Abstract: Adjustable resolution electron energy loss spectroscopy methods and apparatus are disclosed herein. An example method includes operating an electron microscope in a first state, the first state including operating a source of the electron microscope at a first temperature, obtaining, by the electron microscope, a first EELS spectrum of a sample at a first resolution, the first resolution based on the first temperature, operating the electron microscope in a second state, the second state including operating the source of the electron microscope at a second temperature, the second temperature different than the first temperature, and obtaining, by the electron microscope, a second EELS spectrum of the sample at a second resolution, the second resolution based on the second temperature, wherein the second resolution is different than the first resolution.

Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.

Abstract: An overlay metrology system includes a particle-beam metrology tool to scan a particle beam across an overlay target on a sample including a first-layer target element and a second-layer target element. The overlay metrology system may further include a controller to receive a scan signal from the particle-beam metrology tool, determine symmetry measurements for the scan signal with respect to symmetry metrics, and generate an overlay measurement between the first layer and the second layer based on the symmetry measurements in which an asymmetry of the scan signal is indicative of a misalignment of the second-layer target element with respect to the first-layer target element and a value of the overlay measurement is based on the symmetry measurements.

Abstract: A surface measurement system is configured to measure a sample with a low reflectivity surface. The surface measurement system includes a condensation device and a measurement device. The condensation device is configured to form a liquid layer on the surface of the sample. The condensation device includes a chamber, a temperature controlling gas source, and a humidification gas source. The chamber is configured to accommodate the sample. The temperature controlling gas source is connected to the chamber to provide temperature controlling gases to the chamber, so as to control the temperature of the sample. The humidification gas source is connected to the chamber to provide water vapor to the chamber, so as to form the liquid layer on the surface of the sample. The measurement device includes a plate, a light source, and an image capturing device.

Abstract: A method of operating a Post Column Filter (PCF) in a Scanning/Transmission Electron Microscope, and a Post Column Filter configured to operate according to the method. In an embodiment, the method includes receiving, at an entrance plane, an incoming beam of electrons; dispersing, by an energy dispersive element, the incoming beam of electrons into an energy dispersed beam of electrons; disposing a first plurality of quadrupoles between the entrance plane and a slit plane; operating the PCF in an EELS mode; and operating the PCF in an EFTEM mode. Operating the PCF in an EELS mode includes exciting one or more quadrupoles of the first plurality of quadrupoles at a first excitation level, wherein the first excitation level does not enlarge the energy dispersion of the energy dispersed beam of electrons; and forming an image of the energy dispersed beam of electrons on the image plane, the image being an EELS spectrum.

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

Abstract: A retarding potential type energy analyzer including a front grid electrode, reference grid electrode and rear grid electrode sequentially arranged, with a predetermined amount of potential difference given between the reference grid electrode and the front grid electrode to form an upward potential gradient as well as a potential difference given between the reference grid electrode and the rear grid electrode to form a downward potential gradient, the grid electrodes are arranged so that the distance between the reference grid electrode and the rear grid electrode is shorter than the distance between the reference grid electrode and the front grid electrode, or the potential difference between the reference grid electrode and the rear grid electrode is made to be greater than the potential difference between the reference grid electrode and the front grid electrode.

Abstract: A pattern inspection method includes: scanning an inspection substrate, to be inspected, to detect a secondary electron group emitted from the inspection substrate due to irradiation with the multiple beams; correcting individually distortion of a first region image obtained from a detection signal of secondary electrons corresponding to a corresponding first region for each beam of the multiple beams; correcting distortion of a corresponding second region image corresponding to a second region larger than the first region for each of the second region images, using data of each of the first region images in which the distortion of the corresponding first region image has been corrected; and comparing an inspection image to be inspected, in which the distortion of each of the plurality of second region images has been corrected, with a reference image of a same region to output a result thereof.

Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.

Abstract: A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.

Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images.

Abstract: An ion sensor comprises an electron repelling electrode to be placed at a negative electric potential, and an ion repelling electrode to be placed at a variable positive electric potential. The electron repelling electrode is formed by a diaphragm element having a diaphragm opening for the passage of an ion beam. The ion repelling electrode forms a blind hole which faces the diaphragm opening with its open hole end and the hole surface of which forms a collector face for detecting impinging ions. With such an ion sensor it is possible, for example, to test the energy spectrum of the ions contained in an exhaust plasma plume of an ion thruster.

