Abstract: A method includes providing a detector disposed above a semiconductor structure; identifying a portion of the semiconductor structure at a temperature substantially greater than a predetermined threshold by the detector; rotating the stage; and deriving a position of the portion of the semiconductor structure based upon the rotation of the stage.

Abstract: A new scanning electrochemical microscopy tip positioning method that allows topography and surface activity to be resolved independently is presented. A SECM tip is oscillated relative to the surface of interest. Changes in the oscillation amplitude, caused by the intermittent contact of the SECM tip with the surface of interest, are used to detect the surface of interest, and as a feedback signal for various types of imaging.

Abstract: A substrate processing apparatus including: a processing container; an injector provided inside the processing container to have a shape extending in a longitudinal direction and configured to supply a processing gas; a holder fixed to the injector; a windmill fixed to the holder; a first driving-gas supply part configured to supply a driving-gas that rotates the windmill in a first direction; a second driving-gas supply part configured to supply the driving-gas that rotates the windmill in a second direction opposite the first direction; and a driving-gas controller configured to control the supply of the driving-gas from the first driving-gas supply part and the second driving-gas supply part. The injector is rotated about the longitudinal direction corresponding to a rotational axis by rotating the windmill through the supply of the driving-gas from at least one of the first and second driving-gas supply parts under the control of the driving-gas controller.

Abstract: A workstation is described for mounting specimens into a cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging. The cryotransfer holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar.

Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.

Abstract: A positioning apparatus includes: an upper unit that includes a spherical body, a retainer part that retains the spherical body, and an upper plate part provided on the retainer part and adapted to carry a carried object; a lower unit that includes a lower plate part on which the upper unit is mounted and a guide part that marks a region of movement of the upper unit on the lower plate part; and a tilting structure that tilts the region of movement relative to a horizontal plane and guides the upper unit, on which the carried object is not mounted, toward a reference position located on a lower side of a tilt.

Abstract: A method for altering surface charge on an insulating surface of a first sample includes generating first plasma inside a plasma source, causing the first plasma to diffuse into a first vacuum chamber to generate second downstream plasma, immersing the first sample in the second downstream plasma, and applying a first bias voltage to a conductive layer of the first sample, or applying a first bias voltage to a metal holder that holds the first sample.

Abstract: A method for altering surface charge on an insulating surface of a first sample includes generating first plasma inside a plasma source, causing the first plasma to diffuse into a first vacuum chamber to generate second downstream plasma, immersing the first sample in the second downstream plasma, and applying a first bias voltage to a conductive layer of the first sample, or applying a first bias voltage to a metal holder that holds the first sample.

Abstract: The system described herein relates to a method for operating a beam apparatus, such as a particle beam apparatus or laser beam apparatus, a computer program product and a beam apparatus for carrying out the method, and to an object holder for an object that, for example, is able to be arranged in a particle beam apparatus. The method includes generating a marking on an object holder using a laser beam of a laser beam device and/or using a particle beam of the particle beam apparatus, where the particle beam includes charged particles, arranging an object on the object holder, moving the object holder, positioning the particle beam and/or the laser beam in relative fashion in relation to the object using the marking, and processing, imaging and/or analyzing the object using the particle beam and/or the laser beam.

Abstract: A cabinet x-ray device for imaging seeds includes an x-ray source configured to transmit an x-ray beam along a beam path. A seed holder is configured to hold seeds and be selectively positioned in the x-ray device such that the beam path crosses the seed holder and the x-ray beam passes through at least some of the seeds. An x-ray detector is configured to detect the x-ray beam after passing through the seeds such that one or more x-ray images of the seeds can be formed. Self-supporting x-ray shielding can extend circumferentially around the x-ray beam to mitigate x-ray transmission outside the device. A drive mechanism can automatically move the seed holder so that discrete x-ray images of subsets of seeds are taken in an automatic seed imaging operation. Various seed evaluations and seed process evaluations can be made using the device.

