Abstract: An image forming apparatus includes a printer portion; an image reading portion rotatable relative to the printer portion; a discharge portion configured to stack the recording material discharged from an inside of the printer portion, the discharge portion being supported rotatably relative to the printer portion; and a regulating member provided between the discharge portion and the image reading portion and configured to regulate movement of the recording material stacked on the discharge portion. When the image forming apparatus is seen in a rotational axis direction of the image reading portion, at least a part of the regulating member in a state in which the image reading portion and the discharge portion are open away from the printer portion is hidden inside a contour of a casing of the image reading portion.

Abstract: A holding apparatus includes a holding portion that includes a first member which contacts a portion of an object, a second member which at least a portion thereof is fixed to a base, and a connection member which is configured to connect the first and second members, and a driving unit which drives the holding portion to change at least a posture of the first member, wherein a relative positional relationship between the first member and the second member is changed via the connection member.

Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.

Abstract: Variable orientation illumination-pattern rotators (“IPRs”) that can be incorporated into structured illumination microscopy instruments to rapidly rotate an interference pattern are disclosed. An IPR includes a rotation selector and at least one mirror cluster. The rotation selector directs beams of light into each one of the mirror clusters for a brief period of time. Each mirror cluster imparts a particular predetermined angle of rotation on the beams. As a result, the beams output from the IPR are rotated through each of the rotation angles imparted by each of the mirror clusters. The rotation selector enables the IPR to rotate the beams through each predetermined rotation angle on the order of 5 milliseconds or faster.

Abstract: A paper sheet handling apparatus capable of effectively preventing a photodetector from malfunctioning due to external light is provided. The present invention is a paper sheet handling apparatus including a paper sheet handling port, a projector for emitting light within the paper sheet handling port, a photodetector for receiving the light emitted from the projector, and a light-shielding body that is formed along an optical path from the projector towards the photodetector and shields the photodetector against external light; wherein a projector-side end of the light-shielding body is formed to be retracted from an incident direction of the external light towards the photodetector.

Abstract: An image reading apparatus includes an image reading unit that is reciprocally movable in a predetermined direction; a guide member that supports the image reading unit and guides the image reading unit in the predetermined direction; a first cable that is fixed to the image reading unit at one end of the first cable and is deformable in accordance with a movement of the image reading unit; and a second cable that is fixed to the image reading unit at one end of the second cable and is deformable in accordance with the movement of the image reading unit, wherein the first cable and the second cable are provided such that a rotation moment of the image reading unit generated by a reaction force of the first cable and a rotation moment of the image reading unit generated by a reaction force of the second cable cancel each other out.

Abstract: Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.

Abstract: A method for inspecting wafers or other flat objects having an object surface, comprises the steps of: providing a camera assembly with a camera for recording images of said object surface or portions of said object surface during an exposure time which is limited by a shutter; generating a continuous relative movement of said camera assembly and said object without interruption, whereby a movement blur of said image during said exposure time is caused; continuously illuminating said object with an illuminance which is controlled to remain at the same value; and recording one or more images of at least one of said portions of said object surface with said camera; defining a movement blur which is acceptable for an analysis of said image wherein said exposure time is smaller than a time causing said acceptable movement blur; and performing said analysis of said image.

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract: A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.

Abstract: An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has a opening for imaging light to pass through. The fourth-last mirror in the light path before the image field is not obscured and provides, with an outer edge of the optically effective reflection surface thereof, a central shadowing in a pupil plane of the imaging optical system. The distance between the fourth-last mirror and the last mirror along the optical axis is at least 10% of the distance between the object field and the image field. An intermediate image, which is closest to the image plane, is arranged between the last mirror and the image plane. The imaging optical system can have a numerical aperture of 0.9. These measures, not all of which must be effected simultaneously, lead to an imaging optical system with improved imaging properties and/or reduced production costs.

Abstract: A scanning exposure apparatus has plural projection optical systems having plural mirrors configured to form an optical-axis shift vector. Its component in a direction orthogonal to a scanning direction is set so that adjacent areas in plural areas on the original can adjoin each other when viewed from the direction orthogonal to the scanning direction and adjacent areas in plural areas on the substrate can adjoin each other when viewed from the direction. A size of its component in the scanning direction is set so that a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two projection optical systems in the plurality of projection optical systems can be equal to a distance between centers of two areas on the substrate corresponding to the two projection optical systems in the scanning direction.

Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

Abstract: Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning optical system; the scanning optical system including a main scanning optical system, and a sub scanning optical system for carrying out scanning in a direction perpendicular to an optical axis, and a scanning direction by the main scanning optical system, the sub scanning by the sub scanning optical system is carried out between frames of the main scanning by the main scanning optical system, a frame rate and an average of substantial numbers of times of movement until the sub scanning optical system returns from a sub scanning origin to the sub scanning origin satisfy a relationship of Rf/Ns>15 where Rf is the frame rate and Ns is the average of substantial numbers of times of movement.

