Ion Or Electron Beam Irradiation Patents (Class 250/492.3)
  • Patent number: 10279064
    Abstract: In some embodiments, a sensor assembly for continuous measurement of at least one dose control parameter of an electron beam during a substantial part of the duration of a sterilizing process of package material includes an electron beam emitter adapted to emit electron beam (e?) from an electron exit window and a sensor device that includes: a sensor surface having an electron excitable material arranged to be radiated with at least a part of said electron beam (e?), so as to excite said electron excitable material so that said electron excitable material emits luminescence and a detector arranged and adapted to detect said luminescence. The electron beam emitter is adapted to emit a continuous electron beam (e?) during a predetermined time period so as to irradiate and sterilize package material.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: May 7, 2019
    Assignee: Tetra Laval Holdings & Finance S.A.
    Inventor: Alaa Omrane
  • Patent number: 10283422
    Abstract: An ion implantation method includes measuring a beam energy of an ion beam that is generated by a high-energy multistage linear acceleration unit operating in accordance with a tentative high-frequency parameter, adjusting a value of the high-frequency parameter based on the measured beam energy, and performing ion implantation by using the ion beam generated by the high-energy multistage linear acceleration unit operating in accordance with the adjusted high-frequency parameter. The tentative high-frequency parameter provides a value different from a value of the high-frequency parameter for achieving a maximum acceleration in design to a high-frequency resonator in a part of stages including at least a most downstream stage. The adjusting includes changing at least one of a voltage amplitude and a phase set for the high-frequency resonator in the part including the at least most downstream stage.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: May 7, 2019
    Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
    Inventors: Hiroyuki Kariya, Hideki Morikawa, Masaki Ishikawa
  • Patent number: 10256073
    Abstract: In one embodiment, a charged particle beam writing method includes writing a first pattern statically in central part of a first substrate having Charge Dissipation Layer (CDL), calculating, based on a position of the written first pattern, a first correction coefficient, writing a second pattern statically applying with the first correction coefficient in central part of a second substrate having no CDL, calculating, based on a position of the written second pattern, a second correction coefficient, writing a third pattern continuously applying with the first correction coefficient in central part of a third substrate having CDL, calculating, based on a position of the written third pattern, a third correction coefficient, writing a fourth pattern statically applying with the first correction coefficient in wide range of a fourth substrate having CDL, and calculating, based on a position of the written fourth pattern, a fourth correction coefficient.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: April 9, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Hirohito Anze
  • Patent number: 10219776
    Abstract: A medical imaging system has improved positioning possibilities which facilitate the workflow during an intervention. A medical imaging apparatus (10) has an image acquisition arrangement (12), which is positionable in relation to an object (16) to acquire image data (18) of the object from different directions. An output unit (14) is arranged to provide the image data. First movement direction indicators (22) are provided to indicate possible movement directions of the image acquisition arrangement in relation to the object. A display apparatus (24), includes a display area (26) to display image data (30) of the object provided by the image acquisition arrangement and a movement direction indication (28) The movement direction indication is configured to provide second movement direction indicators (32) in relation to the displayed image data of the object to indicate possible movement directions of the image acquisition arrangement in relation to the object.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: March 5, 2019
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Peter Belei, Bart Carelsen
  • Patent number: 10222400
    Abstract: A beam current measuring device capable of performing measurement of a beam current distribution of a charged particle beam seamlessly and continuously in an arbitrary direction is provided. The beam current measuring device includes collector electrodes whose detection regions seamlessly continue in an arrangement direction thereof.
    Type: Grant
    Filed: September 21, 2016
    Date of Patent: March 5, 2019
    Assignee: NISSIN ION EQUIPMENT CO., LTD.
    Inventors: Hideyasu Une, Tetsuro Yamamoto, Yoshihiro Takigami
  • Patent number: 10168626
    Abstract: An apparatus for generating at least one particle shield. The at least one particle shield includes a first component and a second component. The first component and the second component are usable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object, the first particle shield is substantially parallel to and physically separated from the proximate surface of the object, and the first particle shield includes an energy gradient force or a velocity gradient force.
