Electron Energy Analysis Patents (Class 250/305)
  • Patent number: 10720317
    Abstract: Among other things, we describe methods and apparatus for the ionization of target molecular analytes of interest, e.g., for use in mass spectrometry. In some implementations, a thin molecular stream is emitted in either single or a split mode and encounters both an electron-impact ion source and trochoidal electron monochromator placed sequentially or coincidentally. The first ion source emits high-energy electrons (˜70 eV) to generate characteristic positively-charged mass fragment spectra while the second source emits low-energy electrons in a narrow bandwidth to generate negative molecular ions or other ions via electron capture ionization. The dual ion source may be coupled to analytical instruments such as a gas chromatograph and to any number of mass analyzers such as a polarity switching quadrupole mass analyzer or to multiple mass analyzers.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: July 21, 2020
    Assignee: MERIDION, LLC
    Inventor: Nicholas Wilton
  • Patent number: 10682528
    Abstract: Systems and methods for determining beam asymmetry in a radiation treatment system using electronic portal imaging devices (EPIDs) without implementation of elaborate and complex EPID calibration procedures. The beam asymmetry is determined based on radiation scattered from different points in the radiation beam and measured with the same region of interest ROI of the EPID.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: June 16, 2020
    Assignee: VARIAN MEDICAL SYSTEMS INTERNATIONAL AG
    Inventors: Reto Ansorge, Mathias Lehmann, Stefan J. Thieme-Marti
  • Patent number: 10665423
    Abstract: An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.
    Type: Grant
    Filed: June 15, 2016
    Date of Patent: May 26, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Dirk Preikszas
  • Patent number: 10649102
    Abstract: Apparatus and method for analyzing an electron beam including a circular sensor disk adapted to receive the electron beam, an inner semi-circular slit in the circular sensor disk; an outer semi-circular slit in the circular sensor disk wherein the outer semi-circular slit is spaced from the first semi-circular slit by a fixed distance; a system for sweeping the electron beam radially outward from the central axis to the inner semi-circular slit and outer second semi-circular slit; a sensor structure operatively connected to the circular sensor disk wherein the sensor structure receives the electron beam when it passes over the inner semi-circular slit and the outer semi-circular slit; and a device for measuring the electron beam that is intercepted by the inner semi-circular slit and the outer semi-circular slit.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: May 12, 2020
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: John W. Elmer, Alan T. Teruya
  • Patent number: 10643819
    Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: May 5, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
  • Patent number: 10622183
    Abstract: The present invention relates to a charged particle beam apparatus enabling a selection of a charged particle beam in a specified energy range by symmetrically arranging cylindrical electrostatic lenses deflecting a path of the charged particle beam and disposing an energy selection aperture between the cylindrical electrostatic lenses. Since an integral structure in which a central electrode and a plurality of electrodes that are arranged at a front portion and a rear portion in relation to the central electrode of a monochromator are fixed to each other through insulator, is applied, a mechanism for adjusting an offset with respect to an optical axis is simplified as compared to the case of separately providing the lenses at the front portion and the rear portion, respectively, and a secondary aberration is canceled in an exit plane due to symmetry of an optical system.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: April 14, 2020
    Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Takashi Ogawa, Ju Hwang Kim, In Yong Park
  • Patent number: 10614999
    Abstract: A method which can generate a clear image of a specimen by correcting an image drift is disclosed. The image generation method includes: scanning a specimen with an electron beam to generate images; calculating amounts of image drift within specific regions of the respective images; calculating continuous amounts of image drift by interpolation from the amounts of image drift; determining an amount of image drift at each pixel of the images from the continuous amounts of image drift; correcting the images by correcting a brightness of each pixel based on the amount of image drift at each pixel; and generating a synthetic image from the corrected images.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: April 7, 2020
    Assignee: TASMIT, INC.
