With Developing Patents (Class 355/27)
  • Patent number: 11328148
    Abstract: The present disclosure provides a touch panel, a fingerprint recognition method thereof, a method for manufacturing a touch panel and a display device. The touch panel includes multiple driving electrode groups and multiple, sensing electrodes which are intersected with and insulated from each other, each of the driving electrode groups comprises a plurality of driving electrodes, each driving electrodes is coupled to a scanning line, and the method includes: a first scanning step of performing a first scanning on each of the driving electrode groups by using scanning lines to detect a sensing signal generated by a sensing electrode being touched; a determining step of determining a driving electrode group being touched according to the detected sensing signal; a second scanning step of sequentially performing a second scanning on the driving electrodes in the determined driving electrode group being touched to obtain a valley or a ridge of a fingerprint.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: May 10, 2022
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Pengpeng Wang, Xue Dong, Haisheng Wang, Xiaoliang Ding, Chihjen Cheng, Yanling Han, Wei Liu, Xueyou Cao, Rui Xu, Yuzhen Guo, Ping Zhang
  • Patent number: 11307504
    Abstract: A layer is formed over a wafer. The layer contains a material that is sensitive to an extreme ultraviolet (EUV) radiation. A first baking process is performed to the layer. The first baking process is performed with a first humidity level that is greater than about 44%. After the first baking process, the layer is exposed to EUV radiation. A second baking process is performed to the layer. The second baking process is performed with a second humidity level that is greater than about 44%. The layer is rinsed with a liquid that contains water before the second baking process or after the second baking process. After the exposing, the layer is developed with a developer solution that contains water.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: April 19, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng
  • Patent number: 11262662
    Abstract: Implementations described herein relate to a platform apparatus for post exposure processing. In one implementation, a platform apparatus includes a plumbing module and a process module. The process module further includes a central region having a robot disposed therein, and a plurality of process stations disposed about the central region and sharing the plumbing module. Each process station includes a process chamber and a post process chamber in a stacked arrangement. The process chamber includes a chamber body defining a process volume, a door coupled to the chamber body, a first electrode coupled to the door, and a power source communicatively coupled to the first electrode.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: March 1, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Patent number: 11161109
    Abstract: A joint point-of-care testing (POCT) analyzer, and a system comprising an analyzer and a cartridge, for measuring one or more analyte quantities per unit volume of blood and one or more formed element quantities per unit volume of blood, is described. Examples of formed elements of blood are red blood cells and white blood cells, and cell counts are determined by imaging using a two-dimensional multi-channel detector. Examples of analytes are hemoglobin and bilirubin, and hemoglobin and bilirubin concentrations are determined by spectroscopy using a one-dimensional multi-channel detector. Other examples of analytes are electrolytes, and electrolyte concentrations may be determined using biosensors incorporated in the cartridges.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: November 2, 2021
    Assignee: INVIDX CORP.
    Inventor: James Samsoondar
  • Patent number: 11127613
    Abstract: A substrate treating apparatus and a substrate transporting method. An ID block 2, a coating block 3, a developing block 4, and an IF block 6 are arranged in this order. A platform 13 is placed on the ID block 2, and a platform 47 is placed on the IF block 6. A currently-used carrier platform is provided only on an ID block. Accordingly, a substrate is transported in both a forward path and a return path between the ID block and the IF block. According to the disclosure, a substrate W is transported from the IF block 6 to the developing block 4 in the return path, and thereafter, the substrate W is returned back from the developing block 4 to the IF block 6 without being transported to the coating block 3. Consequently, transportation process by the coating block 3 in the return path is reduced so that an entire throughput of a substrate treating apparatus 1 can be enhanced.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: September 21, 2021
    Inventor: Joji Kuwahara
  • Patent number: 10985007
    Abstract: Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: April 20, 2021
    Assignee: SEMES CO. LTD.
