Abstract: The present invention provides methods for controllably forming a layer of amorphous ice and other amorphous solids on a substrate, and also provides cryo-electron microscopy (cryo-EM) sample preparation methods and systems that utilize in vacuo formation of amorphous ice and other solids. Formation of the amorphous solid layer can be independent of the deposition of sample molecules to be analyzed using electron microscopy, and allows for the generation of a uniformly thick layer. Optionally, mass spectrometry instruments are used to generate and purify molecules deposited on the generated amorphous solid layer. The techniques and systems described herein can deliver near ideal cryo-EM sample preparation to greatly increase resolution, sensitivity, scope, and throughput of cryo-EM protein imaging, and therefore greatly impact the field of structural biology.

Abstract: A method for processing scanning electron microscope specimen is provided. The method comprises: providing a specimen to be observed; providing a carbon nanotube array comprising a plurality of carbon nanotubes; and pulling a carbon nanotube film from the carbon nanotube array, and laying the carbon nanotube film on a surface of the specimen, wherein the carbon nanotube film comprising a plurality of through holes.

Abstract: A sample analyzing method and a sample preparing method are provided. The sample analyzing method includes a sample preparing step, a placing step, and an analyzing step. The sample preparing step includes an obtaining step implemented by obtaining an identification information; and a marking and placing step implemented by placing a sample carrying component having a sample disposed thereon into a marking equipment, allowing the marking equipment to utilize the identification information to form an identification structure on the sample carrying component, and placing the sample carrying component into one of the accommodating slots according to the identification information. The placing step is implemented by taking out the sample carrying component from one of the accommodating slots and placing the sample carrying component into an electron microscope equipment. The analyzing step is implemented by utilizing the electron microscope equipment to photograph the sample to generate an analyzation image.

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.

Abstract: An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle, the multistage shuttle having a first shuttle stage having a single degree of freedom of motion for gross movement, a second shuttle stage having a single degree of freedom of motion independent of the first stage for fine movement, an end effector connected to at least one of the first and second shuttle stages, the end effector being configured to hold a grid carrier and transport the grid carrier holding the grid into and out of an electron microscope through a transport interface that is communicably connected to a multi-axis positioning stage port of the electron microscope, the end effector having a range of motion, defined by a combination of the first and second stage degrees of freedom of motions and the multi-axis positioning stage internal to the electron microscope, and an automated loading module connected to the frame and being communicably connected to the transport module,

Abstract: Slide analysis a gripper with three sensors for controlling a slide grip sequence and at least one rotatable carousel with a slide receiving channel. The systems also include a robot with a robot arm that holds a slide gripper residing inside the housing in communication with the rotatable carousel. The systems also include a load lock chamber and a door sealably coupled to the second end portion and an acquisition vacuum chamber with an X-Y stage and a slide holder with a vacuum seal.

Abstract: An ion milling apparatus has: a sample holder including a shield member for shielding the sample except for a portion to be milled; and a sample locking member cooperating with the shield member such that the sample is sandwiched and held therebetween. The shield member has an edge portion that determines a milling position on or in the sample. The sample locking member is disposed downstream of the edge portion in the direction of irradiation by the ion beam and has a support portion cooperating with the edge portion to support the milled portion therebetween. The support portion has a first surface making contact with the sample and a second surface making a given angle to the first surface. The given angle is equal to or less than 90°.

Abstract: An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle, the multistage shuttle having a first shuttle stage having a single degree of freedom of motion for gross movement, a second shuttle stage having a single degree of freedom of motion independent of the first stage for fine movement, an end effector connected to at least one of the first and second shuttle stages, the end effector being configured to hold a grid carrier and transport the grid carrier holding the grid into and out of an electron microscope through a transport interface that is communicably connected to a multi-axis positioning stage port of the electron microscope, the end effector having a range of motion, defined by a combination of the first and second stage degrees of freedom of motions and the multi-axis positioning stage internal to the electron microscope, and an automated loading module connected to the frame and being communicably connected to the transport module,

Abstract: A first spring array and a second spring array are provided in a holder body. Three sample plates can be mounted in the holder body. On each sample plate, pressing-up forces from the first spring array and the second spring array are applied, but upward movement of each sample plate is restricted by an inner surface of a cover.

Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.

Abstract: A sample holder tip for use in transmission electron microscopy (TEM) or scanning electron microscopy (SEM) for performing in-situ experiments is described which facilitates in situ analysis of air-sensitive samples and allows physical manipulation of the sample. This includes, but is not limited to translation, rotation, electrical biasing, and heating/cooling for one or more individual cradles. The sample holder tip incorporates a compact design which eases sample loading and enables direct linkages between consecutive cradles, allowing a single tilt actuator to rotate each cradle around its respective eucentric position. Each of the connecting wires incorporates one or more bends or kinks which enable conductive access to the sample holder tip while also preserving the ability to also retract/extend the tip and tilt individual cradles with at least two degrees of freedom.

Abstract: A sample preparation method includes disposing a microcrystal on an electrically conductive grid, coating the microcrystal with an electrically conductive material to yield a coated microcrystal, milling the coated microcrystal with a first ion beam to yield a milled microcrystal, and polishing the milled microcrystal with a second ion beam to yield a polished microcrystal. A length of a side of the milled microcrystal is between about 250 nm and about 500 nm, and a length of the corresponding side of the polished microcrystal is between about 150 nm and about 250 nm. Assessing the crystal structure of the polished microcrystal includes rotating the polished microcrystal while accelerating electrons toward the polished microcrystal, diffracting the electrons from the polished microcrystal to yield a multiplicity of diffraction patterns, and assessing, from the multiplicity of diffraction patterns, the crystal structure of the polished microcrystal.

Abstract: A carrier device and a carrier kit are provided. The carrier kit includes the carrier device and a specimen carrier. The carrier device carries the specimen carrier and is configured to be fixedly disposed on a specimen holder. The specimen carrier has two observation grooves and a containing channel that is formed therein, and the two observation grooves are configured to expose a part of the containing channel. The carrier device has a containing groove that is recessed on a side of a main body and an observation port. When the specimen carrier is disposed in the containing groove, one of the observation grooves is exposed from the main body through the observation port. At least one limiting element is configured to limit a range of movement of the specimen carrier disposed in the containing groove relative to the main body.

Abstract: A chucking station comprises a chuck, a power supply, and one or more pumping elements. The chuck comprises a plurality of first vacuum ports configured to interface with a surface of a substrate and a plurality of second vacuum ports configured to interface with a surface of a carrier. The chuck further comprises a first electrical pin configured to be in electrical communication with a first electrode of the carrier, and a second electrical pin configured to be in electrical communication with a second electrode of the carrier. The power supply is configured to apply a chucking voltage and a de-chucking voltage to the first and second electrical pins. The one or more pumping elements is coupled to the first and second vacuum ports and configured to generate a vacuum between the substrate and the chuck and a vacuum between the carrier and the chuck.

Abstract: Aspects of the present disclosure involve a data capturing and processing system that intentionally captures data and/or data sets with missing pieces of information. The data and/or datasets may include various types of data, such as one-dimensional signals, two-dimensional images (or other images), and/or three-dimensional structures. The captured data is processed to restore missing information into the data and/or data sets, thereby enabling simultaneous pattern recognition and image recovery.

Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.

Abstract: A projection exposure apparatus for semiconductor lithography includes a component and fixed to a structural part of the apparatus. The component and/or the structural part have/has a stop for bearing against a reference surface at the structural part and/or the component. The stop is movable relative to the component fixed and/or the structural part so that it can be moved away from the reference surface. A method for adjusting a component on a structural part of a projection exposure apparatus includes: securing a stop to the component or the structural part; positioning the component so that the stop comes into mechanical contact with a reference surface at the component or the structural part; fixing the component to the structural part; and moving the stop away from the reference surface.

Abstract: The present document relates to a Z-position motion stage for use in a scanning probe microscopy system. The stage comprises a support element for mounting the z-position motion stage on a scan head, and at least one first actuator mounted on the support element for enabling motion of a probe of the scanning probe microscopy system. The probe is connected to or attachable to the z-position motion stage. The support element and the at least one first actuator are shaped and mounted such as to form a rotation symmetric element which is rotation symmetric around a notional common longitudinal axis. The document further relates to a scan head, a method of manufacturing a z-position motion stage, and a Z-position motion stage obtained with such a method.

