Acceleration Patents (Class 315/111.61)
  • Patent number: 10134568
    Abstract: Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma chamber having a longitudinal axis extending between a first end wall and a second end wall, and an RF antenna adjacent a plasma within the plasma chamber, wherein the RF antenna is configured to provide RF energy to the plasma. The ion source may further include an end plate disposed within the plasma chamber, adjacent the first end wall, the end plate actuated along the longitudinal axis between a first position and a second position to adjust a volume of the plasma. By providing an actuable end plate and RF antenna, plasma characteristics may be dynamically controlled to affect ion source characteristics, such as composition of ion species, including metastable neutrals.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: November 20, 2018
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Bon-Woong Koo, Yong-Seok Hwang, Kyong-Jae Chung
  • Patent number: 9429543
    Abstract: An ion mobility analyzer, combination device thereof, and ion mobility analysis method. The ion mobility analyzer comprises an electrode system that surrounds the analytical space and a power device that attaches to the electrode system an ion mobility electric potential field that moves along one space axis. During the process of analyzing mobility of ions to be measured, by always placing the ions to be measured in the moving ion mobility electric potential field, and keeping the movement direction of the ion mobility electric potential field consistent with the direction of the electric field on the ions to be measured within the ion mobility electric potential field, theoretically a mobility path of an infinite length can be formed so as to distinguish ions having mobility or ion cross sections that have very small differences.
    Type: Grant
    Filed: June 10, 2015
    Date of Patent: August 30, 2016
    Assignee: SHIMADZU CORPORATION
    Inventors: Gongyu Jiang, Yupeng Cheng, Xiaoqiang Zhang, Wenjian Sun
  • Patent number: 9006971
    Abstract: A planar helix slow-wave structure with straight edge connections where the structure consists of two arrays of thin, parallel, conductors printed on top and bottom faces of a low-loss dielectric material or substrate, the conductors in the arrays printed on the top and bottom surfaces being inclined at different but symmetric pitch angles on the surface of the planar surface, the conjunction ends of the conductors on the top and bottom faces being connected by vertical conductors with circular rings with a diameter greater than the diameter of the vertical conductors to ensure proper connections between them, and a vacuum tunnel inside the planar helix structure.
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: April 14, 2015
    Inventors: Ciersiang Chua, Sheel Aditya, Zhongxiang Shen
  • Patent number: 8994258
    Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: March 31, 2015
    Assignee: Kaufman & Robinson, Inc.
    Inventors: Harold R. Kaufman, James R. Kahn, Richard E. Nethery
  • Patent number: 8933414
    Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: January 13, 2015
    Assignee: FEI Company
    Inventor: Mostafa Maazouz
  • Patent number: 8698401
    Abstract: In accordance with one embodiment of the present invention, the dielectric discharge chamber of a generally axially symmetric ion source has a hollow cylindrical shape. One end of the discharge chamber is closed with a dielectric wall. The working gas is introduced through an aperture in the center of this wall. The ion-optics grids are at the other end of the discharge chamber, which is left open. The inductor is a helical coil of copper conductor that surrounds the cylindrical portion of the dielectric discharge chamber. The modification that produces uniformity about the axis of symmetry is a shorted turn of the helical-coil inductor at the end of the inductor closest to the ion-optics grids.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: April 15, 2014
    Assignee: Kaufman & Robinson, Inc.
