Abstract: To avoid a glow discharge during the use of a conventional gas ionization chamber, there is no alternative but to increase a gas pressure. Therefore, while a conventional gas ionization chamber is used, an ion current cannot be increased by raising a gas introduction pressure. An object of the present invention is to increase the ion current by raising the gas pressure and prevent an ion beam from being scattered by an ionization gas. The gas is supplied from a structure maintained at a ground potential to prevent the application of a high voltage to the vicinity of an ionization gas introduction port at which the gas pressure is relatively high. Further, the ionization gas existing in a region through which the ion beam passes is preferentially reduced by performing differential evacuation from a lens opening in a lens electrode that forms an acceleration/focusing lens.

Abstract: A method for stabilizing a plasma is disclosed. The method includes (a) providing in an ionization chamber a number of high voltage wires and a gas suitable for forming a plasma, and (b) exposing the gas to a high voltage thereby igniting the gas to form the plasma. Upon ignition, the plasma is subjected to an amount of light. A use of the method to generate X-rays is also disclosed. The invention is further directed to an ionization chamber including (a) a gas suitable for forming a plasma, and (b) a number of high voltage wires for exposing the gas to a high voltage thereby igniting the gas to form the plasma. The ionization chamber includes a device for subjecting the plasma upon ignition to an amount of light. The invention relates to an X-ray generator including such ionization chamber and to a laser apparatus including such X-ray generator.

Abstract: Disclosed herein are systems and methods that allow analysis of macromolecular structures using laserspray ionization at intermediate pressure or high vacuum using commercially available mass spectrometers with or without modification and with the application of heat. The systems and methods produce multiply-charged ions for improved analysis in mass spectrometry.

Abstract: An ion source for a mass spectrometer and a method of ionizing a sample are disclosed. A droplet generator is configured to emit a stream of analyte droplets, which are ionized upon impact with a target, thus forming an ion stream. Preferably, the droplets have a diameter that is greater than a preset value to increase the kinetic energy of the droplets. Additionally, the droplet generator can be configured to create a gas flow that increases the kinetic energy of the droplets. In one embodiment, the target is positioned upstream of an inlet of a mass spectrometer so that the ion stream enters the inlet. In another preferred embodiment, the target is positioned downstream of the inlet so that the stream of droplets passes through the inlet of the mass spectrometer, and the inlet is provided with a pressure drop that increases the kinetic energy of the droplets.

Abstract: An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within the ion source chamber. The ion source chamber and cathode are comprised of a refractory metal. A phosphide insert is disposed within the ion source chamber and presents an exposed surface area that is configured to generate gas phase phosphorous species when the plasma is present in the ion source chamber, wherein the phosphide component is one of boron phosphide, tungsten phosphide, aluminum phosphide, nickel phosphide, calcium phosphide and indium phosphide.

Abstract: An ion source for a mass spectrometer is disclosed comprising a lens and mirror arrangement which focuses a laser beam onto the upper surface of a target substrate. The lens has an effective focal length ?300 mm. The laser beam is directed onto the target substrate at an angle ? with respect to the perpendicular to the target substrate, wherein ??3°. One or more ion guides receive ions released from the target substrate and onwardly transmit the ions along an ion path which substantially bypasses the lens and mirror.

Abstract: A mass spectrometry apparatus includes a holding table that holds a specimen to be ionized, a probe that identifies a portion of the specimen to be ionized, an ion extraction electrode that extracts ions obtained by ionizing the specimen, a liquid supplying unit that supplies liquid to between the specimen and the probe to form a liquid bridge between the specimen and the probe, a vibrating unit that vibrates one of the probe and the holding table, an electric field generating unit that generates an electric field between the probe and the ion extraction electrode, a mass spectrometry unit that mass analyzes ions extracted by the ion extraction electrode, and a synchronization unit configured to synchronize a time at which ions are generated from the portion with a time at which the mass spectrometry unit measures the ions.

Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.

Abstract: A method of ion source fabrication for a mass spectrometer includes simultaneously forming aligned component portions of an ion source using direct metal laser fusing of sequential layers. The method can further include forming the component portions on a base plate made from a ceramic material by applying fused powder to the base plate to build the component portions thereon.

Abstract: The invention generally relates to systems and methods for mass spectrometry analysis of microorganisms in samples.

Abstract: The invention relates generally to sample ionization, and provides ionization probe assemblies, systems, computer program products, and methods useful for this purpose.

