Irradiation Of Semiconductor Devices Patents (Class 250/492.2)
  • Patent number: 10840055
    Abstract: A high-brightness electron beam source is disclosed. The electron beam source may include a broadband illumination source configured to generate broadband illumination. A tunable spectral filter may be configured to filter the broadband illumination to provide filtered illumination having an excitation spectrum. The electron beam source may further include a photocathode configured to emit one or more electron beams in response to the filtered illumination, wherein emission from the photocathode is adjustable based on the excitation spectrum of the filtered illumination from the tunable spectral filter.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 17, 2020
    Assignee: KLA Corporation
    Inventors: Gildardo Delgado, Katerina Ioakeimidi, Frances A. Hill, Rudy F. Garcia, Mike Romero, Zefram Marks, Gary V. Lopez Lopez
  • Patent number: 10832888
    Abstract: There is provided an ion milling apparatus and sample holder permitting one to observe a sample, which has been milled, with an electron microscope without transferring the sample to a different holding member. The ion milling apparatus has an ion source, a sample holder, and a sample stage. The sample holder includes: a holder body having a sample holding portion for holding the sample; and a cover member detachably mounted to the holder body and hermetically sealing the sample held on the sample holding portion. The holder body has a shield plate and a field-correcting plate for correcting electric fields around the sample held on the sample holding portion.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: November 10, 2020
    Assignee: JEOL Ltd.
    Inventors: Shogo Kataoka, Toru Kagawa
  • Patent number: 10824083
    Abstract: A light source for extreme ultraviolet (EUV) radiation is provided. The light source includes a target droplet generator, a laser generator, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to a source vessel. The laser generator is configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation. The measuring device is configured to measure process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. The controller is configured to provide the control signal according to at least two of the process parameters.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: November 3, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chi Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10822230
    Abstract: Systems, methods and tools for the synthesis of products via mechanosynthesis are disclosed, including a set of atomically-precise tips and associated reactions, methods for determining build sequences for workpieces, exemplary build sequences, and methods for creating new reactions, build sequences, and tips.
    Type: Grant
    Filed: April 16, 2019
    Date of Patent: November 3, 2020
    Assignee: CBN Nano Technologies Inc.
    Inventors: Robert A. Freitas, Jr., Ralph C. Merkle
  • Patent number: 10801992
    Abstract: Ion mobility spectrometers and drift tubes including an inlet configured to receive ions, and an outlet, and an internal portion having a pressure at about atmospheric pressure, wherein the drift tube is configured to separate ions using a convective velocity from a carrier gas that transports the ions from the inlet to the outlet, a second controllable velocity that alters a migration of the ions from the inlet to the outlet, and neither radio frequency (RF) nor an alternating current (AC) center the ions are disclosed. Methods of separating charged particles are also disclosed.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: October 13, 2020
    Assignee: Indiana University Research and Technology Corporation
    Inventor: Carlos Larriba-Andaluz
  • Patent number: 10796428
    Abstract: Disclosed are an inspection system and an inspection method of performing image processing on an outline of an inspection object according to whether the inspection object is good or defective, and overlapping and displaying the image-processed outline with reference information for determining whether the inspection object is good or defective. The inspection system includes: a data acquisition unit configured acquire an image of an inspection object by irradiate light on the inspection object; a processing unit configured to detect an outline of the inspection object based on the image data of the inspection object; and an output unit configured to overlap and display the outline with reference information, wherein the processing unit is configured to determine whether the outline is good or defective based on the reference information to perform image processing on the outline according to whether the outline is good or defective.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: October 6, 2020
    Assignee: KOH YOUNG TECHNOLOGY INC.
    Inventors: Seung Ae Seo, Won Mi Ahn, Hye In Lee, Jong Hui Lee
  • Patent number: 10790115
    Abstract: A multi charged particle beam writing method includes assigning, for each unit irradiation region per beam of multi-beams, each divided shot obtained by dividing a shot of a maximum irradiation time and continuously irradiate the same unit irradiation region, to at least one of a plurality of beams that can be switched by collective deflection; calculating, for each unit irradiation region, an irradiation time; determining, for each unit irradiation region, whether to make each divided shot be beam “on” or “off” so that the total irradiation time for a plurality of corresponding divided shots to be beam “on” may become a combination equivalent to the irradiation time calculated; and applying, to the corresponding unit irradiation region, the plurality of corresponding divided shots to be beam “on”, using the plurality of beams while switching a beam between beams by collective deflection.
