Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract: The present invention is related to an apparatus and method for irradiating a product package, comprising a radiation source directing a radiation beam along a beam direction towards said product package, conveying means for transporting said product package past said radiation source along a transport path, and reflecting means located on at least one side of the plane formed by said beam direction and said transport path. By adjusting the distance and angle of the reflecting means to the conveyor and beam, and improved dose uniformity ratio is obtained.

Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

Abstract: A mass spectrometer detector having a coupling capacitor including an anode that is placed at a high potential of say ?4.9 kV. An annular electrode is placed outside the anode. A voltage of say ?5 kV is applied to the annular electrode. This reduces the potential difference between the anode and the annular electrode, mitigating the electric field. A peripheral electrode is mounted on the outer fringe of a dielectric body and stably held at a potential of say ?2.5 kV, for example, by voltage-dividing resistors.

Abstract: A sample analyzer such as a Rutherford backscattering spectrometer for detecting ions that are elastically scattered by a sample is provided. A spectrum-measuring unit is shifted so that it can be positioned in accordance with a plurality of the scattering directions of the scattered ions in the sample analyzer. For example, the spectrum-measuring unit is shifted in an arc about the irradiation point of the ion beams along a guide rail. Alternatively, a vacuum container is composed of a fixed container holding the sample therein and a movable container hermitically and slidably connected to the fixed container and provided with detection ports. The movable container slides and thus the detection ports are shifted so that the detection ports can be positioned in accordance with the scattering directions. Accordingly, the detection ports, in turn, detection angles are easily changed, whereby a large sample can be analyzed.

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract: Methods and apparatus for determining the material composition of a semiconductor device at an area of interest are described. An electron time-of-flight spectrometer is used within a semiconductor inspection system. The spectrometer is placed on the opposite side of an objective lens from the area of interest. In one embodiment, the electron time-of-flight spectrometer is an electron drift tube. A computing module produces an electron emission spectrum for the materials at the area of interest.

Abstract: Angular electrostatic filters and methods of filtering that remove energy contaminants from a ribbon shaped ion beam are disclosed. An angular electrostatic filter comprises a top deflection plate and a bottom deflection plate extending from an entrance side to an exit side of the filter. The bottom deflection plate is substantially parallel to the top deflection plate and includes an angle portion. An entrance focus electrode is positioned on the entrance side of the filter and an exit focus electrode is positioned on the exit side of the filter and both serve to focus the ion beam. Edge electrodes are positioned between the top and bottom deflection plates and at sides of the filter to mitigate edge effects. A negative bias is also applied to the top and bottom plates to mitigate space charge by elevating the beam energy.

Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

Abstract: One embodiment disclosed relates to a method for robustly detecting a defective high aspect ratio (HAR) feature. A surface area of a semiconductor specimen with HAR features thereon is charged up, and a primary beam is impinged onto the surface area. Scattered electrons that are generated due to the impingement of the primary beam are extracted from the surface area. An energy filter is applied to remove the scattered electrons with lower energies, and the filtered electrons are detected. Image data is generated from the detected electrons, and an intensity threshold is applied to the image data.

Abstract: Backthinning in an area selective manner is applied to imaging sensors 12 for use in electron bombarded devices. A further arrangement results in an array of collimators 51 aligned with pixels 42 or groups of pixels providing improved image contrast of such image sensor. Provision of a thin P-doped layer 52 on the illuminated rear surface provides both a diffusion barrier resulting in improved resolution and a functional shield for reference pixels. A gradient in concentration of P-doped layer 52 optimizes electron collection at the pixel array.

Abstract: An atomic lithography apparatus for depositing atoms included in an atomic beam on a substrate to manufacture an periodic atomic structure, comprising an atomic oven having a pin hole, a collimator for collimating an atom gas effused from the atomic oven to generate an atomic beam, four lasers for irradiating laser beams on the atomic beam to control the spreading angle of the atomic beam, two lasers for forming an optical standing wave at a part of a space in which the atomic beam is propagated, an electro-optic element for controlling the phases of the optical standing wave for controlling the propagation direction of the atomic beam, an electro-optic element drive device for controlling a voltage applied to the electro-optic element to control a refraction index of the electro-optic element, and a control device for controlling the electro-optic element drive device.

