Ion Or Electron Beam Irradiation Patents (Class 250/492.3)
-
Patent number: 12161885Abstract: An example method of treating a target using particle beam includes directing the particle beam along a path at least part-way through the target, and controlling an energy of the particle beam while the particle beam is directed along the path so that the particle beam treats at least interior portions of the target that are located along the path. While the particle beam is directed along the path, the particle beam delivers a dose of radiation to the target that exceeds one (1) Gray-per-second for a duration of less than five (5) seconds. A treatment plan may be generated to perform the method.Type: GrantFiled: August 8, 2023Date of Patent: December 10, 2024Assignee: Mevion Medical Systems, Inc.Inventors: James Cooley, Townsend Zwart
-
Patent number: 12138472Abstract: A treatment device includes a pulsed particles accelerator and a processor for controlling the latter to deliver a treatment plan by deposition at HDR of charged particles into a flash volume (Vht) by PBS. To shorten the time for depositing a target dose (Dti) into the cells spanned by the flash spots (Si) of the flash volume (Vht), the flash spots are combined into k sets of n flash spots (Si). After depositing a jth pulse dose (Dij) into the cells spanned by a ith flash spot (Si) the beam commutes from the ith flash spot (Si) to a next (i+1)th flash spot according to a flash scanning subsequence to deposit a jth dose into the cells spanned by each of the subsequent flash spots of the flash scanning subsequence, until returning to the ith flash spot to deposit a (j+1)th dose (Di(j+1)), and so on When all the cells spanned by all the flash spots of a set have received their corresponding target dose, the beam moves to a next set of combined flash spots and repeats the foregoing pulse deposition steps.Type: GrantFiled: July 7, 2022Date of Patent: November 12, 2024Assignee: Ion Beam ApplicationsInventors: Rudi Labarbe, Lucian Hotoiu, Arnaud Pin, Yves Claereboudt, Gabriel Krier
-
Patent number: 12130343Abstract: The magneto-optical Kerr effect (MOKE) is used to capture variations in magnetic permeability and magnetization to determine the presence of sensitization. MOKE-magnetometry-based systems and apparatus may be used to provide in-field magnetic measurements, and may be particularly useful in methods for assessing changes in composition, crystal structure, and grain size in magnetic materials.Type: GrantFiled: October 27, 2023Date of Patent: October 29, 2024Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Nicholas J. Jones, Emily L. Guzas, Matthew T. Roberts, Wayne C. Tucker
-
Patent number: 12094685Abstract: An ion implantation method includes acquiring a first data set for setting beam energy of an ion beam output from the high energy multi-stage linear acceleration unit to be a first output value, determining a second data set for setting the beam energy of the ion beam output from the high energy multi-stage linear acceleration unit to be a second output value different from the first output value, based on the first data set, and performing ion implantation by irradiating a workpiece with the ion beam output from the high energy multi-stage linear acceleration unit operating in accordance with the second data set. An acceleration phase of the high frequency accelerator in each of the plurality of stages is the same between the first data set and the second data set, in all of the high frequency accelerators respectively in the plurality of stages.Type: GrantFiled: January 25, 2022Date of Patent: September 17, 2024Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.Inventor: Taisei Futakuchi
-
Patent number: 12087543Abstract: A multi-charged particle beam writing apparatus according to one aspect of the present invention includes a region setting unit configured to set, as an irradiation region for a beam array to be used, the region of the central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, and a writing mechanism, including the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented.Type: GrantFiled: October 20, 2022Date of Patent: September 10, 2024Assignee: NuFlare Technology, Inc.Inventor: Hiroshi Matsumoto
-
Patent number: 12046447Abstract: In one embodiment, a multi-charged-particle-beam writing method includes dividing a data path into a plurality of first blocks based on at least either one of each of a plurality of input/output circuits and a plurality of wiring groups, and calculating a first shift amount for multiple beams for each of the plurality of first blocks. The data path is for inputting control data to a cell array on a blanking aperture array substrate. The control data is for controlling ON/OFF of each beam of the multiple beams. Each of the plurality of wiring groups includes a plurality of pieces of wiring connected to the plurality of input/output circuits and grouped together based on inter-wiring distance. The first shift amount is due to at least one of an electric field and a magnetic field for each of the plurality of first blocks. An irradiation position or a dose of the multiple beams is corrected based on the first shift amount, and irradiation is performed.Type: GrantFiled: August 11, 2022Date of Patent: July 23, 2024Assignee: NuFlare Technology, Inc.Inventors: Taku Yamada, Takahito Nakayama
-
