With Developing Patents (Class 355/27)
  • Patent number: 10431468
    Abstract: Techniques herein include systems and methods for correcting pattern overlay errors by correcting or adjusting bowing of wafers. Location-specific tuning of stress on semiconductor substrates reduces overlay error. Location-specific tuning of stress independently modifies specific regions, areas, or point locations on a substrate to change wafer bow at those specific locations, which reduces overlay error on substrates, which in turn improves overlay of subsequent patterns created on the substrate. Techniques herein include receiving a substrate with some amount of overlay error, measuring bow of the substrate to map z-height deviations across the substrate, generating an overlay correction pattern, and then physically modifying internal stresses on the substrate at specific locations with modifications independent of other coordinate locations. Such modifications can include etching a backside surface of the substrate. One or more processing modules can be used for such processing.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: October 1, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Anton J. deVilliers, Daniel Fulford
  • Patent number: 10416511
    Abstract: A liquid crystal display device includes: a first display panel displaying a color image, a second display panel that is disposed farther away from the observer with respect to the first display panel and displays a monochrome image, and an image processor that generates color image data and monochrome image data. The image processor includes an extension filtering unit that performs extension filtering on first monochrome image data, which is made monochrome using a maximum value in a value of each color expressing color information included in the input video signal. The extension filtering unit performs the extension filtering on the first monochrome image data using a large filter size in a larger luminance difference region, and performs the extension filtering on the first monochrome image data using a small filter size in a small luminance difference region.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: September 17, 2019
    Assignee: Panasonic Liquid Crystal Display Co., Ltd.
    Inventors: Toshikazu Koudo, Masahiro Ishii, Katsuhiro Kikuchi, Ikuko Mori
  • Patent number: 10347482
    Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: July 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Shoichi Terada, Junji Nakamura
  • Patent number: 10341503
    Abstract: An image forming apparatus accepts a start of the remote maintenance function for resolving a failure of the image forming apparatus in accordance with instructions of an operator using an external terminal, generates support data including information of at least one of device information of the print server and device information of the image forming apparatus, which is that is information necessary when the operator analyzes the failure of the image forming apparatus, and transmits it to the external terminal.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: July 2, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroyuki Toriyabe
  • Patent number: 10310387
    Abstract: Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: June 4, 2019
    Assignee: Nikon Corporation
    Inventors: Shane R. Palmer, Julia A. Sakamoto, Donis G. Flagello
  • Patent number: 10298851
    Abstract: The present invention relates to a portable device for magnifying an electronic image, the device includes: a body having a body frame, a camera module, a display module, an image processing module, and a guide pin; and a holder having a base plate, supporting ends respectively provided at opposite ends of an upper surface of the base plate to define a receiving space for receiving the body in an upper center of the base plate, and a guide groove provided on each inner surface of the supporting ends such that the guide pin is inserted into the guide groove, the holder rotating the body within a preset angle range while holding the body so as to obtain a focal length of the camera module and a viewing angle of the display module.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: May 21, 2019
    Assignee: C & P CO., LTD.
    Inventors: Kyeong Min Park, Kyoung Peo Park, Se Gu Kang
  • Patent number: 10175580
    Abstract: A method for producing flexographic printing plates. The method has the following steps: (a) producing a mask by imaging the digitally imagable layer, (b) exposing the photopolymerizable, relief-forming layer through the mask with actinic light, and photopolymerizing the image regions of the layer, and (c) developing the photopolymerized layer by washing out the unphotopolymerized regions of the relief-forming layer with an organic solvent, or by thermal development, wherein step (b) contains at least two exposure cycles with actinic light with an intensity of 100 to 5000 mW/cm2 from a plurality of UV-LEDs, the energy input into the photopolymerizable, relief-forming layer per exposure cycle being 0.1 to 5 J/cm2.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: January 8, 2019
    Assignee: Flint Group Germany GmbH
    Inventors: Peter Fronczkiewicz, Thorben Wendland, Matthias Beyer
  • Patent number: 10170348
    Abstract: A printing production line system for an electronic device includes a transport chamber with a robot transport line in which a self-traveling robot transports a base material in a sheet-fed manner in a free state, a plurality of processing chambers for forming an electronic device on the base material by printing on at least one side of the transport chamber, and base material transfer areas that performs loading of the base material to the processing chambers from the self-traveling robot and unloading of the base material to the self-traveling robot from the processing chambers. The transport chamber and the base material transfer area communicate with each other through respective openings, and a one-way air flow in each of the openings is formed by making an adjustment such that air pressure in the transport chamber is higher than air pressure in the base material transfer areas.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: January 1, 2019
    Assignees: KONICA MINOLTA, INC., RICOH COMPANY, LTD., TOPPAN PRINTING CO., LTD.
