Abstract: The effectiveness of a method for checking for exact alignment of two successive shafts, axles or the like is improved by the fact the no measures with respect to linearization or temperature compensation are necessary any longer by using a light-sensitive array as the light-sensitive sensor. The effects of outside light and reflections can be suppressed. The cross section and the quality of a detected laser beam can be checked especially by visual inspection. Production of the corresponding device for executing this process is facilitated. By using matched beam splitters and reflectors as well as light sources of different colors the number of optoelectronic sensors necessary can be significantly reduced.

Abstract: The present invention provides an apparatus and a method for accurately positioning tools for use in manufacturing or inspection operations whilst reducing the need for costly tooling such as jigs. The method for accurately positioning tools comprises at least the steps of projecting an image onto a surface, detecting the projected image, processing the projected image, calculating at least two dimensional co-ordinates of the projected image relative to a tool, and moving the tool so that it is positioned in a pre-defined spacial relationship with respect to the projected image.

Abstract: A tilt detecting device for detecting tilt by a reflection light from a free liquid surface, comprising a photodetection element, a liquid member for forming the free liquid surface, a fixed reflection member fixed on a structural member, a free liquid surface light projecting system for projecting a light toward the liquid member, a fixed reflection member light projecting system for projecting a light toward the fixed reflection member, a photodetection optical system for guiding the reflection light from the free liquid surface of the liquid member and a reflection light from the fixed reflection member toward the photodetection element, and an arithmetic processing unit for calculating deviation based on two reflection images received by the photodetection element.

Abstract: An angle measuring system for measuring the angular position of two objects which are rotatable around an axis in relation to each other and includes a support with a graduation, wherein the support can be connected on a first object. A scanning device which can be fastened on a second object. A clamping element which fixes at least the axial positional relationship between the graduation and the scanning device before and during their mounting on the first and second objects, wherein the clamping element and/or the support are deformed by being radially pressed together in a clamping area, and this deformation causes at least an axially acting interlocking connection between the scanning device and the support.

Abstract: Disclosed is a multi-functioned wafer aligner comprising a multi-functioned unit performing a wafer centering operation, a wafer flat zone alignment, and a wafer damage detection, and a main processor deciding positions of the wafer centering operation and the wafer flat zone alignment, and discriminating wafer damage, such as wafer breakage and wafer crack, by calculating an accumulated digital signal inputted from the multi-functioned unit.

Abstract: Apparatus for analyzing fluid supplied to it through a tube, comprising an analyzing instrument within an enclosure, a first connector attached to the tube and having an end face, a second connector, mating with the first connector and attached to the enclosure, a pair of optical fibers disposed inside the enclosure, a first end of each of the fibers is mounted in the second connector, there is a clear optical path between the end face of each of the first ends of the fibers and at least one common point on the end face. A light source is optically coupled to the second end of a first one of the pair of fibers, and a light detector optically coupled to the second end of the second one of the pair of fibers.

Abstract: A method of positioning a semiconductor wafer includes the steps of fixing a semiconductor wafer on a wafer stage, the semiconductor wafer including a plurality of shot areas regularly arranged thereon, and positioning each of the shot areas in turn to an exposure position by a step and repeat system, wherein a step pitch to move each of the shot areas to the exposure position is adjusted by a magnitude of warpage of the semiconductor wafer.

Abstract: In an exposure apparatus for projecting illumination light irradiating a reticle on a wafer via an optical system, a mark magnification variation &Dgr;&bgr;M is calculated from the displacement amounts of a plurality of position measurement marks used for reticle alignment. From the mark magnification variation &Dgr;&bgr;M, a shot magnification &Dgr;&bgr;S is estimated using an estimation equation having an aspect ratio A and area ratio S of the exposure region as parameters: &Dgr;&bgr;S=c·Ap·Sq·&Dgr;&bgr;M (where c, p, q are coefficients). The shot magnification is corrected based on the estimation result using the magnification correction function of a projection lens.

Abstract: Alignment-mark patterns are disclosed that are defined on stencil reticles and that can be transferred lithographically from the reticle to a sensitized substrate using charged-particle-beam microlithography. The corresponding alignment marks as transferred to the substrate are detectable at high accuracy using an optical-based alignment-detection device (e.g., an FIA-based device). The transferred alignment marks can be used in place of alignment marks used in optical microlithography systems. An alignment-mark pattern as defined on a stencil reticle includes pattern elements that are split in any of various ways into respective pattern-element portions separated from each other on the membrane of the stencil reticle by “girders” (band-like membrane portions) that prevent the formation of islands in the stencil reticle and that prevent deformation of the pattern elements on the stencil reticle.

