Ultraviolet Light Source Patents (Class 250/365)
  • Patent number: 10345714
    Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: July 9, 2019
    Assignee: Cymer, LLC
    Inventors: Thomas Frederick Allen Bibby, Jr., Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey
  • Patent number: 10203247
    Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: February 12, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Gregory R. Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick A. Shaughnessy, Anatoly Shchemelinin, Ilya Bezel, Muzammil A. Arain, Anatoly A. Vasiliev, James Andrew Allen, Oleg Shulepov, Andrew V. Hill, Ohad Bachar, Moshe Markowitz, Yaron Ish-Shalom, Ilan Sela, Amnon Manassen, Alexander Svizher, Maxim Khokhlov, Avi Abramov, Oleg Tsibulevsky, Daniel Kandel, Mark Ghinovker
  • Patent number: 10117958
    Abstract: An apparatus for destroying pathogens includes a platform and an LED matrix panel. The platform has a portion configured to permit passage of ultraviolet light therethrough. The LED matrix panel is disposed below the portion of the platform and includes a grid and a plurality of discreetly-controlled, ultraviolet light LEDs (UV LEDs). The grid defines a plurality of cells. Each UV LED is associated with one cell such that the cells direct the ultraviolet light emitted by the UV LEDs upwardly through the portion of the platform to sanitize an object supported on the portion of the platform.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: November 6, 2018
    Assignee: Harbor Innovations, LLC
    Inventors: Rachel Dombrowsky, Christopher Montalbano, Andrew Martin, Philip Beamer
  • Patent number: 9801965
    Abstract: A solution for disinfecting flowable products, such as liquids, suspensions, creams, colloids, emulsions, powders, and/or the like, as well as accessories and products relating thereto, such as containers, caps, brushes, applicators, and/or the like, using ultraviolet radiation is provided. In an embodiment, an ultraviolet impermeable cap is configured to enclose a volume corresponding to a flowable product. At least one ultraviolet radiation source can be mounted on the cap and be configured to generate ultraviolet radiation for disinfecting the enclosed area. The ultraviolet radiation source can be configured to only generate ultraviolet radiation when the volume is enclosed by the ultraviolet impermeable cap.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: October 31, 2017
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Timothy James Bettles, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
  • Patent number: 9772714
    Abstract: This disclosure provides methods and systems for mitigating pathogen transmission via a touch surface of a touch input device. Mitigation is accomplished through selective touch surface sterilization and through touchscreen user interface reorganization. The touch surface includes a pixel array for illuminating selected portions of the touch surface with ultraviolet light of a sterilization wavelength based upon the received touch inputs. The selective illumination may occur while receiving a touch input or after an accumulation of touch inputs have been received. The user interface may also be reorganized based on received touch inputs in order to locate user interface icons to lesser touched locations of the touch surface.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: September 26, 2017
    Assignee: International Business Machines Corporation
    Inventors: Guy Cohen, James R. Kozloski, Clifford A. Pickover
  • Patent number: 9665017
    Abstract: Various embodiments provide systems and methods for extreme ultraviolet (EUV) lithography light source. An exemplary system can include a laser radiation apparatus configured to provide laser radiation. The system can further include an EUV light excitation source material configured to receive the laser radiation to generate an EUV light. The laser radiation can generate droplets from the EUV light excitation source material. The system can further include a collector configured to collect the EUV light. The collector can include a plurality of reflective mirrors surrounding the EUV light excitation source material. The plurality of reflective mirrors can be movable. The collector can further include a mirror control system synchronized with the laser radiation apparatus and configured to set the plurality of reflective mirrors to be in one of a reflective state for reflecting the EUV light and a non-reflective state for preventing contamination by the droplets.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: May 30, 2017
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Emily Shu
  • Patent number: 9579410
    Abstract: The present invention relates to a self-powered, footwear sanitizing system configured to substantially neutralize biological contaminants on the soles of shoes when a wearer of the shoes steps onto the system, the system has a method to generate sanitizing radiation of 254 nm (UVC), a means for delivering sanitizing radiation from the mat to the underside of a wearer's shoes and a piezo-electric or mechano-luminescence generator to power the system.