    Inventor: Kwangsup Kim
  • Patent number: 10921713
    Abstract: A developing method includes: forming a liquid pool of a diluted developing solution diluted with pure water in a central portion of a substrate; forming a liquid film of the diluted developing solution on a surface of the substrate by accelerating rotation of the substrate to diffuse the liquid pool of the diluted developing solution on the entire surface of the substrate; and then supplying a developing solution onto the substrate. Supplying a developing solution includes: supplying the developing solution from a developing solution supply nozzle having a liquid contact surface while securing a gap having a predetermined size between the developing solution supply nozzle and the substrate; and moving the developing solution supply nozzle in a radial direction passing through a center of the substrate while forming a liquid pool of the developing solution between the substrate and the liquid contact surface of the developing solution supply nozzle.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: February 16, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koshi Muta, Hideharu Kyoda, Minoru Kubota
  • Patent number: 10908514
    Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: February 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Janneke Ravensbergen, Duygu Akbulut, Nitesh Pandey, Jin Lian
  • Patent number: 10884337
    Abstract: A substrate processing apparatus includes: a plurality of unit blocks, each having a plurality of modules for processing substrates and a substrate transfer path; a plurality of main transfer mechanisms, each being provided on the substrate transfer path, and configured to transfer the substrates among the plurality of modules; a loading and unloading transfer mechanism configured to load and unload the substrates with respect to each of the unit blocks; a memory configured to store substrate transfer history for each of the unit blocks; and a setting part configured to update a cycle time, which is a time required for a corresponding one of the main transfer mechanisms to move around the substrate transfer path once, of each of the unit blocks based on the substrate transfer history, and configured to set a transfer schedule of the substrates in each of the unit blocks based on the updated cycle time.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: January 5, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Kenichirou Matsuyama
  • Patent number: 10866524
    Abstract: A method includes selecting a group of wafers, each of the wafers having a resist pattern; selecting a group of fields for each of the wafers; selecting one or more points on each of the fields; measuring overlay errors on the resist pattern at locations associated with the one or more points selected on the respective wafers; and generating a combined overlay correction map based on measurements of the overlay errors on the wafers. At least one of the selecting of the group of wafers, the selecting of the group of fields, and the selecting of the one or more points is based on a computer-generated model.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: December 15, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yang-Hung Chang, Chih-Ming Ke, Kai-Hsiung Chen
  • Patent number: 10840096
    Abstract: A substrate on which a processing film made of a directed self-assembly material is formed is placed on a holding plate incorporating a preheating mechanism, and is preheated. A low oxygen atmosphere surrounds the substrate. A preheating temperature is a temperature at which the directed self-assembly material comprised of two types of polymers is phase-separated. By preheating the processing film, the two types of polymers are phase-separated to form a fine pattern. The processing film is irradiated with flashes of light from flash lamps while being preheated. This increases the fluidity of the polymers constituting the processing film to achieve the formation of a fine pattern while suppressing the occurrence of defects.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: November 17, 2020
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Takahiro Yamada, Masahiko Harumoto, Yuji Tanaka
  • Patent number: 10670540
    Abstract: A photolithography method includes dispensing a first liquid onto a first target layer formed over a first wafer through a nozzle at a first distance from the first target layer; capturing an image of the first liquid on the first target layer; patterning the first target layer after capturing the image of the first liquid; comparing the captured image of the first liquid to a first reference image to generate a first comparison result; responsive to the first comparison result, positioning the nozzle and a second wafer such that the nozzle is at a second distance from a second target layer on the second wafer; dispensing a second liquid onto the second target layer formed over the second wafer through the nozzle at the second distance from the second target layer; and patterning the second target layer after dispensing the second liquid.
    Type: Grant
    Filed: December 19, 2018
    Date of Patent: June 2, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi-Hung Liao, Wei Chang Cheng
  • Patent number: 10656524
    Abstract: A substrate on which exposure processing has not been performed is carried into a placement cooling unit and cooled. The cooled substrate is held and carried out from the placement cooling unit by a transport device. In the case where an exposure device is able to receive the substrate, the substrate that has been carried out from the placement cooling unit is transported to the exposure device by the transport device. In the case where the exposure device is unable to receive the substrate, the substrate that has been carried out from the platform cooling unit is carried into a cooling buffer unit by the transport device. In the cooling buffer unit, a temperature of the substrate is maintained. After the exposure device becomes able to receive the substrate, the substrate is carried out from the cooling buffer unit and transported to the exposure device by the transport device.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: May 19, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Koji Nishiyama, Kazuhiro Inoue
  • Patent number: 10632733
    Abstract: Method for producing flexographic printing plates from a photopolymerizable flexographic printing plate with a dimensionally stable support, photopolymerizable, relief-forming layer(s), and a digitally imagable layer. The method comprises (a) producing a mask by imaging the digitally imagable layer, (b) exposing the flexographic printing plate with a plurality of UV-LEDs on a UV-LED strip through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photopolymerized layer. In the UV-LED strip or in a separate strip, at least one ultrasonic sensor is arranged for determining the thickness of the flexographic printing plate for exposure. Depending on the measured thickness of the flexographic printing plate, the exposing of the flexographic printing plate is controlled in respect of: (i) number of exposure steps, exposure intensity, energy input per exposure step, duration of the individual exposure steps, and/or overall duration of exposure.