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: January 1, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chue San Yoo, Ching-Yueh Chen, Wen-Hao Cheng
  • Patent number: 10157739
    Abstract: Disclosed is a method of forming a semiconductor device using a self-assembly (DSA) patterning process. The method includes forming a patterned feature over a substrate; applying an orientation material that includes a first polymer and a second polymer over the substrate, wherein the first polymer has a first activation energy and the second polymer has a second activation energy; baking the substrate at first temperature thereby forming a first orientation layer that includes the first polymer; baking the substrate at second temperature thereby forming a second orientation layer that includes the second polymer; and performing a directed self-assembly (DSA) process over the first and the second orientation layers.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: December 18, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tsung-Han Ko, Ching-Yu Chang, Kuan-Hsin Lo
  • Patent number: 10126666
    Abstract: An apparatus for generating at least one particle shield in photolithography includes a first component and a second component. The first component and the second component are operable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object. The first component includes a first gas injector, and the second component includes a first gas extractor corresponding to the first gas injector. The first gas injector is configured to blow out a gas, thereby forming the first particle shield. The first gas extractor is configured to work with the first gas injector for providing gas pressure gradient for the first particle shield.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: November 13, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chue San Yoo, Ching-Yueh Chen, Wen-Hao Cheng
  • Patent number: 10109498
    Abstract: A method may include providing an initial mask feature in a mask disposed on a substrate, the initial mask feature comprising a first material, the substrate defining a substrate plane; directing ions as an ion beam to the initial mask feature at a non-zero angle of incidence ? with respect to a perpendicular to the substrate plane, wherein a composite mask feature is formed, the composite mask feature comprising a cap material disposed on the initial mask feature, the cap material comprising the ions; and performing a substrate etch, wherein an etch feature is formed in the substrate, wherein at least a portion of the initial mask feature remains after the substrate etch, wherein the substrate etch etches the first material at a first etch rate and etches the cap material at a second etch rate, the first etch rate being greater than the second etch rate.
    Type: Grant
    Filed: October 18, 2016
    Date of Patent: October 23, 2018
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventor: John Hautala
  • Patent number: 10109454
    Abstract: Disclosed is a method of diagnosing a conversion process for converting a format of image data including unit data corresponding to charged particle beams into a format suitable for an aperture array, the aperture array having a plurality of controllers provided to match a plurality of the charged particle beams to control the charged particle beams, and a driver configured to drive the controllers. The method includes: extracting the unit data having an identical first rank based on an arrangement of the unit data in the image data from the unit data of each block including a predetermined number of the unit data and calculating a first checksum of each of the first rank; extracting the unit data having an identical second rank after the conversion process from the unit data of each block and calculating a second checksum of each of the second rank; and comparing the first and second checksums.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: October 23, 2018
    Assignee: NuFlare Technology, Inc.
    Inventors: Kei Hasegawa, Hayato Kimura
  • Patent number: 10092776
    Abstract: The invention comprises a method and apparatus for imaging a tumor of a patient using one or more imaging systems positionable about the tumor and treating the tumor using positively charged particles, such as a process of: (1) rotating a gantry support and/or gantry, connected to at least a portion of a beam transport system configured to pass a charged particle treatment beam, circumferentially about the patient and a gantry rotation axis; (2) translating a translatable imaging system past the patient on a path parallel to an axis perpendicular to the gantry rotation axis; (3) imaging the tumor using the translatable imaging system; and (4) treating the tumor using the rotatable treatment beam.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: October 9, 2018
    Inventors: Susan L. Michaud, Daniel J. Raymond, W. Davis Lee
  • Patent number: 10053252
    Abstract: A method for sterilizing packaging material comprises an emitter that is adapted to emit charge carriers, in particular electrons, wherein the charge carriers form at least one cloud, and wherein the emitter and the packaging material are moved relative to each other so that a flow of a gaseous medium is established in between the emitter and the packaging material. The method comprises the steps of: controlling a movement profile between the emitter and the packaging material; sterilizing the flow of the medium in between the emitter and the packaging material by adjusting the movement profile so that the flow of the medium in between the emitter and the packaging material is sterilized. Also disclosed is a device for sterilizing packaging material.
