Irradiation Of Objects Or Material Patents (Class 250/492.1)
  • Patent number: 10892064
    Abstract: A multi-leaf collimator is provided. The multi-leaf collimator may include a plurality of leaves configured to shield radiation beams. At least two leaves of the plurality of leaves may be movable in a direction parallel to each another. Each leaf of at least some of the plurality of leaves may be configured to be movable between at least two positions. At least one of the at least two positions may be adjustable.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: January 12, 2021
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Johannes Stahl, Jonathan Maltz
  • Patent number: 10888713
    Abstract: A multileaf collimator includes a plurality of beam-blocking leaves of a first type and a plurality of beam-blocking leaves of a second type. The beam-blocking leaves of the first type are alternatingly arranged with the beam-blocking leaves of the second type side by side. Each of the beam-blocking leaves of the first type has a trapezoidal geometry viewed in the leaf longitudinal moving direction comprising a wider end and a narrower end with the wider end being proximal to a source. Each of the beam-blocking leaves of the second type has a trapezoidal geometry viewed in the leaf longitudinal moving direction comprising a wider end and a narrower end with the wider end being distal to the source.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: January 12, 2021
    Assignee: Varian Medical Systems, Inc.
    Inventors: Rachel Rieger, Juha Kauppinen, Anthony Magliari, Dusan Baic
  • Patent number: 10881755
    Abstract: Ultraviolet illumination with optical elements to irradiate objects and/or fluid for purposes of sterilization, disinfection, and/or cleaning. The objects and/or fluid can be irradiated using an ultraviolet illuminator having at least one ultraviolet light emitting source. An ultraviolet transparent housing encapsulates the at least one ultraviolet light emitting source. The ultraviolet transparent housing includes an ultraviolet transparent material that emits ultraviolet light from the at least one ultraviolet light emitting source while preventing humidity from penetrating the ultraviolet transparent housing and damaging the at least one ultraviolet light emitting source. At least one ultraviolet transparent optical element is located about the ultraviolet transparent housing interspersed with the ultraviolet transparent material.
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: January 5, 2021
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Alexander Dobrinsky, Maxim S. Shatalov
  • Patent number: 10880983
    Abstract: A gantry-less particle therapy system is provided. Charged particles are extracted from an ion source and accelerated in a beam transport system having an annular portion extending in a first plane and that circumscribes a volume, an arcuate portion extending in a second plane, and a transition portion that connects the annular portion and the arcuate portion. The arcuate portion terminates at a beam nozzle extending radially inward from the annular portion to deliver an ion beam to a treatment area contained in the volume circumscribed by the annular portion.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: December 29, 2020
    Assignee: The General Hospital Corporation
    Inventors: Thomas Bortfeld, Jacob Flanz, Hsiao-Ming Lu, Susu Yan
  • Patent number: 10865134
    Abstract: A wavelength-selective transmissive glass has a light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less represented by the formula shown below of 1% or more in terms of a plate thickness of 6 mm and a light transmittance T315 nm or less at a wavelength of 315 nm or less represented by the formula shown below of 60% or less in terms of a plate thickness of 6 mm. Ak is a weighting factor at a wavelength k (nm) for calculating T (light transmittance) defined in ISO-9050:2003, and Tk is a transmittance at the wavelength k (nm) in terms of a plate thickness of 6 mm: Tmore than 315 nm and 400 nm or less=(?k=more than 315400Ak×Tk)/(?k=more than 315400Ak) T315 nm or less=(?k=300315Ak×Tk)/(?k=300315Ak).
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: December 15, 2020
    Assignees: AGC Inc., TSUBOTA LABORATORY, INC.
