Methods Patents (Class 250/307)
  • Patent number: 10020162
    Abstract: There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (?X) relative to the reference axis, the second direction (?X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: July 10, 2018
    Assignee: JEOL Ltd.
    Inventors: Yuko Shimizu, Akira Yasuhara, Kazuya Yamazaki, Fumio Hosokawa
  • Patent number: 10021370
    Abstract: An optical inspector with feedback capability includes an optical device that captures an image when a sample is within the field of view of the optical device, a storage device that stores the captured image, a processor that determines a quality characteristic value of the sample based on the captured image, and an interface circuit that outputs inspection data or a command based on the quality characteristic value. A method of controlling a sample processing line is also disclosed, the method including capturing an image of a sample traversing the processing line, determining a quality characteristic of the sample based at least in part on the captured image, and causing the operation of a device included in the processing line to be adjusted based at least in part on the quality characteristic value. In one example, the optical inspector is an in-flight 3D inspector located in the processing line.
    Type: Grant
    Filed: November 19, 2017
    Date of Patent: July 10, 2018
    Assignee: Qcify Inc.
    Inventors: Raf Peeters, Bert Peelaers
  • Patent number: 10013768
    Abstract: Provided is a method and apparatus for displaying an image showing an object. The method of displaying an image showing an object includes: displaying a model corresponding to the object; receiving a user input for selecting, from the model, a region of interest (ROI) included in the object; and displaying an image showing the ROI based on the user input.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: July 3, 2018
    Assignee: SAMSUNG MEDISON CO., LTD.
    Inventors: Sung-wook Park, Jin-yong Lee, Hyuk-jae Chang, Namsik Chung, Geu-ru Hong, Chi-young Shim, Ji-hyun Yoon, In-jeong Cho, Ran Heo
  • Patent number: 10008363
    Abstract: A method of imaging a specimen using ptychography includes directing a charged-particle beam from a source through an illuminator so as to traverse the specimen and land upon a detector, detecting a flux of radiation emanating from the specimen with the detector, calculating at least one property of a charged-particle wavefront exiting the specimen based on using an output of the detector in combination with applying a mathematical reconstruction technique, wherein the at least one property comprises a phase of the wavefront, and wherein applying the mathematical construction technique comprises directly reconstructing the phase of the wavefront to determine a reconstructed phase of the wavefront. An associated apparatus is also described.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: June 26, 2018
    Assignee: FEI Company
    Inventors: Eric Gerardus Theodoor Bosch, Bart Jozef Janssen
  • Patent number: 9995765
    Abstract: Methods and apparatuses are provided for automatically controlling and stabilizing aspects of a scanning probe microscope (SPM), such as an atomic force microscope (AFM), using Peak Force Tapping (PFT) Mode. In an embodiment, a controller automatically controls periodic motion of a probe relative to a sample in response to a substantially instantaneous force determined and automatically controls a gain in a feedback loop. A gain control circuit automatically tunes a gain based on separation distances between a probe and a sample to facilitate stability. Accordingly, instability onset is quickly and accurately determined during scanning, thereby eliminating the need of expert user tuning of gains during operation.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: June 12, 2018
    Assignee: Bruker Nano, Inc.
