Abstract: A system for sanitizing an enclosed structure comprises a first sensor, a second sensor, a third sensor, a germicidal ultraviolet light source, a motor, and a controller. The first sensor detects the presence of humans or animals within the enclosed structure. The second sensor detects the position of at least one door of the enclosed structure. The third sensor detects tampering with the system. The ultraviolet light source provides electromagnetic radiation in the ultraviolet range. The motor moves the ultraviolet light source from an inactive position to an active position and from the active position to the inactive position. The controller receives inputs from the first sensor, the second sensor, and the third sensor, and transmits outputs to the ultraviolet light source and the motor.

Abstract: A method is provided of detecting a region of raised material on a document surface. A surface of the document is illuminated with at least one angled radiation beam such that any raised material on the document surface reflects the radiation. The surface containing the raised material is imaged using at least one radiation detector. The image is then processed to detect the existence on the document surface of the raised material. The illuminating step causes a reflection and/or shadow to be generated from at least one edge of the raised material. The processing step detects the location of the material using the said reflection and/or shadow from the at least one edge.

Abstract: An extreme ultraviolet light source apparatus includes a main body including a supply section to which an extreme ultraviolet radiation seed is supplied, and an emission part configured to emit extreme ultraviolet, an excitation unit provided in the main body and configured to generate a plasma by exciting the extreme ultraviolet radiation seed, an optical condensing unit provided in the main body and configured to converge extreme ultraviolet, which is radiated from the plasma, at the emission part, a trap provided between the excitation unit and the optical condensing unit, a first positioning mechanism connected to the trap and configured to adjust at least one of a position and an angle of the trap, and a measuring unit configured to measure a far field distribution image of the plasma on the basis of the extreme ultraviolet which is emitted from the emission part, thereby to operate the first positioning mechanism.

Abstract: A device to polymerize plastics that are to be hardened by means of UV irradiation comprises two different irradiation sources for UV irradiation and IR irradiation, respectively, whose irradiation is projected onto the plastic to be hardened. The irradiation source for the UV irradiation includes a solid-state laser.

Abstract: The invention relates to a skin tanning chamber, the improvement comprising at least one light emitting diode emitting a UVA light, such as a UVA LED that emits essentially only UVA. Additionally, multiple LEDs of varying types with various characteristic wavelengths are controlled independently to produce an arbitrary light pattern in an arbitrary sequence over time. The chamber can be rigid or flexible. It can be a bed, booth or incorporated into a flexible form, such as a garment or cloth. In one embodiment, the chamber further comprises at least one LED emitting a UVC light, whereby the UVC light sanitizes the chamber surface. Preferably the LED emitting the UVA light is under independent control from the LED emitting UVC light.

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract: A method for generating radiation in a range of desired wavelengths in a direction of emission is provided. According to the method, initial radiation is produced by a radiation source, the wavelengths thereof including the desired range, and the initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterized in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.

Abstract: LED lamp has LEDs aimed rearwards with either a concave mirror to the rear of each LED, or one concave mirror to the rear of two or more LEDs, collecting the light from the LEDs to form a forward projecting beam. LEDs may be high power types that require heatsinking. LED lamp may have a lens forward of each LED to collimate the radiation produced by the LEDs into a beam, where at least one lens has at least one aspheric curved surface. LED lamp may have a transparent reflective optic to collimate the radiation produced by each LED into a beam. For an inspection lamp, the LEDs typically have a peak wavelength of 395 to 415 nanometers for seeing the area being irradiated but not so visible as to overwhelm fluorescence of fluorescent materials to be detected. Other wavelengths may be used.

Abstract: An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 ?m at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

Abstract: Apparatus is provided, for sanitizing feet of persons entering a particular area, such as a residential area, having a platform for transmitting sanitizing ultraviolet light to feet of persons standing upon upper portions of the platform, a germicidal light source for directing sanitizing UV-C ultraviolet light through upper portions of the platform, a power supply for energizing the germicidal light source, a switching device coupled between the power supply and the germicidal light source for energizing the germicidal light source and wherein the switching device energizes the germicidal light source in response to the presence of the person positioned upon upper portions of the platform. The germicidal ultraviolet light source includes one or more elongated bulbs, or one or more elongated linear arrays of solid state devices and a central light reflective wall portion is positioned to enhance support of the upper portions of said platform.

Abstract: An apparatus having one or more UV bulbs arranged around a structural element and within an outer conductive element. The apparatus also contains an inner conductive element which extends the length of the apparatus. The inner and outer conductive elements are coupled to a microwave source to enable the UV bulbs to be powered.

