Abstract: A mass spectrometer comprising: a vacuum chamber; and an ion inlet assembly for transmitting analyte ions into the vacuum chamber; wherein the spectrometer is configured to operate in a cooling mode in which it selectively controls one or more gas flow to the ion inlet assembly for actively cooling the ion inlet assembly.

Abstract: There is provided an ion source device including a pair of first electrodes for emitting an electron, a second electrode that defines a region in which the electron is enclosed and to which raw material source gas is supplied, between the pair of first electrodes, and that has a hole portion through which an ion generated by collision between the electron and the material gas is extruded, an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, and an intermediate electrode disposed between the second electrode and the extraction electrode. A first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

Abstract: An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller.

Abstract: An ion source is provided that includes a gas source for supplying a gas, and an ionization chamber defining a longitudinal axis extending therethrough and including an exit aperture along a side wall of the ionization chamber. The ion source also includes one or more extraction electrodes at the exit aperture of the ionization chamber for extracting ions from the ionization chamber in the form of an ion beam. At least one of the extraction electrodes comprises a set of discrete rods forming a plurality of slits in the at least one extraction electrode for enabling at least one of increasing a current of the ion beam or controlling an angle of extraction of the ion beam from the ionization chamber. Each rod in the set of discrete rods is parallel to the longitudinal axis of the ionization chamber.

Abstract: A vacuum arc thruster (VAT) for a propulsion system of a micro-satellite is provided. The VAT includes an anode, a cathode including a fuel, and an insulator between the anode and the cathode. The VAT is operable to create an arc between the anode and the cathode and discharge plasma through the diverging nozzle as thrust. The anode may define a diverging nozzle. The VAT may further include a Halbach array including a plurality of permanent magnets arranged in a ring, each of the permanent magnets of the ring having a radially inward positioned north pole and a radially outward positioned south pole.

Abstract: An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

Abstract: An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller.

Abstract: The invention relates to a method and device for collecting nanoparticles which may be present in an aerosol. The invention consists of electrostatically collecting nanoparticles contained in an aerosol by a mechanism of particle charging by unipolar ion diffusion, followed by the application of a field without a corona effect, which makes it possible to deposit the particles in concentric rings on different parts of a single flat substrate oriented orthogonally to the aerosol circulation direction. The biggest particles are deposited towards the centre of the flat substrate and the finest particles towards the periphery of the flat substrate. The invention also relates to a method of operation and to the use of such a device for evaluating the exposure of workers or consumers to nanoparticles.

Abstract: Provided are elements for an ion implanter and an ion generating device including the same. The elements include a repeller, a cathode, a chamber wall, and a slit member constituting an arc chamber of an ion generating device for ion implantation used in the fabrication of a semiconductor device. A coating structure including a semicarbide layer is provided to each of the elements in order to stabilize the element against thermal deformation, protect the element from wear, and prevent a deposition product from being peeled off. The coating structure enables precise ion implantation without a change in the position of ion generation or distortion of the equipment. The coating structure allows electrons to be uniformly reflected into the arc chamber to increase the uniformity of plasma, resulting in an improvement in the dissociation efficiency of an ion source gas. The coating structure significantly improves the service life of the element compared to those of existing elements.

Abstract: An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller.

Abstract: This disclosure describes devices, system, and a method for the prediction and prevention of acute decompensated heart failure or other patient conditions involving fluid accumulation in legs or hands. In one example, a wearable device contains a drift-free leg-size sensor and a tissue-elasticity sensor. Both sensors may be relatively inexpensive and developed using innovative new sensing ideas. Preliminary tests with the sensor prototypes show promising results: the leg-size sensor is capable of measuring 1 mm changes in leg diameter and the tissue-elasticity sensor can detect 0.15 MPa differences in elasticity. In another example, a wearable system includes sensors for measuring a variety of physiological parameters, a processing module, and a communication module. A low-profile instrumented sock, e.g., a wearable device, with multiple sensors can provide an indication of heart failure status for a patient.

Abstract: The invention relates to reflectors for time-of-flight mass spectrometers, and especially their design. A Mamyrin reflector is provided which consists of metal plates with cut-out internal apertures, and symmetric shielding edges which are set back from the inner edges. The dipole field formed by these shielding edges penetrates only slightly through the plates and into the interior of the reflector. With a good mechanical design, the resolving power of the time-of-flight mass spectrometer increases by around fifteen percent compared to the best prior art to date.