Abstract: An electron microscope includes a secondary electron detector (51) which detects an electron generated when a sample (70) is illuminated with an electron beam from an electron gun (1), a monitor (39) which displays a secondary electron image of the sample based on an output of the detector, a gas inlet device (60) which emits gas to the sample, and a gas control device (81) which controls a gas emitting amount of the gas inlet device so that a degree of vacuum in an intermediate chamber (74) in which the secondary electron detector is installed may be kept at less than a set value P1 during gas emission performed by the gas inlet device. Accordingly, a microscopic image of the sample in a gas atmosphere with use of the detector requiring application of voltage is obtained.

Abstract: The present approach relates to the synchronization of frame acquisition by a camera with an external event or trigger despite the camera lacking external control or synchronization capabilities. For example, inexpensive and/or consumer grade camera typically lack a control interface to explicitly synchronize with an external trigger event or external device. The present approach allows synchronization of such a camera lacking external synchronization capabilities with an external event or device.

Abstract: An aberration corrector includes a mirror that corrects an aberration of a charged particle beam, a beam separator, and a bypass optical system in the beam separator. The beam separator includes an entrance of the charged particle beam and an exit from which the charged particle beam is emitted to an objective lens, and separates an incident trajectory from the entrance to the mirror and a reflection trajectory from the mirror to the exit from each other by deflecting the charged particle beam in an ON state. The bypass optical system is disposed at a position at which the trajectory of the charged particle beam bypasses when the beam separator is in the ON state, and the trajectory of the charged particle beam passes when the beam separator is in an OFF state, and controls the charged particle beam so that objective lens optical conditions in a trajectory via the mirror and a trajectory passing through the bypass optical system coincide with each other.

Abstract: The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.

Abstract: The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample, e.g. a parameter related to the energies, the start directions, the start positions or the spin of the particles. The method comprises the steps of guiding a beam of charged particles into an entrance of a measurement region by means of a lens system, and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises the steps of deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance of the measurement region can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample.

Abstract: An electron energy loss spectrometer for electron microscopy is disclosed having an electrically isolated drift tube extending through the bending magnet and through subsequent optics that focus and magnify the spectrum. An electrostatic or magnetic lens is located either before or after or both before and after the drift tube and the lens or lenses are adjusted as a function of the bending magnet drift tube voltage to maintain a constant net focal length and to avoid defocusing. An energy selecting slit is included in certain embodiments to cleanly cut off electrons dispersed outside the energy range incident on the detector, thereby eliminating artifacts caused by unwanted electrons scattering back into the spectrum.

Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.

Abstract: The method is for automatic astigmatism correction of a lens system. A first image of a first frequency spectrum in a microscope is provided. The first image of a view is not in focus. The first image is then imaged. A first roundness measure of a distribution and directions of intensities in the first image is determined. The lens is changed to a second stigmator setting to provide a second image of a second frequency spectrum. The second image of the view is not in focus. The second image is the same view as the first image of the view at the first stigmator setting. A second roundness measure of a distribution and directions of intensities in the second image is determined. The first roundness measure is compared with the second roundness measure. The image with the roundness measure indicating the roundest distribution is selected.

Abstract: Aspects of the present invention include systems, devices, and methods of surface chemical analysis of solid samples, and particularly it relates to methods of chemical analysis of molecular compounds located either on or within thin surface layer of solid samples. Even more particularly, aspects of the present invention relate to systems, devices, and non-destructive methods combining both high sensitivity and high spatial resolution of analysis of chemical compounds located or distributed on the surface of solid samples with obtaining most important information regarding vibration spectra of atoms and molecular groups contained in thin surface layer of solid samples. These objectives are realized by implementation of computer-assisted systems that carefully regulate the motion of, and force applied to probes of atomic force microscopes.

Abstract: According to one embodiment, an analysis package, including a board, an analysis chip provided on the board, the chip including a detector for detecting a particle, a flow channel of a sample liquid, and a liquid receiver of the sample liquid, a first mold layer provided on the analysis chip, the first mold layer including an opening above the liquid receiver, and a second mold layer provided on the board and the first mold layer, the second mold layer including an opening above the opening of the first mold layer, wherein the respective openings of the first and second mold layers are connected above the liquid receiver to allow the sample liquid to be introduced into the liquid receiver from outside.

Abstract: A semiconductor device or article includes a substrate including a feature and divided into a feature region in which the feature is formed and a pad region in which the substrate is substantially unmodified, and a layer of interest applied over the substrate and feature. The pad and feature regions are irradiated and resulting photoelectron intensities are recorded and used to determine a thickness of the layer of interest over the feature. In addition, if the layer of interest includes an atomic species distinct from any in the substrate, an actual dose of the atomic species can be determined.

