Abstract: A method is disclosed for determining the inactive doping concentration of a semiconductor region using a PMOR method. In one aspect, the method includes providing two semiconductor regions having substantially the same known as-implanted concentration but known varying junction depths. The method includes determining on one of these semiconductor regions the as-implanted concentration. The semiconductor regions are then partially activated. PMOR measures are then performed on the partially activated semiconductor regions to measure (a) the signed amplitude of the reflected probe signal as function of junction depth and (b) the DC probe reflectivity as function of junction depth. The method includes extracting from these measurements the active doping concentration and then calculating the inactive doping concentration using the determined total as-implanted concentration and active doping concentration.

Abstract: An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled. to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

Abstract: A radiation detector device is provided that is capable of distinguishing between full charge collection (FCC) events and incomplete charge collection (ICC) events based upon a correlation value comparison algorithm that compares correlation values calculated for individually sensed radiation detection events with a calibrated FCC event correlation function. The calibrated FCC event correlation function serves as a reference curve utilized by a correlation value comparison algorithm to determine whether a sensed radiation detection event fits the profile of the FCC event correlation function within the noise tolerances of the radiation detector device. If the radiation detection event is determined to be an ICC event, then the spectrum for the ICC event is rejected and excluded from inclusion in the radiation detector device spectral analyses. The radiation detector device also can calculate a performance factor to determine the efficacy of distinguishing between FCC and ICC events.

Abstract: A High-resolution Image Acquisition and Processing Instrument (HIAPI) performs at least five simultaneous measurements in a noninvasive fashion, namely: (a) determining the volume of a liquid sample in welh (or microtubes) containing liquid sample, (b) detection of precipitate, objects of artifacts within microliter plate wells, (c) classification of colored samples in microliter plate wells or microtubes; (dl determination of contaminant (e.g. wafer concentration}; (e) air bubbles; (f) problems with the actual plate. Remediation of contaminant is also possible.

Abstract: One embodiment relates to an apparatus comprising a light source adapted to transmit light through a liquid, and a detector adapted to detect an intensity of the light after it passes through the liquid. The apparatus may also include a device to process data relating to the intensity of the infrared light and compare the processed data to predetermined control data. The apparatus may also include a controller adapted to transmit a signal to a liquid dispenser if the processed data differs from the control data by a predetermined amount. The light may be selected from the group consisting of ultraviolet, visible, infrared, and microwave light. Other embodiments are described and claimed.

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract: Improved analytical, diagnostic, monitoring, and other methods (and their associated devices) for evaluating the extent of deposition of an agent onto a substrate are described. Exemplary methods may be used in the in the monitoring of the dental health of patients or in the fast, efficient screening and/or characterization of formulations in terms of their use for depositing oral actives onto tooth surfaces. The methods involve the direct or in situ analysis of substrates, onto which agents are deposited, using Near-IR spectroscopy and/or UV spectroscopy.

Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.

Abstract: Techniques for sampling a subsurface reservoir include lowering a downhole logging tool comprising one or more samplers, a cleaner system, and a sample probe bit into a borehole until at least one sampler is positioned correctly in a subterranean reservoir; advancing the cleaner system into the reservoir cleaning mud filtrate and contaminated reservoir material away into a mud column; advancing the sample probe bit into the reservoir; and solvent is injected into the reservoir from the solvent reservoir.

Abstract: An optical sensor is disclosed for measuring pressure and/or temperature. The optical sensor is adapted for use in high temperature environments, such as gas turbines and other engines. The optical sensor comprises an optical assembly having a sensor element, a spacer and a lens arranged along the optical axis. The sensor element is spaced from the lens by the spacer. An optical fibre is coupled to the optical assembly for illuminating the sensor element. The optical assembly is resiliently mounted in a housing such that the optical assembly is insulated from shock to the housing. There is also disclosed a method of assembling the optical sensor.

