Etching Using Radiation (e.g., Laser, Electron-beam, Ion-beam, Etc.) Patents (Class 216/94)
  • Publication number: 20090264975
    Abstract: In one aspect, a medical device has a first configuration and a second configuration, a reservoir containing a therapeutic agent, and a barrier layer disposed over the reservoir, wherein the barrier layer comprises an inorganic material. In another aspect, a medical device has a reservoir containing a therapeutic agent, a barrier layer disposed over the reservoir, wherein the barrier layer comprises an inorganic material, and a swellable material disposed between the barrier layer and a surface of the medical device, wherein the swellable material is a material that swells upon exposure to an aqueous environment. In yet another aspect, a medical device has a multi-layered coating having alternating reservoir layers and barrier layers, and a plurality of excavated regions penetrating through at least a partial thickness of the multi-layered coating.
    Type: Application
    Filed: April 17, 2009
    Publication date: October 22, 2009
    Applicant: BOSTON SCIENTIFIC SCIMED, INC.
    Inventors: Aiden FLANAGAN, John KILCOOLEY, Tim O'CONNOR, Barry O'BRIEN, Dominique SEIDEL, Michael KUEHLING, Torsten SCHEUERMANN, Jan WEBER
  • Publication number: 20090264316
    Abstract: UV/ozone treatment can be used to alter the hydrophobicity of organosilane coated surfaces. Methods are contemplated for producing micropatterned surfaces by coating a surface with an organosilane to produce an organosilane surface; and exposing the organosilane surface to ultraviolet light in the presence of oxygen, wherein the micropatterned organosilane surface is produced without the use of photoresist. Methods for producing substrate-micropatterned surfaces further are also contemplated. Suitable substrates include nucleotides, proteins, carbohydrates, and cells. The organosilane coated devices of the present invention may be used in, for example, arrays.
    Type: Application
    Filed: April 17, 2009
    Publication date: October 22, 2009
    Applicant: Marshall University Research Corporation
    Inventors: Eric R. BLOUGH, Hideyo TAKATSUKI, Kevin Matthew RICE, Brian Scott DAY
  • Publication number: 20090236209
    Abstract: Portable phones are getting a trend that s design and thinner configuration becomes more important. Therefore, in order to meet this demand, the entire key top is made of a thin metal, and a thin resin layer is provided on the back surface of the key top and further letter holes are filled with a resin. According to those, the adhesiveness of the key top is improved as well as improvement of hand feeling. In addition, a printed layer for coloring the letters can be provided on the back surface of the key top.
    Type: Application
    Filed: October 24, 2006
    Publication date: September 24, 2009
    Inventor: Hisashi Ishii
  • Publication number: 20090212020
    Abstract: The invention relates to a method for microstructuring solid surfaces by chemical or electrochemical etching, in which the solid surface is treated with an etching fluid with formation of intermediate products which are insoluble or low-soluble in the etching fluid. By additional use of a particle stream, these intermediate products can be removed in a simple manner. Associated herewith is the advantage that low damage microstructuring of solid bodies is made possible.
    Type: Application
    Filed: March 9, 2006
    Publication date: August 27, 2009
    Applicant: FRA UNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWAN
    Inventors: Kuno Mayer, Daniel Kray, Sybille Hopman, Bernd O. Kolbesen
  • Patent number: 7576008
    Abstract: Disclosed is a method for manufacturing an optoelectronic semiconductor device having a p-n junction diode, which includes the steps of: (a) etching at least one surface of the p-n junction diode in a depth direction to form a plurality of continuous, isolated or mixed type electrode pattern grooves with a certain array; and (b) filling the formed grooves with a conductive ink containing a transparent conducting particle through an inkjet and then performing heat treatment to form a buried transparent electrode, the optoelectronic semiconductor device, and an apparatus for manufacturing the optoelectronic semiconductor device. In the present invention, covering loss is significantly reduced due to a buried transparent electrode so that the high efficiency of photoelectric conversion can be implemented, and there can be provided the easiness of a manufacturing process and the enhancement of productivity through the unification of etching and electrode forming processes.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: August 18, 2009
    Assignee: LG Chem Ltd.
