Step And Repeat Patents (Class 355/53)
  • Patent number: 11029611
    Abstract: Projection objective wave-front aberration detecting device and a detecting method thereof, wherein the projection objective wave-front aberration detecting device comprises a light source and illuminating system, an object plane grating, an object plane displacement stage, a measured projection objective, an image plane grating, a two-dimensional photoelectric sensor, an image plane displacement stage and a control processing unit. According to the invention, by controlling the length of the object plane grating line, or the periodic structure of the object plane grating perpendicular to the shearing diffraction direction, or the object plane grating to adopt a sinusoidal grating, or the image plane grating to adopt an amplitude-phase hybrid grating, the complexity of an interference field is reduced, and the wave-front aberration detection speed and precision are improved, and the precision and speed of in-situ wave-front aberration detection can be improved.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: June 8, 2021
    Assignee: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
    Inventors: Feng Tang, Changzhe Peng, Xiangzhao Wang, Yunjun Lu, Peng Li
  • Patent number: 11029256
    Abstract: Provided is an apparatus for measuring a wafer. The apparatus may include a chuck disposed on a stage and a plate connected with the stage, a horizontal frame configured to support a wafer, and a vertical frame connecting the plate and the horizontal frame. The apparatus may further include first to third adsorption portions connected with the horizontal frame and configured to adsorb the wafer, a support bar penetrating through the chuck and extending in a first direction and a beam irradiator connected to the support bar and disposed between the plate and the horizontal frame. The beam irradiator may be configured to irradiate a beam on the wafer. The apparatus may further include a detector on an opposite side of the horizontal frame from the beam irradiator and configured to receive the beam after it has penetrated through the wafer.
    Type: Grant
    Filed: April 13, 2020
    Date of Patent: June 8, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tae-Heung Ahn, Racine Nassau, Su Hwan Park, Ki Wan Seo, Nam Il Koo, In Keun Baek, Jong Min Yoon, Ik Seon Jeon
  • Patent number: 11022644
    Abstract: There is provided an inspection apparatus provided with a plurality of inspection chambers for inspecting an electrical characteristic of a semiconductor device formed on a substrate, the inspection apparatus includes: a substrate chuck part configured to attractively hold the substrate during an inspection; a measurement part configured to measure an attractive force of the substrate chuck part in a state in which the substrate is placed on the substrate chuck part; and a controller configured to perform a first determination based on a first condition and a measurement result of the measurement part and a second determination based on a second condition different from the first condition and the measurement result of the measurement part, and configured to select one of a plurality of preset operations based on a result of the first determination and a result of the second determination and execute a process corresponding to the selected operation.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: June 1, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Junya Ozawa
  • Patent number: 11018202
    Abstract: A display device includes a display panel, a protective sheet at a rear side of the display panel, the protective sheet including an opening, a sensor in the opening, and a pattern in the display panel, the pattern overlapping the opening.
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: May 25, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seung-Lyong Bok, Sun Mi Yu
  • Patent number: 11004682
    Abstract: Provided are a laser annealing apparatus, a laser annealing method, and a mask with which scan nonuniformity can be decreased. According to the present invention, all or some openings of a plurality of openings are configured so that a partial subregion of a prescribed region is irradiated with laser light. The plurality of openings are configured so that, between prescribed regions irradiated with laser light via a group of openings in one row arranged in a row direction and prescribed regions irradiated with laser light via a group of openings in another row arranged in the row direction, the number of times of laser light radiations in subregions having the same occupying region is the same, and at least two openings of a group of openings arranged in a column direction have different positions or shapes.