    Inventor: Shinichi Nakazawa
  • Patent number: 10614991
    Abstract: The present invention relates to an electron beam apparatus including a monochromator in which cylindrical electrostatic lenses for deflecting a path of an electron beam in the lenses are arranged symmetrically and an aperture including a plurality of selectable slits is disposed therebetween to be able to select an electron beam having a specified energy range. The electron beam apparatus has a monochromator having high resolution and excellent stability and maintainability by disposing slits and circular openings in one aperture part in parallel arrangement, thereby improving spatial resolution and energy resolution.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: April 7, 2020
    Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Takashi Ogawa, Ju Hwang Kim
  • Patent number: 10607803
    Abstract: An electron microscope includes an electron source, an extraction electrode that extracts an electron beam emitted from the electron source, a monochromator having an energy filter that disperses the electron beam emitted from the electron source based on an energy thereof and an energy selection slit that selects the energy of the electron beam, an incident-side electrode provided between the extraction electrode and the monochromator, and an incident-side electrode controller that controls the incident-side electrode based on a change in a voltage applied to the extraction electrode.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: March 31, 2020
    Assignee: JEOL Ltd.
    Inventor: Masaki Mukai
  • Patent number: 10607807
    Abstract: An electron spectroscopy system and method are disclosed. In another aspect, an ultrabright and ultrafast angle-resolved electron spectroscopy system is provided. A further aspect of the present system employs an electron gun, a radio frequency cavity and multiple spectrometers. Yet another aspect uses spectrometers in an aligned manner to deflect and focus electrons emitted by the electron gun. Moreover, an ultrafast laser is coupled to an electron spectroscopy system. A bunch of monochromatic electrons have their energy compressed and reoriented in an additional aspect of the present system. A further aspect of the present electron spectroscopy system employs adaptive and/or adjustable optics to optimize both time and energy compression. Another aspect provides at least two RF lenses or cavities, one before a specimen and one after the specimen.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: March 31, 2020
    Assignee: Board of Trustees of Michigan State University
    Inventor: Chong-Yu Ruan
  • Patent number: 10593511
    Abstract: A method of determining a local electric field and/or a local magnetic field in a sample and/or the dielectric constant of a material and/or the angle between the input and output surfaces of the sample, comprising illumination of the sample by an electron beam in precession mode using an illumination device, generation of a diffraction pattern, determination of the offset of the disk corresponding to the transmitted beam due to the electric field and/or the magnetic field, by comparison of the diffraction pattern and a reference diffraction pattern, determination of a deflection angle of the transmitted beam, and determination of the value of the local electric field and/or the local magnetic field of the sample and/or determination of the dielectric constant of materials and/or determination of the angle between the input and output surfaces of the sample.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: March 17, 2020
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Benedikt Haas, David Cooper, Jean-Luc Rouviere
  • Patent number: 10580614
    Abstract: Mask-modulated spectra are incident to a sensor and are summed during a frame time. After the frame time, a compressed spectrum is read out based on the sum and decompressed to obtain spectra for some or all specimen locations. The mask-modulated spectrum that are summed are associated with different modulations produced by a common mask.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: March 3, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Andrew J. Stevens, Libor Kovarik, Nigel D. Browning
  • Patent number: 10546714
    Abstract: There is provided an energy filter capable of being simplified in structure and of achieving low aberrations. The energy filter (100) includes a first sector magnet (10) and a second sector magnet (20). The first and second magnets (10, 20) are configured mirror-symmetrically with respect to a symmetry plane (M). There are one focal point of crossover in the X direction and one focal point of crossover in the Y direction. The focal point of crossover in the X direction and the focal point of crossover in the Y direction are at an energy dispersive plane (S2). There are two focal points of image in the X direction and two focal points of image in the Y direction. The focal points of image in the X direction and the focal points of image in the Y direction are at the symmetry plane (M) and at an achromatic plane (A2).
    Type: Grant
    Filed: February 7, 2018
    Date of Patent: January 28, 2020
    Assignee: JEOL Ltd.
    Inventor: Kazuya Omoto
  • Patent number: 10534107
    Abstract: A method may include measuring a formation sample using a Raman spectrometer to determine a formation sample characteristic, wherein the formation sample characteristic is mineral ID and distribution, carbon ID and distribution, thermal maturity, rock texture, fossil characterization, or combinations thereof.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: January 14, 2020
    Assignee: GAS SENSING TECHNOLOGY CORP.
