Acceleration Patents (Class 315/111.61)
  • Patent number: 7459858
    Abstract: A Hall thruster with a shared magnetic structure including a plurality of plasma accelerators each including an anode and a discharge zone for providing plasma discharge. An electrical circuit having one or more cathodes connected to the plurality of plasma accelerators emits electrons that are attracted to the anode in each of the plasma accelerators. A shared magnetic circuit structure establishes a transverse magnetic field in each of the plurality of plasma accelerators that creates an impedance to the flow of electrons toward the anode in each of the plurality of plasma accelerators and enables ionization of a gas moving through one or more of the plurality of plasma accelerators. The impedance localizes an axial electric field in the plurality of plasma accelerators for accelerating ionized gas through the one or more of the plurality of plasma accelerators to create thrust.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: December 2, 2008
    Assignee: Busek Company, Inc.
    Inventors: Vladimir J. Hruby, Bruce Pote, Rachel A. Tedrake, Lawrence T. Byrne, James J. Szabo, Jr., Juraj Kolencik
  • Patent number: 7436122
    Abstract: Atoms of a propellant gas are ionized in a helicon plasma source, preferably in an annular area between inner and outer cylinders. The annular ionization area is aligned with an annular acceleration stage similar to the electrical-magnetic acceleration stage of a Hall effect thruster.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: October 14, 2008
    Assignee: Aerojet-General Corporation
    Inventors: Brian E. Beal, Roger M. Myers, Kristi H. de Grys, Alfred C. Wilson
  • Patent number: 7420182
    Abstract: This invention features a combined radio frequency (RF) and Hall Effect ion source and plasma accelerator system including a plasma accelerator having an anode and a discharge zone, the plasma accelerator for providing plasma discharge. A gas distributor introduces a gas into the plasma accelerator. A cathode emits electrons attracted to the anode for ionizing the gas and neutralizing ion flux emitted from the plasma accelerator. An electrical circuit coupled between the anode and the cathode having a DC power source provides DC voltage. A magnetic circuit structure including a magnetic field source establishes a transverse magnetic field in the plasma accelerator that creates an impedance to the flow of the electrons toward the anode to enhance ionization of the gas to create plasma and which in combination with the electric circuit establishes an axial electric field in the plasma accelerator.
    Type: Grant
    Filed: April 27, 2006
    Date of Patent: September 2, 2008
    Assignee: Busek Company
    Inventors: Vladimir Hruby, Kurt Hohman, Thomas Brogan
  • Publication number: 20080191629
    Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.
    Type: Application
    Filed: February 9, 2007
    Publication date: August 14, 2008
    Inventors: Michael Gutkin, Alexander Bizyukov, Vladimir Sleptsov, Ivan Bizyukov, Konstantin Sereda
  • Patent number: 7408303
    Abstract: A pulsed plasma accelerator includes two electrodes (1) arranged between dielectric bars (2) made from an ablating material, a discharge channel with an open end part whose walls are defined by the surfaces of electrodes (1) and dielectric bars (2), an energy accumulator (11) and current supplies (14,15) for connecting the electrodes (1) with the energy accumulator (11). The current supplies (14, 15) define in conjunction with the electrodes (1) and the energy accumulator (11) an external electric circuit, with characteristics of the external electric circuit being selected on the condition: 2?C/L, where C (?F) is the electric capacitance of the external electric circuit, and L is the inductance of the external electric circuit, L?100 nH. During operation of the plasma accelerator, quazi-nonperiodic pulse discharges are ignited and maintained in the discharge channel.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: August 5, 2008
    Assignee: Gosudarstvennoe Nauchnoe Uchrezhdenic “Gosudarstvenny Nauchno-Issledovatelsky Institut Prikladnoi Mechanik I Elektrodinamiki”
    Inventors: Nikolay Nikolaevich Antropov, Grigory Alexandrovich Diyakonov, Michail Michailovich Orlov, Garry Alekseevich Popov, Valery Konstantinovich Tyutin, Vladimir Nikolaevich Yakovlev
  • Patent number: 7400094
    Abstract: A device for generating a particle beam includes a particle source, and a structure having a first section and a second section, the first section coupled to the particle source, the first section having a first power input, and the second section having a second power input, wherein the first section is configured to produce a particle beam having a first energy E1, and the second section is configured to increase or decrease the first energy E1 by an amount E2, the absolute value of E2 being less than E1.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: July 15, 2008
    Assignee: Varian Medical Systems Technologies, Inc.
