Methods Patents (Class 250/424)
  • Patent number: 11062906
    Abstract: Compositions, systems, and methods are described for implanting silicon and/or silicon ions in a substrate, involving generation of silicon and/or silicon ions from corresponding silicon precursor compositions, and implantation of the silicon and/or silicon ions in the substrate.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: July 13, 2021
    Assignee: Entegris, Inc.
    Inventors: Ying Tang, Joseph D. Sweeney, Tianniu Chen, James J. Mayer, Richard S. Ray, Oleg Byl, Sharad N. Yedave, Robert Kaim
  • Patent number: 10790116
    Abstract: An apparatus may include a main chamber, the main chamber comprising a plurality of electrodes; an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber along a first direction; and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance axis and the exit axis define a beam bend of at least 30 degrees therebetween.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: September 29, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Frank Sinclair, Shengwu Chang
  • Patent number: 10781115
    Abstract: An apparatus for providing metal ions to a fluid waste stream includes a housing having an inlet port and an outlet port through which the fluid waste stream enters and exits the housing. Within the housing and between the inlet and outlet ports is an electrode assembly that includes first electrode ring assemblies and second electrode ring assemblies. Each first electrode ring assembly includes a first tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more first electrode plates span the interior of the first tubular section and contact the fluid waste stream. Each second electrode ring assembly includes a second tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more second electrode plates span the interior of the second tubular section and contact the fluid waste stream.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: September 22, 2020
    Assignee: Innovation Services, Inc
    Inventors: Jeffrey G. Hubrig, Joseph B. Dooley
  • Patent number: 10763071
    Abstract: An apparatus may include an ion source, arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column, disposed downstream of the ion source, and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator, disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy, greater than the second ion energy.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: September 1, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Frank Sinclair
  • Patent number: 10580634
    Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 3, 2020
    Assignee: Purdue Research Foundation
    Inventors: Robert Graham Cooks, Anyin Li, Adam Hollerbach
  • Patent number: 10559457
    Abstract: A first mass spectrometer includes a first introduction device configured to select between a reference material and a first portion of an analyte and introduce the selected one of the reference material or the first portion of the analyte to an ion source, the first mass spectrometer being configured to provide third molecular analyte ions to a detector at a first mass resolution of about 30,000 or greater. A system includes the first mass spectrometer and a second mass spectrometer. A method for determining the isotopic composition of an analyte in a sample includes converting a first portion of the analyte to first molecular analyte ions, filtering out second molecular analyte ions, filtering out third molecular analyte ions, detecting two or more of the third molecular analyte ions at a mass resolution of about 30,000 or greater to determine the isotopic composition of at least a portion of the analyte.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: February 11, 2020
    Assignees: CALIFORNIA INSTITUTE OF TECHNOLOGY, THERMO FISHER SCIENTIFIC (BREMEN) GMBH
    Inventors: John M. Eiler, Johannes Schwieters
  • Patent number: 10395911
    Abstract: The invention generally relates to systems and methods for relay ionization of a sample. In certain aspects, the invention provides systems that include an ion source that generates ions, a sample emitter configured to hold a sample, and a mass spectrometer. The system is configured such that the ions generated by the ion source are directed to interact with the sample emitter, thereby causing the sample to be discharged from the sample emitter and into the mass spectrometer.
    Type: Grant
    Filed: February 1, 2019
    Date of Patent: August 27, 2019
    Assignee: Rudue Research Foundation
    Inventors: Robert Graham Cooks, Anyin Li, Adam Hollerbach
  • Patent number: 10153127
    Abstract: A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: December 11, 2018
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventor: Jeffrey A. Burgess
  • Patent number: 10068745
    Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.
    Type: Grant
    Filed: September 5, 2014
    Date of Patent: September 4, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshie Yaguchi, Yasuhira Nagakubo, Toshiyuki Iwahori
  • Patent number: 10062544
    Abstract: An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: August 28, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: James P. Buonodono
  • Patent number: 9916966
    Abstract: An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: March 13, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: James P. Buonodono
  • Patent number: 9881768
    Abstract: A charged particle beam system capable of reducing contamination has a sample chamber (15) in which the sample (S) is irradiated with a charged particle beam and a receptacle chamber (21) which is connected into the sample chamber (15) via an isolation valve (25) and is connected to the ambient via a door (26). A transport mechanism (22) conveys the sample (S) from the ambient via the door (26) into the receptacle chamber (21) and via the isolation valve (25) into the sample chamber (15). A cleaning portion supplies active oxygen into the receptacle chamber which can then be evacuated by a vacuum pump.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 30, 2018
    Assignee: JEOL Ltd.