Abstract: An apparatus and method operable for the continuous monitoring of a gas stream including an optical sensor operable to monitor and/or measure Hg concentrations in a flue gas by calculating the absorbance of the ultraviolet light thereby at a range of wavelength 253.7 nm+/?0.05 nm. The apparatus therefore provides as a spectrally narrow UV light source, a mercury lamp. The spectrally broad UV light source includes a UV LED. A 2×2 coupler is provided to mix the narrow and broad UV light energy which is propagated through the gas stream. The invention recognizes that measurement of radiation absorption at the 254 nm+/?1.5 nm range will result in not only from Hg0, but also from the SO2 component in the flue gas. To compensate for sulphur dioxide, measurement of energy absorption for both specially narrow radiant energy in the 253.7 nm+/?0.

Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.

Abstract: An exemplary sterilization system includes a self-propelled robotic mobile platform for locating and eradicating infectious bacterial and virus strains on floors (and objects thereon), walls, cabinets, angled structures, etc., using one or more ultraviolet light sources. A controller allows the system to adjust the quantity of ultraviolet light received by a surface by, for example, changing the intensity of energy input to a ultraviolet light source, changing a distance between a ultraviolet light source and a surface being irradiated, changing the speed/movement of the mobile platform to affect time of exposure, and/or by returning to contaminated areas for additional passes. The mobile platform may include a sensor capable of detecting fluorescence of biological contaminants irradiated with ultraviolet light to locate contaminated areas. The system is thus capable of “seek and destroy” functionality by navigating towards contaminated areas and irradiating those areas with ultraviolet light accordingly.

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.

Abstract: Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements.

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

Abstract: An ultraviolet (UV) liquid disinfection system and method are described. The system includes a conduit to carry liquid to be disinfected, the conduit having an inlet to receive the liquid and an outlet to discharge the liquid; a UV source configured to illuminate the liquid within the conduit; a liquid salinity detector to measure a value indicative of the liquid salinity; and a controller coupled to the salinity detector and configured to receive from the liquid salinity detector the measured value and to determine a desired salinity-adjusted UV dose level based on the measured value and predetermined data correlating salinity levels to respective UV dose levels.

Abstract: The present invention provides a method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process and a pickup assembly device for performing the method. The method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process includes the following steps: Step 1: providing a multi-level bake furnace for TFT-LCD manufacturing process, a pickup device, an inspection control system, and a sensor for inspecting UV illuminance; Step 2: mounting the sensor on the pickup device; Step 3: connecting the inspection control system and the sensor with communication; Step 4: operating the pickup device to bring the sensor to a site in a level of the multi-level UV bake furnace where inspection of UV illuminance is to be made; and Step 5: sensor collecting data and transmitting the data so collected to the inspection control system to thereby realize inspection.

Abstract: Optical flame holding and flashback detection systems and methods are provided. Exemplary embodiments include a combustor including a combustor housing defining a combustion chamber having combustion zones, flame detectors disposed on the combustor housing and in optical communication with the combustion chamber, wherein each of the flame detectors is configured to detect an optical property related to one or more of the combustion zones.

Abstract: A sensor for measuring ultraviolet radiation and mount for retaining the sensor includes a converter plate having a perimeter and an edge about the perimeter, a retainer comprising a conical mirror and a frame having a UV blocker, and a fluorescent radiation detector coupled to the frame. The converter plate fluoresces in response to UV radiation incident on the converter plate. The conical mirror couples with the converter plate and directs a portion of the fluorescent radiation emitted from the edge of the plate to the detector coupled to the frame. The detector detects the fluorescent radiation from the converter plate and produces an electrical signal proportional to the magnitude of fluorescent radiation.

Abstract: The invention presented is a real time EUV illumination metrology device that includes at least one pair of electrodes mounted on an insulator substrate with an aperture defined by the at least one pair of electrodes and/or the insulator substrate. The electrodes of each of the pairs of electrodes are separated by an arc suppression distance. In one alternate embodiment, the metrology device includes four pairs of electrodes. The device may also include a voltage biasing component to divert unwanted electrons that may distort illumination measurement. Also presented is an EUV illumination system incorporating the metrology device. One object of the invention is to provide a system of real time measurement of an EUV illumination beam.