    Inventors: Kensuke Nagai, Tetsuya Nakashima, Yutaka Kuroiwa, Hiroyuki Hijiya, Masamichi Tanida, Akio Koike, Manabu Nishizawa, Kazuo Tsubota, Toshihide Kurihara, Hidemasa Torii
  • Patent number: 10857747
    Abstract: Provided is a mold cleaning system. When cleaning a mold, the mold cleaning system acquires three-dimensional image data of a molding surface of the mold by a camera and, on the basis of the acquired image data, the mold cleaning system controls the movement of arms using a control device, moves a laser head along the molding surface while irradiating with a laser beam supplied by a laser oscillator and, as a result, removes dirt adhered to the molding surface.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: December 8, 2020
    Inventors: Kensuke Matsumura, Masayuki Watanabe, Yusaku Miyazaki
  • Patent number: 10856952
    Abstract: A system for disinfecting a medical device is provided. The system includes a light source that generates light having at least one wavelength between about 100 nm and about 500 nm. The system further includes at least one cylindrical optical diffuser disposed in optical communication with at least one interior channel of a medical device, the at least one cylindrical optical diffuser having an outer surface and an end optically coupled to the light source. The at least one cylindrical optical diffuser is configured to scatter guided light through the outer surface to form a light diffuser portion having a length that emits substantially uniform radiation over its length.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: December 8, 2020
    Assignee: CORNING INCORPORATED
    Inventors: Anthony Sebastian Bauco, Kevin Wallace Bennett, William Spencer Klubben, III, Horst Schreiber
  • Patent number: 10845708
    Abstract: The present invention provides an exposure apparatus for exposing a substrate, including: an optical system including a barrel and an optical element arranged in the barrel; and an adjustment unit including a heat radiator and configured to adjust imaging characteristics of the optical system by applying heat to the optical element from the heat radiator, wherein the heat radiator is a member including a first end portion and a second end portion on a side opposite to the first end portion and having a variation in physical properties falling within a predetermined range, a central portion between the first end portion and the second end portion of the heat radiator is arranged inside the barrel, and the first end portion and the second end portion of the heat radiator are arranged outside the barrel.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: November 24, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hikaru Sugita
  • Patent number: 10835766
    Abstract: A particle beam treatment apparatus includes: a rotating gantry configured to axially rotate in a state where a bed fixed to a stationary system is disposed inside the rotating gantry and an irradiation port of a beam is fixed to a body of the rotating gantry; a tunnel structure configured to have at least a horizontal floor surface and have an internal space in which at least a part of the bed is accommodated; and a rotation supporter configured to cause the tunnel structure to be stationary in the stationary system independently of axis rotation of the rotating gantry by rotationally displacing the tunnel structure with respect to an inner side surface of the rotating gantry.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: November 17, 2020
    Assignees: KABUSHIKI KAISHA TOSHIBA, Toshiba Energy Systems & Solutions Corporation
    Inventors: Kunihiko Kinugasa, Kiyohiko Kitagawa, Hideo Kobayashi, Shigeru Kasai, Kazutaka Maeta, Yoshifumi Nagamoto
  • Patent number: 10832889
    Abstract: A charged particle beam device that can improve machining position precision in section processing using a shielding plate is provided. The invention is directed to a charged particle beam device including: an ion source (101); a sample stand (106) on which a sample (107) is mounted; a shielding plate (108) placed so that a portion of the sample (107) is exposed when seen from the ion source (101); and tilt units (123, 124) that tilt the sample (107) and the shielding plate (108) relative to the irradiation direction of an ion beam (102) from the ion source (101) to the sample (107).
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: November 10, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Asako Kaneko, Hisayuki Takasu, Toru Iwaya
  • Patent number: 10806950
    Abstract: Methods and system for facilitating rapid radiation treatments are provided herein and relate in particular to radiation generation and delivery, beam control, treatment planning, imaging and dose verification. The methods and systems described herein are particularly advantageous when used with a compact high-gradient, very high energy electron (VHEE) accelerator and delivery system (and related processes) capable of treating patients from multiple beam directions with great speed, using all-electromagnetic or radiofrequency deflection steering is provided, that can deliver an entire dose or fraction of high-dose radiation therapy sufficiently fast to freeze physiologic motion, yet with a better degree of dose conformity or sculpting than conventional photon therapy.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: October 20, 2020
    Assignee: The Board of Trustees of The Leland Stanford Junior University
    Inventors: Rebecca Fahrig, Billy Wiseman Loo, Peter G. Maxim, Sami Tantawi
  • Patent number: 10809634
    Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: October 20, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Marcel Koenraad Marie Baggen, Thomas Jan De Hoog, Sinar Juliana, Henricus Martinus Johannes Van De Groes
  • Patent number: 10802406
    Abstract: An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. An energy detector is configured to measure a variation in EUV energy generated when the target droplets are converted to plasma. A feedback controller is configured to adjust parameters of the droplet generator and/or the excitation laser based on the variation in EUV energy.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: October 13, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chieh Hsieh, Kuan-Hung Chen, Chun-Chia Hsu, Shang-Chieh Chien, Liu Bo-Tsun, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10804068
    Abstract: An apparatus is provided. The apparatus may include a main chamber; an entrance tunnel having a propagation axis extending into the main chamber along a first direction; an exit tunnel, connected to the main chamber and defining an exit direction. The entrance tunnel and the exit tunnel may define a beam bend of at least 30 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit aperture, wherein the electrode assembly comprises a lower electrode, disposed on a first side of the beam path, and a plurality of electrodes, disposed on a second side of the beam path, the plurality of electrodes comprising at least five electrodes.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: October 13, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Frank Sinclair, Shengwu Chang
  • Patent number: 10791958
    Abstract: Apparatus and techniques are described herein for nuclear magnetic resonance (MR) projection imaging. Such projection imaging may be used to control radiation therapy delivery to a subject, such as including receiving reference imaging information, generating a two-dimensional (2D) projection image using imaging information obtained via nuclear magnetic resonance (MR) imaging, the 2D projection image corresponding to a specified projection direction, the specified projection direction including a path traversing at least a portion of an imaging subject, determining a change between the generated 2D projection image and the reference imaging information, and controlling delivery of the radiation therapy at least in part using the determined change between the obtained 2D projection image and the reference imaging information.