    Type: Grant
    Filed: June 5, 2015
    Date of Patent: February 28, 2017
    Inventors: Corinne K. Simmons, James A. Brunner
  • Patent number: 9546964
    Abstract: A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: January 17, 2017
    Assignee: THE INSTITUTE OF MICROELECTRONICS OF CHINESE ACADEMY OF SCIENCES
    Inventors: Hailiang Li, Changqing Xie, Ming Liu, Dongmei Li, Jiebin Niu, Lina Shi, Xiaoli Zhu
  • Patent number: 9470985
    Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: October 18, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Fabrizio Evangelista, Derk Jan Wilfred Klunder, Cornelis Cornelia De Bruijn
  • Patent number: 9448179
    Abstract: A gas analyzing apparatus includes a gas analyzing unit, a luminescence inducing component generating unit, and a measurement signal calculating unit. The gas analyzing unit receives a sample gas containing a component gas and/or a standard gas and the luminescence inducing gas. The gas analyzing unit is configured to output a detection signal based on an intensity of a reaction light generated by the interaction between the component gas and the luminescence inducing component. The luminescence inducing component generating unit generates the luminescence inducing gas by electric discharge generated repeatedly at specified intervals. The measurement signal calculating unit calculates a first measurement signal based on a first detection signal, based on the reaction light generated when the sample gas and the luminescence inducing gas are introduced, and a second detection signal, based on the reaction light generated when the standard gas and the luminescence inducing gas are introduced.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: September 20, 2016
    Assignee: HORIBA, LTD.
    Inventors: Yusuke Mizuno, Takuji Oida, Misato Arakawa
  • Patent number: 9421738
    Abstract: A method of producing electrons via photoemission comprising providing diamond doped p-type with boron, treating a surface of the diamond by exposing it to atomic hydrogen inside an ultrahigh vacuum chamber, illuminating the surface with photons, and extracting the photoemitted electrons. A chemically stable visible light photoemission electron source comprising a diamond film having a surface terminated with hydrogen and a light source.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: August 23, 2016
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Jonathan L. Shaw, Jeremy Hanna
  • Patent number: 9354327
    Abstract: Radiation detection is disclosed. A radiation detection package includes a radio-photoluminescent glass (RPLG), an EMR source and a photodetector. The EMR source includes an input lead, and is configured to emit first energy in a predetermined band of EMR in a downstream direction toward the RPLG in response to receipt of an input signal on the input lead of the EMR source. The photodetector has an output lead, and is configured to detect second energy that is emitted by the RPLG in an emission band of EMR in response to the receipt of the first energy in the predetermined band of EMR, and generate a first output signal on the output lead indicative of an amount of the second energy.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: May 31, 2016
    Assignee: Lockheed Martin Corporation
    Inventors: David P. Summerlot, Matthew W. Kelley, Joseph M. Turchiano
  • Patent number: 9301380
    Abstract: A laser-produced plasma extreme ultraviolet source has a buffer gas to slow ions down and thermalize them in a low temperature plasma. The plasma is initially trapped in a symmetrical cusp magnetic field configuration with a low magnetic field barrier to radial motion. Plasma overflows in a full range of radial directions and is conducted by radial field lines to a large area annular array of beam dumps.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: March 29, 2016
    Assignee: PLEX LLC
    Inventor: Malcolm W. McGeoch
  • Patent number: 9228225
    Abstract: The invention provides a novel class of xanthene dyes, some of which are functionalized to allow their coupling to conjugation partners of interest, e.g. biomolecules, drugs, toxins and the like. Also provided are conjugates of the dyes, methods of preparing and using the dyes and their conjugates and kits including the dyes and their conjugates.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: January 5, 2016
    Assignee: BIOSEARCH TECHNOLOGIES, INC.