Abstract: An ion milling apparatus includes a pair of shielding members sandwiching a sample, and an ion source configured to irradiate the sample with an ion beam. The ion milling apparatus is configured to be capable of irradiating the sample with the ion beam in a first mode of irradiating the sample with the ion beam via one shielding member and in a second mode of irradiating the sample with the ion beam via the other shielding member.

Abstract: A torsional probe for a metrology instrument includes a cantilever coupled to a support structure via a torsion bar. The cantilever, support structure, and arms of torsion bar have substantially the same thickness. A method of manufacture of the torsion probe, as well as a method of using the torsion probe to measure photothermal induced surface displacement of a sample are also described.

Abstract: According to one aspect of the present invention, a ? stage mechanism includes a fixed shaft; a plurality of bearings in which outer rings roll on an outer peripheral surface of the fixed shaft; a plurality of cylindrical members supported in a state of being inserted inside inner rings of the plurality of bearings; and a table that is arranged on the plurality of cylindrical members and moves in a rotational direction about a center of the fixed shaft by the plurality of bearings rolling on an outer peripheral surface of the fixed shaft.

Abstract: A sample holder (19) includes a base portion (41), a sample carrying portion (42), a rotation guide portion (43), a cooling stage (46), a connection member (47), a first support portion, and a fixing guide portion (48). The base portion (41) is configured to be fixed to a stage (12), which is configured to be driven to rotate by a stage driving mechanism (13). The rotation guide portion (43) is configured to guide synchronous rotation of the base portion (41) and the sample carrying portion (42). The cooling stage (46) is configured to cool a sample (S). The connection member (47) is configured to be connected to the cooling stage (46). The first support portion is configured to support the base portion (41), which is configured to be driven to rotate by the stage (12).

Abstract: The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.

Abstract: A device comprises an electron column or an ion column, provided with an adjustable holder. The adjustable holder maintains the whole range of movements of the manipulation stage and is adapted to change its position in relation to the stage at least in one direction, wherein the range of movements of the manipulation stage is sufficient to change this position and it is unnecessary to install any other control drive or actuator.

Abstract: Provided is a charged particle beam apparatus including a focused ion beam column, a sample holder, a stage supporting the sample holder, a securing member rotating unit, a stage driving unit, and a control device. The sample holder includes a securing member fixing a sample. The securing member rotating unit rotates the securing member around a first rotational axis and a second rotational axis. The stage driving unit translates the stage in three dimensions and rotates the stage around a third rotational axis. The control device acquires a correction value for correcting a change in a position of a center of rotation for rotation around at least one among a first rotational axis, a second rotational axis, and a third rotational axis. The control device translates the stage according to the correction value.

Abstract: A composite charged particle beam apparatus includes a first charged particle beam column that irradiates a thin sample with a first charged particle beam, and a second charged particle beam column that irradiates an irradiation position of the first charged particle beam on the thin sample with a second charged particle beam. A sample holder as a base stage disposed on a sample stage, a motor-driven rotation driving section, a rotation stand rotatable about a flip axis by the driving of the rotation driving section, and a TEM grid that holds the thin sample. The TEM grid is movable within a plane perpendicular to an observation surface of the thin sample together with the rotation stand by being reciprocally driven around the flip axis by the driving section.

Abstract: Disclosed herein is an apparatus for growing a single crystal metal-oxide epi wafer, including a reaction chamber having an internal space, a substrate mounting unit disposed in the internal space and allowing a substrate to be mounted thereon, a metal-oxide treating unit treating a metal-oxide to supply metal ions and oxygen ions generated from the metal-oxide to the substrate, and an arsenic supply unit installed to face the substrate and supplying arsenic ions to the substrate, wherein the metal-oxide treating unit includes a mount disposed to face the substrate in the internal space and allowing a zinc oxide plate which is the metal-oxide to be installed thereon, and an electron beam irradiator irradiating the zinc oxide plate with an electron beam in a direct manner to cause zinc ions and oxygen ions evaporated from the zinc oxide plate to move toward the substrate.

