Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.

Abstract: When focus adjustment is performed according to the height of the surface of a sample at each inspection point in order to continuously inspect a plurality of inspection points on a wafer by using an electron microscope, even when the focus adjustment by an electrostatic lens in which a variation of heights of inspection points is greater than a predetermined range, and that can perform adjustment at a high speed and adjustment by an electromagnetic lens with a low speed are required to be used together, a flow of focus adjustment in which the number of times of the adjustment by the electromagnetic lens is reduced by using a relation of changes of heights at inspection points, an inspection order, and a range in which an electrostatic focus can be performed is realized, so that inspection with high throughput is made possible.

Abstract: According to one embodiment, an electron beam device includes a support which supports the sample and an electrode disposed below the sample on the support The electrode is for applying a voltage to the sample and includes a plurality of columnar electrodes that can be independently controlled to apply different voltages to portions of the sample. A controller for generating correction data for correcting the distribution of an electric field generated across the area of the sample. The correction data is generated based on structure information indicating a structure of the sample. The controller controls the plurality of columnar electrodes to apply local voltages set based on the correction data.

Abstract: A robotic object handling system comprises a robot arm, a non-contact sensor, a first station, and a computing device. The computing device is to cause the robot arm to pick up an object on an end effector, cause the robot arm to position the object within a detection area of the non-contact sensor, cause the non-contact sensor to generate sensor data of the object, determine at least one of a rotational error of the object relative to a target orientation or a positional error of the object relative to a target position based on the sensor data, cause an adjustment to the robot arm to approximately remove at least one of the rotational error or the positional error from the object, and cause the robot arm to place the object at the first station, wherein the placed object lacks at least one of the rotational error or the positional error.

Abstract: The disclosed technology brings histopathology into the operating theatre, to enable real-time intra-operative digital pathology. The disclosed technology utilizes confocal imaging devices image, in the operating theatre, “optical slices” of fresh tissue—without the need to physically slice and otherwise process the resected tissue as required by frozen section analysis (FSA). The disclosed technology, in certain embodiments, includes a simple, operating-table-side digital histology scanner, with the capability of rapidly scanning all outer margins of a tissue sample (e.g., resection lump, removed tissue mass). Using point-scanning microscopy technology, the disclosed technology, in certain embodiments, precisely scans a thin “optical section” of the resected tissue, and sends the digital image to a pathologist rather than the real tissue, thereby providing the pathologist with the opportunity to analyze the tissue intra-operatively.

Abstract: The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample; scanning said charged particle beam over said sample; and detecting, using a first detector, emissions of a first type from the sample in response to the beam scanned over the sample. Spectral information of detected emissions of the first type is used for assigning a plurality of mutually different phases to said sample. In a further step, a corresponding plurality of different color hues—with reference to an HSV color space—are associated to said plurality of mutually different phases. Using a second detector, emissions of a second type from the sample in response to the beam scanned over the sample are detected. Finally an image representation of said sample is provided.

Abstract: A GUI (graphical user interface) image includes an input portion and a reference image. The reference image includes a plan diagram and numerical value information. The plan diagram includes a figure indicating an electron penetration range, a figure indicating a characteristic X-ray generation range, and a figure indicating a back-scattered electron generation range. The numerical value information includes numerical values indicating sizes of these ranges.

Abstract: Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

Abstract: A distance measurement apparatus comprises a distance measurement optical signal generation part, a collimating part, a beam diameter change part, an emission direction control part, and a beam diameter change control part. The distance measurement optical signal generation part generates an optical signal for measuring the distance to a target. The collimating part collimates the optical signal. The beam diameter change part is able to change a beam diameter of the collimated light. The emission direction control part controls an emission destination of the collimated light with the diameter changed. The beam diameter change control part controls the changing of the beam diameter by the beam diameter change part according to the emission direction of an outgoing.

Abstract: Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.