    Inventor: Grant A. Myers
  • Patent number: 10522323
    Abstract: Adjustable resolution electron energy loss spectroscopy methods and apparatus are disclosed herein. An example method includes operating an electron microscope in a first state, the first state including operating a source of the electron microscope at a first temperature, obtaining, by the electron microscope, a first EELS spectrum of a sample at a first resolution, the first resolution based on the first temperature, operating the electron microscope in a second state, the second state including operating the source of the electron microscope at a second temperature, the second temperature different than the first temperature, and obtaining, by the electron microscope, a second EELS spectrum of the sample at a second resolution, the second resolution based on the second temperature, wherein the second resolution is different than the first resolution.
    Type: Grant
    Filed: April 5, 2018
    Date of Patent: December 31, 2019
    Assignee: FEI Company
    Inventor: Peter Christiaan Tiemeijer
  • Patent number: 10515778
    Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: December 24, 2019
    Assignee: NGR INC.
    Inventors: Sumio Sasaki, Susumu Takashima, Makoto Kato, Kazufumi Kubota, Yukihiro Tanaka, Yuichiro Yamazaki
  • Patent number: 10473460
    Abstract: An overlay metrology system includes a particle-beam metrology tool to scan a particle beam across an overlay target on a sample including a first-layer target element and a second-layer target element. The overlay metrology system may further include a controller to receive a scan signal from the particle-beam metrology tool, determine symmetry measurements for the scan signal with respect to symmetry metrics, and generate an overlay measurement between the first layer and the second layer based on the symmetry measurements in which an asymmetry of the scan signal is indicative of a misalignment of the second-layer target element with respect to the first-layer target element and a value of the overlay measurement is based on the symmetry measurements.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: November 12, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Nadav Gutman, Eran Amit, Stefan Eyring, Hari Pathangi, Frank Laske, Ulrich Pohlmann, Thomas Heidrich
  • Patent number: 10436580
    Abstract: A surface measurement system is configured to measure a sample with a low reflectivity surface. The surface measurement system includes a condensation device and a measurement device. The condensation device is configured to form a liquid layer on the surface of the sample. The condensation device includes a chamber, a temperature controlling gas source, and a humidification gas source. The chamber is configured to accommodate the sample. The temperature controlling gas source is connected to the chamber to provide temperature controlling gases to the chamber, so as to control the temperature of the sample. The humidification gas source is connected to the chamber to provide water vapor to the chamber, so as to form the liquid layer on the surface of the sample. The measurement device includes a plate, a light source, and an image capturing device.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: October 8, 2019
    Assignee: CHROMA ATE INC.
    Inventors: Yi-Chang Chiu, Cheng-Ting Tsai, Shih-Yao Pan, Lan-Sheng Yang, Hsiu-Wei Kuo, Shao-En Chung
  • Patent number: 10431420
    Abstract: A method of operating a Post Column Filter (PCF) in a Scanning/Transmission Electron Microscope, and a Post Column Filter configured to operate according to the method. In an embodiment, the method includes receiving, at an entrance plane, an incoming beam of electrons; dispersing, by an energy dispersive element, the incoming beam of electrons into an energy dispersed beam of electrons; disposing a first plurality of quadrupoles between the entrance plane and a slit plane; operating the PCF in an EELS mode; and operating the PCF in an EFTEM mode. Operating the PCF in an EELS mode includes exciting one or more quadrupoles of the first plurality of quadrupoles at a first excitation level, wherein the first excitation level does not enlarge the energy dispersion of the energy dispersed beam of electrons; and forming an image of the energy dispersed beam of electrons on the image plane, the image being an EELS spectrum.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: October 1, 2019
    Assignee: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer
  • Patent number: 10366862
    Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: July 30, 2019