    Inventors: Tae Su Kim, Bu Gon Shin, Jae Sung You, Hyun Woo Shin
  • Publication number: 20090197777
    Abstract: Disclosed are high density microarrays and methods for making and using such microarrays. The microarrays of the present invention can have uniformly shaped and sized sensing zones and are designed to allow high-throughput detection assays with minimal noise.
    Type: Application
    Filed: August 13, 2008
    Publication date: August 6, 2009
    Inventors: Alexander Chagovetz, Steve Blair, Colby Wilson
  • Publication number: 20090159197
    Abstract: A method of forming an electrochemical multilayer test sensor that includes a base, a second layer and a reactive layer. The reactive area includes an enzyme. The test sensor is adapted to be used in a meter and assist in determining the concentration of an analyte. A plurality of electrodes and their respective conductive leads are partially defined on the base. After partially defining the plurality of electrodes and their respective conductive leads on the base, the base is attached to a second layer to define a reaction zone in which the plurality of electrodes are fully defined. After attaching the base to the second layer, the plurality of conductive leads on the base of the test sensor are fully defined.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 25, 2009
    Applicant: BAYER HEALTHCARE LLC
    Inventor: Andrew J. Edelbrock
  • Publication number: 20090135521
    Abstract: To provide a high-quality protection target by forming a protective film that is thin and excellent in corrosion resistance. Provided is a protective film forming method for forming a protective film at least on a surface of a protection target. The method comprises: a base film forming step for forming a base film on the surface of the protection target; and a DLC film forming step for forming a diamond-like carbon film on the base film. The base film forming step forms the base film on the surface of the protection target for a plurality of times by repeating a process of depositing the base film in a prescribed thickness and eliminating a part of or a whole part of the base film. Further, the method comprises, before the DLC film forming step, an insulating layer forming step for forming an insulating layer on the surface of the base film on which the diamond-like carbon film is to be formed.
    Type: Application
    Filed: September 10, 2008
    Publication date: May 28, 2009
    Applicants: SAE Magnetics (H.K.) Ltd, SIMADZU CORPORATION
    Inventors: Kunihiro Ueda, Hong Xin Fang, Dong Wang, Yoshiyuki Konishi, Satoko Ueno, Shigenobu Okada
  • Publication number: 20090128950
    Abstract: A high-aspect ratio motion limiter of a microactuator and a method for fabrication are disclosed. In one embodiment, at least one low-aspect ratio gap is created in a substrate of a microactuator of a hard disk drive. The low-aspect ratio gap is then utilized to facilitate the creation of a high-aspect ratio motion limiter in the substrate of the microactuator.
    Type: Application
    Filed: November 19, 2007
    Publication date: May 21, 2009
    Inventors: Toshiki Hirano, Haruhide Takahashi
  • Publication number: 20090130394
    Abstract: The invention relates to a method for the laser marking of a support having a body and a cover sheet. A laser beam is used to etch the body of the support through the thickness of the cover sheet. The support is laminated either during or after the laser marking in order to reduce or prevent deformations in the cover sheet resulting from etching.
    Type: Application
    Filed: April 25, 2006
    Publication date: May 21, 2009
    Applicant: GEMPLUS
    Inventor: Jean-Luc Lesur
  • Patent number: 7534365
    Abstract: A method for etching a substrate is described wherein a substrate is positioned in a solution of solvent and the substrate is exposed to excitation energy. The method may be applied to the production of thermocouple devices wherein the substrate is poly-ethylene-terephthalate.
    Type: Grant
    Filed: July 26, 2005
    Date of Patent: May 19, 2009
    Assignee: Purdue Research Foundation
    Inventors: Saeed Mohammadi, Shamsuddin Mohajerzadeh, Teimor Maleki
  • Publication number: 20090114619
    Abstract: A fine pattern is formed on a surface of a processing object without using photoresist. A wet etching for the processing object in an area to which ultraviolet light is applied is performed by bringing a solution in which nitrous oxide (N2O) is dissolved into contact with the processing object and applying the ultraviolet light to the solution in a vicinity of an area to the processing object other than portions shielded with a mask whereupon a light shielding pattern is formed.