    Type: Grant
    Filed: September 12, 2016
    Date of Patent: September 29, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Hiroshi Matsumoto
  • Patent number: 10784174
    Abstract: A method for processing a substrate in a processing chamber using at least one time trace based prediction model is provided. A substrate is dry processed, where the dry processing creates at least one gas by-product. A concentration of the at least one gas by-product is measured. A time trace of the concentration of the at least one gas by-product is determined. The determined time trace of the concentration is provided as input for the at least one time trace based prediction model to obtain at least one process output. The at least one process output is used to adjust at least one process parameter.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: September 22, 2020
    Assignee: Lam Research Corporation
    Inventors: Yassine Kabouzi, Luc Albarede
  • Patent number: 10763179
    Abstract: An example semiconductor wafer includes a semiconductor layer, a dielectric layer disposed on the semiconductor layer, and a layer of the metal disposed on the dielectric layer. An example method of determining an effective work function of a metal on the semiconductor wafer includes determining a surface barrier voltage of the semiconductor wafer, and determining a metal effective work function of the semiconductor wafer based, at least in part, on the surface barrier voltage.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: September 1, 2020
    Assignee: SEMILAB Semiconductor Physics Laboratory Co., Ltd.
    Inventors: Dmitriy Marinskiy, Thye Chong Loy, Jacek Lagowski, Sung-Li Wang, Lin-Jung Wu, Shyh-Shin Ferng, Yi-Hung Lin, Sheng-Shin Lin
  • Patent number: 10763096
    Abstract: A method and apparatus are provided. The method includes selectively supplying a neutralizing gas to a position on a trajectory of an ion beam between an extraction electrode system and an analysis slit based on a composition of a dopant gas introduced into an ion source that produces the ion beam. The apparatus includes the ion source, the extraction electrode system, the analysis slit, and a gas supply system that selectively supplies the neutralizing gas to the position on the trajectory.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: September 1, 2020
    Assignee: NISSIN ION EQUIPMENT CO., LTD.
    Inventor: Yusuke Kuwata
  • Patent number: 10754132
    Abstract: An imaging optical system, in particular a projection objective, for microlithography, includes optical elements to guide electromagnetic radiation with a wavelength in a path to image an object field into an image plane. The imaging optical system includes a pupil, having coordinates (p, q), which, together with the image field, having coordinates (x, y) of the optical system, spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q), as a function of which a wavefront W(x, y, p, q) of the radiation passing through the optical system is defined. The wavefront W can therefore be defined in the pupil plane as a function of an extended 4-dimensional pupil space spanned by the image field (x, y) and the pupil (p, q) as W(x, y, p, q)=W(t), with t=(x, y, p, q).
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: August 25, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Olaf Rogalsky, Sonja Schneider, Boris Bittner, Jens Kugler, Bernhard Gellrich, Rolf Freimann
  • Patent number: 10747938
    Abstract: An integrated circuit (IC) manufacturing method includes receiving an IC design layout having IC regions separate from each other. Each of the IC regions includes an initial IC pattern that is substantially identical among the IC regions. The method further includes identifying a group of IC regions from the IC regions. All IC regions in the group have a substantially same location effect, which is introduced by global locations of the IC regions on the IC design layout. The method further includes performing a correction process to a first IC region in the group, modifying the initial IC pattern in the first IC region into a first corrected IC pattern. The correction process includes using a computer program to correct location effect. The method further includes replacing the initial IC pattern in a second IC region in the group with the first corrected IC pattern.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: August 18, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hung-Chun Wang, Ching-Hsu Chang, Chun-Hung Wu, Cheng Kun Tsai, Feng-Ju Chang, Feng-Lung Lin, Ming-Hsuan Wu, Ping-Chieh Wu, Ru-Gun Liu, Wen-Chun Huang, Wen-Hao Liu
  • Patent number: 10739378
    Abstract: The system is configured for performing scanning electrochemical microscopy via non-local continuous line probes. The continuous line probes include an insulating probe substrate, an insulating layer, and a conductive band electrode. The system includes a sample stage for positioning a sample substrate to be imaged so as to enable contact with the insulting probe substrate at an angle ?CLP. The continuous line probe is translated across the sample substrate and changes in the signal generated at the continuous line probe are identified to indicate the presence of features on the sample substrate. A plurality of scans are performed at different angles via rotating the sample stage or the continuous line probe, the results of which are combined and analyzed to produce an image of the sample substrate via compressed sensing reconstruction.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: August 11, 2020