    Type: Grant
    Filed: May 13, 2019
    Date of Patent: October 6, 2020
    Assignee: Elekta, Inc.
    Inventors: Martin Emile Lachaine, Tony Falco
  • Patent number: 10777443
    Abstract: An imprint apparatus for forming a pattern of an imprint material on a mold and a substrate includes a substrate holding unit configured to hold the substrate, and a charging unit configured to charge at least one of a surface of the substrate holding unit on a side facing the mold or a particle existing in the vicinity of the surface to the same polarity as the charge polarity of the mold.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: September 15, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Eiji Sakamoto, Junichi Seki
  • Patent number: 10766296
    Abstract: In a method for lacquering pencils by the push-through method, a respective pencil is guided through a lacquering chamber in order to apply a lacquer coat. After exiting the lacquering chamber, successive pencils butt against one another and are held against one another at their end sides such at a plurality of pencils form a stable strand which is guided, subsequent to the lacquering chamber, through a drying section, with the result that a respective pencil is held in a hovering manner on leaving the lacquering chamber. It is hereby in particular also made possible to use UV-curing lacquers, with the overall result that a very short total lacquering time for lacquering pencils, in particular cosmetic pencils, is achieved.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: September 8, 2020
    Assignee: SCHWAN-Stabilo Cosmetics GmbH & Co. KG
    Inventor: Juergen Reitenspies
  • Patent number: 10751555
    Abstract: The invention comprises a method and apparatus for treating a tumor of a patient, in a beam treatment center comprising a floor, with positively charged particles, comprising: (1) a synchrotron mounted to an elevated floor section above the floor of the beam treatment center; (2) a beam transport system, comprising: at least three fixed-position beam transport lines, where none of the synchrotron and the beam transport system penetrate through the floor of the beam treatment center; (3) the positively charged particles transported from the synchrotron, through the beam transport system, to a position above a patient positioning system during use; and (4) an optional repositionable nozzle system connected to a first, second, and third fixed-position beam transport line at a first, second, and third time, respectively, where the nozzle track forms an arc of a circle and the repositionable nozzle system moves along the nozzle track.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: August 25, 2020
    Inventors: Daniel J. Raymond, W. Davis Lee, James P. Bennett
  • Patent number: 10736585
    Abstract: A multiple frames imaging system is disclosed with capability of differential x-ray exposure of different input areas of an image intensifier or other x-ray detector. Collimators are provided to control the amount of radiation in various regions of the image and image processing is provided to provide the display of images of different qualities. Motion methods are provided to move the collimators to produce optimal image frames.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: August 11, 2020
    Assignee: CONTROLRAD SYSTEMS, INC.