    Type: Application
    Filed: November 17, 2006
    Publication date: May 7, 2009
    Inventors: Ryuji Sotoaka, Keiichi Tanaka, Tomoyuki Azuma
  • Publication number: 20090107956
    Abstract: A technique is described whereby temperature gradients are created within a semiconductor wafer. Temperature sensitive etching and/or deposition processes are then employed. These temperature sensitive processes proceed at different rates in regions with different temperatures. To reduce pinch off in etching processes, a temperature sensitive etch process is selected and a temperature gradient is created between the surface and subsurface of a wafer such that the etching process proceeds more slowly at the surface than deeper in the wafer. This reduces “crusting” of solid reaction products at trench openings, thereby eliminating pinch off in many cases. Similar temperature-sensitive deposition processes can be employed to produce void-free high aspect ratio conductors and trench fills.
    Type: Application
    Filed: October 24, 2007
    Publication date: April 30, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Michael R. Sievers, Kaushik A. Kumar, Andres F. Munoz, Richard Wise
  • Publication number: 20090095712
    Abstract: A flattening method, by utilizing the advantages of the CARE method and making up for the disadvantages, can perform removal processing of a surface of a workpiece at a sufficient processing rate and can provide a processed surface having enhanced flatness without leaving damage in the processed surface. A flattening method comprises at least two surface removal steps and at least two cleaning steps, the final surface removal step being a catalyst-referred etching step comprising immersing a workpiece in a processing solution containing at least one of hydrohalic acid, hydrogen peroxide water and ozone water, and bringing a surface of a catalyst platen into contact with or close proximity to a surface to be processed of the workpiece to process the surface, said catalyst platen having in a surface a catalyst selected from the group consisting of platinum, gold, a ceramic solid catalyst, a transition metal, glass, and an acidic or basic solid catalyst.
    Type: Application
    Filed: October 14, 2008
    Publication date: April 16, 2009
    Inventors: Kazuto Yamauchi, Yasuhisa Sano, Hideyuki Hara, Junji Murata, Keita Yagi
  • Publication number: 20090084760
    Abstract: The invention relates to a method for material removal on solid bodies, in particular for microstructuring and cutting, by means of liquid jet-guided laser etching, the removed material just as the non-reacted etching components being recycled to a high degree. In this way, silicon with high purity can be recovered either in a polycrystalline manner or be deposited epitaxially on other substrates in the same process chain.
    Type: Application
    Filed: January 25, 2007
    Publication date: April 2, 2009
    Applicants: FRAUNHOFER-SESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V., JOHANN WOLFGANG GOETHE-UNIVERSITAT FRANKFURT AM MAIN
    Inventors: Kuno Mayer, Daniel Kray, Bernd O. Kolbesen, Sybille Hopman
  • Publication number: 20090081512
    Abstract: A sintered electrolyte sheet comprising: a body of no more than 45 ?m thick and laser machined features with at least one edge surface having at least 10% ablation. A method of micromachining the electrolyte sheet includes the steps of: (i) supporting a sintered electrolyte sheet; (ii) micromachining said sheet with a laser, wherein said laser has a wavelength of less than 2 ?m, fluence of less than 200 Joules/cm2, repetition rate (RR) of between 30 Hz and 1 MHz, and cutting speed of preferably over 30 mm/sec.
    Type: Application
    Filed: October 29, 2007
    Publication date: March 26, 2009
    Inventors: William Cortez Blanchard, Sean Matthew Garner, Thomas Dale Ketcham, Xinghua Li
  • Publication number: 20090071941
    Abstract: A method for finishing a substrate including transferring an image onto the substrate and powder coating the substrate. Embodiments provide methods for producing simulated wood grain finishes on engineered wood products such as medium density fiberboard. Logos, graphics, text, and the like may be embossed and/or etched onto the substrate using a laser. In alternative embodiments, the substrate may comprise a solid polymer.