    Inventors: Chanmin Su, Jian Shi, Yan Hu, Shuiqing Hu, Ji Ma
  • Patent number: 9989556
    Abstract: Aspects of the present invention include systems and devices useful for surface chemical analysis of solid samples by Tip Enhanced Raman Spectrometry (“TERS”), and particularly it relates to devices useful for chemical analysis of molecular compounds located either on or within thin surface layer of solid samples. Even more particularly, aspects of the present invention relate to systems, and devices for non-destructive analysis combining both high sensitivity and high spatial resolution of analysis of chemical compounds located or distributed on the surface of solid samples with obtaining important information regarding vibration spectra of atoms and molecular groups contained in a thin surface layer of solid samples. These objectives are realized by implementation of computer-assisted systems that use sensors to carefully regulate the motion of, and force applied to, probes of atomic force microscopes.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: June 5, 2018
    Assignee: HORIBA INSTRUMENTS INCORPORATED
    Inventors: Sergey A. Saunin, Andrey V. Krayev, Vladimir V. Zhishimontov, Vasily V. Gavrilyuk, Leonid N. Grigorov, Alexey V. Belyaev, Dmitry A. Evplov
  • Patent number: 9991089
    Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: June 5, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Ingo Mueller, Nicole Rauwolf, Christof Riedesel, Thomas Kemen, Joerg Jacobi, Arne Thoma, Markus Doering, Dirk Zeidler, Juergen Kynast, Gerd Benner
  • Patent number: 9978560
    Abstract: A system for performing nano beam diffraction (NBD) analysis, includes a focused ion beam (FIB) device for preparing a transmission electron microscopy (TEM) sample, a broad beam ion mill for milling the TEM sample to remove a surface portion of the TEM sample, and a strain analyzer for performing NBD analysis on the milled TEM sample to acquire diffraction data.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: May 22, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Marc Adam Bergendahl, James John Demarest, Christopher J. Penny, Roger Allen Quon, Christopher Joseph Waskiewicz
  • Patent number: 9978557
    Abstract: A method and apparatus are provided for aligning a sample in a charged particle beam system. The charged particle beam is directed toward the sample to obtain a sample diffraction pattern. The sample diffraction pattern is compared with reference diffraction patterns having known misalignments to determine which reference pattern most closely matches the sample pattern. The known alignment of the best-matching reference diffraction pattern is used to correct the tilt of the sample. The “patterns” compared can be lists of bright spots with corresponding intensities rather than images.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: May 22, 2018
    Assignee: FEI Company
    Inventor: John Francis Flanagan, IV
  • Patent number: 9977049
    Abstract: A scanning probe microscope includes a cantilever having a probe at a free end thereof; a scanner to three-dimensionally relatively move the probe and a sample; a vibrator to vibrate the cantilever based on a vibrating signal; a displacement detector to detect a displacement of the cantilever and to output a displacement signal indicating the displacement; and a phase difference information detecting section to generate a phase signal including information of a phase difference between the vibrating signal and the displacement signal. The phase difference information detecting section includes a phase regulating portion to provide, to the phase difference, a phase offset to cancel an initial phase difference present in a state in which the probe is not in contact with the sample.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: May 22, 2018
    Assignee: OLYMPUS CORPORATION
    Inventor: Nobuaki Sakai
  • Patent number: 9970959
    Abstract: A coated probe is provided. The probe includes a probe body and a cladding layer. The probe body has a terminal. The cladding layer covers the surface of the terminal of the probe body, wherein the cladding layer includes a carbon nano-material layer, and the carbon nano-material layer includes a carbon nano-material.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: May 15, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chun Tseng, Ren-Jye Wu, Ping-Hsing Yang, Li-Duan Tsai, Jin-Bao Wu
  • Patent number: 9966227
    Abstract: A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: May 8, 2018
    Assignee: EBARA CORPORATION
    Inventors: Masahiro Hatakeyama, Takeshi Murakami, Yoshihiko Naito, Kenji Terao, Norio Kimura, Kenji Watanabe
  • Patent number: 9966223
    Abstract: The invention relates to a device for correlative scanning transmission electron microscopy (STEM) and light microscopy. In order to create a device for correlative microscopy which enables an improved combination of light microscopy and STEM methods, a STEM detector (7) according to the invention is combined with a photo-optical lens (8). This detection device combines the efficient detection by means of STEM microscopy of materials having a high atomic number, for example specific nanoparticle markers in a specimen in a liquid, such as a cell, with simultaneous light microscopy.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: May 8, 2018
    Assignee: Leibniz-Institut Fuer Neue Materialien gemeinnuetzige GmbH
    Inventor: Niels De Jonge
  • Patent number: 9963776