    Inventors: Harold R. Kaufman, James R. Kahn
  • Patent number: 8648536
    Abstract: A pair of coaxial electrodes 10 that face each other, a discharge-environment-maintaining device 20, and a voltage-applying device 30 are provided. Each coaxial electrode 10 includes a center electrode 12, a guide electrode 14 which surrounds the front end portion of the facing center electrode, and an insulation member 16 which insulates the center electrode and the guide electrode from each other. The insulation member 16 is formed of partially porous ceramics including an insulative dense portion 16a and a porous portion 16b. The insulative dense portion 16a includes a reservoir 18 which holds a plasma medium therein, and by the porous portion 16b, the inner surface of the reservoir 18 communicates with a gap between the center electrode 12 and the guide electrode 14 through the inside of the insulative dense portion 16a.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: February 11, 2014
    Assignee: IHI Corporation
    Inventor: Hajime Kuwabara
  • Patent number: 8635850
    Abstract: An electron cyclotron resonance (ECR) thruster is disclosed having a plasma chamber which is electrically biased with a positive voltage. The chamber bias serves to efficiently accelerate and expel the positive ions from the chamber. Electrons follow the exiting ions, serving to provide an electrically neutral exhaust plume. In a further embodiment, a downstream shaping magnetic field serves to further accelerate and/or shape the exhaust plume.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: January 28, 2014
    Assignee: U.S. Department of Energy
    Inventors: Max E. Light, Patrick L. Colestock
  • Patent number: 8610379
    Abstract: The present invention provides systems and methods for the magnetic insulation of accelerator electrodes in electrostatic accelerators. Advantageously, the systems and methods of the present invention improve the practically obtainable performance of these electrostatic accelerators by addressing, among other things, voltage holding problems and conditioning issues. These problems and issues are addressed by flowing electric currents along these accelerator electrodes to produce magnetic fields that envelope the accelerator electrodes and their support structures, so as to prevent very low energy electrons from leaving the surfaces of the accelerator electrodes and subsequently picking up energy from the surrounding electric field. In various applications, this magnetic insulation must only produce modest gains in voltage holding capability to represent a significant achievement.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: December 17, 2013
    Assignee: U.S. Department of Energy
    Inventor: Larry R. Grisham
  • Patent number: 8604423
    Abstract: Novel methods and instrumentation for mass spectrometry are described. Zoom-time of flight mass spectrometry (Zoom-TOF) allows increased mass resolution over a pre-determined specific range of masses. Methods for retrofitting traditional time-of-flight (TOF) and distance of flight (DOF) mass spectrometers are described, as well as novel instruments capable of performing Zoom-TOF analyses.
    Type: Grant
    Filed: April 5, 2011
    Date of Patent: December 10, 2013
    Assignees: Indiana University Research and Technology Corporation, Battelle Memorial Institute
    Inventors: Christie G. Enke, Steven J. Ray, Alexander W. Graham, Gary M. Hieftje, Elise Dennis, Charles J. Barinaga, David W. Koppenaal
  • Patent number: 8597428
    Abstract: A linear actuator comprised of an actuator body having a first portion and a second portion, each arranged along a longitudinal axis of the actuator body. A vacuum bellows is concentrically located in the first portion and is configured to seal a vacuum environment from the second portion. A linear motion shaft is concentrically located substantially within the actuator body and is configured to move in a linear direction along the longitudinal axis. An electrically conductive portion of the shaft is concentrically located substantially within the vacuum bellows and electrically insulated therefrom and is configured to receive and conduct a signal. A lift force generating portion of the shaft is concentrically located substantially within the second portion. An electrical contact pad is electrically coupled to the conductive portion of the shaft and is configured to couple the signal to another surface upon activation of the shaft.
    Type: Grant
    Filed: December 12, 2008
    Date of Patent: December 3, 2013
    Assignee: Lam Research Corporation
    Inventors: Danny Brown, Allan Ronne, Arthur Sato, John Daugherty, Leonard Sharpless
  • Patent number: 8593064
    Abstract: A plasma source comprising an RF coupling system, magnets or coils that generate magnetic fields, a gas injection system, and a vacuum tight, RF transparent gas containment tube, wherein the RF coupling system comprises an RF coupler and the plasma source further comprises a choke point wherein the ratio of the field strength at said choke point to the field strength at said RF coupler is greater than two.
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: November 26, 2013
    Assignee: AD Astra Rocket Company
    Inventor: Franklin Chang Diaz
  • Patent number: 8581526
    Abstract: A design for an RF electron gun having a gun cavity utilizing an unbalanced electric field arrangement. Essentially, the electric field in the first (partial) cell has higher field strength than the electric field in the second (full) cell of the electron gun. The accompanying method discloses the use of the unbalanced field arrangement in the operation of an RF electron gun in order to accelerate an electron beam.