Abstract: An angle compensation method compensates for the angle of the light-receiving surface of a photodiode disposed in an inclination detection device. The light-receiving surface is divided into four parts by an a-axis and a b-axis disposed perpendicular to each other and receives light reflected from an object surface that is an X-Y plane. The inclination detection device seeks the inclination of the object surface from changes in the irradiation position of the light reflected onto the photodiode light-receiving surface.

Abstract: A method and apparatus reduces undesirable glints in an optical position alignment sensor designed to orient components. Collimated light is provided onto the component. A filter is positioned behind the components and is used to block glint generated by the components. The filter is tunable by rotating it about an axis in the plane of the component.

Abstract: A test device for horizontal position of an optical disc drive, comprising a test platform having a plurality of vertical position rods mounted thereon and the rods being of similar horizontal height; and at least a sensor mounted within the area formed by the position rods located on the platform, and including at least an emitting element and a receiving element, the emitting element emitting an optical detection signal (i.e., incident wave) to an optical disc connectedly driven by the motor rotating shaft of a pick-up mechanism to be tested, by means of a reflected optical signal produced by the optical disc, the receiving element receives the signal, and the sensor produces a horizontal height measuring data, and thereby the results and the measured horizontal height data determine whether the motor horizontal position of the optical disc drive pick-up device is parallel to the horizontal axial direction of the optical disc drive pick-up device.

Abstract: An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate.

Abstract: A laser transmitter is provided including a specialized compensator assembly damping mechanism. In accordance with one embodiment of the present invention, a compensator assembly position detector is arranged to detect a position X1 of the compensator assembly with respect to the X-axis, and a position Y1 of the compensator assembly with respect to the Y-axis. The compensator assembly damping mechanism includes an X-axis magnetic damping mechanism, a Y-axis magnetic damping mechanism, and a rotational damping mechanism. The active feedback circuit is arranged to (i) drive the X-axis magnetic damping mechanism so as to increase a damping force generated by the X-axis magnetic damping mechanism as a rate of change of the signal indicative of the position x1 increases, and (ii) drive the Y-axis magnetic damping mechanism so as to increase a damping force generated by the Y-axis magnetic damping mechanism as a rate of change of the signal indicative of the position y1 increases.

Abstract: A portable gravity-based self-levelling device for projecting a laser ray or a flat beam of laser rays (L, L11, L12, L110, L120) in a horizontal and/or vertical direction even if the device lies in an inclined position, comprises: a case (C) in the form of a hollow housing (1); a pendulum (11) suspended inside the case (C) by suspension means (5, 9); means (23A, 23B, 24) for damping the pendulum swing; means (18, 19) for adjusting the equilibrium position of the pendulum (11); and, mounted on the pendulum (11), means (12) for projecting collimated visible laser rays. The suspension means comprise at least one first mechanical decoupling member such as a ball or roller bearing (5), associated with the hollow housing (1), and, lying in a plane perpendicular to that of the first member (5), a second mechanical decoupling member rigidly secured to the movable part (6) of said first member and supporting the pendulum (11).

Abstract: The invention is directed to an apparatus for detecting and ejecting fallen containers on a conveyor line. The detecting apparatus includes at least three sensors arranged beside the conveyor system. Two of the sensors are positioned to detect the top of a container and a third sensor is positioned to detect the bottom of the container. When a container is judged to be fallen on the conveyor line, a control system sends a signal to an ejector apparatus to remove the fallen container from the conveyor line.

Abstract: A method of determining overlay accuracy, using visual inspection, of a first circuit pattern relative to a second circuit pattern. The first circuit pattern and the second circuit pattern are too large to be contained in a single reticle and are formed separately on an integrated circuit wafer and photo stitched together. A first overlay pattern is located adjacent to the first circuit pattern on a mask. A second overlay pattern is located adjacent to the second circuit pattern on a mask, preferably, but not necessarily, the same mask. The first overlay pattern and the second overlay pattern are located so that their images in the layer of developed photoresist will be adjacent to each other after the photoresist is exposed with the first and second circuit patterns and developed. Visual observation of the images of the first and second overlay patterns is then used to determine the overlay accuracy of the first circuit pattern relative to the second circuit pattern.

Abstract: To provide a package structure for securing a satisfactory optical coupling between an optical device arranged beforehand on a printed board and an optical device newly mounted on the particular printed board. Positioning LDs 41a and 41b are arranged on a printed board 1. A sensing PD 42a for receiving the optical signal emitted from the positioning LD 41a and a sensing PD 42b for receiving the optical signal emitted from the positioning LD 41b are arranged in an OEIC package 11 mounted on the printed board.

Abstract: A frame layout and method for determining the overlay accuracy of a first chip image relative to a second chip image when the first and second chip images are used to form a single chip. One embodiment employs a vernier scale in two orthoginal directions included in the scribeline of both the first chip image and the second chip image. Another embodiment employs a box in box pattern included in the scribeline of both the first chip image and the second chip image. A layer of photoresist on an integrated circuit wafer is exposed with the first and second chip image and the associated monitor images. When the photoresist is developed the overlay accuracy of the first chip image relative to the second chip image can be determined directly from the monitor images in the photoresist.