Abstract: The present invention pertains to an apparatus for generating a charged particle beam comprising a magnetic element for controlling the profile of the beam in a predetermined plane. A cathode can be provided for emitting charged particles and an anode for accelerating the charged particles along an axis of travel. The present invention also pertains to a method for generating a particle beam that has a uniform profile in a predetermined plane comprising inducing emission of charged particles from an emitter, accelerating those particles along and toward an axis of beam travel, generating a magnetic field with a component aligned with the axis of beam travel but different in the predetermined plane than at the emitter, and modifying the beam profile.

Abstract: A primary ion source subassembly for use with a secondary ion mass spectrometer may include a unitary graphite ionizer tube and reservoir base. A primary ion source may include a capillary insert defining an ionizer aperture. An ionizer aperture may be centrally arranged in an outwardly protruding conical or frustoconical surface, and may be overlaid with a refractory metal coating or sheath. Parameters including ionizer surface shape, ionizer materials, ionizer temperature, and beam stop plate orifice geometry may be manipulated to eliminate ghost images. A graphite tube gasket with a dual tapered surface may promote sealing of a source material cavity.

Abstract: An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to pass the electrode therethrough. First and second ends of the body have respective first and second gas conductance limiters. The first gas conductance limiter extends from an outer diameter of the body and has a U-shaped lip. The second gas conductance limiter has a recess for a seal to protect the seal from corrosive gases and maintain an integrity of the seal. A gas source introduces a gas to the arc chamber body. A liner has an opening configured to pass the cathode shield therethrough, where the liner has a recess. A gap is defined between the U-shaped lip and the liner, wherein the U-shaped lip reduces a conductance of gas into the gap and the recess further reduces conductance of gas into the region.

Abstract: An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system. The aperture fastener may be a screw and a bevel washer. The first aperture member may be operably coupled to a base plate via an aperture assembly fastener.

Abstract: The invention relates to a tandem mass spectrometer comprising an ionization source that can produce ions; a mass analyzer comprising an ion trap arranged in such a way as to receive ions from the ion source and a detector that can detect ions leaving the ion trap according to the mass to charge (m/z) ratio thereof; ion activation means for activating ions that can fragment at least some of the ions trapped in the ion trap; and coupling means arranged between the ion trap and said ion activation means. According to the invention, the ion activation means consists of a glow discharge lamp that can generate a light beam oriented towards the ion trap, said light beam being electromagnetic radiation in the vacuum ultraviolet wavelength range with photon energies of between 8 eV and 41 eV in such a way as to fragment at least some of the ions trapped in the ion trap.

Abstract: The present invention pertains to an apparatus for generating a charged particle beam comprising a magnetic element for controlling the profile of the beam in a predetermined plane. A cathode can be provided for emitting charged particles and an anode for accelerating the charged particles along an axis of travel. The present invention also pertains to a method for generating a particle beam that has a uniform profile in a predetermined plane comprising inducing emission of charged particles from an emitter, accelerating those particles along and toward an axis of beam travel, generating a magnetic field with a component aligned with the axis of beam travel but different in the predetermined plane than at the emitter, and modifying the beam profile.

Abstract: This disclosure provides systems, methods, and apparatus for ion generation. In one aspect, an apparatus includes an anode, a first cathode, a second cathode, and a plurality of cusp magnets. The anode has a first open end and a second open end. The first cathode is associated with the first open end of the anode. The second cathode is associated with the second open end of the anode. The anode, the first cathode, and the second cathode define a chamber. The second cathode has an open region configured for the passage of ions from the chamber. Each cusp magnet of the plurality of cusp magnets is disposed along a length of the anode.

Abstract: An apparatus (10) for coupling liquid chromatography with mass spectrometry and for splitting and analyzing a liquid sample includes a fluid conduit (16), which defines a flow passage (18) and is configured to supply the liquid sample. The fluid conduit (16) has an outer surface and a micro-hole (30) through the outer surface into the flow passage (18). The apparatus (10) also includes an ambient ionizer (40) configured to generate and direct a charged solvent (44) toward the micro-hole (30) at the outer surface for ionizing a portion of the liquid sample (32) that emerges out of the micro-hole (30). The apparatus (10) further includes a mass spectrometer (60) having a sample entrance (62) adjacent the micro-hole (30) configured to analyze an ionized portion of the liquid sample (54).