    Inventors: Mark Reddington, Matt Lyttle
  • Patent number: 9006680
    Abstract: A solution for disinfecting flowable products, such as liquids, suspensions, creams, colloids, emulsions, powders, and/or the like, as well as accessories and products relating thereto, such as containers, caps, brushes, applicators, and/or the like, using ultraviolet radiation is provided. In an embodiment, an ultraviolet impermeable cap is configured to enclose a volume corresponding to a flowable product. At least one ultraviolet radiation source can be mounted on the cap and be configured to generate ultraviolet radiation for disinfecting the enclosed area. The ultraviolet radiation source can be configured to only generate ultraviolet radiation when the volume is enclosed by the ultraviolet impermeable cap.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: April 14, 2015
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Timothy James Bettles, Alexander Dobrinsky, Michael Shur, Remigijus Gaska
  • Patent number: 8975605
    Abstract: This specification relates to an improved method, process and apparatus for disinfecting and sterilizing all types of surfaces and indoor air and room air contaminated with microorganisms. The improved apparatus consists of a multi-wavelength narrow spectral width UV source that is more effective than mercury based 254 nm germicidal lamps for destroying the DNA and outer shell or membrane of virus, bacteria, spores and cists.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: March 10, 2015
    Inventor: S. Edward Neister
  • Patent number: 8974871
    Abstract: A curing machine to cure a UV-curable adhesive adhering on a workpiece, the workpiece having a slot thereon and a hole on a sidewall of the slot. The hole receives the UV-curable adhesive, the curing machine can include a curing mechanism. The curing mechanism can include a base plate holding a curing assembly and the curing assembly can include a holding member, at least one UV lamp being coupled to the holding member. Axis of the at least one UV lamp can intersect with the holding member at an angle of less than 90 degrees. A workpiece being positioned on the base plate, the UV lamp can irradiate directly an inside or an outside of a sidewall through the hole in the sidewall of the slot.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: March 10, 2015
    Assignees: Fu Ding Electronical Technology (Jiashan) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventors: Jun-Min Fei, Huo-Zhong Wu, Jian-Hua Xu
  • Patent number: 8977796
    Abstract: Disclosed is a disinfecting docking station for at least one portable electronic device, such as a medical technician's tablet computer, that has at least one recharging connector. An enclosure is adapted to receive the at least one portable electronic device therein through an openable side that includes a selectively closable door. Each electronic device is exposed to a disinfecting wavelength of light, such as UV light, to disinfect the surface of the device. The enclosure includes supports that minimally contact each device so that the device will be substantially exposed to the UV light. A control circuit monitors the exposure time and level, and is programmable to activate the UV light based on pre-set criteria. The enclosures may be stacked and provide power and network connectivity to each device while docked therein.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: March 10, 2015
    Assignee: Readydock, Inc.
    Inventors: David G. Engelhardt, William A. Saimond
  • Patent number: 8933417
    Abstract: A lens and reflector unit for optical measurements includes first and second convex surface sections of the lens and reflector unit. Both have their respective central normal lines. A first flat surface section has a normal direction that divides the angle between the central normal lines into equal halves. A third convex surface section has a third central normal line, and the fourth convex surface section has a fourth central normal line. A second flat surface section has a normal direction that divides the angle between the third and fourth central normal lines into to equal halves.
    Type: Grant
    Filed: January 18, 2010
    Date of Patent: January 13, 2015
    Assignee: Wallac Oy
    Inventor: Pauli Salmelainen
  • Publication number: 20150001405
    Abstract: There is provided a particle detector that detects biogenic particles with high sensitivity. The particle detector includes a collecting member having a principal surface and configured to electrostatically collect particles on the principal surface, an irradiation unit configured to irradiate the particles collected on the principal surface with excitation light, a light receiving unit configured to receive fluorescence emitted from the particles by irradiation of the particles with the excitation light, and a detection unit configured to detect biogenic particles from the particles collected on the principal surface on the basis of a fluorescence intensity in the light receiving unit. The particle detector further includes a filter disposed between the principal surface and the light receiving unit cut light with a wavelength emitted by irradiation of the excitation light from a substance that is generated on the principal surface when the particles are electrostatically collected.
    Type: Application
    Filed: November 30, 2012
    Publication date: January 1, 2015
    Inventors: Hideaki Fujita, Haruki Kamiyama, Tomonori Kamo, Akihiro Suzuki
  • Patent number: 8901524
    Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: December 2, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Takeshi Asayama, Kouji Kakizaki, Akira Endo, Shinji Nagai
  • Patent number: 8895947
    Abstract: An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz or rock crystal; and a Pr:LuAG polycrystalline film 22, provided on the substrate 21, that generates ultraviolet light upon receiving an electron beam. By using a Pr:LuAG polycrystal as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.