    Assignee: KLA-Tencor Corporaton
    Inventors: Doug K. Masnaghetti, Richard R. Simmons, Mark A. McCord, Rainer Knippelmeyer
  • Patent number: 10319578
    Abstract: A retarding potential type energy analyzer including a front grid electrode, reference grid electrode and rear grid electrode sequentially arranged, with a predetermined amount of potential difference given between the reference grid electrode and the front grid electrode to form an upward potential gradient as well as a potential difference given between the reference grid electrode and the rear grid electrode to form a downward potential gradient, the grid electrodes are arranged so that the distance between the reference grid electrode and the rear grid electrode is shorter than the distance between the reference grid electrode and the front grid electrode, or the potential difference between the reference grid electrode and the rear grid electrode is made to be greater than the potential difference between the reference grid electrode and the front grid electrode.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: June 11, 2019
    Assignee: JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE
    Inventors: Takayuki Muro, Tomohiro Matsushita
  • Patent number: 10281415
    Abstract: A pattern inspection method includes: scanning an inspection substrate, to be inspected, to detect a secondary electron group emitted from the inspection substrate due to irradiation with the multiple beams; correcting individually distortion of a first region image obtained from a detection signal of secondary electrons corresponding to a corresponding first region for each beam of the multiple beams; correcting distortion of a corresponding second region image corresponding to a second region larger than the first region for each of the second region images, using data of each of the first region images in which the distortion of the corresponding first region image has been corrected; and comparing an inspection image to be inspected, in which the distortion of each of the plurality of second region images has been corrected, with a reference image of a same region to output a result thereof.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: May 7, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Takafumi Inoue, Nobutaka Kikuiri
  • Patent number: 10262830
    Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: April 16, 2019
    Assignee: HITACHI, LTD.
    Inventors: Daisuke Bizen, Hideo Morishita, Michio Hatano, Hiroya Ohta
  • Patent number: 10256068
    Abstract: A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: April 9, 2019
    Assignee: HITACHI, LTD.
    Inventors: Momoyo Enyama, Yasuhiro Shirasaki, Natsuki Tsuno
  • Patent number: 10176968
    Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: January 8, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kunji Shigeto, Mitsugu Sato, Tsutomu Saito, Kohtaro Hosoya, Yoshihiro Takahoko, Tohru Ando
  • Patent number: 10141167
    Abstract: An ion sensor comprises an electron repelling electrode to be placed at a negative electric potential, and an ion repelling electrode to be placed at a variable positive electric potential. The electron repelling electrode is formed by a diaphragm element having a diaphragm opening for the passage of an ion beam. The ion repelling electrode forms a blind hole which faces the diaphragm opening with its open hole end and the hole surface of which forms a collector face for detecting impinging ions. With such an ion sensor it is possible, for example, to test the energy spectrum of the ions contained in an exhaust plasma plume of an ion thruster.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: November 27, 2018
    Assignee: Airbus DS GmbH
    Inventors: Franz Georg Hey, Christopher Groll
  • Patent number: 10083814
    Abstract: An electron microscope includes a secondary electron detector (51) which detects an electron generated when a sample (70) is illuminated with an electron beam from an electron gun (1), a monitor (39) which displays a secondary electron image of the sample based on an output of the detector, a gas inlet device (60) which emits gas to the sample, and a gas control device (81) which controls a gas emitting amount of the gas inlet device so that a degree of vacuum in an intermediate chamber (74) in which the secondary electron detector is installed may be kept at less than a set value P1 during gas emission performed by the gas inlet device. Accordingly, a microscopic image of the sample in a gas atmosphere with use of the detector requiring application of voltage is obtained.
