Step And Repeat Patents (Class 355/53)
  • Patent number: 11366396
    Abstract: A method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method includes determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.
    Type: Grant
    Filed: August 1, 2019
    Date of Patent: June 21, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Daan Maurits Slotboom, Hermannes Theodorus Heijmerikx, Javier Augusto Loaiza Rivas, Jeroen Cottaar
  • Patent number: 11366393
    Abstract: An optical arrangement of an imaging device for microlithography, particularly for using light in the extreme UV range, includes an optical element and a holding device for holding the optical element. The optical element includes an optical surface and defines a plane of main extension, in which the optical element defines a radial direction and a circumferential direction. The holding device includes a base element and more than three separate holding units. The holding units are connected to the base element and arranged in a manner distributed along the circumferential direction and spaced apart from one another. The holding units hold the optical element with respect to the base element. Each of the holding units establishes a clamping connection between the optical element and the base element. The clamping connection for each holding unit is separate from the clamping connections of the other holding units.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: June 21, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eugen Anselm, Karl Fenkl, Christoph Müller, Ralf Moser
  • Patent number: 11359327
    Abstract: An apparatus, a system, and a method for detecting water supply based on a vision sensor by performing big data, an artificial intelligence (AI) algorithm, and/or a machine learning algorithm in a 5G environment connected for the Internet of things is provided. The apparatus for detecting water may be used for a washing machine and includes a vision sensor mounted on a tub or in the vicinity of the tub, directed toward at least one water supply region of interest in the tub, and configured to acquire an image of the water supply region of interest, and a water supply level determiner configured to detect a water supply level through a vision algorithm based on the image information acquired by the vision sensor. The determiner may predict water supply time to the point in time at which the water supply will be completed based on models trained by machine learning.
    Type: Grant
    Filed: September 24, 2019
    Date of Patent: June 14, 2022
    Assignee: LG ELECTRONICS INC.
    Inventor: Jeong Yo Ha
  • Patent number: 11347143
    Abstract: A method for cleaning a reflective photomask is provided. The method includes: disposing the reflective photomask in a chamber; providing hydrogen radicals to the chamber; and exposing the reflective photomask to the hydrogen radicals. A method of manufacturing a semiconductor structure and system for forming a semiconductor structure are also provided.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: May 31, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Wu-Hung Ko, Chung-Hung Lin, Chih-Wei Wen
  • Patent number: 11336071
    Abstract: A device may determine at least one metric related to a plurality of laser pulses associated with a Q-switched laser. The device may determine a statistical metric for the at least one metric related to the plurality of laser pulses. The device may determine that the statistical metric satisfies a threshold level of deviation of the at least one metric related to the plurality of laser pulses from a baseline value for the at least one metric. The device may indicate laser degradation of the Q-switched laser based on determining that the statistical metric satisfies the threshold.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: May 17, 2022
    Assignee: Lumentum Operations LLC
    Inventors: Tobyn VanVeghten, Joseph J. Alonis, James J. Morehead, Loren A. Eyres
  • Patent number: 11327404
    Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: May 10, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
  • Patent number: 11320731
    Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: May 3, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter-Jan Van Zwol, Dennis De Graaf, Paul Janssen, Mária Péter, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, David Ferdinand Vles, Willem-Pieter Voorthuijzen
  • Patent number: 11315817
    Abstract: An apparatus for transferring a wafer includes a main body, a first support installed in the main body, a sensor support fixed to the first support, a finger member slidably installed along the first support to transfer the wafer and positioned at a lower level than the sensor support, three sensors each including a light emitter installed on the first support and a light receiver installed on the sensor support, the three sensors respectively configured to detect three points of an edge of the wafer seated on the finger member, and a controller connected to the three sensors, wherein the controller is configured to determine whether any of the three points of the edge of the wafer is detected from a notch of the wafer based on signals received from the sensors.
