Abstract: Determining a property of a layer of an integrated circuit (IC), the layer being formed over an underlayer, is implemented by performing the steps of: irradiating the IC to thereby eject electrons from the IC; collecting electrons emitted from the IC and determining the kinetic energy of the emitted electrons to thereby calculate emission intensity of electrons emitted from the layer and electrons emitted from the underlayer calculating a ratio of the emission intensity of electrons emitted from the layer and electrons emitted from the underlayer; and using the ratio to determine material composition or thickness of the layer. The steps of irradiating IC and collecting electrons may be performed using x-ray photoelectron spectroscopy (XPS) or x-ray fluorescence spectroscopy (XRF).

Abstract: The disclosure relates to a method of determining an energy width of a charged particle beam, comprising the steps of providing a charged particle beam, directing said beam towards a specimen, and forming an energy-dispersed beam from a flux of charged particles transmitted through the specimen. As defined herein, the method comprises the steps of providing a slit element in a slit plane, and using said slit element for blocking a part of said energy-dispersed beam, as well as the step of modifying said energy-dispersed beam at the location of said slit plane in such a way that said energy dispersed beam is partially blocked at said slit element. The unblocked part of said energy-dispersed beam is imaged and an intensity gradient of said imaged energy-dispersed beam is determined, with which the energy width of the charged particle beam can be determined.

Abstract: A method of calculating a thickness of a graphene layer and a method of measuring a content of silicon carbide, by using X-ray photoelectron spectroscopy (XPS), are provided. The method of calculating the thickness of the graphene layer, which is directly grown on a silicon substrate, includes measuring the thickness of the graphene layer directly grown on the silicon substrate, by using a ratio between a signal intensity of a photoelectron beam emitted from the graphene layer and a signal intensity of a photoelectron beam emitted from the silicon substrate.

Abstract: A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector.

Abstract: A monitoring system and method are provided for determining at least one property of an integrated circuit (IC) comprising a multi-layer structure formed by at least a layer on top of an underlayer. The monitoring system receives measured data comprising data indicative of optical measurements performed on the IC, data indicative of x-ray photoelectron spectroscopy (XPS) measurements performed on the IC and data indicative of x-ray fluorescence spectroscopy (XRF) measurements performed on the IC. An optical data analyzer module analyzes the data indicative of the optical measurements and generates geometrical data indicative of one or more geometrical parameters of the multi-layer structure formed by at least the layer on top of the underlayer.

Abstract: Provided is a compact two-dimensional electron spectrometer that is capable of variably adjusting the deceleration ratio over a wide range, and performing simultaneous measurement of the two-dimensional emission angle distribution with a high energy resolution over a wide solid angle of acquisition. The two-dimensional electron spectrometer is configured from: a variable deceleration ratio spherical aberration correction electrostatic lens; a cylindrical mirror type energy analyzer or a wide angle energy analyzer; and a projection lens.

Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.

Abstract: Spectrums are measured by irradiating an electron beam on a sample while varying an accelerating potential and by detecting X-rays emitted from the sample. A normalizer unit normalizes the spectrums and thereby calculates normalized spectrums. A difference calculator unit calculates difference spectrums based on the normalized spectrums. A search unit performs a search in a database for each comparison difference spectrum, and identifies compounds contained in the sample.

Abstract: A device system and method for wirelessly communicating through tissue is provided. The device system comprises an implanted device with an array of antennas aligned with a tandem device with an array of antennas outside of the body. The two devices wirelessly communicate in a bi-directional manner. The implanted device can act as a physiological sensor and stimulator, and the external device can act as a controller and relay. Such configurations allow for a range of uses within research and clinical settings.

Abstract: The present disclosure discloses a method and a system for determining an energy spectrum of an incident electron beam. The method includes obtaining a plurality of deflection currents of a beam deflection device; for each of the plurality of deflection currents, determining an energy range of an ejected electron beam, and determining a target current of a target generated by the ejected electron beam irradiating the target, wherein the ejected electron beam is emitted from an output of the beam deflection device after the incident electron beam enters the beam deflection device. The method also includes determining the energy spectrum of the incident electron beam based on the energy ranges of the plurality of ejected electron beams and the corresponding target currents.

Abstract: The invention comprises a method and apparatus for treating a tumor of a patient with charged particles, comprising the step of developing a multi-modality treatment plan, the multi-modality treatment plan directing: (1) use of a first beam type to treat a first volume of the tumor, the first beam type a first mass per particle and (2) use of a second beam type to treat a second volume of the tumor, the second beam type comprising a second mass per particle, where the second mass per particle is at least ten percent different than the first mass per particle and the second volume differs from the first volume. The multi-modality treatment plan is optionally formed by selectively merging treatment plans using the respective particle types or is developed using properties of the multiple particle types.