    Abstract: An object of the present invention is to provide: a wiring method in which wiring is performed in a vacuum chamber of a charged particle device without using gas deposition or the like; and a charged particle device. In order to achieve the above-described object, the present invention proposes: a wiring method in which a wiring line composed of an ionic liquid is formed by dropping an ionic liquid on a sample or preparing an ionic liquid on a sample table, on which a sample is placed in advance, and irradiating a wiring track between a wiring start point and a wiring end point with a charged particle beam; and a charged particle device. According to this configuration, wiring can be performed in a vacuum chamber of a charged particle device without using a gas deposition method or the like.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: May 8, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yoichiro Hashimoto, Eiko Nakazawa, Mami Konomi, Shuichi Takeuchi
  • Patent number: 9966225
    Abstract: A simulation device calculates a detection number of electrons generated by charged particles radiated to a sample by a simulation and generates a simulation image of the sample. The simulation device holds penetration length information (272) in which incidence conditions of the charged particles and a penetration length are associated with each other, sample configuration information (271) which shows a configuration of a sample, and emission electron number information in which the incidence conditions of the charged particles and an emission electron number are associated with each other. The simulation device calculates the number of electrons emitted from a predetermined incidence point, on the basis of incidence conditions at the predetermined incidence point, the penetration length information (272), the sample configuration information (271), and the emission electron number information.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: May 8, 2018
    Assignee: HITACHI, LTD.
    Inventors: Daisuke Bizen, Makoto Sakakibara, Hiroya Ohta, Junichi Tanaka
  • Patent number: 9960008
    Abstract: A device for measuring electron orbital angular momentum states in an electron microscope includes the following components aligned sequentially in the following order along an electron beam axis: a phase unwrapper (U) that is a first electrostatic refractive optical element comprising an electrode and a conductive plate, where the electrode is aligned perpendicular to the conductive plate; a first electron lens system (L1); a phase corrector (C) that is a second electrostatic refractive optical element comprising an array of electrodes with alternating electrostatic bias; and a second electron lens system (L2). The phase unwrapper may be a needle electrode or knife edge electrode.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: May 1, 2018
    Assignee: University of Oregon
    Inventors: Benjamin J. McMorran, Tyler R. Harvey
  • Patent number: 9953801
    Abstract: A resolving aperture assembly for an ion implantation system has a first plate and a second plate, where the first plate and second plate generally define a resolving aperture therebetween. A position of the first plate with respect to the second plate generally defines a width of the resolving aperture. One or more actuators are operably coupled to one or more of the first plate and second plate and are configured to selectively vary the position the first plate and second plate with respect to one another, thus selectively varying the width of the resolving aperture. A servo motor precisely varies the resolving aperture width and a pneumatic cylinder independently selectively closes the resolving aperture. A downstream position actuator varies a position of the resolving aperture along a path of the ion beam, and a controller controls the one or more actuators based on desired properties of the ion beam.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: April 24, 2018
    Assignee: Axcelis Technologies, Inc.
    Inventors: Michael Paul Cristoforo, Justin White McCabe
  • Patent number: 9947596
    Abstract: A technique to identify non-visual defects, such as SEM non-visual defects (SNVs), includes generating an image of a layer of a wafer, evaluating at least one attribute of the image using a classifier, and identifying the non-visual defects on the layer of the wafer. A controller can be configured to identify the non-visual defects using the classifier. This controller can communicate with a defect review tool, such as a scanning electron microscope (SEM).
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: April 17, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Hemanta Kumar Roy, Arpit Jain, Arpit Yati, Olivier Moreau, Arun Lobo
  • Patent number: 9927509
    Abstract: A current measurement device is provided for use with a measurement target having a conductive path. The current measurement device includes a non-contact current sensor to be positioned adjacent the conductive path of the measurement target. A calibration current superimposing unit, including a first electrode and a second electrode to be positioned in contact with the conductive path of the measurement target, is configured to output a calibration current to flow through the conductive path between the first electrode and the second electrode. A controller, coupled to the non-contact current sensor and the calibration current superimposing unit, is configured to control the output of the calibration current from the calibration current superimposing unit, and is configured to sample a signal from the non-contact current sensor positioned adjacent the conductive path of the measurement target.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: March 27, 2018
    Assignee: Keysight Technologies, Inc.