Patent number: 12023518Abstract: The invention relates a system for assisting in planning a radiation therapy treatment provided using a treatment plan comprising irradiation parameters for controlling a delivery of radiation. The system is configured to (i) receive a first dose distribution, (ii) obtain a first objective function, which depends upon at least one parameter and a dose distribution, (iii) determine a first value of the parameter such that the first objective function fulfills a predefined criterion when being evaluated for the first value of the parameter and for a second dose distribution derived from the first dose distribution, (iii) provide the first objective function in connection with the first value of the at least one parameter to a user for modifying the first objective function to generate a second objective function, and (v) determine the treatment plan using the second objective function. Further, the invention relates to a corresponding method and computer program.Type: GrantFiled: December 15, 2021Date of Patent: July 2, 2024Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Rolf Juergen Weese, Alfonso Agatino Isola, Maria Luiza Bondar, Torbjoern Vik, Nick Flaeschner, Jens Wiegert, Harald Sepp Heese
-
Patent number: 11978609Abstract: An electron gun EG in which mixing of secondary electrons is suppressed is provided. The electron gun EG has an electron source 1, an extraction electrode 2 for extracting an electron beam E1 from the electron source 1, and an acceleration electrode for accelerating the extracted electron beam E1. The extraction electrode 2 includes a diaphragm 4 for allowing a part of the electron beam E1 to pass through, a shield 5 positioned above the diaphragm 4 apart from the diaphragm 4, and a shield 6 positioned below the diaphragm 4 apart from the diaphragm 4. The diaphragm 4 has an opening OP4 having an opening diameter D4, the shield 5 has an opening OP5 having an opening diameter D5 which is greater than the opening diameter D4, and the shield 6 has an opening OP6 having an opening diameter D6 which is greater than the opening diameter D4.Type: GrantFiled: May 21, 2019Date of Patent: May 7, 2024Assignee: Hitachi High-Tech CorporationInventor: Minoru Kaneda
-
Patent number: 11906605Abstract: The magneto-optical Kerr effect (MOKE) is used to capture variations in magnetic permeability and magnetization to determine the presence of sensitization. MOKE-magnetometry-based systems and apparatus may be used to provide in-field magnetic measurements, and may be particularly useful in methods for assessing changes in composition, crystal structure, and grain size in magnetic materials.Type: GrantFiled: November 1, 2021Date of Patent: February 20, 2024Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Nicholas J. Jones, Emily L. Guzas, Matthew T. Roberts, Wayne C. Tucker
-
Patent number: 11896041Abstract: A device(s) and method for pasteurizing and/or sterilizing particulate material using an electron beam. The device (10) includes at least one electron source (20) for generating an electron beam, a treatment zone (19) in which the material, particularly a freely falling material, can be pasteurized and/or sterilized by the electron beam, and a material channel (21) arranged in the region of the treatment zone (19) in which the material can be pasteurized and/or sterilized by the electron beam. A planar protective element (23), which is at least partially permeable by the electron beam, is arranged between the electron source (20) and the material channel (21). The device (10) includes a holding frame (120) which holds the protective element (23) and which has a cavity (121) through which a cooling fluid can flow.Type: GrantFiled: February 20, 2019Date of Patent: February 13, 2024Assignee: BÜHLER AGInventor: Alasdair Currie
-
Patent number: 11881376Abstract: Described are ion implantation devices, systems, and methods, and in particular to an ion source that is useful for generating an aluminum ion beam.Type: GrantFiled: October 1, 2021Date of Patent: January 23, 2024Assignee: ENTEGRIS, INC.Inventors: Ying Tang, Joe R. Despres, Joseph D. Sweeney, Oleg Byl, Barry Lewis Chambers
-
Patent number: 11785702Abstract: A remote diagnostic monitoring of operating states for physical components of a particle accelerator system includes generating, by at least one processor, a component hierarchy corresponding to a physical arrangement of one or more physical components of a particle emitting system and including corresponding operating indicators of operating states of the physical components, identifying, by the at least one processor, a faulted physical component among the physical components, identifying, by the at least one processor, one or more fault path components among the physical components, the fault path components corresponding to a portion of the physical arrangement associated with the faulted physical component, and modifying, by the at least one processor, the operating indicators of the fault path components to fault state indicators.Type: GrantFiled: August 10, 2022Date of Patent: October 10, 2023Assignee: VARIAN MEDICAL SYSTEMS, INC.Inventors: Brian Forbes, Joel Rumley, Imran Tariq, Eric Grossimon, Brian Morse
-
Patent number: 11771395Abstract: The present invention relates to positioning a medical imaging system in relation to an object. In order to provide improved positioning possibilities which facilitate the workflow during an intervention, a medical imaging apparatus (10) is provided with an image acquisition arrangement (12), which is positionable in relation to an object (16) to acquire image data (18) of the object from different directions. An output unit (14) is arranged to provide the image data. According to the invention, first movement direction indicators (22) are provided to indicate possible movement directions of the image acquisition arrangement in relation to the object.Type: GrantFiled: January 30, 2019Date of Patent: October 3, 2023Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Peter Belei, Bart Carelsen
