Abstract: Embodiments disclosed herein include methods for performing intensity-modulated radiation therapy on a subject using a plurality of pencil beams. The methods can include generating a treatment plan for intensity-modulated radiation therapy that satisfies dose constraints for each of a plurality of sub-volumes. The treatment plan can be generated using a superiorization technique that reduces total variation in dose space. Additional dose-volume constraints that permit a fraction of treatment doses to violate a prescription by up to a defined percentage of intensity can be used to assist in determining the treatment plan.

Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.

Abstract: A probe system including a probe with first and second arms and a probe tip carried by the first and second arms, the probe tip having a height and a tilt angle; an illumination system arranged to deform the probe by illuminating the first arm at a first actuation location and the second arm at a second actuation location each with a respective illumination power; and an actuation controller arranged to independently control the illumination power at each actuation location in order to control the height and tilt angle of the probe tip.

Abstract: An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).

Abstract: A scanning charged particle microscope apparatus includes image quality improvement unit which performs an image quality improvement process on image data which is obtained by detecting particles generated from a sample, the image quality improvement unit divides a region in which the image data is acquired into two or more regions on the basis of a distance from a region in which the image data within a visual field of a charged particle optical unit is not acquired, determines an image quality improvement processing method and a processing parameter for image quality improvement for the image data in each of the separate regions according to the separate regions; and performs an image quality improvement process on the image data in each of the separate regions by using the determined processing method and processing parameter corresponding to the separate region.

Abstract: Probe tip formation is described for die sort and test. In one example, the tips of wires of a test probe head are prepared for use as test probes. The wires are attached to a test probe head substrate. The end opposite the substrate has a tip. The tips of the wires are polished when attached to the test probe head to form a sharpened point.

Abstract: To improve the workability of the task of adjusting the position of a limit field diaphragm. An electron microscope provided with an image-capturing means for capturing an image of an observation visual field prior to insertion of a limit field diaphragm as a map image, a recording means for recording the map image, an extraction means for capturing an image of the observation visual field after insertion of the limit field diaphragm and extracting the outline of the diaphragm, a drawing means for drawing the outline on the map image, and a display means for displaying the image drawn by the drawing means.

Abstract: An improved spectroscopic analysis apparatus and method are disclosed, comprising directing a beam of radiation onto a measurement location on a specimen, thereby causing a flux of X-rays to emanate from this location; examining the X-ray flux using a detector arrangement, thus acquiring a spectrum; choosing a set of different measurement directions originating from the location; recording outputs from the detector arrangement for different measurement directions; adopting a spectral model that is a convoluted mix of terms B and Lp, where B is the Bremsstrahlung background spectrum and Lp comprises spectral lines corresponding to the specimen composition at the measurement location; and then automatically deconvolving the set of measurements on the basis of the spectral model to calculate Lp to determine the chemical composition of the specimen at the measurement location. The method includes corrections for differential X-ray absorption within the specimen along the different measurement directions.

Abstract: An inspection system that includes charged particle optics that irradiate a bottom of a hole with a charged particle beam propagated along an optical axis, an energy dispersive x-ray detector and a processor. The x-ray detector detects x-ray photons emitted from the bottom of the hole and generates detection signals indicative of the x-ray photons. The processor processes the detection signals to provide an estimate of the bottom of the hole.

Abstract: The purpose of the present invention is to provide a pattern measurement device for quantitatively evaluating a pattern formed using a directed self-assembly (DSA) method with high accuracy. The present invention is a pattern measurement device for measuring distances between patterns formed in a sample, wherein the centroids of a plurality of patterns included in an image are determined; the inter-centroid distances, and the like, of the plurality of centroids are determined; and on the basis of the inter-centroid distances, and the like, of the plurality of centroids, a pattern meeting a specific condition is distinguished from patterns different from the pattern meeting the specific condition or information is calculated about the number of the patterns meeting the specific condition, the size of an area including the patterns meeting the specific condition, and the number of imaginary lines between the patterns meeting the specific condition.

Abstract: A signal charged particle deflection device for a charged particle beam device is provided. The signal charged particle deflection device includes a beam bender configured for deflecting the signal charged particle beam, wherein the beam bender includes a first electrode and a second electrode providing an optical path for the signal charged particle beam therebetween, wherein the first electrode has a first cross section in a plane perpendicular to the optical path, and the second electrode has a second cross section in the plane perpendicular to the optical path, and wherein a first part of the first cross section and a second part of the second cross section provide the optical path therebetween, and wherein the first part and the second part are different in shape.