    Inventor: Gard E. Meddaugh
  • Publication number: 20080164820
    Abstract: An ion gun 11 supplies an Ar gas into a main body 111 from a gas inlet 114, causes DC hot cathode discharge between a filament 113 and an anode 112 to generate Ar plasma. Next, a voltage gradient is applied to separated accelerator grids 116a, 116b having a bi-separated configuration in an ion ejecting direction. The each potential of the separated accelerator grids 116a, 116b is independently controlled by independently setting accelerator control switches 121a, 121b on or off to change the potential of that of the separated accelerator grids 116a, 116b which corresponds to an ion beam to be disabled.
    Type: Application
    Filed: November 28, 2007
    Publication date: July 10, 2008
    Applicant: SHOWA SHINKU CO., LTD.
    Inventors: Yusuke Osada, Tadahisa Shiono, Yutaka Yabe, Makoto Ito
  • Patent number: 7381949
    Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: June 3, 2008
    Assignee: Coincident Bearns Licensing Corporation
    Inventor: Michael Mauck
  • Publication number: 20080116808
    Abstract: A method to manipulate a fluid flow over a surface is provided. This method may be used to reduce drag, improve the lift to drag (L/D) ratio, attach fluid flow, or reduce flow noise at the surface. This involves flowing a fluid over the surface wherein the fluid contains positively charged ions and electrons. An electric field accelerates ions and electrons in directions parallel to the electric field. A magnetic field at the surface redirects ions and electrons based on their velocity and charge. The magnetic field imparts little force on the relatively heavy and slow moving positive ions but has a significant impact on the relatively fast moving, light weight electrons. This results in a non-zero net change in the total momentum of the positive ions and electrons allowing thrust to be realized. This thrust may be sufficient for vehicle propulsion or manipulation of the fluid flow around the vehicle.
    Type: Application
    Filed: November 22, 2006
    Publication date: May 22, 2008
    Inventors: Paul D. McClure, Charles J. Chase
  • Patent number: 7309961
    Abstract: A plasma accelerator (300) is disclosed that has three separate sections of coils (301-316) disposed outside the plasma chamber (321). The separate sections of coils include an initial discharge section (309-316), an acceleration section (303-308), and a nozzle section (301-302). Each section of coils is driven by signals of a different frequency to more efficiently discharge and accelerate a plasma in the plasma accelerator (300).
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: December 18, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-taek Park, Vladimir Volynets
  • Patent number: 7294969
    Abstract: Disclosed is a high-frequency discharge plasma generation-based two-stage Hall-effect plasma accelerator, which comprises an annular acceleration channel having a gas inlet port, a high-frequency wave supply section, an anode, a cathode, a neutralizing electron generation portion and a magnetic-field generation element, wherein: gas introduced from the gas inlet port into the annular acceleration channel is ionized by a high-frequency wave supplied from the high-frequency wave supply section, to generate plasma; a positive ion includes in the generated plasma is accelerated by an acceleration voltage applied between the anode and cathode, and ejected outside; and an electron included in the generated plasma is restricted in its movement in the axial direction of the annular acceleration channel by an interaction with a magnetic field.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: November 13, 2007
    Assignee: Japan Aerospace Exploration Agency
    Inventor: Hitoshi Kuninaka
  • Patent number: 7276140
    Abstract: A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a circular channel comprising an inner wall, an outer wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the inner and outer walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas inside the channel to generate a plasma beam, and to accelerate the generated plasma beam toward the outlet port, wherein one of the inner wall and outer wall of the channel is inclined at an angle so that the other end of the wall is located closer to a center of the plasma accelerating apparatus.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: October 2, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-woo Yoo, Won-taek Park
  • Patent number: 7262564
    Abstract: An electrostatic fluid acceleration and method of operation thereof includes at least two synchronously powered stages. A single power supply or synchronized and phase controlled power supplies provide high voltage power to each of the stages such that both the phase and amplitude of the electric power applied to the corresponding electrodes are aligned in time. The frequency and phase control allows neighboring stages to be closely spaced at a distance of from 1 to 2 times an inter-electrode distance within a stage, and, in any case, minimizing or avoiding production of a back corona current from a corona discharge electrode of one stage to an electrode of a neighboring stage. Corona discharge electrodes of neighboring stages may be horizontally aligned, complementary collector electrodes of all stages being similarly horizontally aligned between and horizontally offset from the corona discharge electrodes.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: August 28, 2007
    Assignee: Kronos Advanced Technologies, Inc.
