Abstract: An integrated circuit (IC) device includes a power control circuit including a first transistor and a second transistor of different types. The first transistor includes a gate terminal configured to receive a control signal, a first terminal electrically coupled to a first power supply node, and a second terminal electrically coupled to a second power supply node. The second transistor includes a gate terminal configured to receive the control signal, and first and second terminals configured to receive a predetermined voltage. The first transistor is configured to, in response to the control signal, connect or disconnect the first and second power supply nodes.

Abstract: The application discloses a semiconductor device and a semiconductor device manufacturing method. The semiconductor device includes: a substrate; a circuit macro on the substrate; a plurality of metal layers over the substrate, wherein the plurality of metal layers include a first power mesh; and a plurality of power switch circuits on the substrate, wherein the power switch circuits selectively couple a power to the first power mesh according to a control signal, and the power switch circuits are arranged in sequence, wherein a control signal output terminal of each first power switch circuit is coupled to a control signal input terminal of a following first power switch circuit, so that the control signal passes through the first power switch circuits sequentially.

Abstract: Disclosed herein are related to an integrated circuit including a semiconductor layer. In one aspect, the semiconductor layer includes a first region, a second region, and a third region. The first region may include a circuit array, and the second region may include a set of interface circuits to operate the circuit array. A side of the first region may face a first side of the second region along a first direction. The third region may include a set of header circuits to provide power to the set of interface circuits through metal rails extending along a second direction. A side of the third region may face a second side of the second region along the second direction. In one aspect, the first side extending along the second direction is shorter than the second side extending along the first direction, and the metal rails are shorter than the first side.

Abstract: Various implementations described herein are related to various devices having a frontside power network with frontside supply rails and a backside power network with backside supply rails. The device may include intermixing architecture with transition vias that couple the frontside power network to the backside power network. The intermixing architecture may transition the frontside supply rails of the frontside power network to the backside supply rails of the backside power network.

Abstract: A cell layout implemented in an integrated circuit (IC) includes a first plurality of independent power posts in a first metal layer. Each independent power post of the plurality of independent power posts provides a power connection to one device of a plurality of devices within the cell layout. A source or drain of each device of the plurality of devices is connected to one independent power post of the plurality of independent power posts. The IC further includes a plurality of independent power straps in a second metal layer that is different from the first metal layer. Each independent power strap of the plurality of independent power straps spans across and connects to multiple independent power posts of the first plurality of independent power posts.

Abstract: An integrated circuit includes a substrate layer and a resistor bank in a polysilicon layer disposed on the substrate layer. The resistor bank includes a plurality of resistor elements having a body portion extending in a longitudinal direction. A metal line is disposed in a metal layer above the polysilicon layer to extend transverse to the longitudinal direction and across the body portion of a group of the plurality of resistor elements, thereby forming a first region of the resistor bank and a second region of the resistor bank. The first region is separated from the second region by the metal line. A resistor device having a predetermined resistance includes a subset of the resistor elements in the group electrically coupled together in the second region. The resistor device also includes first and second terminals located in the same first or second region of the resistor bank.

Abstract: A method of fabricating an integrated circuit is disclosed. The method comprises defining a multi-layer semiconductor device structure on a substrate using standard cells, defining an input port on the M0OD or PO layer of the semiconductor device structure and an output port on the M0OD layer, and defining a metal-1 layer over the M0OD and PO layers, the metal-1 layer having a first set of conduction paths and a second set of conduction paths. The method further comprises defining a metal-2 layer over the metal-1 layer and configuring the first set of metal-1 conduction paths and the metal-2 conduction paths to interconnect circuit components in different cells, wherein inter cell connections in the semiconductor device structure are made using the first set of metal-1 conduction paths or a combination of the first set of metal-1 and the metal-2 conduction paths.