    Inventors: Shinichi Nishi, Hitoshi Kondoh, Osamu Kina
  • Patent number: 10140073
    Abstract: Wireless devices that establish a wireless connection with a mobile device (e.g., smart phone) by wirelessly detecting the mobile device within a physical proximity, are herein disclosed and enabled. To set up a wireless device (e.g., Bluetooth devices, audio output devices, television controllers, Internet appliances, digital cameras, etc.) for connecting with a smart phone, the wireless device and the smart phone are simply placed within physical proximity of each other for short range wireless detection. During the wireless detection, the smart phone and the wireless device may exchange, transmit, or receive device or security information to facilitate future wireless connections. Subsequent to the short range wireless detection, the wireless device and the smart phone are connected or locked for future wireless communications (e.g., Bluetooth or IEEE802.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: November 27, 2018
    Assignee: Flexiworld Technologies, Inc.
    Inventors: William Ho Chang, Christina Ying Liu
  • Patent number: 10043249
    Abstract: An automated, computerized method is provided for processing an image. The method includes the steps of providing an image file depicting an image, in a computer memory, performing an image segregation operation on the image file to generate a set of intrinsic images corresponding to the image, modifying a preselected one of the set of intrinsic images according to a set of preselected operations and merging the modified one of the set of intrinsic images relative to the set of intrinsic images to provide a modified output image.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: August 7, 2018
    Assignee: Tandent Vision Science, Inc.
    Inventors: Richard Mark Friedhoff, Casey Arthur Smith, Bruce Allen Maxwell, Neil Alldrin, Steven Joseph Bushell, Timothy King Rodgers, Jr.
  • Patent number: 10037178
    Abstract: Output devices supporting wireless device discovery are herein disclosed and enabled. To setup an output device for wireless connection, wireless device discovery is performed by a client of the output device to discover the output device. Upon being discovered, the output device may provide identification or information related to the output device to the client for establishing a wireless connection. Subsequently, the output device may receive, via the established wireless connection, digital content from the client for output. Wireless device discovery operations may be based on one or more of a close proximity wireless communication, a Bluetooth wireless communication, or a wireless communication compatible with a protocol within IEEE 802.11 standards. Security information, such as a password, biometrics, or a PIN, may be required for establishing the wireless connection. The output device may automatically obtain the security information from the client or may be based, in part, on user input.
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: July 31, 2018
    Assignee: Flexiworld Technologies, Inc.
    Inventors: William Ho Chang, Christina Ying Liu
  • Patent number: 10033892
    Abstract: An image reading apparatus is provided with an identification information reading unit (reading unit, NFC reader, and identification information acquisition unit) which acquires identification information by reading the identification information from a section to be read at which identifiable identification information is recorded for each individual carrier sheet and which is provided at a joining section of the carrier sheet in which two transparent sheets for pinching an original document are joined at a portion of a peripheral edge portion; and a processor which performs a process which is associated with the identification information read by the identification information reading unit.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 24, 2018
    Assignee: Seiko Epson Corporation
    Inventors: Kosuke Nomoto, Shinsuke Kogi, Kazuya Yoshikaie
  • Patent number: 10012906
    Abstract: A developing device includes a spraying assembly and a concentration regulating assembly. A developing method usable in the developing device includes: spraying developing agents by a spraying assembly onto respective developing regions on a substrate to be developed; and spraying a regulating liquid by a concentration regulating assembly onto a target developing region on the substrate to be developed to change concentration of the developing agents.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: July 3, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Liping Luo, Mingxuan Liu, Xiaoxiang Zhang, Huishuang Liu, Zengbiao Sun, Wei Li
  • Patent number: 10007191