Abstract: Apparatus for searching for and detecting defects on parts that are substantially inaccessible, being located behind a wall, the apparatus comprising a first endoscope for illumination in visible light and for observation, the first endoscope and pipes for feeding and spraying penetration test substances being housed together in a rod which can be passed through an orifice in the wall in order to examine a part, the apparatus further comprising a second endoscope independent of the first endoscope and the rod for illuminating in ultraviolet light and for observing the portion of the part that has been treated by the penetration test substances.

Abstract: A spectral purity filter arrangement is disclosed. The spectral purity filter arrangement includes a film configured for filtering out at least a portion of input light and a support structure coupled to the film along at least one edge of the film. The spectral purity filter arrangement further includes a gas control subsystem configured to direct a gas at the film to support the film at least when the film is disposed in an operational position to perform the filtering.

Abstract: The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.

Abstract: A system for sanitizing an enclosed structure comprises a first sensor, a second sensor, a third sensor, a germicidal ultraviolet light source, a motor, and a controller. The first sensor detects the presence of humans or animals within the enclosed structure. The second sensor detects the position of at least one door of the enclosed structure. The third sensor detects tampering with the system. The ultraviolet light source provides electromagnetic radiation in the ultraviolet range. The motor moves the ultraviolet light source from an inactive position to an active position and from the active position to the inactive position. The controller receives inputs from the first sensor, the second sensor, and the third sensor, and transmits outputs to the ultraviolet light source and the motor.

Abstract: An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.

Abstract: A method for providing information about a spatial gain distribution of a scintillator for a primary radiation is provided which does not require the irradiation of the scintillator with the primary radiation. The method comprises the step of irradiating the scintillator with a secondary radiation for generating an image of a spatial secondary gain distribution of the scintillator for said second radiation. The spatial secondary gain distribution image corresponds to an image of the spatial primary gain distribution for the primary radiation. In an embodiment of the invention, i.e. in an X-rayimaging device where the primary radiation is X-rayradiation, the invention provides for an accurate calibration of the X-raydetector without irradiating the X-raydetector with X-rayradiation. Rather, irradiation with UV radiation as the secondary radiation provides the desired spatial secondary gain distribution image which can be used for calibration.

Abstract: Disclosed are systems and methods for determining the shape of a glass sheet during and/or after the forming process. In one example, a system for determining the shape of a glass sheet defining an interior bulk can include a light source, an image capture device and a processor that are configured to calculate the location of an energy centroid within a selected portion of the bulk of the glass sheet.

Abstract: Apparatus for searching for and detecting defects on parts that are substantially inaccessible, being located behind a wall, the apparatus comprising a first endoscope for illumination in visible light and for observation, the first endoscope and pipes for feeding and spraying penetration test substances being housed together in a rod which can be passed through an orifice in the wall in order to examine a part, the apparatus further comprising a second endoscope independent of the first endoscope and the rod for illuminating in ultraviolet light and for observing the portion of the part that has been treated by the penetration test substances.

Abstract: The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.

Abstract: A detector receives energy pulses and a lossy integration circuit generates a lossy integration that, for each pulse, increases over the pulse duration to a maximum value and then decays. The lossy integration is sampled, with a sampling rate and decay rate such that the sample is within a given acceptable error of the maximum value. The sample represents the pulse total energy, within the given acceptable error. An optional circuit and processing function calculates a total accumulated energy over a plurality of pulses.

Abstract: A UV light source water disinfection system includes a UV light source that is driven or controlled by a ballast. Improved start-up scenarios are provided by use of a separate heating wire around the lamp or employing an inductive-coupled system to provide initial high power requirements. The UV lamp is discontinuously operated in order to extend the life of the system, save energy, and periodically dose standing water to prevent regeneration of undesired microorganisms.

Abstract: An inkjet printer including an inkjet head unit having inkjet heads for ejecting UV inks, an UVLED unit having a UVLED for emitting ultraviolet light, and a control unit for controlling the inkjet head unit and the UVLED unit. The control unit controls the inkjet head unit and the UVLED unit to move in the scanning direction, controls the inkjet heads to eject UV inks, and controls the UVLED to emit ultraviolet light of a first light quantity. After that, the control unit controls the inkjet head unit and the UVLED unit to move in the direction opposite to the scanning direction and controls the UVLED to emit ultraviolet light of a second light quantity.