Abstract: To provide an atomic force microscopy which allows the measurement of the configuration of a surface being measured by using the phenomenon observed between the surface being measured and a probe approaching thereto at very fine distance. By selecting the material of the tip surface of said probe such that the surface energy of said probe tip becomes less than the interface energy between the tip surface and the surface being measured, thereby the surface configuration of soft body, or soft fouling adhered to the body surface can be measured. A method of measuring the surface configuration and a method of producing magnetic recording medium using the same are also provided.

Abstract: Preparations are made for the transmission image of an object tilted as a reference image and the image obtained by polar coordinate conversion of this transmission image, and correlation is established with the image obtained by polar coordinate conversion of the transmission image of the object in a sample.

Abstract: An energy filter with reduced aberration. The energy filter has a first stage of filter for receiving an electron beam entering along the optical axis and for focusing the beam in one direction vertical to the optical axis and a second stage of filter positioned along the optical axis behind the first stage of filter. The beam once focused by the first stage of filter is made to enter the second stage of filter. In the second stage of filter, the orbit of the electron beam is inverted with respect to the focal point. The two stages of filters are identical in length taken along the optical axis. The first and second stages of filters have electric and magnetic quadrupole fields, respectively, along the optical axis. These quadrupole fields make an angle of 45 degrees to the optical axis to achieve astigmatic focusing.

Abstract: An electron microscopy system and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface and electrons emanating from the sample surface are detected, time resolved. To this end the system comprises in particular a cavity resonator. A cavity resonator can also be used to reduce aberrations of focusing lenses.

Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.

Abstract: The present invention provides an ultimate analyzer which displays an element distribution image of an object with high contrast and high accuracy. A scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer is also provided. The ultimate analyzer comprises a scattered electron beam detector for detecting an electron beam scattered by an object; an electron spectrometer for energy dispersing an electron beam transmitted through the object; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.

Abstract: A scanning transmission electron microscope has an electron beam energy analyzer (energy filter) to observe electron beam energy loss spectra and element distribution images. This electron microscope further includes a deflection coil provided on the upstream side of a magnetic sector to correct for the electron beam path in a plane normal to the optical axis and make the electron beam incident to the energy filter, a deflection coil for correcting for the electron beam path in the energy axis direction of an energy dispersion surface formed by the magnetic sector, and a control unit for controlling the exciting conditions of the deflection coils.

Abstract: A technique employing volume conductive electrodes for the generation of linear or non-linear electric fields is provided for devices used in charged ion optics. A hollow cylinder of a conductive polymer, which is loaded with conductive carbon particles or inherently conductive, and which is used to improve the performance of a dual stage gridless reflectron. Instrumental resolution measurements comparing a conventional discrete ring reflectron with a hybrid polymeric/discrete ring validate the design.

Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using collected spectral data. For example, an acquired spectrum may be cumulatively integrated and the geometric properties of the integrated spectrum may be used to determine component concentration information. Thickness measurements for the film may be provided based on the component concentration information.

Abstract: An optical particle corrector with a straight optical axis for eliminating color and aperture aberrations in optical particle lenses includes multipole elements in the form of electric and/or magnetic quadrupole and octupole elements. There are at least twelve quadrupole elements and ten octupole elements, in which three quadrupole elements and two octupole elements are assembled into a group. These groups are arranged successively along the straight optical axis, in which a first symmetrical plane is defined between the first and second groups, a second symmetrical plane is defined between the second and third groups and a third symmetrical plane is defined between the third and fourth groups. The multipole elements from one group to another correspond to each other in pairs, in which the multipole elements of the corresponding following group are positioned in reverse order along the straight optical axis in comparison with the corresponding multipole elements of the preceding group.