Abstract: A semiconductor integrated circuit device provided with vertical nanowire (VNW) FETs includes a tap cell. The tap cell includes a power supply interconnect extending in a first direction and a bottom region of a first conductivity type formed in a top portion of a well or substrate of the first conductivity type. The bottom region overlaps the power supply interconnect as viewed from top and is connected with the power supply interconnect.

Abstract: A method for designing a power network is provided and includes: initializing via widths and power-trace widths; determining whether utilization rates of first, second and third routing tracks are respectively equal to first, second and third values; when said utilization rate of said first routing tracks is not equal to said first value, adjusting said distance between first and second power traces until said utilization rate thereof is equal to said first value; when said utilization rate of said second routing tracks is not equal to said second value, adjusting said distance between third and fourth power traces until said utilization rate thereof is equal to said second value; and when said utilization rate of said third routing tracks is not equal to said third value, adjusting said distance between fifth and sixth power traces until said utilization rate thereof is equal to said third value.

Abstract: A MOS IC includes a MOS logic cell that includes first and second sets of transistor logic in first and second subcells, respectively. The first and second sets of transistor logic are functionally isolated from each other. The MOS logic cell includes a first set of Mx layer interconnects on an Mx layer extending in a first direction over the first and second subcells. A first subset of the first set of Mx layer interconnects is coupled to inputs/outputs of the first set of transistor logic in the first subcell and is unconnected to the second set of transistor logic. Each of the first subset of the first set of Mx layer interconnects extends from the corresponding input/output of the first set of transistor logic of the first subcell to the second subcell, and is the corresponding input/output of the first set of transistor logic.

Abstract: An integrated circuit structure includes: an integrated circuit structure includes: a first plurality of cell rows extending in a first direction, and a second plurality of cell rows extending in the first direction. Each of the first plurality of cell rows has a first row height and comprises a plurality of first cells disposed therein. Each of the second plurality of cell rows has a second row height different from the first row height and comprises a plurality of second cells disposed therein. The plurality of first cells comprises a first plurality of active regions each of which continuously extends across the plurality of first cells in the first direction. The plurality of second cells comprises a second plurality of active regions each of which continuously extends across the plurality of second cells in the first direction. At least one active region of the first and second pluralities of active regions has a width varying along the first direction.

Abstract: An IC structure includes first and second transistors, an isolation region and a first gate extension. The first transistor includes a first gate and first source/drain regions respectively on opposite sides of the first gate. The second transistor includes a second gate and second source/drain regions respectively on opposite sides of the second gate. The isolation region is laterally between the first and second transistors. A first one of the first source/drain regions has a first source/drain extension protruding from a first boundary of the isolation region, and a first one of the second source/drain regions has a second source/drain extension protruding from a second boundary of the isolation region. The first gate extension extends from the first gate to a position overlapping the isolation region.

Abstract: In some embodiments, a fishbone structure in a power network includes a first conductive segment in a first conductive layer running in a first direction, a plurality of second conductive segments in a second conductive layer running in a second direction and a plurality of interlayer vias between the first conductive layer and the second conductive layer. The second direction is substantially vertical to the first direction. The plurality of second conductive segments overlap with the first conductive segment. The plurality of interlayer vias are formed at where the plurality of second conductive segments overlap with the first conductive segment. Each of the plurality of second conductive segments has a width such that the first conductive segment has a first unit spacing with a first adjacent conductive line or one of the plurality of second conductive segments has a second unit spacing with a second adjacent conductive line.

Abstract: Disclosed is a semiconductor device including a substrate with first and second regions adjacent to each other in a first direction, and first to third gate electrodes extending from the first region toward the second region. Each of the first and second regions includes a PMOSFET region and an NMOSFET region. The first to third gate electrodes extend in the first direction and are sequentially arranged in a second direction different from the first direction. The first and third gate electrodes are supplied with a first signal. The second gate electrode is supplied with a second signal that is an inverted signal of the first signal. The first gate electrode includes a first gate of the first region and a first gate of the second region. The first gates are aligned and connected with each other in the first direction.

