Abstract: An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The techniques described use relatively simple optical detectors and data acquisition electronics that are capable of monitoring the distortion in real time, during operation of the lithography equipment. Time-varying anisotropic distortion of a reticle can be measured by directing slit patterns of light having different orientations to the reticle and detecting reflected, transmitted or diffracted light from the reticle. In one example, corresponding segments of successive time measurements of secondary light signals are compared as the reticle scans a substrate at a reticle stage speed of about 1 m/s to detect temporal offsets and other features that correspond to spatial distortion.

Abstract: The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus including a first detection unit configured to detect a surface structure in a wafer edge region of the substrate, a specifying unit configured to specify, from the surface structure detected by the first detection unit, an effective region in which the pattern of the imprint material is formed, and a first determining unit configured to determine, based on the effective region specified by the specifying unit, a shape of a peripheral shot region whose area is smaller than an area of a pattern region of the mold, and a second determining unit configured to determine based on the shape determined by the first determining unit, a supply position of the imprint material in the peripheral shot region.

Abstract: A hold-down pallet for a textile printer, the pallet comprising a central board and flaps, the flaps moving between an open position to allow placing of a garment and a closed position to hold a garment firmly on the board for printing, the pallet travelling between a garment setting position and a printing area and comprising an engagement mechanism which engages the pallet as it enters the garment setting position. Engagement opens the flaps so that the flaps are in the open position in the garment setting area, the pallet disengaging to close the flaps as it heads for the printing area.

Abstract: Systems and methods for imprinting formable material on a substrate with a template. Illuminate the formable material with a gelling radiation distribution pattern. The gelling radiation distribution pattern has a gelling dosage that that varies from a minimum gelling dosage at each of a plurality of corners of a boundary edge to a peak gelling dosage at a center of each of the boundary edges.

Abstract: A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

Abstract: An exposure method includes projecting a reticle pattern into a first exposure field of a photoresist layer, wherein the reticle pattern includes first and second line patterns on opposite edges of the reticle pattern and wherein at least the first line pattern includes an end section through which light flux decreases outwards. The reticle pattern is further projected into a second exposure field of the photoresist layer, wherein a first tapering projection zone of the end section of the first line pattern in the second exposure field overlaps a projection area of the second line pattern in the first exposure field.

Abstract: An edge exposure apparatus and method are disclosed. The edge exposure apparatus includes: a base frame (1); an edge exposure unit (2) mounted on the base frame and configured to perform an edge exposure process on a wafer; a pre-alignment unit (3) for centering and orienting the wafer and cooperating with the edge exposure unit (2) in the edge exposure process; a cassette unit (4) for storing and detecting the wafer; a robotic arm (5) for transferring the wafer; and a master control unit (6) for controlling the above components of the edge exposure apparatus. The edge exposure unit (2) and the pre-alignment unit (3) share a common worktable, resulting in structural compactness. Alternatively, two pre-alignment units (3) and two edge exposure units (2) may be included in order to increase processing efficiency.

Abstract: An extreme ultraviolet lithography system (10) that creates a new pattern (330) having a plurality of densely packed parallel lines (332) on a workpiece (22), the system (10) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13B) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22) to create a first stripe (364) of generally parallel lines (332) during a first scan (365); and a control system (24). The workpiece (22) includes an existing pattern (233) that is distorted. The control system (24) selectively adjusts a control parameter during the first scan (365) so that the first stripe (364) is distorted to more accurately overlay the portion of existing pattern (233) positioned under the first stripe (364).

Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.

Abstract: A roll-shaped medium transport device includes: a medium supply unit that keeps a roll body formed by winding a roll-shaped medium on a support shaft, and unwinds and supplies the roll-shaped medium; a transport unit that transports the roll-shaped medium unwound from the roll body; a rotation detecting unit that detects rotation of the support shaft; a rotation unit that rotates the support shaft; and a determination unit that determines abnormality of a transport state of the roll-shaped medium on the basis of the rotation detecting unit when the rotation unit rotates the support shaft, when the rotation detecting unit does not detect the rotation of the support shaft in a state where a transport operation of the roll-shaped medium is performed by the transport unit.

Abstract: A method and system is provided to extend operational life of a mirror array of an image generating system, wherein the image generating system further includes a high intensity power light source to cause light to impinge on the mirror array, sufficient to cause deleterious plastic deformation of associated hinges of the mirror array, and an image output generating section configured to receive light from the mirror array. Image date is received by the image generating system image data to control mirrors of the mirror array and to generate an output image. A required level of illumination is provided from the mirror array to the image output generating section over a predetermined time period, in accordance with the received image data.