Abstract: A method of forming a sample and performing correlative S/TEM and APM analysis is provided wherein a sample containing a region of interest is cut from a bulk of sample material and formed into an ultra-thin lamella. The lamella is then analyzed with an S/TEM to form an image. The lamella sample and mount may then go through a cleaning process to remove any contamination. The lamella containing the ROI is then embedded within a selected material and is formed into a needle-shaped sample. The needle-shaped sample is then analyzed with the APM and the resulting data is merged and correlated with the S/TEM data.

Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.

Abstract: The present invention discloses an e-beam inspection tool, and an apparatus for detecting defects. In one aspect is described an apparatus for detecting defects that includes a focusing column that accelerates the e-beam and separately, for each of the plurality of predetermined locations, focuses the e-beam to a predetermined non-circular spot that is within the predetermined surface area of each of the plurality of predetermined locations based upon the major axis.

Abstract: Provided is a method of computing precise disparity using a stereo matching method based on developed census transform with an adaptive support weight method in area based stereo matching. The method includes a step of setting an adaptive support weight window centered on a specific point of a left image and setting adaptive support weight windows with the same size with respect to one point positioned within a maximum disparity prediction value about a specific point of the left image in a right image.

Abstract: Transmission electron microscopes (TEMs) are being utilized more often in failure analysis labs as processing nodes decrease and alternative device structures, such as three dimensional, multi-gate transistors, e.g., FinFETs (Fin Field Effect Transistors), are utilized in IC designs. However, these types of structures may confuse typical TEM sample (or “lamella”) preparation as the resulting lamella may contain multiple potentially faulty structures, making it difficult to identify the actual faulty structure. Passive voltage contrast may be used in a dual beam focused ion beam (FIB) microscope system including a scanning electron microscope (SEM) column by systematically identifying non-faulty structures and milling them from the lamella until the faulty structure is identified.

Abstract: The present invention discloses a combination of two existing approaches for mineral analysis and makes use of the Similarity Metric Invention, that allows mineral definitions to be described in theoretical compositional terms, meaning that users are not required to find examples of each mineral, or adjust rules. This system allows untrained operators to use it, as opposed to previous systems, which required extensive training and expertise.

Abstract: A method for diagnosing a defect is provided. A first candidate pair comprises a first defect candidate and a second defect candidate. A first pattern is generated to distinguish one or more faults of the first defect candidate from one or more faults of the second defect candidate. The first defect candidate is removed responsive to determining that the first pattern does not detect the first defect candidate and determining that an automatic test equipment (ATE) failure log associates the first pattern with failure. Removing the first candidate pair, as well as additional candidate pairs when possible, promotes diagnosis efficiency by reducing a number of computations required.

Abstract: An image inspection apparatus includes: a light source configured to emit white light onto a test image formed on a paper sheet; an optical lens system configured to receive light reflected by the paper sheet, the reflected light being of the white light emitted from the light source; a separating unit configured to separate light having passed through the optical lens system; a reading unit configured to receive the separated light at the different wavelengths, and optically read the test image of the light; and a control unit configured to calculate edge blurs at a rising edge and a falling edge of each set of image data of the light obtained by the reading unit reading the test image, calculate widths of the test image, and determine the width calculated from the set of image data having the smallest edge blur to be the width of the test image.

Abstract: Provided are a device and a method allowing a crystal orientation to be adjusted with adequate throughput and high precision to observe a sample, regardless of the type of the sample or the crystal orientation. In the present invention, the method comprises: setting a fitting circular pattern (26) displayed overlaid so that a main spot (23) is positioned on the circumference thereof, on the basis of the diffraction spot brightness distribution in an electron diffraction pattern (22b) displayed on a display unit (13); setting a vector (28) displayed with the starting point at the center position (27) of the displayed circular pattern (26), and the end point at the location of the main spot (23) positioned on the circumference of the circular pattern (26); and adjusting the crystal orientation on the basis of the orientation and the magnitude of the displayed vector (28).