Abstract: Placement methods described in this disclosure provide placement and routing rules where a system implementing the automatic placement and routing (APR) method arranges standard cell structures in a vertical direction that is perpendicular to the fins but parallel to the cell height. Layout methods described in this disclosure also improve device density and further reduce cell height by incorporating vertical power supply lines into standard cell structures. Pin connections can be used to electrically connect the power supply lines to standard cell structures, thus improving device density and performance. The APR process is also configured to rotate standard cells to optimize device layout.

Abstract: A semiconductor device is provided that includes an active region above a substrate, a first gate structure, a second gate structure, a first semiconductor structure, a second semiconductor structure and a semiconductor bridge. The first gate semiconductor and the second semiconductor structure are in the active region and between the first and the second gate structures. The first semiconductor structure is adjacent to the first gate structure and a second semiconductor structure is adjacent to the second gate structure. The semiconductor bridge is in the active region electrically coupling the first and the second semiconductor structures.

Abstract: An integrated circuit structure includes: a first plurality of cell rows extending in a first direction, each of which has a first row height and comprises a plurality of first cells disposed therein; and a second plurality of cell rows extending in the first direction, each of which has a second row height different from the first row height and comprises a plurality of second cells disposed therein. The plurality of first cells comprises a first plurality of active regions each of which continuously extends across the plurality of first cells in the first direction, and wherein the plurality of second cells comprises a second plurality of active regions each of which continuously extends across the plurality of second cells in the first direction.

Abstract: A semiconductor device comprises a stack structure comprising decks each comprising a memory element level comprising memory elements, and a control logic level in electrical communication with the memory element level and comprising control logic devices. At least one of the control logic devices of the control logic level of one or more of the decks comprises at least one device exhibiting a gate electrode shared by neighboring vertical transistors thereof. A control logic assembly, a control logic device, an electronic system, a method of forming a control logic device, and a method of operating a semiconductor device are also described.

Abstract: An integrated circuit (IC), including a first integrated circuit (IC) cell configured to perform a defined operation on a first input signal to generate a first output signal, wherein the first IC cell includes a first metal configured to receive the first input signal or output the first output signal; and a second IC cell configured to perform the defined operation on a second input signal to generate a second output signal, wherein the second IC cell includes a second metal configured to receive the second input signal or the second output signal, wherein the second metal is located substantially in the same location within the second IC cell as the first metal is located within the first IC cell, and wherein the first and second metals are configured differently based on differences in first and second intercell metal interconnects to which the first and second metals electrically connect, respectively.

Abstract: A method includes forming a shallow trench isolation (STI) region in a semiconductor substrate, the STI region bordering an active region in the semiconductor substrate; forming a plurality of gate structures over the semiconductor substrate; and forming a plurality of conductive contacts between the gate structures and in contact with the STI region, wherein a portion of the active region is between the conductive contacts.

Abstract: A power network includes a plurality of power switch units disposed in a first semiconductor layer, arranged in a plurality of columns along a first direction and a plurality of rows along a second direction. The power switch units in even rows are aligned with a center point of a horizontal space between adjacent two of the power switch units in the same row of the odd rows of the power switch units in the first direction. The power switch units in even columns are aligned with a center point of a vertical space between adjacent two of the power switch units in the same column of the odd columns of the power switch units in the second direction. The power network further includes a plurality of second connecting lines disposed in a fourth semiconductor layer and extending in the second direction.

Abstract: According to one implementation of the present disclosure, a method includes determining one or more of a read current threshold, a leakage current threshold or a minimum assist voltage threshold; identifying a logic design, wherein the logic design is based the on one or more of the read current threshold, the leakage current threshold, or the minimum assist voltage threshold; identifying a bitcell-type and a corresponding version of the bitcell-type, wherein each version of the bitcell-type is associated with performance and power attributes of a bitcell of a memory array; and determining a memory optimization mode based on the identified logic design and the identified version of the bitcell-type.