    Type: Grant
    Filed: August 28, 2010
    Date of Patent: November 12, 2013
    Assignee: Jefferson Science Associates, LLC
    Inventor: Alicia Hofler
  • Patent number: 8575867
    Abstract: A charged particle accelerator having a curvilinear beam trajectory maintained solely by a laterally directed, constant electric field; requiring no magnetic field. A method for controlling the trajectory of a charged particle in an accelerator by applying only a constant electric field for beam trajectory control. Curvilinear steering electrodes held at a constant potential create the beam path. A method for making a chip-scale charged particle accelerator involves integrated circuit-based processes and materials. A particle accelerator that can generate 110 KeV may a footprint less than about 1 cm2.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: November 5, 2013
    Assignee: Cornell University
    Inventors: Amit Lal, Shi Yue
  • Patent number: 8558461
    Abstract: Accelerated charged particles are provided by inductive amplification of particle energy in connection with a deflagration-mode plasma discharge. The deflagration mode discharge tends to increase particle energy relative to other operating modes. Inductive amplification of particle energy further increases output particle velocity. Inductive amplification can occur by formation of a current loop in the plasma discharge, and/or by a sudden increase in inductance due to collapse of the current distribution of the plasma discharge. Applications include particle therapy and production of radio-isotopes.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: October 15, 2013
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Flavio Poehlmann-Martins, Mark A. Cappelli, Gregory Rieker
  • Patent number: 8461762
    Abstract: An apparatus and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions ions are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.
    Type: Grant
    Filed: July 29, 2009
    Date of Patent: June 11, 2013
    Assignee: The Regents of The University of California
    Inventors: Norman Rostoker, Michl Binderbauer
  • Patent number: 8399852
    Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: March 19, 2013
    Inventors: Alexander Klein, Matthew Wittman, Scott Rackey
  • Patent number: 8319435
    Abstract: The invention, in its various aspects and embodiments, comprises a method and apparatus for an optical filament launch. In one aspect, the present invention generates a plurality of plasma filaments defining a radio frequency propagation path. In a second aspect, the present invention generates a pulsed plasma filament RF transmission line.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: November 27, 2012
    Assignee: Lockheed Martin Corp.
    Inventors: James R. Wood, Mark K. Browder
  • Patent number: 8314411
    Abstract: There is obtained a particle beam therapy system in which the beam size is reduced. There are provided an accelerator 14 that accelerates a charged particle beam; an irradiation apparatus that has a beam scanning apparatus 5a, 5b for performing scanning with the charged particle beam and irradiates the charged particle beam onto an irradiation subject; and a beam transport apparatus 15 that has a duct for ensuring a vacuum region or gas region that continues from the accelerator 14 to a beam outlet window 7 disposed at a more downstream position than the beam scanning apparatus 5a, 5b, and that transports the charged particle beam exiting from the accelerator 14 to the irradiation apparatus.
    Type: Grant
    Filed: April 24, 2009
    Date of Patent: November 20, 2012
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hisashi Harada, Takaaki Iwata, Taizo Honda, Yuehu Pu, Yuichi Yamamoto, Toshihiro Otani, Hidenobu Sakamoto
  • Patent number: 8299713
    Abstract: A method of accelerating charged particles using a laser pulse fired through a plasma channel contained in a capillary, wherein the plasma waveguide has deviations along its length that cause deviations in the plasma density contained therein, the deviations in plasma density acting to promote charged particle injection into a wake of a passing laser pulse. A radiation source based on a laser-driven plasma accelerator in a plasma waveguide in which the plasma waveguide and/or laser injection process is/are controlled so as to produce an undulating path for the laser pulse through the waveguide, the undulation exerting a periodic transverse force on charged particles being accelerated in the wake of the laser pulse, the resulting charged particle motion causing controlled emission of high frequency radiation pulses.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: October 30, 2012
    Assignee: Isis Innovation Limited
    Inventors: Simon Martin Hooker, Anthony Joseph Gonsalves, Dino Anthony Jaroszynski, Wim Pieter Leemans
  • Patent number: 8288950
    Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: October 16, 2012
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Scott G. Walton, Christopher D. Cothran, Richard F. Fernsler, Robert A. Meger, William E. Amatucci
  • Patent number: 8242404
    Abstract: A plasma jet system includes a housing with a single opening. A plasma generator is coupled to ionize a fluid in the housing. An electromagnetic accelerator is coupled to generate an electric field that accelerates ionized fluid in the housing toward the opening. A controller can modulate the frequency of the electric field to cause the ionized fluid to form a plasma vortex flow through the opening. A magnetic field is applied normal to the direction of the plasma vortex flow to mitigate the momentum of the electrons. The electrons slowed by the magnetic field can be collected and conducted to a location where they are re-inserted into the plasma vortex flow to maintain charge neutrality.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: August 14, 2012
    Assignee: Lockheed Martin Corporation
    Inventors: Daniel N. Miller, Paul D. McClure, Charles J. Chase, Robert R. Boyd
  • Patent number: 8138677
    Abstract: A closed drift Hall Current accelerator with a split solenoid Hall field, a radial injection collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes, for injection of ions into the solenoid field. The Hall Effect field in this case is in the gap of the return field of the split solenoid magnetic field.
