Methods Patents (Class 250/424)
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Patent number: 12154766Abstract: An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as an inert gas, while heating the vaporizer. When operating in a second mode, the ion source may supply a second gas, which may be an organoaluminium gas. When operating in a third mode, the ion source may supply the second gas, while heating the vaporizer. Ions having single charges may be created in the first and second modes, while ions having multiple charges may be created in the third mode.Type: GrantFiled: June 7, 2022Date of Patent: November 26, 2024Assignee: Applied Materials, Inc.Inventors: Graham Wright, Shardul S. Patel
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Patent number: 12002663Abstract: A processing apparatus is provided. The processing apparatus includes a chamber and a carrier that is positioned in the chamber for holding a substrate. The processing apparatus further includes a gas inlet connected to the chamber. The gas inlet is configured to supply a process gas into the chamber. The processing apparatus also includes a coil module positioned around the chamber and configured to transfer the process gas into plasma. In addition, the processing apparatus includes a filter disposed in the chamber. The coil module is configured to change a position of the plasma between a first position and a second position, the first position is located between the gas inlet and the filter, and the second position is located between the filter and the carrier.Type: GrantFiled: July 16, 2021Date of Patent: June 4, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Rung Hsu, Li-Te Lin, Pinyen Lin
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Patent number: 11978665Abstract: A semiconductor manufacturing method includes forming a concave portion in a layer provided above a substrate from a top surface of the layer downwards, the layer including an insulation layer at least partially. The method includes forming a silicon film on an inner surface of the concave portion. The method includes exposing the silicon film to a raw material gas of metal and an inhibitor gas that inhibits growth of the metal at a first temperature, to replace a first portion of the silicon film located in an upper-end side portion of the concave portion with a first conductive film containing the metal. The method includes exposing the silicon film to the raw material gas and the inhibitor gas at a second temperature lower than the first temperature, to replace a second portion of the silicon film with a second conductive film containing the metal.Type: GrantFiled: September 8, 2021Date of Patent: May 7, 2024Assignee: Kioxia CorporationInventor: Kenichi Ide
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Patent number: 11978608Abstract: There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.Type: GrantFiled: March 15, 2021Date of Patent: May 7, 2024Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.Inventor: Yuuji Ishida
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Patent number: 11944845Abstract: An asymmetric dual-mode ionization chamber measurement system can include a first high-voltage plate, a second high-voltage plate and a readout plate. The first high-voltage plate can be disposed from the readout plate by a first active volume. The second high-voltage plate can be disposed from the readout plate by a second active volume. A high-voltage potential can be coupled to the first high-voltage plate during a first mode, and to the second high-voltage plate during a second mode. Ion pairs generated by a radiation stream passing through the first active volume during the first mode and the second active volume during the second mode can be measured at the readout plate to determine a radiation rate of the ionizing radiation. The asymmetric dual-mode ionization chamber measurement system can advantageously measure different radiation streams that have significantly different ranges of radiation rates flux.Type: GrantFiled: December 23, 2022Date of Patent: April 2, 2024Assignee: VARIAN MEDICAL SYSTEMS PARTICLE THERAPY GMBH & CO. KGInventors: Manuel Schedler, Simon Busold, Birger Schumacher
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Patent number: 11948781Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.Type: GrantFiled: January 27, 2021Date of Patent: April 2, 2024Assignee: Applied Materials, Inc.Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson
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Patent number: 11904729Abstract: A superconducting eddy-current brake for high-speed trains includes a pair of superconducting magnet units with alternate arrangement of N and S poles; and a cryogenic system. The superconducting magnet units are fixed on a bottom of a bogie of the train and an air gap is provided between the superconducting magnet units and a top surface of a rail below the bogie. The cryogenic system is provided on the bogie of the train. Each superconducting magnet unit is embedded with a superconducting container including a coil case, a thermal shield and a Dewar successively from inside to outside. The coil case is filled with liquid helium. A superconducting coil is provided in the coil case and immersed in the liquid helium. A high-vacuum environment is provided in the thermal shield. Liquid nitrogen inlet and outlet pipes are provided on an outer wall of the thermal shield.Type: GrantFiled: September 23, 2020Date of Patent: February 20, 2024Assignee: HEFEI INSTITUTES OF PHYSICAL SCIENCE, CHINESE ACADEMY OF SCIENCESInventors: Chao Fang, Jing Wei, Yuntao Song, Wenhua Dai, Jinxing Zheng