    Type: Grant
    Filed: December 15, 2016
    Date of Patent: May 11, 2021
    Assignee: SAKAI DISPLAY PRODUCTS CORPORATION
    Inventors: Yoshiaki Matsushima, Takeshi Uno, Yuta Sugawara, Kota Imanishi, Nobutake Nodera, Takao Matsumoto
  • Patent number: 11004683
    Abstract: According to one embodiment, an imprint apparatus includes a first light source positioned to irradiate a substrate with light, a second light source positioned to irradiate the substrate with light, an illuminance changing portion selectively configured to change the illuminance distribution of light from the first light source on an irradiation surface on the substrate, and a controller configured to control the first light source, the second light source and the illuminance changing portion to irradiate the substrate with light from the first light source, and to subsequently irradiate the substrate with light from the second light source directly through the template.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: May 11, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Kazuya Fukuhara, Tetsuro Nakasugi, Masayuki Hatano
  • Patent number: 11003094
    Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade
  • Patent number: 10996573
    Abstract: A method including: obtaining error information indicative of accuracy of positioning a pattern formed on a layer on a substrate relative to a target position, wherein the pattern has been formed by irradiating the layer with a radiation beam patterned by a patterning device; and producing modification information including a map of positional shifts across the patterning device so as to increase the accuracy of positioning the pattern formed using the patterning device modified according to the modification information, the modification information based on the error information, wherein the error information is independent of any other layer on the substrate.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: May 4, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Ten Berge, David Frans Simon Deckers, Peter Hanzen Wardenier
  • Patent number: 10990024
    Abstract: Lithographic exposure tool and method for operating thereof are provided that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data (representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path or a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: April 27, 2021
    Assignee: Nikon Research Corporation of America
    Inventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
  • Patent number: 10990025
    Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: April 27, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Ruud Hendrikus Martinus Johannes Bloks, Günes Nakiboglu, Marinus Jan Remie, Johan Gertrudis Cornelis Kunnen
  • Patent number: 10983444
    Abstract: Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizontal rows and vertical columns. The variable intensity of each group of solid state emitters, for example an entire row or column of solid state emitters, is controllable for improved field brightness uniformity and stitching. Controlling the variable intensity includes, for example, varying the signal, such as voltage, that is applied to each of the rows of solid state emitters to attenuate the brightness from the middle of the array to the edges of the array to accommodate for overlapping exposures during photolithography processing.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: April 20, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson
  • Patent number: 10983005
    Abstract: A spectroscopic overlay metrology system and corresponding spectroscopic overlay metrology methods are disclosed herein for improving overly measurement accuracy, optimizing overlay recipes, and/or minimizing (or eliminating) asymmetry-induced overly error from overlay measurements. An exemplary method includes generating a diffraction spectrum by an overlay target from incident radiation having more than one wavelength. The diffraction spectrum includes a plurality of positive ordered diffracted beams and a plurality of negative ordered diffracted beams that are separated by wavelength, such that the diffraction spectrum includes more than one wavelength of a positive order and a negative order.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: April 20, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Kai Wu, Hung-Chih Hsieh, Kai-Hsiung Chen, Chih-Ming Ke, Yen-Liang Chen
  • Patent number: 10983446
    Abstract: A control equipment and a control method of a stepper are provided. The control equipment of the stepper includes an input device, a generating device and a processing device. The input device is configured to input a plurality of sample development patterns. The sample development patterns are obtained according to a plurality of sample focal length values. The generating device is configured to generate a plurality of generative categories corresponding to a plurality of generative focal length values by using a depth learning algorithm. The processing device is configured to analyze an estimated focal length value of the online development pattern according to the generative categories.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: April 20, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventor: Chih-Ming Lin
  • Patent number: 10976672
    Abstract: Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a second topographical height of the substrate at a second coordinate on the substrate are provided. The measured first and second topographical heights may be provided as a wafer map. An exposure process is then performed on the substrate using the wafer map. The exposure process can include using a first focal point when exposing the first coordinate on the substrate and using a second focal plane when exposing the second coordinate on the substrate. The first focal point is determined using the first topographical height and the second focal point is determined using the second topographical height.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: April 13, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jui-Ching Wu, Jeng-Horng Chen, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien, Anthony Yen
  • Patent number: 10976673
    Abstract: A levellable reticle library assembly includes a reticle library assembly (4), a pivot assembly (3) and a frame assembly (2). The reticle library assembly (4) is disposed on the frame assembly (2) so that it is able to be leveled by the pivot assembly (3) via the frame assembly (2), and the reticle library assembly (4) can also be leveled by the frame assembly (2).