Abstract: A system for making flexible circuit films includes an inelastic conveyor, a web handling apparatus configured to pass a flexible substrate around the inelastic conveyor, an image acquisition apparatus configured to measure positions of a first set of alignment marks on the flexible substrate at a first conveyor location, an exposure apparatus configured to patternwise expose a photosensitive material on the flexible substrate at a second conveyor location, and an image processor configured to receive the measured positions of the first set of alignment marks, and to compare the measured positions with reference positions of the first set of alignment marks. The exposure apparatus is configured to patternwise expose the photosensitive material based on the comparison between the measured positions and the reference positions.

Abstract: An image processing device includes first and second feeding units. The first feeding unit feeds a sheet toward the second feeding unit in a sheet feeding direction via a sheet feeding path. The device further includes an image processing portion. The first feeding unit is in the path upstream of the processing portion and includes a first shaft rotating in the feeding direction. The second feeding unit is in the path downstream of the processing portion, and the first and the second units feed and hold the sheet. The second feeding unit includes a second shaft rotating in the feeding direction. The device includes a first supporting member supporting first and second ends of the first shaft, a second supporting member supporting first and second ends of the second shaft, and a third supporting member supporting one shaft at a predetermined portion which is not either end of either shaft.

Abstract: An image reading and recording apparatus includes a reading unit, a recording unit, and a movable member. The movable member is configured to select a discharge way of the document discharged from the reading unit from at least a first discharge way in which the document is discharged into a space between the reading unit and the recording unit and a second discharge way in which the document is discharged to a side of the recording unit.

Abstract: A device for optically imaging at least part of an object onto an area of a digital image sensor includes an optical channel, which includes a first imaging lens arranged on a first substrate, a second imaging lens arranged on a second substrate, and a field lens arranged on a third substrate. The first and second imaging lenses are identical and arranged such that a first surface of the first imaging lens is a light entry surface of the optical channel and that a first surface of the second imaging lens is a light exit surface of the optical channel. The field lens is arranged between the first imaging lens and the second imaging lens such that an axis running perpendicularly to the lateral extension of the optical channel and through a lateral center of the field lens forms a symmetry axis of the optical channel.

Abstract: An image processing device comprises a first feeding unit coupled to a second feeding unit via a sheet feeding path and is configured to feed a sheet toward the second feeding unit in a sheet feeding direction via the sheet feeding path. The first feeding unit comprises a first shaft configured to rotate in the sheet feeding direction, and the second feeding unit comprises a second shaft configured to rotate in the feeding direction. The first feeding unit and the second feeding unit are configured to feed and hold the sheet simultaneously. The image processing device further comprises a first supporting member which rotatably supports the first shaft, a second supporting member which rotatably supports the second shaft, and a third supporting member which rotatably supports the first shaft and/or the second shaft at a location different than the first supporting member and/or the second supporting member.

Abstract: A shading device includes: a shading member to pass a conveying path for conveying a recoding medium to plural image reading sections and reach the plural image reading sections; and a moving member to move the shading member between the plural image reading sections and a retracted position on the outside of the conveying path.

Abstract: A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface.

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as ?, and circumference ratio is taken as ?, then the conditions for D?(?×L)/? are satisfied.

Abstract: A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation support device; an object movable with respect to the metrology frame; and a displacement determining unit to determine positions, speeds and/or accelerations of the object with respect to the metrology frame and/or the projection system. At least one actuator is provided for applying correcting forces and/or torques on the metrology frame, and a controller is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame based on the determined positions, speeds and/or accelerations of the object in order to compensate for pressure pulses exerted on the metrology frame due to movements of the object with respect to the metrology frame.

Abstract: A light shielding unit, which shields a part of an exposure light with a light shielding member, includes a sensor which detects displacement of the light shielding member, a driving device which drives the light shielding member based on a detection result obtained by the sensor, a case which accommodates the sensor and the driving device, and a bellows mechanism which gas-seals the case with respect to the light shielding member. When the illumination area of the illumination light is defined, it is possible to mitigate the influence of the foreign matters and/or the heat generated from the driving mechanism.