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: April 26, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Euijin Kim, Hyungjong Kim, Juno Park, Seok Heo
  • Patent number: 11308688
    Abstract: A localization microscope including an imaging device emitting sample light from a focal plane into an image plane, including an optical-manipulation device for depth-dependent influencing of a point-spread function of the imaging and influencing the point-spread function of the imaging such that a point emitter is imaged in the image plane into an image that is rotationally asymmetrically distorted. A form of the distortion depends on the location of the point emitter with respect to the focal plane and a wavelength of the sample light. The optical manipulation device includes first and second anisotropy elements that anisotropically influence the point spread function to produce rotational asymmetry of the point emitter image. The elements are arranged one behind the other in the imaging direction, with anisotropy axes at an angle to one another. Both elements have differing neutral wavelength at which they do not anisotropically influence the point spread.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: April 19, 2022
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Thomas Kalkbrenner, Michael Goelles
  • Patent number: 11306788
    Abstract: A carrying device and, a fixing method of a carrying device are provided. The carrying device includes a body and an electromagnet fixing module disposed on the body; wherein the electromagnet fixing module is configured to fix the carrying device. The present application uses the electromagnet fixing module to fix the carrying device, which can avoid downtime of an exposure machine caused by shaking of the carrying device when a robot arm of the exposure machine picks or places the mask form the carrying device so as to improve throughput.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: April 19, 2022
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Wei Wang
  • Patent number: 11307503
    Abstract: A microlithographic arrangement, for example using light in the extreme UV range, includes a supporting structure for supporting an optical unit, the mass of which can be 4 t to 14 t. The supporting structure includes a number of separate supporting units for supporting the optical unit. Each of the supporting units includes an air bearing unit by way of which a supporting force which counteracts the weight of the optical unit can be generated. The number of supporting units is at least four, at least two of the supporting units being coupled via a coupling device to form a supporting unit pair in such a way that the coupling device counteracts a deviation from a predeterminable ratio of the supporting forces of the two supporting units of the supporting unit pair.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: April 19, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Martin Vogt, Joachim Hartjes
  • Patent number: 11307502
    Abstract: Embodiments and implementations of the present disclosure provide assistant pattern configuration methods, masks and forming methods thereof, and related devices.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: April 19, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Feng Bai, Wanjuan Zhang, Yibin Huang, Yao Xu, Fan Zhang
  • Patent number: 11302546
    Abstract: A system includes a plurality of masks and a scanner device. A pattern of a semiconductor device is defined by each of the plurality of masks in a photolithography process. A first mask of the plurality of masks includes a first identification code configured to distinguish the first mask from remaining masks of the plurality of masks. The scanner device is configured to read the first identification code to select the first mask from the plurality of mask, in order to form the pattern of the semiconductor device on a substrate according to the first mask.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: April 12, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Ming Chin, Hsiao-Chi Huang, Han-Ming Liang
  • Patent number: 11296013
    Abstract: A semiconductor wafer includes chip regions; and a scribe region provided between the chip regions, the scribe region extending in a first direction in a plan view, wherein the scribe region includes a first region extending in the first direction, second regions situated on respective sides of the first region in a second direction perpendicular to the first direction in a plan view, each of the two second regions extending in the first direction, and an electrode pad provided in at least the second regions, and each of the two second regions includes one or more trench vias that are wall-shaped, the one or more trench vias extending in the first direction, and at least one trench via of the one or more trench vias having a portion overlapping with the electrode pad in a plan view.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: April 5, 2022
    Assignee: SOCIONEXT INC.
    Inventor: Toyoji Sawada
  • Patent number: 11287635
    Abstract: An optical system such as an imaging system, projecting system or combined imaging and projecting system, has complex dielectric coatings and/or reflecting polarizers to separate multiple spectral bands and/or polarizations on one or more of the system's curved mirrors.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: March 29, 2022
    Assignee: The Charles Stark Draper Laboratory, Inc.
