Abstract: The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Abstract: The present invention relates to an MCP with sufficient physical strength and high detection efficiency. The MCP has a double cladding structure composed of first cladding glasses each of which has a through hole serving as a channel, and a second cladding glass having a high acid resistance and employing a honeycomb structure. In an entrance end face each first cladding glass has a tapered opening.

Abstract: The present invention relates to a low-resistance MCP with an expanded dynamic range and excellent environment resistance, in comparison with the conventional technology. The MCP has a double structure composed of hollow first cladding glasses whose inner wall surfaces function as channel walls, and a second cladding glass having a resistivity lower than that of the first cladding glasses.

Abstract: Embodiments of the invention relate to electron microscopy. Example embodiments relate to an apparatus including a first electron beam source, a second electron beam source, and a receiving unit. The first electron beam source is configured to provide a first low-voltage electron beam to a surface of a sample. The second electron beam source is configured to provide a second low-voltage electron beam to pass through the sample. The receiving unit is configured to analyze the first low-voltage electron beam, or the second low-voltage electron beam, or both the first and the second electron beam to obtain information about the sample.

Abstract: Methods for processing a vessel, for example to provide a gas barrier or lubricity, are disclosed. First and second PECVD or other vessel processing stations or devices and a vessel holder comprising a vessel port are provided. An opening of the vessel can be seated on the vessel port. The interior surface of the seated vessel can be processed via the vessel port by the first and second processing stations or devices. Vessel barrier, lubricity and hydrophobic coatings and coated vessels, for example syringes and medical sample collection tubes are disclosed.

Abstract: A transport of plasmonic particles through a mineral formation is analyzed by flowing a plasmonic particles solution through an immobile phase (e.g., a mineral formation), determining an absorbance of the plasmonic particles solution subsequent to flowing the plasmonic particles solution through the immobile phase, comparing the determined absorbance of the plasmonic particles solution with an absorbance of the plasmonic particles solution determined previous to flowing the plasmonic particles solution through the immobile phase, and determining an absorbance of the plasmonic particles to the immobile phase as a function of the comparison. The plasmonic particles solution may be produced by dissolving or suspending plasmonic particles in a mobile phase. Flowing the plasmonic particles solution through the immobile phase may include injecting the plasmonic particles solution into the immobile phase, and then flushing the plasmonic particles solution through the immobile phase.

Abstract: A method for measuring the population of atoms in a vapor cell comprises collecting a sample of atoms, applying radio frequency (RF) spectroscopy to the sample such that a first portion of the atoms are in an upper ground state and a second portion of the atoms are in a lower ground state, and applying light to the sample to produce a first fluorescence such that all atoms are left in the lower ground state. The method further comprises measuring a population of the atoms in the upper ground state based on the first fluorescence, applying an RF pulse to the sample to transfer the atoms in the lower ground state to the upper ground state, and applying light to the sample after the RF pulse is applied to produce a second fluorescence. A population of all the atoms in the sample is then measured based on the second fluorescence.

Abstract: A method of obtaining an elemental concentration profile of a sample using x-ray photon spectroscopy measurements is described. Each measurement relates to a different depth in the sample. The sample is shaped to provide access to different depths thereof. Measurements are obtained at respective positions on a bevelled surface exposing material at each of the depths. The method involves fitting the measurements to a mathematical function, dividing the function into a plurality of equal depth wise slices, determining the elemental concentration for the slice corresponding to the thinnest part of the bevel, and then iteratively determining the contribution of each successive slice to the intensity value as being the intensity value measured for that slice minus the intensity value determined to have been contributed by each preceding slice. According to preferred embodiments, a surface correction factor compensating surface effect phenomena is applied to the concentration value calculated for each slice.

Abstract: A method and system are disclosed for improving characteristic peak signals in electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) measurements of crystalline materials. A beam scanning protocol is applied which varies the inclination, azimuthal angle, or a combination thereof of the incident beam while spectroscopic data is acquired. The method and system may be applied to compositional mapping.

Abstract: The present invention concerns an imaging energy filter for electrically charged particles with a toroidal energy analyzer, preferably with a hemispherical analyzer, with an entrance plane and an exit plane. To provide an imaging energy filter and a spectroscope having such an imaging energy filter, which has a higher degree of position and angle resolution and which can be operated with a greater acceptance angle, it is proposed according to the invention that a mirror element for electrically charged particles is provided and is so arranged that charged particles which leave the toroidal energy analyzer by way of the exit plane are reflected back into the toroidal energy analyzer by the mirror element so that the charged particles pass through the toroidal energy analyzer a further time in the opposite travel direction.