    Type: Application
    Filed: July 14, 2008
    Publication date: March 19, 2009
    Inventors: Michael F. Knoblauch, William Miller
  • Patent number: 7504623
    Abstract: A milling device is disclosed for the preparation of microscopy specimens or other surface science applications through the use of ion bombardment. The device provides the ability to utilize both gross and fine modification of the specimen surface through the use of high and low energy ion sources. Precise control of the location of the specimen within the impingement beams created by the ion sources provides the ability to tilt and rotate the specimen with respect thereto. Locational control also permits the translocation of the specimen between the various sources under programmatic control and under consistent vacuum conditions. A load lock mechanism is also provided to permit the introduction of specimens into the device without loss of vacuum and with the ability to return the specimen to ambient temperature during such load and unload operation. The specimen may be observed and imaged during all active phases of operation.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: March 17, 2009
    Assignee: E.A. Fischione Instruments, Inc.
    Inventors: Paul E. Fischione, David W. Smith, Michael R. Scheinfein, Joseph M. Matesa, Thomas C. Swihart, David Martin
  • Publication number: 20090061161
    Abstract: A method of patterning a cross-linked polymer layer includes providing a substrate comprising a cross-linked polymer layer. A laser beam is generated. The laser beam is directed onto a first surface of the polymer layer. Relative movement between the laser beam and the first surface is caused, thereby forming at least one feature on the first surface.
    Type: Application
    Filed: August 27, 2007
    Publication date: March 5, 2009
    Inventors: LYNN SHEEHAN, KEVIN DOOLEY, RORY JORDAN
  • Patent number: 7482052
    Abstract: A laser processing method where laser beam for processing is irradiated on a processing object and the laser beam for processing directly removes a part of the processing object. The processing object is made of a glass substrate, metal thin film having high absorption to laser beam for processing is formed on a surface of glass substrate, into which laser beam for processing is made incident, the laser beam for processing is irradiated from a surface of metal thin film, and matter is directly removed by irradiation of laser beam onto the processing object in order to form a region finer than an irradiation region of laser beam for processing on the processing object.
    Type: Grant
    Filed: July 6, 2005
    Date of Patent: January 27, 2009
    Assignees: Ricoh Company, Ltd., Riken
    Inventors: Yasufumi Yamada, Katsumi Midorikawa, Hiroshi Kumagai
  • Publication number: 20090023030
    Abstract: The present invention relates to a manufacturing method of an anode for a solid oxide fuel cell (SOFC), an anode, and a SOFC, in which an anode is formed by stacking sheets having a plurality of holes, and the holes are used as gas diffusion paths through which fuel gas can be facilely diffused, and some of the holes are filled with a reinforcement member or a current collecting member, thereby improving a cell strength and increasing a current collecting performance and thus an efficiency of the SOFC.
    Type: Application
    Filed: November 20, 2007
    Publication date: January 22, 2009
    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Joongmyeon Bae, Seung-Wook Baek
  • Patent number: 7479211
    Abstract: A method of forming a biosensor is provided in accordance with the present invention. The method includes providing a metallized electrode support substrate and a sensor support, ablating the electrode support substrate to form electrodes, coupling the sensor support substrate to the electrode support substrate, and positioning spaced-apart electrically conductive tracks across the sensor support substrate so that each track is in electrical communication with one electrode.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: January 20, 2009
    Assignee: Roche Diagnostics Operations, Inc.
    Inventors: Raghbir S. Bhullar, John T. Austera, Brian S. Hill, Christopher D. Wilsey
  • Publication number: 20090001289
    Abstract: A method and apparatus for a recording medium is described. In one embodiment, the invention is an apparatus. The apparatus includes a substrate. The apparatus also includes a phase change layer disposed on the substrate. The phase change layer has a first phase with a first secondary emission ratio and a second phase with a second secondary emission ratio.
    Type: Application
    Filed: March 14, 2005
    Publication date: January 1, 2009
    Inventor: William S. Oakley
  • Publication number: 20080296263
    Abstract: Disclosed are systems and methods for directing laser energy to surfaces of materials via elements which have sharp points, and for reducing the adverse effects of particles which become dislodged by scribing and laser machining of materials.