    Inventors: Matthew A. Sinclair, Paul Aaron Bohn, Juha-Pekka Laine, Francis J. Rogomentich
  • Patent number: 11281115
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: March 22, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
  • Patent number: 11274919
    Abstract: A measurement system to be used in a micro-device manufacturing line is equipped with: a plurality of measurement devices which performs measurement processing on each substrate; and a controller that can control the plurality of measurement devices, and the plurality of measurement devices includes at least one first measurement device which acquires position information of a plurality of marks formed on a substrate.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: March 15, 2022
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Yuichi Shibazaki
  • Patent number: 11273470
    Abstract: An apparatus includes: a sprinkler configured for spraying liquid; a conduit with a nano-particle coated surface; a sensor associated with the conduit, wherein the sensor is configured to detect a signal corresponding to a film deposition on the nano-particle coated surface; and a controller coupled with the sensor and the sprinkler, wherein the controller is configured to regulate liquid spraying of the sprinkler over the nano-particle coated surface.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: March 15, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Li-Hsing Chien, Yung-Ti Hung, Rouh Jier Wang, Yu-Te Chang
  • Patent number: 11262591
    Abstract: A system for generating pump illumination for laser sustained plasma (LSP) is disclosed. In embodiments, the system includes an illumination source and a beam shaper. The illumination source can be configured to output illumination having a first pupil power distribution. In embodiments, the beam shaper is configured to receive the illumination having the first pupil power distribution from the illumination source and is further configured to output pump illumination having a second pupil power distribution that is different from the first pupil power distribution.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: March 1, 2022
    Assignee: KLA Corporation
    Inventors: Ilya Bezel, Matthew Derstine, Andrey Stepanov, Nikolay Sherbak
  • Patent number: 11264239
    Abstract: Techniques that can assist with fabricating a semiconductor package that includes a zero misalignment-via (ZMV) and/or a trace formed using a polarization process are described. The disclosed techniques can result in creation of ZMVs and/or traces between the ZMVs using a process comprising application of polarized light to one or more resist layers (e.g., a photoresist layer, etc.). One embodiment of a technique includes modulating an intensity of light applied to one or more resist layers by interaction of a light source with a photomask and at least one polarizer such that one or more patterns are created on the one or more resist layers. One embodiment of another technique includes creating patterns on one or more resist layers with different types of polarized light formed from a photomask and at least one polarizer. The disclosed techniques can assist with reducing manufacturing costs, reducing development time, and increasing I/O density.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: March 1, 2022
    Assignee: Intel Corporation
    Inventors: Hiroki Tanaka, Aleksandar Aleksov, Sri Ranga Sai Boyapati, Robert A. May, Kristof Darmawikarta
  • Patent number: 11256181
    Abstract: A method for removing particles from a semiconductor process chamber including at least the following steps is provided. Electrical charges having a first polarity are accumulated on a receiving surface of the substrate holder by applying a voltage to the substrate holder. The particles having a second polarity in the semiconductor process chamber are attracted to move toward the receiving surface of the substrate holder on which the electrical charges having the first polarity are accumulated, where the first polarity is opposite to the second polarity. The particles having the second polarity are removed from the semiconductor process chamber. Other methods for removing particles from a semiconductor process chamber are also provided.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: February 22, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yueh-Lin Yang, Chi-Hung Liao
  • Patent number: 11255796
    Abstract: An optical scanning system, including: a radiating source that outputs a light beam, a first time varying beam reflector that reflects the light beam through a scan lens towards a transparent sample, a second time varying beam reflector that reflects the light beam reflected from the transparent sample, a focusing lens that focuses the light beam reflected from the transparent sample, a blocker, and a detector that is irradiated by the one or more selectable portions of the light beam reflected from the transparent sample that pass the blocker. The blocker can be configured to block one or more portions of the light beam reflected from the transparent sample so that one or more selectable portions of the light beam reflected from the transparent sample can pass the blocker.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: February 22, 2022
    Assignee: Lumina Instruments Inc.