Abstract: A bio electron microscope and an observation method which can observe a bio specimen by low damage and high contrast to perform high-accuracy image analysis, and conduct high-throughput specimen preparation. 1) A specimen is observed at an accelerating voltage 1.2 to 4.2 times a critical electron accelerating voltage possible to transmit a specimen obtained under predetermined conditions. 2) An electron energy filter of small and simplified construction is provided between the specimen and an electron detector for imaging by the electron beam in a specified energy region of the electron beams transmitting the specimen. 3) Similarity between an observed image such as virus or protein in the specimen and a reference image such as known virus or protein is subjected to quantitative analysis by image processing.

Abstract: The present invention relates to a scanning electron microscope employing a deceleration field forming technology (retarding), more particularly a scanning electron microscope which separates and detects secondary electrons at high efficiency. The object of the present invention is accomplished by providing an electron source, a lens for condensing the primary electron beam which is emitted from said electron source, a detector for detecting electrons which are generated by radiation of the primary electron beam onto a specimen, a first deceleration means for decelerating the primary electron beam which is radiated onto said specimen, a second deceleration means for decelerating electrons which are generated on the specimen, and a deflector for deflecting said electrons which are decelerated by said second decelerating means.

Abstract: The invention relates to an electron-optical corrector for eliminating third-order aberrations, such as spherical aberrations, field curvature and off-axis astigmatism; said corrector being devoid of third-order off-axis coma, third-order distortion and first-order chromatic aberration of the first degree. The corrector has a construction which is symmetrical about the central plane in the direction of the linear optical axis. A hexapole S1 of length l1 is first positioned in the direction of the beam path, followed by a circular lens R1, a hexapole S2 of length l2 and subsequently a circular lens R2 which is followed by a third hexapole S3 with the same strength with the same strength of the hexapole S1 and double the length of the latter l3=211.

Abstract: A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip (12); and a sample carrier (58) which supports a sample (10) so that a surface thereto to be analyzed is presented towards the tip (12). The sample carrier (58) and the tip (12) are relative movable to enable the distance between the tip (12) and the surface to be varied in use and the sample surface to be scanned in two dimensions by the tip (12). An electronic analyzer is positioned to detect electrons from the tip (12) which have been back-scattered off the sample surface. A voltage controller (59) enables selective operation of the tip (12) in a first voltage range in scanning tunnelling mode, to enable spatial resolution imaging of the sample surface, and in a second, higher, voltage range in electron field emission mode whereby to permit the electron analyzer to analyze the back-scattered electrons.

Abstract: There are provided an element distribution observing method and an element distribution observing apparatus under utilization of core-loss electrons capable of restricting artifact caused by either a thickness or density of a specimen, or an occurrence of the artifact caused by a diffraction contrast. Electron beam intensities in a total three different energy-loss areas of two energy-loss areas not containing any core-loss electrons and one energy-loss area are calculated to attain an element distribution on the basis of the corresponding three energy-loss areas and an electron beam intensity.

Abstract: The invention relates to a particle beam system comprising a particle source (1), a mirror corrector (9, 21 to 25), and an objective lens (16). The mirror corrector comprises an electrostatic mirror (9) and a magnetic beam deflector (21, 22, 23, 24, 25), which is arranged between the particle source (1) and the electrostatic mirror (9) as well as between the electrostatic mirror (9) and the objective lens (16). The magnetic beam deflector (21, 22, 23, 24, 25) is free from dispersion for each single pass. The magnetic beam deflector (21, 22, 23, 24, 25) also comprises quadrupoles and/or quadrupole components, which are provided in such a manner that a maximum of two planes, which are conjugated with regard to the diffraction plane (28) of the objective lens (16), occur on the entire path length between the first outlet from the magnetic beam deflector (21, 22, 23, 24, 25) and from the objective lens (16).

Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

Abstract: A Wien filter is provided in which a less amount of secondary aberration is produced than conventional. This filter has 12 poles. These poles have front ends facing the optical axis. These front ends have a 12-fold rotational symmetry about the optical axis within the XY-plane perpendicular to the optical axis.