    Inventor: Shuji Kawai
  • Patent number: 9826615
    Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source having a collector mirror oriented to reduce contamination of fuel droplet debris. In some embodiments, the EUV radiation source has a fuel droplet generator that provides a plurality of fuel droplets to an EUV source vessel. A primary laser is configured to generate a primary laser beam directed towards the plurality of fuel droplets. The primary laser beam has a sufficient energy to ignite a plasma from the plurality of fuel droplets, which emits extreme ultraviolet radiation. A collector mirror, configured to focus the extreme ultraviolet radiation to an exit aperture of the EUV source vessel, which is oriented so that a normal vector extending outward from a vertex of the collector mirror intersects a direction of a gravitation force by an angle that is less than 90°.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: November 21, 2017
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Jian-Yuan Su, Hung-Ming Kuo, Kuo-Hung Chao, Jui-Chun Peng
  • Patent number: 9790107
    Abstract: An apparatus for providing metal ions to a fluid waste stream includes a housing having an inlet port and an outlet port through which the fluid waste stream enters and exits the housing. Within the housing and between the inlet and outlet ports is an electrode assembly that includes first electrode ring assemblies and second electrode ring assemblies. Each first electrode ring assembly includes a first tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more first electrode plates span the interior of the first tubular section and contact the fluid waste stream. Each second electrode ring assembly includes a second tubular section formed of electrically insulative material and has an interior through which the fluid waste stream flows. One or more second electrode plates span the interior of the second tubular section and contact the fluid waste stream.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: October 17, 2017
    Assignee: INNOVATION SERVICES, INC.
    Inventors: Jeffrey G. Hubrig, Joseph B. Dooley
  • Patent number: 9659736
    Abstract: An isotope generation apparatus is disclosed including: an ion beam source of any of the types described herein; an extractor for extracting the ion beam from the confinement region, where the beam includes a portion of multiply ionized ions in a selected final ionization state; a target including a target material; and an accelerator for accelerating the ion beam and directing the ion beam to the target. The ion beam directed to the target transmutes at least a portion of the target material to a radio-isotope in response to a nuclear reaction between ions in the selected final ion state and atoms of the target material.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: May 23, 2017
    Assignee: ALPHA SOURCE, INC.
    Inventor: Glenn B. Rosenthal
  • Patent number: 9437341
    Abstract: An apparatus to generate negative hydrogen ions includes an ion source operative to generate positive hydrogen ions, a first component to adjust positive molecular hydrogen ion species in the ion source, a second component to adjust extraction voltage for extraction of the positive molecular hydrogen ions from the ion source, and a charge exchange cell comprising charge exchange species to convert the extracted positive molecular hydrogen ions to negative hydrogen ions. The adjusted extraction voltage is effective to generate an ion energy to maximize negative ion current yield in the charge exchange cell based upon a product of extraction efficiency of the positive molecular hydrogen ions and a peak in charge exchange efficiency for converting a species of the positive molecular hydrogen ions to negative hydrogen ions through charge exchange between the extracted hydrogen ions and charge exchange species.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: September 6, 2016
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Shengwu Chang
  • Patent number: 9396917
    Abstract: Tube-like device (100) for transferring ions generated by means of ion generation source (4) comprising a cylindrical middle portion (104) and an inlet portion (102) for introduction of the ions in at least one ion cloud into the cylindrical middle portion (104), wherein a flow direction of the ions is along a longitudinal axis (L) of the tube-like device (100), wherein the inlet portion (102) is formed tapering funnel-like towards the cylindrical middle portion (104).