    Type: Grant
    Filed: August 21, 2017
    Date of Patent: August 21, 2018
    Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Roger Lindgren, Håkan Mellbin, Jonas Dickner, Fredrik Hansen
  • Patent number: 10044181
    Abstract: Power system for supplying high voltage to an electron beam emitter, which is adapted to sterilize a packaging container or a packaging material by electron beam irradiation, the power system comprising a voltage multiplier for generating a high voltage, a first voltage measurement device for measuring an output voltage level of the voltage multiplier and providing a first measured voltage value, and an actuator for modifying the output voltage level of the voltage multiplier based on the first measured voltage value provided by the first voltage measurement device, characterized in that the power system further comprises a second voltage measurement device adapted to independently measure the output voltage level of the voltage multiplier and provide a second measured voltage value.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: August 7, 2018
    Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Dominique Corpataux, Willi Wandfluh, Robert Streit, Christoph Wünsch, Werner Haag
  • Patent number: 10034952
    Abstract: One object is to provide an electron beam sterilization apparatus for sterilizing a preform product (P) by applying an electron beam while conveying the preform product (P), the apparatus comprising: an input star wheel (21) configured to convey the preform product (P) in a circular path; and an outer-surface electron beam application device and an inner-surface electron beam application device configured to apply an electron beam to the preform product (P) being conveyed by the input star wheel (21). A blocking short tube (31) is provided on a lower surface of the star wheel plate (22) of the input star wheel (21) so as to block radioactive rays produced by application of the electron beam and surround a central axis (1v) of the input star wheel (21). The blocking short tube (31) includes a ventilation space (34) formed therein.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: July 31, 2018
    Assignee: HITACHI ZOSEN CORPORATION
    Inventors: Kazuaki Sasaki, Takayasu Yokobayashi, Shinichi Takeda
  • Patent number: 10029124
    Abstract: The invention comprises a method and apparatus for treating a tumor with protons using multiple beamline positions not having an isocenter, including the steps of: (1) delivering the protons from a synchrotron along a redirectable beam transport path to yield a plurality of incident vectors, each of the plurality of incident vectors directed toward the treatment room and (2) redirecting the protons traveling along each of the plurality of incident vectors, with an output nozzle, to the tumor, where a first vector, of the plurality of incident vectors, comprises a first direction intersecting the tumor and where a second vector, of the plurality of incident vectors, comprises a second direction passing by the tumor without entering the tumor. The step of redirecting directs the protons traveling along the first and second incident vectors, respectively, to a first and second path intersecting a front and the back of the tumor.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: July 24, 2018
    Inventors: W. Davis Lee, Jillian Reno, James P. Bennett
  • Patent number: 10028369
    Abstract: Ions are released over time from an ion source into a beam area proximate a central axis. A radiofrequency (RF) system with a variable frequency and variable voltage accelerates the ions in orbiting trajectories expanding outward from the central axis. The ions are accelerated to different extraction energy levels within a given design range at a shared extraction radius from the central axis. An RF-frequency versus ion-time-of-flight scenario is set such that the frequency versus time scenario is the same for any ion extraction energy from the given design range, and a constant-or-variable-RF-voltage versus ion-time-of-flight scenario is adjusted to provide ion acceleration from injection to extraction for ions with different respective extraction energy levels within the given design range; and the ions are extracted at the different energy levels at the shared extraction radius.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: July 17, 2018
    Assignee: Massachusetts Institute of Technology
    Inventor: Alexey Radovinsky
  • Patent number: 10020163
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: July 10, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Patent number: 10008361
    Abstract: Provided is a charged particle beam device that is small, high performance, and easy to transport. A charged particle beam device (100) is provided with a detachable body unit (15) and an auxiliary unit (14), the body unit (15) housing a functional unit related to charged particle beams, and the auxiliary unit (14) housing a power source unit (9).