    Type: Grant
    Filed: March 20, 2014
    Date of Patent: September 25, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Isao Nagaoki, Toshiyuki Oyagi, Hiroaki Matsumoto, Kiyotaka Nakano, Takeshi Sato, Yasuhira Nagakubo
  • Patent number: 10033910
    Abstract: The present approach relates to the synchronization of frame acquisition by a camera with an external event or trigger despite the camera lacking external control or synchronization capabilities. For example, inexpensive and/or consumer grade camera typically lack a control interface to explicitly synchronize with an external trigger event or external device. The present approach allows synchronization of such a camera lacking external synchronization capabilities with an external event or device.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: July 24, 2018
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: Ralf Lenigk, Mark Marshall Meyers, Victor Petrovich Ostroverkhov, Timothy Toepfer, Keith Michael Looney
  • Patent number: 9991088
    Abstract: An aberration corrector includes a mirror that corrects an aberration of a charged particle beam, a beam separator, and a bypass optical system in the beam separator. The beam separator includes an entrance of the charged particle beam and an exit from which the charged particle beam is emitted to an objective lens, and separates an incident trajectory from the entrance to the mirror and a reflection trajectory from the mirror to the exit from each other by deflecting the charged particle beam in an ON state. The bypass optical system is disposed at a position at which the trajectory of the charged particle beam bypasses when the beam separator is in the ON state, and the trajectory of the charged particle beam passes when the beam separator is in an OFF state, and controls the charged particle beam so that objective lens optical conditions in a trajectory via the mirror and a trajectory passing through the bypass optical system coincide with each other.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 5, 2018
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiro Shirasaki, Momoyo Enyama, Hiroya Ohta
  • Patent number: 9978561
    Abstract: The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: May 22, 2018
    Assignee: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer
  • Patent number: 9978579
    Abstract: The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample, e.g. a parameter related to the energies, the start directions, the start positions or the spin of the particles. The method comprises the steps of guiding a beam of charged particles into an entrance of a measurement region by means of a lens system, and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises the steps of deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance of the measurement region can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 22, 2018
    Assignee: SCIENTA OMICRON AB
    Inventor: Björn Wannberg
  • Patent number: 9966219
    Abstract: An electron energy loss spectrometer for electron microscopy is disclosed having an electrically isolated drift tube extending through the bending magnet and through subsequent optics that focus and magnify the spectrum. An electrostatic or magnetic lens is located either before or after or both before and after the drift tube and the lens or lenses are adjusted as a function of the bending magnet drift tube voltage to maintain a constant net focal length and to avoid defocusing. An energy selecting slit is included in certain embodiments to cleanly cut off electrons dispersed outside the energy range incident on the detector, thereby eliminating artifacts caused by unwanted electrons scattering back into the spectrum.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: May 8, 2018
    Assignee: GATAN, INC.
    Inventors: Alexander Jozef Gubbens, Colin Trevor, Ray Dudley Twesten, Melanie Barfels
  • Patent number: 9952166
    Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: April 24, 2018
    Assignee: Nova Measuring Instruments Inc.
    Inventors: Heath A. Pois, Wei Ti Lee
  • Patent number: 9928989
    Abstract: The method is for automatic astigmatism correction of a lens system. A first image of a first frequency spectrum in a microscope is provided. The first image of a view is not in focus. The first image is then imaged. A first roundness measure of a distribution and directions of intensities in the first image is determined. The lens is changed to a second stigmator setting to provide a second image of a second frequency spectrum. The second image of the view is not in focus. The second image is the same view as the first image of the view at the first stigmator setting. A second roundness measure of a distribution and directions of intensities in the second image is determined. The first roundness measure is compared with the second roundness measure. The image with the roundness measure indicating the roundest distribution is selected.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: March 27, 2018
    Assignee: INTELLIGENT VIRUS IMAGING INC.
    Inventors: Ida-Maria Sintorn, Rickard Nordstrom, Gustaf Kylberg
  • Patent number: 9910066
    Abstract: Aspects of the present invention include systems, devices, and methods of surface chemical analysis of solid samples, and particularly it relates to methods of chemical analysis of molecular compounds located either on or within thin surface layer of solid samples. Even more particularly, aspects of the present invention relate to systems, devices, and non-destructive methods combining both high sensitivity and high spatial resolution of analysis of chemical compounds located or distributed on the surface of solid samples with obtaining most important information regarding vibration spectra of atoms and molecular groups contained in thin surface layer of solid samples. These objectives are realized by implementation of computer-assisted systems that carefully regulate the motion of, and force applied to probes of atomic force microscopes.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: March 6, 2018
    Assignee: HORIBA INSTRUMENTS, INC.