Abstract: The purpose of the present invention is to increase accuracy of a specific test using an electronic microscope and improve work efficiency. Provided is a system that identifies test recipe information corresponding to an object to be tested on the basis of attribute information about a testing sample, and analyzes and evaluates the object to be tested contained in the testing sample by checking image data and element analysis data that are acquired by a measuring device in accordance with a control program for the test recipe information, against reference image data and reference element analysis data that are used as evaluation references for the object to be tested.

Abstract: A reference image is generated based on an illumination condition and element information of a specimen. The reference image includes a figure indicating a characteristic X-ray generation range, a numerical value indicating a characteristic X-ray generation depth, or the like. The reference image changes with a change of an accelerating voltage, a tilt angle, or an element forming the specimen. The reference image may include a figure indicating a landing electron scattering range, a figure indicating a back-scattered electron generation range, or the like.

Abstract: A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

Abstract: A method is for generating an X-ray image dataset via an X-ray detector having a converter element and a multiplicity of pixel elements. In an embodiment, the method includes first counting of at least one quantity of count signals dependent upon the incident X-ray radiation in each pixel element of the multiplicity of pixel elements; second counting of at least one quantity of coincidence count signals in each pixel element of the subset of pixel elements with at least one further pixel element of the multiplicity of pixel elements; and generating an X-ray image dataset based upon the at least one quantity of count signals counted in each pixel element of the multiplicity of pixel elements and upon the at least one quantity of coincidence count signals counted in each pixel element of the subset of pixel elements.

Abstract: A sequential X-ray fluorescence spectrometer according to the present invention includes a total analysis time display unit configured to measure, for each kind of analytical sample, a standard sample which contains a component at a known content as a standard value to determine a measured intensity of each measurement line corresponding to the component. The total analysis time display unit is further configured to calculate, for each component, a counting time which gives a specified analytical precision by using the standard value and the measured intensity and to calculate a total counting time as a sum of the counting times of respective components. The total analysis time display unit is configured to calculate a total analysis time as a sum of the total counting time and a total non-counting time and to output the calculated total analysis time and the calculated counting times of the respective components.

Abstract: A method of operating a particle beam device for imaging, analyzing and/or processing an object may be carried out, for example, by a particle beam device. The method may include: identifying at least one region of interest on the object; defining: (i) an analyzing sequence for analyzing the object, (ii) a processing sequence for processing the object by deformation and (iii) an adapting sequence for adapting the at least one region of interest depending on the processing sequence and/or on the analyzing sequence; processing the object by deformation according to the processing sequence and/or analyzing the object according to the analyzing sequence; adapting the at least one region of interest according to the adapting sequence; and after or while adapting the at least one region of interest, imaging and/or analyzing the at least one region of interest using a primary particle beam being generated by a particle beam generator.

Abstract: An analysis method using an X-ray fluorescence analyzer is provided in which an X-ray spectrum is acquired by detecting a secondary X-ray emitted from a specimen when the specimen is irradiated with a primary X-ray. The analysis method includes: acquiring a first X-ray spectrum obtained, with a take-off angle of the secondary X-ray being set as a first take-off angle; acquiring a second X-ray spectrum obtained, with a take-off angle of the secondary X-ray being set as a second take-off angle that is different from the first take-off angle; and obtaining information on an element in a depth direction of a specimen based on the first X-ray spectrum and the second X-ray spectrum.

Abstract: An electron beam melting machine and a method of operation are provided which maintains constant energy absorption within a build layer by adjusting an incident energy level to compensate for energy not absorbed by the additive powder. This unabsorbed energy is detected in the form of electron emissions, which include secondary electrons, backscattered electrons, and/or electrons which are transmitted through the build platform.

Abstract: The present disclosure provides methods and apparatus for rapidly classifying detected defects in subcomponents of a manufactured component or device. The defect classification may occur after defect detection or, because the classification may be sufficiently rapid to be performed in real-time, during defect detection, as part of the defect detection process. In an exemplary implementation, the presently-disclosed technology may be utilized to enable real-time classification of detected defects in multiple subcomponents of the component in parallel. The component may be, for example, a multi-chip package with silicon interposers, and the subcomponents may include, for example, through-silicon vias and solder joints. Defects in subcomponents of other types of components may be also be classified. One embodiment relates to a method of classifying detected defects in subcomponents of a manufactured component.