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract: An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV radiation in the direction of an optical axis. A first optical element is provided to generate secondary light sources, and a second optical element is provided at the location of these secondary light sources, the second optical element being part of an optical device which includes further optical elements, and which images the first optical element into an image plane into the illumination field. Between the collector and the illumination field, a maximum of five reflecting optical elements are arranged. These optical elements reflect the main beam either grazingly or steeply. The optical axis, projected onto an illumination main plane, is deflected by more than 30° between a source axis portion and a field axis portion.

Abstract: An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting source generates pulsed light by producing plasma from an intermittently supplied target material. A reticle stage holds a reticle that is irradiated by the pulsed light. A photosensitive substrate stage holds a photosensitive substrate irradiated by the pulsed light patterned by the reticle. A control means controls the photosensitive substrate stage so that, before exposing the photosensitive substrate begins, the timing between an exposure starting point or an exposure ending point and the light emission timing are matched based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.

Abstract: Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other.

Abstract: A cosmetics and cosmetic implement germicidal device is provided, having a main housing and an implement support for receiving cosmetics/implements. The support may be a tray or one or more shelves or receptacles. At least one first ultraviolet (UV) bulb is mounted inside the main housing facing the implement support. The UV bulb substantially irradiates a first side of the inner drawer and any cosmetics or implements placed upon the inner drawer. It is preferred to provide UV bulbs on opposite sides of a light-transmissible inner drawer as well as a reflective material inside the main housing so that no portion of any cosmetics or implements remain un-irradiated after use. A single UV bulb that travels or scans may be provided on either side of the drawer, or a number of stationary UV bulbs may be provided, or the implement support may move with respect to the bulbs.

Abstract: The present invention comprises a method for detecting and analyzing forensic evidence. A digital image is taken of background radiation from a suspected-evidence area suspected to contain evidence. The suspected-evidence area is exposed to a high-intensity pulse of ultraviolet radiation. Another digital image is taken of fluorescence within the exposed suspected-evidence area. The digital images are processed to create a composite digital image showing regions of evidence. The composite digital image is analyzed to determine the wavelength of fluorescent radiation emitted by the regions of evidence. Composite evidence image and the analysis results are displayed. The present invention also comprises a forensic evidence detection and analysis system that includes a digital camera, an ultraviolet light source, a computer and display, and a computer program installed on the computer.

Abstract: The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings.

Abstract: An exposure apparatus exposes a substrate in a vacuum atmosphere through an optical system. The apparatus includes a partition which separates a first space including at least part of the optical system from a second space adjacent to it, and includes an opening to pass light through it. The apparatus further includes a first pressure regulator which regulates the pressure in the first space, a second pressure regulator which regulates the pressure in the second space, and a controller which outputs manipulated variables for the first and second pressure regulators. The controller outputs the manipulated variables for the first and second pressure regulators to change the pressure in the first space and the pressure in the second space in the range of a vacuum to the atmospheric pressure while maintaining a pressure relationship in which the pressure in the first space is higher than that in the second space.

Abstract: An Sn—Ga type alloy having a composition in which the atomic % of Sn is 15% or less is accommodated inside a heated tank 4. The Sn alloy pressurized by the pressurizing pump is conducted to a nozzle 1, so that a liquid-form Sn alloy is caused to jet from the tip end of this nozzle 1 disposed inside a vacuum chamber 7. The liquid-form Sn alloy that is caused to jet from the nozzle 1 has a spherical shape as a result of surface tension, and forms a target 2. Laser light generated by an Nd:YAG laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and introduced into the vacuum chamber 7. The target 2 that is irradiated by the laser is converted into a plasma, and radiates light that includes EUV light.

Abstract: A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

Abstract: An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the pump is prolonged is achieved by the provision of a treatment unit between a radiation source chamber and the evacuation device. The treatment device has a hydrogen radical producing part in which tin and/or a tin compound in the evacuated gas from the radiation source chamber is/are made into a tin hydride; and a heat treatment part in which the tin hydride is thermally decomposed and in which the tin produced liquefied and separated from the evacuated gas. The liquid tin is fed into a collecting/storage vessel and the evacuated gas from which the tin and/or a tin compound has been removed fed to the evacuation device.