Abstract: One embodiment disclosed relates to an apparatus for substrate inspection and review. The apparatus includes at least a first subsystem, a processor, and a second subsystem. The first subsystem is used for inspecting said substrate. The processor is utilized for identifying regions of said substrate for review. The second subsystem is used for reviewing at least a portion of said identified regions.

Abstract: The invention relates to a raster electron microscope having a specimen chamber and a detector for electrons mounted in the specimen chamber. The raster electron microscope also includes a specimen table having a specimen holder and the specimen table is mounted in the specimen chamber. A diaphragm system is provided on the specimen table and has a diaphragm between the specimen holder and the detector. The diaphragm system is adjustable relative to the specimen holder. The invention can be configured especially as an ancillary module which is accommodated on the specimen table of a conventional raster electron microscope. The system of raster electron microscope and ancillary unit serves for generating special contrastings, especially a dark-field contrast in transmission.

Abstract: In accordance with one embodiment, the disclosure pertains to an apparatus for inspection of substrates. The apparatus includes at least a dual-energy e-beam source, an energy-dependent dispersive device, a beam separator, and an objective lens. The dual-energy e-beam source is configured to generate both a higher-energy e-beam component and a lower-energy e-beam component. Said two components exit the dual-energy e-source co-axially. The energy-dispersive device is configured to introduce dispersion between the two components. The components exit the dispersive device at different angles of trajectory. The beam separator is configured to receive the two dispersed components and substantially cancel the dispersion previously introduced by the dispersive device. As a result, the two components are rejoined in trajectory. Finally, the objective lens configured to focus said two rejoined components onto an area of the substrate.

Abstract: A vacuum window transmitting keV electrons and usable for high-pressure electron analysis such as XPS and AES in which the sample is positioned outside the UHV analyzer chamber, possibly in a controlled gas environment, relatively close to the window. The window includes a grid formed from a support layer and a thin window layer supported between the ribs and having a thickness preferably of 2 to 3 nm. The window and support layers may be deposited on a silicon wafer and the support layer is lithographically defined into the grid. The wafer is backside etched to expose the back of the grid and its supported window layer. Such a window enables compact and easily used electron analyzers and further allows control of the gas environment at the sample surface during analysis.

Abstract: The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using a comparison process (e.g., a fitting process) to compare measured peak shapes for elemental and/or chemical species (e.g., Si peak shapes previously measured for a particular process to be monitored) to collected spectral data (e.g., using a non-linear least squares fitting algorithm).

Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

Abstract: A scanning transmission electron microscope has an electron beam energy analyzer (energy filter) to observe electron beam energy loss spectra and element distribution images. This electron microscope further includes a deflection coil provided on the upstream side of a magnetic prism to correct for the electron beam path in a plane normal to the optical axis and make the electron beam incident to the energy filter, a deflection coil for correcting for the electron beam path in the energy axis direction of an energy dispersion surface formed by the magnetic prism, and a control unit for controlling the exciting conditions of the deflection coils.

Abstract: An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module for controlling energy shift. On receiving instructions about setting of energy shift from the CPU, the control module issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module. The control module also sends information about the energy shift to an energy shift feedback control module, which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module. The feedback value is multiplied by a corrective coefficient that can be calibrated.

Abstract: An electrostatic corrector for eliminating the chromatic aberration of particle lenses, includes a corrector having a straight optical axis and an electrostatic quadrupole for allocating to the objective lens. Two corrector pieces are positioned behind the quadrupole, along the optical axis in the direction of radiation. Each corrector piece has three electrical quadrupole fields with an overlying circular lens field. The quadrupole fields, however, are rotated 90° about the optical axis in relation to each other. This arrangement is adjusted so that the astigmatic first image of one sectional view lies in one corrector piece and the astigmatic first image perpendicular thereto, of the other sectional view, lies in the other corrector piece, with another electrostatic quadrupole being located on the output side.