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: July 19, 2016
    Assignees: Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., TechNische Universitaet Berlin
    Inventors: Stephan Rauschenbach, Matthias Pauly, Gordon Rinke, Ralf Vogelgesang, Klaus Kern, Julius Reiss, Joern Sesterhenn, Mario Sroka
  • Patent number: 9384943
    Abstract: Provided is an ion generating apparatus. The ion generating apparatus includes opposed electrodes connected to a high-frequency power supply, and hence, even in a case where a cathode filament is broken, hydride gas can be ionized to generate hydrogen ion. Thus, a fluorine compound deposited in a source housing is reduced in vacuum, and gas containing fluorine generated due to the above-mentioned reduction reaction is discharged with a vacuum pump.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: July 5, 2016
    Assignee: SII Semiconductor Corporation
    Inventor: Kiyohiro Tsuru
  • Patent number: 9308537
    Abstract: An electrostatic air conditioner having at least one ion emitting member (i.e., corona frame) and at least one ion collecting member (i.e., collecting cartridge) is provided. The corona frame and collecting cartridge are configured to have active and passive areas and be removable from the housing within which they are positioned. The passive areas provide additional spacing between the active area and the side walls of the housing, and provide several advantages over existing electrostatic air conditioners, e.g., eliminates barriers between active corona wires and the housing walls, which prevents any settling of chemically active or electrically active matter (vapor or particles) on such barriers and/or housing walls (due to air flow).
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: April 12, 2016
    Inventor: Igor Krichtafovitch
  • Patent number: 9196489
    Abstract: A method of tailoring the dopant profile of a workpiece by modulating one or more operating parameters is disclosed. In one embodiment, the workpiece may be a solar cell and the desired dopant profile may include a heavily doped surface region and a highly doped region. These two regions can be generated by varying one or more of the parameters of the ion implanter. For example, the extraction voltage may be changed to affect the energy of the implanted ions. The ionization energy can be changed to affect the species of ions being generated from the source gas. In another embodiment, the source gasses that are ionized may be changed to affect the species being generated. After the implant has been performed, thermal processing is performed which minimizes the diffusion of the ions in the workpiece.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: November 24, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Vikram Bhosle, Bon-Woong Koo
  • Patent number: 9087678
    Abstract: A laser-ablation plasma generator generates laser-ablation plasma from a target in a vacuum vessel. An ion beam extractor generates an ion beam by extracting ions included in the laser-ablation plasma from the vacuum vessel. An ion detector detects unintended ions other than intended ions, which are obtained by ionizing the elements in the target, out of ions in the vacuum vessel and outputs a detection signal representing a value which is a number of the unintended ions or a mixing ratio of the unintended ions to the intended ions as a detection result. The ion source using the laser beam makes it possible to normally monitor unintended ions other than intended ions out of ions in the vacuum vessel.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: July 21, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akiko Kakutani, Kiyoshi Hashimoto, Kiyokazu Sato, Takeshi Yoshiyuki, Tsutomu Kurusu
  • Publication number: 20150144782
    Abstract: The invention provides interfaces between analytical instruments, e.g., between chromatography systems and mass spectrometers. In an exemplary embodiment, an ion source is provided for connecting a carbon dioxide-based chromatograph device to a mass spectrometer. The ion source includes a first conduit for receiving eluent from the chromatography device, a heater for heating at least a portion of said first conduit, a second conduit in fluid communication with the first conduit, an inlet for receiving eluent from said second conduit and introducing the eluent into an ion source region to form a plume of gas and/or liquid in the ion source region, and an ionization promoting inlet for injecting an ionization promoting fluid into the ion source region to interact with the plume to promote ionization of at least some of the plume.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: WATERS TECHNOLOGIES CORPORATION
    Inventors: Michael O. Fogwill, Joseph D. Michienzi, James P. Murphy, Geoff C. Gerhardt
  • Patent number: 9040907
    Abstract: An apparatus includes an electrostatic ion trap and electronics configured to measure parameters of the ion trap and configured to adjust ion trap settings based on the measured parameters. A method of tuning the electrostatic ion trap includes, under automatic electronic control, measuring parameters of the ion trap and adjusting ion trap settings based on the measured parameters.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: May 26, 2015
    Assignee: MKS Instruments, Inc.