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Daniel Vincent Esposito, Glen O'Neil, John Wright, Han-wen Kuo, Anna E. Dorfi
  • Patent number: 10703674
    Abstract: The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: July 7, 2020
    Assignees: AGC GLASS EUROPE, AGC Inc., QUERTECH INGENIERIE
    Inventors: Benjamine Navet, Pierre Boulanger, Lionel Ventelon, Denis Busardo, Frederic Guernalec
  • Patent number: 10670535
    Abstract: Methods and systems for determining parameter(s) of a metrology process to be performed on a specimen are provided. One system includes one or more computer subsystems configured for automatically generating regions of interest (ROIs) to be measured during a metrology process performed for the specimen with the measurement subsystem based on a design for the specimen. The computer subsystem(s) are also configured for automatically determining parameter(s) of measurement(s) performed in first and second subsets of the ROIs during the metrology process with the measurement subsystem based on portions of the design for the specimen located in the first and second subsets of the ROIs, respectively. The parameter(s) of the measurement(s) performed in the first subset are determined separately and independently of the parameter(s) of the measurement(s) performed in the second subset.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: June 2, 2020
    Assignee: KLA-Tencor Corp.
    Inventors: Brian Duffy, Ajay Gupta, Thanh Huy Ha
  • Patent number: 10672648
    Abstract: A method of forming a semiconductor memory device includes following steps. First of all, a dielectric layer is formed on a semiconductor substrate, and a conductive pad is formed in the dielectric layer. Then, a stacked structure is formed on the dielectric layer, and the stacked structure includes a first layer, a second layer and a third layer stacked one over another on the conductive pad. Next, a patterned mask layer is formed on the stacked structure, and a portion of the stacked structure is removed, to form an opening in the stacked structure, with the opening having a tapered sidewall in the second layer and the first layer. After that, the tapered sidewall of the opening in the second layer is vertically etched, to form a contact opening in the stacked structure. Finally, the patterned mask layer is removed.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: June 2, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Wang Zhan
  • Patent number: 10643869
    Abstract: A semiconductor wafer that has a plane orientation of (100) and is made of monocrystalline silicon is warped along an axis, i.e., a diameter along a <100> direction of the semiconductor wafer when irradiated with a flash of light. The semiconductor wafer is placed on a susceptor while the direction of the semiconductor wafer is adjusted so that the diameter along the <100> direction coincides with an optical axis of an upper radiation thermometer. This adjustment makes a diameter along a direction in which a warp of the semiconductor wafer is smallest during irradiation with a flash of light coincide with the optical axis of the upper radiation thermometer. As a result, the semiconductor wafer is hardly warped along the optical axis direction of the upper radiation thermometer even during irradiation with a flash of light, thus hardly changing the emissivity of the semiconductor wafer, so that it is possible to accurately measure the temperature of an upper surface of the semiconductor wafer.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: May 5, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Takahiro Kitazawa, Kazuhiko Fuse
  • Patent number: 10566242
    Abstract: A plasma doping process provides conformal doping profiles for lightly doped source/drain regions in fins, and reduces the plasma doping induced fin height loss. The plasma doping process overcomes the limitations caused by traditional plasma doping processes in fin structures that feature aggressive aspect ratios and tights pitches. Semiconductor devices with conformal lightly doped S/D regions and reduced fin height loss demonstrate reduced parallel resistance (Rp) and improved transistor performance.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: February 18, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ling Chan, Tsan-Chun Wang, Liang-Yin Chen, Huicheng Chang
  • Patent number: 10558124
    Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: February 11, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Xiaofeng Liu, Rafael C. Howell
  • Patent number: 10543515
    Abstract: The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.