    Type: Grant
    Filed: May 1, 2008
    Date of Patent: March 20, 2012
    Inventor: Mark Edward Morehouse
  • Patent number: 8138678
    Abstract: A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: March 20, 2012
    Assignees: IHI Corporation, The University of Tokyo
    Inventors: Daisuke Ishida, Hiroyuki Nose, Namio Kaneko, Yasuo Sakai, Masashi Yamamoto, Mitsuru Uesaka, Katsuhiro Dobashi, Fumito Sakamoto
  • Patent number: 8130893
    Abstract: A magnetohydrodynamic simulator that includes a plasma container. The magnetohydrodynamic simulator also includes an first ionizable gas substantially contained within the plasma container. In addition, the magnetohydrodynamic simulator also includes a first loop positioned adjacent to the plasma container, wherein the first loop includes a gap, a first electrical connection on a first side of the gap, a second electrical connection of a second side of the gap, and a first material having at least one of low magnetic susceptibility and high conductivity. The first loop can be made up from an assembly of one or a plethora or wire loop coils. In such cases, electrical connection is made through the ends of the coil wires. The magnetohydrodynamic simulator further includes an electrically conductive first coil wound about the plasma container and through the first loop.
    Type: Grant
    Filed: July 15, 2010
    Date of Patent: March 6, 2012
    Inventor: Nassim Haramein
  • Patent number: 8073094
    Abstract: A magnetohydrodynamic simulator that includes a plasma container. The magnetohydrodynamic simulator also includes an first ionizable gas substantially contained within the plasma container. In addition, the magnetohydrodynamic simulator also includes a first loop positioned adjacent to the plasma container, wherein the first loop includes a gap, a first electrical connection on a first side of the gap, a second electrical connection of a second side of the gap, and a first material having at least one of low magnetic susceptibility and high conductivity. The first loop can be made up from an assembly of one or a plethora or wire loop coils. In such cases, electrical connection is made through the ends of the coil wires. The magnetohydrodynamic simulator further includes an electrically conductive first coil wound about the plasma container and through the first loop.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: December 6, 2011
    Inventor: Nassim Haramein
  • Publication number: 20110199000
    Abstract: A method of accelerating charged particles using a laser pulse fired through a plasma channel contained in a capillary, wherein the plasma waveguide has deviations along its length that cause deviations in the plasma density contained therein, the deviations in plasma density acting to promote charged particle injection into a wake of a passing laser pulse. A radiation source based on a laser-driven plasma accelerator in a plasma waveguide in which the plasma waveguide and/or laser injection process is/are controlled so as to produce an undulating path for the laser pulse through the waveguide, the undulation exerting a periodic transverse force on charged particles being accelerated in the wake of the laser pulse, the resulting charged particle motion causing controlled emission of high frequency radiation pulses.
    Type: Application
    Filed: September 11, 2007
    Publication date: August 18, 2011
    Applicant: Isis Innovation Limited
    Inventors: Simon Martin Hooker, Anthony Joseph Gonsalves, Dino Anthony Jaroszynski, Wim Pieter Leemans
  • Patent number: 7994739
    Abstract: A betatron magnet having at least one electron injector positioned approximate an inside of a radius of a betatron orbit, the betatron magnet further includes a first guide magnet having a first pole face and a second guide magnet having a second pole face. Both the first and the second guide magnet have a centrally disposed aperture and the first pole face is separated from the second pole face by a guide magnet gap. A core is disposed within the centrally disposed apertures in an abutting relationship with both guide magnets. The core has at least one core gap. A drive coil is wound around both guide magnet pole faces. An orbit control coil has a core portion wound around the core gap and a field portion wound around the guide magnet pole faces. The core portion and the field portion are connected but in opposite polarity.
    Type: Grant
    Filed: December 14, 2008
    Date of Patent: August 9, 2011
    Assignee: Schlumberger Technology Corporation
    Inventor: Felix K. Chen
  • Patent number: 7973485
    Abstract: A particle controller is disclosed. In some embodiments, a particle controller includes an input port configured to receive a particle stream and a set of cells configured to form a tube through which at least a portion of the particles comprising the particle stream are directed. In some such cases, each cell in the set of cells comprises at least a portion of a semiconductor die.