    Type: Grant
    Filed: April 24, 2012
    Date of Patent: November 25, 2014
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Yoshinori Honda, Fumitsugu Fukuyo, Takashi Suzuki, Norio Ichikawa, Takeaki Hattori, Koji Kawai, Shucheng Chu
  • Patent number: 8872126
    Abstract: A target supply device 4 may include a tank 51, formed of a metal, that holds a target material, an insulating member 62 that makes contact with at least part of the periphery of the tank 51, and a heater 58 that is separated from the tank 51 and heats the tank 51 via the insulating member 62.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: October 28, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Umeda, Toshiyuki Hirashita
  • Patent number: 8872131
    Abstract: Some aspects of the invention may be related to an ultraviolet (UV) water disinfection system and a method of assembling such system. The system may be designed to treat, inactivate, disintegrate and/or remove at least two predetermined different types of contaminations. The system may include a chamber to carry the water containing the predetermined types of contaminations. The system may further include one or more first-type UV lamps having a first UV emission spectrum and one or more second-type UV lamps having a second UV emission spectrum different than the first spectrum. A location of the one or more first-type UV lamps and the one or more second-type UV lamps may be determined such that a combined UV impact function matches with a combined sensitivity response function of the two or more predetermined different types of contaminations in the water each having a different response function.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: October 28, 2014
    Assignee: Atlantium Technologies Ltd.
    Inventors: Ytzhak Rozenberg, Mike Kertser, Tovit Lichi, Zohar Vardiel, Itay Kreisel
  • Patent number: 8866111
    Abstract: A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
    Type: Grant
    Filed: July 4, 2012
    Date of Patent: October 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Johan Frederik Dijksman
  • Patent number: 8857465
    Abstract: The invention relates to a method for realizing a vacuum in at least one vacuum chamber. The method comprises providing an arrangement comprising a plurality of vacuum chambers, wherein each vacuum chamber is connected to a shared vacuum system. The shared vacuum system comprises a plurality of turbo molecular pumps, at least one common fore pump, and a piping system comprising one or more pipes for connecting the at least one common fore pump to each of the plurality of turbo molecular pumps. Each turbo molecular pump is separately connected to a corresponding vacuum chamber. The piping system further comprises flow regulators for controlling a flow within the piping system. The method further comprises selecting at least one vacuum chamber for pump-down, and separately pumping down the at least one selected vacuum chamber by means of the shared vacuum system.
    Type: Grant
    Filed: January 2, 2013
    Date of Patent: October 14, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventor: Sander Baltussen
  • Patent number: 8853657
    Abstract: A regenerative ring resonator in the path of a light beam includes a discharge chamber having electrodes and a gain medium between the electrodes; an optical coupler that is partially reflective so that at least a portion of a light beam impinging on the optical coupler from the discharge chamber is reflected back through the discharge chamber and at least a portion of the light beam impinging on the optical coupler from the discharge chamber is transmitted through the optical coupler; and an attenuation optical system in the path of the light beam within the resonator, the attenuation optical system having a plurality of distinct attenuation states, with each attenuation state defining a distinct attenuation factor applied to the light beam to provide adjustment of an energy of the light beam.