Abstract: A semiconductor processing apparatus includes a chamber housing, an electrostatic chuck disposed in the chamber housing, the electrostatic chuck being configured to hold a semiconductor wafer, an edge ring surrounding the electrostatic chuck, the edge ring including a ring electrode disposed within the edge ring, and a ring voltage supply configured to supply a ring voltage to the ring electrode, the ring voltage having a non-sinusoidal periodic waveform, wherein each period of the non-sinusoidal periodic waveform comprises a positive voltage applied during a first time period and a negative voltage applied during a second time period, and wherein the negative voltage has a magnitude that increases during the second time period.

Abstract: A surgical clamp comprising two halves, each halve with an upper (2) and a lower portion (3), the lower portions forming two jaws (3) adapted to be in contact with a surgical site, one of the upper portions (2) being provided with a kinematic coupling mechanism (4, 5) and a passive circuit with a predetermined impedance value such that it is possible to identify different clamps because of their different impedances.

Abstract: A mono-planar sealed laser beam alignment device may include a plurality of fasteners holding an upper plate. The device further includes an upper O-ring, a lower O-ring, an inner motion plane, and an outer motion plane. The device further includes a main housing affixed to a laser beam alignment assembly. The laser beam alignment device is configured to provide laser beam alignment with respect to a first axis and a second axis opposed at 90 degrees to the first axis of the laser beam alignment assembly. The first axis and the second axis on a single plane are normal to an optical axis of a laser beam of the laser beam alignment assembly. The plurality of fasteners secure the upper O-ring, the inner motion plane, the lower O-ring, and the outer motion plane into the main housing, creating beam path pressurization by the laser beam alignment device.

Abstract: A system for measuring total operating deflection shapes of a structure includes one or more imagers, each including two cameras spaced apart from one another and each oriented and positioned to have corresponding fields of view of a different corresponding section of the structure, with the corresponding sections that may include overlap area of the structure within each of the different sections of the structure. Each of the cameras generates a corresponding data stream, which is communicated to a controller, which is configured to measure the response of the structure to an excitation, such as a vibration or an impulse. The system is configured to convert time-domain data from each of the data streams to the frequency-domain data using a Fourier Transform algorithm and stitching the shapes to obtain the total operating deflection shapes of the structure by scaling and stitching together the frequency-domain data.

Abstract: The present invention provides a driving system comprising two actuators for moving a stage through two elastic connectors; and a general apparatus/device comprising such a driving system, such as a machine tool, an analytical instrument, an optical microscope, and an apparatus of charged-particle beam such as electron microscope and an electron beam lithographical apparatus. When used in an electron microscope, the stage can be used as a specimen stage or a plate having apertures for electron beam to pass through. The novel stage driving system exhibits numerous technical merits such as simpler structure, better manufacturability, improved cost-effectiveness, and higher reliability, among others.

Abstract: A positioning system for an electron microscope includes a first carriage comprising a holder for holding a workpiece and a second carriage. The first carriage being coupled to one or more first drive units configured to position the workpiece along first, second, and third axes, and along a first tilt axis. The second carriage housing the one or more first drive units and being coupled to one or more second drive units configured to position the workpiece along a second tilt axis.

Abstract: An object of the invention is to provide a device for observing the same field of view with a charged particle beam device and a camera without increasing a size of a housing.

Abstract: An object of the invention is to provide a technique of capturing images at higher speed and higher magnification when acquiring continuous tilted images with an electron microscope. The electron microscope of the invention includes a first spherical receiver fixed to a column of the electron microscope and configured to slide with a spherical fulcrum provided at a tip end of a sample holder; a spherical surface part provided on the column; and a second spherical receiver provided outside the column. The spherical surface part and the second spherical receiver slide on a contact part between the spherical surface part and the second spherical receiver, and a track of the slide is along a spherical surface centered on a central axis of the first spherical receiver, so that a view shift and a focus shift from an observation position of a sample can be reduced.