Abstract: A magnetic material observation method in accordance with the present invention includes: an irradiating step including irradiating a region of a sample with an excitation beam and thereby allowing a magnetic element contained in the sample to radiate a characteristic X-ray; a detecting step including detecting intensities of a right-handed circularly polarized component and a left-handed circularly polarized component contained in the characteristic X-ray; and a calculating step including calculating the difference between the intensity of the right-handed circularly polarized component and the intensity of the left-handed circularly polarized component. Reference to such a difference enables precise measurement of the direction or magnitude of magnetization without strict limitations as to the sample.

Abstract: A method of acquiring a dark-field image for a scanning transmission electron microscope is provided. The scanning transmission electron microscope includes a dark-field detector having an annular detection region which is capable of detecting electrons scattered at a specimen in a predetermined angular range, an objective lens, and an imaging lens group disposed at a stage following the objective lens. The method includes reducing an influence of a geometrical aberration on the electrons scattered in the predetermined angular range by shifting a focus of the imaging lens group from a diffraction plane of the objective lens.

Abstract: Apparatuses and methods for comparative holographic imaging to improve structural and molecular information of reconstructions is disclosed herein. An example method at least includes acquiring a plurality of holograms of a sample, wherein each hologram of the plurality of holograms is acquired at a different electron beam energy, and determining atomic and structural information of the sample based at least on a comparison of at least two of the holograms of the plurality of holograms.

Abstract: Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.

Abstract: Methods for inserting dummy boundary cells in an integrated circuit (IC) are provided. A plurality of macros and a top channel are merged into floorplan of the IC. The top channel is arranged between the macros and is filled with a plurality of first dummy boundary cells, and each of the macros includes a macro boundary and a main pattern surrounded by the macro boundary. The first dummy boundary cells within the top channel and between a first macro and a second macro are replaced with a plurality of second dummy boundary cells. The macro boundaries of the first and second macros are formed by the second dummy boundary cells. First gate length of dummy patterns within the first dummy boundary cells is greater than second gate length of dummy patterns within the second dummy boundary cells. The first and second dummy boundary cells are the same size.

Abstract: An electron beam system and method are provided. The system includes a detector having a detector face configured to detect back-scattered electrons reflected off of a sample. The system further includes an annular cap disposed on the detector face, and a protective pellicle disposed on the annular cap, covering the detector face. The protective pellicle is transparent to back-scattered electrons and provides a physical barrier to particles directed at the detector face.

Abstract: A visualized data generation device includes an acquisitor, an analyzer, and a generator. The acquisitor acquires manufacturing data including one or more pieces of first data Yi regarding a product state with respect to one product. The analyzer analyzes the first data Yi acquired by the acquisitor and derives a first index value with respect to each piece of the first data Yi. The generator generates visualized data including a first analysis result display region for causing a display device to display information about the first index value. The generator generates the visualized data in which an amount of information and a priority is set for each first analysis result display region on the basis of the first index value and a display form of the first analysis result display region is set on the basis of the amount of information and the priority.

Abstract: Provided is a technology for evaluating a property of a pattern formed inside a sample from two-dimensional information of the sample. A pattern evaluation system of the present disclosure includes a computer subsystem that executes a process of evaluating a property of a pattern by reading a program from a memory that stores the program for evaluating the property of the pattern formed inside a sample. The computer subsystem executes a process of acquiring an image of the sample; a process of extracting a signal waveform from the image; a process of calculating a feature amount in a predetermined region of the signal waveform; a process of comparing the feature amount with a reference value of the feature amount; and a process of evaluating the property of the pattern based upon a comparison result in the comparison process.

Abstract: The present invention relates to an autofocus technique for a scanning electron microscope using interlaced scan. The autofocus method for a scanning electron microscope, includes: generating a thinned image of a pattern (160) formed on a surface of a specimen by repeatedly scanning the specimen with an electron beam while shifting a scanning position of the electron beam by predetermined plural pixels in a direction perpendicular to a scanning direction; performing said generating a thinned image of the pattern (160) plural times, while changing a focal position and an irradiation position of the electron beam, to generate thinned images of the pattern (160); calculating a plurality of sharpness levels of the respective thinned images; and determining an optimum focal position based on the sharpness levels.