    Inventor: Yasuhiro Miyake
  • Patent number: 9928316
    Abstract: A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: March 27, 2018
    Assignee: International Business Machines Corporation
    Inventors: Todd C. Bailey, Ioana C. Graur, Scott D. Halle, Marshal A. Miller
  • Patent number: 9927461
    Abstract: A semiconductor carrier profiling method utilizes a scanning tunneling microscope and shielded probe with an attached spectrum analyzer to measure power loss of a microwave frequency comb generated in a tunneling junction. From this power loss and by utilizing an equivalent circuit or other model, spreading resistance may be determined and carrier density from the spreading resistance. The methodology is non-destructive of the sample and allows scanning across the surface of the sample. By not being destructive, additional analysis methods, like deconvolution, are available for use.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: March 27, 2018
    Inventor: Mark J. Hagmann
  • Patent number: 9928991
    Abstract: A method for generating cross-sectional profiles using a scanning electron microscope (SEM) includes scanning a sample with an electron beam to gather an energy-dispersive X-ray spectroscopy (EDS) spectrum for an energy level to determine element composition across an area of interest. A mesh is generated to locate positions where a depth profile will be taken. EDS spectra are gathered for energy levels at mesh locations. A number of layers of the sample are determined by distinguishing differences in chemical composition between depths as beam energies are stepped through. A depth profile is generated for the area of interest by compiling the number of layers and the element composition across the mesh.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: March 27, 2018
    Assignee: International Business Machines Corporation
    Inventors: Eric J. Campbell, Sarah K. Czaplewski
  • Patent number: 9928990
    Abstract: A method for generating cross-sectional profiles using a scanning electron microscope (SEM) includes scanning a sample with an electron beam to gather an energy-dispersive X-ray spectroscopy (EDS) spectrum for an energy level to determine element composition across an area of interest. A mesh is generated to locate positions where a depth profile will be taken. EDS spectra are gathered for energy levels at mesh locations. A number of layers of the sample are determined by distinguishing differences in chemical composition between depths as beam energies are stepped through. A depth profile is generated for the area of interest by compiling the number of layers and the element composition across the mesh.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: March 27, 2018
    Assignee: International Business Machines Corporation
    Inventors: Eric J. Campbell, Sarah K. Czaplewski
  • Patent number: 9921240
    Abstract: A probe actuation system has a detection system arranged to measure a position or angle of a probe to generate a detection signal. An illumination system is arranged to illuminate the probe. Varying the illumination of the probe causes the probe to deform which in turn causes the detection signal to vary. A probe controller is arranged to generate a desired value which varies with time. A feedback controller is arranged to vary the illumination of the probe according to the detection signal and the desired value so that the detection signal is driven towards the desired value. The probe controller receives as its inputs a detection signal and a desired value, but unlike conventional feedback systems this desired value varies with time. Such a time-varying desired value enables the probe to be driven so that it follows a trajectory with a predetermined speed. A position or angle of the probe is measured to generate the detection signal and the desired value represents a desired position or angle of the probe.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: March 20, 2018
    Assignee: INFINITESIMA LIMITED
    Inventor: Andrew Humphris