Abstract: The present invention relates to sample holders for holding a sample, particularly for an atomic force microscope. Such a sample holder comprising a sample dish (1) comprising a bottom (2), and an opening (3) arranged in said bottom (2) for receiving and holding the sample (15). Furthermore the present invention relates to a sample holder system and to a method for transferring an e.g. biological sample (15) from a biopsy tool (18) to a sample holder.

Abstract: An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the second and first electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the second and first electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

Abstract: A charged particle beam device allowing an analysis position in a sample analyzable with an EBSD detector to be acquired beforehand, and allowing a sample to be adjusted to a desired analysis position in a short time. A charged particle beam device is provided with a charged particle source (111), a charged particle optical system (115), an EBSD detector (101), a sample stage (116), an image display unit (117) for displaying a portion of the sample observable with the EBSD detector and a non-observable portion of the sample such that said portions are distinguished from each other, an operation input unit (121) where a position to be observed by the EBSD detector is entered, and a control unit (118) for controlling a planar movement, an inclination movement and a rotation movement of the sample stage so as to allow the observation position entered from the operation input unit to be observed with the EBSD detector.

Abstract: A method and apparatus are provided for identifying a material with a sample-specific reference spectral list or library. A sequential approach to SEM-EDS automated mineralogy classification is carried out by performing two or more material classification analyses. A pre-classification step restricts the processing of spectra deconvolution algorithms to a subset of spectra that pass a dominant mineral criteria resulting in a significantly reduced subset of reference spectra that occur within the measured sample in pure enough form at a given minimum quantity. The following complex classification stages involving deconvolution of multiple constituents within measured spectra is based on this sample relevant subset.

Abstract: A tomography accessory device for supporting a sample relative to the imaging assembly of a microscope has an electric positioning motor supported on the existing sample supporting stage of the microscope. An output shaft of the positioning motor is supported for rotation about an output axis parallel to a plane of the stage and a controller acts to control the motor so as to rotate the output shaft between a plurality of different angular positions about the output axis. An adjustable assembly supports a sample holder relative to the outer shaft such that i) the sample holder is translatable relative to the output shaft along at least one translation axis oriented generally perpendicularly to the output axis, and ii) the sample holder is pivotable relative to the output shaft about at least two pivot axes which are transverse to one another and which are generally perpendicular to the output axis.

Abstract: A method for generating cross-sectional profiles using a scanning electron microscope (SEM) includes scanning a sample with an electron beam to gather an energy-dispersive X-ray spectroscopy (EDS) spectrum for an energy level to determine element composition across an area of interest. A mesh is generated to locate positions where a depth profile will be taken. EDS spectra are gathered for energy levels at mesh locations. A number of layers of the sample are determined by distinguishing differences in chemical composition between depths as beam energies are stepped through. A depth profile is generated for the area of interest by compiling the number of layers and the element composition across the mesh.

Abstract: A facial expression control system, a facial expression control method, and a computer system thereof are disclosed. The facial expression control system includes a face detection module, a database, and a processing module. The face detection module is used for determining whether a facial expression feature is detected in a captured image. The database is used for storing a control parameter table, wherein the control parameter table is corresponding to the facial expression feature. If the face detection module detects the facial expression feature, the control parameter table of the database is accessed according to the facial expression feature to get an encode signal and transmitted to the processing module. The processing module is used for generating a control signal according to the encode signal.

Abstract: An analysis apparatus includes a two-dimensional coordinate detecting unit and a three-dimensional coordinate determining unit. The two-dimensional coordinate detecting unit is configured to detect, with respect to a captured image group obtained by capturing an analysis specimen including an analysis target object at a plurality of focal depths, a two-dimensional coordinate candidate being a candidate of a plane coordinate of the analysis target object in each captured image. The three-dimensional coordinate determining unit is configured to determine, based on a position relationship of the plane coordinate candidates between the captured images, a three-dimensional coordinate candidate being a candidate of a three-dimensional coordinate of the analysis target object.

Abstract: Beforehand, the device characteristic patterns of each critical dimension SEM are measured, a sectional shape of an object to undergo dimension measurement is presumed by a model base library (MBL) matching system, dimension measurements are carried out by generating signal waveforms through SEM simulation by inputting the presumed sectional shapes and the device characteristic parameters, and differences in the dimension measurement results are registered as machine differences. In actual measurements, from the dimension measurement results in each critical dimension SEM, machine differences are corrected by subtracting the registered machine differences. Furthermore, changes in critical dimension SEM's over time are monitored by periodically measuring the above-mentioned device characteristic parameters and predicting the above-mentioned dimension measurement results. According to the present invention, actual measurements of machine differences, which require considerable time and effort, are unnecessary.