Abstract: The invention relates to a charged particle microscope (CPM) that at least includes a sample holder, for holding a sample, and a manipulator device arranged for transferring a lamella created in said sample out of said sample, wherein said manipulator device comprises a first elongated manipulator member with a first outer end, and a second elongated manipulator member with a second outer end. The outer ends are movable for mechanically gripping and releasing said lamella. In embodiments, the elongated manipulator members comprise off-set parts that increase manoeuvrability, accessibility, and monitorability of the manipulator device during use.

Abstract: Systems and methods for an adjustable sample floor for ultrafast signal washout are disclosed. In an embodiment. A target support configured to adjustably support a target within a sample chamber may include: a support frame that may configured to be inserted into the sample chamber, a support platform that may be disposed within the support frame, and a platform adjustment system that may be coupled to the support frame and the support platform. The platform adjustment system may be configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber.

Abstract: The present invention provides an apparatus of charged-particle beam such as an electron microscope including a specimen table that can slide on a planar surface around the lower pole piece of the objective lens. The specimen table is confined in a specimen stage having one elastic protrusion and one or more elastic force receiving parts (e.g three permanent protrusions) that contact and press the table. When the specimen is under microscopic examination, disturbing vibration cannot generate a force sufficient to overcome the limiting friction between the specimen table and the planar surface of the objective lens. The invention exhibits numerous technical merits such as minimal or zero vibration noise, and improved image quality, among others.

Abstract: Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.

Abstract: The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.

Abstract: Systems and methods of microsuture training include receiving an image or video of a suture; extracting features of the suture from the image or video; scoring the suture based on the extracted features of the suture and based on a rating and complexity of the suture to determine a quality of the suture in an objective manner. A suture training system includes a suture training apparatus configurable with a plurality of orientations of simulated or actual tissue to simulate natural anatomical orientations encountered in actual surgery, wherein the plurality of simulated tissue orientations are objective based on fiducial markings on the suture training apparatus; and an image analysis system configured to receive an image or video of a suture performed on the suture training apparatus; extract features of the suture from the image or video; score the suture.

Abstract: A linear actuator includes dual bucking magnets, dual pole pieces, and dual spacers. The linear actuator includes a coil-and-housing assembly disposed around a magnet assembly. The magnet assembly includes two bucking magnets sandwiched around a central magnet. The central magnet and the bucking magnets may be separated by spacers. A housing is disposed around the magnet assembly. Between the housing and the magnet assembly, a dual coil is wound in two opposing directions to generate additive forces on the magnet assembly.

Abstract: A stage apparatus comprises an incremental scale fixed to a movable unit and having a predetermined length shorter than a distance the movable unit can move in a first direction, a first and a second sensor that are arranged in the first direction with an interval therebetween shorter than the predetermined length, and a detection unit that detects an origin point position set in a movable range of the movable unit. In an origin return, if the movable unit is at a position at which both the first sensor and the second sensor can read the scale, the apparatus moves the movable unit to the origin point position by a predetermined distance, then moves the movable unit at a lower speed until the origin point position is detected.

Abstract: A microscope system includes an observation optical system including an objective lens, an XY stage capable of moving an XY plane in an X-axis direction and an Y-axis direction, a first change unit configured to change a slant of the XY plane with respect to an optical axis direction of the objective lens, and a second change unit configured to change a slant of a slide placed on the XY stage with respect to the XY plane. Changing the slant of the XY plane by the first change unit is performed based on a first mark arranged on the XY plane at a position observable by the observation optical system. Changing the slant of the slide with respect to the XY plane by the second change unit is performed based on a second mark arranged on the slide.