Abstract: A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.

Abstract: A method for identifying a presence of a nitro (NO)-bearing compound suspected of being included in a sample includes photodissociating a sample into one or more fragments that include a NO molecule, where the NO molecule has an electron in a first-vibrational excited state of an electronic ground state. Laser-induced fluorescence (LIF) is applied including directing UV light from a UV laser source at the sample to induce fluorescent light. An emission wavelength of 270 nm to 274 nm from fluorescent light received is used to identify a presence of the NO-bearing compound in the sample.

Abstract: The present disclosure relates to paper-based substrates and apparatus comprising such substrates. The apparatus may include a patterned conductive structure coupled to the paper-based substrate, wherein the patterned conductive structure responds to electromagnetic radiation.

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.

Abstract: A self validating flame detection system (10) for a turbine engine (12) configured to determine whether a flame exists in a turbine engine combustor is disclosed. The self validating flame detection system (10) may include two different types of flame detection sensors to reduce the risk of false positive signals. In at least one embodiment, the flame detection system (10) may include one or more infrared sensors (20) that sense infrared radiation within the combustor of the turbine engine (12) and one or more ultraviolet light sensors (22) that sense ultraviolet light within the combustor of the turbine engine (12). The flame detection system (10) may include a processor (24) configured to ignore the steady state infrared signal generated and instead analyze the dynamic infrared signal. The processor (24) may be configured to determine whether both types of sensors indicate a flame out condition so that a false alarm does not occur.

Abstract: A system and method for detecting adhesive used to produce an envelope in a mailpiece creation system. The system includes a source of ElectroMagnetic (EM) energy in at least the short UV range to illuminate a surface of the substrate material anticipated to have an adhesive deposited thereon in select regions, an EM energy detection device operative to detect energy reflected from the surface of the substrate material in the visible light range and produce a response indicative of the optical absorbance of EM energy in the short UV range; and a processor operative to analyze the response of the EM energy detection device to determine whether light energy in the visible range is below a threshold level to indicate the presence of adhesive deposited on the substrate material.

Abstract: The present invention generally relates to a method and apparatus for exciting particles, and more specifically relates to analyzers or sorters for exciting fluorescently labeled particles with a multimode diode laser and the optics for making high resolution determinations from the multimode diode laser beam excitation.

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract: A material aging test apparatus and method thereof are provided. The aging apparatus includes a pulsed laser, a beam expansion assembly, a platform, and a spectrum analyzer. The pulsed laser is used for transmitting a first beam. The beam expansion assembly is used for converting the first beam into a second beam and projecting the second beam onto an object. The platform is used for carrying the object. The spectrum analyzer is used for measuring the spectral response which is generated from the object by the projection of the second beam.

Abstract: A process for evaluating a cleaning solution is described. The process includes: (a) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (b) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (c) obtaining a reference UV absorbance spectra; (d) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (e) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (f) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a virus destruction operating configuration and a bacteria disinfection operating configuration. Each configuration can include a unique combination of the target wavelength range and target intensity range.

Abstract: A spectrometer can include a plurality of semiconductor nanocrystals. Wavelength discrimination in the spectrometer can be achieved by differing light absorption and emission characteristics of different populations of semiconductor nanocrystals (e.g., populations of different materials, sizes or both). The spectrometer therefore can operate without the need for a grating, prism, or a similar optical component. A personal UV exposure tracking device can be portable, rugged, and inexpensive, and include a semiconductor nanocrystal spectrometer for recording a user's exposure to UV radiation. Other applications include a personal device (e.g. a smartphone) or a medical device where a semiconductor nanocrystal spectrometer is integrated.