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: April 13, 2021
    Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
    Inventors: Yongwei Fan, Huaiyang Chen
  • Patent number: 10971384
    Abstract: A substrate processing system to process a substrate includes a sensor to generate sensed values of a parameter of the substrate processing system. An actuator adjusts the parameter of the substrate processing system. A controller communicates with the sensor and the actuator and is configured to process a first substrate using the sensed values to adjust control values for controlling the actuator without feedforward control during a process. The sensed values are delayed and cause instability in the parameter. The controller is further configured to automatically calibrate feedforward values for processing a second substrate based on the sensed values and the control values and process the second substrate while controlling the actuator using the feedforward values.
    Type: Grant
    Filed: September 13, 2018
    Date of Patent: April 6, 2021
    Assignee: Lam Research Corporation
    Inventor: Anthony Paul Van Selow
  • Patent number: 10948829
    Abstract: A pattern forming apparatus configured to form a pattern on a substrate includes a holding portion configured to hold the substrate by suction, an optical system configured to detect, from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield light entering the optical system.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: March 16, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Naoki Funabashi
  • Patent number: 10948831
    Abstract: Methods of determining, and using, a patterning process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: March 16, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Ya Luo, Yu Cao, Jen-Shiang Wang, Yen-Wen Lu
  • Patent number: 10928736
    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.
    Type: Grant
    Filed: December 13, 2016
    Date of Patent: February 23, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Coen Adrianus Verschuren, Erwin Paul Smakman, Erwin John Van Zwet, Wouter Frans Willem Mulckhuyse, Pieter Verhoeff, Robert Albertus Johannes Van Der Werf
  • Patent number: 10928738
    Abstract: A method of applying a measurement correction includes calculating a first correction value based on a first coefficient and the measurement; calculating a second correction value based on a second coefficient, greater than the first coefficient, and the measurement; and calculating a third correction value based on a third coefficient, greater than the second coefficient, and the measurement. The method also includes applying the third correction value to the measurement if a difference between the first correction value and the third correction value is above a first threshold value; applying the second correction value to the measurement if a difference between the first correction value and the second correction value is above a second threshold value; and applying the first correction value to the measurement if the difference between the first correction value and the second correction value is below or equal to the second threshold value.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: February 23, 2021
    Assignee: ASML Holding N.V.
    Inventors: Eric Brian Catey, Igor Matheus Petronella Aarts, Robert Anthony Augelli, Sergey Malyk
  • Patent number: 10928606
    Abstract: A lens unit is provided that includes: a first lens that is housed inside a lens-barrel, the first lens including a first lens section and a first flange section that juts out from the first lens section in a direction orthogonal to an optical axis direction; a second lens that is housed inside the lens-barrel further toward an imaging plane side than the first lens, the second lens including a second lens section and a second flange section that juts out from the second lens section in a direction orthogonal to the optical axis direction; and a spacing ring that is sandwiched between the first lens and the second lens and that defines a spacing between the first lens and the second lens, the spacing ring includes a main body disposed between the first flange section and the second flange section in the optical axis direction, first protrusion portions that protrude in the optical axis direction from an object side of the main body, and second protrusion portions that protrude in the optical axis direction fr
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: February 23, 2021
    Assignee: TIANJIN OFILM OPTO ELECTRONICS CO., LTD.