-
Patent number: 11752362Abstract: According to one embodiment, a radiotherapy planning apparatus includes processing circuitry. The processing circuitry calculates initial irradiation directions of particle beams and an initial dose distribution corresponding to the initial irradiation directions by using a three-dimensional medical image concerning an object. The processing circuitry disperses some or all of the initial irradiation directions in response to a dispersion instruction via an input device. The processing circuitry modifies the initial dose distribution based on the dispersed irradiation directions.Type: GrantFiled: July 13, 2017Date of Patent: September 12, 2023Assignee: Canon Medical Systems CorporationInventor: Satoru Ohishi
-
Patent number: 11749496Abstract: Disclosed herein are techniques directed toward a protective shutter for a charged particle microscope. An example apparatus at least includes a charged particle column and a focused ion beam (FIB) column, a gas injection nozzle coupled to a translation device, the translation device configured to insert the gas injection nozzle in close proximity to a stage, and a shutter coupled to the gas injection nozzle and arranged to be disposed between the sample and the SEM column when the gas injection nozzle is inserted in close proximity to the stage.Type: GrantFiled: June 21, 2021Date of Patent: September 5, 2023Assignee: FEI CompanyInventor: Philip Brundage
-
Patent number: 11735395Abstract: To provide a technique capable of measuring high-frequency electrical noise in a charged particle beam device. A charged particle beam device 100 includes an electron source 2 for generating an electron beam EB1, a stage 4 for mounting a sample 10, a detector 5 for detecting secondary electrons EB2 emitted from the sample 10, and a control unit 7 electrically connected to the electron source 2, the stage 4, and the detector 5 and can control the electron source 2, the stage 4, and the detector 5. Here, when the sample 10 is mounted on the stage 4, and a specific portion 11 of the sample 10 is continuously irradiated with the electron beam EB1 from the electron source 2, the control unit 7 can calculate a time-series change in irradiation position of the electron beam EB1 based on an amount of the secondary electrons EB2 emitted from the specific portion 11, and can calculate a feature quantity for a shake of the electron beam EB1 based on the time-series change in irradiation position.Type: GrantFiled: July 29, 2021Date of Patent: August 22, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takayasu Iwatsuka, Tomoyo Sasaki, Wen Li, Ryo Kadoi, Makoto Suzuki
-
Patent number: 11690164Abstract: A method for beam therapy is provided. The method includes receiving first data indicating a plurality of target volumes within a target region inside a subject for particle beam therapy relative to a particle beam outlet on a gantry for directing a particle beam from a particle beam source. The method further includes moving automatically, one or more energy modulator components to reduce an energy of the particle beam and deliver the particle beam to the target region such that a Bragg Peak is delivered to at least one target volume of the plurality of target volumes. The method further includes repeating the moving automatically as the particle beam source rotates with the gantry around the subject, without changing the energy of the particle beam at the particle beam outlet, until every target volume is subjected to a Bragg Peak.Type: GrantFiled: March 8, 2018Date of Patent: June 27, 2023Assignee: UNIVERSITY OF MARYLAND, BALTIMOREInventors: Byong Yong Yi, Warren D. D'Souza, Ulrich Langner
-
Patent number: 11623237Abstract: Disclosed is droplet ejecting apparatus that ejects droplets of a functional liquid onto a workpiece to draw a pattern. The droplet ejecting apparatus includes: a workpiece table; a droplet ejecting head configured to eject the droplets onto the workpiece placed on the workpiece table; a movement mechanism configured to relatively move the workpiece table and the droplet ejecting head in a main scanning direction and a sub-scanning direction; and a control unit configured to: detect a position of the workpiece or a position of the workpiece table while relatively moving the workpiece table and the droplet ejecting head along a plurality of scanning lines extending in the main scanning direction and set side by side in the sub-scanning direction; and create, based on a detection result, a correction table that indicates a correlation between a position of the movement mechanism and a positional correction amount of the workpiece table.Type: GrantFiled: March 5, 2018Date of Patent: April 11, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuhito Miyazaki, Akira Kakino, Wataru Yoshitomi
-
Patent number: 11623107Abstract: A method of optimizing delivery of a particle beam at a target is disclosed. The particle beam is delivered from an output device at a plurality of control points. In implementations, the method comprises delivering a substantially continuous particle beam about the plurality of control points, iteratively adjusting a delivery time of the substantially continuous particle beam about the plurality of control points, and processing to undertake at least one of (i) pre-defining energy layers based on one or both of the control points and a control point sampling frequency, or (ii) sorting the energy layers.Type: GrantFiled: May 7, 2021Date of Patent: April 11, 2023Assignee: WILLIAM BEAUMONT HOSPITALInventors: Xuanfeng Ding, Xiaoqiang Li, Di Yan
-