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Patent number: 11791129Abstract: A method for imaging a material to atomic scale by means of a field-ion microscope having a vacuum chamber configured to accommodate the material prepared in the form of a tip and an imaging gas, and an ion detector is provided. The method includes application of a DC electrical potential (VDC) and of a pulsed electrical potential, of which the maximum pulse value is denoted Vimp, so that the tip erodes for a potential value equal to VDC+Vimp; acquisition, by the detector between at least two pulses of the pulsed potential, of series of at least two ion images of the impacts of the ions repelled by the tip onto the detector; and calculation of a quantity characteristic of a trend of the erosion of the tip based on the series of ion images acquired and the adjustment, between each series of images, of the values of VDC and of Vimp such that the quantity characteristic of the trend and the ratio VDC/Vimp remain constant.Type: GrantFiled: February 20, 2020Date of Patent: October 17, 2023Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, INSTITUT NATIONAL DES SCIENCES APPLIQUEES DE ROUEN (INSA), UNIVERSITE DE ROUEN NORMANDIEInventors: François Vurpillot, Rodrigue Larde, Benjamin Klaes, Gérald Da Costa
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Patent number: 11769648Abstract: An ion source for extracting a ribbon ion beam with improved height uniformity is disclosed. Gas nozzles are disposed in the chamber proximate the extraction aperture. The gas that is introduced near the extraction aperture serves to shape the ribbon ion beam as it is being extracted. For example, the height of the ribbon ion beam may be reduced by injecting gas above and below the ion beam so as to compress the extracted ion beam in the height direction. In some embodiments, the feedgas is introduced near the extraction aperture. In other embodiments, a shield gas, such as an inert gas, is introduced near the extraction aperture.Type: GrantFiled: October 28, 2021Date of Patent: September 26, 2023Assignee: Applied Materials, Inc.Inventor: Adam M. McLaughlin
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Patent number: 11534626Abstract: An asymmetric dual-mode ionization chamber measurement system can include a first high-voltage plate, a second high-voltage plate and a readout plate. The first high-voltage plate can be disposed from the readout plate by a first active volume. The second high-voltage plate can be disposed from the readout plate by a second active volume. A high-voltage potential can be coupled to the first high-voltage plate during a first mode, and to the second high-voltage plate during a second mode. Ion pairs generated by a radiation stream passing through the first active volume during the first mode and the second active volume during the second mode can be measured at the readout plate to determine a radiation rate of the ionizing radiation. The asymmetric dual-mode ionization chamber measurement system can advantageously measure different radiation streams that have significantly different ranges of radiation rates flux.Type: GrantFiled: March 31, 2021Date of Patent: December 27, 2022Assignee: Varian Medical Systems Particle Therapy GmbH & Co. KGInventors: Manuel Schedler, Simon Busold, Birger Schumacher
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Patent number: 11062906Abstract: Compositions, systems, and methods are described for implanting silicon and/or silicon ions in a substrate, involving generation of silicon and/or silicon ions from corresponding silicon precursor compositions, and implantation of the silicon and/or silicon ions in the substrate.Type: GrantFiled: August 14, 2014Date of Patent: July 13, 2021Assignee: Entegris, Inc.Inventors: Ying Tang, Joseph D. Sweeney, Tianniu Chen, James J. Mayer, Richard S. Ray, Oleg Byl, Sharad N. Yedave, Robert Kaim
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Patent number: 10790116Abstract: An apparatus may include a main chamber, the main chamber comprising a plurality of electrodes; an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber along a first direction; and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance axis and the exit axis define a beam bend of at least 30 degrees therebetween.Type: GrantFiled: November 20, 2018Date of Patent: September 29, 2020Assignee: Applied Materials, Inc.Inventors: Alexandre Likhanskii, Frank Sinclair, Shengwu Chang