    Type: Grant
    Filed: March 20, 2017
    Date of Patent: January 28, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventor: Pio Peter Niraj Nirmalraj
  • Patent number: 10534278
    Abstract: The present invention provides an exposure apparatus that exposes a substrate via a projection optical system, the apparatus including a supply unit including a first channel to which a first gas containing air is supplied, a second channel to which a second gas higher in oxygen concentration than the first gas is supplied, and a third channel to which a third gas lower in oxygen concentration than the first gas is supplied, and configured to generate a mixture gas by using at least two of the first gas, the second gas, and the third gas, and supply the mixture gas to a space between the substrate and the projection optical system.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Ryo Sasaki
  • Patent number: 10533251
    Abstract: A showerhead module adjustment mechanism is provided which supports a showerhead module in a top plate of a semiconductor substrate processing apparatus, the showerhead module adjustment mechanism being dynamically operable to adjust a planarization of a faceplate of the showerhead module with respect to an upper surface of a substrate pedestal module adjacent the faceplate in the semiconductor substrate processing apparatus.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: January 14, 2020
    Assignee: Lam Research Corporation
    Inventor: John Wiltse
  • Patent number: 10514610
    Abstract: Disclosed is an apparatus for lithography patterning. The apparatus includes a substrate stage configured to hold a substrate coated with a deposition enhancement layer (DEL), a radiation source for generating a patterned radiation towards a surface of the DEL, and a supply pipe for flowing an organic gas near the surface of the DEL, wherein elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang, Jeng-Horng Chen
  • Patent number: 10507544
    Abstract: A laser processing system includes a first positioning system (1044) for imparting first relative movement of a beam axis along a beam trajectory (1062) with respect to a workpiece (1060), a processor for determining a second relative movement of the beam axis (1061) along a plurality of dither rows, a second positioning system (1042) for imparting the second relative movement, and a laser source (1046) for emitting laser beam pulses. The laser beam pulses of individually selected energies can be directed to individually selected transverse spot locations (5310) one or more times during a primary laser pass to permit three-dimensional patterning. The laser beam pulses can also be directed to the spatially identical, overlapping, or non-overlapping neighboring spot area locations on the workpiece in a temporally nonsequential order.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: December 17, 2019
    Assignee: ELECTRO SCIENTIFIC INDUSTRIES, INC
    Inventors: Haibin Zhang, Chuan Yang, Mark Alan Unrath, Martin Orrick
  • Patent number: 10510569
    Abstract: A pattern forming apparatus according to an embodiment includes: a pre-alignment unit that performs pre-alignment for a substrate; a transfer unit that transfers the substrate into the pre-alignment unit; a placing table on which the substrate transferred into the pre-alignment unit is placed; a position detecting unit provided at a position included in the placing table and overlapping with an edge of the substrate, and adapted to detect a position of the edge of the substrate; and a control unit that calculates a positional displacement amount of the substrate from the position of the edge of the substrate detected by the position detecting unit, and controls the placing table on the basis of the positional displacement amount of the substrate to correct the position of the substrate.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: December 17, 2019
    Assignee: Toshiba Memory Corporation
    Inventor: Sho Kawadahara
  • Patent number: 10506167
    Abstract: In one example embodiment, an information processing apparatus, for an observed image associated with an observation target object (e.g., a section of biological tissue), associates and stores position information and observation magnification information. In this embodiment, the information processing apparatus causes a display device to: (i) display an image associated with the observation target object; (ii) indicate the first positional information of the first observed image; and (iii) indicate the first observation magnification information of the first observed image.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: December 10, 2019
    Assignee: Sony Corporation
    Inventors: Yoichi Mizutani, Shigeatsu Yoshioka, Yoshihiro Wakita, Masashi Kimoto, Naoki Tagami
  • Patent number: 10495980
    Abstract: A projection optical system for an immersion exposure apparatus which exposes a substrate with an illumination light through the projection optical system and a liquid, the projection optical system includes: a plurality of reflective and refractive optical elements through which the illumination light passes, the plurality of reflective and refractive optical elements having a final lens, through which the illumination light passes, the final lens having a light emitting surface through a part of which the illumination light passes, the part of the light emitting surface being in contact with the liquid, wherein the image is projected in a projection region, a center of the projection region is away from an optical axis of the projection optical system with respect to a first direction perpendicular to the optical axis, and a center of the light emitting surface is away from the optical axis with respect to the first direction.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Bob Streefkerk