Patent number: 11602644Abstract: It is provided a method for determining a distribution of spots for use with ion beam therapy for providing the spots in a target volume, wherein each spot represents a collection of ions of a specific energy level and of a specific size at a specific lateral location. The method is performed in a treatment planning system and comprises the steps of: dividing the target volume in a plurality of target sections based on a user configuration comprising at least one spot size strategy defining a maximum spot size at the location of a Bragg peak; assigning a spot size strategy to each one of the target sections based on the location of the respective target section; and determining, within each target section, spots in accordance with its spot size strategy.Type: GrantFiled: June 26, 2018Date of Patent: March 14, 2023Assignee: RaySearch Laboratories ABInventors: Erik Engwall, Lars Glimelius, Martin Janson
-
Patent number: 11574796Abstract: An aperture diaphragm capable of varying the size of an aperture in two dimensions is disclosed. The aperture diaphragm may be utilized in an ion implantation system, such as between the mass analyzer and the acceleration column. In this way, the aperture diaphragm may be used to control at least one parameter of the ion beam. These parameters may include angular spread in the height direction, angular spread in the width direction, beam current or cross-sectional area. Various embodiments of the aperture diaphragm are shown. In certain embodiments, the size of the aperture in the height and width directions may be independently controlled, while in other embodiments, the ratio between height and width is constant.Type: GrantFiled: July 21, 2021Date of Patent: February 7, 2023Assignee: Applied Materials, Inc.Inventors: Jun Lu, Frank Sinclair, Shane W. Conley, Michael Honan
-
Patent number: 11559702Abstract: A treatment planning system for generating a plan for treatment by radiation with charged particles beams applied by pencil beam scanning onto a target tissue comprising tumoral cells is provided. The treatment planning system performs a dose definition stage defining the doses to be deposited within the peripheral surface, a beam definition stage defining positions and dimensions of the beamlets of the PBS during the at least one high rate fraction, the beams definition stage including a dose rate definition stage comprising at least one high rate fraction, and a beamlets scanning sequence stage defining a scanning sequence of irradiation of the beamlets. The beamlets scanning sequence stage optimizes a time sequence of beamlets emission such that at the end of a fraction j, a dose is deposited onto at least a predefined fraction of each specific volume at a mean deposition rate superior or equal to a predefined value.Type: GrantFiled: June 29, 2021Date of Patent: January 24, 2023Assignee: Ion Beam ApplicationsInventors: Rudi Labarbe, Lucian Hotoiu, Arnaud Pin
-
Patent number: 11511130Abstract: The disclosure provides systems and methods for adjusting a multi-leaf collimator (MLC). The MLC includes a plurality of cross-layer leaf pairs, each cross-layer leaf pair of the plurality of cross-layer leaf pairs includes a first leaf located in a first layer of leaves and a second leaf opposingly located in a second layer of leaves. For at least one cross-layer leaf pair, an effective cross-layer leaf gap to be formed between the first leaf and the second leaf may be determined; at least one of the first leaf or the second leaf may be caused to move to form the effective cross-layer leaf gap; and an in-layer leaf gap may be caused, based on the effective cross-layer leaf gap, to be formed between the first leaf and an opposing first leaf in the first layer. A size of the in-layer leaf gap may be no less than a threshold.Type: GrantFiled: April 15, 2020Date of Patent: November 29, 2022Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.Inventors: Johannes Stahl, Walter Arturo Aguilar
-
Patent number: 11478661Abstract: Systems and methods for radiation treatment planning can include a computing system determining an estimate of a radiation dose distribution within an anatomical region of a patient, and determining a cost matrix representing an objective function, using the estimate of the radiation dose distribution. The computing system can project the cost matrix on each of a plurality of fluence planes. Each of the plurality of fluence planes can be associated with a corresponding gantry-couch orientation of a plurality of gantry-couch orientations of a medical linear accelerator. The computing system can determine, using projections of the cost matrix on each of the plurality of fluence planes, a sequence of gantry-couch orientations among the plurality of gantry-couch orientations representing a treatment path.Type: GrantFiled: September 29, 2020Date of Patent: October 25, 2022Assignee: VARIAN MEDICAL SYSTEMS INTERNATIONAL AGInventors: Tuomas Tallinen, Daniel Valenzuela, Janne Nord
-
Patent number: 11437216Abstract: Systems for reducing the generation of thermal magnetic field noise in optical elements of microscope systems, are disclosed. Example microscopy optical elements having reduced Johnson noise generation according to the present disclosure comprises an inner core composed of an electrically isolating material, and an outer coating composed of an electrically conductive material. The product of the thickness of the outer coating and the electrical conductivity is less than 0.01??1. The outer coating causes a reduction in Johnson noise generated by the optical element of greater than 2×, 3×, or an order of magnitude or greater. In a specific example embodiment, the optical element is a corrector system having reduced Johnson noise generation. Such a corrector system comprises an outer magnetic multipole, and an inner electrostatic multipole. The inner electrostatic multipole comprises an inner core composed of an electrically isolating material and an outer coating composed of an electrically conductive material.Type: GrantFiled: December 31, 2020Date of Patent: September 6, 2022Assignee: FEI CompanyInventors: Alexander Henstra, Pleun Dona