    Inventors: Sergey A. Saunin, Andrey V. Krayev, Vladimir V. Zhishimontov, Vasily V. Gavrilyuk, Leonid N. Grigorov, Alexey V. Belyaev, Dmitry A. Evplov
  • Patent number: 9895691
    Abstract: According to one embodiment, an analysis package, including a board, an analysis chip provided on the board, the chip including a detector for detecting a particle, a flow channel of a sample liquid, and a liquid receiver of the sample liquid, a first mold layer provided on the analysis chip, the first mold layer including an opening above the liquid receiver, and a second mold layer provided on the board and the first mold layer, the second mold layer including an opening above the opening of the first mold layer, wherein the respective openings of the first and second mold layers are connected above the liquid receiver to allow the sample liquid to be introduced into the liquid receiver from outside.
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: February 20, 2018
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hiroshi Hamasaki, Michihiko Nishigaki, Yutaka Onozuka, Kentaro Kobayashi, Hiroko Miki, Naofumi Nakamura
  • Patent number: 9892979
    Abstract: A semiconductor device or article includes a substrate including a feature and divided into a feature region in which the feature is formed and a pad region in which the substrate is substantially unmodified, and a layer of interest applied over the substrate and feature. The pad and feature regions are irradiated and resulting photoelectron intensities are recorded and used to determine a thickness of the layer of interest over the feature. In addition, if the layer of interest includes an atomic species distinct from any in the substrate, an actual dose of the atomic species can be determined.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: February 13, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Kriteshwar K. Kohli, Sean M. Polvino
  • Patent number: 9874532
    Abstract: A scatter diagram display device includes a principal component analysis section that performs principal component analysis on intensity or concentration map data that represents each element, a priority level setting section that sets a priority level to each element based on the results of the principal component analysis performed by the principal component analysis section, and a display control section that performs a control process that arranges a plurality of scatter diagrams generated by combining each element based on the priority level that has been set to each element by the priority level setting section, and displays the plurality of scatter diagrams on a display section.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: January 23, 2018
    Assignee: JEOL Ltd.
    Inventors: Norihisa Mori, Masaru Takakura, Shinya Fujita, Shigeru Honda, Naoki Kato, Shuichi Sakamoto
  • Patent number: 9859091
    Abstract: An automatic method is provided to align a semiconductor crystalline substrate for electron channeling contrast imaging (ECCI) in regions where an electron channeling pattern cannot be reliably obtained but crystalline defects need to be imaged. The automatic semiconductor crystalline substrate alignment method is more reproducible and faster than the current operator intensive process for ECCI alignment routines. Also, the automatic semiconductor crystalline substrate alignment method increases the throughput of ECCI.
    Type: Grant
    Filed: June 20, 2016
    Date of Patent: January 2, 2018
    Assignee: International Business Machines Corporation
    Inventors: Stephen W. Bedell, Kunal Mukherjee, John A. Ott, Devendra K. Sadana, Brent A. Wacaser
  • Patent number: 9818573
    Abstract: The present invention is related to an apparatus for transporting a charged particle beam. The apparatus may include means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning and means for adjusting the field strength of said at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.
    Type: Grant
    Filed: January 12, 2015
    Date of Patent: November 14, 2017
    Assignee: ION BEAM APPLICATIONS S.A.