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: June 26, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shuhei Yabu, Naoto Koga, Mitsuo Akatsu, Isao Takahira, Shinichi Tomita, Hiroyuki Noda, Ai Masuda
  • Patent number: 9978554
    Abstract: An ion source having dual indirectly heated cathodes is disclosed. Each of the cathodes may be independently biased relative to its respective filament so as to vary the profile of the beam current that is extracted from the ion source. In certain embodiments, the ion source is used in conjunction with an ion implanter. The ion implanter comprises a beam profiler to measure the current of the ribbon ion beam as a function of beam position. A controller uses this information to independently control the bias voltages of the two indirectly heated cathodes so as to vary the uniformity of the ribbon ion beam. In certain embodiments, the current passing through each filament may also be independently controlled by the controller.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: May 22, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Jun Lu, Frank Sinclair, Eric D. Hermanson, Joseph E. Pierro, Michael D. Johnson, Michael S. DeLucia, Antonella Cucchetti
  • Patent number: 9952338
    Abstract: An x-ray detector is disclosed, for a computed tomography system. In an embodiment, the x-ray detector includes a base plate and a number of detector modules, each including at least one detector field with a detector surface facing counter to an r-direction on a front face and each including a module support, fastened to the base plate. In at least one embodiment, the module support includes a bearing surface facing the base plate, perpendicular to the detector surface, for fastening purposes.
    Type: Grant
    Filed: March 24, 2015
    Date of Patent: April 24, 2018
    Assignee: SIEMENS AKTIENGESELLSCHAFT
    Inventor: Claus Pohan
  • Patent number: 9927805
    Abstract: Disclosed are a method and an apparatus for manufacturing a radiation intensity bolus.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: March 27, 2018
    Assignee: Samsung Life Public Welfare Foundation
    Inventor: Sang Gyu Ju
  • Patent number: 9910166
    Abstract: The invention comprises a system for redundantly determining the state of a charged particle beam, such as beam position, direction, energy, and/or intensity. For example, the charged particle beam state is determined: (1) in an extraction system from a synchrotron, (2) in a charged particle beam transport path, and/or (3) at or about a patient undergoing charged particle cancer therapy using one or more film layers designed to emit photons upon passage of a charged particle beam, which yields information on position and/or intensity of the charged particle beam. The emitted photons are used to calculate position, direction, and/or intensity of the treatment beam in imaging and/or during tumor treatment.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: March 6, 2018
    Inventors: Stephen L. Spotts, W. Davis Lee, James P. Bennett
  • Patent number: 9899112
    Abstract: A structure configuring a ridge filter has line symmetry about a line vertical to a depth direction passing the center of the structure. A small structure obtained in such a way that the structure is divided by this line has a bilaterally asymmetric shape about a center line in an iterative direction, and has a point symmetric shape about an intersection between the center line in the iterative direction and the center line in the depth direction. Thicknesses in the iterative direction of an uppermost stream surface and a lowermost stream surface in the depth direction are equal to each other. The structure is configured so that a thick portion in the iterative direction of the uppermost stream surface and the lowermost stream surface is not present in the depth direction.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: February 20, 2018
    Assignees: Hitachi, Ltd., National University Corporation Hokkaido University
    Inventors: Taisuke Takayanagi, Shinichiro Fujitaka, Chihiro Nakashima, Tomoki Murata, Taeko Matsuura, Naoki Miyamoto, Kikuo Umegaki, Yuichi Hirata
  • Patent number: 9899187
    Abstract: A charged particle beam writing apparatus includes a processing circuitry configured to calculate a third proximity effect correction irradiation coefficient where at least one correction irradiation coefficient term up to k-th order term, in correction irradiation coefficient terms of from a first order term to a n-th order term for a first proximity effect correction irradiation coefficient which does not take account of a predetermined effect, are replaced by at least one correction irradiation coefficient term up to the k-th order term, for a second proximity effect correction irradiation coefficient which takes account of the predetermined effect; and a processing circuitry configured to calculate a dose by using the third proximity effect correction irradiation coefficient.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: February 20, 2018
    Assignee: NuFlare Technology, Inc.