  • Patent number: 9922797
    Abstract: An improved microreactor for use in microscopy, use of said microreactor, and a microscope comprising said reactor. The present invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy (EM and FIB), and in particular Transmission Electron Microscopy (TEM). However its application is extendable in principle to any field of microscopy, especially wherein characteristics of a (solid) specimen (or sample) are studied in detail, such as during a reaction.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: March 20, 2018
    Assignee: TECHNISCHE UNIVERSITEIT DELFT
    Inventor: Hendrik Willem Zandbergen
  • Patent number: 9909860
    Abstract: Systems and methods for monitoring component deformation are provided. The component has an exterior surface. A method includes directly measuring a passive strain indicator configured on the exterior surface of the component along an X-axis, a Y-axis and a Z-axis to obtain X-axis data points, Y-axis data points, and Z-axis data points. The X-axis, Y-axis and Z-axis are mutually orthogonal. The method further includes assembling a three-dimensional profile of the passive strain indicator based on the X-axis data points, Y-axis data points and Z-axis data points.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: March 6, 2018
    Assignee: General Electric Company
    Inventors: Jason Lee Burnside, Gregory Lee Hovis, Bryan J. Germann, John David Ward, Jr., William F. Ranson
  • Patent number: 9903813
    Abstract: Multiply patterned metrology targets and target design methods are provided to enable pitch walk measurements using overlay measurements. Multiply patterned structures having single features or spacers produced simultaneously and sharing a common pitch with the paired features or spacers are used to express pitch walk as a measurable overlay between the structures. For example, targets are provided which comprise a first multiply patterned structure having a single left-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers, and a second multiply patterned structure having a single right-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: February 27, 2018
    Assignee: KLA-Tencor Corporation
    Inventor: Nuriel Amir
  • Patent number: 9905480
    Abstract: A method includes forming a first nitride layer on a semiconductor substrate, forming a first oxide layer on the first nitride layer, forming a first trench through the first oxide layer, the first nitride layer and a portion of the semiconductor substrate, forming a first spacer on a sidewall of the first trench, forming a second trench in the semiconductor substrate by using the first spacer as a mask, forming a third trench, forming a second oxide layer in the second trench, wherein the second oxide layer laterally extends into the semiconductor substrate and under the first spacer, forming a second spacer on a sidewall of the third trench, and removing a portion of the first nitride layer and a portion of the semiconductor substrate by etching and using the second spacer as a mask to form a fin structure on the second oxide layer.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: February 27, 2018
    Assignee: NUVOTON TECHNOLOGY CORPORATION
    Inventor: Wen-Ying Wen
  • Patent number: 9903756
    Abstract: Apparatuses and methods are provided that minimize the effects of dark-current pulses. For example, in one embodiment of the invention, a method is provided where a first pixel is struck (i.e., a primary pixel). Pixels struck within a fixed time frame after the primary pixel is struck are referred to as secondary pixels. After a short fixed time frame has expired, the number of primary and secondary pixels is added. If the count exceeds a threshold, the primary pixel was activated by the first (or early) photon from a true gamma event. If the threshold is not met then it is likely the primary pixel generated a dark pulse that should be ignored.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: February 27, 2018
    Assignee: Siemens Medical Solutions USA, Inc.