    Inventors: Tomonari Masuzawa, Daiki Yoshida, Kensuke Masui
  • Patent number: 10928618
    Abstract: A microscope (10) is described, comprising an autofocus system (11) for executing a focusing procedure, having a first image sensor (14a), arranged in a first outcoupled beam path (12a), for acquiring a first image (16a); and a second image sensor (14b), arranged in a second outcoupled beam path (12b), for acquiring a second image (16b). The autofocus system (11) is embodied in such a way that the focusing procedure is executable on the basis of at least a first operating mode and a second operating mode.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: February 23, 2021
    Assignee: Leica Microsystems (Schweiz) AG
    Inventors: Harald Schnitzler, Reto Zuest, Marc Honegger
  • Patent number: 10928619
    Abstract: A microscope (10) is described, having an autofocus system (11) for executing a focusing procedure, having a first image sensor (14a), arranged in a first outcoupled beam path (12a), for acquiring a first image (16a); and a second image sensor (14b), arranged in a second outcoupled beam path (12b), for acquiring a second image (16b). The autofocus system (11) is embodied to adjust a relative location of the focal plane (20) with respect to the object plane (22), at a focus displacement speed, during the image acquisition time for acquisition of the first image (16a) acquired by the first image sensor (14a) and of the second image (16b) acquired by the second image sensor (14b), the focus displacement speed being equal to the ratio of an increment to the image acquisition time, and the increment being larger than the depth of focus of the microscope (10).
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: February 23, 2021
    Assignee: Leica Microsystems (Schweiz) AG
    Inventors: Marc Honegger, Harald Schnitzler, Reto Zuest
  • Patent number: 10921719
    Abstract: An optical measurement device includes: a deformation measurement device for measuring magnitude of deformation of an optical detection platform frame, and a correction module for correcting the position of a substrate carrier and/or the position of an optical detection device according to the magnitude of deformation of the optical detection platform frame, so as to eliminate an error in measurement of mark positions due to deformation of the frame. An optical measurement method is also disclosed.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: February 16, 2021
    Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
    Inventors: Zhiyong Yang, Bing Xu, Yuzhi Li, Chang Zhou
  • Patent number: 10915032
    Abstract: To provide a cleaning apparatus advantageous for cleaning, for example, an original plate used to transfer a pattern to a substrate. Provided is a cleaning apparatus that cleans an original plate used when a pattern is transferred to a substrate, the cleaning apparatus including a region dividing unit which divides the original plate into a plurality of regions on the basis of information of the original plate, a conditions generator which generates cleaning conditions for each of the separate regions, and a cleaner which cleans the original plate on the basis of the cleaning conditions.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: February 9, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shingo Ishida
  • Patent number: 10908507
    Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact illumination tools for projecting an image onto a substrate are provided. In one embodiment, an illumination tool includes a microLED array including one or more microLEDs. Each microLED produces at least one light beam. The illumination tool also includes a beamsplitter adjacent the microLED array, a camera adjacent the beamsplitter, and a projection optics system adjacent the beamsplitter.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: February 2, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Jang Fung Chen, Christopher Dennis Bencher
  • Patent number: 10908518
    Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: February 2, 2021
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Santiago E. Delpuerto, Antonius Franciscus Johannes De Groot, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 10908515
    Abstract: A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: February 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Tanbir Hasan, Vivek Kumar Jain, Stefan Hunsche, Bruno La Fontaine
  • Patent number: 10908555
    Abstract: An imaging module, including a lens and a transmissive display panel disposed adjacent to each other, and a controller electrically connected to the transmissive display panel, the controller loading a white image on a preset area of the transmissive display panel so that a light beam passes through the preset area. A light beam gating control method, a testing apparatus and method for an imaging module are further provided.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: February 2, 2021
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Bingchuan Shi
  • Patent number: 10908494
    Abstract: A method of manufacturing a photomask includes at least the following steps. First, a phase shift layer and a hard mask layer are formed on a light transmitting substrate. A predetermined mask pattern is split into a first pattern and a second pattern. A series of processes is performed so that the hard mask layer and the phase shift layer have the first pattern and the second pattern. The series of processes includes at least the following steps. First, a first exposure process for transferring the first pattern is performed. Thereafter, a second exposure process for transferring the second pattern is performed. The first exposure process and the second exposure process are executed by different machines.