    Inventors: Gerardo A. Brucker, G. Jeffery Rathbone, Brian J. Horvath, Timothy C. Swinney, Stephen C. Blouch, Jeffrey G. McCarthy, Timothy R. Piwonka-Corle
  • Patent number: 9040906
    Abstract: An ion source for a mass spectrometer is disclosed comprising an ionization device which emits a stream of droplets and one or more ultrasonic transmitters which create one or more acoustic standing waves. The acoustic standing waves may be used to further nebulize the stream of droplets and induce internal mixing of the droplets.
    Type: Grant
    Filed: November 22, 2012
    Date of Patent: May 26, 2015
    Assignee: Micromass UK Limited
    Inventors: Michael Raymond Morris, Steven Derek Pringle, Keith Richardson
  • Publication number: 20150129775
    Abstract: An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.
    Type: Application
    Filed: November 10, 2014
    Publication date: May 14, 2015
    Inventor: Masateru Sato
  • Patent number: 9029797
    Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: May 12, 2015
    Assignee: Agilent Technologies, Inc.
    Inventors: Mark Denning, Guthrie Partridge
  • Publication number: 20150123009
    Abstract: There is provided a device for generating a heavy-ion beam. The device includes a laser beam generating unit configured to generate a laser beam; a target configured to generate a heavy-ion beam by the laser beam; a laser optical system configured to focus the laser beam on the front of the target; and a plasma treating unit disposed at a rear surface of the target and configured to remove impurities within the target by plasma surface treatment that is performed by radiating cationic plasma onto the rear surface of the target.
    Type: Application
    Filed: November 5, 2014
    Publication date: May 7, 2015
    Inventors: Dong-Ho SHIN, Moon-Youn JUNG
  • Publication number: 20150123010
    Abstract: A method of producing field emitters having improved brightness and durability relying on the creation of a liquid Taylor cone from electrically conductive materials having high melting points. The method calls for melting the end of a wire substrate with a focused laser beam, while imposing a high positive potential on the material. The resulting molten Taylor cone is subsequently rapidly quenched by cessation of the laser power. Rapid quenching is facilitated in large part by radiative cooling, resulting in structures having characteristics closely matching that of the original liquid Taylor cone. Frozen Taylor cones thus obtained yield desirable tip end forms for field emission sources in electron beam applications. Regeneration of the frozen Taylor cones in-situ is readily accomplished by repeating the initial formation procedures. The high temperature liquid Taylor cones can also be employed as bright ion sources with chemical elements previously considered impractical to implement.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 7, 2015
    Inventor: Gregory Hirsch
  • Patent number: 9024274
    Abstract: Provided are an ion generation target and a treatment apparatus including the target. The treatment apparatus includes a grid having a net shape of nano wires, an ion generation thin film attached to a side of the grid and generating ions by means of an incident laser beam, and a laser for emitting a laser beam into the nano wire of the grid to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam emitted into the nano wire forms a near field, the intensity of which is higher than that of the laser beam through a nanoplasmonics phenomenon, and the near field emits the ions from the ion generation thin film.
    Type: Grant
    Filed: April 23, 2013
    Date of Patent: May 5, 2015
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Moon Youn Jung, Hyung Ju Park, Hyeon-Bong Pyo, Nam Soo Myung, Seunghwan Kim
  • Patent number: 9024273
    Abstract: An apparatus that generates molecular ions and methods to generate molecular ions are disclosed. At least a first species is ionized in an ion source. The first species ions and/or first species combine to form molecular ions. These molecular ions may be transported to a second chamber, which may be an arc chamber or diffusion chamber, and are extracted. The molecular ions may have a larger atomic mass than the first species or first species ions. A second species also may be ionized with the first species to form molecular ions. In one instance, the first and second species are both molecules.
    Type: Grant
    Filed: April 20, 2010
    Date of Patent: May 5, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ludovic Godet, Svetlana Radovanov, Christopher R. Hatem
  • Patent number: 9018596
    Abstract: A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: April 28, 2015
    Assignee: Universiteit Antwerpen
    Inventors: Johan Verbeeck, Gustaaf Van Tendeloo
  • Patent number: 9018598
    Abstract: A system and method comprising an ion production chamber having a plasma source disposed in said chamber, a harvest gas disposed to flow through the chamber from an inlet to an outlet, and a jet, said jet operable to introduce a sample into the harvest gas flow. In some embodiments the system includes using helium as the harvest gas. Certain embodiments include introducing a sample perpendicular to the harvest gas flow and using multiple sample introduction jets to increase mixing efficiency. The charge sample may be coupled to a MEMS-based electrometer.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: April 28, 2015
    Assignee: Brechtel Manufacturing, Inc.