Abstract: The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample at a plurality of sample positions; and acquiring an EELS spectrum for each of said plurality of sample positions. According to the method, it comprises the further steps of scanning, once more, said charged particle beam over said sample at said plurality of sample positions; acquiring a further EELS spectrum for each of said plurality of sample positions; and combining, for each of said plurality of sample positions, said EELS spectrum with said further EELS spectrum. With this, it is possible to acquire rapid information on the sample being investigated, allowing for faster processing of samples.

Abstract: An input lens is provided which has a large acceptance solid angle for electrons. The input lens is for use in an electron spectrometer and disposed between an electron source producing electrons and an electron analyzer in the electron spectrometer. The input lens has a reference electrode at a reference potential, a slit, first through nth electrodes, where n is an integer equal to or greater than three, arranged between the reference electrode and the slit, and a second mesh attached to the first electrode. The first through nth electrodes are arranged in this order along an optical axis. The second mesh is at a potential higher than the reference potential.

Abstract: According to various embodiments, an inspection device may include a chamber, a stage provided within the chamber, an electron emitter, a laser emitter, and a conductive probe. The stage may be configured to hold a sample. The electron emitter may be configured to emit an electron beam towards the stage, to generate a first electrical signal in the sample. The laser emitter may be configured to emit a laser beam towards the stage, to generate a second electrical signal in the sample. The conductive probe may be configured to receive from the conductive structure, at least one of the first electrical signal and the second electrical signal.

Abstract: An electron imaging apparatus 100 is disclosed, which is configured for an electron transfer along an electron-optical axis OA of an electron 2 emitting sample 1 to an energy analyzer apparatus 200, and comprises a sample-side first lens group 10, an analyzer-side second lens group 30 and a deflector device 20, configured to deflect the electrons 2 in an exit plane of the electron imaging apparatus 100 in a deflection direction perpendicular to the electron-optical axis OA. An electron spectrometer apparatus, an electron transfer method and an electron spectrometry method are also described.

Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.

Abstract: One embodiment relates to apparatus for correcting aberrations introduced when an electron lens images a specimen. A specimen is illuminated, and a cathode objective lens accelerates emitted or scattered electrons. The resulting electron beam is deflected by a magnetic beam separator that disperses the incoming electron beam according to its energy. The dispersed beam is focused at the reflection plane of an electron mirror. After this focusing, and a second deflection by the beam separator, the beam dispersion is removed. The dispersion-free beam is reflected in a second electron mirror which corrects aberrations of the cathode objective lens. The beam separator then deflects the beam towards projection optics which form a magnified, aberration-corrected image. When energy filtering is needed, a knife-edge plate is inserted between the beam separator and first electron mirror to remove electrons outside the selected range. Other embodiments are disclosed.

Abstract: Apparatuses and methods for aligning lamella to charged particle beams based on a volume reconstruction are disclosed herein. An example method at least includes forming a reconstructed volume of a portion of a sample, the sample including a plurality of structures, and the reconstructed volume including a portion of the plurality of structures, performing, over a range of angles, a mathematical transform on each plane of a plurality of planes of the reconstructed volume, and based on the mathematical transform on each plane of the plurality of planes, determining a target orientation of the sample within the range of angles, wherein the target orientation aligns the plurality of structures parallel to an optical axis of a charged particle beam.

Abstract: The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.

Abstract: To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.

Abstract: A volume interrogation system can use an accelerated beam of charged particles to interrogate objects using charged-particle attenuation and scattering tomography to screen items such as electronic devices, packages, baggage, industrial products, or food products for the presence of materials of interest inside. The apparatus, systems, and methods in this patent document can be employed in checkpoint applications to scan items. Such checkpoint applications can include border crossings, mass transit terminals (subways, buses, railways, ferries, etc.), and government and private-sector facilities.

Abstract: The invention relates to the field of physics and relates to an impulse-resolving photo-electron spectrometer, by means of which the physical properties can be determined. The aim of the invention is to provide an impulse-resolving photo-electron spectrometer enabling the device components to have a simple structure with a significantly reduced overall volume.