Abstract: A method utilizing characteristic x-ray emission from a single thin film or multilayer thin film when an electron beam impinges at a grazing angle with respect to the surface of the sample to capture structural and physical properties of the layers such as layer thickness, interfacial roughness, and stoichiometry of the sample.

Abstract: The present invention relates to a novel system and method for the determination of depth profiling with improved accuracy and reliability. The method comprises obtaining spectroscopic data from the sample while under at least two different electrical conditions of the sample, the spectroscopic data comprising a signal of charged particles emitted from the sample, and being indicative of a change in amplitude, spectral position and spectral shape of the signal from the sample while under different electrical conditions of the sample, the change being indicative of the compositional profile and spatial distribution for at least one chemical element in the sample along a direction through the sample.

Abstract: Various embodiments of the present invention provide systems and methods for determining an characteristic of a material. The characteristics may include, but are not limited to, crystallographic and chemical composition characteristics of a material.

Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

Abstract: Described herein is an ion slicer that: a) accelerates an ion beam towards a first electrode comprising an ion entrance slit, where the first electrode blocks a portion of ions with high displacement from the axis of the ion beam, thereby slicing the ion beam; and then b) decelerates the ion beam after it is sliced.

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract: The invention relates to a method for electron diffraction tomography in a Transmission Electron Microscope. Known methods involve using Scanning Transmission Electron Microscope, and use the scanned beam for STEM diffraction. The invention proposes to form the diffraction patterns with a stationary beam with a diameter slightly larger than the crystal, as a result of which a TEM without STEM unit can be used. Finding the crystal is done in TEM mode. Advantages of the method according to the invention are: a TEM without scanning unit can be used, and the diffraction volume is not depending on the orientation of the crystal, as the whole crystal is illuminated while obtaining the diffraction pattern.

Abstract: An electron detecting mechanism having a plate provided with an opening permitting passage of the primary beam, an energy filter, a first light detector, and a second light detector. The plate has first and second scintillating surface on its opposite sides. The first scintillating surface faces a sample. The second scintillating surface faces the energy filter. When the primary beam hits the sample, electrons are produced and some of them impinge as first electrons on the first scintillating surface. Consequently, first scintillation light is produced and detected by the first light detector. At the same time, some of the electrons produced from the sample pass through the opening of the plate, are repelled by the energy filter, and impinge as second electrons on the second scintillating surface. As a result, second scintillation light is produced and detected by the second light detector.

Abstract: Methods for using sub-100V electron beam landing energies for performing circuit edit operations. Circuit edit operations can include imaging for navigation and etching in the presence of a suitable gas. Low landing energies can be obtained by modifying a decelerator system of native FESEM equipment, or by using biasing means near the sample surface for decelerating electrons of the primary beam. At low landing energies near the operating voltage of a semiconductor circuit, voltage contrast effects can be visually seen for enhancing operator navigation. Low landing energies can be used during etching processes for minimizing the interaction volume of the beam and obtaining accurate and localized etching.

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract: The present invention provides a charged particle beam device in which signal electrons (14) are generated from a sample when the sample (11) is irradiated with a primary charged particle beam (3), and then enter different positions of a position-sensitive signal detector (16) in accordance with energy of the signal electrons (14), whereby an energy distribution image of the signal electrons generated from the sample is acquired. Accordingly, it becomes possible to discriminate and select signal electrons having arbitrary energy to thereby obtain an image to which information specific to the arbitrary energy is reflected, and to acquire various characteristic information of the sample.

Abstract: A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

Abstract: Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.

Abstract: In an electron probe microanalyzer (EPMA) and a method of use thereof, even if plural sets of X-ray image data are obtained at different timings from regions between which a positional deviation occurs, processing for obtaining the correlation is performed precisely. The sets of X-ray image data are obtained from the same region of a sample using the EPMA at different timings and stored in memory along with sets of electron image data based on detection of secondary or backscattered electrons arising from the region. The sets of electron image data obtained at the different timings are compared, and the amount of positional deviation is calculated. An operation for extracting a region common to the regions respectively producing the sets of X-ray image data obtained at the different timings is performed on these sets of X-ray image data based on the calculated amount of positional deviation.