Abstract: Disclosed is a semiconductor device including a substrate with first and second regions adjacent to each other in a first direction, and first to third gate electrodes extending from the first region toward the second region. Each of the first and second regions includes a PMOSFET region and an NMOSFET region. The first to third gate electrodes extend in the first direction and are sequentially arranged in a second direction different from the first direction. The first and third gate electrodes are supplied with a first signal. The second gate electrode is supplied with a second signal that is an inverted signal of the first signal. The first gate electrode includes a first gate of the first region and a first gate of the second region. The first gates are aligned and connected with each other in the first direction.

Abstract: A method of designing a layout includes generating first routing tracks assigned to a first color group, generating second routing tracks assigned to a second color group, wherein a first routing track of the first routing tracks is between adjacent second routing tracks of the second routing tracks, and specifying a color stitching region connecting a selected first routing track of the first routing tracks with a selected second routing track of the second routing tracks of the layout, wherein the color stitching region represents a conductive region that connects a first conductive element represented by the selected first routing track with a second conductive element represented by the selected second routing track through an exposed portion of the selected first routing track, and wherein the exposed portion is at a removed portion of a sidewall structure surrounding the selected first routing track.

Abstract: A chip having a substrate region having a substrate contact, an RS latch having two complementary nodes representing a storage state of the RS latch, a control circuit having a control input and configured to connect one of the complementary nodes to a supply potential depending on a potential at the control input, wherein the control input is connected to the substrate contact, and an output circuit connected to an output of the RS latch and configured to trigger an alarm depending on the storage state of the RS latch.

Abstract: A method for designing a semiconductor integrated circuit is disclosed, including generating a physical layout from a schematic layout of the analog integrated circuit. The method comprises retrieving, with a processor, pre-defined cells having physical layout information for a specific process stored in a memory device responsive to the schematic layout being created by an analog circuit designer using an analog design tool, building the physical layout by connecting the retrieved pre-defined cells according to the schematic layout, and storing the physical layout in the memory device. Related systems and computer-readable media are also described herein.

Abstract: A system and method for fabricating metal patterns are described. Multiple mandrels are formed on a first polysilicon layer which is on top of a first oxide layer. Each mandrel uses a second polysilicon on top of a first nitride. A spacer oxide and a spacer nitride are formed on the sidewalls of the mandrels to create double spacers. A second oxide layer is deposited followed by removing layers until the first nitride in the mandrels is reached. Areas are etched based on a selected method of multiple available methods until the first oxide layer is etched providing trenches for the metal patterns. Remaining materials on the first oxide layer are removed followed by metal being deposited in the trenches in the first oxide layer.

Abstract: High density integrated circuit (IC) capacitor structures and fabrication methods that increase the capacitive density of integrated capacitors with little or no reduction in Q-factor by using a stacked high-density integrated capacitor structure that includes substrate-contact (“S-contact”) capacitor plates. Embodiments include a plurality of S-contact plates fabricated in electrical connection with a capacitor formed in a metal interconnect layer. Some embodiments include interstitial S-contact plates to provide additional capacitive density. Embodiments may also utilize single-layer transfer (SLT) and double-layer transfer (DLT) techniques to create ICs with high density, high Q-factor capacitors. Such capacitors can be beneficially combined with other structures made possible in SLT and DLT IC structures, such as metal interconnect layer capacitors and inductors, and one or more FETs having a conductive aligned supplemental gate.

Abstract: Pursuant to some embodiments of the present invention, transistor devices are provided that include a semiconductor structure, a gate finger extending on the semiconductor structure in a first direction, and a gate interconnect extending in the first direction and configured to be coupled to a gate signal at an interior position of the gate interconnect, where the gate interconnect is connected to the gate finger at a position offset from the interior position of the gate interconnect.