    Inventors: Yasuo Kato, Masafumi Ise, Ryoh Kawana
  • Patent number: 9899183
    Abstract: Various embodiments include measurement structures and methods for measuring integrated circuit (IC) images. In some cases, a measurement structure for use in measuring an image of an IC, includes: a first section having a positive shift spacing pattern; a second section, on an opposite side of the measurement structure, having a negative shift spacing pattern; and a third section having a reference spacing pattern for calibrating a measurement from at least one of the first section or the second section.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: February 20, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Lei Zhuang, Timothy A. Brunner
  • Patent number: 9892914
    Abstract: Disclosed is a method of forming a semiconductor device using a self-assembly (DSA) patterning process. The method includes forming a patterned feature over a substrate; applying an orientation material that includes a first polymer and a second polymer over the substrate, wherein the first polymer has a first activation energy and the second polymer has a second activation energy; baking the substrate at first temperature thereby forming a first orientation layer that includes the first polymer; baking the substrate at second temperature thereby forming a second orientation layer that includes the second polymer; and performing a directed self-assembly (DSA) process over the first and the second orientation layers.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: February 13, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Tsung-Han Ko, Ching-Yu Chang, Kuan-Hsin Lo
  • Patent number: 9894271
    Abstract: A pattern inspection apparatus according to an embodiment includes an image capture and an output part. The image capture captures an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern. The output part outputs position information of the first or second pattern corresponding to divergent portions between a reference data generated from design data of the first pattern and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged.
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: February 13, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Ryoji Yoshikawa, Tatsuhiko Higashiki, Seiji Morita, Takashi Hirano
  • Patent number: 9854661
    Abstract: A method of operating an acceleration system comprises injecting charged particles into an RF accelerator, providing RF power to the accelerator, and accelerating the injected charged particles. The accelerated charged particles may impact a target to generate radiation. The RF power is based, at least in part, on past performance of the system, to compensate, at least partially, for dose and/or energy instability. A controller may provide a compensated control voltage (“CCV”) to an electric power source based on the past performance, to provide compensated electric power to the RF source. A decreasing CCV, such as an exponentially decreasing CCV, may be provided to the electric power source during beam on time periods. The CCV to be provided may be increased, such as exponentially increased toward a maximum value, during beam off time periods. The controller may be configured by a compensation circuit and/or software. Systems are also described.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: December 26, 2017
    Assignee: VAREX IMAGING CORPORATION
    Inventors: Gongyin Chen, Kenneth Todd Romriell, David Alan Howell
  • Patent number: 9839794
    Abstract: For the purpose of providing a particle beam therapy apparatus which is unnecessary to be separately verified for operational integrity of its dose monitors and is unnecessary to have an additional failure diagnosis function, a particle beam therapy apparatus is so configured that, by a dose-monitoring system controller, the main and sub roles of two dose monitors are switched therebetween at every radiation and their corresponding dose monitor circuits are controlled accordingly, so that operation checking of the two dose monitors can be performed during a therapeutic flow, without the need of a special operation.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: December 12, 2017
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventor: Masayuki Kato
  • Patent number: 9833638
    Abstract: New techniques for controlling electromagnetic and other forms of radiation are provided. In some aspects of the invention, multiple sources of radiation with characteristics that are projected to constructively interfere at a target are provided. In other aspects, spatially-encoded source signals create a decrypted resulting beam at a planned, target location. In still other aspects, a variable shield which is also a lens is inserted between a radiation target and collateral material.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: December 5, 2017
    Inventor: Christopher V. Beckman
  • Patent number: 9805763
    Abstract: The present disclosure provides systems and methods associated with data storage using atomic films, such as graphene, boron nitride, or silicene. A platter assembly may include at least one platter that has one or more substantially planar surfaces. One or more layers of a monolayer atomic film, such as graphene, may be positioned on a planar surface. Data may be stored on the atomic film using one or more vacancies, dopants, defects, and/or functionalized groups (presence or lack thereof) to represent one of a plurality of states in a multi-state data representation model, such as a binary, a ternary, or another base N data storage model. A read module may detect the vacancies, dopants, and/or functionalized groups (or a topographical feature resulting therefrom) to read the data stored on the atomic film.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: October 31, 2017
    Assignee: ELWHA LLC
    Inventors: Hon Wah Chin, Howard Lee Davidson, Roderick A. Hyde, Jordin T. Kare, Nicholas F. Pasch, Robert C. Petroski, David B. Tuckerman, Lowell L. Wood, Jr.
  • Patent number: 9789461
    Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels, foods or materials. For example, systems and methods are described that can be used to treat feedstock materials, such as cellulosic and/or lignocellulosic materials, while cooling equipment and the biomass to prevent overheating and possible distortion and/or degradation. The biomass is conveyed by a conveyor, which conveys the biomass under an electron beam from an electron beam accelerator. The conveyor can be cooled with cooling fluid. The conveyor can also vibrate to facilitate exposure to the electron beam. The conveyor can be configured as a trough that can be optionally cooled.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: October 17, 2017
    Assignee: XYLECO, INC.