    Type: Grant
    Filed: August 27, 2017
    Date of Patent: February 2, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Ming Lin, Cheng-Hsuen Chiang, Chih-Ming Chen, Huai-Chih Cheng, Hao-Ming Chang, Hsao Shih, Hsin-Yi Yin
  • Patent number: 10901331
    Abstract: A coaxial reticle alignment device, a lithography apparatus and alignment methods are disclosed. The coaxial reticle alignment device includes: illumination modules (A, B), each configured to provide an alignment light beam; a projection objective (8) under a reticle (5); a reference plate (9) on a workpiece stage (12), configured to carry a reference mark (10); and an image detection and processing module (11) under the reference plate (9).
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: January 26, 2021
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventor: Chengshuang Zhang
  • Patent number: 10901324
    Abstract: A imprint method includes contacting the pattern formed on the mold M with the imprint material R supplied to a shot on the substrate W; and detecting a plurality of alignment marks AMM and AMW in the contacting while changing a position of a detector for detecting the plurality of alignment marks AMM and AMW formed on the shot on the substrate W in accordance with a progress of filling of the imprint material R into the pattern formed on the mold M.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: January 26, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Nozomu Hayashi
  • Patent number: 10895728
    Abstract: Provided is a sample observation method including: bringing a gel-like transparent sample that encloses an observation target into contact with a transparent flat surface section of a substrate; and collecting light from the observation target by means of an objective lens via the substrate, in a state in which a pressing force is made to act in a direction in which the sample and the flat surface section relatively approach each other, until the contact area between the sample and the flat surface section comes to have a size allowing an effective light flux for the objective lens of a microscope to pass therethrough.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: January 19, 2021
    Assignee: OLYMPUS CORPORATION
    Inventors: Yoshihiro Shimada, Kazuhito Goda
  • Patent number: 10890850
    Abstract: An optical imaging arrangement includes an optical projection system, a support structure system and a control device. The optical projection system includes a group of optical elements supported by the support structure system and configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. The group of optical elements includes a first optical element and a second optical element and the control device includes a sensor device and an active device. The sensor device is functionally associated to the first optical element and is configured to capture mechanical disturbance information representative of a mechanical disturbance acting on the first optical element in at least one degree of freedom up to all six degrees of freedom.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: January 12, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Hembacher, Bernhard Geuppert, Jens Kugler
  • Patent number: 10890853
    Abstract: An exposure device may include an exposure head that may radiate an exposure beam onto a substrate on a stage, a support that may be provided on the stage to support the exposure head, a chamber that may accommodate the stage, the exposure head, and the support. The exposure device may include first protrusions that may be disposed on an outer circumference of the support adjacent to an inner wall of the chamber, and second protrusions that may be disposed on the inner wall of the chamber surrounding the outer circumference of the support. The first and second protrusions may overlap each other in a plan view.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: January 12, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Kab Jong Seo, Min Suk Ko, Si Kwang Kim, Yong Hoon Yang
  • Patent number: 10890851
    Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: January 12, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
  • Patent number: 10884343
    Abstract: Disclosed are a system and method for micro-nano machining by femtosecond laser two-photon polymerization. The system includes: a femtosecond laser, an external light path modulation unit, an image capture apparatus, a focusing lens, a displacement platform, a computer and a monitoring apparatus, where the image capture apparatus is configured to capture cross-section graphs of a three-dimensional micro-nano device layer by layer, so that modulated femtosecond lasers form parallel beams arranged according to all layers of the cross-section graphs.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: January 5, 2021
    Assignee: South University of Science and Technology of China
    Inventors: Xing Cheng, Dehu Cui, Ziping Li, Jing Ming
  • Patent number: 10877258
