With Temperature Or Foreign Particle Control Patents (Class 355/30)
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Publication number: 20140327891Abstract: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.Type: ApplicationFiled: June 26, 2014Publication date: November 6, 2014Inventors: Ulrich Loering, Vladan Blahnik, Wilhelm Ulrich, Daniel Kraehmer, Norbert Wabra
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Publication number: 20140327893Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.Type: ApplicationFiled: July 14, 2014Publication date: November 6, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Antonius LEENDERS, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Patent number: 8879043Abstract: A liquid immersion exposure apparatus and method expose a substrate through a liquid. The liquid is supplied to a space between a projection system of the exposure apparatus and an object, the object being different from the substrate, in a non-exposure operation. The object is moved relative to the projection system while supplying the liquid in the non-exposure operation, such that substantially no gas portion remains in the liquid filled in the space between the projection system and the object after the non-exposure operation.Type: GrantFiled: November 9, 2010Date of Patent: November 4, 2014Assignee: Nikon CorporationInventor: Hiroyuki Nagasaka
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Patent number: 8879044Abstract: A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling device further has a cooling duct assembly with a supply duct to supply a cooling fluid to the cooling element, and a discharge duct to discharge the cooling fluid from the cooling element. A pump causes the cooling fluid to flow through at least part of the cooling duct assembly. A flow control device controls a flow rate of the cooling fluid through at least part of the cooling duct assembly, to maintain a predetermined average temperature of the cooling fluid in the cooling element.Type: GrantFiled: March 17, 2011Date of Patent: November 4, 2014Assignee: ASML Netherlands B.V.Inventor: Frank Auer
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Publication number: 20140320831Abstract: A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable stage to hold a substrate and having an upper surface around the held substrate. An apparatus frame supports the optical assembly and the containment member, and an optical mount isolator, which has an actuator, isolates the optical assembly from vibrations of the apparatus frame. A first inlet of the containment member faces at least one of the substrate and the stage and collects fluid from a gap between the containment member and the at least one of the substrate and the stage. A gas supply outlet of the containment member supplies gas to the gap.Type: ApplicationFiled: July 7, 2014Publication date: October 30, 2014Applicant: NIKON CORPORATIONInventors: Andrew J. HAZELTON, Michael SOGARD
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Publication number: 20140322648Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.Type: ApplicationFiled: May 5, 2014Publication date: October 30, 2014Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventor: Deyan Wang
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Patent number: 8873021Abstract: A debris mitigation system for use in a radiation unit for EUV radiation and/or X-rays, for example, includes a foil trap having several passages allowing a straight passage of radiation, and one or several feed pipes for gas supply of buffer gas to the foil trap. The foil trap has an interior space extending over several of the passages, where the feed pipes open into the interior space.Type: GrantFiled: June 6, 2006Date of Patent: October 28, 2014Assignee: Koninklijke Philips N.V.Inventors: Gunther Hans Derra, Thomas Krucken
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Publication number: 20140313493Abstract: The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having one or more lamps. The base assembly includes an assembly for controlling the temperature of the exposure bed to heat and cool the bed; and an assembly configured to remove air between the photosensitive element and an exterior top surface of the exposure bed.Type: ApplicationFiled: April 3, 2014Publication date: October 23, 2014Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: VOLKER STRUEWE, HELMUT LUETKE
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Publication number: 20140313494Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: April 25, 2014Publication date: October 23, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
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Publication number: 20140313495Abstract: An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided directly on a surface of a transmissive optical element on the substrate's side of the projection optical system, and a second anti-dissolution member formed on the first anti-dissolution member on the substrate's side of the first anti-dissolution member.Type: ApplicationFiled: June 30, 2014Publication date: October 23, 2014Applicant: Nikon CorporationInventor: Takeshi SHIRAI
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Publication number: 20140315132Abstract: The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.Type: ApplicationFiled: April 3, 2014Publication date: October 23, 2014Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: VOLKER STRUEWE, Helmut Luetke, Rolf Schwan
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Patent number: 8867017Abstract: A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and liquid includes a movable member having an upper surface, a part of which holds the substrate. A liquid immersion system that has a supply port and a recovery port supplies the liquid to a space between the projection optical system and the upper surface via the supply port of a supply path and recovers the liquid of a liquid immersion region formed in the space via the recovery port of a recovery path. A flow path is connected to the supply path between the supply port and a source of the liquid, the flow path permitting flow therethrough to remove liquid that remains in the supply path, the liquid that remains in the supply path having been supplied from the source of the liquid without being discharged from the supply port.Type: GrantFiled: January 28, 2013Date of Patent: October 21, 2014Assignee: Nikon CorporationInventors: Hideaki Hara, Hiroaki Takaiwa, Dai Arai