Abstract: A quantification method of functional groups in an organic thin layer includes: a) measuring an absolute quantity per unit area of an analysis reference material having functional groups included in a reference organic thin layer by means of MEIS spectroscopy; b) carrying out spectrometry for the same reference organic thin layer as in a) and thereby obtaining peak intensities of the functional groups in the reference organic thin layer; c) carrying out the same spectrometry as in b) for an organic thin layer to be analyzed having the same functional groups and thereby measuring peak intensities of the functional groups with unknown quantity; and d) comparing the peak intensities of the functional groups measured in b) with respect to the absolute quantity of the analysis reference material in a) and thereby determining the absolute quantity per unit area of the functional groups with unknown quantity measured in c).

Abstract: A time-of-flight (TOF) photoemission electron energy analyzer includes a TOF spectrometer for measuring an energy spectrum of a beam of electrons photoemitted from a sample and a 90 degree bend bandpass filter for spatially dispersing and filtering electrons according to energy. An exchange scattering electron spin polarimeter for detecting the spin of electrons includes an entrance aperture for admitting an electron beam, a magnetizable target positionable for receiving the electron beam at an angle relative to a target surface normal vector, a pair of Helmholtz coils positioned about the target for magnetizing the target in a selected direction, and a high-speed multi-channel plate (MCP) detector facing toward the target for receiving electrons reflected from the target surface, the MCP outputting a signal corresponding to the spin dependent intensity and time of electrons' arrivals.

Abstract: The invention relates to a method for determining a performance of a photolithographic mask at an exposure wavelength with the steps of scanning at least one electron beam across at least one portion of the photolithographic mask, measuring signals generated by the at least one electron beam interacting with the at least one portion of the photolithographic mask, and determining the performance of the at least one portion of the photolithographic mask at the exposure wavelength based on the measured signals.

Abstract: The invention provides constructions of an energy analyzer with entrance angles slightly greater than ?/2. The analyzer is capable of collecting electrons in 2? azimuth directions, has a high energy resolution, and a large entrance solid angle. The analyzer is compatible with transmission electron microscopy and other surface analysis techniques.

Abstract: The electron affinity of thick dielectrics, of thickness greater than 10 nanometers, is measured by applying a polarization voltage varying between ?4V and ?40V, for example, and by taking several measuring points to determine a reference value of the photo-emission threshold (ES), applying linear regression to an adjustment straight line (10) linking the measured thresholds (11) to the respective values of the square root of the voltage V.

Abstract: A charged particle energy analyser (10) includes inner and outer cylindrically symmetric electrodes (11,12) arranged coaxially on a longitudinal axis (z-z) of the analyser. A position-sensitive detector (17) has a particle-receiving detection surface located off-axis, at a radial spacing from the longitudinal axis (z-z) less than the radius of the inner electrode (11). Methods of operating the charged particle energy analyser in first and second order focussing modes are described. A position-sensitive detector (17) suitable for use in “parallel analysers” is described (FIGS. 7 and 8).

Abstract: An electron microscope according to the present invention includes a phase plate (510) having a thickness which changes in a radial direction, and adjusts a phase difference caused by a difference in electron beam path due to an effect of a spherical aberration when an electron beam is converged by a lens or an image of the electron beam is formed. Accordingly, the phase difference caused by the difference in electron beam path is adjusted, to thereby improve the coherence, so that a phase contrast image of transmitted electrons can be obtained at a higher resolution.

Abstract: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

Abstract: An X-ray detection system has an electron beam irradiation portion, a diffraction grating, a splitter for distributing the direction of propagation of the diffracted X-rays such that an imaging plane for the diffracted X-rays is assigned to plural positions spaced apart in a direction perpendicular to the direction of energy dispersion of the diffracted X-rays, and image sensors different in energy sensitivity disposed respectively at the positions to which the imaging plane is assigned.

Abstract: Systems and methods for determining doping type and level in semiconducting nanostructures include generating light from a laser source, directing the light on the device via an extended microscope, collecting electrons emitted from the device in an electron analyzer and calculating the doping type and level of the device.

Abstract: Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt.