Abstract: An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of ?14.3<(PD/TT)/R<?8.3 is fulfilled by a distance PD which is provided along an optical axis between the incident pupil and the first plane, a distance TT which is provided along the optical axis between the first plane and the second plane, and an angle of incidence R (rad) of a main light beam which comes into the first plane.

Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

Abstract: An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical system for forming an image of a first surface and an image of a second surface on a third surface comprises a first imaging optical system, a second imaging optical system, a third imaging optical system, a fourth imaging optical system, a fifth imaging optical system, a sixth imaging optical system, a seventh imaging optical system, a first folding member disposed between the third imaging optical system and the seventh imaging optical system, and a second folding member disposed between the sixth imaging optical system and the seventh imaging optical system.

Abstract: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

Abstract: Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning optical system; the scanning optical system including a main scanning optical system, and a sub scanning optical system for carrying out scanning in a direction perpendicular to an optical axis, and a scanning direction by the main scanning optical system, the sub scanning by the sub scanning optical system is carried out between frames of the main scanning by the main scanning optical system, a frame rate and an average of substantial numbers of times of movement until the sub scanning optical system returns from a sub scanning origin to the sub scanning origin satisfy a relationship of Rf/Ns>15 where Rf is the frame rate and Ns is the average of substantial numbers of times of movement.

Abstract: An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas circulation path for connecting a gas discharging port for discharging a gas from the chamber and a gas supplying port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in the gas circulation path.

Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

Abstract: Vibration-attenuation devices and methods are disclosed that utilize a bellows situated between a first and second mass and pressurized with a fluid to an internal fluid pressure substantially equal to a zero-stiffness pressure such that the bellows exhibits a substantially zero lateral stiffness. The devices may include various components configured to measure, regulate, and control the internal pressure of the bellows in order to maintain a desired pressure. The devices may include an active support, such as a secondary bellows or linear actuator, that provides a secondary support force. The active support may be connected to various components configured to measure and control the secondary support force. The vibration-attenuation devices disclosed may be used in a lithography exposure apparatus to attenuate vibrations between: (1) a support frame and a support surface; (2) a base and a stage-supporting platform; and (3) a supporting stage and a wafer stage.

Abstract: It is an object to provide a laser irradiation apparatus for enlarging an area of a beam spot and reducing a proportion of a region with low crystallinity. It is also an object to provide a laser irradiation apparatus for enhancing throughput with a CW laser beam. Furthermore, it is an object to provide a laser irradiation method and a method for manufacturing a semiconductor device with the laser irradiation apparatus. A region melted by a first pulsed laser beam having harmonic is irradiated with a second CW laser beam. Specifically, the first laser beam has a wavelength of visible light or a shorter wavelength than that of visible light (approximately not more than 830 nm, preferably, not more than 780 nm). Since the first laser beam melts a semiconductor film, an absorption coefficient of the second laser beam to the semiconductor film increases drastically and thereby being more absorbable.

Abstract: Disclosed is a stage device by which high precision motion and high speed motion can be accomplished simultaneously. The stage device includes a stage, a repulsive magnet unit for accelerating and/or decelerating the stage with respect to a movement direction, and a magnetic driving system for controlling the position of the stage. The repulsive force generator has (i) a repulsive stator, as a set magnet, including a plurality of magnets disposed along a direction orthogonal or substantially orthogonal to the movement direction, with a spacing therebetween while different poles of them are opposed to each other, and (ii) a repulsive movable element, as an insert magnet, to be mountably and demountably inserted into the spacing and being disposed in relation to the repulsive stator so that the same poles are opposed to each other.

Abstract: A laser exposure device at which alignment marks of a plate material on an exposure stage, which is moving in a direction opposite to a scanning direction, are read by a CCD camera mounted at a support gate, after which an imaging region, whose position is judged using the alignment marks, is exposed by a laser beam from a laser scanner. Here, a distance along the scanning direction from the CCD camera to the laser scanner is not less than a pitch of the alignment marks that are provided to respectively correspond to a trailing end and a leading end of the imaging region. According to this laser exposure device, even in a case in which a plurality of the imaging region is provided at a recording medium, an increase in a duration for forming images on the recording medium in accordance with an increase in imaging regions is prevented.