Abstract: Disclosed is a liquid culture medium for substance introduction, which is capable of increasing the survival rate of cells after substance introduction as much as possible when the cells are irradiated with plasma for the purpose of introducing a target substance into each of the cells. Specifically disclosed is a liquid culture medium for substance introduction, which is used for the purpose of introducing a predetermined target substance into a cell and enables introduction of the target substance into the cell by having the cell in the liquid culture medium, which contains the target substance, irradiated with a plasma jet. The liquid culture medium contains a damage preventing component that prevents the cell from damage due to the plasma jet.

Abstract: An ionization vacuum gauge includes a cathode, an anode and an ion collector. The ion collector component is located at one side of the anode component and spaced from the anode component. The cathode component is located at another side of the anode component and includes an electron emitter, which extends toward the anode component from the cathode component. The electron emitter includes at least one carbon nanotube wire.

Abstract: The object of the present invention is to provide a method for producing a micro-plasma with biocompatibility. The produced micro-plasma is a low temperature, adjustable micro-plasma with low energy consumption. The method provides a device comprising a first gas storage unit, a second gas storage unit, a unit for producing the micro-plasma, and a power supply unit.

Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

Abstract: An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.

Abstract: A system and method comprising an ion production chamber having a plasma source disposed in said chamber, a harvest gas disposed to flow through the chamber from an inlet to an outlet, and a jet, said jet operable to introduce a sample into the harvest gas flow. In some embodiments the system includes using helium as the harvest gas. Certain embodiments include introducing a sample perpendicular to the harvest gas flow and using multiple sample introduction jets to increase mixing efficiency. The charge sample may be coupled to a MEMS-based electrometer.

Abstract: Ion sources, systems and methods are disclosed.

Abstract: A method is disclosed for reducing particle contamination in an ion implantation system, wherein an ion beam is created via the ion source operating in conjunction with an extraction electrode assembly. A cathode voltage is applied to the ion source for generating ions therein, and a suppression voltage is applied to the extraction assembly for preventing electrons in the ion beam from being drawn into the ion source. The suppression voltage is selectively modulated, thereby inducing a current flow or an arc discharge through the extraction assembly to remove deposits on surfaces thereof to mitigate subsequent contamination of workpieces.

Abstract: A discharge electrode 5 for generating ions and a high-voltage generating circuit unit 2 that supplies the discharge electrode 5 with a high voltage are housed in a housing 3. A discharge opening 12 for discharging the generated ions is formed in the housing 3. The housing 3 is covered by an exterior case 15. The exterior case 15 is connected to the high-voltage generating circuit unit 2 and functions as an induction electrode. A passage opening 33 leading to the discharge opening 12 is formed in the exterior case 15. An insulating sheet 36 covers the periphery of the passage opening 33 in the exterior case 15 facing a space into which the ions are discharged so that the discharged ions do not attach to the exterior case 15. Decrease in the amount of discharged ions can be prevented while using a peripheral component of the discharge electrode 5 as the induction electrode.

Abstract: To avoid a glow discharge during the use of a conventional gas ionization chamber, there is no alternative but to increase a gas pressure. Therefore, while a conventional gas ionization chamber is used, an ion current cannot be increased by raising a gas introduction pressure. An object of the present invention is to increase the ion current by raising the gas pressure and prevent an ion beam from being scattered by an ionization gas. The gas is supplied from a structure maintained at a ground potential to prevent the application of a high voltage to the vicinity of an ionization gas introduction port at which the gas pressure is relatively high. Further, the ionization gas existing in a region through which the ion beam passes is preferentially reduced by performing differential evacuation from a lens opening in a lens electrode that forms an acceleration/focusing lens.

Abstract: The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed analyte molecules are ionized with ambient temperature ionizing species. In various embodiments of the invention a current is passed through a mesh upon which the analyte molecules are present. The current heats the mesh and results in desorption of the analyte molecules which then interact with gas phase metastable neutral molecules or atoms to form analyte ions characteristic of the analyte molecules.

Abstract: A technique for ion implanting a target is disclosed. In accordance with one exemplary embodiment, the technique may be realized as a method for ion implanting a target, the method comprising: providing a predetermined amount of processing gas in an arc chamber of an ion source, the processing gas containing implant species and implant species carrier, where the implant species carrier may be one of O and H; providing a predetermined amount of dilutant into the arc chamber, wherein the dilutant may comprise a noble species containing material; and ionizing the processing gas and the dilutant.