    Abstract: In some embodiments, a method may include improving a development process of a photoresist. The method may include simulating a negative-tone development process of a photoresist. The method may include determining a reaction of a developer with a soluble photoresist surface. Determining the reaction of the developer may include applying a reaction rate constant at a power of a reaction order to a blocked polymer concentration to yield a resist dissolution rate of soluble resist comprising the dissolution-limited regime of development. The method may include determining a flux of the developer into exposed and partially soluble resist. Determining the flux of the developer may include applying a vector valued diffusion coefficient of the developer dependent upon the blocked polymer concentration to a gradient of developer concentration to an expansion rate of insoluble resist comprising the expansion-controlled regime of development.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: June 26, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, David A. Blankenship, Alessandro Vaglio Pret
  • Patent number: 9964863
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: May 8, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Patent number: 9897919
    Abstract: A substrate liquid treatment method includes: (a) rotating the substrate about the vertical axis; (b) supplying the treatment liquid to the rotating substrate from the second nozzle with a falling point of the treatment liquid supplied from the second nozzle moving from the central portion to the peripheral portion of the substrate, while supplying the treatment liquid to the central portion of the substrate from the first nozzle, (c) after (b), moving the second nozzle from the peripheral portion to the central portion of the substrate with the supplying of the treatment liquid from the second nozzle being stopped, while continuing supplying the treatment liquid to the central portion of the rotating substrate from the first nozzle; and (d) after (c), supplying the treatment liquid to the rotating substrate from the second nozzle.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: February 20, 2018
    Assignee: Tokyo Electron Limited
    Inventor: Jun Nonaka
  • Patent number: 9889640
    Abstract: Described is a method for producing flexographic printing plates, using as starting material a photopolymerizable flexographic printing plate which contains a dimensionally stable support, a photopolymerizable, relief-forming layer, and a digitally imagable layer. A mask is produced by imaging the digitally imagable layer. The printing plate is exposed with actinic light through the mask. The image regions of the layer are photopolymerized. A plurality of UV-LEDs are arranged on at least one UV-LED strip which is moved relative to the surface of the flexographic printing plate for exposure. The photopolymerized layer is developed by washing out and drying or by thermal development. An ultrasonic sensor determines the thickness of the flexographic printing plate for exposure. The exposure is controlled as to number of exposure steps, exposure intensity, energy input per exposure step, duration of individual exposure steps, and/or overall duration of exposure.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: February 13, 2018
    Assignee: Flint Group Germany GmbH
    Inventor: Frank Boyksen
  • Patent number: 9823570
    Abstract: Embodiments described herein generally relate to methods for mitigating patterning defects. More specifically, embodiments described herein relate to utilizing field guided post exposure bake processes to mitigate microbridge photoresist defects. An electric field may be applied to a substrate being processed during a post exposure bake process. Photoacid generated as a result of the exposure may be moved along a direction defined by the electric field. The movement of the photoacid may contact microbridge defects and facilitate the removal of the microbridge defects from the surface of a substrate.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: November 21, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ludovic Godet, Sang Ki Nam, Christine Y Ouyang
  • Patent number: 9750832
    Abstract: A disinfecting unit and method of operating the same includes a cabinet and a support arm having a first position within the cabinet and a second position at least partially outside the cabinet. A lamp arm is rotatably coupled to the support arm. The support arm comprises a folded position in the first position and an unfolded position in the second position. A lamp is coupled to the lamp arm. A nebulizer is coupled to the cabinet that dispenses disinfecting fluid therethrough.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: September 5, 2017
    Assignee: E & C Manufacturing, LLC
    Inventor: Stephen J. Paver, Jr.