    Inventors: Marshall Medoff, Thomas Craig Masterman, Robert Paradis
  • Patent number: 9758268
    Abstract: The invention relates to a method for sterilizing packaging material, comprising an emitter that is adapted to emit charge carriers, in particular electrons, wherein the charge carriers form at least one cloud, and wherein the emitter and the packaging material are moved relative to each other so that a flow of a gaseous medium is established in between the emitter and the packaging material. The method comprises the steps of: controlling a movement profile between the emitter and the packaging material; sterilizing the flow of the medium in between the emitter and the packaging material by adjusting the movement profile so that the flow of the medium in between the emitter and the packaging material is sterilized. Also disclosed is a device for sterilizing packaging material.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: September 12, 2017
    Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Roger Lindgren, Hakan Mellbin, Jonas Dickner, Fredrik Hansen
  • Patent number: 9750957
    Abstract: A charged particle irradiation system is capable of shortening the irradiation time and the treatment time by performing efficient irradiation even when irregular variation occurs in the irradiation object during the gating irradiation. The extraction of the beam is stopped upon reception of a regular extraction permission end signal which is outputted based on a regular movement signal. An extractable state maintaining function operates upon the reception of the extraction permission end signal. When a preset standby time elapses without receiving an extraction permission start signal again during the standby time, the extractable state maintaining function finishes its operation and a charged particle beam generator decelerates the beam. Also, the extraction of the beam is stopped due to reception of an irregular extraction permission end signal during the irradiation. When the extraction permission start signal is received again during the standby time, the extraction of the beam is restarted.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: September 5, 2017
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Fujii, Toru Umekawa, Masumi Umezawa, Hiroki Shirato, Kikuo Umegaki, Naoki Miyamoto, Taeko Matsuura
  • Patent number: 9735000
    Abstract: A miniature, low cost mass spectrometer capable of unit resolution over a mass range of 10 to 50 AMU. The mass spectrometer incorporates several features that enhance the performance of the design over comparable instruments. An efficient ion source enables relatively low power consumption without sacrificing measurement resolution. Variable geometry mechanical filters allow for variable resolution. An onboard ion pump removes the need for an external pumping source. A magnet and magnetic yoke produce magnetic field regions with different flux densities to run the ion pump and a magnetic sector mass analyzer. An onboard digital controller and power conversion circuit inside the vacuum chamber allows a large degree of flexibility over the operation of the mass spectrometer while eliminating the need for high-voltage electrical feedthroughs. The miniature mass spectrometer senses fractions of a percentage of inlet gas and returns mass spectra data to a computer.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: August 15, 2017
    Assignee: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Ian W. Hunter, Brian Hemond, Harold F. Hemond
  • Patent number: 9724903
    Abstract: The present invention discloses a heat radiator, especially an infrared radiator, having at least one radiation source by means of which supplied electrical energy is convertible into heat radiation, as well as a control. This control comprises at least one frequency converter having a first, a second and a third output so that between the first and the third output a first alternating current is providable and between the second and the third output a second alternating current is providable by means of which the at least one radiation source is operable.
    Type: Grant
    Filed: August 12, 2014
    Date of Patent: August 8, 2017
    Assignee: BRANSON ULTRASCHALL Niederlassung der Emerson Technologies GmbH & Co. OHG
    Inventors: Heiko Priem, Thomas Köhler
  • Patent number: 9722129
    Abstract: A method of processing a solar cell is disclosed, where a chained patterned ion implant is performed to create a workpiece having a lightly doped surface having more heavily doped regions. This configuration may be used in various embodiments, such as for selective emitter solar cells. Additionally, various mask sets that can be used to create this desired pattern are also disclosed. The mask set may include one or more masks that have an open portion and a patterned portion, where the union of the open portions of the masks comprises the entirety of the surface to be implanted. The patterned portions of the masks combine to create the desired pattern of heavily doped regions.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: August 1, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Nicholas P T Bateman, Benjamin Riordan, William T. Weaver
  • Patent number: 9711328
    Abstract: An ion implantation system measurement system has a scan arm that rotates about an axis and a workpiece support to translate a workpiece through the ion beam. A first measurement component downstream of the scan arm provides a first signal from the ion beam. A second measurement component with a mask is coupled to the scan arm to provide a second signal from the ion beam with the rotation of the scan arm. The mask permits varying amounts of the ion radiation from the ion beam to enter a Faraday cup based on an angular orientation between the mask and the ion beam. A blocking plate selectively blocks the ion beam to the first faraday based on the rotation of the scan arm. A controller determines an angle and vertical size of the ion beam based on the first signal, second signal, and orientation between the mask and ion beam as the second measurement component rotates.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: July 18, 2017
    Assignee: Axcelis Technologies, Inc.