Abstract: A novel method for cross-section sample preparation has a sample oriented normal to an SEM/GFIS or other imaging column via a stage, and is operated upon by an FIB to form the cross-section pre-lamella within the sample, followed by an approximate 90° rotation with no tilt of the stage for cut out by the FIB. Asymmetric trenches are milled to have a three-dimensional depth profile to ensure that the FIB has clear line of sight to a face of the resulting pre-lamella when the sample has been rotated. The three-dimensional depth profile further minimizes overall milling time required for the preparation of the pre-lamella.

Abstract: An object of the present invention is to provide a charged particle beam device capable of easily and quickly calling a function required by a user on a GUI. A charged particle beam device according to the invention presents an operation component that is recommended to be provided on a component set according to an operation history of the charged particle beam device (see FIG. 5).

Abstract: The present application relates to a method and an apparatus for determining a wavefront of a massive particle beam, including the steps of: (a) recording two or more images of a reference structure using the massive particle beam under different recording conditions; (b) generating point spread functions for the two or more recorded images with a modified reference image of the reference structure; and (c) performing a phase reconstruction of the massive particle beam on the basis of the generated point spread functions and the different recording conditions, for the purposes of determining the wavefront.

Abstract: A particle beam apparatus and/or a light microscope is operated. A first temperature of an object may be changed, where the object may be arranged on an object receiving device rendered movable by a motor operated by a supply current. Changing the first temperature of the object may alter a second temperature of the object-receiving device from a first temperature value to a second temperature value. The supply current of the motor may be changed from a first current value to a second current value, where the supply current is designed to hold the object-receiving device in position, and a temperature of the object-receiving device may be changed from the second temperature value to a third temperature value on account of heat generated by the motor, which may be obtained by the second current value of the supply current and fed to the object receiving device.

Abstract: Systems, devices, and methods for performing a non-contact electrical measurement (NCEM) on a NCEM-enabled cell included in a NCEM-enabled cell vehicle may be configured to perform NCEMs while the NCEM-enabled cell vehicle is moving. The movement may be due to vibrations in the system and/or movement of a movable stage on which the NCEM-enabled cell vehicle is positioned. Position information for an electron beam column producing the electron beam performing the NCEMs and/or for the moving stage may be used to align the electron beam with targets on the NCEM-enabled cell vehicle while it is moving.

Abstract: The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.

Abstract: Systems, devices, and methods for performing a non-contact electrical measurement (NCEM) on a NCEM-enabled cell included in a NCEM-enabled cell vehicle may be configured to perform NCEMs while the NCEM-enabled cell vehicle is moving. The movement may be due to vibrations in the system and/or movement of a movable stage on which the NCEM-enabled cell vehicle is positioned. Position information for an electron beam column producing the electron beam performing the NCEMs and/or for the moving stage may be used to align the electron beam with targets on the NCEM-enabled cell vehicle while it is moving.

Abstract: The invention relates to a method of examining a sample using a charged particle microscope, comprising the steps of providing a charged particle beam, as well as a sample, and scanning said charged particle beam over at least part of said sample. A first detector is used for obtaining measured detector signals corresponding to emissions of a first type from the sample at a plurality of sample positions. According to the method, a set of data class elements is provided, wherein each data class element relates an expected detector signal to a corresponding sample information value. The measured detector signals are processed, and processing comprises comparing said measured detector signals to said set of data class elements; determining at least one probability that said measured detector signals belong to a certain one of said set of data class elements; and assigning at least one sample information value and said at least one probability to each of the plurality of sample positions.

Abstract: A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.