    Type: Grant
    Filed: January 3, 2018
    Date of Patent: April 28, 2020
    Assignee: Flint Group Germany GmbH
    Inventor: Frank Boyksen
  • Patent number: 10627723
    Abstract: A defect prediction method for a device manufacturing process involving production substrates processed by a lithographic apparatus, the method including training a classification model using a training set including measured or determined values of a process parameter associated with the production substrates processed by the device manufacturing process and an indication regarding existence of defects associated with the production substrates processed in the device manufacturing process under the values of the process parameter, and producing an output from the classification model that indicates a prediction of a defect for a substrate.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: April 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Willem Maria Julia Marcel Coene, Frank Arnoldus Johannes Maria Driessen, Adrianus Cornelis Matheus Koopman, Markus Gerardus Martinus Maria Van Kraaij
  • Patent number: 10589499
    Abstract: A processing machine includes: (A) a lamination module including: (A1) a supply roller on which a band carrying a protective film or a layer of varnish to be deposited is wound, (A2) a recovery roller on which the band is wound after the protective film or layer of varnish has been applied to a plastic card, (A3) a heating roller disposed between the supply roller and the recovery roller, (A4) a backing roller disposed against the heating roller, and (A5) a constraining roller; (B) an insertion system defining, with the heating roller, an upstream transfer path along which the plastic card moves as far as the heating roller; (C) a discharge system defining, with the backing roller, a downstream transfer path along which the plastic card moves from the backing roller. The constraining roller is disposed across the downstream transfer path.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: March 17, 2020
    Assignee: EVOLIS
    Inventors: Romain Grimault, Anthony Chiron
  • Patent number: 10527945
    Abstract: A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: January 7, 2020
    Assignee: Nikon Corporation
    Inventors: Masaki Kato, Tohru Kiuchi
  • Patent number: 10453692
    Abstract: Techniques herein include systems and methods for correcting pattern overlay errors by correcting or adjusting bowing of wafers. Location-specific tuning of stress on semiconductor substrates reduces overlay error. Location-specific tuning of stress independently modifies specific regions, areas, or point locations on a substrate to change wafer bow at those specific locations, which reduces overlay error on substrates, which in turn improves overlay of subsequent patterns created on the substrate. Techniques herein include receiving a substrate with some amount of overlay error, measuring bow of the substrate to map z-height deviations across the substrate, generating an overlay correction pattern, and then physically modifying internal stresses on the substrate at specific locations with modifications independent of other coordinate locations. Such modifications can include etching a backside surface of the substrate. One or more processing modules can be used for such processing.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: October 22, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Anton J. deVilliers, Daniel Fulford
  • Patent number: 10431468
    Abstract: Techniques herein include systems and methods for correcting pattern overlay errors by correcting or adjusting bowing of wafers. Location-specific tuning of stress on semiconductor substrates reduces overlay error. Location-specific tuning of stress independently modifies specific regions, areas, or point locations on a substrate to change wafer bow at those specific locations, which reduces overlay error on substrates, which in turn improves overlay of subsequent patterns created on the substrate. Techniques herein include receiving a substrate with some amount of overlay error, measuring bow of the substrate to map z-height deviations across the substrate, generating an overlay correction pattern, and then physically modifying internal stresses on the substrate at specific locations with modifications independent of other coordinate locations. Such modifications can include etching a backside surface of the substrate. One or more processing modules can be used for such processing.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: October 1, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Anton J. deVilliers, Daniel Fulford
  • Patent number: 10416511
    Abstract: A liquid crystal display device includes: a first display panel displaying a color image, a second display panel that is disposed farther away from the observer with respect to the first display panel and displays a monochrome image, and an image processor that generates color image data and monochrome image data. The image processor includes an extension filtering unit that performs extension filtering on first monochrome image data, which is made monochrome using a maximum value in a value of each color expressing color information included in the input video signal. The extension filtering unit performs the extension filtering on the first monochrome image data using a large filter size in a larger luminance difference region, and performs the extension filtering on the first monochrome image data using a small filter size in a small luminance difference region.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: September 17, 2019
    Assignee: Panasonic Liquid Crystal Display Co., Ltd.