Abstract: Devices are disclosed for placement between first and second masses for attenuating transmission of motions from one of the masses to the other. A general embodiment of such a device includes a fluid isolator and a lateral fluid bearing situated along a support axis. The fluid isolator includes a housing defining an isolator chamber pressurized with a gas at pressure Pisol. The fluid isolator is situated such that motion of the masses relative to each other along the support axis is at the fluid isolator, and lateral motion is at the lateral fluid bearing. The lateral fluid bearing includes first and second bearing surfaces that are transverse to the support axis. At least one such surface defines three channels: pressure channel, atmospheric pressure channel, and vacuum channel. In order from the isolator chamber, the pressure channel (at pressure PXYbearing≈Pisol) is first, the atmospheric pressure channel (at pressure Patm) is second, and the vacuum channel (at pressure Pvac) is third.

Abstract: A die for a memory array may store Flash and EEPROM bits in at least one Nitride Read Only Memory (NROM) array. Each array may store Flash, EEPROM or both types of bits.

Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract: To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.

Abstract: A writing device is provided which, in simple processes, can write in two dimensions and three dimensions, and which can form highly accurate patterns. An exposure head, a conductive material discharging head, and an insulating material discharging head are disposed at one scanning stage. At the one scanning stage, a pattern can be formed on a printed board which is on the scanning stage. As a result, processes can be simplified, time between patternings can be shortened, and pattern formation can be made to be faster. Moreover, positional offset of the exposure head and the discharging heads with respect to the printed board does not arise. Thus, it is easy to increase a density of a pattern, and a highly accurate pattern is formed.

Abstract: A method forms a feature pattern on a substrate by exposing the substrate, using a mask having a pattern of features thereon, with illumination having a first set of settings. The substrate is exposed a second time, using the same mask having the pattern of features thereon, with illumination having a second set of settings. The mask having the pattern of features thereon remains stationary between the two illumination exposures of the substrate.

Abstract: A projection optical system for forming an image of a pattern in a first plane onto a second plane using exposure light in a wavelength region of shorter than 200 nm. When a projection pattern placed in the first plane and having a dark pattern and a light pattern around the dark pattern is projected onto the second plane, an average illuminance in a area where a projected image of the dark pattern is formed in the second plane is 8 or less, where an illuminance of an image of the light pattern around the dark pattern in the second plane is set to be 100.

Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.

Abstract: The present invention provides a method for detecting instantaneously a flare noise within patterns of a semiconductor device, including the steps of: A method for detecting a flare noise in a semiconductor device, comprising the steps of: preparing a mask having a plurality of expose-areas having different light energy-levels when photo exposing and a plurality of dummy patterns with different sizes for detecting flare noises in each expose-area; forming dummy patterns on a wafer through a photolithography process with the mask; and detecting the flare noise by comparing the dummy patterns in each expose-area with optical microscope.

Abstract: A system and method for an imaging system is provided. The system utilizes light of at least two wavelengths to project an image. The image is first projected using light of a first wavelength from a device such as a cathode ray tube and is directed towards a diode array connectable to an integrated circuit (IC). The light may pass through a translucent substrate of the diode array and strike sensors associated with the diodes and connected to the IC. Sensors which receive the light may provide power to the associated diodes using a power circuit present on the IC. The diodes receiving power may then emit light of the second wavelength and the emitted light may pass back through the translucent substrate. The IC may provide amplification if desired.

Abstract: A stage is driven along guide surfaces of a supporting member with a stator that is provided independent from the support member vibration-wise and a mover connected to the stage. In addition, when a drive amount of the supporting member exceeds a predetermined amount in, for example, the vertical direction, a connection between the stage and the mover by a connection mechanism is released. That is, the connection between the stage and the mover is released before the mover connected to the stage on the supporting member comes into contact with the stator and both parts are put under a large stress, which can prevent the mover and stator from being damaged. Furthermore, since the stator is provided independent from the support member vibration-wise, position control of the stage can be preformed with high precision. Accordingly, the stage can be driven stably, for over a long period of time.

Abstract: A first main body unit for supporting a substrate stage is supported at four points by vibration isolators, and a second main body unit is supported on the first main body unit at three points by second vibration isolators. This allows the first main body unit and the substrate stage to be supported in a stable manner with high rigidity, and for example, allows maintenance operations on the stage portion from the back side of the apparatus (−X side), which is not possible when the first main body unit is supported at three points. In addition, since the apparatus comprises vibration isolation units that are connected in series in two platforms, such an arrangement has a great effect of suppressing background vibration from the floor surface.

Abstract: A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm.

Abstract: A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups (33, 36) that are movable over large moving ranges.

Abstract: In a method for applying a scale (7) to a carrier (1,2), a material layer (11) is applied to the carrier in such a way that the change in length on account of temperature change of the material layer (11) corresponds at least approximately to changes in length of the carrier (1,2) on account of temperature change. The scale (7) is introduced into or applied to the material layer (11) with a measuring graduation (7a). The carrier may be an optical element, e.g. a lens (1) of an objective (5) for semiconductor lithography.