Abstract: An observation method includes placing a specimen on a specimen supporting film of a specimen support, attaching the specimen support to a retainer, attaching the retainer to an optical microscope retainer holding base, attaching the optical microscope retainer holding base to a specimen stage of an optical microscope and observing the specimen under the optical microscope, attaching the retainer to a transmission electron microscope retainer holding base, and loading the transmission electron microscope retainer holding base into a transmission electron microscope and observing the specimen under the transmission electron microscope.

Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.

Abstract: A method and system is disclosed for acquiring image data of a subject. The image data can be collected with an imaging system using various selection techniques. The selection techniques may be used to assist in generating selected images for viewing. Selection techniques may include moving a filter to filter a selected portion of an imaging beam.

Abstract: Slide analysis a gripper with three sensors for controlling a slide grip sequence and at least one rotatable carousel with a slide receiving channel. The systems also include a robot with a robot arm that holds a slide gripper residing inside the housing in communication with the rotatable carousel. The systems also include a load lock chamber and a door sealably coupled to the second end portion and an acquisition vacuum chamber with an X-Y stage and a slide holder with a vacuum seal.

Abstract: Grids comprising a coating modified with one or more capture agents and a deactivating agent are disclosed. Methods of using such grids in connection with suitable microscopy techniques, such as for determining the structure of target compounds including proteins, are also disclosed.

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.

Abstract: Disclosed is an adjustable transmission device for measuring transverse parameters of beams, including: a CCD transmission support assembly, an external transmission rod, the CCD transmission support assembly is connected with a support block, and the support block is provided with the slotted set screw with flat point, and is connected with a limit block via a first fastener; a snap ring is arranged in the rear of the external transmission and is matched with a base; the base is connected with the CCD fixed plate via a second fastener. The external transmission rod is provided with a second groove for mounting the first retaining ring, and a side of the first retaining ring is sequentially provided with a vacuum observation window, a second retaining ring, a head assembly, a retaining sleeve and a screwing mechanism.

Abstract: A cryotransfer holder for mounting a specimen held at cryogenic temperature in an electron microscope is described. The holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar. The holder further includes a sample shutter control mechanism that can be decoupled from the shutter to reduce vibration during imaging. There is also described a workstation for mounting specimens into the cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging.

Abstract: A method of operating a charged particle beam device is disclosed, including passing each of a plurality of beamlets through a deflector and a scanner, in that order. Each of the beamlets is focused with an objective lens on a sample to form a plurality of focal spots, forming an array. A first beamlet is focused on a first spot and a second beamlet is focused on a second spot. In a centered configuration of the device, each of the plurality of beamlets is directed by the deflector toward a coma free point. In a beamlet-displaced configuration of the device, the scanner is scanned such that the first beamlet passes through an acceptable aberrations point, the first beamlet scanning a displaced first field of view; and the first spot is displaced from the regular first focal spot to a displaced first focal spot.

Abstract: An object of the invention relates to the fact that the alignment of the sample stage and the optical image can be adjusted with high accuracy, good operability, and high throughput by utilizing a low magnification optical image and a high magnification optical image. The invention relates to the fact that an alignment adjustment by a sample table alignment can be performed using a first processed optical image obtained by enlarging or reducing or changing a visual field of the optical image of the sample table holding the sample by digital processing, and that an alignment adjustment by an alignment point designation can be performed using a second processed optical image different from the first processed optical image. According to the invention, it is possible to adjust the alignment of the sample stage and the optical image with reference to the outer shape of the sample table and the feature points on the sample without taking out the sample table holding the sample from the sample chamber.

Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

Abstract: A method of preparing a cryogenic sample (e.g. for study in a charged-particle microscope), whereby the sample is subjected to rapid cooling using a cryogen, comprising the following steps: Providing two conduits for transporting cryogenic fluid, each of which conduits opens out into a mouthpiece, which mouthpieces are arranged to face each other across an intervening gap; Placing the sample in said gap; Pumping cryogenic fluid through said conduits so as to concurrently flush from said mouthpieces, thereby suddenly immersing the sample in cryogenic fluid from two opposite sides, wherein the flush of cryogenic fluid applied from a first of said mouthpieces is different—e.g. has a different duration—to that applied from the second of said mouthpieces.