Abstract: A 3D-IC includes a first tier device and a second tier device. The first tier device and the second tier device are vertically stacked together. The first tier device includes a first substrate and a first interconnect structure formed over the first substrate. The second tier device includes a second substrate, a doped region formed in the second substrate, a dummy gate formed over the substrate, and a second interconnect structure formed over the second substrate. The 3D-IC also includes an inter-tier via extends vertically through the second substrate. The inter-tier via has a first end and a second end opposite the first end. The first end of the inter-tier via is coupled to the first interconnect structure. The second end of the inter-tier via is coupled to one of: the doped region, the dummy gate, or the second interconnect structure.

Abstract: Aspects of the embodiments include a semiconductor package that includes a printed circuit board (PCB) and a semiconductor die. The semiconductor die including an interconnect landing pad on an active side of the semiconductor die; a solder material on the interconnect landing pad; a partial redistribution layer on the active side of the semiconductor die; and a protection layer on the partial redistribution layer, the protection layer comprising the solder material. The semiconductor die is electrically connected to the PCB by the solder material on the interconnect landing pad. The partial redistribution layer and the protection layer are separated from the printed circuit board by an air gap.

Abstract: Disclosed is a computer-readable medium including a program code. The program code, when executed by a processor, causes the processor to place an electrically active pattern having a first width and a first least margin area, on a layer, to place a first dummy pattern having a second width wider than the first width and having a second least margin area, on the layer, and to place a second dummy pattern having a third width and a third least margin area, on the layer, based on whether a ratio of an area of the layer to areas of the electrically active pattern and the first dummy pattern is within a reference range.

Abstract: Placement methods described in this disclosure provide placement and routing rules where a system implementing the automatic placement and routing (APR) method arranges standard cell structures in a vertical direction that is perpendicular to the fins but parallel to the cell height. Layout methods described in this disclosure also improve device density and further reduce cell height by incorporating vertical power supply lines into standard cell structures. Pin connections can be used to electrically connect the power supply lines to standard cell structures, thus improving device density and performance. The APR process is also configured to rotate standard cells to optimize device layout.

Abstract: The present disclosure discloses a resistive random access memory (RRAM) and a method for manufacture the RRAM. The method includes: providing a bottom interconnection layer; forming a bottom dielectric layer above the bottom interconnection layer, the bottom dielectric layer comprising a via through the bottom dielectric layer that exposes a portion of the bottom interconnection layer; and forming a bottom electrode layer in the via, the bottom electrode layer including a first electrode selectively grown above the bottom interconnection layer. The bottom electrode layer manufactured in such a way provides improved filling capability of the bottom electrode layer in the via.

Abstract: Systems and methods are directed to contacts for an infrared detector. For example, an infrared imaging device includes a substrate having a first metal layer and an infrared detector array coupled to the substrate via a plurality of contacts. Each contact includes for an embodiment a plurality of metal studs each having a first end and a second end and each disposed between the first metal layer and a second metal layer, wherein the first end of each metal stud is disposed on a portion of the first metal layer that is at least partially on the surface of the substrate.

Abstract: A post placement abutment treatment for cell row design is provided. In an embodiment a first cell and a second cell are placed in a first cell row and a third cell and a fourth cell are placed into a second cell row. After placement vias connecting power and ground rails to the underlying structures are analyzed to determine if any can be merged or else removed completely. By merging and removing the closely placed vias, the physical limitations of photolithography may be by-passed, allowing for smaller structures to be formed.

Abstract: Various embodiments include monitoring structures for integrated circuits (ICs) and related monitoring methods. In some cases, a monitoring structure includes: a set of serpentine-comb structures configured to connect with a back-end-of-line (BEOL) portion of the IC, each of the serpentine-comb structures including: a chain of interconnected laterally extending wires spanning a set of metal levels in the IC; and a set of vias connecting the chain of interconnected laterally extending wires across the set of metal levels, wherein the set of vias includes at least one via spanning between each successive level of the chain of interconnected laterally extending wires, wherein the chain of interconnected laterally extending wires and the set of vias are configured to detect a chip package interface (CPI) failure in the IC.