Abstract: To eliminate the disadvantage that determination of the alignment marks becomes difficult also in the case in which the peripheral area of the wafer is provided with alignment marks, a wafer, with a surface provided with alignment marks, and with a peripheral area provided with a singularly shaped point and to which a photoresist has been applied, is placed on a rotary stage and the edge position of the wafer and the singularly shaped point, such as a notch or the like, is determined by a device for determination of the singularly shaped point and the edge position. Based on the position information of the alignment marks formed in the wafer and based on the singularly shaped point and the edge position, a control element computes the positions of the alignment marks of the wafer which was seated on the rotary stage.

Abstract: The present invention provides the beam-shaping device which includes a first surface on which is formed a first grating through which a beam of light emitted from a light source on an optical axis passes; and a second surface on which is formed a second grating through which the beam of light having passed through the first surface passes; wherein the first grating and the second grating are designed, so as to maintain, when the wavelength of the emitted beam of light varies, a prescribed relationship between (1) the displacement of the first virtual light emitting point, in the first meridian plane containing the optical axis, and (2) the displacement of the second virtual light emitting point, in the second meridian plane perpendicular to the first meridian plane containing the optical axis.

Abstract: An alignment apparatus which detects the position of an alignment mark on a wafer has a low-magnification sensing system including the first imaging optical system and a photoelectric conversion element, and a high-magnification sensing system including the second imaging optical system and a photoelectric conversion element. Detection light from an alignment mark is branched, thereby sensing the alignment mark simultaneously by the low- and high-magnification sensing systems. The positions of the alignment mark are respectively calculated on the basis of the obtained low- and high-magnification images. If the mark position calculated on the basis of the low-magnification image falls within a predetermined range, the mark position calculated on the basis of the high-magnification image is determined to be valid and adopted as the proper alignment mark position.

Abstract: In a scanning exposure apparatus for performing exposure even when movable stages (31, 35) are being accelerated/decelerated, use is made of an illumination-distribution varying unit including a rotatable wedge prism (21) serving as an optical member for temporally varying the illumination distribution, and a prism driver (101) for driving the prism (21). The illumination-distribution varying unit has a function for varying the temporal change of the illumination distribution in conformity with a pattern for driving the movable stages (31, 35). An illumination distribution that conforms to an acceleration/deceleration pattern of the stages (31, 35) is measured and a pattern for driving the wedge prism (21) is decided based upon the result of measurement.

Abstract: The invention provides a method of making an EUV lithography stage structure for use in a semiconductor microlithography with EUV (extreme ultraviolet) radiation, where the stage is utilized to hold and support a substrate such as a mask or wafer.

Abstract: A high speed, high resolution, continuous optical film printer (25) is disclosed for copying negative intermediate film (11) onto a print film (12). The two films are placed side by side on a common transport shaft (13) and moved past an illumination system comprised of a source (30) and an integrating cylinder (15a). A unit magnification imaging optical system (25) produces a telecentric, monocentric, color corrected, high resolution, low flare image strip (18) on the print film which is parallel to the object strip. The optical film print also provides angularly diffuse illumination to provide scratch and matte suppression.

Abstract: An article of manufacture includes a medium having a plurality of checkerboard patches recorded thereon. Each of the patches is of equal nominal tint and formed of dots. The dots of each of the patches are of equal nominal size with the size being different from that of the dots forming all other patches. One of the patches is arranged adjacent to all other patches.

Abstract: A flow camera apparatus (10) operable for photographing large original documents in continuous, moving fashion includes a camera (74) located within the housing (12). An aperture adjustment mechanism (86) allows adjustment of the camera aperture from the outside of the housing (12) without opening the housing (12). The iris adjustment mechanism also allows the aperture to be changed during photographing of a document. The apparatus includes lamps (214, 216 and 218) for illuminating the document during photographing and a "T" mask assembly 22 provided with baffles (204 and 208) for allowing only light reflected from the document to enter the image path (88) to the camera (74). The apparatus (10) also includes precisely balanced detectors (126) for detecting entry of a document into the apparatus (10).

Abstract: A step-and-scan exposure method and a scanning exposure apparatus in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordance with the number of patterns transferred, and dimensions of a pattern illumination area are varied in accordance with the patterns to be transferred. Transfer of a pattern to a shot area is omitted when an image of the pattern on the shot area would extend beyond the photosensitive substrate. Elimination of exposure scanning movements for patterns that are not to be transferred permits rapid movements of the mask and the substrate to scanning start positions.