  • Patent number: 9733579
    Abstract: A method of processing a substrate is disclosed herein. The method includes applying a photoresist layer comprising a photoacid generator to a substrate, wherein a first portion of the photoresist layer has been exposed unprotected by a photomask to a radiation light in a lithographic exposure process. The method also includes applying an electric field to alter movement of photoacid generated from the photoacid generator substantially in a vertical direction, wherein the electric field is applied by a first alternating pair of a positive voltage electrode and a negative voltage electrode and a second alternating pair of a positive voltage electrode and a negative voltage electrode.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 15, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sang Ki Nam, Peng Xie, Qiwei Liang, Ludovic Godet
  • Patent number: 9720244
    Abstract: An intensity distribution management system includes a light source, a mask for receiving light therefrom and for allowing some light to propagate through and past the mask, a surface for receiving light allowed past the mask, and a diffusive element disposed between the mask and the light source for ensuring a substantially even light intensity distribution in relation to the surface. An imaging method includes emitting a light beam, manipulating the beam to have a first numerical aperture across a first divergence axis, directing the beam through a diffusive element to increase the numerical aperture of the beam, directing the beam through one or more transmissive portions of a mask, the mask being disposed relative to the diffusive element, and imaging transmitted portions of the beam to a target surface wherein the beam has a substantially ripple-free and uniform intensity distribution across the first divergence axis at the target surface.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: August 1, 2017
    Assignee: nLIGHT, Inc.
    Inventors: Joseph V. DeBartolo, Jr., Scott Karlsen, Rob Martinsen, Jay Small
  • Patent number: 9584061
    Abstract: An electric drive system includes a smoothing capacitor including at least one terminal, a bus bar electrically coupled to the at least one terminal, a thermoelectric device including a first side and a second side positioned opposite the first side, where the first side is thermally coupled to at least one of the at least one terminal and the bus bar, and a cooling element thermally coupled to the second side of the thermoelectric device, where the cooling element dissipates heat from the thermoelectric device.
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: February 28, 2017
    Assignee: Toyota Motor Engineering & Manufacturing North America, Inc.
    Inventors: Ercan Mehmet Dede, Feng Zhou
  • Patent number: 9470979
    Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: October 18, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Yoshinori Ikeda, Koki Yoshimura, Yoshiki Okamoto, Masahiro Fukuda
  • Patent number: 9417529
    Abstract: In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 16, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Nobuaki Matsuoka, Akira Miyata, Shinichi Hayashi, Suguru Enokida, Hiroshi Tomita, Makoto Hayakawa, Tatsuhei Yoshida
  • Patent number: 9327410
    Abstract: A method of operation of a stepper motor, especially as used in connection with a picker assembly employed in a data storage library and a picker assembly that may utilize the stepper motor.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: May 3, 2016
    Assignee: Spectra Logic, Corporation
    Inventor: Jay Gregory Sherritt
  • Patent number: 9305819
    Abstract: A first transfer apparatus unloads and transfers substrates from a cassette. A first accommodating unit accommodates the substrates. First substrate processing units divided into at least two groups and arranged in a height direction performs a process to the substrates. Second accommodating units respectively corresponding to the groups are arranged to be parallel with the first accommodating unit in the height direction. Second transfer apparatuses respectively corresponding to the groups unload and transfer the substrates from the second accommodating units corresponding to the same groups into the first substrate processing units of the same groups. Second substrate processing units respectively corresponding to the groups are arranged to be parallel with the first and second accommodating units in the height direction.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: April 5, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yukiyoshi Saito, Tomohiro Kaneko
  • Patent number: 9291911
    Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: March 22, 2016
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Giora Dishon, Moshe Finarov, Zvi Nirel, Yoel Cohen
  • Patent number: 9205698
    Abstract: A method including a) forming a through-hole in a dummy substrate including a surface by radiating a laser to the surface of the dummy substrate in a state where the dummy substrate is moved relative to the laser along a direction parallel to the surface of the dummy substrate, b) determining an angle ? (?90°<?<+90°) of the through-hole relative to a line perpendicular to the surface of the dummy substrate, and c) forming a through-hole in the insulating substrate with the same conditions as step a) except for radiating a laser at an angle ? relative to a line perpendicular to a surface of the insulating substrate. The angle ? is set to be line symmetric with the angle ? relative to the line perpendicular to the surface of the insulating substrate and satisfy a relationship of ?=??.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: December 8, 2015
    Assignee: ASAHI GLASS COMPANY, LIMITED
    Inventor: Kohei Horiuchi
  • Patent number: 9208480
    Abstract: A central system for receiving captured transaction data from a plurality of remote capture devices over a network, the remote capture devices including a mobile device type and a fixed location device type, the system comprising: a receipt module to receive the captured transaction data; a processing module to process the received captured transaction data; and a storage module to store the processed transaction data such that characteristic data of the mobile device type is associated with the stored transaction data for said processed transaction data originating from a remote capture device of the mobile device type.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: December 8, 2015