Abstract: A four sensor wheel aligner has a single omnidirectional angle sensor mounted on each of four vehicle support wheels. Each sensor is in optical communication with the other sensors. Data is produced from which toe, camber, caster and steering axis inclination angles are computed. No reference is made to vertical. Redundant data sets are produced which provide system reliability and error tracking features and maximum accuracy from available data sets. Frame distortion measurements are made to facilitate collision repair in coordination with wheel alignment.

Abstract: The present invention relates to a detecting apparatus capable of detecting the position of a surface to be examined at higher accuracy and speed. Particularly, the detecting apparatus of the present invention allows a slit image, which is tilted relative to a base pattern on the surface of a substrate, to be applied to the surface of the substrate and its reflection on the surface to be re-imaged and recorded as a two-dimensional image on an image pick-up device. In particular, a row of imaging elements of the image pick-up device aligned in one dimension are arranged with its direction extending at an angle to the lengthwise direction of the two-dimensional image of the slit pattern reflection. Also, the two-dimensional image of the slit pattern reflection is defocused along the lengthwise direction by the action of a specific optics thus to average data of the optical characteristics on the surface of the substrate.

Abstract: There is provided an image reading method comprising the steps of reading an original image photoelectrically under a plurality of reading conditions different in light quantity; obtaining image characteristic values of the original image for the individual reading conditions from image signals read under the individual reading conditions; and absorbing differences in signal level of the image signals under the individual reading conditions using the image characteristic values obtained under the individual reading conditions to thereby align the signal level of the image signals under the individual reading conditions.

Abstract: A semiconductor fabrication process permits for narrowing linewidths using Optical End of Line Metrology (OELM). OELM involves measuring relative line shortening effects that are inherent in many semiconductor fabrication processes using optical overlay instruments. According to one embodiment, the process involves a frame that has two adjacent sides which are constructed of lines and spaces. The frame is imaged onto a wafer, but the optical line measurements used to implement the frame over-predict actual shortening of the lines.

Abstract: Independent of any of several ways used to control exposure for the optical sensor in an optical navigation device, changes in average level of illumination are taken as indicative of changes in exposure. An acceptable exposure level for an optical navigation system is maintained by first establishing an initial operating level of exposure and subsequently adjusting it in proportion to changes in average illumination so long as image contrast remains acceptable. Associated with the initial operating level of exposure is an average level of illumination, which is then noted, and about which is presumed to exist a range of satisfactory operating levels for exposure. The system proceeds to navigate from the current reference frame using this level of exposure. When a new reference frame is established the average level of illumination and the image contrast are checked.

Abstract: In order to locate a package (110) which houses active elements including an opto-electric type transducer (100), in a position which assures that the opto-electric sensor and other active elements will be located in proper operative positions when the package is installed in predetermined piece of apparatus, the package casing (102) is provided with location features (112) at least some of which are deformable. During optimization, the package is moved with respect to a target until such time as the sensor is detected as producing an optimal output. Selected location features are then deformed to form location faces (112a) which have a predetermined spatial relationship with the active elements and which ensure that the active elements will be supported in an optimally operative position when the package is operatively disposed in a device such as an optical scanner or the like.

Abstract: A method and apparatus reduces two types of undesirable glints in an optical position alignment sensor designed to orient at least two components. In one aspect, a method includes using an aperture and a positive optic to block large angle glint generated by the components. In another aspect, a detector is positioned behind the image plane of the components to reduce the effect of small angle glint.

Abstract: An image registration (alignment) system which achieves alignment by determining an optimal focus for a composite image produced from the combination of misregistered images. The system also uses optimal or nearly optimal linear filters for filtering the combined image to emphasize (enhance) alignment information in the combined image and to de-emphasize (damp) noise. One set of the nearly optimal linear filters are modified second order difference filters in which the number of internal zeros are modified to tune the filter to the particular equipment.

Abstract: A laser apparatus and method for aligning a horizontal metal extrusion press. The apparatus comprises a scanning laser and scanning laser target, one or more spindle lasers and spindle laser targets, a data acquisition station and adapters for mounting the lasers and targets. The method comprises the steps of leveling and aligning the components of the horizontal extrusion press in parallel, square and aligned relationship with respect to each other. Alignments are preferably performed with the extrusion press at its operating temperature. The selections as to which press members are used for locating the lasers and targets are necessary requirements for proper alignment of the press members.