-
Patent number: 11437263Abstract: An electrostatic chuck includes at least one conductor layer; an electrostatic electrode; and a base body in which the electrostatic electrode is embedded, the base body having a first dielectric layer on which the electrostatic electrode is mounted, the base body having a second dielectric layer stacked on the first dielectric layer with covering the electrostatic electrode. The conductor layer is formed on a surface of the first dielectric layer opposite to a surface on which the electrostatic electrode is mounted. The second dielectric layer has a first surface facing the first dielectric layer and a second surface opposite to the first surface, and the second surface is a placement surface on which a suction target is placed. A relative permittivity of the first dielectric layer is lower than a relative permittivity of the second dielectric layer.Type: GrantFiled: June 17, 2020Date of Patent: September 6, 2022Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.Inventors: Michio Horiuchi, Masaya Tsuno
-
Patent number: 11426606Abstract: A method of evaluating a radiation therapy (RT) treatment plan for a treatment volume, divided into sub-volumes and having a target volume and one or more organs at risk, OAR. It includes obtaining a RT treatment plan; calculating the linear energy transfer, LET, in each sub-volume; dividing the dose distribution into doses of a first category and a second category in each sub-volume, wherein the first category comprises doses with energy depositions with an LET below a first LET threshold and the second category comprises doses with energy depositions with an LET above a second LET threshold; determining amounts of doses of the first and of the second category in each sub-volume; and performing an analysis of the quality of the RT treatment plan by metrics based on the obtained distribution of doses of the first and of the second category in the target volume and in the OAR.Type: GrantFiled: January 29, 2020Date of Patent: August 30, 2022Assignee: RAYSEARCH LABORATORIES ABInventor: Erik Traneus
-
Patent number: 11413476Abstract: According to an embodiment, a particle beam treatment system includes a storage, an estimator, a target value generator, and a particle beam treatment device. The storage stores therein a respiratory movement model obtained by synchronizing amount of displacement of an affected area of a subject with a signal related to respiration of the subject and performing modeling. The estimator estimates, based on the measured signal related to respiration and the respiratory movement model, amount of displacement of the affected area corresponding to the measured signal. The target value generator generates a target value, which is used for performing movement control on a platform on which the subject is lying down, corresponding to the estimated amount of displacement of the affected area. The particle beam treatment device irradiates, with particle beams, the affected area of the subject on the platform subjected to movement control according to the target value.Type: GrantFiled: May 16, 2019Date of Patent: August 16, 2022Assignee: Kabushiki Kaisha ToshibaInventors: Junichiro Ooga, Hideki Ito, Nobukatsu Sugiyama, Atsuro Oonishi
-
Patent number: 11389671Abstract: To provide a particle beam treatment system and a method for renewing facilities of the particle beam treatment system with which the facilities can be renewed efficiently. A particle beam treatment system 1 includes a charged particle beam generation device 2 that generates a charged particle beam Bm, a first irradiation device 4(1) that irradiates the charged particle beam to a predetermined irradiation target, a first beam transportation device 3(1) that transports the charged particle beam from the charged particle beam generation device 2 to the first irradiation device 4(1), and a first vacuum valve 33(1) that is arranged in the first beam transportation device 3(1).Type: GrantFiled: December 12, 2018Date of Patent: July 19, 2022Assignee: HITACHI, LTD.Inventor: Hidehiro Aono
-
Patent number: 11389669Abstract: A method of radiotherapy treatment planning for creating a plan for delivery of radiation to a patient in at least one particle-based arc is proposed. The delivery time for the plan is reduced by including a penalty in the objective function, designed to limit the number of energy layers and/or the number of energy layer changes.Type: GrantFiled: April 1, 2019Date of Patent: July 19, 2022Assignee: RaySearch Laboratories ABInventors: Erik Traneus, Kjell Eriksson, Erik Engwall, Rasmus Bokrantz, Albin Fredriksson
-
Patent number: 11383105Abstract: A particle beam transport apparatus includes a vacuum duct, at least one magnet controller, and a scanning magnet. The vacuum duct is configured such that a particle beam advances through the vacuum duct. The magnet controller is disposed around a bent portion of the vacuum duct and is configured to control an advancing direction or shape of the particle beam. The scanning magnet is disposed on the downstream side of the magnet controller in the advancing direction and is configured to scan the particle beam by deflecting each bunch of the particle beam. The magnet controller includes a deflection magnet configured to deflect the advancing direction of the particle beam along the bent portion and a quadrupole magnet configured to converge the particle beam. The deflection magnet and the quadrupole magnet constitute a combined-function magnet arranged at the same point in the advancing direction.Type: GrantFiled: November 14, 2017Date of Patent: July 12, 2022Assignees: KABUSHIKI KAISHA TOSHIBA, Toshiba Energy Systems & Solutions CorporationInventors: Shigeki Takayama, Tomofumi Orikasa, Yoshifumi Nagamoto, Takeshi Yoshiyuki