    Abstract: A microscope (10) is described, having an autofocus system (11) for executing a focusing procedure, having a first image sensor (14a), arranged in a first outcoupled beam path (12a), for acquiring a first image (16a); and a second image sensor (14b), arranged in a second outcoupled beam path (12b), for acquiring a second image (16b). The autofocus system (11) is embodied to ascertain a contrast difference based on contrast values of the first image (16a) acquired by the first image sensor (14a) and of the second image (16b) acquired by the second image sensor (14b), and to set a relative location of the focal plane (20) with respect to the object plane (22) based on the ascertained contrast difference, the first and the second image (16a, 16b) each encompassing image information furnished by the first and the second image sensor (14a, 14b) each embodied as an area sensor.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: December 29, 2020
    Assignee: Leica Microsystems (Schweiz) AG
    Inventors: Marc Honegger, Harald Schnitzler, Reto Zuest
  • Patent number: 10878542
    Abstract: A method and a system for filtering thermal image data. The method comprises: capturing thermal image data by a thermal image detector; forming a signal distribution of intensity values; identifying a first part in the signal distribution of intensity values, the first part being a peak having an intensity width equal to or smaller than a predetermined intensity span being based on a resolution parameter of the thermal image detector; identifying a second part having an intensity width larger than the predetermined intensity span; determining an intensity range between the first part and the second part; and filtering, if the intensity range is larger than a predetermined minimum intensity range, the thermal image data by excluding thermal image data forming part of the first part.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: December 29, 2020
    Assignee: Axis AB
    Inventors: Thomas Winzell, Jesper Bengtsson, Anthony Hawkins
  • Patent number: 10871718
    Abstract: An exposure apparatus includes a projection optical system configured to project a pattern of a mask onto a substrate, a substrate stage configured to hold and move the substrate, and a controller configured to control exposure of the substrate held by the substrate stage, wherein the controller obtains an amount of deviation of an image of the pattern projected onto the substrate with respect to the pattern of the mask based on telecentricity information, which is information on telecentricity for respective image heights of the projection optical system, and height information, which is information on the height of a surface of the substrate, and corrects deviation of the image based on the obtained amount of deviation to expose the substrate.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: December 22, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Akihisa Kaga, Kazushi Mizumoto
  • Patent number: 10871713
    Abstract: A method of controlling reticle masking blade positioning to minimize the impact on critical dimension uniformity includes determining a target location of a reticle masking blade relative to a reflective reticle and positioning the reticle masking blade at the target location. A position of the reticle masking blade is monitored during an imaging operation. The position of the reticle masking blade is compared with the target location and the position of the reticle masking blade is adjusted if the position of the reticle masking blade is outside a tolerance of the target location.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: December 22, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng, Chin-Hsiang Lin
  • Patent number: 10868940
    Abstract: There is disclosed an apparatus and method of aligning content put through a duplex scanner. By performing operations on data extracted from physical documents, digital documents that would otherwise appear skewed can be un-skewed. The process compares two images, e.g. a front and a back page for a document, and determines how they are offset from one another. The process uses a projection profile error minimization technique to calculate a translation for one or both pages to digitally align the margins for a digital document such that the margins match.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: December 15, 2020
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventor: Mitchell G. Marks
  • Patent number: 10866531
    Abstract: An alignment system configured to be substantially insensitive to thermal variations in its system during alignment measurements. The alignment system includes a sensor system, a support structure, a sensing element, a position measurement system, and an athermal interface between the sensing element and the support structure. The sensor system is configured to determine a position of an alignment mark on a substrate and the support structure is configured to support the sensor system. The sensing element is configured to detect an unintentional displacement of the support structure and the position measurement system is configured to measure the unintentional displacement relative to a reference element based on the detected unintentional displacement. The athermal interface is configured to prevent detection of temperature induced displacement of the support structure by the sensing element.