    Type: Grant
    Filed: July 28, 2012
    Date of Patent: October 7, 2014
    Assignee: Cymer, LLC
    Inventors: Robert J. Rafac, Rostislav Rokitski
  • Patent number: 8847182
    Abstract: The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 30, 2014
    Assignee: TRUMPF Laser— und Systemtechnik GmbH
    Inventors: Martin Lambert, Andreas Enzmann
  • Patent number: 8841641
    Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: September 23, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Kouji Kakizaki, Shinji Nagai, Tatsuya Yanagida
  • Patent number: 8785892
    Abstract: Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
    Type: Grant
    Filed: June 11, 2012
    Date of Patent: July 22, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander I. Ershov, Igor V. Fomenkov
  • Patent number: 8785895
    Abstract: A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: July 22, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Umeda, Taku Yamazaki, Hakaru Mizoguchi, Toshihiro Nishisaka
  • Patent number: 8779403
    Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: July 15, 2014
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Dong-Gun Lee, Eok-Bong Kim, Jong-Ju Park, Seong-Sue Kim
  • Patent number: 8772744
    Abstract: UV-C light assembly is designed to kill germs (bacteria, molds, protozoa, virus, and yeast) in the forced airstreams of HVAC systems, thus preventing the spreading of germs into other rooms or spaces. An air-flow activated switch is invented for turning on the UV-C lights when airstreams pass through and turning off when airstreams stop in the HVAC systems. The UV-C light assembly is installed inside duct through air filter's opening. The UV-C germicidal assembly is an easy add-on to an existing HVAC system for indoor air purification. The UV-C light sources are either LEDs or fluorescent tubes.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: July 8, 2014
    Inventor: Benjamin Dengfa Liu
  • Patent number: 8748828
    Abstract: The present invention includes an interposer disposed on a surface of a substrate, a light sensing array sensor disposed on the interposer, the light sensing array sensor being back-thinned and configured for back illumination, the light sensing array sensor including columns of pixels, one or more amplification circuitry elements configured to amplify an output of the light sensing array sensor, the amplification circuits being operatively connected to the interposer, one or more analog-to-digital conversion circuitry elements configured to convert an output of the light sensing array sensor to a digital signal, the ADC circuitry elements being operatively connected to the interposer, one or more driver circuitry elements configured to drive a clock or control signal of the array sensor, the interposer configured to electrically couple at least two of the light sensing array sensor, the amplification circuits, the conversion circuits, the driver circuits, or one or more additional circuits.
    Type: Grant
    Filed: September 18, 2012
    Date of Patent: June 10, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: David L. Brown, Guowu Zheng, Yung-Ho Chuang, Venkatraman Iyer
  • Patent number: 8748829
    Abstract: An ultraviolet curing system separates the source of ultraviolet radiation and the controller, allowing an operator to stand at a relatively great distance away from the ultraviolet radiation when applied. The apparatus includes a base unit and a source of intense ultraviolet (UV) radiation coupled to the base unit by way of a pivoting arm. A controller, disposed remotely from the base unit, allows an operator to activate the source of UV radiation at a distance of at least several feet away from the source. The preferred embodiment allows an operator to control the UV radiation at a distance of 10 to 100 feet or more using a wired or wireless interconnection between the controller and the base unit. A detachable infrared lamp may be optionally disposed along side the UV source.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: June 10, 2014
    Inventor: Ronald Lipson
  • Patent number: 8742381
    Abstract: A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: June 3, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Martin Jacobus Johan Jak
  • Patent number: 8742380
    Abstract: A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: June 3, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Hideo Hoshino, Tatsuya Yanagida
  • Patent number: 8698112
    Abstract: An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: April 15, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Takayuki Yabu, Kouji Kakizaki, Takanobu Ishihara, Tamotsu Abe, Osamu Wakabayashi
  • Patent number: 8686370
    Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: April 1, 2014
    Assignee: Cymer, LLC
    Inventors: Norbert R. Bowering, Oleh V. Khodykin
  • Patent number: 8680496
    Abstract: A system for sanitizing an enclosed structure has a plurality of sensors, a germicidal ultraviolet light source, and a controller. A first sensor detects the presence of humans or animals within the enclosed structure, and a second sensor detects the position of at least one door of the enclosed structure. The ultraviolet light source provides electromagnetic radiation in the ultraviolet range. The controller receives inputs from the first and second sensors and instructs emission or cessation of emission of the electromagnetic radiation based on the received input.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: March 25, 2014
    Assignee: Elevated Health Systems, LLC
    Inventor: David G. Leben
  • Patent number: 8673157
    Abstract: The present invention relates to a reactor for the photocatalytic treatment of liquid or gaseous streams, which reactor comprises a tube through which the stream to be treated flows, wherein, in the tube, there are arranged at least one light source, at least one flat means M1 provided with at least one photocatalytically active material and at least one flat means M2 reflecting the light radiation radiated by the at least one light source, wherein the reflecting surface of the at least one means M2 and the inner wall of the tube are at an angle greater than or equal to 0°, in such a manner that the light exiting from the light source is reflected by the at least one means M2 onto the photocatalytically active material, and to a method for the photocatalytic treatment of liquid or gaseous streams by irradiation with light in the reactor according to the invention.
    Type: Grant
    Filed: September 13, 2010
    Date of Patent: March 18, 2014
    Assignee: BASF SE
    Inventors: Grigorios Kolios, Florina Corina Patcas, Goetz-Peter Schindler, Alexandra Seeber, Gerrit Waters
  • Patent number: 8669543
    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: March 11, 2014
    Assignee: Gigaphoton, Inc.