    Inventors: Igor A. Krichtafovitch, Vladimir L. Gorobets
  • Patent number: 7247992
    Abstract: For an ion accelerator system having a special magnetic field structure with an alternating predominantly longitudinal and crosswise progression of the magnetic field, a geometry of the ionization chamber having a non-cylindrical shape of the chamber wall that is adapted to the progression of the magnetic field is proposed.
    Type: Grant
    Filed: December 13, 2003
    Date of Patent: July 24, 2007
    Assignee: Thales Electron Devices GmbH
    Inventors: Günter Kornfeld, Gregory Coustou, Norbert Koch
  • Patent number: 7247993
    Abstract: The invention relates to an ion accelerator arrangement which uses a combination of a magnetic field having a cusp structure and a cross-section of an ionisation chamber that is extended in one direction transversally in relation to the longitudinal axis. This enables the ionic current to be advantageously scaled.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: July 24, 2007
    Assignee: Thales Electron Devices GmbH
    Inventors: Günter Kornfeld, Gregory Coustou, Norbert Koch
  • Patent number: 7183515
    Abstract: A plasma jet system includes a housing with an opening. A plasma generator is coupled to ionize a fluid in the housing. An electromagnetic accelerator is coupled to generate an electric field that accelerates ionized fluid in the housing toward the opening. A controller can modulate the frequency of the electric field to cause the ionized fluid to form a plasma vortex flow through the opening. A magnetic field is applied normal to the direction of the plasma vortex flow to mitigate the momentum of the electrons. The electrons slowed by the magnetic field can be collected and conducted to a location where they are re-inserted into the plasma vortex flow to maintain charge neutrality.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: February 27, 2007
    Assignee: Lockhead-Martin Corporation
    Inventors: Daniel N. Miller, Paul D. McClure, Charles J. Chase, Robert R. Boyd
  • Patent number: 7180243
    Abstract: The closed electron drift plasma accelerator comprises an annular ionization chamber, an acceleration chamber on the same axis as the ionization chamber, an annular anode, a hollow cathode, a first DC voltage source, an annular gas manifold, a magnetic circuit, and magnetic field generators. A coaxial annular coil is placed in the cavity of the ionization chamber, is provided with bias conductive cladding connected, together with the electrically-conductive material of the inside faces of the walls of the ionization chamber, to the positive pole of a second voltage source whose negative pole is connected to the anode, and constitutes an additional magnetic field generator which, together with the other magnetic field generators, forms a magnetic field having a magnetic line of force with an “X” point corresponding to a magnetic field zero situated between the coaxial annular coil and the anode.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: February 20, 2007
    Assignee: SNECMA Moteurs
    Inventors: Olivier Secheresse, Antonina Bougrova, Alexei Morozov
  • Patent number: 7174703
    Abstract: An ion thrusting system is disclosed comprising an ionization membrane having at least one area through which a gas is passed, and which ionizes the gas molecules passing therethrough to form ions and electrons, and an accelerator element which accelerates the ions to form thrust. In some variations, a potential is applied to the ionization membrane may be reversed to thrust ions in an opposite direction. The ionization membrane may also include an opening with electrodes that are located closer than a mean free path of the gas being ionized. Methods of manufacture and use are also provided.
    Type: Grant
    Filed: February 26, 2004
    Date of Patent: February 13, 2007
    Assignee: Ionfinity LLC
    Inventor: Frank T. Hartley
  • Patent number: 7161158
    Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: January 9, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Dror Shemesh, Dubi Shachal
  • Patent number: 7119491
    Abstract: A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.