    Assignee: RDM Corporation
    Inventors: Graham Heit, Dima Shamroni, Dhammika Botejue, John Kavanagh
  • Patent number: 9089213
    Abstract: According to one embodiment, a stabilizer includes a jaw portion which contacts a bottom of an apparatus, a fastener to fasten the stabilizer to a lateral side of the apparatus, and a foot portion extending from the bottom of the apparatus toward far side and in obliquely downward.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: July 28, 2015
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Sadahiro Masuda, Takashi Ogiwara
  • Patent number: 9053284
    Abstract: A method for overlay monitoring and control is introduced in the present disclosure. The method comprises forming resist patterns on one or more wafers in a lot by an exposing tool; selecting a group of patterned wafers in the lot using a wafer selection model; selecting a group of fields for each of the selected group of patterned wafers using a field selection model; selecting at least one point in each of the selected group of fields using a point selection model; measuring overlay errors of the selected at least one point on a selected wafer; forming an overlay correction map using the measured overlay errors on the selected wafer; and generating a combined overlay correction map using the overlay correction map of each selected wafer in the lot.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: June 9, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yang-Hung Chang, Kai-Hsiung Chen, Chih-Ming Ke
  • Publication number: 20150116674
    Abstract: A substrate treating apparatus according to the present invention includes: an index unit having an index robot and a port on which a container containing a substrate is placed; a process treating unit having a development treating unit in which a first development treating chamber and a second development treating chamber for performing a substrate development process are arranged in divided layers; and a first path unit arranged between the development treating unit and the index unit, wherein the first development treating chamber includes a development module, a first heating module, and a first main transport robot arranged in a movement passage accessible to the development module and the first heating module, wherein the first path unit includes a second heating module, a first buffer module, a cooling module, a second buffer module, and a first buffer transport robot arranged in a movement passage accessible to the second heating module, the first buffer module, the cooling module and the second buffe
    Type: Application
    Filed: October 30, 2014
    Publication date: April 30, 2015
    Inventors: Soo Min HWANG, Hyoung Rae NOH
  • Patent number: 8985880
    Abstract: In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: March 24, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Nobuaki Matsuoka, Akira Miyata, Shinichi Hayashi, Suguru Enokida, Hiroshi Tomita, Makoto Hayakawa, Tatsuhei Yoshida
  • Publication number: 20150077726
    Abstract: A coating and developing apparatus forms a coating film including a resist film on a substrate and performs developing on the substrate after exposure and a plurality of unit blocks performing the same processing each includes plural kinds of processing modules. A control unit outputs a control signal to perform preparing individual conveying schedules for the one substrate according to the condition when the one substrate distributed into unit blocks is conveyed in the unit blocks, respectively, obtaining a residence time until the one substrate is conveyed in each unit block and is then conveyed out; and conveying the one substrate in the unit block having the shortest residence time and conveying the substrate based on the individual conveying schedules.
    Type: Application
    Filed: August 27, 2014
    Publication date: March 19, 2015
    Inventor: Tomohiro Kaneko
  • Publication number: 20150077727
    Abstract: A coating and developing apparatus includes: first and second transfer mechanisms for transferring a substrate from a first mount module to a second mount module, one of the first and second transfer mechanisms being selected each time when the substrate transfer should be performed; first and second processing modules for performing substrate processing, for which the transfer of substrates is performed by the first and second transfer mechanisms, respectively; and a control unit. The control unit controls the transfer mechanisms for the substrate transfer by determining a delay time, representing a delay caused by the transfer of the substrate to the second mount module to the timing of transfer of a substrate from the first/second processing module, in regard to each of the first and second transfer mechanisms and selecting one of the first and second transfer mechanisms whose delay time is the shortest.
    Type: Application
    Filed: September 17, 2014
    Publication date: March 19, 2015
    Inventor: Tomohiro KANEKO
  • Patent number: 8982314
    Abstract: A photolithographic apparatus for use with a photo-resist comprises a first component that generates a first chemical substance and produces a chemical amplification action and a second component that generates a second chemical substance. The photolithographic apparatus comprises a first exposure subsystem for selectively illuminating a surface of the photo-resist using a light of a first wavelength band such that the first component generates the first chemical substance and a second exposure subsystem for uniformly illuminating the surface using a light of a second wavelength band such that the second component generates the second chemical substance. The second chemical substance reacts with the first chemical substance to reduce the mass concentration of the first chemical substance in the photo-resist and improves the contrast of a latent image of the first chemical substance formed in the photo-resist.