    Type: Application
    Filed: June 30, 2008
    Publication date: December 4, 2008
    Applicant: BOARD OF REGENTS OF UNIVERSITY OF NEBRASKA
    Inventors: DENNIS R. ALEXANDER, JOHN BRUCE, III
  • Publication number: 20080299647
    Abstract: A cell capturing plate has a flat surface, an opening formed in one surface of the flat surface and supporting the cell therein, and a through-hole penetrating from the opening to the other surface of the flat surface and having a cross section parallel to the flat surface smaller than that of the opening.
    Type: Application
    Filed: May 28, 2008
    Publication date: December 4, 2008
    Applicant: FUJITSU LIMITED
    Inventors: Akio Ito, Akihiko Yabuki, Daisuke Uchida, Satoru Sakai, Sachihiro Youoku
  • Patent number: 7452473
    Abstract: A method of producing a highly etched electrode for a capacitor from a foil is disclosed. The method comprises first applying a laser beam to the foil to form a plurality of marks on the foil surface and then etching the foil. Preferably, the laser marks facilitate etching of foil surface in areas near the marks and retard etching of foil surface inside the marks. After etching, the foil is further processed in a combination of optional steps such as forming and finishing steps. The laser marking of the foil allows for positional control of tunnel initiation, such that tunnel initiation density and the location of tunnel initiation is controlled. By controlling the position of tunnel initiation, foils are etched more uniformly and have optimum tunnel distributions, thus allows for the production of highly etched foils that maintain high strength and have high capacitance.
    Type: Grant
    Filed: September 13, 2004
    Date of Patent: November 18, 2008
    Assignee: Pacesetter, Inc.
    Inventors: R. Jason Hemphill, Xiaofei Jiang, Tearl Stocker, Gary D. Thompson, Thomas F. Strange, Bruce Ribble
  • Patent number: 7452478
    Abstract: This invention provides a method for converting materials for stabilizing surfaces of semiconductor nanoparticles. In this method, surfaces of semiconductor nanoparticles are first modified and then dissolved by photoetching in the presence of materials for stabilization to obtain nanoparticles that are stabilized in an aqueous solution.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: November 18, 2008
    Assignee: Hitachi Software Engineering Co., Ltd.
    Inventors: Keiichi Sato, Susumu Kuwabata
  • Publication number: 20080277381
    Abstract: The present invention provides an etching solution for silver or silver alloy comprising one at least ammonium compound represented by the formula (1), (2) or (3) below and an oxidant.
    Type: Application
    Filed: April 5, 2006
    Publication date: November 13, 2008
    Applicant: INKTEC CO., LTD.
    Inventors: Kwang-Choon Chung, Hyun-Nam Cho, Young-Kwan Seo
  • Publication number: 20080264905
    Abstract: Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.
    Type: Application
    Filed: April 28, 2008
    Publication date: October 30, 2008
    Inventors: Mehran Nasser-Ghodsi, Mark Borowicz, Dave Bakker, Mehdi Vaez-Iravani, Prashant Aji, Rudy F. Garcia, Tzu Chin Chuang
  • Publication number: 20080237189
    Abstract: A method and device for ablation of thin layers on the rim region of the surface of a plane substrate coated with a thin film. The rim region runs along the edge or edges of the substrate, and the thin layers should be ablated in at least two, not necessarily unconnected areas of the rim region along edge pieces not parallel to one another. A laser beam is pointed toward an ablation area. The areas of the rim region to be ablated are guided through the area so that in a plane of the surface of the substrate, during the whole ablation process, there is basically a constant distance in the space that lies partly in the ablation area and has its starting point outside the substrate surface and its end point within the substrate surface.
    Type: Application
    Filed: March 31, 2008
    Publication date: October 2, 2008
    Applicant: OC OERLIKON BALZERS AG
    Inventors: Philipp Grunewald, Phil Rumsby
  • Publication number: 20080241478
    Abstract: A painted surface is processed by a laser beam to remove at least one layer of paint. The surface that is exposed may be the raw substrate material, e.g., wood or wood laminate, or may be another painted surface. The laser may engrave a pattern, e.g. a wood grain pattern.
    Type: Application
    Filed: February 20, 2008
    Publication date: October 2, 2008
    Inventors: Darryl J Costin, Darryl Costin, Richard C. Fishburn
  • Publication number: 20080210298
    Abstract: The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of silicon dioxide layers and also for the doping of underlying silicon layers. The present invention also relates secondly to a process in which these media are employed.