    Type: Grant
    Filed: May 19, 2005
    Date of Patent: October 10, 2006
    Assignee: The Regents of the University of California
    Inventors: Norman Rostoker, Michl Binderbauer, Artan Qerushi, Hooshang Tahsiri
  • Patent number: 7084572
    Abstract: The invention relates to various advantageous embodiments of a plasma-accelerator configuration, especially for the configuration and design of electron sources used for ionizing the working gas and/or neutralizing the discharged plasma jet.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: August 1, 2006
    Assignee: Thales Electron Devices GmbH
    Inventors: Günter Kornfeld, Werner Schwertfeger, Roland Lenz, Gregory Coustou
  • Patent number: 7078852
    Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: July 18, 2006
    Assignee: Coincident Beams Licensing Corporation
    Inventor: Michael Mauck
  • Patent number: 7053389
    Abstract: The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member provided in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributes to cutting a time required for treatment per patient and increasing the number of patients treated.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: May 30, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Masaki Yanagisawa, Hiroshi Akiyama, Koji Matsuda, Hisataka Fujimaki
  • Patent number: 7053565
    Abstract: An electrostatic fluid acceleration and method of operation thereof includes at least two synchronously powered stages with final or rear-most electrodes of one stage maintained at substantially the same instantaneous voltage as the immediately adjacent initial or forward-most electrodes of a next stage in an airflow direction. A single power supply or synchronized and phase controlled power supplies provide high voltage power to each of the stages such that both the phase and amplitude of the electric power applied to the corresponding electrodes are aligned in time. The frequency and phase control allows neighboring stages to be closely spaced at a distance of from 1 to 2 times an inter-electrode distance within a stage, and, in any case, minimizing or avoiding production of a back corona current from a corona discharge electrode of one stage to an electrode of a neighboring stage.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: May 30, 2006
    Assignee: Kronos Advanced Technologies, Inc.
    Inventors: Igor A. Krichtafovitch, Vladimir L. Gorobets
  • Patent number: 7049736
    Abstract: Background plasma electrons in a laser wake field are trapped and accelerated using a sharp downward density transition. A short and intense laser pulse travels through low density plasma with a sharp downward density transition. The density transition scale length is much smaller than the wavelength of a laser wake wave. As the laser wake wave passes the density transition, its wavelength increases suddenly so that some background plasma electrons are self-injected into the acceleration phase of the wake field and trapped and accelerated by the strong laser wake field.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: May 23, 2006
    Assignee: Korea Electrotechnology Research Institute
    Inventors: Hy-yong Suk, Guang-Hoon Kim, Jong-Uk Kim, Chang-Bum Kim, Hae-June Lee
  • Patent number: 7045792
    Abstract: A charged particle buncher with a series of spaced apart electrodes 1 arranged to generate a shaped electric field, the series comprising a first electrode 1a, a last electrode 1b and one or more intermediate electrodes, wherein the shaped electric field is generated substantially without free charges being transferred onto or away from the intermediate electrode or electrodes. The first and last electrodes may be connected to means for transferring charged on to or off the electrode. The first, intermediate and last electrodes may be connected in serried with capacitors.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: May 16, 2006
    Assignee: Scientific Analysis Instruments, Ltd.
    Inventors: Victor Carl Parr, Stephen Paul Thompson, Mark Duncan Mills
  • Patent number: 7045793
    Abstract: A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed having two shield grids. The extraction grid has a high positive potential and covers a plasma chamber containing plasma. The acceleration grid has a non-positive potential. The focus grid is positioned between the acceleration grid and the shield grid. The combination of the extraction grid and the acceleration grid extracts ions from the plasma. The focus grid acts to change momentum of the ions exiting the acceleration grid, focusing the ions into a more collimated ion beam than previous approaches. In one embodiment, the focus grid has a large positive potential. In another embodiment, the focus grid has a large negative potential.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: May 16, 2006
    Assignee: Veeco Instruments, Inc.
    Inventor: Erik Karl Kristian Wåhlin
  • Patent number: 7030576
    Abstract: A Hall effect thruster for propelling spacecraft and satellites includes at least two acceleration channels, each of the channels has a closed end and an open end, and a plurality of flux guides adjacent each of the channels. The plurality of flux guides includes an innermost flux guide, an outermost flux guide, and at least one intermediate flux guide. Each intermediate flux guide helps provide a magnetic field to each of two adjacent acceleration channels.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: April 18, 2006
    Assignee: United Technologies Corporation
    Inventors: John B. McVey, Andrew S. Perrucci, Edward J. Britt
  • Patent number: 7030398
    Abstract: A system and method of accelerating ions in an accelerator to optimize the energy produced by a light source. Several parameters may be controlled in constructing a target used in the accelerator system to adjust performance of the accelerator system. These parameters include the material, thickness, geometry and surface of the target.