    Type: Grant
    Filed: May 20, 2008
    Date of Patent: July 5, 2011
    Assignee: Silicon Accelerators, Inc
    Inventors: Sammy Karl Brown, Alok Mohan
  • Publication number: 20110089835
    Abstract: A plasma jet system includes a housing with a single opening. A plasma generator is coupled to ionize a fluid in the housing. An electromagnetic accelerator is coupled to generate an electric field that accelerates ionized fluid in the housing toward the opening. A controller can modulate the frequency of the electric field to cause the ionized fluid to form a plasma vortex flow through the opening. A magnetic field is applied normal to the direction of the plasma vortex flow to mitigate the momentum of the electrons. The electrons slowed by the magnetic field can be collected and conducted to a location where they are re-inserted into the plasma vortex flow to maintain charge neutrality.
    Type: Application
    Filed: December 15, 2010
    Publication date: April 21, 2011
    Applicant: Lockheed Martin Corporation
    Inventors: Daniel N. Miller, Paul D. McClure, Charles J. Chase, Robert R. Boyd
  • Patent number: 7884333
    Abstract: A new type of structure for the deflection and crabbing of particle bunches in particle accelerators comprising a number of parallel transverse electromagnetic (TEM)-resonant) lines operating in opposite phase from each other. Such a structure is significantly more compact than conventional crabbing cavities operating the transverse magnetic TM mode, thus allowing low frequency designs.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: February 8, 2011
    Assignee: Jefferson Science Associates, LLC
    Inventor: Jean Delayen
  • Patent number: 7883601
    Abstract: An apparatus for controlling a plasma etching process includes plasma control structure that can vary a size of a plasma flow passage, vary a speed of plasma flowing through the plasma flow passage, vary plasma concentration flowing through the plasma flow passage, or a combination thereof.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: February 8, 2011
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih Ming Chang, Chi-Lun Lu
  • Patent number: 7838855
    Abstract: A charged particle irradiation system that positions the beam at a target position to avoid irradiation of normal tissue includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signals received from the charged particle beam position monitors 26 and 27, the control unit 70 calculates a beam position at a target position and then controls the scanning magnets 24 and 25 so that the charged particle beam is moved to a desired irradiation position at the target position. The control unit 70 corrects the value of an excitation current applied to each of the scanning magnets 24 and 25 on a specified cycle basis on the basis of information about the position and the angle of the charged particle beam.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: November 23, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Yusuke Fujii, Hisataka Fujimaki, Kazuo Hiramoto
  • Patent number: 7825601
    Abstract: The present patent letters discloses a Hall Current accelerator with a solenoid Hall field, a collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes. The Hall field in this case is the end fringe field(s) of a common solenoid magnetic field.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: November 2, 2010
    Inventor: Mark Edward Morehouse
  • Patent number: 7781728
    Abstract: A device for transporting and focusing ions in a low vacuum or atmospheric-pressure region of a mass spectrometer is constructed from a plurality of longitudinally spaced apart electrodes to which oscillatory (e.g., radio-frequency) voltages are applied. In order to create a tapered field that focuses ions to a narrow beam near the device exit, the inter-electrode spacing or the oscillatory voltage amplitude is increased in the direction of ion travel.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: August 24, 2010
    Assignee: Thermo Finnigan LLC
    Inventors: Michael W. Senko, Viatcheslav V. Kovtoun, Paul R. Atherton, Jean Jacques Dunyach, Eloy R. Wouters, Maurizio Splendore, William Siebert
  • Patent number: 7772577
    Abstract: A particle beam therapy system using a spot scanning method includes a synchrotron, a beam transport system, an irradiation system, and a controller. A controller is configured to turn on a radio frequency electromagnetic field to be applied to an extraction system when a charged particle beam is to be supplied to the irradiation system, and turn off the radio frequency electromagnetic field to be applied to the extraction system when the supply of the charged particle beam to the irradiation system is to be blocked by means of an electromagnet provided in the beam transport system or in the synchrotron. The controller is also adapted to turn off a radio frequency acceleration voltage to be applied to an acceleration cavity in synchronization with the turning-off of the radio frequency electromagnetic field to be applied to the extraction device.