Abstract: A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

Abstract: A system that may include a first mechanical stage, a second mechanical stage, charged particle beam optics and a controller. The system may charge, with a charged particle beam, a slice of the object. During the charging of the slice the first mechanical stage may introduce a first movement along a first direction, between the object and charged particle beam optics. The charged particle beam optics may scan the slice with the charged particle beam. The scanning of the slice includes performing, by the charged particle optics, a first counter-movement deflection of the charged particle beam to at least partially counter the first movement. The second mechanical stage is configured to introduce a second movement along a second direction, between the object and the charged particle beam optics. Upon a completion of the charging of the slice, the second mechanical stage is configured to perform a first flyback operation.

Abstract: Proposed is a charged particle beam device including an arithmetic processing unit that generates an image of a sample, based on a detection signal that is detected based on irradiation to the sample with a charged particle beam emitted from a charged particle source. The arithmetic processing unit searches a second image as a search target image with use of a first image as a template, and when a region corresponding to the first image is not detected in the second image, the arithmetic processing unit searches a third image that represents a region larger than a region displayed in the second image, with use of a second template.

Abstract: The present invention pertains to a method and device for quantitatively evaluating the degree and characteristics of wiggling, which is a phenomenon that occurs in electronic device fabrication processes and consists of the deformation in the same shape of the left and right edges of fine line patterns, and takes advantage of the fact that this wiggling is included in measured values for line edge variation but not line width variation by acquiring the differences between these values. Further, the present invention is configured so as to calculate line center positions and use the distribution of the deviation from the average line center position as an indicator. Additionally, the present invention is configured to quantify wiggling characteristics by outputting a coefficient of wiggling correlation between lines or a wiggling component synchronized between lines as an indicator.

Abstract: An IC includes logic cells, selected from a standard cell library, and fill cells, configured for compatibility with the standard logic cells. The fill cells contain structures configured to obtain in-line data via non-contact electrical measurements (“NCEM”). The IC includes such NCEM-enabled fill cells configured to enable detection and/or measurement of a variety of open-circuit and short-circuit failure modes, including at least one via-open-related failure mode, one AACNT-short-related failure mode, one TS-short-related failure mode, and one metal-short-related failure mode.

Abstract: The present invention relates to a biomolecular measurement system (1), which enables to measure the intermolecular forces arising from the interaction between two biomolecules or the intramolecular forces within a single biomolecule by using an atomic force microscope (AFM). In the present invention, the cantilever (2) is moved only when the actuator (4) moves the magnetic nanowire (3) and thus moves the molecule attached to the end of the magnetic nanowire (3). Since the cantilever (2) is not moved, fluctuation and disturbance is not created in the liquid containing the biomolecules. Thus, the measurements are made more accurately and with higher resolution. Additionally, by means of the actuator (4), the biomolecules are enabled to be moved upon exertion of magnetic force at any coordinate on x, y and z axes on the nanowire (3), or exertion of torque on two axes.

Abstract: Exemplary embodiments of systems and methods can be provided which can generate data associated with at least one portion of a sample. For example, at least one first radiation can be forwarded to the portion through at least one optical arrangement. At least one second radiation can be received from the portion which is based on the first radiation. Based on an interaction between the optical arrangement and the first radiation and/or the second radiation, the optical arrangement can have a first transfer function. Further, it is possible to forward at least one third radiation to the portion through such optical arrangement (or through another optical arrangement), and receive at least one fourth radiation from the portion which is based on the third radiation. Based on an interaction between the optical arrangement (or the other optical arrangement) and the third radiation and/or the fourth radiation, the optical arrangement (or the other optical arrangement) can have a second transfer function.

Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage.

Abstract: An e-Petri dish comprising a transparent layer having a specimen surface and a light detector configured to sample a sequence of sub-pixel shifted projection images of a specimen located on the specimen surface. The sub-pixel shifted projection images associated with light from a plurality of illumination angles provided by an illumination source.