    Type: Grant
    Filed: March 1, 2005
    Date of Patent: April 18, 2006
    Assignee: The Regents of the University of California
    Inventor: Toshiki Tajima
  • Patent number: 6982520
    Abstract: An efficiency enhancing anode-magnetic structure of a Hall effect thruster produces a radially directed magnetic field between inner and outer poles at the exit portion of a gas distribution channel. The field-shaping structure includes magnetic material extending alongside the channel with an associated secondary flux-generating component to create an axially directed magnetic field in the area between the anode of the thruster and the exit portion of the gas distribution channel.
    Type: Grant
    Filed: September 10, 2002
    Date of Patent: January 3, 2006
    Assignee: Aerojet-General Corporation
    Inventor: Kristi H. de Grys
  • Patent number: 6960888
    Abstract: A method of producing and accelerating an ion beam comprising the steps of: providing a magnetic field with a cusp that opens in an outward direction along a centerline that passes through a vertex of the cusp: providing an ionizing gas that sprays outward through at least one capillary-like orifice in a plenum that is positioned such that the orifice is on the centerline in the cusp, outward of the vortex of the cusp; providing a cathode electron source, and positioning it outward of the orifice and off of the centerline; and positively charging the plenum relative to the cathode electron source such that the plenum functions as an anode. A hot filament may be used as the cathode electron source, and permanent magnets may be used to provide the magnetic field.
    Type: Grant
    Filed: January 5, 2004
    Date of Patent: November 1, 2005
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventor: John E. Foster
  • Patent number: 6929712
    Abstract: A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the chamber. The high-frequency current detector outputs the detected high-frequency current to a computer. The computer compares the high-frequency current received from the high-frequency current detector with a reference high-frequency current. When the received high-frequency current matches the reference high-frequency current, the computer determines that the process performance is normal. Otherwise, the computer determines that the process performance is abnormal. In this way, high-frequency characteristics specific to the apparatus are detected and the process performance are evaluated based on the detected high-frequency characteristics.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: August 16, 2005
    Assignee: Renesas Technology Corp.
    Inventors: Minoru Hanazaki, Keiichi Sugahara, Toshihiko Noguchi, Toshio Komemura, Masakazu Taki, Mutumi Tuda, Kenji Shintani
  • Patent number: 6906338
    Abstract: A system and method of accelerating ions in an accelerator to optimize the energy produced by a light source. Several parameters may be controlled in constructing a target used in the accelerator system to adjust performance of the accelerator system. These parameters include the material, thickness, geometry and surface of the target.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: June 14, 2005
    Assignee: The Regents of the University of California
    Inventor: Toshiki Tajima
  • Patent number: 6906453
    Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: June 14, 2005
    Assignee: Coincident Beams Licensing Corporation
    Inventor: Michael Mauck
  • Patent number: 6897617
    Abstract: A method to limit ozone production in wind ion devices while simultaneously realizing incidents of high acceleration in such devices varies the high voltage potential across the array of emitter(s) (10) and collectors (20) over time in such a manner as to generate a wave effect of airflow. The variance may be achieved by switching, ramping, or gating the high voltage potential delivered to the array.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: May 24, 2005
    Assignee: Zenion Industries, Inc.
    Inventor: Jim L. Lee
  • Patent number: 6873123
    Abstract: The invention concerns a device (10) for regulating the intensity of a beam extracted from a particle accelerator, such as a cyclotron, used for example for protontherapy, said particles being generated from an ion source. The invention is characterized in that it comprises at least: a comparator (90) determining a difference ? between a digital signal IR representing the intensity of the beam measured at the output of the accelerator and a setpoint value IC of the beam intensity: a Smith predictor (80) which determines on the basis of the difference ?, a correct value of the intensity of the beam IP; an inverted correspondence table (40) supplying, on the basis of the corrected value of the intensity of the beam IP, a setpoint value IA for supply arc current from the ion source (20).