    Type: Grant
    Filed: February 25, 2012
    Date of Patent: March 17, 2015
    Assignee: Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Qiang Wu, Yiming Gu
  • Publication number: 20150072536
    Abstract: A photoresist pattern used for forming a pattern of a block copolymer is formed on a substrate, and then an acid solution is supplied and an alkaline solution is further supplied to the photoresist pattern so as to slim and smooth the photoresist pattern. A block copolymer solution is applied to the substrate on which the smoothed photoresist pattern has been formed, to form a film of the block copolymer, and the film is heated.
    Type: Application
    Filed: April 15, 2013
    Publication date: March 12, 2015
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Keiji Tanouchi
  • Publication number: 20150036110
    Abstract: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.
    Type: Application
    Filed: August 4, 2014
    Publication date: February 5, 2015
    Inventors: Kousuke YOSHIHARA, Hideharu KYOUDA, Koshi MUTA, Taro YAMAMOTO, Yasushi TAKIGUCHI
  • Publication number: 20150036109
    Abstract: A developing method includes: horizontally holding an exposed substrate by a substrate holder; forming a liquid puddle on a part of the substrate, by supplying a developer from a developer nozzle; rotating the substrate; spreading the liquid puddle on a whole surface of the substrate, by moving the developer nozzle such that a supply position of the developer on the rotating substrate is moved in a radial direction of the substrate; bringing, simultaneously with the spreading of the liquid puddle on the whole surface of the substrate, a contact part into contact with the liquid puddle, the contact part being configured to be moved together with the developer nozzle and having a surface opposed to the substrate which is smaller than the surface of the substrate. According to this method, an amount of liquid falling down to the outside of the substrate can be inhibited. In addition, since the rotating speed of the substrate can be decreased, spattering of the developer can be inhibited.
    Type: Application
    Filed: August 1, 2014
    Publication date: February 5, 2015
    Inventors: Kousuke YOSHIHARA, Hideharu KYOUDA, Koshi MUTA, Taro YAMAMOTO, Yasushi TAKIGUCHI, Masahiro FUKUDA
  • Publication number: 20150022790
    Abstract: A coating mechanism disposes a liquid (e.g., polymer) thin film onto a conveyor surface (e.g., roller or belt) that is moved by a suitable motor to convey the thin film into a precisely controlled gap (or nip) region where applied potentials generate an electric field that causes the liquid to undergo Electrohydrodynamic (EHD) patterning deformation, whereby the liquid forms patterned micro-scale features. A curing mechanism (e.g., a UV laser) is used to solidify (e.g., cross-link) the patterned liquid features inside or immediately after exiting the gap region, thereby forming micro-scale patterned structures that are either connected by an intervening web as part of a sheet, or separated into discrete micro-scale structures. Nanostructures (e.g., nanotubes or nanowires) disposed in the liquid become vertically oriented during the EHD patterning process. Segmented electrodes and patterned charges are utilized to provide digital patterning control.
    Type: Application
    Filed: July 17, 2013
    Publication date: January 22, 2015
    Inventors: David Mathew Johnson, Armin R. Volkel, John Steven Paschkewitz
  • Publication number: 20140347639
    Abstract: A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.
    Type: Application
    Filed: August 6, 2014
    Publication date: November 27, 2014
    Inventors: Hirofumi TAKEGUCHI, Taro YAMAMOTO, Kousuke YOSHIHARA
  • Patent number: 8895225
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
    Type: Grant
    Filed: November 19, 2013
    Date of Patent: November 25, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Patent number: 8885140
    Abstract: The present invention is a substrate treatment apparatus for performing solution treatment on a substrate, performing post-treatment in a treatment module subsequent to the solution treatment, including: a solution treatment section including a plurality of nozzles prepared for respective kinds of treatment solutions corresponding to lots of substrates; a transfer mechanism for transferring the substrate; a monitoring section monitoring whether there is a failure in discharge of the treatment solution in the nozzle; and a control unit outputting a control signal to prohibit the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle determined to have a failure by the monitoring section and to perform the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle other than the nozzle determined to have a failure.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: November 11, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Tomohiro Nakashima, Shin Inoue, Yoshitaka Hara, Izumi Hasegawa, Kunie Ogata, Takuya Mori
  • Publication number: 20140327890
    Abstract: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.