Abstract: Various methods and systems are provided for acquiring electron backscatter diffraction patterns. In one example, a first scan is performed by directing a charged particle beam towards multiple impact points within a ROI and detecting particles scattered from the multiple impact points. A signal quality of each impact point of the multiple impact points is calculated based on the detected particles. A signal quality of the ROI is calculated based on the signal quality of each impact point. Responsive to the signal quality of the ROI lower than a threshold signal quality, a second scan of the ROI is performed. A structural image of the sample may be formed based on detected particles from both the first scan and the second scan.

Abstract: The invention is directed to mass spectrometer comprising an extraction system for secondary ions. The system comprises: an inner spherical deflecting sector; an outer spherical deflecting sector; a deflecting gap formed between the sectors; a housing in which the sectors are arranged. The deflecting sectors (42; 44) are biased at retarding gap (46). The system further comprises an exit disc electrode with an exit through hole centered about the exit axis, the intermediate electrode being biased at an intermediate voltage between the voltage of the housing and the average voltage of the sectors. The trajectories of the secondary ions become more parallel to the exit axis and become closer to the axis.

Abstract: There is provided a monochromator capable of reducing angular dispersion in electron rays. In the monochromator, a first Wien filter and a second Wien filter are arranged symmetrically with respect to a first plane of symmetry. A third Wien filter and a fourth Wien filter are arranged symmetrically with respect to a second plane of symmetry. A pair of the first and second Wien filters and a pair of the third and fourth Wien filters are arranged symmetrically with respect to a third plane of symmetry. The first through fourth Wien filters produce their respective electromagnetic fields which are identical in sense and strength.

Abstract: An integral Wien filter and vacuum pump for separating charged particles or for orienting their spin direction while maintaining optimal beamline vacuum. The vacuum pump is an ion pump including one or more cylindrical Penning cells to trap and expel electrons. The Wien filter includes orthogonal electric and magnetic fields to direct particles with the desired speed through the device while deflecting particles at undesired speeds. The Wien filter includes two electrodes, one biased positive and one biased negative, a dipole magnet, and means for reversing polarity of the electrodes to flip the spin of the charged particles. Metal plates on either side of the Penning cells embed gas that is ionized by trapped electrons in the Penning cell thus creating vacuum by turning gas into solid. The two metal plates can be configured to obtain vacuum pumping via chemical gettering and for removal of noble gases.

Abstract: A system and method are disclosed for acquiring Electron Energy Loss Spectrometry (EELS) spectra in a transmission electron microscope. The inventive system and method maximize spectrum acquisition rate and duty cycle by exposing a first portion of an image sensor to a first spectrum while a previously exposed potion of the sensor is read out of the sensor during some or all of the exposure time.

Abstract: Provided herein are approaches for increasing operational range of an electrostatic lens. An electrostatic lens of an ion implantation system may receive an ion beam from an ion source, the electrostatic lens including a first plurality of conductive beam optics disposed along one side of an ion beam line and a second plurality of conductive beam optics disposed along a second side of the ion beam line. The ion implantation system may further include a power supply in communication with the electrostatic lens, the power supply operable to supply a voltage and a current to at least one of the first and second plurality of conductive beam optics, wherein the voltage and the current deflects the ion beam at a beam deflection angle, and wherein the ion beam is accelerated and then decelerated within the electrostatic lens.

Abstract: In a first cross section along an electron ray that passes between an inner curved surface and an outer curved surface of a beam bender, the curvature of the surfaces are fixed, and the center of the curvature of the surfaces are set so as to match each other. In a second cross section perpendicular to the electron ray, the curvature of the surfaces are fixed, and the center of curvature of the surfaces are set so as to match each other. The radius of the curvature of the surface in the second cross section is set to be larger than that of the surface in the first cross section. The radius of curvature of the surface in the second cross section is set to be larger than that of the surface in the first cross section.

Abstract: The present invention relates to a hard X-ray photoelectron spectroscopy (HAXPES) system comprising an X-ray tube, an X-ray monochromator, and a sample. The X-ray tube provides a beam of photons, which via the X-ray monochromator is directed through the system so as to excite electrons from the illuminated sample. The X-ray tube is connected to a monochromator vacuum chamber in which the X-ray monochromator is configured to monochromatize and focus the beam onto the sample. The monochromator vacuum chamber is connected to an analysis vacuum chamber, the illuminated sample being mounted inside the analysis vacuum chamber and the analysis vacuum chamber being connected to an electron energy analyser. The electron energy analyser is mounted onto the analysis vacuum chamber. Further, the beam of photons provided from the X-ray tube is divergent and has an energy above 6 keV. The X-ray monochromator also comprises a curved optical element arranged to both monochromatize and focus the diverging beam of photons.