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Publication number: 20140306441Abstract: A method of manufacturing a security device including: conveying a substrate web including a photosensitive film along a transport path; exposing the photosensitive film to radiation of a predetermined wavelength through a mask, wherein the mask includes a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web including the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern.Type: ApplicationFiled: October 11, 2012Publication date: October 16, 2014Inventor: Adam Lister
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Publication number: 20140307237Abstract: A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7% or higher and a thickness of 3 through 50 micrometers; the pellicle frame with the pure aluminum layer may be subjected to anodic oxidation treatment, electric coloring, and void filling, and a resin layer can be formed as the outermost layer.Type: ApplicationFiled: January 31, 2014Publication date: October 16, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: Kazutoshi Sekihara
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Publication number: 20140307235Abstract: A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions.Type: ApplicationFiled: October 7, 2013Publication date: October 16, 2014Inventor: Shinji SATO
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Publication number: 20140307239Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.Type: ApplicationFiled: June 25, 2014Publication date: October 16, 2014Inventors: Florian Bach, Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm
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Publication number: 20140307236Abstract: A printer includes: a mask; a cleaning section configured to perform cleaning of the mask by movement relative to the mask in a predetermined direction parallel with an under surface of the mask; a mask holding section capable of turning the mask about an axis perpendicular to the under surface of the mask while holding the mask; and a control section configured to perform a control such that the cleaning is performed on the mask placed in a predetermined position about the axis.Type: ApplicationFiled: April 5, 2012Publication date: October 16, 2014Applicant: YAMAHA HATSUDOKI KABUSHIKI KAISHAInventors: Motoki Kobayashi, Hidetoshi Sato
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Publication number: 20140307238Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.Type: ApplicationFiled: June 25, 2014Publication date: October 16, 2014Applicants: NIKON CORPORATION, NIKON ENGINEERING CO., LTD.Inventors: Hirotaka KOHNO, Takeshi OKUYAMA, Hiroyuki NAGASAKA, Katsushi NAKANO
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Patent number: 8860922Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: January 23, 2012Date of Patent: October 14, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Patent number: 8860923Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: GrantFiled: September 22, 2011Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
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Patent number: 8860926Abstract: A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.Type: GrantFiled: September 22, 2011Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Pieter Renaat Maria Hennus, Jeroen Johannes Sophia Maria Mertens, Patrick Johannes Cornelus Hendrik Smulders, Peter Smits
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Patent number: 8860924Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.Type: GrantFiled: August 20, 2012Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia M. Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Patent number: 8859188Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.Type: GrantFiled: February 6, 2006Date of Patent: October 14, 2014Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
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Publication number: 20140300875Abstract: A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that includes at least a portion disposed below the first member, that is capable of being opposite to the object and that is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.Type: ApplicationFiled: December 19, 2013Publication date: October 9, 2014Inventors: Shinji SATO, Kenyo ODANAKA
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Publication number: 20140300876Abstract: The invention relates to an optical arrangement comprising: at least one optical element comprising an optical surface and a substrate, wherein the substrate is formed from a material whose temperature-dependent coefficient of thermal expansion at a zero crossing temperature ?TZC=TZC?Tref related to a reference temperature Tref is equal to zero, wherein the optical surface has, during the operation of the optical arrangement, a location-dependent temperature distribution ?T(x, y) that is dependent on a local irradiance (5a), is related to the reference temperature Tref and has an average temperature ?Tav, a minimum temperature ?Tmin and a maximum temperature ?Tmax, wherein the average temperature ?Tav is less than the average value 1/2 (?Tmax+?Tmin) formed from the minimum temperature ?Tmin and the maximum temperature ?Tmax, and wherein the zero crossing temperature ?TZC is greater than the average temperature ?Tav.Type: ApplicationFiled: June 19, 2014Publication date: October 9, 2014Inventors: Norman Baer, Toralf Gruner, Ulrich Loering