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Patent number: 10781115Abstract: An apparatus for providing metal ions to a fluid waste stream includes a housing having an inlet port and an outlet port through which the fluid waste stream enters and exits the housing. Within the housing and between the inlet and outlet ports is an electrode assembly that includes first electrode ring assemblies and second electrode ring assemblies. Each first electrode ring assembly includes a first tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more first electrode plates span the interior of the first tubular section and contact the fluid waste stream. Each second electrode ring assembly includes a second tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more second electrode plates span the interior of the second tubular section and contact the fluid waste stream.Type: GrantFiled: September 8, 2017Date of Patent: September 22, 2020Assignee: Innovation Services, IncInventors: Jeffrey G. Hubrig, Joseph B. Dooley
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Patent number: 10763071Abstract: An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.Type: GrantFiled: June 1, 2018Date of Patent: September 1, 2020Assignee: Varian Semiconductor Equipment Associates, Inc.Inventor: Frank Sinclair
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Patent number: 10580634Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.Type: GrantFiled: July 22, 2019Date of Patent: March 3, 2020Assignee: Purdue Research FoundationInventors: Robert Graham Cooks, Anyin Li, Adam Hollerbach
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Patent number: 10559457Abstract: A first mass spectrometer includes a first introduction device configured to select between a reference material and a first portion of an analyte and introduce the selected one of the reference material or the first portion of the analyte to an ion source, the first mass spectrometer being configured to provide third molecular analyte ions to a detector at a first mass resolution of about 30,000 or greater. A system includes the first mass spectrometer and a second mass spectrometer. A method for determining the isotopic composition of an analyte in a sample includes converting a first portion of the analyte to first molecular analyte ions, filtering out second molecular analyte ions, filtering out third molecular analyte ions, detecting two or more of the third molecular analyte ions at a mass resolution of about 30,000 or greater to determine the isotopic composition of at least a portion of the analyte.Type: GrantFiled: November 30, 2018Date of Patent: February 11, 2020Assignees: CALIFORNIA INSTITUTE OF TECHNOLOGY, THERMO FISHER SCIENTIFIC (BREMEN) GMBHInventors: John M. Eiler, Johannes Schwieters
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Patent number: 10395911Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.Type: GrantFiled: February 1, 2019Date of Patent: August 27, 2019Assignee: Rudue Research FoundationInventors: Robert Graham Cooks, Anyin Li, Adam Hollerbach
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Patent number: 10153127Abstract: A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.Type: GrantFiled: October 9, 2017Date of Patent: December 11, 2018Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventor: Jeffrey A. Burgess
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Patent number: 10068745Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.Type: GrantFiled: September 5, 2014Date of Patent: September 4, 2018Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo, Toshiyuki Iwahori
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Patent number: 10062544Abstract: An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.Type: GrantFiled: January 29, 2018Date of Patent: August 28, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventor: James P. Buonodono
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Patent number: 9916966Abstract: An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.Type: GrantFiled: January 26, 2017Date of Patent: March 13, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventor: James P. Buonodono
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Patent number: 9881768Abstract: A charged particle beam system capable of reducing contamination has a sample chamber (15) in which the sample (S) is irradiated with a charged particle beam and a receptacle chamber (21) which is connected into the sample chamber (15) via an isolation valve (25) and is connected to the ambient via a door (26). A transport mechanism (22) conveys the sample (S) from the ambient via the door (26) into the receptacle chamber (21) and via the isolation valve (25) into the sample chamber (15). A cleaning portion supplies active oxygen into the receptacle chamber which can then be evacuated by a vacuum pump.Type: GrantFiled: August 10, 2016Date of Patent: January 30, 2018Assignee: JEOL Ltd.Inventor: Shuji Kawai
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Patent number: 9826615Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source having a collector mirror oriented to reduce contamination of fuel droplet debris. In some embodiments, the EUV radiation source has a fuel droplet generator that provides a plurality of fuel droplets to an EUV source vessel. A primary laser is configured to generate a primary laser beam directed towards the plurality of fuel droplets. The primary laser beam has a sufficient energy to ignite a plasma from the plurality of fuel droplets, which emits extreme ultraviolet radiation. A collector mirror, configured to focus the extreme ultraviolet radiation to an exit aperture of the EUV source vessel, which is oriented so that a normal vector extending outward from a vertex of the collector mirror intersects a direction of a gravitation force by an angle that is less than 90°.Type: GrantFiled: September 22, 2015Date of Patent: November 21, 2017Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jian-Yuan Su, Hung-Ming Kuo, Kuo-Hung Chao, Jui-Chun Peng