    Inventors: Toshikazu Koudo, Masahiro Ishii, Katsuhiro Kikuchi, Ikuko Mori
  • Patent number: 10347482
    Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: July 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Shoichi Terada, Junji Nakamura
  • Patent number: 10341503
    Abstract: An image forming apparatus accepts a start of the remote maintenance function for resolving a failure of the image forming apparatus in accordance with instructions of an operator using an external terminal, generates support data including information of at least one of device information of the print server and device information of the image forming apparatus, which is that is information necessary when the operator analyzes the failure of the image forming apparatus, and transmits it to the external terminal.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: July 2, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroyuki Toriyabe
  • Patent number: 10310387
    Abstract: Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: June 4, 2019
    Assignee: Nikon Corporation
    Inventors: Shane R. Palmer, Julia A. Sakamoto, Donis G. Flagello
  • Patent number: 10298851
    Abstract: The present invention relates to a portable device for magnifying an electronic image, the device includes: a body having a body frame, a camera module, a display module, an image processing module, and a guide pin; and a holder having a base plate, supporting ends respectively provided at opposite ends of an upper surface of the base plate to define a receiving space for receiving the body in an upper center of the base plate, and a guide groove provided on each inner surface of the supporting ends such that the guide pin is inserted into the guide groove, the holder rotating the body within a preset angle range while holding the body so as to obtain a focal length of the camera module and a viewing angle of the display module.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: May 21, 2019
    Assignee: C & P CO., LTD.
    Inventors: Kyeong Min Park, Kyoung Peo Park, Se Gu Kang
  • Patent number: 10175580
    Abstract: A method for producing flexographic printing plates. The method has the following steps: (a) producing a mask by imaging the digitally imagable layer, (b) exposing the photopolymerizable, relief-forming layer through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photopolymerized layer by washing out the unphotopolymerized regions of the relief-forming layer with an organic solvent, or by thermal development, wherein step (b) contains at least two exposure cycles with actinic light with an intensity of 100 to 5000 mW/cm2 from a plurality of UV-LEDs, the energy input into the photopolymerizable, relief-forming layer per exposure cycle being 0.1 to 5 J/cm2.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: January 8, 2019
    Assignee: Flint Group Germany GmbH
    Inventors: Peter Fronczkiewicz, Thorben Wendland, Matthias Beyer
  • Patent number: 10170348
    Abstract: A printing production line system for an electronic device includes a transport chamber with a robot transport line in which a self-traveling robot transports a base material in a sheet-fed manner in a free state, a plurality of processing chambers for forming an electronic device on the base material by printing on at least one side of the transport chamber, and base material transfer areas that performs loading of the base material to the processing chambers from the self-traveling robot and unloading of the base material to the self-traveling robot from the processing chambers. The transport chamber and the base material transfer area communicate with each other through respective openings, and a one-way air flow in each of the openings is formed by making an adjustment such that air pressure in the transport chamber is higher than air pressure in the base material transfer areas.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: January 1, 2019
    Assignees: KONICA MINOLTA, INC., RICOH COMPANY, LTD., TOPPAN PRINTING CO., LTD.
    Inventors: Shinichi Nishi, Hitoshi Kondoh, Osamu Kina
  • Patent number: 10140073
    Abstract: Wireless devices that establish a wireless connection with a mobile device (e.g., smart phone) by wirelessly detecting the mobile device within a physical proximity, are herein disclosed and enabled. To set up a wireless device (e.g., Bluetooth devices, audio output devices, television controllers, Internet appliances, digital cameras, etc.) for connecting with a smart phone, the wireless device and the smart phone are simply placed within physical proximity of each other for short range wireless detection. During the wireless detection, the smart phone and the wireless device may exchange, transmit, or receive device or security information to facilitate future wireless connections. Subsequent to the short range wireless detection, the wireless device and the smart phone are connected or locked for future wireless communications (e.g., Bluetooth or IEEE802.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: November 27, 2018
    Assignee: Flexiworld Technologies, Inc.