Abstract: An apparatus is provided which comprises: an interconnect comprising poly extending in a first direction; a power supply rail extending in a second direction, wherein the second direction is parallel to the first direction; and a memory array organized in rows and columns, wherein the rows are orthogonal to the columns, wherein the first and second directions are parallel to the rows of the memory array, wherein the memory array comprises bit-cells (e.g., 6T SRAM bit-cells) that are organized such that there are no gap bit-cells in the array.

Abstract: A method for semiconductor structure design includes performing, by a processor, error processing of an initial design file layout. The processor further detects a tip-to-tip (T2T) structure design violation at a design cell boundary for a metal layer above (Ma) a via (Vx) at a tip of the Ma for the initial design file layout for a semiconductor structure based on a library of pattern rules. Upon detection of the T2T structure design violation, the processor retargets the Vx for generating a resulting design file layout of the semiconductor structure.

Abstract: An apparatus including a memory storing instructions and a processor executing the instructions to perform a method including: performing error processing of an initial design file layout; detecting a tip-to-tip (T2T) structure design violation at a design cell boundary for a metal layer above (Ma) a via (Vx) at a tip of the Ma for the initial design file layout for a semiconductor structure based on a library of pattern rules; retargeting the Vx for generating a resulting design file layout of the semiconductor structure; and generating a physical semiconductor structure based on the resulting design file layout of the semiconductor structure.

Abstract: An integrated circuit (IC) power distribution network is disclosed. In one aspect, the IC includes a stack of layers formed on a substrate. The IC includes standard cells with parallel gate structures oriented in a direction y. Each cell includes an internal power pin for supplying a reference voltage to the cell. The stack includes metal layers in which lines are formed to route signals between cells. The lines in each metal layer have a preferred orientation that is orthogonal to that of the lines in an adjacent metal layer. A first layer is the lowest metal layer that has y as a preferred orientation while also providing routing resources for signal routing between the cells. A second layer is the nearest metal layer above this first layer. The IC includes a power distribution network for delivering the reference voltage to the power pin.

Abstract: A semiconductor device comprises a plurality of first conductor portions 10, a plurality of second conductor portions 20 and a sealing portion 50, covering upper surfaces of the first conductor portion 10 and the second conductor portion 20. The first conductor portion 10 and the second conductor portion 20 are connected. Usage mode of the first terminal 11 and the second terminal 12 can be selected, and the second terminal 21 of the second conductor portion 20 serves as an output terminal in a case where the first terminal 11 of the first conductor portion 10 is used as a power supply terminal, and the first terminal 11 of the first conductor portion 10 serves as an output terminal in a case where the second terminal 21 is used as a power supply terminal.

Abstract: Aspects describing modified self-aligned quadruple patterning (SAQP) processes using cut pattern masks to fabricate integrated circuit (IC) cells with reduced area are disclosed. In one aspect, a modified SAQP process includes disposing multiple mandrels. First spacers are disposed on either side of each mandrel, and second spacers are disposed on either side of each first spacer. A cut pattern mask is disposed over the second spacers and includes openings that expose second spacers corresponding to locations in which voltage rails are to be disposed. The voltage rails are formed by removing the second spacers exposed by the openings in the cut pattern mask, and disposing the voltage rails in the corresponding locations left vacant by removing the second spacers. Routing lines are disposed over routing tracks formed between each set of the remaining second spacers to allow for interconnecting of active devices formed in the IC cell.

Abstract: An electronic design automation method configured to automatically design a semiconductor device includes generating a site-row having a unit height based on a standard cell having the unit height, and generating metal routing tracks which begin at an offset point spaced a specific distance from an origin point of the site-row. The unit height is a non-integer multiple of a spacing of metal lines of one of interconnection layers of the semiconductor device. Using this process, a layout of a plurality of standard cells on a plurality of site-rows, and constituting a Floorplan of the semiconductor device, is generated.