Abstract: The present invention relates to a hard X-ray photoelectron spectroscopy (HAXPES) system comprising an X-ray source providing a beam of photons which is directed through the system so as to excite electrons from an illuminated sample. An X-ray tube is connected to a monochromator vacuum chamber in which a crystal is configured to monochromatize and focus the beam onto an illuminated sample. A hemispherical electron energy analyser is mounted onto the analysis chamber. An air gap is provided between the X-ray tube and the monochromator chamber, which air gap is provided with a first radiation trap to shield the ambient air from the radiation when the air gap is illuminated with X-rays from the source.

Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.

Abstract: A high-resolution electron energy analyzer is disclosed. In one embodiment, the electron energy analyzer includes an electrostatic lens configured to generate an energy-analyzing field region, decelerate electrons of an electron beam generated by an electron source, and direct the decelerated electrons of the electron beam to the energy-analyzing field region. In another embodiment, the electron energy analyzer includes an electron detector configured to receive one or more electrons passed through the energy-analyzing field region. In another embodiment, the electron detector is further configured to generate one or more signals based on the one or more received electrons.

Abstract: The purpose of the present invention is to provide a charged-particle beam device capable of stable performance of processes such as a measurement or test, independent of fluctuations in sample electric electric potential or the like. To this end, this charged-particle beam device comprises an energy filter for filtering the energy of charged particles released from the sample and a deflector for deflecting the charged particles released from the sample toward the energy filter. A control device generates a first image on the basis of the output of a detector, adjusts the voltage applied to the energy filter so that the first image reaches a prescribed state, and calculates deflection conditions for the deflector on the basis of the post-adjustment voltage applied to the energy filter.

Abstract: In one aspect, an ion trap is disclosed, which includes a curved linear ion trap having a plurality of electrodes arranged around a central curved axis so as to provide a volume for trapping ions, said plurality of electrodes comprising at least one inner electrode and at least one outer electrode radially separated from said inner electrode. The ion trap further includes a pair of inner and outer ion guide electrodes providing a volume therebetween for receiving ions ejected from said curved ion trap and guiding the ejected ions to one or more spatial locations along a focal line, said inner and outer ion guide electrodes being positioned external to said ion trapping volume and in proximity of said at least inner and outer electrodes of the curved ion trap, respectively, wherein a DC voltage is applied between said ion guide electrodes to provide an electric filed therebetween for guiding the ejected ions to said spatial locations.

Abstract: Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.

Abstract: Provided herein are approaches for increasing surface area of a conductive beam optic by providing grooves or surface features thereon. In one approach, the conductive beam optic may be part of an electrostatic filter having a plurality of conductive beam optics disposed along an ion beam-line, wherein at least one conductive beam optic includes a plurality of grooves formed in an exterior surface. In some approaches, a power supply may be provided in communication with the plurality of conductive beam optics, wherein the power supply is configured to supply a voltage and a current to the plurality of conductive beam optics. The plurality of grooves may be provided in a spiral pattern along a length of the conductive beam optic, and/or oriented parallel to a lengthwise axis of the conductive beam optic.

Abstract: Among other things, we describe methods and apparatus for the ionization of target molecular analytes of interest, e.g., for use in mass spectrometry. In some implementations, a thin molecular stream is emitted in either single or a split mode and encounters both an electron-impact ion source and trochoidal electron monochromator placed sequentially or coincidentally. The first ion source emits high-energy electrons (˜70 eV) to generate characteristic positively-charged mass fragment spectra while the second source emits low-energy electrons in a narrow bandwidth to generate negative molecular ions or other ions via electron capture ionization. The dual ion source may be coupled to analytical instruments such as a gas chromatograph and to any number of mass analyzers such as a polarity switching quadrupole mass analyzer or to multiple mass analyzers.

Abstract: Systems and methods for determining beam asymmetry in a radiation treatment system using electronic portal imaging devices (EPIDs) without implementation of elaborate and complex EPID calibration procedures. The beam asymmetry is determined based on radiation scattered from different points in the radiation beam and measured with the same region of interest ROI of the EPID.

Abstract: An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.

Abstract: Apparatus and method for analyzing an electron beam including a circular sensor disk adapted to receive the electron beam, an inner semi-circular slit in the circular sensor disk; an outer semi-circular slit in the circular sensor disk wherein the outer semi-circular slit is spaced from the first semi-circular slit by a fixed distance; a system for sweeping the electron beam radially outward from the central axis to the inner semi-circular slit and outer second semi-circular slit; a sensor structure operatively connected to the circular sensor disk wherein the sensor structure receives the electron beam when it passes over the inner semi-circular slit and the outer semi-circular slit; and a device for measuring the electron beam that is intercepted by the inner semi-circular slit and the outer semi-circular slit.