-
Patent number: 11369807Abstract: A system proton treatment system including a proton accelerator structured to generate a proton beam, a plurality of beamline pathways configured to direct the proton beam from the proton accelerator to a corresponding plurality of treatment rooms, a rotatable bending magnet located between the proton accelerator and the plurality of treatment rooms, the rotatable bending magnet being structured to selectively rotate between multiple treatment rooms, and an upright patient positioning mechanism disposed in each of the treatment rooms, the upright patient positioning mechanism being structured to support a patient within a particular treatment room and to rotate the patient between a fixed imaging source and imaging panel.Type: GrantFiled: January 10, 2020Date of Patent: June 28, 2022Assignee: ProNova Solutions, LLCInventors: Aaron Jacques, Niek Schreuder, Terry Douglass, Joseph C. Matteo, Steve Schrick, Jacob Shamblin, Ian Turnbull, Yan Zhang
-
Patent number: 11342165Abstract: In a plasma processing method, a position in height direction of an upper surface of a focus ring surrounding an edge of a substrate mounted on a supporting table in a chamber of a plasma processing apparatus is set such that the position in height direction of the upper surface of the focus ring mounted on a mounting region of the supporting table is lower than a reference position that is a position in a height direction of an upper surface of the substrate. Plasma is generated in the chamber to perform plasma processing on the substrate in a state where the position in the height direction of the upper surface of the focus ring is maintained. A negative DC voltage is applied to the focus ring in a state where the position in height direction of the upper surface of the focus ring is maintained during the plasma generation.Type: GrantFiled: June 10, 2020Date of Patent: May 24, 2022Assignee: TOKYO ELECTRON LIMITEDInventor: Toshifumi Nagaiwa
-
Patent number: 11309163Abstract: A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.Type: GrantFiled: November 7, 2019Date of Patent: April 19, 2022Assignee: Applied Materials, Inc.Inventors: Mehdi Vaez-Iravani, Christopher Dennis Bencher, Krishna Sreerambhatla, Hussein Fawaz, Lior Engel, Robert Perlmutter
-
Patent number: 11275044Abstract: An anomaly determination method of the present embodiment includes: measuring a first resistance value of a processing target via a first grounding member when the first grounding member is attached to the processing target in a first chamber; bringing the first grounding member into contact with a grounded second grounding member to measure a second resistance value of the processing target via the first and second grounding members in a second chamber; and determining an anomaly of the second grounding member with an arithmetic processing unit based on a trend of a resistance difference between the first resistance value and the second resistance value for a plurality of processing targets.Type: GrantFiled: July 3, 2019Date of Patent: March 15, 2022Assignee: NUFLARE TECHNOLOGY, INC.Inventor: Shun Kanezawa
-
Patent number: 11170907Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).Type: GrantFiled: November 3, 2016Date of Patent: November 9, 2021Assignee: ASML Netherlands B.V.Inventors: Pieter Willem Herman De Jager, Sipke Jacob Bijlsma, Olav Waldemar Vladimir Frijns, Andrey Alexandrovich Nikipelov, Nicolaas Ten Kate, Antonius Theodorus Anna Maria Derksen, Jacobus Johannus Leonardus Hendricus Verspay, Robert Gabriël Maria Lansbergen, Aukje Arianne Annette Kastelijn
-
Patent number: 11154729Abstract: An apparatus for applying an electron beam to a subdermal tumor generates a pulsed electron beam that is collimated to a diameter of less than 1 mm and less than 10 millimeter-milliradiant transverse emittance. A biopsy needle having an interior diameter less than 2 mm and length between 1 cm and 100 cm is inserted through the skin to the tumor, and the electron beam is electromagnetically directed through the needle, so as to reach the tumor without irradiating intervening normal tissue and with minimal irradiation of surrounding normal tissue. The electron pulsing rate can be in the S-band or Q-band, the beam energy can be between 1 Mev and 6 MeV, and/or the beam brightness can be less than 10 mm·mrad. A distal end of the biopsy needle can include an electron-permeable vacuum barrier, and the apparatus can be evacuated to less than 10?8 Torr.Type: GrantFiled: August 17, 2018Date of Patent: October 26, 2021Assignee: Shenzhen Ming-Jie Medical Science and Technologies Co. Ltd.Inventors: Wei Gai, Huijun Xu, Huaibi Chen
-
Patent number: 11145430Abstract: Disclosed is a gas targeting system including a body, which has a frustoconical cavity; a cooling circuit including at least one channel which surrounds at least one portion of the cavity; a window, positioned facing an inlet of the cavity in order to close the cavity, including a fine sheet that is permeable to at least a portion of a beam of particles emitted by a particle accelerator and a support grid configured to support pressure differences between and inside of the cavity and an outside of the targeting system, with the fine sheet positioned between the support grid and the cavity; and a support flange which holds the window and is hermetically secured on the body, and which includes a mechanical attachment interface at the outlet of a particle accelerator.Type: GrantFiled: December 19, 2017Date of Patent: October 12, 2021Assignee: P M BInventors: Thomas Campanella, Alain Perez Delaume