    Inventors: Haim Zvi Melman, Liron Melman, Allon Guez
  • Patent number: 10729921
    Abstract: A system for particle beam therapy has an adjustable gantry for beam delivery to a patient site. The gantry has a beam coupling section, a first beam bending section with beam deflection and/or focusing magnets. A beam transport section receiving the particle beam from the first beam bending section and guiding the particle beam to a second beam bending section. The beam exits at a window of a beam nozzle. A patient table/chair is rotatable in the horizontal plane or in a plane being parallel to the horizontal plane and optionally being adjustable vertically. The gantry is supported by a tilting mechanism allowing the gantry to be tilted vertically by an angle ?1?[?90°; +90°]. A rotation mechanism is disposed in a way that the second beam bending section and the beam nozzle are rotatable by an angle ?2?[?180°; +180°] around a direction given by the angle ?1.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: August 4, 2020
    Assignee: Paul Scherrer Institut
    Inventors: Jacobus Maarten Schippers, Alexander Gerbershagen
  • Patent number: 10721875
    Abstract: A light dosing system for promoting preferred characteristics in plants, the light dosing system configured to direct light onto a target area upon which the plant resides, the light dosing system including one or more light emitters positioned above the target area, a means for controlling one or more characteristics of the light emitted by the light emitters, a conveyor configured to alter the relative positions of the light emitters and the target area, and a lighting controller configured to read a media having a predefined dosage regime stored thereon for promoting the preferred characteristics of the plant, characterized in that the lighting controller is configured to alter one or more characteristics of the light emitted by the, or each, of the one or more light emitters onto the target area in accordance with the predefined dosage regime.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: July 28, 2020
    Assignee: BIOLUMIC LIMITED
    Inventors: Jason John Wargent, Matthew John Van DerWerff, Terry Robin Southern
  • Patent number: 10719006
    Abstract: An improved firearm for use in video recording and audio recording is a video and audio recording system for a firearm that becomes active when the safety is taken off. The recording system is unable to be manipulated by the user.
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: July 21, 2020
    Inventor: Clavel Hunter
  • Patent number: 10714312
    Abstract: In one embodiment, a data processing method is provided for generating writing data from design data and registering the writing data in a charged particle beam writing apparatus. The method includes generating the writing data by performing a plurality of conversion processes on a plurality of pieces of first frame data obtained through division of the design data corresponding to one chip, and performing a plurality of preprocessing processes on a plurality of pieces of second frame data obtained through division of the writing data of the chip, and registering the writing data of the chip in the charged particle beam writing apparatus. The plurality of conversion processes are performed in frame-basis pipeline processing, and the plurality of preprocessing processes are performed in frame-basis pipeline processing. The writing data is registered in the charged particle beam writing apparatus on a frame basis.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: July 14, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Kenichi Yasui
  • Patent number: 10714304
    Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: July 14, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Muneyuki Fukuda, Yoshinori Momonoi, Akihiro Miura, Fumihiro Sasajima, Hiroaki Mito
  • Patent number: 10695955
    Abstract: A manufacturing method of a mold, the mold having at its surface a plurality of recessed portions whose two-dimensional size is not less than 10 nm and less than 500 nm when viewed in a direction normal to the surface, the method comprising: (a) providing a mold base (10); (b) partially anodizing the aluminum alloy layer (18), thereby forming a porous alumina layer (14) which has a plurality of minute recessed portions (14p); (c) bringing the porous alumina layer into contact with an etching solution, thereby enlarging the plurality of minute recessed portions; (d) detecting a protrusion (210) formed at a surface of the porous alumina layer or the mold base; (e) determining whether or not a height of the detected protrusion is greater than a predetermined height; and (f) if it is determined at step (e) that the height of the protrusion is greater, irradiating the protrusion with laser light such that the height of the protrusion becomes smaller than the predetermined height.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: June 30, 2020
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Nobuaki Yamada, Hidekazu Hayashi, Miho Yamada
  • Patent number: 10678149
    Abstract: The present invention is directed to a method and apparatus for maintaining a surface of an optical component free of foreign particles using passive and active approaches to particle control.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: June 9, 2020
    Inventor: Diego Arturo Alvarado Castañeda
  • Patent number: 10672634
    Abstract: The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: June 2, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 10667377
    Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: May 26, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Jay Rafac, Richard L. Sandstrom, Daniel John William Brown, Kai-Chung Hou
  • Patent number: 10665447
    Abstract: Transition radiation from nanotubes, nanosheets, and nanoparticles and in particular, boron nitride nanomaterials, can be utilized for the generation of light. Wavelengths of light of interest for microchip lithography, including 13.5 nm (91.8 eV) and 6.7 nm (185 eV), can be generated at useful intensities, by transition radiation light sources. Light useful for monitoring relativistic charged particle beam characteristics such as spatial distribution and intensity can be generated.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: May 26, 2020
    Assignees: BNNT, LLC, Jefferson Science Associates, LLC
    Inventors: Kevin C. Jordan, Thomas G. Dushatinski, Michael W. Smith, Jonathan C. Stevens, R. Roy Whitney
  • Patent number: 10656539
    Abstract: A method for a lithography exposure process is provided. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The method further includes reflecting the EUV light with a collector. The method also includes discharging a cleaning gas over the collector through a gas distributor positioned next to the collector. A portion of the cleaning gas is converted to free radicals before the cleaning gas leaves the gas distributor, and the free radicals are discharged over the collector along with the cleaning gas.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: May 19, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shang-Ying Wu, Shang-Chieh Chien, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10646728
    Abstract: An example particle therapy system includes a particle accelerator to output a particle beam having a spot size; a scanning system for the particle accelerator to scan the particle beam in two dimensions across at least part of a treatment area of an irradiation target; and an adaptive aperture between the scanning system and the irradiation target. The adaptive aperture includes structures that are movable relative to the irradiation target to approximate a shape to trim part of the treatment area. The part of the treatment area has a size that is based on an area of the spot size.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: May 12, 2020
    Assignee: Mevion Medical Systems, Inc.