    Inventor: Fredrick J Brechtel
  • Patent number: 9020101
    Abstract: There is provided a target for an X-ray generator, including: a holder part made of an electrically conductive material and having an opening part; a diamond plate air-tightly joined to the holder part so as to close the opening part; a thin film target provided on a surface of the diamond plate, with its outer peripheral part extending to the holder part to be electrically connected to the holder part, wherein the holder part is configured to be electrically connected to a power supply of the X-ray generator, and the diamond plate is incorporated into the X-ray generator with one side disposed in a vacuum atmosphere where the thin film target is formed, and an opposite side thereto disposed at a side where the diamond plate is brought into thermal contact with a refrigerant and cooled.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: April 28, 2015
    Assignee: Rigaku Corporation
    Inventors: Kazuhiko Omote, Kazuaki Shimizu, Naohisa Osaka
  • Patent number: 9012867
    Abstract: Ion sources, systems and methods are disclosed.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: April 21, 2015
    Assignee: Carl Zeiss Microscopy, LLC
    Inventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, Randall G. Percival, Raymond Hill, Klaus Edinger, Lars Markwort, Dirk Aderhold, Ulrich Mantz
  • Publication number: 20150102230
    Abstract: An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
    Type: Application
    Filed: June 21, 2012
    Publication date: April 16, 2015
    Applicant: FEI Company
    Inventors: Sean Kellogg, Andrew B. Wells, James B. Mcginn, N. William Parker, Mark W. Utlaut
  • Publication number: 20150102232
    Abstract: In order to achieve an ionization method of high robustness with a small carry-over or less crosstalk, an ionization method is disclosed. A method includes the steps of: joining an ionization unit to a tube; sucking the sample from a sample container into a sample holder of the ionization unit to hold the sample; moving the ionization unit holding the sample to near the ionization unit using an ionization unit drive unit; and applying a voltage to the ionization unit using a power supply to ionize the sample by electrostatically spraying the sample from the holding unit.
    Type: Application
    Filed: August 27, 2012
    Publication date: April 16, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Satake, Hideki Hasegawa, Yuichiro Hahimoto, Masao Suga, Izumi Waki
  • Publication number: 20150102233
    Abstract: A method of setting up a medium current ribbon beam for ion implantation is provided. It includes providing an ion source fed with a process gas and a support gas. The process ion beam is separated from the support gas beam with a mass analyzing magnet, and the intensity of the process ion beam is controlled by varying the ratio of process gas to support gas in the ion source gas feed. Process beam intensity may also be controlled with one or more mechanical current limiting devices located downstream of the ion source. An ion beam system is also provided. This method may control the total ribbon beam intensity at the target between approximately 3 uA to about 3 mA.
    Type: Application
    Filed: September 18, 2014
    Publication date: April 16, 2015
    Inventors: Robert KAIM, Charles M. FREE, David HOGLUND, Wilhelm P. PLATOW, Kourosh SAADATMAND
  • Patent number: 9006690
    Abstract: A method is disclosed for reducing particle contamination in an ion implantation system, wherein an ion beam is created via the ion source operating in conjunction with an extraction electrode assembly. A cathode voltage is applied to the ion source for generating ions therein, and a suppression voltage is applied to the extraction assembly for preventing electrons in the ion beam from being drawn into the ion source. The suppression voltage is selectively modulated, thereby inducing a current flow or an arc discharge through the extraction assembly to remove deposits on surfaces thereof to mitigate subsequent contamination of workpieces.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: April 14, 2015
    Assignee: Axcelis Technologies, Inc.