  • Patent number: 10488749
    Abstract: A method for forming a photomask includes the following steps. A substrate is provided, which has a pattern region and a peripheral region surrounding the pattern region. A first etching operation is performed on a first surface of the substrate to remove first portions of the substrate in the pattern region, so as to form recesses in the pattern region of the substrate. A blasting operation is performed on the first surface of the substrate. A BARC layer is formed filling the recesses and over the first surface of the substrate. A second etching operation is performed on a second surface of the substrate opposite to the first surface until portions of the BARC layer in the recesses are exposed. The BARC layer is removed after the second etching operation, so as to form openings in the substrate in the pattern region.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: November 26, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: You-Hua Chou, Kuo-Sheng Chuang
  • Patent number: 10483082
    Abstract: An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: November 19, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Rieko Nishimura
  • Patent number: 10437161
    Abstract: A method and apparatus for adjusting an exposure gap in the manufacture of display panels. The method includes: setting a detection range of a detector based on a thickness of a substrate, wherein a position of a waveform corresponding to the thickness of the substrate is outside the detection range; in case a position of a waveform corresponding to a target exposure gap is outside the detection range, setting an intermediary exposure gap within the detection range; adjusting the exposure gap during detecting the exposure gap by the detector until the exposure gap is equal to the intermediary exposure gap, wherein the exposure gap is a distance between the substrate and a mask plate; and adjusting the exposure gap to the target exposure gap based on a difference between the target exposure gap and the intermediary exposure gap.
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: October 8, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Hui Wang, Zhiqiang Wang, Guanglong Guo, Xing Tang, Wuyi Liao
  • Patent number: 10427439
    Abstract: An electronic device includes a housing having an opening that includes an interior surface with a portion that is only viewable from an external vantage point at a viewing angle that is other than ninety degrees (90°). The electronic device also includes a SIM card tray that is removable from the housing via the opening and the SIM card tray includes an angled surface. Information is encoded in the form of text that is laser etched on the angled surface. The text is characterized as having an aspect ratio that corresponds to the viewing angle.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: October 1, 2019
    Assignee: Apple Inc.
    Inventors: Jennifer L. Hawthorne, Michael J. Northrop, Tristan E. Lee, Marwan Rammah, Matthew D. Hill
  • Patent number: 10426020
    Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: September 24, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Peter M. Baumgart, John Martin Algots, Abhiram Govindaraju, Chirag Rajyaguru
  • Patent number: 10418266
    Abstract: An electrostatic chuck according to an embodiment is an electrostatic chuck for adsorbing an object. The electrostatic chuck includes a base body having a first surface that includes a bottom surface and a protruding surface part protruding from the bottom surface. The protruding surface part has a first top surface and a step surface disposed between the first top surface and the bottom surface.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: September 17, 2019
    Assignee: KYOCERA Corporation
    Inventor: Masahiko Horiuchi
  • Patent number: 10415804
    Abstract: A lighting system includes a housing and a finishing section. The housing defines a cavity and includes at least one magnet mounted inside the cavity. The finishing section includes a second magnet mounted adjacent to a side of the finishing section and oriented so that the second magnet and the first magnet attract each other when the finishing section is inserted into the housing.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: September 17, 2019
    Assignee: Eaton Intelligent Power Limited
    Inventors: Grzegorz Wronski, Jared Michael Davis, Barton Kirk Ideker
  • Patent number: 10393675
    Abstract: An x-ray inspection system including a cabinet containing an x-ray source, a sample support for supporting a sample to be inspected, and an x-ray detector; an air mover configured to force air into the cabinet through an air inlet above the sample support, where the air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support, and an assembly for positioning the sample support relative to the x-ray source and x-ray detector. The sample support includes an upper surface extending in a horizontal plane and the sample positioning assembly includes a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the horizontal plane, and a first horizontal positioning mechanism for moving the sample support and vertical positioning mechanism in a first horizontal direction.