    Inventors: Gerrit Townsend Zwart, Mark R. Jones, Miles S. Wagner, James Cooley, Eros Pedroni, Robert Silva
  • Patent number: 10638588
    Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: April 28, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev
  • Patent number: 10625097
    Abstract: The invention comprises a method for treating a tumor of a patient with positively charged particles in a treatment room, comprising the steps of: (1) controlling a cancer therapy treatment system with a main controller, the main controller comprising hardware and software; (2) generating at least one image of the tumor using at least one imaging system controlled by the main controller; (3) using the at least one image and a software coded set of radiation treatment directives, the main controller auto-generating a radiation treatment plan; and (4) the main controller auto-delivering the positively charged particles, via a beam transport system and a nozzle system, from a synchrotron to the tumor according to the radiation treatment plan.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: April 21, 2020
    Inventors: Jillian Reno, Mark R. Amato, Susan L. Michaud, James P. Bennett, Nick Ruebel, W. Davis Lee
  • Patent number: 10626842
    Abstract: A laser device includes a light source device including a semiconductor laser; and a laser cavity irradiated with light from the light source device and including a saturable absorber. A beam waist diameter r of the light that irradiates the laser cavity and an initial transmittance T0 of the saturable absorber satisfy a relationship of 7.75×T04?7.77×T03+3.13×T02+0.16×T0+0.74?r?2.62×T0+0.675.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: April 21, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Toshiyuki Ikeoh, Kentaroh Hagita, Naoto Jikutani, Yasuhiro Higashi, Kazuma Izumiya
  • Patent number: 10617893
    Abstract: A beam shaping assembly for neutron capture therapy includes a beam inlet, a target having nuclear reaction with an incident proton beam from the beam inlet to produce neutrons forming a neutron beam, a moderator adjoining to the target, a reflector surrounding the moderator, a thermal neutron absorber adjoining to the moderator, a radiation shield arranged inside the beam shaping assembly and a beam outlet. The material of the moderator is subjected to a powder sintering process using a powder sintering device so as to change powders or a power compact into blocks. The reflector leads the neutrons deviated from the main axis back. The thermal neutron absorber is used for absorbing thermal neutrons so as to avoid overdosing in superficial normal tissue during therapy. The radiation shield is used for shielding leaking neutrons and photons so as to reduce dose of the normal tissue not exposed to irradiation.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: April 14, 2020
    Assignee: NEUBORON MEDTECH LTD.
    Inventors: Yuan-hao Liu, Wei-lin Chen, Pei-yi Lee, Ming-chuan Chang, Wenyu Xu
  • Patent number: 10576303
    Abstract: Methods and system for facilitating rapid radiation treatments are provided herein and relate in particular to radiation generation and delivery, electron source design, beam control and shaping/intensity-modulation.