Abstract: The invention relates to a skin tanning chamber, the improvement comprising at least one light emitting diode emitting a UVA light, such as a UVA LED that emits essentially only UVA. Additionally, multiple LEDs of varying types with various characteristic wavelengths are controlled independently to produce an arbitrary light pattern in an arbitrary sequence over time. The chamber can be rigid or flexible. It can be a bed, booth or incorporated into a flexible form, such as a garment or cloth. In one embodiment, the chamber further comprises at least one LED emitting a UVC light, whereby the UVC light sanitizes the chamber surface. Preferably the LED emitting the UVA light is under independent control from the LED emitting UVC light.

Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

Abstract: A plug-in radiation source module (10) for mounting and locating a radiation source (3) for a weathering apparatus (20), the plug-in module (10) being configured to be insertable from without into a cavity (21) provided therefor in a weathering apparatus (20).

Abstract: A lighting system comprising at least one lighting assembly, the lighting assembly comprising at least one ultraviolet light source, means for separately controlling ultraviolet light source and a mounting base, the mounting base carrying the ultraviolet light source with the means for separately controlling disposed remote therefrom, lighting assemblies of the lighting system mounted upon a portion of the side of a boat wherein the ultraviolet light source comprises an array of point lights.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

Abstract: The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arranged in said computer controlled reticle according to a digital description. An image of said computer controlled reticle is created on said workpiece, wherein said pixels in said computer controlled reticle are arranged in alternate states along at least a part of one feature edge in order to create a smaller address grid. The invention also relates to an apparatus for creating a pattern on a workpiece. The invention also relates to a semiconducting wafer and a mask.

Abstract: Techniques for sterilizing a fomite are disclosed. A UV sterilization apparatus includes a housing for enveloping a fomite inside the housing. The housing is composed of a material that prevents transmission of electromagnetic radiation in the ultraviolet range. Attached to the housing is a closure element, and the closure element is also composed of a material that prevents transmission of electromagnetic radiation in the UV range but allows transmission of electromagnetic radiation in the visual range. An ultraviolet light source is attached to an internal surface of the housing or an internal surface of the closure element, and the light source sterilizes the fomite enclosed inside the housing by transmitting ultraviolet electromagnetic radiation towards the fomite.

Abstract: The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for EUV.

Abstract: An improved elemental mercury analyzer utilizes a fluorescence assembly in combination with a fluorescence quenching reduction mechanism to detect the concentration of elemental mercury within an emission gas sample, via fluorescence of the mercury within the gas sample, while minimizing fluorescence quenching of the gas sample. In one arrangement, the analyzer contains the emission gas sample under a vacuum or negative pressure while detecting fluorescence of the elemental mercury within the emission gas sample. By performing fluorescence detection of the emission gas sample at reduced pressure relative to the pressure of the as-sampled emission gas, the analyzer reduces the number of particle collisions within the emission gas sample over a certain period of time. Such collisional deactivation, and/or the addition of oxygen depleted gas such as nitrogen to the gas sample, reduces fluorescence quenching of the emission gas sample, improving accuracy of detection of mercury.

Abstract: An apparatus for producing wavelength stabilized electromagnetic radiation is provided, the apparatus comprising a broadband semiconductor radiation source configured to produce broadband electromagnetic radiation having a mean wavelength ?m, and a bandpass radiation filter, an input of said bandpass radiation filter being in optical connection to an output of said radiation source, and a common temperature stabilizer being in thermal contact with both, the radiation source and the radiation filter. In a preferred embodiment, the radiation source—which is, for example, a superluminescent light emitting diode—and the bandpass radiation filter are provided on a common mount which is in contact with a thermoelectric cooler acting, together with temperature sensing means and control means, as temperature stabilizer.

Abstract: There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.

Abstract: A lighting system comprising at least one lighting assembly, the lighting assembly comprising at least one ultraviolet light source, means for separately controlling ultraviolet light source and a mounting base, the mounting base carrying the ultraviolet light source with the means for separately controlling disposed remote therefrom, lighting assemblies of the lighting system mounted upon a portion of the side of a boat wherein the ultraviolet light source comprises an array of point lights.

Abstract: A device intended to reduce the risks of overexposure to harmful solar radiation. The device includes a detection arrangement, including at least one sensor sensitive to solar radiation, in particular UV. In addition, an arrangement is linked to the detection arrangement to generate a signal representing the quantity of radiation received by the detection means. An attachment arrangement is provided to attach the device to the head of a subject, such that the sensor(s) is (are) oriented in a substantially perpendicular manner to the vertical plane of the subject when the latter is active in the sun. The device is preferably configured in the form of a cap, with the detection arrangement arranged on a first visor intended to be positioned over the back of the individual's neck. The cap also preferably includes a second visor located opposite the first.