Abstract: A composite charged particle beam apparatus includes a first charged particle beam column that irradiates a thin sample with a first charged particle beam, a second charged particle beam column that irradiates an irradiation position of the first charged particle beam of the thin sample with a second charged particle beam, a sample holder that fixes the thin sample, and a sample stage on which the sample holder is mounted. The sample holder is able to rotate the thin sample within a surface parallel to an observation surface of the thin sample around a first rotational axis on the sample stage.

Abstract: A metallic plate holder 3 is directly placed on a flat bottom plate 1a of a sample chamber. A linear guide 21 extending in x-direction is located below the bottom plate. Another linear guide 22 extending in y-direction is fixed to a movable part 21a of the linear guide 21. A magnet 23, fixed to a movable part 22a of the linear guide 22, magnetically attracts the plate holder across the bottom plate. When the magnet is two-dimensionally driven by the linear guides, the plate holder follows it and moves two-dimensionally. The flat bottom plate limits the z-position of the plate holder, thereby reducing the fluctuation in the level of the sample on a sample plate 2 due to the movement. Thus, the variation in the level at different positions on the sample plate is reduced, so that the number of times of a calibrant measurement can be decreased.

Abstract: Aspects of the invention provide methods and systems for moving a plurality of moveable stages relative to a stator. The stator comprises a plurality of coils shaped to provide pluralities of coil trace groups where each coil trace group comprises a corresponding plurality of generally linearly elongated coil traces which extend across a stator tile. Each moveable stage comprises a plurality of magnet arrays. Methods and apparatus are provided for moving the moveable stages relative to the stator, where a magnet array from a first moveable stage and a magnet array from a second moveable stage both overlap a shared group of coil traces. For at least a portion of the time that the magnet arrays from the first and second moveable stages overlap the shared group of coil traces, currents are controllably driven in the shared coil trace group based on the positions of both the first and second moveable stages. The positions of the first and second moveable stages may be ascertained by feedback.

Abstract: The invention provides methods, systems and detector arrangements for scanning an object moving in a first direction that includes the steps of irradiating the object with radiation having a peak energy of at least 900 keV, providing a first detector region having a thickness of at least 2 mm and a second detector region having a thickness of at least 5 mm where the second detector region is arranged to receive radiation that has passed through the first detector region, and detecting the radiation after it has interacted with or passed through the object in order to provide information relating to the object.

Abstract: A heating device having a heating element patterned into a robust MEMs substrate, wherein the heating element is electrically isolated from a fluid reservoir or bulk conductive sample, but close enough in proximity to an imagable window/area having the fluid or sample thereon, such that the sample is heated through conduction. The heating device can be used in a microscope sample holder, e.g., for SEM, TEM, STEM, X-ray synchrotron, scanning probe microscopy, and optical microscopy.

Abstract: In at least one embodiment, a specimen holder includes a specimen holder shaft unit having a specimen and/or specimen mesh setting unit, an outer tubular unit capable of housing the specimen holder shaft unit, a thermal drift adjusting unit made of a material having a different thermal expansion coefficient from a thermal expansion coefficient of the specimen holder shaft unit and partially in contact with the specimen holder shaft unit, and a control mechanism which controls movement of the thermal drift adjusting unit toward a center direction of a specimen.

Abstract: Apparatus and methods are described for the automated transfer and storage of transmission electron microscope (TEM) and scanning/transmission electron microscope (STEM) lamella samples throughout a semiconductor manufacturing facility using existing automation infrastructure such as a Front Opening Unified Pod (FOUP). Also provided are wafer facsimiles corresponding to outer dimensions of semiconductor, data storage or solar cell wafers, wherein the facsimiles adapted to store, carry and/or provide a testing platform for testing of samples taken from semiconductor, data storage or solar cell wafers.

