Abstract: The present disclosure provides a device and method for exposing a person to ultraviolet radiation in tanning wavelengths which is emitted from a discharge lamp having a plurality of grooves formed in its outer periphery along a helical path. The discharge lamp includes, inter alia, an elongated vitreous tube, first and second electrode assemblies and a coating on the interior the interior of the tube. The coating is applied on an interior of the tube along the entire length for emitting ultraviolet radiation in tanning wavelengths when a voltage is applied across the first and second electrodes. In a first representative embodiment, the plurality of grooves are interconnected and the helical path is continuous. Alternatively, the plurality of grooves can be axially offset and the helical path can be discontinuous.

Abstract: A radiation curing apparatus comprises a plurality of solid state radiation sources to generate radiation that cures a first material. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The curing apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.

Abstract: A countermeasure device includes an emitter having a surface. A band gap material is integral with the surface of the emitter. A series of apertures are formed in the band gap material. A heat source for heating the emitter is provided proximate to the emitter and may be the metal surface itself. When the emitter is heated, the band gap material, and the apertures therein, allows the emitter to emit photons at predetermined wavelengths.

Abstract: LED lamp has LEDs aimed rearwards with either a concave mirror to the rear of each LED, or one concave mirror to the rear of two or more LEDs, collecting the light from the LEDs to form a forward projecting beam. LEDs may be high power types that require heatsinking. LED lamp may have a lens forward of each LED to collimate the radiation produced by the LEDs into a beam, where at least one lens has at least one aspheric curved surface. LED lamp may have a transparent reflective optic to collimate the radiation produced by each LED into a beam. For an inspection lamp, the LEDs typically have a peak wavelength of 395 to 415 naometers for seeing the area being irradiated but not so visible as to overwhelm fluorescence of fluorescent materials to be detected. Other wavelengths may be used.

Abstract: In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the membrane support structures. In a second embodiment, deformation of membranes is compensated for by fabricating the membranes to cooperatively bend in a similar manner and direction. In a third embodiment, deformation of the membrane is reduced by fabricating the membranes with an intrinsic tensile or compressive stress.

Abstract: A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.

Abstract: A radiation modifying apparatus comprises a plurality of solid state radiation sources to generate radiation that modifies a first material such as by curing or creating alignment through polarization. The solid state radiation sources can be disposed in an array pattern. Optical concentrators, arranged in a corresponding array pattern, receive radiation from corresponding solid state radiation sources. The concentrated radiation is received by a plurality of optical waveguides, also arranged in a corresponding array pattern. Each optical waveguide includes a first end to receive the radiation and a second end to output the radiation. The radiation modifying apparatus can be utilized for continuous substrate, sheet, piece part, spot curing, and/or 3D radiation-cure processes.

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract: In an ultraviolet irradiating device in which a controller section and plural head portions used to cure ultraviolet curable resin used in the adhesion of a part are connected by an electric cable, each of the plural head portions has a sleeve-shaped housing and a light emitting diode which is arranged within this housing and emits a near-ultraviolet ray. The ultraviolet irradiating device is constructed such that the near-ultraviolet ray emitted from the light emitting diode is irradiated to the exterior from a near-ultraviolet ray irradiating port arranged on the tip face of the housing. The controller section has a power circuit and a control circuit for individually controlling the operations of the light emitting diodes of the plural head portions.

Abstract: A spectrum measuring apparatus that includes an extinction member for decreasing a light intensity from an EUV light source, a spectrum member for extracting light with a desired wavelength band from the decreased intensity light and a detector for detecting a light intensity of the light with a desired wavelength band is disclosed. Then, a spectrum intensity distribution (spectrum) is obtained by (a) a plural opening is located in the extinction member, and the light from the EUV light source passes through the plural opening at the same time, or (b) the detector detects the light volume of the light with a desired wavelength band as thermal energy.

Abstract: An ultraviolet irradiating apparatus for emitting ultraviolet light toward a work piece. The work piece, e.g. a semiconductor wafer, is held by a ring-shaped frame through an ultraviolet sensitive adhesive tape applied to the back surface of the wafer. The apparatus includes an ultraviolet irradiating section having a regulating member disposed in a lower position of a support base. The regulating member is provided to limit a downward displacement of the wafer.