Abstract: A method for designing an semiconductor integrated circuit is disclosed, including generating a physical layout from a schematic layout of the analog integrated circuit. The method comprises retrieving, with a processor, pre-defined cells having physical layout information for a specific process stored in a memory device responsive to the schematic layout being created by a circuit designer using an analog circuit design tool, building the physical layout by connecting the retrieved pre-defined cells according to the schematic layout, and storing the physical layout in the memory device. Related systems and computer-readable media are also described herein.

Abstract: An IC structure includes a cell, a first rail and a second rail. The cell includes a first and a second active region and a first gate structure. The first and second active region extend in a first direction and is located at a first level. The second active region is separated from the first active region in a second direction. The first gate structure extends in the second direction, overlaps the first and second active region, and is located at a second level. The first rail extends in the first direction, overlaps the first active region, is configured to supply a first supply voltage, and is located at a third level. The second rail extends in the first direction, overlaps the second active region, is located at the third level, separated from the first rail in the second direction, and is configured to supply a second supply voltage.

Abstract: Several embodiments for semiconductor devices and methods for forming semiconductor devices are disclosed herein. One embodiment is directed to a method for manufacturing a microelectronic imager having a die including an image sensor, an integrated circuit electrically coupled to the image sensor, and electrical connectors electrically coupled to the integrated circuit. The method can comprise covering the electrical connectors with a radiation blocking layer and forming apertures aligned with the electrical connectors through a layer of photo-resist on the radiation blocking layer. The radiation blocking layer is not photoreactive such that it cannot be patterned using radiation. The method further includes etching openings in the radiation blocking layer through the apertures of the photo-resist layer.

Abstract: In some embodiments, the present disclosure relates to an integrated chip. The integrated chip has a plurality of gate structures arranged over a substrate. A plurality of first MOL (middle-of-line) structures are arranged at a first pitch over the substrate at locations interleaved between the plurality of gate structures. The plurality of first MOL structures connect active regions within the substrate to an overlying metal interconnect layer. A plurality of second MOL structures are arranged at a second pitch over the plurality of gate structures at locations interleaved between the plurality of first MOL structures. The plurality of second MOL structures connect the plurality of gate structures to the metal interconnect layer. The second pitch is different than the first pitch. The different pitches avoid misalignment errors between the plurality of gate structures and the metal interconnect layer.

Abstract: A packaged Integrated Circuit (IC) includes an IC and a package. The package has a bottom dielectric layer and a plurality of redistribution layers (RDLs) formed on the bottom dielectric layer. Each the RDLs includes patterned conductors, a dielectric layer, and a plurality of vias that extend between the patterned conductors to a differing RDL or to external connections. The package includes a plurality of package pads that have a first lateral separation pitch. The IC includes a plurality of IC pads that electrically connect to the plurality of package pads that have a first lateral separation pitch. The package also includes a plurality of Printed Circuit Board (PCB) pads that extend through the bottom dielectric layer and contact the plurality of patterned conductors of the first RDL. Power PCB pads and ground PCB pads of the plurality of PCB pads have a second lateral separation pitch that exceeds the first lateral separation pitch.

Abstract: Some embodiments include an apparatus having first, second, third and fourth wiring tracks. The first and third wiring tracks sandwich the second wiring track therebetween, and the second and fourth wiring tracks sandwich the third wiring track therebetween. A lower-level wiring layer includes a first wiring which has a first portion extending along the second wiring track, a second portion extending along the first wiring track, and a third portion extending along the third wiring track. An upper-level wiring layer includes a second wiring electrically connected to the first wiring and having a fourth portion extending along the third wiring track. The third portion of the first wiring is coupled with the fourth portion of the second wiring.