    Inventors: William Ho Chang, Christina Ying Liu
  • Patent number: 10043249
    Abstract: An automated, computerized method is provided for processing an image. The method includes the steps of providing an image file depicting an image, in a computer memory, performing an image segregation operation on the image file to generate a set of intrinsic images corresponding to the image, modifying a preselected one of the set of intrinsic images according to a set of preselected operations and merging the modified one of the set of intrinsic images relative to the set of intrinsic images to provide a modified output image.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: August 7, 2018
    Assignee: Tandent Vision Science, Inc.
    Inventors: Richard Mark Friedhoff, Casey Arthur Smith, Bruce Allen Maxwell, Neil Alldrin, Steven Joseph Bushell, Timothy King Rodgers, Jr.
  • Patent number: 10037178
    Abstract: Output devices supporting wireless device discovery are herein disclosed and enabled. To setup an output device for wireless connection, wireless device discovery is performed by a client of the output device to discover the output device. Upon being discovered, the output device may provide identification or information related to the output device to the client for establishing a wireless connection. Subsequently, the output device may receive, via the established wireless connection, digital content from the client for output. Wireless device discovery operations may be based on one or more of a close proximity wireless communication, a Bluetooth wireless communication, or a wireless communication compatible with a protocol within IEEE 802.11 standards. Security information, such as a password, biometrics, or a PIN, may be required for establishing the wireless connection. The output device may automatically obtain the security information from the client or may be based, in part, on user input.
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: July 31, 2018
    Assignee: Flexiworld Technologies, Inc.
    Inventors: William Ho Chang, Christina Ying Liu
  • Patent number: 10033892
    Abstract: An image reading apparatus is provided with an identification information reading unit (reading unit, NFC reader, and identification information acquisition unit) which acquires identification information by reading the identification information from a section to be read at which identifiable identification information is recorded for each individual carrier sheet and which is provided at a joining section of the carrier sheet in which two transparent sheets for pinching an original document are joined at a portion of a peripheral edge portion; and a processor which performs a process which is associated with the identification information read by the identification information reading unit.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 24, 2018
    Assignee: Seiko Epson Corporation
    Inventors: Kosuke Nomoto, Shinsuke Kogi, Kazuya Yoshikaie
  • Patent number: 10012906
    Abstract: A developing device includes a spraying assembly and a concentration regulating assembly. A developing method usable in the developing device includes: spraying developing agents by a spraying assembly onto respective developing regions on a substrate to be developed; and spraying a regulating liquid by a concentration regulating assembly onto a target developing region on the substrate to be developed to change concentration of the developing agents.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: July 3, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Liping Luo, Mingxuan Liu, Xiaoxiang Zhang, Huishuang Liu, Zengbiao Sun, Wei Li
  • Patent number: 10007191
    Abstract: In some embodiments, a method may include improving a development process of a photoresist. The method may include simulating a negative-tone development process of a photoresist. The method may include determining a reaction of a developer with a soluble photoresist surface. Determining the reaction of the developer may include applying a reaction rate constant at a power of a reaction order to a blocked polymer concentration to yield a resist dissolution rate of soluble resist comprising the dissolution-limited regime of development. The method may include determining a flux of the developer into exposed and partially soluble resist. Determining the flux of the developer may include applying a vector valued diffusion coefficient of the developer dependent upon the blocked polymer concentration to a gradient of developer concentration to an expansion rate of insoluble resist comprising the expansion-controlled regime of development.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: June 26, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, David A. Blankenship, Alessandro Vaglio Pret
  • Patent number: 9964863
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: May 8, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Patent number: 9897919
    Abstract: A substrate liquid treatment method includes: (a) rotating the substrate about the vertical axis; (b) supplying the treatment liquid to the rotating substrate from the second nozzle with a falling point of the treatment liquid supplied from the second nozzle moving from the central portion to the peripheral portion of the substrate, while supplying the treatment liquid to the central portion of the substrate from the first nozzle, (c) after (b), moving the second nozzle from the peripheral portion to the central portion of the substrate with the supplying of the treatment liquid from the second nozzle being stopped, while continuing supplying the treatment liquid to the central portion of the rotating substrate from the first nozzle; and (d) after (c), supplying the treatment liquid to the rotating substrate from the second nozzle.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: February 20, 2018