    Type: Grant
    Filed: September 4, 2017
    Date of Patent: December 15, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Suzanne Johanna Antonetta Geertruda Cosijns, Maarten Van Der Heijden, Frederikus Johannes Maria De Vreede, David Taub, Eric Emery, Joseph Ashwin Franklin
  • Patent number: 10866529
    Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: December 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Michael Johannes Vervoordeldonk, Maurice Willem Jozef Etiënne Wijckmans
  • Patent number: 10859921
    Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: December 8, 2020
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun-Ho Sim, Sang-Hyun Yun, Hi-Kuk Lee, Hyun-Seok Kim
  • Patent number: 10859930
    Abstract: Offline metrology measurements are performed on substrates that have been subjected to lithographic processing. Model parameters are calculated by fitting the measurements to an extended high-order substrate model defined using a combination of basis functions that include an edge basis function related to a substrate edge. A radial edge basis function may be expressed in terms of distance from a substrate edge. The edge basis function may, for example, be an exponential decay function or a rational function. Lithographic processing of a subsequent substrate is controlled using the calculated high-order substrate model parameters, in combination with low-order substrate model parameters obtained by fitting inline measurements to a low order model.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: December 8, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jasper Menger, Paul Cornelis Hubertus Aben, Everhardus Cornelis Mos
  • Patent number: 10836152
    Abstract: A three-dimensional printing apparatus and a three-dimensional printing method are provided. The three-dimensional printing apparatus includes a tank, an injection module, a platform movably disposed above the bottom of the tank, a curing module, and a control module. The tank has a forming area and a separating area in a stepped manner on a bottom thereof, and the forming area is higher than the separating area. The injection module includes a storage tank and an injection pipe connected thereto, and a forming material is filled therein to be applied to the forming area. The curing module is disposed beside the tank or the platform to cure the forming material between the platform and the forming area to be a curing layer. The control module is electrically connected to the injection module, the curing module, and at least one of the tank and the platform to perform a relative movement.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: November 17, 2020
    Assignees: XYZprinting, Inc., Kinpo Electronics, Inc.
    Inventor: Peng-Yang Chen
  • Patent number: 10831113
    Abstract: A stage mechanism includes a wedge with an inclined surface having a predetermined angle with respect to a horizontal direction, a roller relatively rolling on the inclined surface of the wedge by relative horizontal movement of the wedge, a fine movement mechanism supporting the roller, going up and down in accordance with up and down movement of the roller which relatively rolls on the inclined surfaces by the relative horizontal movement of the wedge, and capable of going up and down more finely than the up and down movement of the roller, a table supported by the fine movement mechanism, and an elastic body connected to the table, restraining horizontal movement of the table, and applying an elastic force, in at least one of upward and downward directions, to the table.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: November 10, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Hideki Ito, Takahiro Murata, Toshikatsu Akiba
  • Patent number: 10830578
    Abstract: A method and an apparatus are directed to characterizing a continuously moving 3D object via interferometry-based scanning. The method includes repeatedly forming several depth characterizations of the 3D object along respective scan lines of a plurality of scan lines on the surface of the 3D object. During this scanning, the 3D object is undergoing its continuous motion. The method further includes combining the determined depth characterization along the scan lines of the plurality of scan lines to form a depth map representing at least a depth of a portion associated with a location on the surface of the 3D object in the third direction on a grid of locations arranged in the first and second directions. Forming the depth characterizations includes scanning a frequency-dispersed pulsed optical signal in a first direction across the continuously moving 3D object, said 3D object moving in a second direction substantially orthogonal to the first direction.
    Type: Grant
    Filed: October 17, 2019
    Date of Patent: November 10, 2020
    Assignee: Inkbit, LLC
    Inventors: Aaron Weber, Kiril Vidimce, Walter H. Zengerle, III, Desai Chen, Wojciech Matusik
  • Patent number: RE48429
    Abstract: A wafer holding apparatus for holding a wafer including a wafer holder on which the wafer is placed; and a lift pin that is configured to be lifted up and down with respect to the wafer holder in a direction along a normal line of a placement surface of the wafer, the lift pin includes a tip part, the tip part includes: a bottom part that forms a suction region for sucking a rear surface of the wafer; and a convex part that supports the rear surface of the wafer in the suction region. When a substrate is placed on a target position, it is possible to prevent a local deterioration of flatness of the substrate even if the substrate is large.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: February 9, 2021
    Assignee: NIKON CORPORATION
    Inventor: Go Ichinose