Abstract: Charged particle energy analysers enabling simultaneous high transmission and energy resolution are described. The analysers have an electrode structure (11) comprising coaxial inner and outer electrodes (14, 15) having inner and outer electrode surfaces (IS, OS) respectively. The inner and outer electrode surfaces are defined, at least in part, by spheroidal surfaces having meridonal planes of symmetry orthogonal to a longitudinal axis of the electrode structure (11). The inner and outer electrode surfaces are generated by rotation, about the longitudinal axis, of arcs of two non-concentric circles having different radii R2 and R1 respectively, R2 being greater than R1. The distance of the outer electrode surface from the longitudinal axis in the respective meridonal plane is R01 and the distance of the inner electrode surface from the longitudinal axis in the respective plane is R02 and R1, R2, R01 and R02 have a defined relationship.

Abstract: A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.

Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.

Abstract: A detector system for a transmission electron microscope includes a first detector for recording a pattern and a second detector for recording a position of a feature of the pattern. The second detector is preferably a position sensitive detector that provides accurate, rapid position information that can be used as feedback to stabilize the position of the pattern on the first detector. In one embodiment, the first detector detects an electron energy loss electron spectrum, and the second detector, positioned behind the first detector and detecting electrons that pass through the first detector, detects the position of the zero-loss peak and adjusts the electron path to stabilize the position of the spectrum on the first detector.

Abstract: One embodiment relates to an apparatus for forming an electron image using electrons with a narrow range of electron energies from an electron beam with a wide range of energies. An electron beam source is configured to generate an electron beam, and condenser lenses collimate the beam into an objective lens configured to illuminate the specimen. The illuminating electrons are scattered by the specimen and form an electron beam with a range of energies that enter a magnetic prism separator. After a 90 degree deflection, the prism separator introduces an angular dispersion that disperses the incoming electron beam according to its energy. A knife-edge plate removes either the high or low energy tail from the propagating beam. An electron lens is configured to focus the electron beam into an electron mirror so that after the reflection, the other energy tail is stopped on the same knife-edge plate.

Abstract: A photoelectron microscope uses the vector potential field as a spatial reference. The microscope can be used with a source of photons to image surface chemistry.

Abstract: Provided is a sample observing method wherein the effect on throughput is minimized, and a pattern profile can be obtained at high accuracy even in a complicated LSI pattern, regardless of the scanning direction of an electron beam. In the sample observing method, the presence or absence of an edge parallel to a scanning direction (707) of an electron beam is judged regarding an edge (708) of a pattern to be observed (S702); if the edge is present, an area in the vicinity of the pattern edge is designated as a local pre-dose area (709) (S703); a local pre-dose of an electron beam is performed, so that the initial charged state is controlled not to return secondary electrons generated by irradiation of an electron beam when an image is captured, to the surface of a sample.

Abstract: A method of obtaining an elemental concentration profile of a sample using x-ray photon spectroscopy measurements is described. Each measurement relates to a different depth in the sample. The sample is shaped to provide access to different depths thereof. Measurements are obtained at respective positions on a bevelled surface exposing material at each of the depths. The method involves fitting the measurements to a mathematical function, dividing the function into a plurality of equal depth wise slices, determining the elemental concentration for the slice corresponding to the thinnest part of the bevel, and then iteratively determining the contribution of each successive slice to the intensity value as being the intensity value measured for that slice minus the intensity value determined to have been contributed by each preceding slice. According to preferred embodiments, a surface correction factor compensating surface effect phenomena is applied to the concentration value calculated for each slice.

Abstract: An electron microscope includes an electron gun for generating an electron beam, an accelerator for accelerating the electron beam to apply the electron beam to a sample, a spectroscope for selecting electrons having a specific energy out of the electron beam transmitted through the sample and losing an energy by an interaction with the sample, and a detector for detecting the electrons of the specific energy selected by the spectroscope and giving a transmission signal or a diffraction signal at a depth of the sample corresponding to a lost energy quantity of the electrons.

Abstract: An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.

Abstract: The present invention concerns an imaging energy filter for electrically charged particles with a toroidal energy analyser, preferably with a hemispherical analyser, with an entrance plane and an exit plane. To provide an imaging energy filter and a spectroscope having such an imaging energy filter, which has a higher degree of position and angle resolution and which can be operated with a greater acceptance angle, it is proposed according to the invention that a mirror element for electrically charged particles is provided and is so arranged that charged particles which leave the toroidal energy analyser by way of the exit plane are reflected back into the toroidal energy analyser by the mirror element so that the charged particles pass through the toroidal energy analyser a further time in the opposite travel direction.

Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.

Abstract: A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array, and extracts a differential signal that represents a difference between the signals that are received from the first position and the signals that are received from the second position.

Abstract: A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

Abstract: This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a double symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually cannot be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management.