Abstract: An ion implantation system and method are provided where an ion source generates an ion and a mass analyzer mass analyzes the ion beam. A beam profiling apparatus translates through the ion beam along a profiling plane in a predetermined time, wherein the beam profiling apparatus measures the beam current across a width of the ion beam concurrent with the translation, therein defining a time and position dependent beam current profile of the ion beam. A beam monitoring apparatus is configured to measure the ion beam current at an edge of the ion beam over the predetermined time, therein defining a time dependent ion beam current, and a controller determines a time independent ion beam profile by dividing the time and position dependent beam current profile of the ion beam by the time dependent ion beam current, therein by cancelling fluctuations in ion beam current over the predetermined time.

Abstract: The invention generally relates to systems and methods for sample analysis. In certain embodiments, the invention provides a system for analyzing a sample that includes a probe including a material connected to a high voltage source, a device for generating a heated gas, and a mass analyzer.

Abstract: One embodiment of a particle accelerator includes: a vacuum container with its inside evacuated to produce vacuum, the vacuum container being formed with a laser beam entrance window for allowing a laser beam to enter; a target arranged in the vacuum container so as to be irradiated with a laser beam to generate ions; and a condenser lens for focusing the laser beam onto the target. The condenser lens is arranged at the laser beam entrance window of the vacuum container, and takes a role of a vacuum bulkhead.

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

Abstract: The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.

Abstract: The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10?5 per incident neon ion.

Abstract: An ion source and an ion guide chamber are provided. The ion guide chamber having a gas flow, the gas flow having a longitudinal velocity and a transverse velocity. The ion guide chamber having an exit aperture and at least one ion guide. The at least one ion guide having an entrance end and an exit end with an exit cross-section wherein the exit cross-section is sized to be smaller in area than the entrance cross-section. The at least one ion guide having a plurality of elongated electrodes wherein a gap between the elongated electrodes and the shape of the elongated electrodes in the vicinity of the gap are essentially the same along the length of the at least one ion guide for confining the ions in the vicinity of the gap by a combination of the transverse velocity of the gas and the RF voltage.

Abstract: A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract: The present invention relates to a device for obtaining the ion source of a mass spectrometer using an ultraviolet diode and a CEM module, having the purpose of inducing initial electron emission using a CEM module and by radiating ultraviolet photons emitted from the ultraviolet diode to the entrance of the CEM module to obtain a large amount of amplified electron beams from the exit and to produce electron beams the emission times of which are accurately controlled at low temperature and at low power.

Abstract: An ionization chamber side voltage contact point is formed so as to protrude from the compartment in the ionization chamber, a mass spectrometric unit side voltage contact point 92 is formed in the hole created in the housing of the mass spectrometric unit, and a predetermined distance is provided between the inner periphery of the hole and the outer periphery of the mass spectrometric unit side voltage contact point in the structure, which allows the ionization chamber side voltage contact point to be inserted into the hole so to be connected to the mass spectrometric unit side voltage contact point when the ionization chamber is in the analysis position and allows the ionization chamber side voltage contact point to be pulled out from the hole so as to be disconnected from the mass spectrometric unit side voltage contact point the ionization chamber is in the maintenance position.

Abstract: An ion source for a mass spectrometer is disclosed comprising an ionisation device which emits a stream of droplets and one or more ultrasonic transmitters which create one or more acoustic standing waves. The acoustic standing waves may be used to further nebulise the stream of droplets and induce internal mixing of the droplets.

Abstract: In an electrostatic spray ionization method for spraying a liquid layer from an insulating plate 2, the plate is arranged between two electrodes 1, 4. A constant high voltage power supply 3 is provided and an electric circuit is used to charge and discharge locally a surface of the liquid layer 7 on the insulating plate 2 by applying the power supply between the electrodes 1, 4.

Abstract: A skin treatment method which includes ionizing oxygen and then mixing the ionized oxygen with saline solution to produce an energized saline solution is disclosed. The method further includes applying the energized saline solution to the skin as a mist-like spray to treat the skin. The system used to carry out the method includes an oxygen concentrator for generating oxygen and an ionizer for imparting an electric charge to the oxygen to produce ionized oxygen. The system also includes a bag of saline solution as well as a peristaltic pump for pumping the saline solution from the bag to a spray nozzle mounted in a handheld wand. The concentrator further includes apparatus for pumping or delivering the oxygen and ultimately the ionized oxygen to the spray nozzle. The spray nozzle mixes and atomizes the ionized oxygen and saline solution to produce a spray-like mist of the same which is then applied to an individual's skin.