    Type: Grant
    Filed: April 3, 2015
    Date of Patent: August 27, 2019
    Assignee: Nordson Corporation
    Inventors: John Tingay, William T. Walker, Phil King, Simon White, Kate Donaldson-Stewart
  • Patent number: 10372032
    Abstract: The present application relates to a method for permanently repairing defects of absent material of a photolithographic mask, comprising the following steps: (a) providing at least one carbon-containing precursor gas and at least one oxidizing agent at a location to be repaired of the photolithographic mask; (b) initiating a reaction of the at least one carbon-containing precursor gas with the aid of at least one energy source at the location of absent material in order to deposit material at the location of absent material, wherein the deposited material comprises at least one reaction product of the reacted at least one carbon-containing precursor gas; and (c) controlling a gas volumetric flow rate of the at least one oxidizing agent in order to minimize a carbon proportion of the deposited material.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: August 6, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jens Oster, Kinga Kornilov, Tristan Bret, Horst Schneider, Thorsten Hofmann
  • Patent number: 10359276
    Abstract: Provided are an apparatus and a method for measuring a three dimensional shape with improved accuracy. The apparatus includes a stage, at least one lighting unit, a plurality of image pickup units and a control unit. The stage supports an object to be measured. The lighting unit includes a light source and a grid, and radiates grid-patterned light to the object to be measured. The image pickup units capture, in different directions, grid images reflected from the object to be measured. The control unit calculates a three dimensional shape of the object from the grid images captured by the image pickup units. The present invention has advantages in capturing grid images through a main image pickup portion and sub-image pickup portions, enabling the measurement of the three dimensional shape of the object in a rapid and accurate manner.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: July 23, 2019
    Assignee: KOH YOUNG TECHNOLOGY INC.
    Inventors: Seung-Jun Lee, Kwangill Koh, Moon-Young Jeon, Sang-Kyu Yun, Hong-Min Kim, Jung Hur
  • Patent number: 10339645
    Abstract: Provided is a defect detection device capable of measuring the volume of surface defects. The defect detection device includes: an imaging device configured to image an image of an inspection object; a binarization processing unit configured to subject the image to first and second binarization processing by use of different first and second binarization thresholds, so as to calculate first and second sizes for an identical defect in the image; a ratio calculation unit configured to calculate a first ratio of the second size to the first size; and a depth determination unit configured to determine a depth of the defect depending on the first ratio.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: July 2, 2019
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Hirohisa Shibayama, Eiji Shiotani, Satoru Sakurai, Kiyokazu Sugiyama, Akira Shimizu, Daisuke Terada, Yoshitsugu Noshi, Yoshito Utsumi
  • Patent number: 10337991
    Abstract: Metrology scatterometry targets, optical systems and corresponding metrology tools and measurement methods are provided. Targets and/or optical systems are designed to enhance first order diffraction signals with respect to a zeroth order diffraction signal from the scatterometry target by creating a phase shift of 180° between zeroth order diffraction signals upon illumination of the scatterometry targets. For example, the targets may be designed to respond to polarized illumination by producing a first phase shift between zeroth order diffraction signals upon illumination thereof and optical systems may be designed to illuminate the target by polarized illumination and to analyze a resulting diffraction signal to yield a second phase shift between zeroth order diffraction signals upon illumination thereof. The phase shifts add up to 180° to cancel out the zeroth order diffraction signals, with either phase shift being between 0 and 180°.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: July 2, 2019
    Assignee: KLA-Tencor Corporation
    Inventor: Vladimir Levinski
  • Patent number: 10324382
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: June 18, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • Patent number: 10319563
    Abstract: The disclosure relates to an electronic beam machining system. The system includes a vacuum chamber; an electron gun located in the vacuum chamber and used to emit electron beam; a holder located in the vacuum chamber and used to fix an object; a control computer; and a diffraction unit located in the vacuum chamber; the diffraction unit includes a two-dimensional nanomaterial; the electron beam transmits the two-dimensional nanomaterial to form a transmission electron beam and a plurality of diffraction electron beams; the transmission electron beam and the plurality of diffraction electron beams radiate the object to form a transmission spot and a plurality of diffraction spots.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: June 11, 2019
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Peng Liu, Wei Zhao, Xiao-Yang Lin, Duan-Liang Zhou, Chun-Hai Zhang, Kai-Li Jiang, Shou-Shan Fan
  • Patent number: 10312052
    Abstract: Provided is an assembly for inspecting the surface of a sample. The assembly includes two or more multi-beam electron column units. Each unit has: a single thermal field emitter for emitting a diverging electron beam towards a beam splitter; wherein the beam splitter includes a first multi-aperture plate having multiple apertures for creating multiple primary electron beams; a collimator lens for collimating the diverging electron beam from the emitter; an objective lens unit for focusing said multiple primary electron beams on said sample; and a multi-sensor detector system for separately detecting the intensity of secondary electron beams created by each one of said focused primary electron beams on said sample. The two or more multi-beam electron column units are arranged adjacent to each other for inspecting different parts of the surface of the sample at the same time.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: June 4, 2019
    Assignee: TECHNISCHE UNIVERSITEIT DELFT
    Inventor: Pieter Kruit
  • Patent number: 10308514
    Abstract: Systems, methods and tools for the synthesis of products via mechanosynthesis, including a set of atomically-precise tips and associated reactions, methods for determining build sequences for workpieces, exemplary build sequences, and methods for creating new reactions, build sequences and tips.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: June 4, 2019
    Assignee: CBN Nano Technologies Inc.