Abstract: A device for mounting a UV bulb includes a housing having a hole therein, a fixed bracket and an adjustable bracket, the fixed bracket is connected to the housing and the adjustable bracket is rotatably mounted to the side bracket, the adjustable bracket also has means for mounting a UV bulb such that when said UV bulb is mounted to the adjustable bracket, the bulb can be inserted through the hole in the housing and rotated through an arc of approximately 90 degrees.

Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

Abstract: A photoemission electron microscopy having a light source system for carrying out a high-resolution measurement such as work function distribution measurement or magnetic domain distribution with reliability, and a high-sensitivity measurement method using the photoemission electron microscopy. A photoemission electron microscopy having an excitation light source system in which a specimen is irradiated with irradiation light from a light source uses a vacuum chamber in which the specimen is placed and an objective lens which collects the irradiation light on a specimen surface. The objective lens is accommodated in the vacuum chamber. The light source may be placed outside the vacuum chamber. A condenser lens which makes the irradiation light from the light source generally parallel may be placed between the light source and the vacuum chamber. A transmission window which transmits the irradiation light while the vacuum chamber is sealed may be placed between the condenser lens and the objective lens.

Abstract: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

Abstract: An ultraviolet water treatment system comprising a water chamber having a water intake for untreated water to enter the chamber, and a water outlet for water to leave the chamber; an ultraviolet light source; and a fibre optic rod having a distributing end and a receiving end, the receiving end is located to receive the focused ultraviolet light from the light source and convey the light through the rod and out the distributing end into the chamber to treat the water.

Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.

Abstract: The present invention relates generally to systems for directing light-based radiation onto a light curable material. More particularly, the present invention is directed to a device for uniformly exposing a UV curable material to UV energy.

Abstract: An apparatus for expeditiously irradiating an object with ultraviolet radiation at a selected UV wavelength. The apparatus includes a plurality of ultraviolet sources, each emitting radiation at a first wavelength. The UV sources are mounted within a housing that also supports one or more conversion plates that can be interposed between the UV sources and the specimen and function to convert the UV to a second wavelength.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits light, a second chamber that receives light from the first chamber, and a vacuum pump, provided between the first and second chambers, which includes a hollow shaft through which the light passes, and exhausts the hollow shaft.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits pulsed light, a first exhaust unit for exhausting said first chamber, a second chamber being connectible to the first chamber to receive the pulsed light, a second exhaust unit for exhausting said second chamber, and a connection control mechanism between the first and second chambers for connecting the first chamber to the second chamber when the pulsed light emits, and for disconnecting the first chamber from the second chamber when the pulsed light does not emit.

Abstract: The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources.

Abstract: A light stability testing device for conducting an accurate light stability test that permits an accurate ultraviolet irradiation and an accurate visible light irradiation, the device comprising an optical sensor having a visible light measuring sensor (5) for measuring the dose of visible light, and a ultraviolet measuring sensor (6) for measuring the dose of ultraviolet ray, an optical system having a total light regulating means (331) for regulating the absolute quantity of light emitted from a light source and a ultraviolet ray regulating means (335) for regulating the dose of ultraviolet ray in light regulated by the total light regulating means, and a control unit for controlling a total light control unit that controls the total light regulating means (331) by a signal from a visible light measuring sensor (5), and the ultraviolet ray regulating means (335) by a signal from the ultraviolet measuring sensor (6).

Abstract: The invention relates to a skin tanning chamber, the improvement comprising at least one light emitting diode emitting a UVA light, such as a UVA LED that emits essentially only UVA. Additionally, multiple LEDs of varying types with various characteristic wavelengths are controlled independently to produce an arbitrary light pattern in an arbitrary sequence over time. The chamber can be rigid or flexible. It can be a bed, booth or incorporated into a flexible form, such as a garment or cloth. In one embodiment, the chamber further comprises at least one LED emitting a UVC light, whereby the UVC light sanitizes the chamber surface. Preferably the LED emitting the UVA light is under dependent control from the LED emitting UVC light.