    Assignee: Tokyo Electron Limited
    Inventor: Jun Nonaka
  • Patent number: 9889640
    Abstract: Described is a method for producing flexographic printing plates, using as starting material a photopolymerizable flexographic printing plate which contains a dimensionally stable support, a photopolymerizable, relief-forming layer, and a digitally imagable layer. A mask is produced by imaging the digitally imagable layer. The printing plate is exposed with actinic light through the mask. The image regions of the layer are photopolymerized. A plurality of UV-LEDs are arranged on at least one UV-LED strip which is moved relative to the surface of the flexographic printing plate for exposure. The photopolymerized layer is developed by washing out and drying or by thermal development. An ultrasonic sensor determines the thickness of the flexographic printing plate for exposure. The exposure is controlled as to number of exposure steps, exposure intensity, energy input per exposure step, duration of individual exposure steps, and/or overall duration of exposure.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: February 13, 2018
    Assignee: Flint Group Germany GmbH
    Inventor: Frank Boyksen
  • Patent number: 9823570
    Abstract: Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing field guided post exposure bake processes to mitigate microbridge photoresist defects. An electric field may be applied to a substrate being processed during a post exposure bake process. Photoacid generated as a result of the exposure may be moved along a direction defined by the electric field. The movement of the photoacid may contact microbridge defects and facilitate the removal of the microbridge defects from the surface of a substrate.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: November 21, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ludovic Godet, Sang Ki Nam, Christine Y Ouyang
  • Patent number: 9750832
    Abstract: A disinfecting unit and method of operating the same includes a cabinet and a support arm having a first position within the cabinet and a second position at least partially outside the cabinet. A lamp arm is rotatably coupled to the support arm. The support arm comprises a folded position in the first position and an unfolded position in the second position. A lamp is coupled to the lamp arm. A nebulizer is coupled to the cabinet that dispenses disinfecting fluid therethrough.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: September 5, 2017
    Assignee: E & C Manufacturing, LLC
    Inventor: Stephen J. Paver, Jr.
  • Patent number: 9733579
    Abstract: A method of processing a substrate is disclosed herein. The method includes applying a photoresist layer comprising a photoacid generator to a substrate, wherein a first portion of the photoresist layer has been exposed unprotected by a photomask to a radiation light in a lithographic exposure process. The method also includes applying an electric field to alter movement of photoacid generated from the photoacid generator substantially in a vertical direction, wherein the electric field is applied by a first alternating pair of a positive voltage electrode and a negative voltage electrode and a second alternating pair of a positive voltage electrode and a negative voltage electrode.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 15, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sang Ki Nam, Peng Xie, Qiwei Liang, Ludovic Godet
  • Patent number: 9720244
    Abstract: An intensity distribution management system includes a light source, a mask for receiving light therefrom and for allowing some light to propagate through and past the mask, a surface for receiving light allowed past the mask, and a diffusive element disposed between the mask and the light source for ensuring a substantially even light intensity distribution in relation to the surface. An imaging method includes emitting a light beam, manipulating the beam to have a first numerical aperture across a first divergence axis, directing the beam through a diffusive element to increase the numerical aperture of the beam, directing the beam through one or more transmissive portions of a mask, the mask being disposed relative to the diffusive element, and imaging transmitted portions of the beam to a target surface wherein the beam has a substantially ripple-free and uniform intensity distribution across the first divergence axis at the target surface.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: August 1, 2017
    Assignee: nLIGHT, Inc.
    Inventors: Joseph V. DeBartolo, Jr., Scott Karlsen, Rob Martinsen, Jay Small
  • Patent number: 9584061
    Abstract: An electric drive system includes a smoothing capacitor including at least one terminal, a bus bar electrically coupled to the at least one terminal, a thermoelectric device including a first side and a second side positioned opposite the first side, where the first side is thermally coupled to at least one of the at least one terminal and the bus bar, and a cooling element thermally coupled to the second side of the thermoelectric device, where the cooling element dissipates heat from the thermoelectric device.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: February 28, 2017
    Assignee: Toyota Motor Engineering & Manufacturing North America, Inc.