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Patent number: 9790107Abstract: An apparatus for providing metal ions to a fluid waste stream includes a housing having an inlet port and an outlet port through which the fluid waste stream enters and exits the housing. Within the housing and between the inlet and outlet ports is an electrode assembly that includes first electrode ring assemblies and second electrode ring assemblies. Each first electrode ring assembly includes a first tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more first electrode plates span the interior of the first tubular section and contact the fluid waste stream. Each second electrode ring assembly includes a second tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more second electrode plates span the interior of the second tubular section and contact the fluid waste stream.Type: GrantFiled: October 31, 2012Date of Patent: October 17, 2017Assignee: INNOVATION SERVICES, INC.Inventors: Jeffrey G. Hubrig, Joseph B. Dooley
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Patent number: 9659736Abstract: An isotope generation apparatus is disclosed including: an ion beam source of any of the types described herein; an extractor for extracting the ion beam from the confinement region, where the beam includes a portion of multiply ionized ions in a selected final ionization state; a target including a target material; and an accelerator for accelerating the ion beam and directing the ion beam to the target. The ion beam directed to the target transmutes at least a portion of the target material to a radio-isotope in response to a nuclear reaction between ions in the selected final ion state and atoms of the target material.Type: GrantFiled: September 12, 2014Date of Patent: May 23, 2017Assignee: ALPHA SOURCE, INC.Inventor: Glenn B. Rosenthal
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Patent number: 9437341Abstract: An apparatus to generate negative hydrogen ions includes an ion source operative to generate positive hydrogen ions, a first component to adjust positive molecular hydrogen ion species in the ion source, a second component to adjust extraction voltage for extraction of the positive molecular hydrogen ions from the ion source, and a charge exchange cell comprising charge exchange species to convert the extracted positive molecular hydrogen ions to negative hydrogen ions. The adjusted extraction voltage is effective to generate an ion energy to maximize negative ion current yield in the charge exchange cell based upon a product of extraction efficiency of the positive molecular hydrogen ions and a peak in charge exchange efficiency for converting a species of the positive molecular hydrogen ions to negative hydrogen ions through charge exchange between the extracted hydrogen ions and charge exchange species.Type: GrantFiled: March 13, 2013Date of Patent: September 6, 2016Assignee: Varian Semiconductor Equipment Associates, Inc.Inventor: Shengwu Chang
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Patent number: 9396917Abstract: Tube-like device (100) for transferring ions generated by means of ion generation source (4) comprising a cylindrical middle portion (104) and an inlet portion (102) for introduction of the ions in at least one ion cloud into the cylindrical middle portion (104), wherein a flow direction of the ions is along a longitudinal axis (L) of the tube-like device (100), wherein the inlet portion (102) is formed tapering funnel-like towards the cylindrical middle portion (104).Type: GrantFiled: February 21, 2013Date of Patent: July 19, 2016Assignees: Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., TechNische Universitaet BerlinInventors: Stephan Rauschenbach, Matthias Pauly, Gordon Rinke, Ralf Vogelgesang, Klaus Kern, Julius Reiss, Joern Sesterhenn, Mario Sroka
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Patent number: 9384943Abstract: Provided is an ion generating apparatus. The ion generating apparatus includes opposed electrodes connected to a high-frequency power supply, and hence, even in a case where a cathode filament is broken, hydride gas can be ionized to generate hydrogen ion. Thus, a fluorine compound deposited in a source housing is reduced in vacuum, and gas containing fluorine generated due to the above-mentioned reduction reaction is discharged with a vacuum pump.Type: GrantFiled: September 15, 2010Date of Patent: July 5, 2016Assignee: SII Semiconductor CorporationInventor: Kiyohiro Tsuru
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Patent number: 9308537Abstract: An electrostatic air conditioner having at least one ion emitting member (i.e., corona frame) and at least one ion collecting member (i.e., collecting cartridge) is provided. The corona frame and collecting cartridge are configured to have active and passive areas and be removable from the housing within which they are positioned. The passive areas provide additional spacing between the active area and the side walls of the housing, and provide several advantages over existing electrostatic air conditioners, e.g., eliminates barriers between active corona wires and the housing walls, which prevents any settling of chemically active or electrically active matter (vapor or particles) on such barriers and/or housing walls (due to air flow).Type: GrantFiled: July 22, 2013Date of Patent: April 12, 2016Inventor: Igor Krichtafovitch