Abstract: A fluid sampler includes: a sample cell that includes: a substrate comprising: a first port; a second port in fluid communication with the first port; a viewing reservoir in fluid communication with the first port and the second port and that receives the fluid from the first port and communicates the fluid to the second port, the viewing reservoir including: a first view membrane; a second view membrane; and a pillar interposed between the first view membrane and second view membrane, the pillar separating the first view membrane from the second view membrane at a substantially constant separation distance such that a volume of the viewing reservoir is substantially constant and invariable with respect to a temperature and invariable with respect to a pressure to which the sample cell is subjected.

Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

Abstract: This disclosure provides systems, methods, and apparatus related to arrangements including electron microscopy grids. In one aspect an arrangement includes an electron microscopy grid. The electron microscopy grid comprises a first surface and a second surface, with the first surface having a holey carbon film disposed thereon. A plurality of lipid molecules are disposed in a hole in the holey carbon film. Each lipid molecule of the plurality of lipid molecules has a hydrophilic head and a hydrophobic tail. A biotin-binding protein is attached to the hydrophilic heads of the plurality of lipid molecules. The biotin-binding protein is crystalline.

Abstract: A simulation system includes a control device for controlling a control object; and an information processing device configured to exchange data with the control device. The control device includes a computation unit configured to execute sequence control and motion control of the control object; and an output unit configured to output a fixed interval of data related to the sequence control and the motion control of the object.

Abstract: Methods and a system for proof testing brittle components of electronic devices are disclosed. The method may include positioning the brittle component relative to a probe of a testing system, contacting the probe to a surface of the brittle component at a first location, and applying a first force at the first location using the probe to create a first localized tensile band below the surface of the brittle component. The method may also include contacting the probe to the surface of the brittle component at a second location, distinct from the first location, and applying a second force at the second location using the probe to create a second localized tensile band below the surface of the brittle component.

Abstract: In this charged particle beam device, when a sample chamber is to be placed in a high-vacuum state, a charged particle gun chamber and the sample chamber are evacuated via a main intake of a turbo molecular pump, and when the sample chamber is to be placed in a low-vacuum state, the sample chamber is evacuated via an intermediate intake of the turbo molecular pump while the charged particle gun chamber is evacuated via the main intake. An oil rotation pump for performing back pressure exhausting of the turbo molecular pump does not directly evacuate the charged particle gun chamber or the sample chamber. It is thereby possible to minimize contamination of the device interior in both high-vacuum and low-vacuum states, which makes it possible to prevent contamination of the observed sample and reduce deterioration over time in the ultimate vacuum.

Abstract: A fluid sampler includes: a sample cell that includes: a substrate comprising: a first port; a second port in fluid communication with the first port; a viewing reservoir in fluid communication with the first port and the second port and that receives the fluid from the first port and communicates the fluid to the second port, the viewing reservoir including: a first view membrane; a second view membrane; and a pillar interposed between the first view membrane and second view membrane, the pillar separating the first view membrane from the second view membrane at a substantially constant separation distance such that a volume of the viewing reservoir is substantially constant and invariable with respect to a temperature and invariable with respect to a pressure to which the sample cell is subjected.

Abstract: A lithography apparatus includes: a projection system configured to project a desired image onto a substrate; an active module that generates a time-varying heat load; a temperature conditioning system configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer including a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load, and wherein the phase change material is stationary relative to the projection system during critical operations of the lithography apparatus.

Abstract: An automated workpiece processing system including at least one workpiece processing unit, a workpiece holder configured to removably hold a batch of workpieces therein, each workpiece embodying workpiece identifying indicia where the workpiece identifying indicia is a physical representation of a sample held on a respective workpiece, and to interface with the at least one automated workpiece processing unit, and a controller including a memory having a data structure therein that effects, with the workpiece identifying indicia, batch process tracking of each workpiece in the batch of workpieces through the at least one automated workpiece processing unit in a predetermined batch workpiece processing sequence.