    Inventors: Steven W. Meeks, Hung Phi Nguyen, Alireza Shahdoost Moghaddam
  • Patent number: 11243477
    Abstract: The invention relates to a lithographic apparatus comprising: an actuation system for positioning an object; a control unit (CU) for controlling the actuation system; and a cooling system for cooling the actuation system, wherein the actuation system comprises a coil assembly (CA) including one or more coils (CO) as force generating members, wherein the cooling system comprises cooling element (CE) interacting with the coil assembly for cooling the coil assembly, and wherein the control unit is configured to control a temperature of the one or more coils to keep a magnitude of cyclic stress below a predetermined value.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: February 8, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Gudrun Ghilaine Agnes De Gersem
  • Patent number: 11243462
    Abstract: A lithography apparatus includes a formation unit that forms an alignment mark on a substrate by irradiating the substrate that includes a photosensitizer with light, and a transfer unit that aligns the substrate on the basis of the position of the alignment mark and that transfers a pattern to the substrate by illuminating the photosensitizer with exposure light. The formation unit irradiates a material of a grounding of the photosensitizer with irradiation light at a wavelength that differs from that of the exposure light and forms the alignment mark on the material by processing the material with energy of the irradiation light.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: February 8, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroaki Itabashi, Takuji Maruta, Ryo Nakamichi, Tomonori Tsukahara
  • Patent number: 11226474
    Abstract: A method for obtaining one or more images of a sample using a microscope includes dividing, using a reverberation cavity, a first one of a plurality of laser pulses into a plurality of sequential sub-pulses, each of the plurality of sequential sub-pulses having a power that is less than a previous one of the plurality of sequential sub-pulses, directing, using the one or more lenses of the microscope, the plurality of sequential sub-pulses onto a portion of the sample to generate a plurality of signals, each of the plurality of signals being associated with a different depth within the sample, and detecting the plurality of signals from the sample to generate one or more images of at least a portion of the sample.
    Type: Grant
    Filed: April 23, 2020
    Date of Patent: January 18, 2022
    Assignee: TRUSTEES OF BOSTON UNIVERSITY
    Inventors: Jerome Charles Mertz, Devin Robert Beaulieu, Thomas Gary Bifano
  • Patent number: 11226551
    Abstract: The present disclosure provides a mask for photolithography patterning. The mask includes a substrate, a pattern layer on a surface of the substrate. The mask also includes a pellicle attached to the substrate and configured to isolate the pattern layer from ambient. The pellicle includes a membrane between the pattern layer and ambient, a frame for securing the membrane on the substrate, and an optical member disposed in the membrane. A method for manufacturing the mask is also provided.
    Type: Grant
    Filed: October 9, 2020
    Date of Patent: January 18, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ching-Yueh Chen, Tzung-Shiun Liu
  • Patent number: 11221560
    Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: January 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Guangqing Chen, Wei Liu, Maurits Van der Schaar
  • Patent number: 11215933
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: January 4, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Patent number: 11214348
    Abstract: A sensor is fixed on an aircraft structure by a joining system which includes at least one enclosure in which is positioned at least one transducer, at least one passage configured to allow at least one conducting element to pass through the enclosure, at least one flexible connection connecting each transducer present in the enclosure to said enclosure and at least one binder joining together the enclosure and the structure. This joining system makes it possible to limit the spread of the deformations of the structure toward the transducer or transducers and ultimately the risks of malfunction.
    Type: Grant
    Filed: June 26, 2019
    Date of Patent: January 4, 2022
    Inventor: Marie-Anne De Smet
  • Patent number: 11209373
    Abstract: A second stage is disposed on the first stage. The second stage provides six degrees of freedom. A chuck that holds a workpiece is disposed on the second stage. Actuators that enable movement in three directions are disposed on the second stage. The first stage and the second stage move independent of each other during inspection of the workpiece on the chuck.