    Type: Application
    Filed: June 13, 2006
    Publication date: September 4, 2008
    Inventors: Armin Kuebelbeck, Werner Stockum
  • Publication number: 20080212181
    Abstract: A retroreflective sheet structure (10) comprising a transparent layer (20) having a front light-receiving surface (30) and a rear retroreflecting surface (32). Light incident on the front surface (30) will pass through the layer (20), impinge on the rear retroreflective surface (32) and reflect back out through the front surface (30) in a predetermined direction. An identifying indicia (44) is chosen and then formed on the retroreflecting surface (32). This indicia (44) can be used for identification purposes, even years after an end product incorporating the reflective sheet structure (10) has been out in the field.
    Type: Application
    Filed: June 7, 2006
    Publication date: September 4, 2008
    Applicant: Avery Dennison Corporation
    Inventor: Feng Wu
  • Patent number: 7419612
    Abstract: The invention concerns a method which consists in first subjecting the polyimide sheet to ionic bombardment, followed by an irradiation in the visible domain and finally a relatively brief chemical etching. Said method enables a thin polyimide sheet comprising pores, of nanometric to micrometric size, having a substantially cylindrical shape and substantially equal diameters to be obtained.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: September 2, 2008
    Assignee: Universite Catholique De Louvain
    Inventors: Roger Legras, Etienne Ferain
  • Publication number: 20080206481
    Abstract: At least one of the surfaces of a silicone contact lens is a wrinkled surface, providing the contact lens surface with a desired topography. The wrinkled surface may include random ridges, either over the entire surface of the lens, or in a desired pattern on the surface of the lens. The wrinkled surface is formed by subjecting the surface to a high energy source.
    Type: Application
    Filed: February 22, 2008
    Publication date: August 28, 2008
    Applicant: BAUSCH & LOMB INCORPORATED
    Inventors: Robert M. Braun, Ravi Sharma
  • Publication number: 20080193781
    Abstract: A method of forming integral articles having non-line-of-site contours includes the steps of providing a plurality of molds, the molds having at least one mold channel therethrough. The plurality of molds are stacked on one another to form a mold stack, wherein at least one portion of the mold stack provides a non-line of sight multi-level channel through at least partial overlap of the mold channels between adjacent ones of the plurality of molds. A flowable material is applied to the mold stack. The flowable material is pressed to fill the mold channels in each of the plurality of molds to form an integral article comprising a plurality of stacked integrally connected levels of the material, wherein through interconnection of the integrally connected levels the integral article provides at least one non-line of sight contour traversing in its thickness direction. The mold stack is then separated or removed to free the integral article.
    Type: Application
    Filed: August 15, 2006
    Publication date: August 14, 2008
    Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.
    Inventors: Wallace Gregory Sawyer, Tony L. Schmitz, John C. Ziegert, Jeffrey Alan Bardt, Gerald R. Bourne
  • Publication number: 20080185363
    Abstract: The invention provides a method of making a metal casing, including the following steps: (a) providing a roll of metal sheet; (b) sequentially pulling out a part of metal sheet from the roll of metal sheet; (c) etching a plurality of holes on the part of metal sheet; and (d) forming the part of metal sheet into the metal casing. Step (d) includes: implementing a surface treatment on the part of metal sheet and press forming the part of metal sheet into the metal casing. Therein the steps of the surface treatment and the press forming can be exchanged. Therefore, the method continuously makes the metal casing and avoids management problems of intermediate products induced in the process of a traditional production.
    Type: Application
    Filed: December 31, 2007
    Publication date: August 7, 2008
    Inventors: Yi-Sheng Yu, Hsu-Pin Kao, Kai-Hsiang Hsu, Chin-Ho Kuo
  • Publication number: 20080156770
    Abstract: By working a grabbing portion by a charged particle beam of FIB or the like, the grabbing portion in parallel with the beam can be formed, and also dust adhered to the grabbing portion is removed. When a small sample represented by a TEM sample is fabricated by being cut out by etching by a charged particle beam and is carried at inside of an apparatus of irradiating a charged particle beam, the sample is etched in a direction of irradiating the charged particle beam, and therefore, a mechanism pinched by a grabbing face of a grabbing portion can be worked in a direction the same as that in working the sample, and therefore, a change in an attitude can be reduced when the sample and the grabbing face are fabricated by parallel faces.