    Inventors: Neil K. Colvin, Jincheng Zhang
  • Patent number: 8993982
    Abstract: A switchable ion gun switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms, comprising: a source chamber having a first gas inlet; a gas expansion nozzle for producing gas clusters in the presence of gas atoms by expansion of a gas from the source chamber through the nozzle; an ionisation chamber for ionising the gas clusters and gas atoms; wherein the ionisation chamber has a second gas inlet for admitting gas directly into the ionisation chamber to form ionised gas atoms; and a variable mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: March 31, 2015
    Assignee: VG Systems Limited
    Inventor: Bryan Barnard
  • Publication number: 20150076340
    Abstract: Methods of characterizing an analyte of interest are provided. The methods can involve using a population of nanoparticles (e.g., magnetic ferrite nanoparticles) as a matrix for matrix-assisted laser desorption ionization (MALDI) mass spectrometry. The size, shape, and composition of the nanoparticles can be selected in view of a variety of factors, including the nature of the analyte of interest, the desired characteristics of the mass spectrum, the nature of the energy directed onto the target composition, and combinations thereof. The nanoparticle matrix can enhance MALDI analysis by providing a cleaner mass spectral background and/or inducing abundant fragmentation of analyte ions by in-source decay (ISD). The nanoparticles are also versatile and selective; the nanoparticle matrix can be tuned to render the matrix particles compatible with an analyte of interest and/or improve selectivity for an analyte of interest.
    Type: Application
    Filed: September 16, 2014
    Publication date: March 19, 2015
    Inventors: Qiaoli Liang, Yuping Bao, Carolyn J. Cassady
  • Publication number: 20150076342
    Abstract: An electrospray ion source method and system is provided for detecting emitter failure comprising a liquid chromatography column suitable for chromatographic separation of a sample. The column can have an inlet for receiving the sample; and an outlet for ejecting the sample. A make-up flow channel is provided for introducing make-up flow of liquid to the sample post-column, wherein the make-up flow normalizes the spray current. An electrospray ionization source is provided having one or more electrospray ionization emitter nozzles for receiving the make-up flow containing sample. A power supply can provide a voltage to the one or more emitter nozzles, and a measurement device can measure and monitor the spray current.
    Type: Application
    Filed: May 17, 2013
    Publication date: March 19, 2015
    Applicant: DH Technologies Development Pte. Ltd.
    Inventors: John L. Campbell, Thomas Covey, Yves LeBlanc, Bradley B. Schneider
  • Patent number: 8981315
    Abstract: To avoid a glow discharge during the use of a conventional gas ionization chamber, there is no alternative but to increase a gas pressure. Therefore, while a conventional gas ionization chamber is used, an ion current cannot be increased by raising a gas introduction pressure. An object of the present invention is to increase the ion current by raising the gas pressure and prevent an ion beam from being scattered by an ionization gas. The gas is supplied from a structure maintained at a ground potential to prevent the application of a high voltage to the vicinity of an ionization gas introduction port at which the gas pressure is relatively high. Further, the ionization gas existing in a region through which the ion beam passes is preferentially reduced by performing differential evacuation from a lens opening in a lens electrode that forms an acceleration/focusing lens.
    Type: Grant
    Filed: May 28, 2012
    Date of Patent: March 17, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Muto, Yoshimi Kawanami
  • Publication number: 20150063547
    Abstract: A method for stabilizing a plasma is disclosed. The method includes (a) providing in an ionization chamber a number of high voltage wires and a gas suitable for forming a plasma, and (b) exposing the gas to a high voltage thereby igniting the gas to form the plasma. Upon ignition, the plasma is subjected to an amount of light. A use of the method to generate X-rays is also disclosed. The invention is further directed to an ionization chamber including (a) a gas suitable for forming a plasma, and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma. The ionization chamber includes a device for subjecting the plasma upon ignition to an amount of light. The invention relates to an X-ray generator including such ionization chamber and to a laser apparatus including such X-ray generator.
    Type: Application
    Filed: March 28, 2013
    Publication date: March 5, 2015
    Inventors: Marc Mestres, Paul Ceccato
  • Publication number: 20150053854
    Abstract: Disclosed herein are systems and methods that allow analysis of macromolecular structures using laserspray ionization at intermediate pressure or high vacuum using commercially available mass spectrometers with or without modification and with the application of heat. The systems and methods produce multiply-charged ions for improved analysis in mass spectrometry.