    Type: Grant
    Filed: February 14, 2018
    Date of Patent: March 3, 2020
    Assignee: The Board of Trsutees of the Leland Stanford Junior University
    Inventors: Vinod Bharadwaj, Valery A. Dolgashev, Rebecca Fahrig, Billy Wiseman Loo, Peter G. Maxim, Sami Tantawi, Cecile Limborg, Ludovic Nicolas
  • Patent number: 10576580
    Abstract: A light irradiation apparatus includes a light source, a dispersive element, a spatial light modulator, and a focusing element. The dispersive element disperses pulsed light output from the light source and outputs the light. The dispersive element includes, for example. The spatial light modulator modulates a phase spectrum or an intensity spectrum of the light output from the dispersive element and outputs the light. The focusing element receives the light output from the spatial light modulator in a dispersing state, and focuses the light on a common region (focusing region) in a surface or an inside of an object.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: March 3, 2020
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventor: Yuu Takiguchi
  • Patent number: 10573490
    Abstract: An ion source for improving beam transport efficiency regarding a ribbon beam is provided. The plasma generation container is formed with a beam extraction port at an end thereof. The shielding member plugs the beam extraction port and comprises three or more elongate holes each of which is long in a lateral direction of a ribbon beam to be extracted through the shielding member and which are arranged in the form of an array extending in the lateral direction, wherein a first length one of the elongate holes located in a central region of the array is shorter than a second length of one of the remaining elongate holes located on an end side of the array.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: February 25, 2020
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventor: Tetsuro Yamamoto
  • Patent number: 10573491
    Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: February 25, 2020
    Assignee: ADVANTEST CORPORATION
    Inventors: Akio Yamada, Shinji Sugatani, Masaki Kurokawa, Masahiro Takizawa, Ryuma Iwashita
  • Patent number: 10568964
    Abstract: A neutron capture therapy system includes a therapy table on which an irradiation target is placed, a neutron beam irradiation unit which irradiates the irradiation target placed on the therapy table with a neutron beam, a position measurement unit which measures a position of the irradiation target placed on the therapy table, and a radiation dose distribution output unit which outputs a radiation dose distribution of a neutron beam used for irradiating the irradiation target, based on an amount of positional misalignment of the position of the irradiation target measured by the position measurement unit.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: February 25, 2020
    Assignees: SUMITOMO HEAVY INDUSTRIES, LTD., KYOTO UNIVERSITY
    Inventors: Takashi Yamaguchi, Tetsuya Mukawa, Hiroki Tanaka
  • Patent number: 10568195
    Abstract: A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source configured to output illumination having a first spectral frequency and an optical frequency converter. The optical frequency converter can be configured to receive the illumination having the first spectral frequency from the illumination source and configured to output pump illumination having a second spectral frequency that is different from the first spectral frequency.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: February 18, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Anatoly Shchemelinin, Matthew Derstine
  • Patent number: 10549124
    Abstract: The invention comprises a method and apparatus for treating a tumor with protons using multiple beamline positions not having an isocenter, including the steps of: (1) delivering the protons from a synchrotron along a redirectable beam transport path to yield a plurality of incident vectors, each of the plurality of incident vectors directed toward the treatment room and (2) redirecting the protons traveling along each of the plurality of incident vectors, with an output nozzle, to the tumor, where a first vector, of the plurality of incident vectors, comprises a first direction intersecting the tumor and where a second vector, of the plurality of incident vectors, comprises a second direction passing by the tumor without entering the tumor. The step of redirecting directs the protons traveling along the first and second incident vectors, respectively, to a first and second path intersecting a front and the back of the tumor.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: February 4, 2020
    Inventors: W. Davis Lee, Jillian Reno, James P. Bennett
  • Patent number: 10543058
    Abstract: A system for disinfecting a medical device is provided. The system includes a light source that generates light having at least one wavelength between about 100 nm and about 500 nm. The system further includes at least one cylindrical optical diffuser disposed in optical communication with at least one interior channel of a medical device, the at least one cylindrical optical diffuser having an outer surface and an end optically coupled to the light source. The at least one cylindrical optical diffuser is configured to scatter guided light through the outer surface to form a light diffuser portion having a length that emits substantially uniform radiation over its length.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: January 28, 2020
    Assignee: CORNING INCORPORATED
    Inventors: Anthony Sebastian Bauco, Kevin Wallace Bennett, William Spencer Klubben, III, Horst Schreiber
  • Patent number: 10525284