    Type: Application
    Filed: December 19, 2007
    Publication date: July 3, 2008
    Inventor: Masanao Munekane
  • Publication number: 20080153305
    Abstract: A method to passivate a freshly etched metal structure comprises providing a metal surface on a substrate that has been etched by a first particle beam, exposing the metal surface to a passivation gas, and exposing the freshly etched metal structures to a second particle beam in the presence of the passivation gas. The second particle beam may comprise an ion beam or a laser beam. The passivation gas may comprise water vapor, oxygen gas, or hydrocarbon gas.
    Type: Application
    Filed: November 14, 2007
    Publication date: June 26, 2008
    Inventor: Ted Liang
  • Publication number: 20080152796
    Abstract: A method of producing a reflective design includes the steps of lasering a pattern on an adhesive side of a reflective laminated material. The lasering ablates the adhesive and causes these areas to not adhere. The reflective laminate material is applied to a substrate. A carrier layer of the reflective laminate is removed to produce a reflective design on the substrate. This method allows for highly customized designs at a reasonable cost that are very visually appealing. The substrate may be a textile, paper, or decal material. The textile may be the garment or may be a patch that is sewn onto a garment or applied to the garment with an adhesive.
    Type: Application
    Filed: March 6, 2008
    Publication date: June 26, 2008
    Inventor: Michael Robert Collier
  • Publication number: 20080149599
    Abstract: A method for producing a porous flow-through element for use in an electrokinetic infusion pump is provided and generally includes providing a porous membrane that is entirely porous along both its length and width, treating the membrane by selectively inactivating portions of the membrane in a desired pattern to define active regions that allow fluid flow therethrough and inactive regions that do not, and laminating the treated membrane. Various techniques can be used to treat the membrane including, for example, applying a heated embossing die to the membrane, contacting selected portions of the membrane with laser energy, applying a pore-penetrating chemical to the membrane, and cutting and removing selected portions of the membrane. The resulting treated membrane can be laminated between opposed films having one or more perforations therethrough with each perforation being aligned with an active region to define a fluid flow pathway therebetween.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 26, 2008
    Applicant: LifeScan, Inc.
    Inventors: Sebastian Bohm, Richard Wiard
  • Publication number: 20080138691
    Abstract: There is provided a separator for a fuel cell having a very good anticorrosiveness and electrical conductivity. A separator for a fuel cell according to the present invention includes: a base 1 formed of a steel which contains 10.5 mass % or more of Cr; a metal film 3 formed on the surface of the base 1; and an intermediate layer 2 formed between the base 1 and the metal film 3, the intermediate layer 2 containing oxygen. The metal film 3 is composed of at least one metallic element selected from the group consisting of Ta, Nb, and Ti, and the intermediate layer 2 contains Fe and Cr which are contained in the steel and at least one metallic element selected from the group consisting of Ta, Nb, and Ti composing the metal film 3.
    Type: Application
    Filed: January 24, 2006
    Publication date: June 12, 2008
    Inventor: Fumiaki Kikui
  • Publication number: 20080139707
    Abstract: The objective of the present invention is to provide a chromatic coloring agent for multicolor laser marking, capable of forming clear markings having two or more different color tones when two or more laser beams having different energy levels are irradiated onto different places of a molded article, a composition for multicolor laser marking, for example, capable of forming a chromatic marking derived from the chromatic coloring agent and a white marking on the surface of a molded article whose base color is black or dark-color based color, a laser marking method, a multicolor-marked molded article and the like. The present chromatic coloring agent has an exothermic peak in the range of 360° C. or higher and 590° C. or lower, as measured by differential thermal analysis.
    Type: Application
    Filed: January 13, 2005
    Publication date: June 12, 2008
    Applicant: TECHNO POLYMER CO., LTD.
    Inventors: Kazuyoshi Kawakami, Hideyuki Kurimoto, Akira Shimizu, Toshiyuki Kosakai, Mio Ishida
  • Patent number: 7385183
    Abstract: In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.