Abstract: A charged particle analyzer electrode assembly of miniaturized physical size and photolithographic process element fabrication capability. The provided electrode assembly is made of conductive materials including semiconductor materials and metal materials. Individual electrodes in the assembly are made of for example plural layers of semiconductor or metal held in place by discrete insulator layers. Bandpass particle energy selection characteristics are achieved in the analyzer through a combination of analyzer particle path geometry configuration and the particle acceleration electrical potential selection. Selected particles are allowed to pass through the analyzer under these influences and non selected particles are excluded. Assembly of individual analyzer electrode assemblies into a multiple element analyzer array usable for example on an aircraft or spacecraft is included. Both millimeter sized and micrometer sized arrangements of the invention are contemplated.

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer. The present invention exists in an ultimate analyzer comprising a scattered electron beam detector for detecting an electron beam scattered by an object to be analyzed; an electron spectrometer for energy dispersing an electron beam transmitted through the object to be analyzed; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements of the object to be analyzed based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.

Abstract: The present invention pertains to a technique of electron spectroscopic imaging that is easy to perform and cost effective. This technique allows for spatial resolution enhancement of electron beam semiconductor inspection systems (for example a critical dimension scanning electron microscope CD-SEM) as well as to obtain useful physical or chemical information on the investigated specimen. The technique involves a high pass energy filter that is alternately set, or multiplexed, at two energies. For an inspected area on a specimen, the detected intensity level at the higher energy setting is subtracted from the intensity level at the lower energy setting. The obtained differential value corresponds to electrons having energy within the range of the first and second filter settings. This obtained differential value is used to generate an image of the specimen for inspection purposes.

Abstract: Apparatus for analysis of a thin film formed over an underlying layer on a surface of a sample, the thin film including first elements, while the underlying layer includes second elements. The apparatus includes an electron gun, which directs a beam of electrons to impinge on a point on the surface of the sample at which the thin film is formed. An electron detector receives Auger electrons emitted by the first and second elements responsive to the impinging beam of electrons, and to output a signal indicative of a distribution of energies of the emitted electrons. A controller receives the signal and analyzes the distribution of the energies so as to determine a composition of the first elements in the thin film and a thickness of the thin film.

Abstract: An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.

Abstract: The invention relates to an electron/ion gun for electron or ion beams, including a beam source and a monochromator. According to the invention, the monochromator is equipped with an additional beam guidance system and a switchover element which are provided at the input of the monochromator, and which convey the particles coming from the beam source to either the monochromator or the rest of the beam guidance system.

Abstract: An energy filter with reduced aberration. The energy filter has a first stage of filter for receiving an electron beam entering along the optical axis and for focusing the beam in one direction vertical to the optical axis and a second stage of filter positioned along the optical axis behind the first stage of filter. The beam once focused by the first stage of filter is made to enter the second stage of filter. In the second stage of filter, the orbit of the electron beam is inverted with respect to the focal point. The two stages of filters are identical in length taken along the optical axis. The first and second stages of filters have electric and magnetic quadrupole fields, respectively, along the optical axis. These quadrupole fields make an angle of 45 degrees to the optical axis to achieve astigmatic focusing.

Abstract: An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically conductive components of the system downstream from the shield. The surface of the shield lies parallel or approximately parallel to a magnetic equipotential surface of the focusing magnetic field so that the shield does not affect the focusing magnetic field. The shield is, e.g., a ferrite disk or a hollow ferrite cone defining a central bore for passage of the charged particle beam.

Abstract: An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.

Abstract: A substrate holding pallet assembly of the present invention comprises a pallet for holding a substrate on upper face thereof, and a probe laid on said pallet from above so as to hold said substrate between said pallet and said probe. Also, a substrate inspection device of the invention comprises a chamber having an exhauster for exhausting the chamber into a high vacuum state, an electron beam generator for radiating an electron beam to the substrate, and a secondary electron detector for detecting a secondary electron generated from the substrate by radiation of electron beam from the electron beam generator, a pallet for holding the substrate on upper face thereof, and a probe laid on said pallet from above so as to hold said substrate between said pallet and said probe.