Abstract: A device for measuring a secondary electron emission coefficient comprises a scanning electron microscope, a first collecting plate, a second collecting plate, a first galvanometer, a second galvanometer, a voltmeter, and a Faraday cup. The scanning electron microscope comprises an electron emitter and a chamber. A sample is located between the first collecting plate and the second collecting plate. The first galvanometer is used to test a current intensity of electrons escaping from the sample and hitting the first collecting plate and the second collecting plate. A high-energy electron beam emitted by the electron emitter passes through the first collecting plate and the second collecting plate, and enters the Faraday cup. The second galvanometer is used to test a current intensity of electrons entering the Faraday cup.

Abstract: A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.

Abstract: The present invention provides an apparatus of charged-particle beam such as an electron microscope with co-condensers. A source of charged particles is configured to emit a beam of charged particles, and the co-condensers including two or more magnetic condensers are configured to coherently focus the beam to a single crossover spot. The invention exhibits numerous technical merits such as continuous image resolution tuning, and automatic switching between multiple resolutions, among others.

Abstract: A system for capturing, organizing, and storing handwritten notes includes a plurality of fluorescently colored boundary markers. The boundary markers are configured to be positioned on a writing surface. An image of the writing surface with the fluorescent markers thereon is captured and the fluorescent colored boundary markers in the captured image are detected. A virtual boundary in the captured image is identified based on the positions of the fluorescent colored boundary markers. A portion of the captured image within the virtual boundary is unwarped to produce an unwarped image.

Abstract: A method for measuring secondary electron emission coefficient comprising: providing a device including a first collecting plate and a second collecting plate, and measuring an injection current. Short-circuiting the first collecting plate and the second collecting plate; placing a sample and applying a 50 volt positive voltage between the sample and the first collecting plate, ISE is 0; measuring a current I1 between the sample and the first collecting plate, and ignoring IBG1; and according to formula I1=IBG1+Iothers+ISE, obtaining a current of other electrons. Applying a positive voltage between the first collecting plate and the sample; measuring a current I2 between the first collecting plate and the sample, and ignoring IBG2; and obtaining ISE formed by the secondary electrons according to formula I2=IBG2+Iothers+ISE. Obtaining the secondary electron emission coefficient according to formula ? = I SE I injection ? ? current .

Abstract: The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.

Abstract: The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focusing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points xD, yD and mapping each of the detected image points xD, yD to an image point of an improved TKD pattern (20a) with the coordinates x0, y0 by using and inverting generalized terms of the form xD=?*A+(1??)*B and yD=?*C+(1??)*D wherein ? = Z D with Z being an extension in the z-direction of a cylindrically symmetric magnetic field BZ of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x0, y0, with B and D defining a rotation around a symmetry axis of the magnetic field BZ, and with A and C d

Abstract: To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.

Abstract: An electron beam inspection apparatus includes a plurality of electrodes to surround an inspection substrate placed on a stage, a camera to measure, for each of the plurality of electrodes, a gap between a peripheral edge of the inspection substrate and an electrode of the plurality of electrodes, a retarding potential application circuit to apply a retarding potential to the inspection substrate, an electrode potential application circuit to apply, to each electrode, a corresponding potential of potentials each obtained by adding an offset potential, which is variable according to a measured gap, to the retarding potential to be applied to the inspection substrate, and an electron optical system to irradiate the inspection substrate with electron beams, in the state where the retarding potential has been applied to the inspection substrate and the corresponding potential of the potentials has been individually applied to each of the plurality of electrodes.

Abstract: An electron microscope includes: a laser light source configured to generate a CW laser; an irradiation lens system configured to irradiate a measurement sample with the CW laser; an energy analyzer configured to disperse, depending on energy, photoelectrons emitted from the measurement sample by irradiation with the CW laser; an energy slit configured to allow a photoelectron with a specified energy to pass, among the photoelectrons; an electron beam detector configured to detect the photoelectron passed through the energy slit; a first electron lens system configured to focus the photoelectrons emitted from the measurement sample onto the energy analyzer; and a second electron lens system configured to project the photoelectron passed through the energy slit onto the electron beam detector.

Abstract: A method and system for controlling neural activity in the brain, including performing a source localization procedure and a neurostimulation procedure, and using the former as a monitor to provide for feedback control of the latter.