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Patent number: 9196489Abstract: A method of tailoring the dopant profile of a workpiece by modulating one or more operating parameters is disclosed. In one embodiment, the workpiece may be a solar cell and the desired dopant profile may include a heavily doped surface region and a highly doped region. These two regions can be generated by varying one or more of the parameters of the ion implanter. For example, the extraction voltage may be changed to affect the energy of the implanted ions. The ionization energy can be changed to affect the species of ions being generated from the source gas. In another embodiment, the source gasses that are ionized may be changed to affect the species being generated. After the implant has been performed, thermal processing is performed which minimizes the diffusion of the ions in the workpiece.Type: GrantFiled: January 25, 2013Date of Patent: November 24, 2015Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Vikram Bhosle, Bon-Woong Koo
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Patent number: 9087678Abstract: A laser-ablation plasma generator generates laser-ablation plasma from a target in a vacuum vessel. An ion beam extractor generates an ion beam by extracting ions included in the laser-ablation plasma from the vacuum vessel. An ion detector detects unintended ions other than intended ions, which are obtained by ionizing the elements in the target, out of ions in the vacuum vessel and outputs a detection signal representing a value which is a number of the unintended ions or a mixing ratio of the unintended ions to the intended ions as a detection result. The ion source using the laser beam makes it possible to normally monitor unintended ions other than intended ions out of ions in the vacuum vessel.Type: GrantFiled: February 20, 2013Date of Patent: July 21, 2015Assignee: Kabushiki Kaisha ToshibaInventors: Akiko Kakutani, Kiyoshi Hashimoto, Kiyokazu Sato, Takeshi Yoshiyuki, Tsutomu Kurusu
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Publication number: 20150144782Abstract: The invention provides interfaces between analytical instruments, e.g., between chromatography systems and mass spectrometers. In an exemplary embodiment, an ion source is provided for connecting a carbon dioxide-based chromatograph device to a mass spectrometer. The ion source includes a first conduit for receiving eluent from the chromatography device, a heater for heating at least a portion of said first conduit, a second conduit in fluid communication with the first conduit, an inlet for receiving eluent from said second conduit and introducing the eluent into an ion source region to form a plume of gas and/or liquid in the ion source region, and an ionization promoting inlet for injecting an ionization promoting fluid into the ion source region to interact with the plume to promote ionization of at least some of the plume.Type: ApplicationFiled: November 25, 2014Publication date: May 28, 2015Applicant: WATERS TECHNOLOGIES CORPORATIONInventors: Michael O. Fogwill, Joseph D. Michienzi, James P. Murphy, Geoff C. Gerhardt
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Patent number: 9040907Abstract: An apparatus includes an electrostatic ion trap and electronics configured to measure parameters of the ion trap and configured to adjust ion trap settings based on the measured parameters. A method of tuning the electrostatic ion trap includes, under automatic electronic control, measuring parameters of the ion trap and adjusting ion trap settings based on the measured parameters.Type: GrantFiled: October 30, 2012Date of Patent: May 26, 2015Assignee: MKS Instruments, Inc.Inventors: Gerardo A. Brucker, G. Jeffery Rathbone, Brian J. Horvath, Timothy C. Swinney, Stephen C. Blouch, Jeffrey G. McCarthy, Timothy R. Piwonka-Corle
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Patent number: 9040906Abstract: An ion source for a mass spectrometer is disclosed comprising an ionization device which emits a stream of droplets and one or more ultrasonic transmitters which create one or more acoustic standing waves. The acoustic standing waves may be used to further nebulize the stream of droplets and induce internal mixing of the droplets.Type: GrantFiled: November 22, 2012Date of Patent: May 26, 2015Assignee: Micromass UK LimitedInventors: Michael Raymond Morris, Steven Derek Pringle, Keith Richardson
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Publication number: 20150129775Abstract: An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.Type: ApplicationFiled: November 10, 2014Publication date: May 14, 2015Inventor: Masateru Sato
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Patent number: 9029797Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.Type: GrantFiled: July 25, 2013Date of Patent: May 12, 2015Assignee: Agilent Technologies, Inc.Inventors: Mark Denning, Guthrie Partridge