    Inventors: Michel Abs, Szymon Zaremba, Willem Kleeven
  • Patent number: 9778377
    Abstract: A Transmission Charged-Particle Microscope comprises a source of charged particles which are then directed by an illuminator onto a specimen supported by a specimen holder. Charged particles transmitted through the specimen may undergo energy loss with a distribution of losses providing information about the specimen. A dispersing device disperses the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: October 3, 2017
    Assignee: FEI Company
    Inventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
  • Patent number: 9767984
    Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: September 19, 2017
    Inventors: Kevin Kagarice, Charles Otis, N. William Parker
  • Patent number: 9741533
    Abstract: Provided is an image type electron spin polarimeter. It at least comprises a scattering target, a two-dimensional electron detector and an electron bending unit, wherein the electron bending unit is used for bending the orbit of the incident (scattered) electrons to a first (second) angle to arrive the scattering target (two-dimensional electron detector) with an optimal incident angle, and to transfer the image of the electron intensities from the entrance plane (scattering target) to the scattering target (two-dimensional electron detector) with small aberrations, and to separate the orbits of incident and scattered electrons to increase the degree of freedom of the geometric configuration of each component of the spin polarimeter.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: August 22, 2017
    Assignee: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES
    Inventors: Shan Qiao, Weishi Wan, Fuhao Ji
  • Patent number: 9714850
    Abstract: An information processing device includes a storage section 50 that stores a history relating to the acquisition of measurement data, a history relating to an analysis position within an analyzer, and a history relating to a predetermined operation performed on a specimen using the analyzer as log information linked to time information, and a display control section 22 that performs a control process that displays these histories within a log display area on a display screen 40 in time series based on the log information, the display control section 22 performing a control process that displays a measurement result image generated based on the measurement data on the display screen, and, when an operation input that selects one measurement result image, performing a control process that displays a history that corresponds to the measurement data used to generate the selected measurement result image.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: July 25, 2017
    Assignee: JEOL Ltd.
    Inventor: Kazushiro Yokouchi
  • Patent number: 9696435
    Abstract: There is disclosed a hybrid arrangement of more than one electron energy conversion mechanism in a detector arranged physically such that the electron image can be acquired from both energy converters in such a manner that selected high-illumination parts of the image can be imaged with an indirectly coupled scintillator detector and the remainder of the image acquired with the high-sensitivity/direct electron portion of the detector without readjustments in the beam position or mechanical positioning of the detector parts. Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: July 4, 2017
    Assignee: GATAN, INC.
    Inventors: Alexander Jozef Gubbens, Paul Mooney, Matthew Lent
  • Patent number: 9679740
    Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: June 13, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Wen Li, Ryo Kadoi, Kazuki Ikeda, Hiroyuki Takahashi, Hajime Kawano
  • Patent number: 9653255
    Abstract: The disclosure provides a scanning particle beam microscope for inspecting an object. The scanning particle beam microscope includes a particle optical system having an objective lens. The microscope further includes a detector system having a particle optical detector component configured to generate an electrostatic field in the beam path of particles emitted from the object. The detector system is configured to spatially filter the emitted particles after the emitted particles have passed through the electrostatic field and to detect a portion of the filtered emitted particles. The particle optical detector component is configured such that the spatial filtering filters the emitted particles according to a kinetic energy of the emitted particles.
    Type: Grant
    Filed: April 14, 2014
    Date of Patent: May 16, 2017
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Stefan Schubert
  • Patent number: 9640358
    Abstract: A radiation window foil is provided for an X-ray radiation window. It includes a continuous window layer with a first side and a second side. A first mesh or grid layer is stacked on or bonded to the first side of the continuous window layer. A second mesh or grid layer is stacked on or bonded to the second side of the continuous window layer.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: May 2, 2017
    Assignee: HS FOILS OY
    Inventors: Esa Kostamo, Jari Kostamo, Pasi Kostamo, Marco Mattila, Pekka Torma, Heikki Sipila
  • Patent number: 9594035
    Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: March 14, 2017
    Assignee: ReVera, Incorporated
    Inventors: Heath A. Pois, Wei Ti Lee
  • Patent number: 9564307
    Abstract: A charged particle analyzer apparatus comprising two opposing ion mirrors each mirror comprising inner and outer field-defining electrode systems elongated along an axis z, the outer system surrounding the inner, whereby when the electrode systems are electrically biased the mirrors create an electrical field comprising opposing electrical fields along z; and at least one arcuate focusing lens for constraining the arcuate divergence of a beam of charged particles within the analyzer while the beam orbits around the axis z, the analyzer further comprising a disc having two faces at least partly spanning the space between the inner and outer field defining electrode systems and lying in a plane perpendicular to the axis z, the disc having resistive coating upon both faces. A mass spectrometer system comprising a plurality of the charged particle analyzers arranged as a parallel array.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: February 7, 2017
    Assignee: Thermo Fisher Scientific (Bremen) GmbH
    Inventor: Alexander A. Makarov