    Type: Grant
    Filed: June 16, 2020
    Date of Patent: December 28, 2021
    Assignee: KLA Corporation
    Inventor: Aviv Balan
  • Patent number: 11204200
    Abstract: A method includes supporting a wafer on a heating element, wherein the heating element is located in a baking chamber. The method further includes heating the wafer for a first duration using the heating element. The method further includes measuring a temperature of the heating element and a temperature of the wafer during the first duration to obtain temperature information. The method further includes adjusting an amount of heat provided by the heating element during the first duration, wherein the adjusting of the amount of heat includes decreasing the amount of heat provided by the heating element as a rate of change of the temperature information versus time increases.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: December 21, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tzung-Chen Wu, Wen-Zhan Zhou, Heng-Jen Lee, Ho-Yung David Hwang
  • Patent number: 11187998
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Abraham Alexander Soethoudt, Thomas Poiesz
  • Patent number: 11185692
    Abstract: The present invention discloses a wireless and self-contained headset that delivers an electronic signal to a precise and self-locating position within bilateral conchae in both ears of a human user. The headset comprises an electronics housing that carries a specific waveform source. The waveform source generates the electronic signal, which is delivered simultaneously to both left and right ears of the human user. An array of silver electrodes housed within the bilateral earpieces cover with precision the location at the exact center of the relatively smooth plane of the conchae directly behind the external auditory meatus (ear opening/canal).
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: November 30, 2021
    Inventor: Emily Ireland
  • Patent number: 11187899
    Abstract: A light source device includes a plurality of light sources configured to output a plurality of laser beams of different color components; and circuitry. A ratio in maximum output power between the plurality of laser beams output from the plurality of light sources is variable.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: November 30, 2021
    Assignee: RICOH COMPANY, LTD.
    Inventor: Tomoyuki Tsukuda
  • Patent number: 11187993
    Abstract: The present invention provides an exposure apparatus including a forming unit configured to form a mark on a resist film on a substrate, and a control unit configured to perform an exposure process to form a latent image by projecting a pattern onto a target position on the resist film on the substrate based on a measured position of the mark, wherein the control unit causes the forming unit to perform a formation process of forming, before the exposure process is performed on a reworked substrate on which a second resist film has been formed after removing a first resist film with a first mark, a second mark on the second resist film so the second mark will be positioned at a position shifted from a position of the first mark on the reworked substrate.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: November 30, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yutaka Matsuda, Kimitoshi Tamaki
  • Patent number: 11181883
    Abstract: Disclosed herein is a processing apparatus including a processing unit, alignment unit, and controller. The controller includes a reference program storing section previously storing a reference program for use in processing a predetermined workpiece, a reference result recording section for rating the result of processing performed to the predetermined workpiece by the processing unit according to the reference program and then recording a resultant rating point as a processing reference result, and an actual result calculating section for rating the result of processing performed to substantially the same workpiece as the predetermined workpiece by the processing unit according to the reference program.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: November 23, 2021
    Assignee: DISCO CORPORATION
    Inventor: Koichi Shigematsu
  • Patent number: 11181824
    Abstract: The present disclosure provides an apparatus for fabricating a semiconductor structure, including an air flow redistribution member configured to receive an air flow at a first end and eject the air flow at a second end. The air flow redistribution member includes a first air flow redistribution plate and a second air flow redistribution plate between the first air flow redistribution plate and the second end.
    Type: Grant
    Filed: December 31, 2019
    Date of Patent: November 23, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yung-Yao Lee, Chen Yi Hsu
  • Patent number: 11175598
    Abstract: The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold, the apparatus including a control unit configured to control a driving unit and a deformation unit such that parts of position control of controlling the relative positions of the mold and the substrate, and shape control of deforming at least one of the mold and the substrate are performed concurrently, wherein the control unit includes an input unit configured to give, to target position data, time-series data representing relative positions of the mold and the substrate that change at each time during which the shape control is performed in accordance with deformation in at least one of the mold and the substrate by the deformation unit.
    Type: Grant
    Filed: June 27, 2018
    Date of Patent: November 16, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Sato
  • Patent number: 11175595
    Abstract: A method localizes assembly errors during the arrangement and/or the assembly of in particular vibration-isolated structural elements, in particular of components of optical arrangements, preferably of microlithographic projection exposure apparatuses.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: November 16, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Niederhausen, Christoph Fetzer
  • Patent number: 11155472
    Abstract: The present disclosure relates to a one-dimensional nano-chain structure including a single crystal structure as a minimum repeat unit structure.