Abstract: A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

Abstract: A specimen loading method for loading a specimen that contains water into a specimen chamber of a charged particle beam device, includes: a step (S100) of mounting the specimen on a specimen support; a step (S102) of covering a predetermined area of the specimen with a water retention material; a step (S104) of evacuating the specimen chamber in which the specimen having the predetermined area covered with the water retention material is placed; and a step (S106) of exposing the predetermined area covered with the water retention material.

Abstract: A low specimen drift holder and cooler for use in microscopy, and a microscope comprising said holder. The present invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy (EM and FIB). However it application is extendable in principle to any field of microscopy, especially wherein a specimen is cooled or needs cooling.

Abstract: To provide a stage device and a charged particle beam device using the same capable of effectively suppressing thermal deformation of a stage generated by temperature increase caused by heat generated by a linear motor. The stage device including a table, a linear motor driving the table in a prescribed direction, in which the table and a moving part of the linear motor are connected by components, a slide unit is attached to the component, movement of which is constrained by a rail fixed to a base, and at the same time, the slide unit is positioned vertically below a place where the component is joined to the table, thereby suppressing thermal deformation of the table.

Abstract: A sample collective device includes two substrates and a spacer. Each substrate has a first surface and a second surface, and the two substrates are arranged with the first surfaces facing each other. The spacer is disposed between the two first surfaces for bonding and fixing the two substrates and forming a sample containing space. In addition, each of the substrates includes a first weakening structure located in the periphery of the sample containing space and exposed on the first surface. A sample collective device array including a plurality of the aforementioned sample collective devices is also provided.

Abstract: The objective of the present invention is to maintain the surrounding of a sample at atmospheric pressure and efficiently detect secondary electrons. In a sample chamber of a charged particle device, a sample holder (4) has: a gas introduction pipe and a gas evacuation pipe for controlling the vicinity of a sample (20) to be an atmospheric pressure environment; a charged particle passage hole (18) and a micro-orifice (18) enabling detection of secondary electrons (15) emitted from the sample (20), co-located above the sample (20); and a charged particle passage hole (19) with a hole diameter larger than the micro-orifice (18) above the sample (20) so as to be capable of actively evacuating gas during gas introduction.

Abstract: A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.

Abstract: An imprint apparatus that transfers a pattern formed on a mold onto a resin on a substrate. A light irradiation unit irradiates the resin with light to cure the resin. A shape correction mechanism applies a force to the mold to deform a pattern region formed on the mold. A heating mechanism heats a substrate-side pattern region formed on the substrate to deform the substrate-side pattern region. A control unit obtains information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and controls the shape correction mechanism and the heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. The control unit controls a temperature distribution in the substrate-side pattern region by using the heating mechanism.

Abstract: The present invention relates to a method for cleaning a phase plate (1) for a transmission electron microscope wherein said phase plate is etched before being irradiated for the first time in the TEM, and is then held in an ultra-pure holding atmosphere until the irradiation in the TEM.

Abstract: An analytical cell includes a first holder and a second holder. The first holder and the second holder each contain a substrate including a through-hole and a transmission membrane having an electron beam permeability. The through-hole is covered with the transmission membrane. The first holder and the second holder are stacked to form an overlapping portion such that the transmission membranes face toward each other. A negative electrode active material and a positive electrode active material, which are arranged at a distance from each other and are in contact, respectively, with an electrolytic solution, are connected electrically to a negative electrode collector and a positive electrode collector, respectively, in the overlapping portion. A lyophobic part having no affinity for the electrolytic solution is formed on at least one of the negative electrode collector and the positive electrode collector.

Abstract: A substrate scanning device includes first, second and third linkages, and a direct drive motor coupled between a process chamber and a first end of the first linkage. A first gear motor coupled between a second end of the first linkage and a first end of the second linkage and a second gear motor coupled between a second end of the second linkage and a first end of the third linkage. A substrate support surface coupled to a second end of the third linkage. The direct drive motor for moving the substrate support surface parallel to a scan axis as the direct drive motor moves the substrate support surface along the scan axis. The first and second gear motors can be configured to maintain the substrate support surface in a plane approximately parallel with the scan axis.