Abstract: An exposure method comprises setting an exposure condition using a value of an exposure parameter when plural types of patterns are transferred onto a substrate. The method of determining a value of an exposure parameter comprises calculating an optical image, formed on an image plane upon illuminating a pattern on an object plane, for each of combinations of plural values of an exposure parameter and plural values of at least one of an exposure amount and a defocus amount, calculating, for each of the plural values of the exposure parameter, a deviation between a contour of a target optical image and a calculated contour of the optical image, in each of the plural types of patterns, and determining a value of the exposure parameter, at which a maximum value of the deviations among the plural types of patterns is minimum, as a value of the exposure parameter when exposing the substrate.

Abstract: Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.

Abstract: An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit that moves the first object and the second object in a first direction within a predetermined plane including a first position opposing the first optical member in a state in which the first object and the second object are close to or in contact with each other and in which positions of the first object and the second object in a second direction within the predetermined plane are shifted.

Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.

Abstract: An ink jet imaging system comprises a heated imaging drum that rotates in at least one direction, a print head for ejecting ink onto the heated imaging drum as it rotates past the print head to form an image, a media sheet transport for synchronizing movement of a media sheet with rotation of the heated imaging drum, a transfixing roller that forms a transfixing nip with the heated imaging drum to transfix the image on the rotating heated image drum onto the media sheet synchronized by the media sheet transport, and a media director located between the media sheet transport and the heated imaging drum to direct the media sheet into close proximity with the heated imaging drum at a position sufficiently prior to the transfixing nip that the heated imaging drum heats the media sheet before the media sheet enters the transfixing nip.

Abstract: An optical member is irradiated with light in order to measure position information in a first direction. The optical member has a first reflecting surface, onto which light propagating in a second direction intersecting the first direction is incident, and a second reflecting surface, onto which light propagating in the second direction is incident. The first reflecting surface and second reflecting surface are optically connected, and light reflected by one among the first reflecting surface and second reflecting surface is incident on the other reflecting surface.

Abstract: The present invention relates to a method to improve at least one feature edge steepness in an image to be exposed onto a moving workpiece, comprising the actions of: moving the image in essentially the same direction relative to the direction of movement of the workpiece, synchronizing said moving of the image with a pulse length of an exposure radiation source.

Abstract: An exposing method that forms a pattern of a reticle on a wafer is provided. In the method, part of the pattern of the reticle in an illumination area, which is illuminated by illumination light from an illumination optical system, is illuminated, and while scanning the illumination area with respect to the reticle in the +Y direction (or the ?Y direction) by pivoting a deflection mirror, the reticle is moved in the corresponding ?Y direction (or the +Y direction) and the wafer is moved in a direction that corresponds to the movement direction of the reticle.

Abstract: An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Abstract: In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in a matrix manner, the unit is continuously and relatively moved at a constant velocity with respect to the drawing surface in an array-direction defined by a matrix-arrangement of the modulation elements. Optical modulation elements, spaced at a regular interval in an alignment of optical modulation elements along the array-direction, are successively and selectively driven based on a same bit datum, to thereby modulate a light beam made incident thereon, whenever the exposure unit is moved by a distance corresponding to the regular interval, resulting in the production of a pixel dot on the drawing surface in a multi-exposure manner by the modulated light beams.

Abstract: This invention relates to an electrophoretic display or a liquid crystal display and novel processes for its manufacture. The electrophoretic display (EPD) of the present invention comprises microcups of well-defined shape, size and aspect ratio and the microcups are filled with charged pigment particles dispersed in an optically contrasting dielectric solvent. The liquid crystal display (LCD) of this invention comprises well-defined microcups filled with at least a liquid crystal composition having its ordinary refractive index matched to that of the isotropic cup material. A novel roll-to-roll process and apparatus of the invention permits the display manufacture to be carried out continuously by a synchronized photo-lithographic process.

Abstract: A photo film cassette contains IX240 type of photo film in a manner movable out through a photo film passageway. A photo film carrier has a feeding path with an entrance, toward which the photo film is advanced. The photo film carrier includes a carrier base plate disposed to extend upstream from the entrance. A holder plate is secured to the carrier base plate in a shiftable manner between first and second positions, and has a first face and a second face. The first face is loaded with the photo film cassette, and when the holder plate is in the first position, is positioned close to the entrance, for opposing the photo film passageway of the photo film cassette to the entrance. The second face, when the holder plate is in the second position, is positioned close to the entrance, for guiding entry of photo film of IX240 type in a cassetteless form to the entrance.