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Patent number: 8854599Abstract: An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally.Type: GrantFiled: September 28, 2010Date of Patent: October 7, 2014Assignee: Nikon CorporationInventors: Hideaki Hara, Hiroaki Takaiwa, Dai Arai
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Patent number: 8853590Abstract: A device for irradiating a laser beam onto an amorphous silicon thin film formed on a substrate. The device includes: a stage mounting the substrate; a laser oscillator for generating a laser beam; a projection lens for focusing and guiding the laser beam onto the thin film; a reflector for reflecting the laser beam guided onto the thin film; a controller for controlling a position of the reflector; and an absorber for absorbing the laser beam reflected by the reflector.Type: GrantFiled: November 6, 2007Date of Patent: October 7, 2014Assignee: Samsung Display Co., Ltd.Inventors: Hyun-Jae Kim, Myung-Koo Kang
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Patent number: 8852850Abstract: A photolithographic exposure system for use on a photoresist on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and a fluid dispensing system. The projection optical exposure system is positioned to project an image of the one or more object patterns toward an image plane. The fluid dispensing system positions a fluid between the projection optical exposure system and the photoresist on the substrate. The fluid has a refractive index value above a refractive index value of water and an absorbance below 0.8 per millimeter at wavelengths between about 180 nm and about 300 nm.Type: GrantFiled: February 3, 2005Date of Patent: October 7, 2014Assignee: Rochester Institute of TechnologyInventor: Bruce W. Smith
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Patent number: 8854602Abstract: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.Type: GrantFiled: November 22, 2004Date of Patent: October 7, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Andreas Wurmbrand, Jens Kugler, Armin Schoeppach, Christian Zengerling, Stephane Bruynooghe
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Patent number: 8852847Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.Type: GrantFiled: November 7, 2013Date of Patent: October 7, 2014Assignee: FUJIFILM CorporationInventor: Hideaki Tsubaki
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Patent number: 8854598Abstract: A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.Type: GrantFiled: July 8, 2009Date of Patent: October 7, 2014Assignee: ASML Netherlands B.V.Inventors: Jan-Jaap Kuit, Doede Frans Kuiper
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Publication number: 20140293248Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: April 24, 2014Publication date: October 2, 2014Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Jozef Maria FINDERS, Paul GRÄUPNER, Johannes Catharinus Hubertus MULKENS, Jan Bernard Plechelmus VAN SCHOOT
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Publication number: 20140293249Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.Type: ApplicationFiled: May 21, 2014Publication date: October 2, 2014Applicant: NIKON CORPORATIONInventors: Naoyuki KOBAYASHI, Akikazu TANIMOTO
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Patent number: 8848162Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.Type: GrantFiled: October 8, 2010Date of Patent: September 30, 2014Assignee: ASML Netherlands B.V.Inventor: Johannes Catharinus Hubertus Mulkens
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Patent number: 8848164Abstract: A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.Type: GrantFiled: May 31, 2011Date of Patent: September 30, 2014Assignee: ASML Netherlands B.V.Inventors: Laurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Pieter Jacob Kramer
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Patent number: 8848166Abstract: An immersion exposure apparatus and method expose a substrate with an exposure beam via an optical assembly and via immersion liquid. A first stage on which a substrate is mounted is positioned below the optical assembly so that the immersion liquid is maintained in a space between the optical assembly and the substrate. The first stage is replaced below the optical assembly with a second stage while maintaining the immersion liquid below the optical assembly. The replacing includes arranging a movable member, which is independently movable relative to the first and second stages and away from below the optical assembly, to face the optical assembly so as to substantially maintain the immersion liquid below the optical assembly while the first and second substrate stages are away from below the optical assembly. A control system controls a drive system to move the first and second stages.Type: GrantFiled: July 19, 2013Date of Patent: September 30, 2014Assignee: Nikon CorporationInventor: Michael Binnard
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Patent number: 8848165Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.Type: GrantFiled: February 9, 2012Date of Patent: September 30, 2014Assignee: ASML Netherlands B.V.Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
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Patent number: 8848163Abstract: A lithography apparatus generates a tunable magnetic field to facilitate processing of photoresist. The lithography apparatus includes a chamber and a substrate stage in the chamber operable to hold a substrate. A magnetic module provides a magnetic field to the substrate on the substrate stage. The magnetic module is configured to provide the magnetic field in a tunable and alternating configuration with respect to its magnitude and frequency. The magnetic field is provided to have a gradient in magnitude along a Z-axis that is perpendicular to the substrate stage to cause magnetically-charged particles disposed over the substrate stage to move up and down along the Z-axis. The lithography apparatus also includes a radiation energy source and an objective lens configured to receive radiation energy from the radiation energy source and direct the radiation energy toward the substrate positioned on the substrate stage.Type: GrantFiled: March 17, 2011Date of Patent: September 30, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsien-Cheng Wang, Chin-Hsiang Lin, Heng-Jen Lee, Ching-Yu Chang, Hua-Tai Lin, Burn Jeng Lin