-
Patent number: 11132798Abstract: Provided is a tumor tracking method including: acquiring a detection image when a first ray source is located at a first detection point; determining, from a first reference image sequence in a preset image library, a first reference image corresponding to the detection image; acquiring, from a second reference image sequence corresponding to the first reference image sequence in the preset image library, a second reference image determined at the same time point as the first reference image; and determining a position of a tumor relative to a second ray source according to the second reference image.Type: GrantFiled: July 28, 2017Date of Patent: September 28, 2021Assignees: OUR UNITED CORPORATION, SHENZHEN OUR NEW MEDICAL TECHNOLOGIES DEVELOPMENT CO., LTD.Inventors: Hao Yan, Jinsheng Li, Jiuliang Li, Haifeng Liu
-
Patent number: 11110188Abstract: An electron beam irradiation device includes an electron gun, a housing, and an electron beam emission window. A rod portion of the housing includes a first tubular member, a second tubular member, a cooling gas flow space, and a wall member. The window is provided at an end portion on a distal end side of the first tubular member. The second tubular member surrounds the first tubular member. The cooling gas flow space includes at least a cooling gas flow path provided between an outer wall surface of the first tubular member and an inner wall surface of the second tubular member. The wall member is provided so as to perform partition between an electron beam emission space and the cooling gas flow space. The wall member is provided with a cooling gas ejection hole. The hole has a flow path sectional area smaller than a flow path sectional area of the cooling gas flow path.Type: GrantFiled: July 3, 2017Date of Patent: September 7, 2021Assignee: HAMAMATSU PHOTONICS K.K.Inventors: Tatsuya Matsumura, Takeaki Hattori, Keigo Uchiyama
-
Patent number: 11097310Abstract: A paint hardening device is a device for hardening paint applied to a workpiece and includes an electron beam emission portion configured to emit an electron beam to harden the paint, and a storage chamber in which the electron beam emission portion is accommodated. The paint hardening device is configured to move the workpiece and the electron beam emission portion relative to each other while the electron beam is being applied to the paint from the electron beam emission portion in a state where an inert gas atmosphere is formed at least in an electron-beam passing region where the electron beam passes in the storage chamber, the electron beam being applied to the paint from the electron beam emission portion.Type: GrantFiled: March 18, 2020Date of Patent: August 24, 2021Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Atsuo Nabeshima
-
Patent number: 11057982Abstract: A rotary module for a measuring device of an accelerator facility includes a first radial bearing including a first bearing side configured to be paired with an accelerator-side flange connection and further including a second bearing side configured to receive the measuring device on the first radial bearing in a bearing manner such that the measuring device is connected to the accelerator facility by the first radial bearing; and a drive configured to control a rotational movement of the measuring device about an axis of rotation.Type: GrantFiled: September 22, 2016Date of Patent: July 6, 2021Assignee: GSI HELMHOLTZZENTRUM FUER SCHWERIONENFORSCHUNG GMBHInventors: Chen Xiao, Michael Maier
-
Patent number: 11026647Abstract: The invention comprises a method and apparatus for imaging a tumor with X-rays while, simultaneously or alternatingly, treating or imaging the tumor with positively charged particles. An X-ray imaging system, such as one or two sets of a cone beam X-ray source coupled to an X-ray detector, is rotatable about a first axis and a patient. The X-ray imaging system is positioned off axis a path of charged particles delivered through an exit port of a nozzle system from a synchrotron and does not block a path of the positively charged particles from the exit nozzle to the patient or an imaging path from the patient to a scintillation detector. Fiducial indicators are used to confirm an unobstructed path of the positively charged particles in a treatment room comprising many movable elements, such as the X-ray imaging system and a patient positioning system/couch.Type: GrantFiled: August 22, 2019Date of Patent: June 8, 2021Inventors: James P. Bennett, W. Davis Lee
-
Patent number: 11020616Abstract: According to a first aspect, it is presented a method for determining a treatment plan comprising a distribution of spots for use with ion beam therapy for providing the spots in a target volume. The method comprises the steps of: selecting energy layers to be used in the treatment plan; determining a number of spot sizes to use; generating, for each energy layer, one copy of the energy layer for each spot size to use and populating each copy with spots of the spot size for that copy; optimizing spots of all copies of all energy layers, by repeatedly varying a weight of at least a subset of the spots and calculating an effect on a performance measurement, wherein the performance measurement is calculated by combining a plurality of evaluation criteria, comprising a first criterion related to total treatment time and a second criterion related to a desired dose distribution.Type: GrantFiled: June 26, 2018Date of Patent: June 1, 2021Assignee: RaySearch Laboratories ABInventors: Erik Engwall, Lars Glimelius, Martin Janson