Abstract: A scatter diagram display device includes a principal component analysis section that performs principal component analysis on intensity or concentration map data that represents each element, a priority level setting section that sets a priority level to each element based on the results of the principal component analysis performed by the principal component analysis section, and a display control section that performs a control process that arranges a plurality of scatter diagrams generated by combining each element based on the priority level that has been set to each element by the priority level setting section, and displays the plurality of scatter diagrams on a display section.

Abstract: An automatic method is provided to align a semiconductor crystalline substrate for electron channeling contrast imaging (ECCI) in regions where an electron channeling pattern cannot be reliably obtained but crystalline defects need to be imaged. The automatic semiconductor crystalline substrate alignment method is more reproducible and faster than the current operator intensive process for ECCI alignment routines. Also, the automatic semiconductor crystalline substrate alignment method increases the throughput of ECCI.

Abstract: The present invention is related to an apparatus for transporting a charged particle beam. The apparatus may include means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning and means for adjusting the field strength of said at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

Abstract: A Transmission Charged-Particle Microscope comprises a source of charged particles which are then directed by an illuminator onto a specimen supported by a specimen holder. Charged particles transmitted through the specimen may undergo energy loss with a distribution of losses providing information about the specimen. A dispersing device disperses the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

Abstract: Provided is an image type electron spin polarimeter. It at least comprises a scattering target, a two-dimensional electron detector and an electron bending unit, wherein the electron bending unit is used for bending the orbit of the incident (scattered) electrons to a first (second) angle to arrive the scattering target (two-dimensional electron detector) with an optimal incident angle, and to transfer the image of the electron intensities from the entrance plane (scattering target) to the scattering target (two-dimensional electron detector) with small aberrations, and to separate the orbits of incident and scattered electrons to increase the degree of freedom of the geometric configuration of each component of the spin polarimeter.

Abstract: An information processing device includes a storage section 50 that stores a history relating to the acquisition of measurement data, a history relating to an analysis position within an analyzer, and a history relating to a predetermined operation performed on a specimen using the analyzer as log information linked to time information, and a display control section 22 that performs a control process that displays these histories within a log display area on a display screen 40 in time series based on the log information, the display control section 22 performing a control process that displays a measurement result image generated based on the measurement data on the display screen, and, when an operation input that selects one measurement result image, performing a control process that displays a history that corresponds to the measurement data used to generate the selected measurement result image.

Abstract: There is disclosed a hybrid arrangement of more than one electron energy conversion mechanism in a detector arranged physically such that the electron image can be acquired from both energy converters in such a manner that selected high-illumination parts of the image can be imaged with an indirectly coupled scintillator detector and the remainder of the image acquired with the high-sensitivity/direct electron portion of the detector without readjustments in the beam position or mechanical positioning of the detector parts. Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit.

Abstract: The disclosure provides a scanning particle beam microscope for inspecting an object. The scanning particle beam microscope includes a particle optical system having an objective lens. The microscope further includes a detector system having a particle optical detector component configured to generate an electrostatic field in the beam path of particles emitted from the object. The detector system is configured to spatially filter the emitted particles after the emitted particles have passed through the electrostatic field and to detect a portion of the filtered emitted particles. The particle optical detector component is configured such that the spatial filtering filters the emitted particles according to a kinetic energy of the emitted particles.

Abstract: A radiation window foil is provided for an X-ray radiation window. It includes a continuous window layer with a first side and a second side. A first mesh or grid layer is stacked on or bonded to the first side of the continuous window layer. A second mesh or grid layer is stacked on or bonded to the second side of the continuous window layer.

Abstract: Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.

Abstract: A charged particle analyzer apparatus comprising two opposing ion mirrors each mirror comprising inner and outer field-defining electrode systems elongated along an axis z, the outer system surrounding the inner, whereby when the electrode systems are electrically biased the mirrors create an electrical field comprising opposing electrical fields along z; and at least one arcuate focusing lens for constraining the arcuate divergence of a beam of charged particles within the analyzer while the beam orbits around the axis z, the analyzer further comprising a disc having two faces at least partly spanning the space between the inner and outer field defining electrode systems and lying in a plane perpendicular to the axis z, the disc having resistive coating upon both faces. A mass spectrometer system comprising a plurality of the charged particle analyzers arranged as a parallel array.