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: March 29, 2005
    Assignee: Ion Beam Applications S.A.
    Inventors: Bruno Marchand, Bertrand Bauvir
  • Patent number: 6815880
    Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
    Type: Grant
    Filed: May 2, 2003
    Date of Patent: November 9, 2004
    Assignee: Coincident Beams Licensing Corporation
    Inventor: Michael Mauck
  • Patent number: 6798141
    Abstract: For a plasma accelerator arrangement having a focused electron beam introduced into a plasma chamber, an annular structure of the chamber and a hollow cylindrical form of the electron beam are presented. A beam-guiding magnet system and, if appropriate, an electrode system is preferably formed in a plurality of stages in an adapted toroidal form.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: September 28, 2004
    Assignee: Thales Electron Devices GmbH
    Inventors: Günter Kornfeld, Werner Schwertfeger
  • Publication number: 20040183452
    Abstract: The invention relates to various advantageous embodiments of a plasma-accelerator configuration, especially for the configuration and design of electron sources used for ionizing the working gas and/or neutralizing the discharged plasma jet.
    Type: Application
    Filed: May 17, 2004
    Publication date: September 23, 2004
    Inventors: Gunter Kornfeld, Werner Schwertfeger, Roland Lenz, Gregory Coustou
  • Patent number: 6753652
    Abstract: An ion implanter having means for scanning an ion beam on a wafer is provided, wherein the scanning means, on which the wafer is mounted, moves the wafer in a region where the ion beam is irradiated. A detecting means, which is fixedly mounted adjacent to the scanning means, detects the ion beam that is overly scanned out of the scanning means. The detecting means has an inclined surface so that a portion of the detecting means adjacent to the scanning means is positioned below a surface of the wafer that is disposed on the scanning means. Accordingly, the ion implanter may prevent the wafer in the scanning means from being polluted with sputtering particles generated from a surface of the scanning means.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: June 22, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Won-Ju Kim
  • Patent number: 6744225
    Abstract: The present invention mainly relates to an ion accelerator with significantly simplified construction, for accelerating an much larger amount of ions, wherein that a plasma-generating target 12, a vacuum chamber 16 for extracting ions from plasma generated from the plasma-generating target 12, and an ion linac 30 are connected in series, the vacuum chamber 16 is installed near an ion entrance of the ion linac 30, the ion accelerator also has a high voltage power supply boosting the vacuum chamber 16 to a desired voltage, and ions are directly injected from the vacuum chamber 16 to the ion linac 30.
    Type: Grant
    Filed: May 1, 2002
    Date of Patent: June 1, 2004
    Assignee: Riken
    Inventors: Masahiro Okamura, Takeshi Takeuchi, Toshiyuki Hattori
  • Patent number: 6735935
    Abstract: A pulsed Hall thruster system includes a Hall thruster having an electron source, a magnetic circuit, and a discharge chamber; a power processing unit for firing the Hall thruster to generate a discharge; a propellant storage and delivery system for providing propellant to the discharge chamber and a control unit for defining a pulse duration &tgr;<0.1d3&rgr;/{dot over (m)}, where d is the characteristic size of the thruster, &rgr; is the propellant density at standard conditions, and {dot over (m)} is the propellant mass flow rate for operating either the power processing unit to provide to the Hall thruster a power pulse of a pre-selected duration, &tgr;, or operating the propellant storage and delivery system to provide a propellant flow pulse of duration, &tgr;, or providing both as pulses, synchronized to arrive coincidentally at the discharge chamber to enable the Hall thruster to produce a discreet output impulse.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: May 18, 2004
    Assignee: Busek Company
    Inventors: Vladimir J. Hruby, Bruce M. Pote, Manuel Gamero-Castano
  • Publication number: 20040070349
    Abstract: A plasma impulse device/method has been developed to provide impulses that can be used for thrust. A field device produces electric and magnetic fields, which E×B drifts a charged portion in the ambient environment, resulting in thrust of the field device.