    Inventors: Peter Hansen, Michael Casey, Stefan B. Siegel
  • Patent number: 9905394
    Abstract: The system described herein analyzes an object using a charged particle beam device, such as an electron beam device and/or an ion beam device. The charged particle beam device is used to generate high resolution 3D data sets by sequentially removing material from the object, exposing surfaces of the object and generating images of the surfaces. When removing material from the object, an opening having sides is generated. Lamellas are generated using the sides and material characteristics of those lamellas are identified. Moreover, filtered data is generated for each pixel of images of the sides of the opening. The method uses the information with respect to the identified material characteristics, the images of the sides and the filtered data of those images to obtain information on the material characteristics for each pixel of each surface generated when sequentially removing material from the object.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: February 27, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Sreenivas Bhattiprolu, Lorenz Lechner
  • Patent number: 9899197
    Abstract: A hybrid extreme ultraviolet (EUV) imaging spectrometer includes: a radiation source to: produce EUV radiation; subject a sample to the EUV radiation; photoionize a plurality of atoms of the sample; and form photoions from the atoms subject to photoionization by the EUV radiation, the photoions being desorbed from the sample in response to the sample being subjected to the EUV radiation; an ion detector to detect the photoions: as a function of a time-of-arrival of the photoions at the ion detector after the sample is subjected to the EUV radiation; or as a function of a position of the photoions at the ion detector; an electron source to: produce a plurality of primary electrons; subject the sample to the primary electrons; and form scattered electrons from the sample in response to the sample being subjected to the primary electrons; and an electron detector to detect the scattered electrons: as a function of a time-of-arrival of the scattered electrons at the electron detector after the sample is subjected
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: February 20, 2018
    Assignees: THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE, COLORADO SCHOOL OF MINES
    Inventors: Norman A. Sanford, Ann Chiaramonti Debay, Brian P. Gorman, David R. Diercks
  • Patent number: 9897791
    Abstract: Presented herein are systems and methods for performing sequencing, including fluorescence in situ sequencing. In one embodiment, a confocal time delay and integration (TDI) line scan imaging system may include various pinhole and/or slit aperture mechanisms in front of the image sensor. The system may also include structures with focusing strips on a substrate in contact with the tissue sample to be imaged. Alternatively, these strips may be cut into the tissue sample. The system may also include configurations and methods of placing a tissue sample inside a reaction chamber of a flow cell during the assembly of the flow cell and then performing chemistry operations on the tissue sample. The flow cells may use an open container for performing chemistry operations on the tissue sample.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: February 20, 2018
    Assignee: ILLUMINA, INC.
    Inventor: Wenyi Feng
  • Patent number: 9896329
    Abstract: The present disclosure relates to an integrated semiconductor device, comprising a semiconductor substrate; a cavity formed into the semiconductor substrate; a sensor portion of the semiconductor substrate deflectably suspended in the cavity at one side of the cavity via a suspension portion of the semiconductor substrate interconnecting the semiconductor substrate and the sensor portion thereof, wherein an extension of the suspension portion along the side of the cavity is smaller than an extension of said side of the cavity.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: February 20, 2018
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Alessia Scire, Maik Stegemann, Bernhard Winkler, Andre Roeth, Steffen Bieselt, Mirko Vogt
  • Patent number: 9899185
    Abstract: A system, computer readable medium and a method for material analysis, the method may include (i) receiving or generating (a) an estimated composition of a microscopic element; wherein the estimated composition is responsive to an energy spectrum of, at least, the microscopic element; wherein the energy spectrum is obtained by an energy dispersive X-ray (EDX) detector; additional information related to, at least, the microscopic element, wherein the additional information is not obtained by the energy dispersive X-ray detector; and (ii) resolving an ambiguity in the estimated composition in response to the additional information, wherein the ambiguity occurs when the energy spectrum comprises a predefined energy peak that is attributed to a predefined material of ambiguous EDX composition determination.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: February 20, 2018
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dror Shemesh, Mor Baram
  • Patent number: 9884206
    Abstract: Embodiments disclosed herein include methods for performing intensity-modulated radiation therapy on a subject using a plurality of pencil beams. The methods can include generating a treatment plan for intensity-modulated radiation therapy that satisfies dose constraints for each of a plurality of sub-volumes. The treatment plan can be generated using a superiorization technique that reduces total variation in dose space. Additional dose-volume constraints that permit a fraction of treatment doses to violate a prescription by up to a defined percentage of intensity can be used to assist in determining the treatment plan.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: February 6, 2018
    Assignees: Loma Linda University Medical Center, Carmel-HAIFA University Economic Corporation Ltd.