    Inventors: Tatsuya Yanagida, Osamu Wakabayashi
  • Patent number: 8629417
    Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: January 14, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Tamotsu Abe, Takanobu Ishihara, Osamu Wakabayashi
  • Patent number: 8610095
    Abstract: An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material. A target generating unit 120 injects molten tin in a droplet shape as a target 201 into a chamber 101. A protective coating provided with an erosion resistance property to tin is configured on a section that comes into contact with tin in a molten state for each face of a nozzle part 121 and a tank part 122. Alternatively, a part that comes into contact with tin in a molten state is made of a material provided with an erosion resistance property and a heat resistance property.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: December 17, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Takayuki Yabu, Takeshi Asayama, Fumika Yoshida, Osamu Wakabayashi
  • Patent number: 8606981
    Abstract: Disclosed is a disinfecting docking station for at least one portable electronic device, such as a medical technician's tablet computer, that has at least one recharging connector. An enclosure is adapted to receive the at least one portable electronic device therein through an openable side that includes a selectively closable door. Each electronic device is exposed to a disinfecting wavelength of light, such as UV light, to disinfect the surface of the device. The enclosure includes supports that minimally contact each device so that the device will be substantially exposed to the UV light. A control circuit monitors the exposure time and level, and is programmable to activate the UV light based on pre-set criteria. The enclosures may be stacked and provide power and network connectivity to each device while docked therein.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: December 10, 2013
    Assignee: ReadyDock, Inc.
    Inventors: David G. Engelhardt, Bill Saimond
  • Patent number: 8586954
    Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: November 19, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Takeshi Asayama, Kouji Kakizaki, Akira Endo, Shinji Nagai
  • Patent number: 8569723
    Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: October 29, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Tamotsu Abe
  • Patent number: 8563956
    Abstract: An attenuation optical system is in a beam path of a light beam traveling through a regenerative ring resonator. The attenuation optical system includes an actuator configured to receive an electromagnetic signal; and a plate mounted to the actuator to be moveable between a plurality of positions, with each position placing an attenuation region in the beam path such that the beam profile is covered by the attenuation region and each attenuation region representing an attenuation factor applied to the light beam as determined by a geometry of the attenuation region. At least one attenuation region includes a plurality of evenly-spaced elongated openings between solid energy-reflecting surfaces and at least one attenuation region includes an open area that is larger than the beam profile of the light beam.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: October 22, 2013
    Assignee: Cymer, LLC
    Inventors: John Melchior, Robert J. Rafac, Rostislav Rokitski
  • Patent number: 8558203
    Abstract: This invention provides for a removable/replaceable, wavelength-transforming sleeve/sheath to be placed around a primary UV radiation source that emits a primary UV wavelength spectral distribution; such that at least a portion of the sleeve/sheath transforms at least a portion of the primary UV wavelength spectral distribution to a different secondary wavelength spectral distribution. Additionally, the sleeve/sheath may help to prevent breakage of the primary UV radiation source and to contain the broken pieces in the event of breakage. In some embodiments, a portion of the sleeve/sheath may be coupled with a UV reflective surface to direct radiation in a preferred direction. Individual sleeves/sheaths may have various patterns of wavelength-transforming materials that emit one or more secondary wavelength spectral distributions and the sleeve/sheath may also have one or more sections that allow transmission of the primary UV wavelength spectral distribution.
    Type: Grant
    Filed: February 17, 2013
    Date of Patent: October 15, 2013
    Inventor: William G Gardner
  • Patent number: 8558182
    Abstract: A novel phase-coded aperture, associated imaging system, and design method is disclosed. The optical imaging system includes a coded-aperture followed optically by a detector array and includes an image processor. A diffraction pattern in the form of a band-limited uniformly redundant array is formed on the detector array when focusable radiation from a point source in object space is modulation by the transmission function of the coded-aperture. Since diffraction effects cannot be ignored in the optical regime, an iterative phase retrieval method is used to calculate the phase-coded aperture transmission function. Correlation type processing can be applied for the image recovery.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: October 15, 2013
    Assignee: University of Rochester
    Inventors: Wanli Chi, Nicholas George