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Publication number: 20150123009Abstract: There is provided a device for generating a heavy-ion beam. The device includes a laser beam generating unit configured to generate a laser beam; a target configured to generate a heavy-ion beam by the laser beam; a laser optical system configured to focus the laser beam on the front of the target; and a plasma treating unit disposed at a rear surface of the target and configured to remove impurities within the target by plasma surface treatment that is performed by radiating cationic plasma onto the rear surface of the target.Type: ApplicationFiled: November 5, 2014Publication date: May 7, 2015Inventors: Dong-Ho SHIN, Moon-Youn JUNG
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Publication number: 20150123010Abstract: A method of producing field emitters having improved brightness and durability relying on the creation of a liquid Taylor cone from electrically conductive materials having high melting points. The method calls for melting the end of a wire substrate with a focused laser beam, while imposing a high positive potential on the material. The resulting molten Taylor cone is subsequently rapidly quenched by cessation of the laser power. Rapid quenching is facilitated in large part by radiative cooling, resulting in structures having characteristics closely matching that of the original liquid Taylor cone. Frozen Taylor cones thus obtained yield desirable tip end forms for field emission sources in electron beam applications. Regeneration of the frozen Taylor cones in-situ is readily accomplished by repeating the initial formation procedures. The high temperature liquid Taylor cones can also be employed as bright ion sources with chemical elements previously considered impractical to implement.Type: ApplicationFiled: November 7, 2014Publication date: May 7, 2015Inventor: Gregory Hirsch
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Patent number: 9024274Abstract: Provided are an ion generation target and a treatment apparatus including the target. The treatment apparatus includes a grid having a net shape of nano wires, an ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam, and a laser for emitting a laser beam into the nano wire of the grid to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam emitted into the nano wire forms a near field, the intensity of which is higher than that of the laser beam through a nanoplasmonics phenomenon, and the near field emits the ions from the ion generation thin film.Type: GrantFiled: April 23, 2013Date of Patent: May 5, 2015Assignee: Electronics and Telecommunications Research InstituteInventors: Moon Youn Jung, Hyung Ju Park, Hyeon-Bong Pyo, Nam Soo Myung, Seunghwan Kim
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Patent number: 9024273Abstract: An apparatus that generates molecular ions and methods to generate molecular ions are disclosed. At least a first species is ionized in an ion source. The first species ions and/or first species combine to form molecular ions. These molecular ions may be transported to a second chamber, which may be an arc chamber or diffusion chamber, and are extracted. The molecular ions may have a larger atomic mass than the first species or first species ions. A second species also may be ionized with the first species to form molecular ions. In one instance, the first and second species are both molecules.Type: GrantFiled: April 20, 2010Date of Patent: May 5, 2015Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Ludovic Godet, Svetlana Radovanov, Christopher R. Hatem
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Patent number: 9020101Abstract: There is provided a target for an X-ray generator, including: a holder part made of an electrically conductive material and having an opening part; a diamond plate air-tightly joined to the holder part so as to close the opening part; a thin film target provided on a surface of the diamond plate, with its outer peripheral part extending to the holder part to be electrically connected to the holder part, wherein the holder part is configured to be electrically connected to a power supply of the X-ray generator, and the diamond plate is incorporated into the X-ray generator with one side disposed in a vacuum atmosphere where the thin film target is formed, and an opposite side thereto disposed at a side where the diamond plate is brought into thermal contact with a refrigerant and cooled.Type: GrantFiled: February 5, 2013Date of Patent: April 28, 2015Assignee: Rigaku CorporationInventors: Kazuhiko Omote, Kazuaki Shimizu, Naohisa Osaka
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Patent number: 9018598Abstract: A system and method comprising an ion production chamber having a plasma source disposed in said chamber, a harvest gas disposed to flow through the chamber from an inlet to an outlet, and a jet, said jet operable to introduce a sample into the harvest gas flow. In some embodiments the system includes using helium as the harvest gas. Certain embodiments include introducing a sample perpendicular to the harvest gas flow and using multiple sample introduction jets to increase mixing efficiency. The charge sample may be coupled to a MEMS-based electrometer.Type: GrantFiled: May 16, 2014Date of Patent: April 28, 2015Assignee: Brechtel Manufacturing, Inc.Inventor: Fredrick J Brechtel