    Inventors: Reinhard W. Schulte, Yair Censor
  • Patent number: 9881764
    Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: January 30, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Xinrong Jiang, Christopher Sears, Douglas Larson
  • Patent number: 9874582
    Abstract: A probe system including a probe with first and second arms and a probe tip carried by the first and second arms, the probe tip having a height and a tilt angle; an illumination system arranged to deform the probe by illuminating the first arm at a first actuation location and the second arm at a second actuation location each with a respective illumination power; and an actuation controller arranged to independently control the illumination power at each actuation location in order to control the height and tilt angle of the probe tip.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: January 23, 2018
    Assignee: INFINITESIMA LIMITED
    Inventor: Andrew Humphris
  • Patent number: 9859093
    Abstract: A scanning charged particle microscope apparatus includes image quality improvement unit which performs an image quality improvement process on image data which is obtained by detecting particles generated from a sample, the image quality improvement unit divides a region in which the image data is acquired into two or more regions on the basis of a distance from a region in which the image data within a visual field of a charged particle optical unit is not acquired, determines an image quality improvement processing method and a processing parameter for image quality improvement for the image data in each of the separate regions according to the separate regions; and performs an image quality improvement process on the image data in each of the separate regions by using the determined processing method and processing parameter corresponding to the separate region.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: January 2, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kenji Nakahira, Maki Tanaka
  • Patent number: 9859095
    Abstract: An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).
    Type: Grant
    Filed: May 11, 2016
    Date of Patent: January 2, 2018
    Assignees: The University of Tokyo, JEOL Ltd.
    Inventors: Naoya Shibata, Yuji Kohno, Hidetaka Sawada
  • Patent number: 9823273
    Abstract: Probe tip formation is described for die sort and test. In one example, the tips of wires of a test probe head are prepared for use as test probes. The wires are attached to a test probe head substrate. The end opposite the substrate has a tip. The tips of the wires are polished when attached to the test probe head to form a sharpened point.
    Type: Grant
    Filed: June 29, 2013
    Date of Patent: November 21, 2017
    Assignee: Intel Corporation
    Inventors: Keith J. Martin, Kip P. Stevenson, Kamil S. Salloum, Todd P. Albertson
  • Patent number: 9818576
    Abstract: To improve the workability of the task of adjusting the position of a limit field diaphragm. An electron microscope provided with an image-capturing means for capturing an image of an observation visual field prior to insertion of a limit field diaphragm as a map image, a recording means for recording the map image, an extraction means for capturing an image of the observation visual field after insertion of the limit field diaphragm and extracting the outline of the diaphragm, a drawing means for drawing the outline on the map image, and a display means for displaying the image drawn by the drawing means.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: November 14, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Kubo, Hiroyuki Kobayashi
  • Patent number: 9812287
    Abstract: An improved spectroscopic analysis apparatus and method are disclosed, comprising directing a beam of radiation onto a measurement location on a specimen, thereby causing a flux of X-rays to emanate from this location; examining the X-ray flux using a detector arrangement, thus acquiring a spectrum; choosing a set of different measurement directions originating from the location; recording outputs from the detector arrangement for different measurement directions; adopting a spectral model that is a convoluted mix of terms B and Lp, where B is the Bremsstrahlung background spectrum and Lp comprises spectral lines corresponding to the specimen composition at the measurement location; and then automatically deconvolving the set of measurements on the basis of the spectral model to calculate Lp to determine the chemical composition of the specimen at the measurement location. The method includes corrections for differential X-ray absorption within the specimen along the different measurement directions.
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: November 7, 2017
    Assignee: FEI Company
    Inventors: Cornelis Sander Kooijman, Thijs Thomas Withaar, Gerard Nicolaas Anne van Veen
  • Patent number: 9805908
    Abstract: A signal charged particle deflection device for a charged particle beam device is provided. The signal charged particle deflection device includes a beam bender configured for deflecting the signal charged particle beam, wherein the beam bender includes a first electrode and a second electrode providing an optical path for the signal charged particle beam therebetween, wherein the first electrode has a first cross section in a plane perpendicular to the optical path, and the second electrode has a second cross section in the plane perpendicular to the optical path, and wherein a first part of the first cross section and a second part of the second cross section provide the optical path therebetween, and wherein the first part and the second part are different in shape.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: October 31, 2017
    Assignee: Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Matthias Firnkes, Stefan Lanio
  • Patent number: 9805909
    Abstract: An inspection system that includes charged particle optics that irradiate a bottom of a hole with a charged particle beam propagated along an optical axis, an energy dispersive x-ray detector and a processor. The x-ray detector detects x-ray photons emitted from the bottom of the hole and generates detection signals indicative of the x-ray photons. The processor processes the detection signals to provide an estimate of the bottom of the hole.