-
Patent number: 10984983Abstract: A particle beam system includes first and second particle beam columns. In a first operating mode, an end cap having an opening therein is outside a beam path of a first particle beam. In a second operating mode, the beam path of the first particle beam can extend through the opening of the end cap so that secondary particles coming from a work region can pass through the opening of the end cap to a detector in the interior of the first particle beam column. While the particle beam system is in the first operating mode, an image of an object arranged in the work region is recorded using the first particle beam column. While the particle beam system is in the second operating mode, the object is processed using a second particle beam.Type: GrantFiled: December 6, 2019Date of Patent: April 20, 2021Assignee: Carl Zeiss Microscopy GmbHInventors: Björn Gamm, Marko Matijevic
-
Patent number: 10857389Abstract: A proton therapy system based on a compact superconducting cyclotron, including: a superconducting cyclotron system, an energy selection system, a beam transport system, a fixed therapy room subsystem and a rotating frame therapy subsystem; a fixed-energy proton beam extracted from a superconducting cyclotron of the superconducting cyclotron system is adjusted into a continuous and adjustable proton beam of 70 MeV to 200 MeV by the energy selection system, thus realizing a longitudinal adjustment for a proton range during treating a tumor, and the continuous and adjustable proton beam is respectively transmitted to the fixed therapy room subsystem and the rotating frame therapy subsystem by the beam transport system. The cooperative control of the superconducting cyclotron system, the energy selection system, the beam transport system and the therapy head realizes the transverse expansion of proton beams, thus realizing intensity modulated radiation therapy for the tumor.Type: GrantFiled: March 19, 2020Date of Patent: December 8, 2020Assignee: HEFEI CAS ION MEDICAL AND TECHNICAL DEVICES CO., LTDInventors: Yuntao Song, Jinxing Zheng, Qingxi Yang, Yonghua Chen, Hansheng Feng, Lu Liu, Junjun Li, Kaizhong Ding, Gen Chen, Pengyu Wang, Junsong Shen, Mingzhun Lei, Jianghua Wei
-
Patent number: 10850119Abstract: When constructing compensators for radiation therapy using ion or proton radiation beams, a computer-aided compensator editing method includes overlaying an initial 3D compensator model on an anatomical image of a target mass (e.g., a tumor) in a patient, along with radiation dose distribution information. A user manipulates pixels or voxels in the compensator model on a display, and a processor automatically adjusts the dose distribution according to the user edits. The user iteratively adjusts the compensator model until the dose distribution is optimized, at which time the optimized compensator model is stored to memory and/or output to a machining device that constructs a compensator from the optimized model.Type: GrantFiled: July 9, 2010Date of Patent: December 1, 2020Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Michael A. Meltsner, Ying Xiong, Michael Kaus
-
Patent number: 10811652Abstract: To carry out accurate defect inspection over a wide area, a defect inspection device (1) includes: a radiation source section (2) configured to emit an electromagnetic wave (4) to a separator roll (10); and a sensor section (3) configured to detect the electromagnetic wave (4) that the radiation source section (2) has emitted to the separator roll (10), the sensor section (3) being configured to detect the electromagnetic wave (4) before and after the separator roll is moved relative to the radiation source section (2).Type: GrantFiled: November 29, 2017Date of Patent: October 20, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshitaka Shinomiya, Koji Kashu, Yasuyuki Kondo
-
Patent number: 10792517Abstract: The invention comprises a method and apparatus for determining state of a positively charged particle, such as a proton, for use in imaging a tumor of a patient prior to and/or concurrent with cancer therapy. The imaging system comprises: (1) a beam transport path of the positively charged particle sequentially passing through a patient, through a first time of flight detector, and, after traversing a pathlength, at least into a second time of flight detector and (2) a beam state determination system using elapsed time between detection at the first and second time of flight detectors and the pathlength to determine a residual beam energy, which, when compared to a known incident beam energy, is used in generation of an image of the tumor. An optional beam energy degrading element increases time differences between the time of flight detectors.Type: GrantFiled: November 27, 2017Date of Patent: October 6, 2020Inventors: W. Davis Lee, Scott Penfold, Mark R. Amato, Louis P. Wainwright
-
Patent number: 10727055Abstract: A patterning method that includes providing an amorphous semiconductor surface to be patterned, and terminating the amorphous semiconductor surface by forming silicon-hydrogen (Si—H) on the surface to be patterned. A photoresist is formed on the surface to be patterned. The photoresist is then lithographically patterned using an extreme ultra violet (EUV) method. A photoresist is then developed on the surface to be patterned using negative tone development (NTD).Type: GrantFiled: February 10, 2017Date of Patent: July 28, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Nelson M. Felix, Martin Glodde, Dario L. Goldfarb