Abstract: The present invention is generally directed to a system for taking displacement measurements of an object. The invention is realized by various embodiments. In one embodiment, the invention utilizes the Moiré effect to take precise displacement measurements of an object. In this regard, a visible pattern is disposed on an object, and a plurality of photosensors are uniformly spaced apart from the visible pattern. Importantly, the spacing between the photosensors is slightly different than the spacing of lines forming a projection or image of the visible pattern. This allows the invention to utilize the Moiré effect to accurately compute precise displacements or movements of the object. In this respect, electrical signal generated by the photosensor array will embody a repeating envelope pattern resulting from the difference in the pitch of the photosensors and the pitch of the projection or image of the visible pattern.

Abstract: In a method of detecting a position of a position detection grating mark formed with a small step structure on a surface of a flat object, an illumination light beam is irradiated on the grating mark at a predetermined incident angle. The illumination light beam includes a plurality of coherent beams having n (n≧3) different wavelengths &lgr;1, &lgr;2, &lgr;3, . . . , &lgr;n. The n wavelengths are set to approximately satisfy the following relation within a range of about ±10%: (1/&lgr;1−1/&lgr;2)=(1/&lgr;2−1/&lgr;3)= . . . =(1/&lgr;n−1−1/&lgr;n) where the wavelengths have a condition &lgr;1<&lgr;2<&lgr;3 . . . <&lgr;n. Photoelectric detection of a change in light amount of a diffracted light component generated from the grating mark in a specific direction is performed upon irradiation of the illumination light beam having the n wavelength components.

Abstract: A lithographic projection apparatus comprising: a radiation system (7) for supplying a projection beam (25) of radiation; a mask table (5) provided with a mask holder (27) for holding a mask (29); a substrate table (1) provided with a substrate holder (17) for holding a substrate (19); a projection system (3) for imaging an irradiated portion of the mask (29) onto a target portion (35) of the substrate (19), the substrate holder (17) comprising a plate (2) having a face (4) which is provided with a matrix arrangement of protrusions (6), each protrusion (6) having an extremity (6′) remote from the face (4) and being thus embodied that the said extremities (6′) all lie within a single substantially flat plane (6″) at a height H above the face (4), the substrate holder (17) further comprising a wall (8) which protrudes from the face (4), substantially encloses the matrix arrangement, and has a substantially uniform height h above the face (4), whereby h<H, the face (4) inside the wall (

Abstract: A patterned transfer process in the manufacture of a semiconductor device is monitored. Patterned features formed on a semiconductor layer to be etched are scanned for generating a first amplitude modulated waveform intensity signal. The first amplitude modulated waveform intensity signal is sampled to extract a first measurement population of critical dimension measurements. The patterned features are etched and then scanned for generating a second amplitude modulated waveform intensity signal. The second amplitude modulated waveform intensity signal is then sampled to extract a second measurement population of critical dimension measurements, which are then cross-correlated to obtain correlation values of the etching process.

Abstract: The present invention relates to a system for determining the alignment of an object, whose image is to be recorded, with a coupling eyepiece and an image capture apparatus that defines an image plane (Pi), comprising: an image capture apparatus (2) equipped with the ability for adjusting its own position; a light source (1) that emits at least two non-focused luminous dots (1a, 1b); eyepiece coupling lens(es) or element(s) (3) that focus on an object plane (Po); an opaque mask (4) that is perforated with at least two holes (5a, 5b) and that is positioned in front of light source (1) such that it transmits at least part of the light emitted by the light source; and calculating mechanism for determining whether alignment exists and, in the case of non-alignment, for quantifying the non-alignment.

Abstract: In an image processing apparatus, an image reading unit reads a document put on a platen glass to generate image data, and a detector in the image reading unit detects a tilt angle of the document put on the platen glass. A rotation angle is set based on the image data of a document and the image data is modified according to the rotation angle. The modification is controlled so as not to deteriorate the image quality. For example, the image data is rotated by an angle at which the document is tilted when the document is read, if the detected tilt angle of a document is larger than a predetermined value. The modification of the image data may be controlled according to a characteristic of the image data. For example, the image data is not rotated when the document is decided to include a half-tone image by detecting the attribute of the image data.

Abstract: The present invention relates to a tool position detection assembly that aligns a tool relative to a feature within a lap joint of a first panel and a second panel. The detection assembly includes an indexing device engageable to the feature. The indexing device includes a reflecting member having a width. The assembly also includes an end-effector movable along at least one axis parallel to the lap joint for positioning the tool. The end-effector has a dual laser device for detecting when the device is aligned with the reflecting member.

Abstract: A method for, without contact and with the aid of a measuring device, measuring in connection to an envelope surface of a measured object with respect to its cylindricity and/or its straightness relative to a straightness reference arranged parallel with the axis of rotation of the measured object, which measuring device besides said straightness reference comprises a measuring stand and a measuring carriage at which at least one measuring means is arranged, which measuring carriage is traversed along a support member parallel to said axis of rotation.

Abstract: A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system o