    Type: Grant
    Filed: September 20, 2016
    Date of Patent: October 31, 2017
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Dror Shemesh, Lei Zhong
  • Patent number: 9804107
    Abstract: The purpose of the present invention is to provide a pattern measurement device for quantitatively evaluating a pattern formed using a directed self-assembly (DSA) method with high accuracy. The present invention is a pattern measurement device for measuring distances between patterns formed in a sample, wherein the centroids of a plurality of patterns included in an image are determined; the inter-centroid distances, and the like, of the plurality of centroids are determined; and on the basis of the inter-centroid distances, and the like, of the plurality of centroids, a pattern meeting a specific condition is distinguished from patterns different from the pattern meeting the specific condition or information is calculated about the number of the patterns meeting the specific condition, the size of an area including the patterns meeting the specific condition, and the number of imaginary lines between the patterns meeting the specific condition.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: October 31, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akiyuki Sugiyama, Miki Isawa, Satoru Yamaguchi, Motonobu Hommi
  • Patent number: 9797923
    Abstract: A method of forming a sample and performing correlative S/TEM and APM analysis is provided wherein a sample containing a region of interest is cut from a bulk of sample material and formed into an ultra-thin lamella. The lamella is then analyzed with an S/TEM to form an image. The lamella sample and mount may then go through a cleaning process to remove any contamination. The lamella containing the ROI is then embedded within a selected material and is formed into a needle-shaped sample. The needle-shaped sample is then analyzed with the APM and the resulting data is merged and correlated with the S/TEM data.
    Type: Grant
    Filed: February 20, 2015
    Date of Patent: October 24, 2017
    Assignee: FEI Company
    Inventor: Roger Alvis
  • Patent number: 9799486
    Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: October 24, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Seiichiro Kanno, Yasushi Ebizuka, Go Miya, Takafumi Miwa
  • Patent number: 9793090
    Abstract: The present invention discloses an e-beam inspection tool, and an apparatus for detecting defects. In one aspect is described an apparatus for detecting defects that includes a focusing column that accelerates the e-beam and separately, for each of the plurality of predetermined locations, focuses the e-beam to a predetermined non-circular spot that is within the predetermined surface area of each of the plurality of predetermined locations based upon the major axis.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: October 17, 2017
    Assignee: PDF Solutions, Inc.
    Inventors: Indranil De, Christopher Hess, Dennis J. Ciplickas
  • Patent number: 9786063
    Abstract: Provided is a method of computing precise disparity using a stereo matching method based on developed census transform with an adaptive support weight method in area based stereo matching. The method includes a step of setting an adaptive support weight window centered on a specific point of a left image and setting adaptive support weight windows with the same size with respect to one point positioned within a maximum disparity prediction value about a specific point of the left image in a right image.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: October 10, 2017
    Assignee: KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY—ACADEMIC COOPERATION FOUNDATION
    Inventors: Byung In Moon, Kyeong Ryeol Bae, Hyeon Sik Son, Seung Ho Ok
  • Patent number: 9778215
    Abstract: The present invention discloses a combination of two existing approaches for mineral analysis and makes use of the Similarity Metric Invention, that allows mineral definitions to be described in theoretical compositional terms, meaning that users are not required to find examples of each mineral, or adjust rules. This system allows untrained operators to use it, as opposed to previous systems, which required extensive training and expertise.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: October 3, 2017
    Assignee: FEI Company
    Inventors: Michael James Owen, Michael Buhot