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Publication number: 20140285781Abstract: A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, and a first liquid supply part, is disposed at at least a portion of surrounding of the first opening part and capable of opposing the surface of the object, are provided at the first part, and a second member includes a first liquid recovery part which can be opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path.Type: ApplicationFiled: December 19, 2013Publication date: September 25, 2014Inventor: Shinji SATO
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Patent number: 8842257Abstract: A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting the substrate on a stage in a treatment container; and repeating a plurality of times steps of supplying a solvent gas to a center portion of the substrate while exhausting the solvent gas from a periphery of the substrate to swell the pattern mask, and then supplying a drying gas for drying the solvent supplied to the substrate to the center portion of the substrate while exhausting the drying gas from the periphery of the substrate.Type: GrantFiled: February 22, 2012Date of Patent: September 23, 2014Assignee: Tokyo Electron LimitedInventors: Shinji Kobayashi, Fumiko Iwao
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Publication number: 20140268074Abstract: The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.Type: ApplicationFiled: January 30, 2014Publication date: September 18, 2014Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu, Chia-Hao Yu, Shih-Ming Chang, Anthony Yen
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Patent number: 8836915Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.Type: GrantFiled: February 23, 2012Date of Patent: September 16, 2014Assignee: ASML Netherlands B.V.Inventors: Pieter Mulder, Jan Willem Cromwijk, Jimmy Matheus Wilhelmus Van De Winkel, Marjan Leonardus Catharina Hoofman, Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks
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Patent number: 8836912Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.Type: GrantFiled: October 14, 2011Date of Patent: September 16, 2014Assignee: ASML Netherlands B.V.Inventors: David Bessems, Erik Henricus Egidius Catharina Eummelen, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van Der Zanden, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops, Paul Willems
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Patent number: 8836914Abstract: A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure.Type: GrantFiled: June 21, 2012Date of Patent: September 16, 2014Assignee: Nikon CorporationInventors: Andrew J. Hazelton, Michael Sogard
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Patent number: 8836913Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.Type: GrantFiled: November 30, 2011Date of Patent: September 16, 2014Assignee: ASML Netherlands B.V.Inventors: Peter Paul Steijaert, Wilhelmus Josephus Box, Emiel Jozef Eussen, Erik Roelof Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Albertus Adrianus Smits
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Publication number: 20140253886Abstract: An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the first being disposed at at least a portion of surrounding of the optical member, the second being disposed at at least a portion of surrounding of an optical path of the exposure light below the first member, being movable with respect to the first member and including a second upper and lower surface, the second upper surface being opposite a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, which is movable below the optical member; and a vibration isolator configured to suppress a vibration of the first member.Type: ApplicationFiled: October 7, 2013Publication date: September 11, 2014Inventor: Shinji SATO
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Publication number: 20140253889Abstract: An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. A first support member supports the projection system, and a second support member supports the liquid confinement member, wherein the projection system is isolated from vibrations of the liquid confinement member.Type: ApplicationFiled: May 23, 2014Publication date: September 11, 2014Applicant: NIKON CORPORATIONInventor: Hiroyuki NAGASAKA
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Publication number: 20140253888Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.Type: ApplicationFiled: May 21, 2014Publication date: September 11, 2014Applicant: NIKON CORPORATIONInventors: W. Thomas NOVAK, Andrew J. HAZELTON, Douglas C. WATSON
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Publication number: 20140253887Abstract: Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. In one embodiment, an apparatus for removing debris particles from a beam of radiation includes a mask station comprising a chamber body, a mask stage disposed in the mask station, and a conductive plate having an opening formed therein, wherein the conductive plate is disposed in a spaced apart relationship to the mask stage in the mask station, defining an interior volume between the mask stage and the conductive plate.Type: ApplicationFiled: March 6, 2014Publication date: September 11, 2014Applicant: Applied Materials, Inc.Inventors: Banqiu WU, Ajay KUMAR
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Patent number: 8830440Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photolithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.Type: GrantFiled: July 20, 2011Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Andrew John Harpham, Paul John Shechter, Paul Alan Stockman