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

Abstract: Ion implantation systems that separate the flow of ions from the flow of neutral particles are disclosed. The separation of neutral particles from ions can be achieved by manipulating the flow of ions in the system through variations in electrical or magnetic fields disposed within the implantation system. The path of neutral particles is less affected by electrical and magnetic fields than ions. The separation of these flows may also be accomplished by diverting the neutral particles from the ion beam, such as via an introduced gas flow or a flow blockage. Both separation techniques can be combined in some embodiments.

Abstract: The present invention is directed to a method and device to desorb an analyte using heat to allow desorption of the analyte molecules, where the desorbed analyte molecules are ionized with ambient temperature ionizing species. In various embodiments of the invention a current is passed through a mesh upon which the analyte molecules are present. The current heats the mesh and results in desorption of the analyte molecules which then interact with gas phase metastable neutral molecules or atoms to form analyte ions characteristic of the analyte molecules.

Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Abstract: This invention relates to the reduction of charged particle loss by radially introducing sheath air from the porous wall. The corona-wire unipolar aerosol charger of the present invention includes a charging chamber, at least one aerosol inlet channel, a corona wire, an annular sheath air inlet opening, a porous tube defining a charging chamber, an annular sheath air outlet opening, and an aerosol outlet channel. The sheath air inlet opening is for radially introducing a sheath air flow into the charging chamber. The charged particles will not deposit on the wall surface of the charger if the radial velocity of the introduced sheath air at the wall is higher or comparable to the electrostatic velocity of charged particles. The dilution effect of charged particle due to the use of clean air can be further minimized by redirecting the excess clean air to the outside of the charger.

Abstract: Charged particle system are disclosed and include a first voltage source, a second voltage source electrically isolated from the first voltage source, a charged particle source electrically connected to the first voltage source, and an extractor electrically connected to the second voltage source. Methods relating to the charged particle systems are also disclosed.

Abstract: Provided is an air supply tube including an inlet port that takes in air, an outlet port that is arranged opposite a portion of an elongated target structure in a longitudinal direction, to which air taken in from the inlet port is to be supplied, and has an elongated opening shape, a channel portion in which a channel space for allowing air to flow between the inlet port and the outlet port is formed, and plural suppressing portions that suppress the flow of air, wherein the plural suppressing portions include at least a most downstream suppressing portion, a first upstream suppressing portion that is provided in a part initially located on the upstream side in the air flow direction, and a gap regulating portion that forms an extended gap at the same interval.

Abstract: An ion source includes a cathode to emit electrons, a cathode grid downstream of the cathode, a reflector electrode downstream of the cathode grid, reflector grid radially inward of the reflector electrode, and an extractor electrode downstream of the reflector electrode, the extractor electrode and cathode grid defining an ionization region therebetween. The cathode and the cathode grid have a first voltage difference such the electrons are accelerated through the cathode grid and into the ionization region on a trajectory toward the extractor electrode. The reflector grid and the extractor electrode have a second voltage difference less than the first voltage difference such that the electrons slow as they near the extractor electrode and are repelled on a trajectory toward the reflector electrode. The reflector electrode has a negative potential such that the electrons are repelled away from the reflector electrode and into the ionization region.

Abstract: In one embodiment, a sample processing method includes placing a sample on a sample placing module, and setting first processing boxes on one side of slice formation scheduled regions of the sample, and second processing boxes on the other side thereof. The method includes processing the sample by performing a primary scan which sequentially scans the first processing boxes with a continuously generated ion beam, and a secondary scan which sequentially scans the second processing boxes with a continuously generated ion beam, to form slices of the sample. The primary and secondary scans are performed so that a first scanning condition for scanning first regions within the first and second processing boxes is set different from a second scanning condition for scanning second regions between the first processing boxes and between the second processing boxes, to allow frame portions of the sample to remain in the second regions.

Abstract: A method and apparatus are disclosed for controlling a semiconductor process temperature. In one embodiment a thermal control device includes a heat source and a housing comprising a vapor chamber coupled to the heat source. The vapor chamber includes an evaporator section and a condenser section. The evaporator section has a first wall associated with the heat source, the first wall having a wick for drawing a working fluid from a lower portion of the vapor chamber to the evaporator section. The condenser section coupled to a cooling element. The vapor chamber is configured to transfer heat from the heat source to the cooling element via continuous evaporation of the working fluid at the evaporator section and condensation of the working fluid at the condenser section. Other embodiments are disclosed and claimed.