Abstract: A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium.

Abstract: An ion source may include a chamber configured to house a plasma comprising ions to be directed to a substrate and an extraction power supply configured to apply an extraction terminal voltage to the plasma chamber with respect to a voltage of a substrate positioned downstream of the chamber. The system may further include a boundary electrode voltage supply configured to generate a boundary electrode voltage different than the extraction terminal voltage, and a boundary electrode disposed within the chamber and electrically coupled to the boundary electrode voltage supply, the boundary electrode configured to alter plasma potential of the plasma when the boundary electrode voltage is received.

Abstract: The present disclosure provides a method of manufacturing film member for laser-driven ion acceleration, a film target, and a method of manufacturing the same, so that only the film member exists at a laser focusing point on the film target, allowing repeated ion acceleration from the film member by focusing high power laser beams thereon. The method includes preparing a film member solution containing a film material to be used for laser-driven ion acceleration; forming a film member on a base substrate by using the film member solution; and separating the film member from the base substrate by dipping the base substrate having the film member formed thereon into a film parting solvent.

Abstract: A gas mixture method for generating an ion beam is provided here. By dynamically tuning the mixture ratio of the gas mixture, lifetime of the ion source of an ion implanter can be prolonged. Accordingly, quality of ion beam can be maintained and maintenance fee is reduced.

Abstract: An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.

Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

Abstract: A measuring part 67 measures the potential of a collecting electrode 66 having collected positive and negative ions respectively generated by ion generating parts 61 of ion generators 6a and 6b and ion generating parts 62 of ion generators 6c and 6d. In the judgment of the presence or absence of ions, the ion generators 6a and 6b and the ion generators 6c and 6d are alternately turned ON/OFF. In ion judgment 1, ON/OFF is performed 6 times with a period of 10 seconds. In ion judgment 2, ON/OFF is performed 10 times with a period of 1 second. Then, when the difference (the amount of change) between the maximum value and the minimum value of the output voltage of the measuring part 67 is greater than a given threshold value, the presence of ions is concluded respectively.

Abstract: In various embodiments of the invention, a cargo container can be monitored at appropriate time intervals to determine that no controlled substances have been shipped with the cargo in the container. The monitoring utilizes reactive species produced from an atmospheric analyzer to ionize analyte molecules present in the container which are then analyzed by an appropriate spectroscopy system. In an embodiment of the invention, a sorbent surface can be used to absorb, adsorb or condense analyte molecules within the container whereafter the sorbent surface can be interrogated with the reactive species to generate analyte species characteristic of the contents of the container.

Abstract: The invention comprises a charged particle beam injection method and apparatus used in conjunction with multi-axis charged particle radiation therapy of cancerous tumors. The negative ion beam source includes a negative ion beam source, vacuum system, an ion beam focusing lens, and/or a tandem accelerator. The negative ion beam source uses electric field lines for focusing a negative ion beam. The negative ion source plasma chamber includes a magnetic material, which provides a magnetic field barrier between a high temperature plasma chamber and a low temperature plasma region. The injection system vacuum system and a synchrotron vacuum system are separated by a conversion foil, where negative ions are converted to positive ions. The foil is sealed to the edges of the vacuum tube providing for a higher partial pressure in the injection system vacuum chamber and a lower pressure in the synchrotron vacuum system.

Abstract: A novel process for using enriched and highly enriched dopant gases is provided herein that eliminates the problems currently encountered by end-users from being able to realize the process benefits associated with ion implanting such dopant gases. For a given flow rate within a prescribed range, operating at a reduced total power level of the ion source is designed to reduce the ionization efficiency of the enriched dopant gas compared to that of its corresponding non-enriched or lesser enriched dopant gas. The temperature of the source filament is also reduced, thereby mitigating the adverse effects of fluorine etching and ion source shorting when a fluorine-containing enriched dopant gas is utilized. The reduced levels of total power in combination with a lower ionization efficiency and lower ion source temperature can interact synergistically to improve and extend ion source life, while beneficially maintaining a beam current that does not unacceptably deviate from previously qualified levels.