    Inventors: Robert A. Freitas, Ralph C. Merkle
  • Patent number: 10310392
    Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: June 4, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Johannes Petrus Martinus Bernardus Vermeulen, Engelbertus Antonius Fransiscus Van Der Pasch
  • Patent number: 10303061
    Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: May 28, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Yuichi Nishimura, Takayuki Yabu, Yoshifumi Ueno
  • Patent number: 10297417
    Abstract: The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle ? between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin ??d?=?, where ? represents a wavelength of the electron beam.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: May 21, 2019
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Peng Liu, Wei Zhao, Xiao-Yang Lin, Duan-Liang Zhou, Chun-Hai Zhang, Kai-Li Jiang, Shou-Shan Fan
  • Patent number: 10290462
    Abstract: An apparatus for the creation of high current ion beams is disclosed. The apparatus includes an ion source, such as a RF ion source or an indirectly heated cathode (IHC) ion source, having an extraction aperture. Disposed proximate the extraction aperture is a bias electrode, which has a hollow center portion that is aligned with the extraction aperture. A magnetic field is created along the perimeter of the hollow center portion, which serves to contain electrons within a confinement region. Electrons in the confinement region energetically collide with neutral particles, increasing the number of ions that are created near the extraction aperture. The magnetic field may be created using two magnets that are embedded in the bias electrode. Alternatively, a single magnet or magnetic coils may be used to create this magnetic field.
    Type: Grant
    Filed: February 9, 2018
    Date of Patent: May 14, 2019
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Alexandre Likhanskii, Svetlana B. Radovanov, Anthony Renau
  • Patent number: 10274839
    Abstract: A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: April 30, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wen-Zhan Zhou, Heng-Jen Lee, Chen-Ming Wang, Kai-Hsiung Cheng, Chih-Ming Ke, Ho-Yung David Hwang
  • Patent number: 10249519
    Abstract: A semiconductor wafer held by a holder within a chamber is irradiated and heated with halogen light emitted from multiple halogen lamps. A cylindrical louver made of opaque quartz and a light-shielding member of a ring shape having a cut-out portion are provided between the halogen lamps and the semiconductor wafer. When the semiconductor wafer is heated with the light emitted from the halogen lamps, a shadow region will appear in the semiconductor wafer as a result of the louver blocking off the emitted light. However, in the presence of the cut-out portion of the light-shielding member, the light emitted from the halogen lamps will reach the shadow region through the cut-out portion. This configuration allows the shadow region to be heated in the same manner as the other regions, and accordingly will help make uniform the in-plane temperature distribution of the semiconductor wafer during light irradiation heating.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: April 2, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Makoto Abe
  • Patent number: RE47922
    Abstract: A charged particle beam writing apparatus includes a division/distribution processing unit to divide and distribute processed data into data groups each having an approximately equal data amount respectively, transmitting units to transmit the processed data of the groups such that processed data is transmitted in descending order with respect to order of writing processing for each data group and the groups are transmitted in parallel, memories to store the processed data of the groups such that each of the memories stores processed data of each different one of the groups, a writing order data output unit to output them, regardless of data group and in order of writing processing, and a writing unit to write a pattern on a target workpiece with a charged particle beam, based on the processed data output in the order of writing processing.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: March 31, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Hideo Inoue