    Type: Grant
    Filed: October 3, 2019
    Date of Patent: October 26, 2021
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Jae-Young Choi, Sudong Chae, Seungbae Oh, Bum Jun Kim
  • Patent number: 11156923
    Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: October 26, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Hakki Ergün Cekli, Xing Lan Liu, Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren
  • Patent number: 11150565
    Abstract: A lithographic apparatus is used to manufacture a plurality of devices on a substrate. A height map is obtained representing a topographical variation across the substrate. Using the height map the apparatus controls imaging of a field pattern at multiple field locations across the substrate. The field pattern includes a plurality of individual device areas. For field locations near the substrate's edge, the height map data is used selectively so as to ignore topographical variations in one or more individual device areas. Whether a device area is to be ignored is determined at least partly based on the height map data obtained for the current exposure. Alternatively or in addition, the selection can be based on measurements made at the corresponding device area and field location on one or more prior substrates, and/or on the same substrate in a previous layer.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: October 19, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Marinus Gerardus Johan Queens, Wolfgang Helmut Henke
  • Patent number: 11142495
    Abstract: An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: October 12, 2021
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Yusuke Suga, Satoshi Enomoto
  • Patent number: 11141863
    Abstract: There is provided a cleaning robot including a light source module, an image sensor and a processor. The light source module projects a line pattern and a speckle pattern toward a moving direction. The image sensor captures an image of the line pattern and an image of the speckle pattern. The processor calculates one-dimensional depth information according to the image of the line pattern and calculates two-dimensional depth information according to the image of the speckle pattern.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: October 12, 2021
    Assignee: PIXART IMAGING INC.
    Inventor: Guo-Zhen Wang
  • Patent number: 11145535
    Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: October 12, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Seth J. Bamesberger, Se-Hyuk Im
  • Patent number: 11143969
    Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Giovanni Luca Gattobigio, Nirupam Banerjee, Johan Franciscus Maria Beckers, Erik Henricus Egidius Catharina Eummelen, Ronald Frank Kox, Theodorus Wilhelmus Polet, Cornelius Maria Rops, Mike Paulus Johannes Van Gils, Wouterus Jozephus Johannes Van Sluisveld, Rik Vangheluwe
  • Patent number: 11143972
    Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: October 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
  • Patent number: 11130199
    Abstract: A device performs laser-assisted processing of a material adhering to a substrate or of a substrate associated or substrate-free body or of its surface. The device has a positioning system enabling three translational and three rotational degrees of freedom and having a sample holder. The sample holder holds the substrate to which the material to be processed adheres or to which the body to be processed is associated or, in the absence of a substrate, the body to be processed. The device has a laser source emitting laser pulses and focusing optics which shape the laser pulses such that they impinge in a focal point or a focal volume in the region of the material or body to be processed in such a way that a two-photon or multi-photon polymerization takes place.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: September 28, 2021
    Assignee: Multiphoton Optics GmbH
    Inventors: Ruth Houbertz, Alexander Krupp, Benedikt Stender
  • Patent number: 11131541
    Abstract: The present disclosure is directed to a method and system for monitoring a distance between a shutter and a reference point in a processing module. For example, the method includes moving a shutter relative to a substrate support in a wafer processing module and determining a distance between the shutter and a wall of the wafer processing module with a measurement device. In response to the distance being greater than a value, the method further includes transferring a substrate to the substrate support, and in response to the distance being equal to or less than the value, the method includes resetting the shutter.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: September 28, 2021
    Inventors: Shih-Yu Liao, Shih-Chi Kuo, Tsai-Hao Hung, Tsung-Hsien Lee
  • Patent number: 11126091
    Abstract: A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: September 21, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Martijn Cornelis Schaafsma, Mhamed Akhssay, James Robert Downes