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract: An electrospray system comprises a liquid extraction surface sampling probe. The probe comprises a probe body having a liquid inlet and a liquid outlet, and having a liquid extraction tip. A solvent delivery conduit is provided for receiving solvent liquid from the liquid inlet and delivering the solvent liquid to the liquid extraction tip. An open liquid extraction channel extends across an exterior surface of the probe body from the liquid extraction tip to the liquid outlet. An electrospray emitter tip is in liquid communication with the liquid outlet of the liquid extraction surface sampling probe. A system for analyzing samples, a liquid junction surface sampling system, and a method of analyzing samples are also disclosed.

Abstract: A novel process for using enriched and highly enriched dopant gases is provided herein that eliminates the problems currently encountered by end-users from being able to realize the process benefits associated with ion implanting such dopant gases. For a given flow rate within a prescribed range, operating at a reduced total power level of the ion source is designed to reduce the ionization efficiency of the enriched dopant gas compared to that of its corresponding non-enriched or lesser enriched dopant gas. The temperature of the source filament is also reduced, thereby mitigating the adverse effects of fluorine etching and ion source shorting when a fluorine-containing enriched dopant gas is utilized. The reduced levels of total power in combination with a lower ionization efficiency and lower ion source temperature can interact synergistically to improve and extend ion source life, while beneficially maintaining a beam current that does not unacceptably deviate from previously qualified levels.

Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

Abstract: Ion sources, systems and methods are disclosed.

Abstract: The invention generally relates to systems and methods for mass spectrometry analysis of microorganisms in samples.

Abstract: A corona discharge ionizer device which emits ions generated by corona discharge to a gas flow to be ionized includes a discharge electrode having a pin configured tip portion. A second grid electrode positioned at a spaced distance from the discharge electrode is provided. The grid electrode is preferably formed from a sheet configured material which has at least one hole formed therein adapted and configured to permit the gas flow to pass therethrough. A power supply is coupled to the discharge electrode and grid electrode configured cause ion emission from the discharge electrode. The power supply is preferably an alternating current power supply configured to produce an alternating electric field region in close proximity to the tip portion of the discharge electrode sufficient to cause avalanche breakdown in the gas flowing in close proximity to the tip portion of the discharge electrode.

Abstract: A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium.

Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.

Abstract: A mass spectrometer is disclosed. The mass spectrometer may include an ion trap configured to trap and analyze an ionized sample. A first aperture may be provided having a first diameter, and a second aperture may be provided having a second diameter. The first aperture may be configured to receive electrons for the purpose of ionizing sample ions within the ion trap. The second aperture may be configured to receive photons for the purpose of ionizing sample ions within the ion trap.

Abstract: A method of and apparatus for controlling the temperature of an inductively coupled or microwave induced plasma for optical emission spectrometry or mass spectrometry in which the intensities of two spectral lines of radiation emitted by the plasma are measured, and the power provided to sustain the plasma is adjusted so that the ratio of the intensities remains substantially constant.

Abstract: An ion source for use in a radiation generator includes a sealed envelope containing an ionizable gas therein. The ion source also includes a RF antenna external to the sealed envelope, the RF antenna to transmit time-varying electromagnetic fields within the sealed envelope for producing ions from the ionizable gas. There is at least one extractor within the sealed envelope having a potential such that the ions are attracted toward the at least one extractor.

Abstract: An electron cyclotron resonance ion source device includes a plasma chamber configured to contain a plasma; a high-frequency system configured to transmit a high-frequency wave into the chamber; a magnetic field generator configured to generate a magnetic field in the chamber; an accelerating tube including an isolating structure and an extraction system, the magnetic field generator for generating a magnetic field being entirely located downstream of the isolating structure.

Abstract: Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.

Abstract: The present invention relates to inductively coupled plasma mass spectrometry (ICPMS) in which a collision cell is employed to selectively remove unwanted artefact ions from an ion beam by causing them to interact with a reagent gas. The present invention provides a first evacuated chamber (6) at high vacuum located between an expansion chamber (3) and a second evacuated chamber (20) containing the collision cell (24). The first evacuated chamber (6) includes a first ion optical device (17). The collision cell (24) contains a second ion optical device (25). The provision of the first evacuated chamber (5) reduces the gas load on the collision cell (24), by minimising the residual pressure within the collision cell (24) that is attributable to the gas load from the plasma source (1). This serves to minimise the formation, or re-formation, of unwanted artefact ions in the collision cell (24).