Abstract: An automated apparatus and method for analyzing liquid samples by forming discrete sample aliquots (boluses) in an elongated conduit which contains a hydrophobic carrier liquid. Aliquots may be analyzed by adding at least one reagent to the sample aliquot that reacts selectively with an analyte contained therein. The reaction product, which is selective for the analyte of interest and proportional to its concentration, is measured with an appropriate detector. Intrinsic sample properties of the sample may also be measured without the need for adding chemical reagents. The invention enables simple and accurate testing of samples using time honored wet-chemical analysis methods in microliter volume regimes while producing remarkably small volumes of waste.

Abstract: An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.

Abstract: A UV light emitting diode (UV-LED) is arranged in a weathering chamber and a UV light receiving diode, which is constructed on the same material basis as the UV LED, is arranged relative to the UV LED in such a way that a portion of the radiation emitted by the UV LED impinges on the UV light receiving diode during the operation of the device.

Abstract: Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region, In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture.

Abstract: A method for handling soiled bank notes is disclosed. The method includes directing a bank note to an ultraviolet detector; transmitting an ultraviolet signal from the ultraviolet detector to the bank note; receiving a reflected ultraviolet signal from the bank note at the ultraviolet detector; analyzing the reflected ultraviolet signal; identifying a soiling level for the bank note based on analysis of the reflected ultraviolet signal; and handling the bank note based on the identified soiling level. Analyzing the reflected ultraviolet signal can include comparing a characteristic of the reflected ultraviolet signal with calibration data. The calibration data can be stored in a computer-readable medium. The bank note is identified as a soiled bank note if the identified soiling level exceeds a threshold soiling level.

Abstract: A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.

Abstract: An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

Abstract: An index value is calculated for rating an eyeglass with respect to protection against UV hazard. The index value is based on an integrated UV transmission value through the eyeglass and an integrated UV reflection value related to a back face of the eyeglass. Thus, the index value takes into account actual wearing conditions where UV eye exposure is due either to transmission through the eyeglass or reflection on the eyeglass back face. Respective index values obtained for a set of eyeglasses allow easy sorting of the eyeglasses with respect to UV protection efficiency.

Abstract: A removable and replaceable keying component which is required for operation of a mechanism and which component includes a waveguide having a photochromic portion. A method of controlling operation of a mechanism, preferably a dispenser, having a removable component comprising the steps of measuring electromagnetic radiation passing through a waveguide carrying at least in part on the removable component and permitting operation of the mechanism only when the measured electromagnetic radiation corresponds with one or more pre-selected parameters. Preferably, the method involves directing emitted electromagnetic radiation with pre-selected input parameters selected from a plurality of input parameters.

Abstract: An apparatus for easily measuring the quality of gallium nitride (GaN) in normal conditions such as an atmospheric pressure and room temperature. The apparatus includes a light source disposed above a GaN substrate and a measuring unit disposed above the GaN substrate. The light source emits light to a surface of the GaN substrate. The measuring unit measures the quality of the GaN substrate based on the spectrum of light radiated from the GaN substrate.

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

Abstract: A mobile device including a source for emitting electromagnetic radiation, an enclosure having a side wall, and a detector for detecting electromagnetic radiation emitted by the source is described. At least a portion of the sidewall is adapted to transmit electromagnetic radiation from the source. The source and detector are positioned inside the enclosure. The detector is spaced from the source, and is arranged to detect electromagnetic radiation from the source that is reflected from an object outside the enclosure and passes through the portion of the side wall.

Abstract: Apparatus for detecting the presence of a flame using a UV tube which can be supplied with a DC voltage via an operating resistor, at least two UV tubes which are arranged in this manner and have substantially the same field of vision being provided, and the two UV tubes being able to be switched on and off in succession with a gap of a predefined time within a predetermined interval of time via a controller, with the result that the UV tubes are switched on for a predeterminable period of time, the number of pulses obtained from each UV tube being able to be recorded and compared with one another, the anode of the respective UV tube being able to be connected to earth potential between the operations of switching the UV tubes off and on in order to draw ionization in the discharge area.