    Type: Grant
    Filed: January 19, 2006
    Date of Patent: June 10, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Chan Park, Sung-Wook Hwang
  • Publication number: 20080131643
    Abstract: A method for the introduction of at least one locally limited weakening into a decorative composite, in particular for use in an automotive vehicle, by way of a plurality of laser beams, is disclosed. The decorative composite includes at least one decorative substrate, at least one decorative material and at least one upholstered layer arranged between the decorative substrate and the decorative material. The weakening is formed after the joining of the decorative composite as a sequence of first blind holes or perforations, which penetrate the decorative substrate completely, and unweakened webs between these blind holes or perforations. At least one second blind hole, which does not penetrate the decorative substrate, is introduced into at least one web.
    Type: Application
    Filed: November 20, 2007
    Publication date: June 5, 2008
    Applicant: Lisa Draxlmaier GMBH
    Inventors: Christian Schlemmer, Hubert Pirkl
  • Patent number: 7374791
    Abstract: This invention relates to a method for manufacturing an implantable medical device, having a surface covered with a coating that can include a desired amount of a biologically active material, using an ultraviolet (UV) laser. The invention also pertains to a method for manufacturing an implantable medical device having a surface covered with a coating having more than one layer wherein a desired portion of the top layer is ablated with an ultraviolet (UV) laser. Also, the invention relates to a method for measuring a thickness of a coating applied to an implantable medical device. Furthermore, the invention is directed to a method for manufacturing an implantable medical device having a surface covered with a coating free of webbing or cracking.
    Type: Grant
    Filed: May 26, 2004
    Date of Patent: May 20, 2008
    Assignee: Boston Scientific Scimed, Inc.
    Inventor: Aiden Flanagan
  • Publication number: 20080111084
    Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.
    Type: Application
    Filed: October 31, 2007
    Publication date: May 15, 2008
    Inventors: Gerard Benas-Sayag, Patrick Bouchet, Antoine Corbin, Pierre Sudraud
  • Publication number: 20080099444
    Abstract: A micro-fabrication method characterized by comprising the steps of applying a pulse laser beam to a plastic material to be processed exhibiting a glass phase transition by heating and having a heat-shrinkage to form laser-processed patterns on the surface of or in the above plastic material to be processed, and then heat-treating the plastic material to be processed at a temperature not lower than a glass transition temperature Tg to fine the formed patterns by heat-shrinkage.
    Type: Application
    Filed: January 17, 2005
    Publication date: May 1, 2008
    Inventors: Hiroaki Misawa, Saulius Juodkazis
  • Publication number: 20080044637
    Abstract: A microhole-formed stretched porous polytetrafluoroethylene material, in which a microhole having a hole diameter greater than an average pore diameter of a stretched porous polytetrafluoroethylene material is formed in the stretched porous polytetrafluoroethylene material by irradiation of a pulse laser beam having a pulse length of at most 10 picoseconds, and the microporous structure of the wall surface of the microhole is substantially retained without being destroyed, a production process thereof, and an abrasion working process.
    Type: Application
    Filed: January 20, 2005
    Publication date: February 21, 2008
    Inventors: Yasuhito Masuda, Yasuhiro Okuda, Hidehiko Mishima
  • Publication number: 20080041822
    Abstract: The present invention relates to a substrate having a blind hole and a method for forming the blind hole. The method for forming the blind hole in the substrate includes: (a) providing a substrate having a lower dielectric layer, a copper layer, and an upper dielectric layer; and (b) forming an upper dielectric layer through hole and a copper layer through hole by etching through the upper dielectric layer and the copper layer with laser, and forming a cavity on the lower dielectric layer by using the laser, in which the aperture of the cavity on the upper surface of the lower dielectric layer is larger than that of the copper layer through hole. Therefore, a blind hole space in a shape of a rivet is formed, so that after the blind hole space is electroplated with an electroplating copper layer, the bonding force between the electroplating copper layer and the copper layer is enhanced.
    Type: Application
    Filed: August 10, 2007
    Publication date: February 21, 2008
    Applicant: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventor: Te-Chun Wang