    Type: Application
    Filed: May 20, 2003
    Publication date: April 15, 2004
    Inventor: John P. Keady
  • Patent number: 6670767
    Abstract: A method for generating a closely spaced train of extremely high voltage short pulses. The method involves generating the train of pulses by combining a plurality of harmonic amplitudes to construct said pulses, via a Fourier construction. Any arbitrary pulse shape can be reproduced simply by changing the amplitude of the harmonics. The train of high voltage electrical pulses produced by the method of the present invention is particularly well suited for the acceleration of particles by applying the pulses to an appropriate accelerating structure, or the pulses can be used to drive an undulator/wiggler.
    Type: Grant
    Filed: October 30, 2001
    Date of Patent: December 30, 2003
    Assignee: FELtech Corporation
    Inventor: Francesco Villa
  • Patent number: 6646383
    Abstract: A device for use in a linear accelerator operable to accelerate charged particles along a beam axis is disclosed. The device includes a plurality of monolithic members connected to form a series of accelerating cavities aligned along the beam axis and coupling cavities. Each of the coupling cavities intersects with adjacent accelerating cavities at first and second coupling apertures. The first and second coupling apertures have different sizes.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: November 11, 2003
    Assignee: Siemens Medical Solutions USA, Inc.
    Inventors: Kirk Joseph Bertsche, Chong-Guo Yao
  • Patent number: 6640535
    Abstract: A linear gridless ion thruster (LGIT) is provided to serve as an ion source for spacecraft propulsion or plasma processing. The LGIT is composed of two stages: (1) an ionization stage composed of a hollow cathode, anode, and cusp magnetic field circuit to ionize the propellant gas; and (2) an acceleration stage composed of a downstream cathode, upstream anode, and a radial magnetic field circuit to accelerate ions created in the ionization stage. The LGIT replaces grids used in conventional ion thrusters (Kaufman guns) to accelerate ions with Hall-current electrons as in the case with conventional Hall thrusters.
    Type: Grant
    Filed: June 13, 2002
    Date of Patent: November 4, 2003
    Assignee: The Regents of the University of Michigan
    Inventors: Alec D. Gallimore, Brian Beal
  • Patent number: 6635998
    Abstract: An ion beam processing apparatus and a method of operating an ion source therefore are provided for reducing the frequency of breakdown due to particles, and for increasing an apparatus available time by operating the apparatus in a stable state for a long time and minimizing maintenance operations such as cleaning for the apparatus, and so on. A plasma generating gas is introduced into a vacuum chamber formed of a processing chamber and an ion source mounted thereto to produce a plasma from the gas, and an electric field is applied within the vacuum chamber to extract ions within the plasma as an ion beam. The ion source comprises an arc power supply, an acceleration power supply for applying an acceleration electrode with a positive potential to extract an ion beam, and a deceleration power supply for applying a deceleration electrode with a negative potential to prevent ions from flowing into the ion source.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: October 21, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Shigeru Tanaka, Isao Hashimoto
  • Patent number: 6635883
    Abstract: Incorporating the use of a permanent magnet within a GCIB apparatus to separate undesirable monomer ions from a gas cluster ion beam to facilitate improved processing of workpieces. In an alternate embodiment, the effect of the permanent magnet may be controlled by the use of an electrical coil. The above system eliminates problems related to power consumption and heat generation.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: October 21, 2003
    Assignee: Epion Corporation
    Inventors: Richard P. Torti, Jerald P. Dykstra
  • Publication number: 20030184235
    Abstract: An object of the present invention is to provide an apparatus for producing stable plasma. Another object of the present invention is to provide an apparatus having a long-lasting cathode electrode which is superior in field emission characteristic since the plasma density has to be raised in order to increase the throughput. The structure of the plasma producing apparatus of the present invention relates to a plasma producing apparatus with a plasma chamber surrounded by walls to make material gas into plasma, characterized in the plasma chamber has a cathode electrode, an anode electrode, means for introducing the material gas, and exhaust means, and that a carbon nano tube is formed on a surface of the cathode electrode and the anode electrode is formed on the surface of the cathode electrode.
    Type: Application
    Filed: March 19, 2003
    Publication date: October 2, 2003
    Applicant: Semiconductor Energy Laboratory Co., Ltd
    Inventor: Osamu Nakamura
  • Patent number: 6611087
    Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.
    Type: Grant
    Filed: August 6, 2002
    Date of Patent: August 26, 2003
    Assignee: Coincident Beams Licensing Corporation
    Inventor: Michael Mauck