Abstract: An ion generator 10a has an ejection head 18 as an opposite electrode and a discharge electrode 16, and generates air ions by corona discharge. A nozzle 14 supporting the discharge electrode 16 is attached to a base member 12 formed with an air supply path 11, and the nozzle 14 is formed with an exposure surface 24 for exposing the tip end portion 16b of the discharge electrode 16 and a tapered surface 25. The nozzle 14 is formed with air guide holes 26 which communicate with the air supply path 11, and ejection ports of the air guide holes 26 are open on the tapered surface 25. Compressed air ejected from the ejection port is flowed along the tapered surface 25 so that outside air surrounding the nozzle 14 is involved in the compressed air, and sprayed in a front direction of the discharge electrode 16.

Abstract: The present invention provides a method of obtaining a bright source of ions with narrow energy spread for focused ion beam applications using micro plasmas. As a preferred embodiment, a high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe+ and/or Xe2+ ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm2 or higher.

Abstract: The second repeller assembly includes a flat plate and two sleeves through which the legs of a filament pass in electrically insulated manner. The clamp assembly for the filament includes a pair of strap assemblies with three straps each for electrically connecting the clamps and filament to an electrical feed. The straps are in contact with opposite flat sides of a terminal pin.

Abstract: An arc chamber assembly for an ion source comprising a housing having a base and at least one pair of side walls extending upwardly from opposite sides of the base to define an arc chamber, the base having a plurality of channels extending to each sidewall; an inlet port connected to the base for delivering a flow of gas into the channels; a bottom liner having at least one pair of notches in each of two opposite side edges thereof and disposed in the housing in spaced parallel relation to the base and opposite the channels for conducting a flow of gas from the inlet port towards the sidewalls, each notch being in communication with a respective channel of the plurality of channels to pass gas upwardly into the arc chamber; and a pair of side liners, each side liner being disposed in the housing in spaced parallel relation to a respective one of the side walls for conducting a flow of gas between the base and the bottom liner, each side liner having at least one pair of slots to horizontally pass gas into the

Abstract: A device and associated methods of operations are disclosed for interfacing on ion trap to a mass analyzer, such as a TOF mass analyzer. The device includes a plurality of sequentially arranged confinement cells having fixed locations. A group of ions, e.g., ions within a relatively narrow window of mass-to-charge ratio, is received by the device from the ion trap, undergoes fragmentation, and is transported through the device from a first to final confinement cell by a series of transfers between adjacent cells. The ion group is confined in each cell for a prescribed cooling period. By providing a suitable aggregate ion confinement time and by enabling concurrent transport and cooling of successively ejected ion groups, the ions are cooled sufficiently to enable the acquisition of mass spectra at high resolution, without having to substantially delay the ejection of a subsequent group of ions from the ion trap until cooling of the previous group is completed.

Abstract: Methods of enabling the use of high wavelength lasers to create shallow melt junctions are disclosed. In some embodiments, the substrate may be preamorphized to change its absorption characteristics prior to the implantation of a dopant. In other embodiments, a single implant may serve to amorphize the substrate and provide dopant. Once the substrate is sufficiently amorphized, a laser melt anneal may be performed. Due to the changes in the absorption characteristics of the substrate, longer wavelength lasers may be used for the anneal, thereby reducing cost.

Abstract: In an ion generator, a flexible discharge electrode 44 composed of one wire is provided to a base 43, and a turning motion of a free end 44b of the discharge electrode 44 about a fixed end 44a of the discharge electrode 44 is performed by repulsive force of a corona discharge generated by supplying a high voltage to the fixed end 44a. Therefore, in comparison with a discharge electrode composed of a bundle of thin wires, it is possible to significantly reduce dust emission from the free end 44b of the discharge electrode 44, and to further improve the ion generator 30 in maintenance interval. Since the discharge electrode 44 is compose of one wire, it is possible to reduce the discharge electrode 44 in size, easily observe the state of the discharge electrode 44, and simplify its maintenance. Since the discharge electrode 44 performs a turning motion, it is possible to transport the generated air ions EI to a wide area of a packaging film 10, and to enhance ionizing efficiency.