    Inventor: Shu Satoh
  • Patent number: 9709770
    Abstract: A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: July 18, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew, Walter Pauls
  • Patent number: 9711253
    Abstract: A radiotherapy system is disclosed. The radiotherapy system comprises an electron beam generator for generating an electron beam and a magnetic field generator for generating a magnetic field. In some embodiments of the present invention, the system further comprises a controller for controlling the electron beam and the magnetic field generators such that the electron beam is dynamically shifted and the magnetic field is dynamically redirected synchronously with the shifting.
    Type: Grant
    Filed: November 28, 2011
    Date of Patent: July 18, 2017
    Assignees: Tel HaShomer Medical Research Infrastructure and Services Ltd., Ben-Gurion University of the Negev Research and Development Authority
    Inventors: Dror Alezra, Eran Nardi, Sion Koren, Itzhak Orion
  • Patent number: 9699882
    Abstract: A linear proton accelerator includes a plurality of accelerator components arranged after one another, and a proton source and a plurality of accelerating units. The accelerator further includes a reticular support structure for supporting the accelerator components. The support structure is shaped as a prism with a polygonal cross-section, and has a plurality of side faces joining opposite ends of the prism. The support structure is arranged concentrically with respect to the accelerator components.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: July 4, 2017
    Assignee: ADAM S.A.
    Inventors: Donatella Ungaro, Jacopo Nardulli
  • Patent number: 9682254
    Abstract: The invention comprises a charged particle cancer therapy system used to seal a periphery of a tumor, such as through use of a proton or carbon ion beam searing the outer edges of the tumor, which prevents/hinders nutrient delivery to the tumor resultant in stunted growth of the tumor, halted growth of the tumor, and/or starvation/necrosis of the tumor. Optionally, a tumor sealing layer is formed using multiple passes, of a treatment beam of the charged particle cancer therapy system, across a tumor/healthy tissue boundary layer or voxel.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: June 20, 2017
    Inventors: Vladimir Balakin, Pavel Balakin
  • Patent number: 9675718
    Abstract: The present invention relates to an irradiation device for irradiating objects with electron beams. The irradiation device comprises at least one electron beam emitter having an electron exit window and at least one sensor device for detecting a first dose control parameter of the electron beam. The electron beam emitter is adapted to move past the sensor device such that the electron beam emitted from the electron exit window passes within a sensing area of the sensor device. The sensor device comprises more than one conductor each having a conductor surface in the sensing area of the sensor device, and the conductor surface is adapted to be exposed to electrons of the electron beam. The invention also relates to a method.
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: June 13, 2017
    Assignee: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Lars-Ake Naslund, Kristoffer Bengtsson, Hakan Mellbin, Hans Hallstadius, Fredrik Hansen, Marco Lavalle
  • Patent number: 9681531
    Abstract: An example particle therapy system includes a particle accelerator to output a particle beam, where the particle accelerator includes: a particle source to provide pulses of ionized plasma to a cavity, where each pulse of the particle source has a pulse width corresponding to a duration of operation of the particle source to produce the corresponding pulse, and where the particle beam is based on the pulses of ionized plasma; and a modulator wheel having different thicknesses, where each thickness extends across a different circumferential length of the modulator wheel, and where the modulator wheel is arranged to receive a precursor to the particle beam and is configured to create a spread-out Bragg peak for the particle beam.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: June 13, 2017
    Assignee: Mevion Medical Systems, Inc.