Abstract: A projection exposure apparatus for microlithography using a wavelength?193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.

Abstract: An aspect of the present invention includes a method to print pattern with improved edge acuity. In one embodiment a method for printing fine patterns comprising the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract: A light emitting diode projection apparatus and method is provided for irradiating a subject with ultraviolet radiation, comprising a plurality of light emitting diodes configured to emit ultraviolet radiation and arranged in a matrix, and a power modulation control unit in communication with the diodes. The power modulation control unit is configured to energize and cause the diodes to emit light and thereby irradiate the subject with ultraviolet radiation sufficient to cause material physical change in the subject. In one embodiment of the invention, the material physical change is skin tanning. The amount, intensity, duration and type of UVR projected by the plurality of UV LED's may be varied by the power modulation control unit responsive to information input into the power modulation control unit.

Abstract: A collector optic assembly for a EUV radiation source. The collector optic assembly includes an elliptical meniscus having a reflective Si/Mo coating for collecting and reflecting EUV radiation generated by the source. The meniscus is machined from a single piece of silicon. The collector optic assembly further includes a heat exchanger that includes cooling channels through which flows a liquid coolant. The heat exchanger is fabricated from a plurality of machined silicon sections fused together by a glass frit bonding process. The meniscus is fused to a front side of the heat exchanger by a glass frit bonding process. A liquid coolant inlet manifold and a liquid coolant outlet manifold are also each machined from a single silicon block and are mounted to a back side of the heat exchanger.

Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge.

Abstract: This invention relates to an illumination system for scanning lithography with wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit. The illumination system includes a light source, and a field lens group. The field lens group is shaped so that an illuminated field is distorted in a plane of a reticle perpendicular to a scanning direction.

Abstract: In a lithographic projection apparatus the positions and/or orientations of reflective optical elements is dynamically controlled. The position of a reflective optical element such as a mirror in an illumination or projection system is first measured using an absolute position sensor mounted on a reference frame and thereafter measured by a relative position sensor also mounted on said reference frame. The position of the element is controlled in accordance with the measured position, e.g. to maintain it stationary in spite of vibrations that might otherwise disturb it. The absolute sensor may be a capacitive or inductive sensor and the relative sensor may be an interferometer.

Abstract: Apparatus for providing substantially two-dimensionally uniform irradiation of elongated three-dimensional objects while the objects are rotating and moving across the irradiator, with a high level of irradiance and with a substantially constant radiation dose on surfaces of the objects during each phase of the rotation and movement. At least one source of radiation produces radiation to irradiate the surfaces of the objects. Each of the sources of radiation is within a respective elongated elliptical reflecting trough and is spaced from the focal axis of the respective trough. Each trough terminates in an opening defining a rectangular plane substantially perpendicular to the major axis of the ellipse of the respective trough and substantially parallel to the longitudinal axis of the respective radiation source. Reflectors extend from the trough substantially to the path of the objects.

Abstract: A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.

Abstract: The invention comprises UV/visible spectroscopic analysis of polycarbonate composition. The method comprises determination of the concentration of Fries products, as either total Fries products or as separate determinations of linear and branched components. The method also allows for simultaneous determination of uncapped phenolic end-groups. Determinations may be performed at a single wavelength or over the entire absorption band. The method is suitable for measuring of Fries products in samples ranging in size from small scale combinatorial formats to production scale reactors. The method is independent of reaction variables such as polymer molecular weight, reactor type, and reaction temperature.

Abstract: Discharge lamp includes a synthetic quartz glass tube having an inside diameter of 8 mm or over and a pair of filaments provided within and at opposite ends of the glass tube with an L (cm) filament-to-filament distance, and rare gas and metal including at least mercury are sealed in the interior of the glass tube. Lamp voltage V (V) and lamp current I (A) during illumination of the discharge lamp, filament-to-filament distance L (cm) and inside diameter D (cm) of the glass tube have relationship represented by the following mathematical expression. Namely, (V−Vf)/L=X/({square root over ( )}D·{square root over ( )}I) and 2.6≦X≦4.2, where Vf is a constant factor depending solely on a illuminating power source and where that if the discharge lamp is illuminated by a high-frequency power source of 1 kHz or over, Vf is 10, but if the discharge lamp is illuminated by a power source of 1 kHz or below, Vf is 50.