Abstract: In a scanning exposure apparatus and method, first and second interferometers of an interferometer system monitor first and second stages of a stage system, one of which holds a mask and the other of which holds a substrate. The first stage is moved at a first scanning speed during scanning exposure, and the second stage is moved at a second scanning speed during the scanning exposure, the speeds differing in accordance with a projecting magnification of a projection unit. The first stage is moved in accordance with a deviation, obtained by using the interferometer system, between the first stage and the second stage in a direction other than the scanning direction during the scanning exposure.

Abstract: An apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.

Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: A method and rotational mask scanning apparatus for exposing a plurality of images on a workpiece, include a rotatable mask having a pattern of image segments thereon, an optical system for projecting the image segments onto the workpiece, and a device for at least one of rotating the mask and for moving the workpiece so as to continuously expose a plurality of regions on the workpiece with the pattern of image segments.

Abstract: To achieve for a photographic film conveying device that no external force causing conveying speed to vary is applied to a photographic film during image reading, after a preceding photographic film is discharged from a reading conveying path, the time until a subsequent photographic film is conveyed to the reading conveying path is not long, or even if a photographic film set in a film supplying section is elongate, image reading of photographic films by an image reading section can be carried out efficiently, there is provided a photographic film conveying device comprising a section setting a discharge conveying section in a withdrawn state or a conveying state, a section controlling conveying of preceding and subsequent photographic films, or a section switching a conveying path of a photographic film.

Abstract: To enable continuation of the transport of a strip-shaped workpiece, its delivery from a delivery reel and its take-up onto a take-up reel even for strip-shaped workpieces that have through openings, such as device holes or the like, in portions thereof, an upper sensor and a lower sensor are provided for detecting sagging of the workpiece at two points, one above the other, and a control element controls the drive of the delivery reel based on the outputs of the upper sensor and the lower sensor which are located between the delivery reel and processing part. Additionally, the control element controls the drive of the take-up reel based on the outputs of a second upper sensor and a second lower sensor located between the processing part and the take-up reel.

Abstract: A projection exposure apparatus has a magnifying projection optical system for projecting a magnified image of an original on a photosensitive substrate, a first position detecting element for detecting a position of the original, a second position detecting element for detecting a position of the photosensitive substrate, and a drive device for moving the original and the photosensitive substrate in a predetermined relationship relative to the magnifying projection optical system. The drive device performs the movements on the basis of results of the first and second position detecting elements.

Abstract: A method and apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.

Abstract: A method and rotational mask scanning apparatus for exposing a plurality of images on a workpiece, include a rotatable mask having a pattern of image segments thereon, an optical system for projecting the image segments onto the workpiece, and a device for at least one of rotating the mask and for moving the workpiece so as to continuously expose a plurality of regions on the workpiece with the pattern of image segments.

Abstract: A film carrier which convenes photographic photosensitive material on which an image is recorded, over a scanning section through which light from a light source passes. The film carrier includes a base placed above the scanning section, a platen movable over the base, a mask which is set on the platen, a pressure plate which together with the mask sandwiches the photographic photosensitive material, a moving device which moves the platen reciprocally over the base, and a conveying device provided at the mask for conveying the photographic photosensitive material.

Abstract: A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has been calculated using the measured distortion map of the lithographic objective. The figuring process applied to the plate uses the principle of polishing in the presence of an elastic deformation, so as to achieve the desired aspherical shape on both sides.

Abstract: A novel device for image-shooting both surfaces of documents at a high rate by an electronic device. The device has an upper transport system for allowing plural documents to descend/move by a pre-set number at a time towards the downstream and an image-shooting device for image-shooting the descending/moving document. Image-shooting can be done simultaneously on both sides or side by side, either during free movement or controlled movement by a transporting device.

Abstract: A method and rotational mask scanning apparatus for exposing a plurality of images on a workpiece, include a rotatable mask having a pattern of image segments thereon, an optical system for projecting the image segments onto the workpiece, and a device for at least one of rotating the mask and for moving the workpiece so as to continuously expose a plurality of regions on the workpiece with the pattern of image segments.

Abstract: Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.

Abstract: Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.

Abstract: A structure for protecting and guiding a flat cable connected between a traveling module and a protective cover of a scanner is disclosed. The protective structure includes an anti-bending member mounted onto the traveling module for preventing the flat cable from being over-bent at its first end. A guide channel member is disposed on the protective cover under the flat cable and along the moving direction of the traveling module for guiding the flat cable during moving of the traveling module and preventing the flat cable from being swung left and right. The second end of the flat cable is extended into the protective cover via a protective sheath fitted on the cover for preventing the second end of the flat cable from excess bending angle and keep the flat cable smoothly moving without deflection.