Abstract: In a method for manufacturing a radiation window there is produced a layered structure where an etch stop layer exists between a carrier and a solid layer. A blank containing at least a part of each of the carrier, the etch stop layer, and the solid layer is attached to a radiation window frame. At least a part of what of the carrier was contained in the blank is removed, thus leaving a foil attached to the radiation window frame, wherein the foil contains at least a part of each of the etch stop layer and the solid layer.

Abstract: This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

Abstract: The present invention relates to calibration and normalization systems and methods for ensuring the quality of radiopharmaceuticals during the synthesis thereof, such as radiopharmaceuticals used in Positron Emission Tomography (PET) and Single-Photon Emission Computed Tomography (SPECT).

Abstract: Systems and methods for capturing image data using a line scan camera. In an embodiment, a line scan camera captures image data of a sample as a plurality of image stripes. A processor may coarsely align two or more of the plurality of image stripes according to a synchronization process while the line scan camera is capturing at least one of the plurality of image stripes. Subsequently, the processor may also finely align the two or more image stripes using pattern matching.

Abstract: A spin device includes: a first condenser lens which focuses a spin polarized electron beam discharged from an electron gun or reflected on a sample; a spin rotator which includes a multipole having a point to which the electron beam is focused by the first condenser lens at a lens center or in the vicinity of the lens center and being capable of generating an electric field and a magnetic field; a Wien condition generating means which applies a voltage and a current which satisfy the Wien condition for rotating spin of the electron beam by a designated angle and making the electron beam advance straightly to the multipole which constitutes the spin rotator; and a second condenser lens which focuses the electron beam whose spin is rotated by the spin rotator.

Abstract: The invention relates to a spin detector arrangement for detecting vector components of a predominating spin vector in a particle beam (T) having a predominating spin orientation of the particles. The spin detector arrangement comprises: a spin rotator (1) having a switchable coil (5), wherein the switchable coil (5) comprises an axial direction and is aligned such that the particle beam (T) passes through the switchable coil (5) along the axial direction; a deflection device (7) connected downstream of the spin rotator (1) and deflecting the path of the particle beam (T) electrostatically by a deflection angle; a spin detector (9) connected downstream of the deflection device (7), allowing the deflection of the vector component of the spin vector predominating in the particle beam (T) perpendicular to the direction of motion of the particle beam (T); and a switching unit (15) connected to the switchable coil (5), allowing switching of the excitation state of the coil (5).

Abstract: One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.

Abstract: The present invention relates to a method for determining at least one parameter related to charged particles emitted from a particle emitting sample. The method comprises guiding a beam of charged particles into an entrance of a measurement region by means of a lens system, and detecting positions of the particles indicative of said at least one parameter within the measurement region. Furthermore, the method comprises deflecting the particle beam at least twice in the same coordinate direction before entrance of the particle beam into the measurement region. Thereby, both the position and the direction of the particle beam at the entrance of the measurement region can be controlled in a way that to some extent eliminates the need for physical manipulation of the sample. This in turn allows the sample to be efficiently cooled such that the energy resolution in energy measurements can be improved.

Abstract: Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.

Abstract: Technologies related to identification of a substance in an optimized manner are provided. A reference group of known materials is identified. Each known material has known values for several classification parameters. The classification parameters comprise at least one of T1, T2, T1?, a relative nuclear susceptibility (RNS) of the substance, and an x-ray linear attenuation coefficient (LAC) of the substance. A measurement sequence is optimized based on at least one of a measurement cost of each of the classification parameters and an initial probability of each of the known materials in the reference group.

Abstract: A method and system are disclosed for improving characteristic peak signals in electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) measurements of crystalline materials. A beam scanning protocol is applied which varies the inclination, azimuthal angle, or a combination thereof of the incident beam while spectroscopic data is acquired. The method and system may be applied to compositional mapping.

Abstract: A spin-filter for detection of angular momentum of electrons, wherein the spin-filter (1) comprises a substrate (10), provided with at least one membrane layer (12) having a first surface (11) and having a plurality of membranes (12n) coated with a magnetic thin-film (14), wherein the membranes (12n) comprises pores (13) having a magnetic thin-film (14) for transmission of electrons.

Abstract: An electron microscope is offered which can facilitate adjusting a monochromator. The electron microscope (100) includes the monochromator (20) having an energy filter (22) for dispersing the beam (EB) according to energy and a slit plate (24) disposed on an energy dispersive plane. The slit plate (24) is provided with plural energy-selecting slits (25) which are different in width taken in a direction where the beam (EB) is dispersed.

Abstract: An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).