Abstract: The method and apparatus provide a technique for monitoring radioactive source emissions by detecting photons arising from scintillation within the environment of the area or item under monitoring, caused by the passage of emissions from the radioactive source. The technique includes options for excluding ambient light photons through suitable shielding and/or selective in detection of photons from only certain wavelengths or wavebands. The technique enables levels/types and locations of emissions sources to be determined. The technique is applicable to environmental monitoring instruments, scanning instruments and other types.

Abstract: An apparatus for expeditiously irradiating an object with ultraviolet radiation at a selected UV wavelength. The apparatus includes a plurality of ultraviolet sources, each emitting radiation at a first wave length. The UV sources are mounted within a housing that also supports one or more conversion plates that can be interposed between the UV sources and the specimen and function to convert the UV to a second wavelength.

Abstract: A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident laser beam and measuring wavelength characteristics of a laser beam in a vacuum ultraviolet region oscillating from a vacuum ultraviolet laser on the basis of the optical pattern. The apparatus has a fluorescent screen for generating a fluorescent pattern having an intensity distribution corresponding to an intensity distribution of the incident optical pattern, a pattern detector for measuring the intensity distribution of the fluorescent pattern, and arithmetic unit for calculating the wavelength characteristics of the laser beam on the basis of the measured intensity distribution.

Abstract: An apparatus (1) for treatment with radiation for personal care, comprising a housing (2) provided with a UV source (3) and a wall (4) made of UV-transparent material which covers the housing (2) and which has a central area (7) and side areas (8) adjoining the central area (7). The wall (4) has a lower transmission to radiation with a wavelength <320 nm near the central area (7) than near the side areas (8). Thus the effective radiation energy of radiation with a wavelength <320 nm reaching the side portions of the irradiation plane (9) approximates a value of 0.14 W/m2 (European standard EN 60335-2-27), while the effective radiation energy of radiation with a wavelength <320 nm reaching the central portion of the irradiation plane (9) also approximates this value. This results in a practically uniform distribution of effective radiation energy of radiation with a wavelength <320 nm over the radiation surface (9) as a whole.

Abstract: The present invention provides a high gain collimator producing generally uniform intensity profiles for use in lithography and other applications. A focusing optic is also provided. The collimator includes a reflector and guide channel. The guide channel preferably includes polycapillary tubes and/or microchannel plates. The polycapillary tubes are used to collimate or focus the central portion of the x-ray beam in a circular, elliptic, square, or rectangular shape. A conical, parabolic resonance reflector or grazing incidence reflector with a shape similar to the polycapillary collimator is used to increase the solid angle collected and produce a circular, square, etc. annular x-ray beam whose inside dimensions are approximately equal to the exit dimensions of the polycapillary collimator.

Abstract: A method for targeting includes illuminating an object, receiving reflected energy of a first wavelength, converting the reflected energy into an energy of a second wavelength, and detecting the energy of a second wavelength. A system for targeting includes a convertor having a first side and a second side, the convertor constructed to convert energy incident upon the first side at a first wavelength to energy passing through the second side at a second wavelength, and a sensor detecting the energy of the second wavelength.

Abstract: A device for sterilizing water flowing through a sanitary appliance, e.g. a bathtub outlet (1), comprises a UV lamp (12), which is disposed in a housing (2, 3, 4) having a housing jacket (2) and the radiation of which is directed towards the water flowing through. Disposed in the housing (2, 3, 4) is a throughflow chamber (17), which surrounds the UV lamp (12). The UV lamp (12) has a substantially rod-shaped lamp body (32). The latter is surrounded by a protective tube (19) made substantially of a material which transmits UV light. The protective tube (19) prevents a flow directly against the lamp body (32). The lamp body (32) is supported against the protective tube (19) via supporting means (38, 39), which allow only a low heat transfer between the protective tube (19) and the lamp body (32).

Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.

Abstract: Apparatus (1) for treatment with light for personal care comprising a housing (2) with a light source, which housing (2) is covered with a wall (4) made from a translucent material, on which wall (4) a focusing area (5) is provided, to which focusing area (5) a user's eyes are mainly directed during use. On the wall (4), side areas (6) are provided adjacent said focusing area (5), and at least a portion of the wall (4) has a reference brightness during operation. Means (8) are provided in the apparatus (1) for varying a brightness of the focusing area (5) of the wall (4) during operation between the reference brightness and a minimum brightness which is lower than the reference brightness. In this way, the brightness of the focusing area (5) can be adjusted to a level which is low relative to the brightness of the side areas (6). A user thus experiences looking at the wall (4) during operation as more comfortable because he/she is not looking at a whole area of uniform brightness.

Abstract: Defects of printed patterns occurring during screen printing are repaired with high efficiency by employing a defect repair sheet in which a material layer for repair is formed on a transparent sheet and an adhesive layer is formed on the transparent sheet in order to cover the material layer for repair. The defect repair sheet is pressed on a defective portion of a predetermined pattern formed on a base by printing, thereby transferring the material layer for repair to the defective portion. The transferred portion is then subjected to, for example, a laser irradiation, so that the adhesive layer transferred together with the material layer for repair is vaporized and the material layer for repair is fired or heated and hence evaporated.

Abstract: An ultraviolet radiation water treatment device for a water cooler machine having an ultraviolet lamp housed inside a transparent inner sleeve which is itself disposed inside an outer transparent sleeve. The upper ends of the two sleeves are housed in a short pipe having a peripheral flange which abuts the sides of the cooler's water tank. A water inlet tube enters the top of the tank and passes between the two sleeves to feed water proximate the tank bottom to circulate the influent water up between the two sleeves and down outside the outer sleeve into the reservoir water to accomplish three exposure passes to the bactericidal ultraviolet radiation.

Abstract: A spectroscopic IR and UV-vis absorption remote exhaust emission monitoring system and sensing instrument for non-invasive, multicomponent analysis of the exhaust plume emitted by in-use vehicles. The concentration of CO, CO2, HC, NO, N2O, C2H2, NH3, SO2, Aromatic hydrocarbons, aldehydes, HONO, NO2, and dust, among others and in any combination there-of, in such a mixture can be determined in real-time, or via post-processing of stored spectral data. The sensor employs an IR and a UV-vis sources, and the physically offset, collimated beams traverse the probed air column, typically a roadway, a plurality of times, before returning to the instrument. Although the IR and UV-vis beams converge at the optics opposite the instrument, they are not coaxial and, thus, do not require an optical device (i.e., dichroic beam splitter) to separate them. The separate IR and UV-vis beams are focused on the slits of rapid spectrometers, where they are analyzed to yield wavelength-resolved spectra (i.e.

Abstract: The invention relates to an apparatus for the photo-initiated chemical cross-linking of material (28). To form one or more mouldings the material is enclosed in an optically transparent mould (26). The apparatus has at least one light source (12), for example a pulsed UV light source by which the material (28) can be acted upon by a light that triggers the cross-linking. The region to be cross-linked in the mould (26) is determined at least partially by beam-delimiting elements (20, 22) between the light source (12) and the mould (26). That can be achieved by arranging between the light source (12) and the mould (26) a mask (20) having transparent and non-transparent surface portions. The mask (20) is then projected onto the material (28) that is enclosed in the mould (26) by projection optics (24). The projection of the mask (20) onto the material is effected in a telecentric beam path.

Abstract: A method of monitoring the conditions of a deep ultraviolet exposure station. In this invention, three usually separate conventional measurements including reticle blind accuracy, pre-alignment accuracy and overlay accuracy are integrated together. A patterned wafer having a photoresist layer thereon is provided. The photoresist layer on the wafer is exposed using a DUV exposure station. Relative positions of various markers are measured using an image-contrasting station. Hence, the reticle blind accuracy, the pre-alignment accuracy and the overlay accuracy are all determined in a single step.