    Inventors: Ercan Mehmet Dede, Feng Zhou
  • Patent number: 9470979
    Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: October 18, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Yoshinori Ikeda, Koki Yoshimura, Yoshiki Okamoto, Masahiro Fukuda
  • Patent number: 9417529
    Abstract: In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 16, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Nobuaki Matsuoka, Akira Miyata, Shinichi Hayashi, Suguru Enokida, Hiroshi Tomita, Makoto Hayakawa, Tatsuhei Yoshida
  • Patent number: 9327410
    Abstract: A method of operation of a stepper motor, especially as used in connection with a picker assembly employed in a data storage library and a picker assembly that may utilize the stepper motor.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: May 3, 2016
    Assignee: Spectra Logic, Corporation
    Inventor: Jay Gregory Sherritt
  • Patent number: 9305819
    Abstract: A first transfer apparatus unloads and transfers substrates from a cassette. A first accommodating unit accommodates the substrates. First substrate processing units divided into at least two groups and arranged in a height direction performs a process to the substrates. Second accommodating units respectively corresponding to the groups are arranged to be parallel with the first accommodating unit in the height direction. Second transfer apparatuses respectively corresponding to the groups unload and transfer the substrates from the second accommodating units corresponding to the same groups into the first substrate processing units of the same groups. Second substrate processing units respectively corresponding to the groups are arranged to be parallel with the first and second accommodating units in the height direction.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: April 5, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yukiyoshi Saito, Tomohiro Kaneko
  • Patent number: 9291911
    Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: March 22, 2016
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Giora Dishon, Moshe Finarov, Zvi Nirel, Yoel Cohen
  • Patent number: 9208480
    Abstract: A central system for receiving captured transaction data from a plurality of remote capture devices over a network, the remote capture devices including a mobile device type and a fixed location device type, the system comprising: a receipt module to receive the captured transaction data; a processing module to process the received captured transaction data; and a storage module to store the processed transaction data such that characteristic data of the mobile device type is associated with the stored transaction data for said processed transaction data originating from a remote capture device of the mobile device type.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: December 8, 2015
    Assignee: RDM Corporation
    Inventors: Graham Heit, Dima Shamroni, Dhammika Botejue, John Kavanagh
  • Patent number: 9205698
    Abstract: A method including a) forming a through-hole in a dummy substrate including a surface by radiating a laser to the surface of the dummy substrate in a state where the dummy substrate is moved relative to the laser along a direction parallel to the surface of the dummy substrate, b) determining an angle ? (?90°<?<+90°) of the through-hole relative to a line perpendicular to the surface of the dummy substrate, and c) forming a through-hole in the insulating substrate with the same conditions as step a) except for radiating a laser at an angle ? relative to a line perpendicular to a surface of the insulating substrate. The angle ? is set to be line symmetric with the angle ? relative to the line perpendicular to the surface of the insulating substrate and satisfy a relationship of ?=??.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: December 8, 2015
    Assignee: ASAHI GLASS COMPANY, LIMITED
    Inventor: Kohei Horiuchi
  • Patent number: 9089213
    Abstract: According to one embodiment, a stabilizer includes a jaw portion which contacts a bottom of an apparatus, a fastener to fasten the stabilizer to a lateral side of the apparatus, and a foot portion extending from the bottom of the apparatus toward far side and in obliquely downward.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: July 28, 2015
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Sadahiro Masuda, Takashi Ogiwara
  • Patent number: 9053284
    Abstract: A method for overlay monitoring and control is introduced in the present disclosure. The method comprises forming resist patterns on one or more wafers in a lot by an exposing tool; selecting a group of patterned wafers in the lot using a wafer selection model; selecting a group of fields for each of the selected group of patterned wafers using a field selection model; selecting at least one point in each of the selected group of fields using a point selection model; measuring overlay errors of the selected at least one point on a selected wafer; forming an overlay correction map using the measured overlay errors on the selected wafer; and generating a combined overlay correction map using the overlay correction map of each selected wafer in the lot.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: June 9, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yang-Hung Chang, Kai-Hsiung Chen, Chih-Ming Ke
  • Publication number: 20150116674
    Abstract: A substrate treating apparatus according to the present invention includes: an index unit having an index robot and a port on which a container containing a substrate is placed; a process treating unit having a development treating unit in which a first development treating chamber and a second development treating chamber for performing a substrate development process are arranged in divided layers; and a first path unit arranged between the development treating unit and the index unit, wherein the first development treating chamber includes a development module, a first heating module, and a first main transport robot arranged in a movement passage accessible to the development module and the first heating module, wherein the first path unit includes a second heating module, a first buffer module, a cooling module, a second buffer module, and a first buffer transport robot arranged in a movement passage accessible to the second heating module, the first buffer module, the cooling module and the second buffe
    Type: Application
    Filed: October 30, 2014
    Publication date: April 30, 2015
    Inventors: Soo Min HWANG, Hyoung Rae NOH