Abstract: The present invention provides an SPR sensor cell having very excellent detection sensitivity, the SPR sensor cell including: an under-cladding layer; a core layer formed so that at least a part of the core layer is adjacent to the under-cladding layer; and a metal layer covering the core layer. In the SPR sensor cell, the core layer includes a uniform refractive index layer and a graded refractive index layer. The graded refractive index layer is arranged between the uniform refractive index layer and the metal layer. A refractive index of the graded refractive index layer is equal to or more than a refractive index of the uniform refractive index layer, and the refractive index of the graded refractive index layer increases continuously from a surface thereof on a uniform refractive index layer side to the metal layer side in a thickness direction of the graded refractive index layer.

Abstract: A chip for plasma generation, a plasma generator, and a plasma spectrometry method are described, having high reproducibility of plasma light emission without a requirement of a discharge unit for removing air bubbles, wherein the chip includes a channel comprising a first region, a narrow portion, and a second region, where the narrow portion is in communication with the first region and the second region and has a cross-sectional area smaller than the first region and the second region.

Abstract: A method for generating cross-sectional profiles using a scanning electron microscope (SEM) includes scanning a sample with an electron beam to gather an energy-dispersive X-ray spectroscopy (EDS) spectrum for an energy level to determine element composition across an area of interest. A mesh is generated to locate positions where a depth profile will be taken. EDS spectra are gathered for energy levels at mesh locations. A number of layers of the sample are determined by distinguishing differences in chemical composition between depths as beam energies are stepped through. A depth profile is generated for the area of interest by compiling the number of layers and the element composition across the mesh.

Abstract: Systems and methods for monitoring turbine component deformation are provided. The turbine component has an exterior surface. A method includes directly measuring a strain sensor configured on the exterior surface of the turbine component along an X-axis, a Y-axis and a Z-axis to obtain X-axis data points, Y-axis data points, and Z-axis data points. The X-axis, Y-axis and Z-axis are mutually orthogonal. The method further includes assembling a three-dimensional profile of the strain sensor based on the X-axis data points, Y-axis data points and Z-axis data points.

Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.

Abstract: A method and apparatus for mapping an electronic device. The electronic device is loaded into a test fixture, which may be an automated test equipment (ATE). A laser beam is stepped across locations of interest. At each location of interest a minimum voltage and/or maximum frequency are computed. A contour map of the changes in minimum voltage and maximum frequency across a field of view of the electronic device is generated. Additional embodiments provide signaling a laser scan module during the rising edge of a synchronization pulse to indicate that minimum voltage (Vmin) and maximum frequency (Fmax) specification search data is provided to a laser voltage probe. A Vmin/Fmax module compares the specification search data with the data read from the laser voltage probe and computes a parameter shift value. The laser beam is moved to another location when the falling edge of the synchronization pulse occurs.

Abstract: A method and device for characterizing a DC parameter of a SRAM device based on TDCD are provided.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use patterns generated using the Hadamard transform as alignment and registration marks (Hadamard targets) for multiple-column charged particle beam lithography and inspection tools. Further, superior substrate alignment and layer-to-layer pattern registration accuracy can be achieved using Hadamard targets patterned in edge-proximal portions of the substrate that are typically stripped bare of resist prior to lithography, in addition to Hadamard targets patterned in inner substrate portions. High-order Hadamard targets can also be patterned and imaged to obtain superior column performance metrics for applications such as super-rapid beam calibration DOE, column matching, and column performance tracking. Superior alignment and registration, and column parameter optimization, allow significant yield gains.

Abstract: An improved mode of AFM imaging (Peak Force Tapping (PFT) Mode) uses force as the feedback variable to reduce tip-sample interaction forces while maintaining scan speeds achievable by all existing AFM operating modes. Sample imaging and mechanical property mapping are achieved with improved resolution and high sample throughput, with the mode workable across varying environments, including gaseous, fluidic and vacuum.

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.

Abstract: Compressive sensing based video rate imaging techniques are presented. Rather than scan the entire image, the imaging system only scans part of the topography of the sample as a compressed scan. After the data has been collected, an algorithm for image reconstruction is applied for recovering the image. Because compressive sensing is used, the imaging rate is increased from several minutes per frame to seconds per frame. Non-vector space control techniques are also presented. No-vector space control use image or compressive data as the input and feedback to generate a closed-loop motion control. Compressive sensing technique provides an efficient data reduction method to retain the essential information in the original image. The non-vector space control method can be used as motion control method with compressive feedback without or with noise.