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract: The present invention relates to a charged particle beam apparatus enabling a selection of a charged particle beam in a specified energy range by symmetrically arranging cylindrical electrostatic lenses deflecting a path of the charged particle beam and disposing an energy selection aperture between the cylindrical electrostatic lenses. Since an integral structure in which a central electrode and a plurality of electrodes that are arranged at a front portion and a rear portion in relation to the central electrode of a monochromator are fixed to each other through insulator, is applied, a mechanism for adjusting an offset with respect to an optical axis is simplified as compared to the case of separately providing the lenses at the front portion and the rear portion, respectively, and a secondary aberration is canceled in an exit plane due to symmetry of an optical system.

Abstract: A method which can generate a clear image of a specimen by correcting an image drift is disclosed. The image generation method includes: scanning a specimen with an electron beam to generate images; calculating amounts of image drift within specific regions of the respective images; calculating continuous amounts of image drift by interpolation from the amounts of image drift; determining an amount of image drift at each pixel of the images from the continuous amounts of image drift; correcting the images by correcting a brightness of each pixel based on the amount of image drift at each pixel; and generating a synthetic image from the corrected images.

Abstract: The present invention relates to an electron beam apparatus including a monochromator in which cylindrical electrostatic lenses for deflecting a path of an electron beam in the lenses are arranged symmetrically and an aperture including a plurality of selectable slits is disposed therebetween to be able to select an electron beam having a specified energy range. The electron beam apparatus has a monochromator having high resolution and excellent stability and maintainability by disposing slits and circular openings in one aperture part in parallel arrangement, thereby improving spatial resolution and energy resolution.

Abstract: An electron microscope includes an electron source, an extraction electrode that extracts an electron beam emitted from the electron source, a monochromator having an energy filter that disperses the electron beam emitted from the electron source based on an energy thereof and an energy selection slit that selects the energy of the electron beam, an incident-side electrode provided between the extraction electrode and the monochromator, and an incident-side electrode controller that controls the incident-side electrode based on a change in a voltage applied to the extraction electrode.

Abstract: An electron spectroscopy system and method are disclosed. In another aspect, an ultrabright and ultrafast angle-resolved electron spectroscopy system is provided. A further aspect of the present system employs an electron gun, a radio frequency cavity and multiple spectrometers. Yet another aspect uses spectrometers in an aligned manner to deflect and focus electrons emitted by the electron gun. Moreover, an ultrafast laser is coupled to an electron spectroscopy system. A bunch of monochromatic electrons have their energy compressed and reoriented in an additional aspect of the present system. A further aspect of the present electron spectroscopy system employs adaptive and/or adjustable optics to optimize both time and energy compression. Another aspect provides at least two RF lenses or cavities, one before a specimen and one after the specimen.

Abstract: A method of determining a local electric field and/or a local magnetic field in a sample and/or the dielectric constant of a material and/or the angle between the input and output surfaces of the sample, comprising illumination of the sample by an electron beam in precession mode using an illumination device, generation of a diffraction pattern, determination of the offset of the disk corresponding to the transmitted beam due to the electric field and/or the magnetic field, by comparison of the diffraction pattern and a reference diffraction pattern, determination of a deflection angle of the transmitted beam, and determination of the value of the local electric field and/or the local magnetic field of the sample and/or determination of the dielectric constant of materials and/or determination of the angle between the input and output surfaces of the sample.

Abstract: Mask-modulated spectra are incident to a sensor and are summed during a frame time. After the frame time, a compressed spectrum is read out based on the sum and decompressed to obtain spectra for some or all specimen locations. The mask-modulated spectrum that are summed are associated with different modulations produced by a common mask.

Abstract: There is provided an energy filter capable of being simplified in structure and of achieving low aberrations. The energy filter (100) includes a first sector magnet (10) and a second sector magnet (20). The first and second magnets (10, 20) are configured mirror-symmetrically with respect to a symmetry plane (M). There are one focal point of crossover in the X direction and one focal point of crossover in the Y direction. The focal point of crossover in the X direction and the focal point of crossover in the Y direction are at an energy dispersive plane (S2). There are two focal points of image in the X direction and two focal points of image in the Y direction. The focal points of image in the X direction and the focal points of image in the Y direction are at the symmetry plane (M) and at an achromatic plane (A2).