    Inventors: Kenneth P. Gall, Stanley Rosenthal, Thomas C. Sobczynski, Adam C. Molzahn
  • Patent number: 9679748
    Abstract: A multi charged particle beam writing apparatus includes a dividing circuitry to divide first irradiation time data into k pieces of second irradiation time data, where each of the k pieces of second irradiation time data has a different number of bits and the total of different numbers of bits is n-bits, in multi-pass writing of k or more passes by using multi charged particle beams, a data transmission circuitry to transmit, for each of k passes, corresponding second irradiation time data, for a beam concerned in multi charged particle beams, a resolution information transmission circuitry to transmit, for each of k passes, corresponding resolution information, and an irradiation time calculation circuitry to calculate an irradiation time of a corresponding beam in the multi charged particle beams of a pass concerned by using input second irradiation time data and resolution information.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: June 13, 2017
    Assignee: NuFlare Technology, Inc.
    Inventor: Hideo Inoue
  • Patent number: 9673111
    Abstract: Methods for extreme ultraviolet (EUV) mask defect mitigation by using multi-patterning lithography techniques. In one exemplary embodiment, a method for fabricating an integrated circuit including identifying a position of a defect in a first EUV photolithographic mask, the photolithographic mask including a desired pattern and transferring the desired pattern to a photoresist material disposed on a semiconductor substrate. Transferring the desired pattern further transfers an error pattern feature to the photoresist material as a result of the defect in the first EUV photolithographic mask. The method further includes, using a second photolithographic mask, transferring a trim pattern to the photoresist material, wherein the trim pattern removes the error pattern feature from the photoresist material.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: June 6, 2017
    Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
    Inventors: Gek Soon Chua, Tan Soon Yoeng
  • Patent number: 9661736
    Abstract: An example particle therapy system includes: a particle accelerator to output a beam of charged particles; and a scanning system to scan the beam across at least part of an irradiation target. An example scanning system includes: a scanning magnet to move the beam during scanning; and a control system (i) to control the scanning magnet to produce uninterrupted movement of the beam over at least part of a depth-wise layer of the irradiation target so as to deliver doses of charged particles to the irradiation target; and (ii) to determine, in synchronism with delivery of a dose, information identifying the dose actually delivered at different positions along the depth-wise layer.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: May 23, 2017
    Assignee: Mevion Medical Systems, Inc.
    Inventors: Charles D. O'Neal, III, Adam C. Molzahn
  • Patent number: 9644244
    Abstract: Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful intermediates and products, such as energy, fuels, foods or materials. For example, systems and methods are described that can be used to treat feedstock materials, such as cellulosic and/or lignocellulosic materials, while cooling equipment and the biomass to prevent overheating and possible distortion and/or degradation. The biomass is conveyed by a conveyor, which conveys the biomass under an electron beam from an electron beam accelerator. The conveyor can be cooled with cooling fluid. The conveyor can also vibrate to facilitate exposure to the electron beam. The conveyor can be configured as a trough that can be optionally cooled.
    Type: Grant
    Filed: August 19, 2016
    Date of Patent: May 9, 2017
    Assignee: XYLECO, INC.
    Inventors: Marshall Medoff, Thomas Craig Masterman, Robert Paradis
  • Patent number: 9589763
    Abstract: The present disclosure provides a method for detecting signal charged particles in a charged particle beam device. The method includes emitting a primary charged particle beam, illuminating a specimen with the primary charged particle beam, wherein the primary charged particle beam has a landing energy on the specimen of less than 40 keV, wherein signal charged particles with a first energy spectrum are generated, energy filtering the signal charged particles such that signal charged particles in an energy range from an energy of 85% of the landing energy to 100% propagate for subsequent detection, and detecting the signal charged particles within the energy range using at least one detector.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: March 7, 2017
    Assignee: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH
    Inventor: Jürgen Frosien
  • Patent number: 9572997
    Abstract: A method of compensating for breathing and other motions of a patient during treatment includes periodically generating internal positional data about an internal target region. The method further includes generating external positional data about external motion of the patient's body using an external sensor and generating a correlation between one or more positions of the internal target region and one or more positions of an external region using the external positional data of the external sensor and the internal positional data of the internal target region. The method further includes predicting the position of the internal target region at some later time based on the correlation model.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: February 21, 2017
    Assignee: Accuray Incorporated
    Inventors: John R. Adler, Achim Schweikard