    Type: Application
    Filed: July 16, 2014
    Publication date: November 6, 2014
    Inventors: Nobuaki MATSUOKA, Akira MIYATA, Shinichi HAYASHI, Suguru ENOKIDA
  • Publication number: 20140327889
    Abstract: A conductive pattern formation method of the present invention includes a first exposure step of radiating active light in a patterned manner to a photosensitive layer including a photosensitive resin layer provided on a substrate and a conductive film provided on a surface of the photosensitive resin layer on a side opposite to the substrate; a second exposure step of radiating active light, in the presence of oxygen, to some or all of the portions of the photosensitive layer not exposed at least in the first exposure step; and a development step of developing the photosensitive layer to form a conductive pattern following the second exposure step.
    Type: Application
    Filed: October 1, 2012
    Publication date: November 6, 2014
    Inventors: Hiroshi Yamazaki, Yoshimi Igarashi
  • Patent number: 8873020
    Abstract: The present disclosure provides an apparatus for fabricating a semiconductor device. The apparatus includes a lithography tool. The lithography tool includes: a first nozzle configured to dispense a developer solution to a wafer; a second nozzle configured to dispense a cleaning solution to the first nozzle; and a controller configured to operate the second nozzle according to a predefined program. The present disclosure also provides a method of fabricating a semiconductor device. The method includes performing a developing process, wherein the performing the developing process includes dispensing a developer solution on a wafer using a first nozzle. The method also includes cleaning the first nozzle with a second nozzle, wherein the cleaning the first nozzle is executed according to one of a plurality of program recipes that each specify a sequence and a duration for which the first nozzle and the second nozzle are to be selectively activated.
    Type: Grant
    Filed: August 24, 2011
    Date of Patent: October 28, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ching-Hai Yang, Shang-Sheng Li
  • Patent number: 8852847
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.
    Type: Grant
    Filed: November 7, 2013
    Date of Patent: October 7, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Patent number: 8848161
    Abstract: The present invention provides a resist coating and developing apparatus, a resist coating and developing method, a resist-film processing apparatus, and a resist-film processing method, capable of reducing a line width roughness by planarizing a resist pattern. The resist coating and developing apparatus comprises: a resist-film forming part configured to coat a resist onto a substrate to form a resist film thereon; a resist developing part configured to develop the exposed resist film to obtain a patterned resist film; and a solvent-gas supply part configured to expose the resist film, which has been developed and patterned by the resist developing part, to a first solvent of a gaseous atmosphere having a solubility to the resist film. A solvent supply part supplies, to the resist film which has been exposed to the first solvent, a second solvent in a liquid state having a solubility to the resist film.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: September 30, 2014
    Assignee: Tokyo Electron Limited
    Inventor: Yuichiro Inatomi
  • Publication number: 20140255844
    Abstract: In the present invention, photolithography processing is performed on a substrate to form a resist pattern over the substrate, and a treatment agent is caused to enter a side surface of the resist pattern and metal is caused to infiltrate the side surface of the resist pattern via the treatment agent, the formed resist pattern has a high etching selection ratio with respect to a film to be treated on the substrate so as to suppress a so-called pattern collapse, therefore.
    Type: Application
    Filed: February 25, 2014
    Publication date: September 11, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Fumiko IWAO, Satoru SHIMURA
  • Publication number: 20140255852
    Abstract: The present invention includes: a resist film forming step of forming a resist film over a substrate; an exposure step of exposing the resist film into a predetermined pattern; a metal treatment step of causing a treatment agent to enter an exposed portion exposed in the exposure step of the resist film and causing metal to infiltrate the exposed portion via the treatment agent; and a resist film removing step of removing an unexposed portion not exposed in the exposure step of the resist film to form a resist pattern over the substrate.
    Type: Application
    Filed: February 11, 2014
    Publication date: September 11, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Fumiko IWAO, Satoru SHIMURA