    Type: Grant
    Filed: August 13, 2008
    Date of Patent: August 10, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Kazuyoshi Saito, Hiroaki Sakurabata
  • Patent number: 7728312
    Abstract: An apparatus and method for partial ion implantation, which desirably provide control over the energy of the implanted dopants, generally includes an ion beam generator, and first and second deceleration units. The first deceleration unit decelerates the energy of an ion beam generated by the ion beam generator; and a subsequent, second deceleration unit further decelerates the energy into different energy levels according to regions of a wafer into which the ions are to be implanted.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: June 1, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Kyong Bong Rouh, Dong Seok Kim
  • Patent number: 7710007
    Abstract: Devices and methods for producing relativistic particles are provided. The devices and methods involve collision of a thin collimated plasma layer from opposite sides with two counter-propagating ultra-intense laser (UL) electromagnetic (EM) pulses. The plasma layer is sufficiently thin so that the pulses penetrate and conjointly propagate through the plasma layer. The Lorenz force between induced skin currents and the magnetic field of the propagating pulses accelerates a number of “in-phase” plasma particles to relativistic velocities.
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: May 4, 2010
    Assignee: William Marsh Rice University
    Inventor: Edison Liang
  • Patent number: 7679025
    Abstract: An apparatus for the formation of a dense plasma focus (DPF) has a center electrode formed about an axis, where the center electrode includes a cylindrical part and a tapered part. An outer electrode is formed about the center electrode, and may be either cylindrical, tapered, or formed from a plurality of individual conductors including a helical conductor arrangement surrounding the tapered region of the center conductor. The taper of the center electrode results in an enhanced azimuthal B field in the final region of the device, resulting in increased plasma velocity prior to the dense plasma focus. Using the outer electrode helical structure an auxiliary axial B field is generated during the final acceleration region of the plasma, which reduces axial modal tearing of the plasma in the final acceleration region.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: March 16, 2010
    Inventors: Mahadevan Krishnan, John R. Thompson
  • Patent number: 7675031
    Abstract: Auxiliary electrodes for creating drag fields may be provided as arrays of finger electrodes on thin substrates such as printed circuit board material for insertion between main RF electrodes of a multipole. A progressive range of voltages can be applied along lengths of the auxiliary electrodes by implementing a voltage divider that utilizes static resisters interconnecting individual finger electrodes of the arrays. Dynamic voltage variations may be applied to individual finger electrodes or to groups of the finger electrodes.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: March 9, 2010
    Assignee: Thermo Finnigan LLC
    Inventors: Michael Konicek, Adrian Land, Gershon Perelman, Lee Earley, Mark Hardman
  • Patent number: 7675252
    Abstract: A betatron structure having a donut-shaped vacuum chamber, wherein the vacuum chamber is made up of two or more pieces bonded together; an injector positioned within the vacuum chamber; and two or more magnets positioned to the outside of the vacuum chamber. A method of manufacturing a betatron structure, including: (a) fabricating two or more pieces; (b) positioning an injector on one of the two or more pieces; and (c) bonding the two or more pieces such that when bonded, the substrates form a hollow donut-shaped chamber.
    Type: Grant
    Filed: May 10, 2006
    Date of Patent: March 9, 2010
    Assignee: Schlumberger Technology Corporation
    Inventors: Felix K. Chen, Joyce Wong, Gary W. Corris, Stephen Balkunas, Zilu Zhou, James G. Haug
  • Patent number: 7663126
    Abstract: An ion implantation system and method of monitoring implant energy of an ion implantation device. The ion implantation system includes an ion implantation device and a monitoring device. The ion implantation device generates a plurality of charged particles and accelerates them with an accelerating voltage for ion implantation. The monitoring device performs spectroscopic analysis of the charged particles to obtain the real accelerating voltage. Thus, implant energy output by the ion implantation device can be calibrated.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: February 16, 2010
    Assignee: Chung Yuan Christian University
    Inventor: Szetsen Steven Lee
  • Patent number: 7631482
    Abstract: Conventional power supplies that actify the grids of electric rockets use an output capacitor to smooth the output DC voltage signal. Large capacitors tend to store a great amount of energy. Arcing acts to transfer this energy to create a well or pit on an accelerator grid of the electric rockets that may eventually cause repeating arcing or perforation on the accelerator grid. Various embodiments of the present invention eliminate or reduce the need to use an output capacitor. Additionally, various embodiments of the present invention use multiple phases of an input signal into the power supply to cause the output DC voltage signal to be substantially smooth.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: December 15, 2009
    Assignee: Aerojet-General Corporation
    Inventors: Geoffrey N. Drummond, Jeffery M. Monheiser
  • Patent number: 7629589
    Abstract: An apparatus and/or method for controlling an ion beam may be provided, and/or a method for preparing an extraction electrode for the same may be provided. In the apparatus, a plurality of extraction electrodes may be disposed in a path of an ion beam. At least one extraction electrode may include a plurality of sub-grids.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: December 8, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Wook Hwang, Do-Haing Lee, Chul-Ho Shin, Jong-Woo Sun
  • Publication number: 20090273284
    Abstract: A closed drift Hall Current accelerator with a split solenoid Hall field, a radial injection collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes, for injection of ions into the solenoid field. The Hall Effect field in this case is in the gap of the return field of the split solenoid magnetic field.