    Type: Application
    Filed: September 4, 2014
    Publication date: February 26, 2015
    Applicant: WAYNE STATE UNIVERSITY
    Inventor: Sarah Trimpin
  • Publication number: 20150048255
    Abstract: An ion source for a mass spectrometer and a method of ionizing a sample are disclosed. A droplet generator is configured to emit a stream of analyte droplets, which are ionized upon impact with a target, thus forming an ion stream. Preferably, the droplets have a diameter that is greater than a preset value to increase the kinetic energy of the droplets. Additionally, the droplet generator can be configured to create a gas flow that increases the kinetic energy of the droplets. In one embodiment, the target is positioned upstream of an inlet of a mass spectrometer so that the ion stream enters the inlet. In another preferred embodiment, the target is positioned downstream of the inlet so that the stream of droplets passes through the inlet of the mass spectrometer, and the inlet is provided with a pressure drop that increases the kinetic energy of the droplets.
    Type: Application
    Filed: August 13, 2014
    Publication date: February 19, 2015
    Inventor: Joseph A. Jarrell
  • Publication number: 20150034817
    Abstract: A mass spectrometry apparatus includes a holding table that holds a specimen to be ionized, a probe that identifies a portion of the specimen to be ionized, an ion extraction electrode that extracts ions obtained by ionizing the specimen, a liquid supplying unit that supplies liquid to between the specimen and the probe to form a liquid bridge between the specimen and the probe, a vibrating unit that vibrates one of the probe and the holding table, an electric field generating unit that generates an electric field between the probe and the ion extraction electrode, a mass spectrometry unit that mass analyzes ions extracted by the ion extraction electrode, and a synchronization unit configured to synchronize a time at which ions are generated from the portion with a time at which the mass spectrometry unit measures the ions.
    Type: Application
    Filed: July 30, 2014
    Publication date: February 5, 2015
    Inventors: Yoichi Otsuka, Masafumi Kyogaku
  • Publication number: 20150034837
    Abstract: An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within the ion source chamber. The ion source chamber and cathode are comprised of a refractory metal. A phosphide insert is disposed within the ion source chamber and presents an exposed surface area that is configured to generate gas phase phosphorous species when the plasma is present in the ion source chamber, wherein the phosphide component is one of boron phosphide, tungsten phosphide, aluminum phosphide, nickel phosphide, calcium phosphide and indium phosphide.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 5, 2015
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, William T. Levay, Richard M. White, Eric R. Cobb
  • Publication number: 20150034814
    Abstract: An ion source for a mass spectrometer is disclosed comprising a lens and mirror arrangement which focuses a laser beam onto the upper surface of a target substrate. The lens has an effective focal length ?300 mm. The laser beam is directed onto the target substrate at an angle ? with respect to the perpendicular to the target substrate, wherein ??3°. One or more ion guides receive ions released from the target substrate and onwardly transmit the ions along an ion path which substantially bypasses the lens and mirror.
    Type: Application
    Filed: July 6, 2012
    Publication date: February 5, 2015
    Applicant: MICROMASS UK LIMITED
    Inventors: Jeffery Mark Brown, Paul Murray, Daniel James Kenny
  • Publication number: 20150028222
    Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.
    Type: Application
    Filed: July 25, 2013
    Publication date: January 29, 2015
    Applicant: Agilent Technologies, Inc.
    Inventors: Mark Denning, Guthrie Partridge
  • Patent number: RE45386
    Abstract: The present invention relates to inductively coupled plasma mass spectrometry (ICPMS) in which a collision cell is employed to selectively remove unwanted artefact ions from an ion beam by causing them to interact with a reagent gas. The present invention provides a first evacuated chamber (6) at high vacuum located between an expansion chamber (3) and a second evacuated chamber (20) containing the collision cell (24). The first evacuated chamber (6) includes a first ion optical device (17). The collision cell (24) contains a second ion optical device (25). The provision of the first evacuated chamber (5) reduces the gas load on the collision cell (24), by minimising the residual pressure within the collision cell (24) that is attributable to the gas load from the plasma source (1). This serves to minimise the formation, or re-formation, of unwanted artefact ions in the collision cell (24).
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: February 24, 2015
    Assignee: Thermo Fisher Scientific (Bremen) GmbH
    Inventor: Philip Marriott