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Patent number: 9018596Abstract: A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.Type: GrantFiled: December 19, 2012Date of Patent: April 28, 2015Assignee: Universiteit AntwerpenInventors: Johan Verbeeck, Gustaaf Van Tendeloo
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Patent number: 9012867Abstract: Ion sources, systems and methods are disclosed.Type: GrantFiled: May 23, 2014Date of Patent: April 21, 2015Assignee: Carl Zeiss Microscopy, LLCInventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
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Publication number: 20150102233Abstract: A method of setting up a medium current ribbon beam for ion implantation is provided. It includes providing an ion source fed with a process gas and a support gas. The process ion beam is separated from the support gas beam with a mass analyzing magnet, and the intensity of the process ion beam is controlled by varying the ratio of process gas to support gas in the ion source gas feed. Process beam intensity may also be controlled with one or more mechanical current limiting devices located downstream of the ion source. An ion beam system is also provided. This method may control the total ribbon beam intensity at the target between approximately 3 uA to about 3 mA.Type: ApplicationFiled: September 18, 2014Publication date: April 16, 2015Inventors: Robert KAIM, Charles M. FREE, David HOGLUND, Wilhelm P. PLATOW, Kourosh SAADATMAND
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Publication number: 20150102232Abstract: In order to achieve an ionization method of high robustness with a small carry-over or less crosstalk, an ionization method is disclosed. A method includes the steps of: joining an ionization unit to a tube; sucking the sample from a sample container into a sample holder of the ionization unit to hold the sample; moving the ionization unit holding the sample to near the ionization unit using an ionization unit drive unit; and applying a voltage to the ionization unit using a power supply to ionize the sample by electrostatically spraying the sample from the holding unit.Type: ApplicationFiled: August 27, 2012Publication date: April 16, 2015Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiroyuki Satake, Hideki Hasegawa, Yuichiro Hahimoto, Masao Suga, Izumi Waki
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Publication number: 20150102230Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.Type: ApplicationFiled: June 21, 2012Publication date: April 16, 2015Applicant: FEI CompanyInventors: Sean Kellogg, Andrew B. Wells, James B. Mcginn, N. William Parker, Mark W. Utlaut
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Patent number: 9006690Abstract: A method is disclosed for reducing particle contamination in an ion implantation system, wherein an ion beam is created via the ion source operating in conjunction with an extraction electrode assembly. A cathode voltage is applied to the ion source for generating ions therein, and a suppression voltage is applied to the extraction assembly for preventing electrons in the ion beam from being drawn into the ion source. The suppression voltage is selectively modulated, thereby inducing a current flow or an arc discharge through the extraction assembly to remove deposits on surfaces thereof to mitigate subsequent contamination of workpieces.Type: GrantFiled: May 3, 2013Date of Patent: April 14, 2015Assignee: Axcelis Technologies, Inc.Inventors: Neil K. Colvin, Jincheng Zhang
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Patent number: 8993982Abstract: A switchable ion gun switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms, comprising: a source chamber having a first gas inlet; a gas expansion nozzle for producing gas clusters in the presence of gas atoms by expansion of a gas from the source chamber through the nozzle; an ionisation chamber for ionising the gas clusters and gas atoms; wherein the ionisation chamber has a second gas inlet for admitting gas directly into the ionisation chamber to form ionised gas atoms; and a variable mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms.Type: GrantFiled: July 15, 2013Date of Patent: March 31, 2015Assignee: VG Systems LimitedInventor: Bryan Barnard
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Publication number: 20150076342Abstract: An electrospray ion source method and system is provided for detecting emitter failure comprising a liquid chromatography column suitable for chromatographic separation of a sample. The column can have an inlet for receiving the sample; and an outlet for ejecting the sample. A make-up flow channel is provided for introducing make-up flow of liquid to the sample post-column, wherein the make-up flow normalizes the spray current. An electrospray ionization source is provided having one or more electrospray ionization emitter nozzles for receiving the make-up flow containing sample. A power supply can provide a voltage to the one or more emitter nozzles, and a measurement device can measure and monitor the spray current.Type: ApplicationFiled: May 17, 2013Publication date: March 19, 2015Applicant: DH Technologies Development Pte. Ltd.Inventors: John L. Campbell, Thomas Covey, Yves LeBlanc, Bradley B. Schneider