    Abstract: Systems and methods for managing motions of an anatomical region of interest of a patient during image-guided radiotherapy are disclosed. An exemplary system may include an image acquisition device, a radiotherapy device, and a processor device. The processor device may be configured to determine a primary plane of motion of the anatomical region of interest and determine a plurality of 2D slices parallel to the primary plane. The plurality of 2D slices may define a 3D volume substantially enclosing the anatomical region of interest. The processor device may also be configured to control the image acquisition device to acquire a plurality of 2D images based on the plurality of 2D slices and determine a motion of the anatomical region of interest based on at least a subset of the acquired plurality of 2D images. The processor device may be further configured to control radiation delivery based on the determined motion.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: January 7, 2020
    Assignee: Elekta LTD
    Inventor: Martin Emile Lachaine
  • Patent number: 10520251
    Abstract: A UV light curing system is provided. The UV light curing system includes: a UV light source; a primary reflector for reflecting light emitted by the UV light source in a direction of an enclosure, the enclosure at least partially surrounding an object of interest; and a secondary reflector on an opposite side of the enclosure with respect to the primary reflector, the secondary reflector being positioned along a portion of a length of the enclosure, the secondary reflector surrounding at least 40% of the enclosure at the portion of the length of the enclosure.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: December 31, 2019
    Assignee: Heraeus Noblelight America LLC
    Inventors: Darrin Leonhardt, William Curtis Harper
  • Patent number: 10524343
    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: December 31, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Takanobu Ishihara, Toshihiro Nishisaka, Yutaka Shiraishi
  • Patent number: 10504685
    Abstract: Magnetic field strength of a converging lens is repeatedly and alternately changed between first strength and second strength. The information about a first aperture image in the case where the magnetic field strength is the first strength and the information about a second aperture image in the case where the magnetic field strength is the second strength are produced. A first movement instruction for the first and second aperture images is given based on the first information and the second information during repetitive changes of the magnetic field strength. Based on the first movement instruction, a first deflector is controlled. A second movement instruction for the first and second aperture images is given based on the first information and the second information during repetitive changes of the magnetic field strength. Based on the second movement instruction, a second deflector is controlled.
    Type: Grant
    Filed: January 9, 2019
    Date of Patent: December 10, 2019
    Assignee: Shimadzu Corporation
    Inventor: Takehiro Ishikawa
  • Patent number: 10497485
    Abstract: Systems and methods for formulating a radioactive liquid using a disposable container are described. The disposable container includes a flexible sidewall defining an interior space for containing the radioactive liquid during formulation. The flexible sidewall is constructed of sterile, pyrogen-free material to prevent contamination of the radioactive liquid. The flexible sidewall includes a first portion and a second portion. The disposable container also includes an access port and a dispense port. The access port is defined by the first portion of the flexible sidewall to provide access to the interior space. The dispense port is defined by the second portion of the flexible sidewall for the radioactive liquid within the interior space to be dispensed through.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: December 3, 2019
    Assignee: Curium US LLC
    Inventors: Kevin B. Graves, Bryan S. Petrofsky, Sumit Verma, John Schmitz, Greg Bushman, Jesse Gurley, IV, Paul Hibbeln
  • Patent number: 10479018
    Abstract: An additive manufacturing apparatus including a scanner for directing a laser beam on to layers of flowable material to selectively solidify the material to form an object in a layer-by-layer manner. The scanner includes an optical component operable under the control of a first actuator to reflect the laser beam over a first range of angles in a first dimension and the or a further optical component operable under the control of a second actuator to reflect the laser beam over a second range of angles in the first dimension, wherein the second actuator provides a faster dynamic response but a smaller range of movement of the laser beam than the first actuator.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: November 19, 2019
    Assignee: RENISHAW PLC
    Inventors: Ceri Brown, Nicholas H H Jones, David G J Ewing, Geoffrey McFarland
  • Patent number: RE48245
    Abstract: The present invention is directed to mobile radiation systems and methods of use that comprise a mobile UVA irradiator including a power supply, a UVA lamp, a control and system indicator unit; a UV radiation blocker nest having an adaptor opening for receiving a hand-held irradiator when said irradiator is in a seated position in said nest; and a mobile carrier comprising a first compartment for housing said power supply, hand-held irradiator, said irradiator nest, wheels and said control unit. The nest may be configured to conform to the hand-held irradiator to block irradiation from the hand-held irradiator when it is energized and in its seated position. The mobile radiation device produced UVA radiation having peak radiation wavelength in a range of from 250 nm to 450 nm and can have a peak irradiation power in a range of from 0.5 W/cm2 to 10 W/cm2.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: October 6, 2020
    Assignee: SPDI, Inc.
    Inventors: John Wilson, Robert Schenk