Abstract: A sample carrier capable of preventing damage to a support stage on which a sample holder is placed while ensuring a sufficient level of conveyance speed includes a sample holder, a holder mounting member, and a transport portion. The transport portion has a drive source (constant-speed motor), a rotary member (second toothed wheel), a guide portion (linear guide), and a rod. The rotary member is rotated about its axis of rotation by the drive source. The guide portion operates to guide the holder mounting member in a linear direction perpendicular to the axis of rotation of the rotary member. The rod is rotatably coupled to the rotary member and to the holder mounting member and has a coupled portion coupled to the rotary member. At a midpoint of the range of movement of the holder mounting member, the shortest distance from the coupled portion to the guide portion is greatest.

Abstract: A substrate cleaning apparatus capable of removing fine particles from a substrate, such as a wafer, without using a chemical liquid is disclosed. The substrate cleaning apparatus includes: a substrate supporting structure for supporting the substrate; a vibration device secured to the substrate supporting structure; a vibration controller configured to cause the vibration device to vibrate at a natural frequency of the substrate; and a cleaning liquid supply nozzle configured to supply a cleaning liquid onto the substrate.

Abstract: Provided is a scanning probe microscope being able to shorten an observation time of a minute observation object. Main measurement is performed to acquire a surface image of a sample based on a detection signal in a measurement range of a plurality of lines by repeating, for each line, processing of scanning a cantilever at predetermined second intervals in a Y-direction after acquiring the detection signal at predetermined first intervals while scanning the cantilever on a line having a predetermined length along an X-direction. Preliminary measurement is performed to acquire a surface image of the sample by acquiring the detection signal at intervals wider than the first intervals or scanning the cantilever in the Y-direction at intervals wider than the second intervals before the main measurement, the surface image of the sample being coarser than the surface image in the main measurement.

Abstract: Provided is a charged particle beam device in which a support body is rigid enough to support a sample chamber while the vibration of the support body is reduced even under the action of a disturbance such as environmental sound, the degree of parallelism of the support body is maintained, and increase in weight of the support body is suppressed. The support body includes: a first member which supports a mounted object, and is supported by a vibration removing mount; second members which have a thickness different from that of the first member and arranged to overlap the first member; fixing members which fix the first member and the second members; and damping members which have rigidity lower than the fixing members and are deformed by a difference in variations between the first member and the second members.

Abstract: An ion collector includes a plurality of segments and a plurality of integrators. The plurality of segments are physically separated from one another and spaced around a substrate support. Each of the segments includes a conductive element that is designed to conduct a current based on ions received from a plasma. Each of the plurality of integrators is coupled to a corresponding conductive element. Each of the plurality of integrators is designed to determine an ion distribution for a corresponding conductive element based, at least in part, on the current conducted at the corresponding conductive element. An example benefit of this embodiment includes the ability to determine how uniform the ion distribution is across a wafer being processed by the plasma.

Abstract: The present disclosure relates to in situ transmission electron microscope (TEM) holders with improved stability and electrical sensitivity. The holders feature a front bearing seal and a rear bearing seal which allow the holders to achieve high sensitivity, high stability, large range of motion and high vacuum isolation. The bearings use a PEEK insulating disk as a pivot point for translation and tilting motion, and use O-rings to dampen vibrations, provide electrical and vacuum insulation, and to set a grabbing force between the bearing and the probe.

Abstract: Provided is a piezo-actuated planar motor, comprising a planar substrate and a mover installed on the planar substrate, the piezo-actuated planar motor further comprising: at least one piezo driving leg which is disposed on said mover so as to drive said mover to move on said planar substrate omnidirectionally in the plane. Further provided is a method of driving a planar motor by using piezo driving legs, which implements three movement modes, i.e., a sliding mode, a walking mode, and a fine tuning mode. The sliding mode has the fastest speed of motion, the walking mode has a relatively slow speed of motion but has a high positioning accuracy and a high-accuracy tracking capability, and the fine tuning mode is used for the adjustment of the planar motor at a final position and has the highest positioning accuracy. The piezo-actuated planar motor of the present invention can effectively overcome the defects of a small movement range and a low speed in a conventional nano-positioning platform.