    Type: Application
    Filed: May 1, 2008
    Publication date: November 5, 2009
    Inventor: Mark Edward Morehouse
  • Patent number: 7609002
    Abstract: A plasma accelerating apparatus and a plasma processing system, which efficiently elevate a drift velocity of a plasma beam and are simple to manufacture and simple in construction. A channel includes an outlet port opening at an end of the channel. A gas supply portion supplies a gas in the channel. A plasma generator provides ionization energy to the gas in the channel to generate a plasma beam. A plasma accelerating portion includes a plurality of grids transversely arranged spaced apart from each other by a predetermined distance in the channel for accelerating the plasma beam generated by the plasma generator to the outlet port of the channel with an electric field. The plasma accelerating apparatus and the plasma processing system elevate a drift velocity of the plasma beam more efficiently than conventional accelerating apparatuses that use an electromagnetic force induced by a magnetic field and a secondary current.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: October 27, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Won-tae Lee
  • Patent number: 7579780
    Abstract: A power supply apparatus for controlling an ion accelerator includes a controller configured to adjust magnitude of ion acceleration in the ion accelerator. The controller controls an anode voltage applied to an anode electrode of the ion accelerator, a gas flow rate of gas flowing through a gas flow rate regulator of the ion accelerator, and magnetic flux density at an ion exit of the ion accelerator to satisfy a formula given as follows: 500 × 10 9 < ? · V a · Q d · S · B 2 where S is a sectional area of the ion exit [m2]; d is an ion accelerating region length [m]; ? is a magnetic flux bias ratio; Va is anode voltage [V]; Q is gas flow rate [sccm]; and B is magnetic flux density at the ion exit [T].
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: August 25, 2009
    Assignee: Mitsubishi Electric Corporation
    Inventors: Taichiro Tamida, Takafumi Nakagawa, Ikuro Suga, Hiroyuki Osuga, Toshiyuki Ozaki
  • Patent number: 7541558
    Abstract: Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: June 2, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
  • Patent number: 7459858
    Abstract: A Hall thruster with a shared magnetic structure including a plurality of plasma accelerators each including an anode and a discharge zone for providing plasma discharge. An electrical circuit having one or more cathodes connected to the plurality of plasma accelerators emits electrons that are attracted to the anode in each of the plasma accelerators. A shared magnetic circuit structure establishes a transverse magnetic field in each of the plurality of plasma accelerators that creates an impedance to the flow of electrons toward the anode in each of the plurality of plasma accelerators and enables ionization of a gas moving through one or more of the plurality of plasma accelerators. The impedance localizes an axial electric field in the plurality of plasma accelerators for accelerating ionized gas through the one or more of the plurality of plasma accelerators to create thrust.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: December 2, 2008
    Assignee: Busek Company, Inc.
    Inventors: Vladimir J. Hruby, Bruce Pote, Rachel A. Tedrake, Lawrence T. Byrne, James J. Szabo, Jr., Juraj Kolencik
  • Patent number: 7436122
    Abstract: Atoms of a propellant gas are ionized in a helicon plasma source, preferably in an annular area between inner and outer cylinders. The annular ionization area is aligned with an annular acceleration stage similar to the electrical-magnetic acceleration stage of a Hall effect thruster.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: October 14, 2008
    Assignee: Aerojet-General Corporation
    Inventors: Brian E. Beal, Roger M. Myers, Kristi H. de Grys, Alfred C. Wilson