Step And Repeat Patents (Class 355/53)
  • Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Patent number: 10697805
    Abstract: An encoder, which measures a relative moving amount of a second member relative to a first member, includes: a diffraction grating provided on the first member; a light-incident optical member causing a measuring light to come into a grating pattern surface of the diffraction grating substantially perpendicularly; a first reflecting member provided on the second member and reflecting a diffracted light generated from the diffraction grating; a first direction-changing member changing a direction of the diffracted light; a first photo-detector detecting an interference light generated by interference between a double diffracted light and other diffracted light than the double diffracted light or a reference light, the double diffracted light being generated, via diffraction of the diffracted light, from the diffraction grating; and a measuring section which obtains the relative moving amount of the second member relative to the first member by using a detection signal from the first photo-detector.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: June 30, 2020
    Assignee: NIKON CORPORATION
    Inventor: Zhigiang Liu
  • Patent number: 10698318
    Abstract: The invention relates to a method and a device for characterizing a mask for microlithography. In a method according to the invention, structures of a mask intended for use in a lithography process in a microlithographic projection exposure apparatus are illuminated by an illumination optical unit, wherein the mask is imaged onto a detector unit by an imaging optical unit, wherein image data recorded by the detector unit are evaluated in an evaluation unit. In this case, for emulating an illumination setting predefined for the lithography process in the microlithographic projection exposure apparatus, the imaging of the mask onto the detector unit is carried out in a plurality of individual imagings which differ from one another with regard to the illumination setting set in the illumination optical unit or the polarization-influencing effect set in the imaging optical unit.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: June 30, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Holger Seitz, Ute Buttgereit, Thomas Thaler, Thomas Frank, Ulrich Matejka, Markus Deguenther, Robert Birkner, Dominik Grau
  • Patent number: 10699877
    Abstract: A charged-particle beam writing apparatus includes a writing chamber to house a stage having a writing object placed thereon, a beam irradiator to irradiate a charged particle beam to the writing object placed on the stage, a stage driver to move the stage, a temperature distribution calculator to calculate temperature distribution of the writing object caused by a heat source in the writing chamber, based on movement history information of the stage, a deformed amount calculator to calculate a deformed amount of the writing object based on a constraint condition of the writing object placed on the stage and the calculated temperature distribution, and a position corrector to correct an irradiation position of the charged particle beam to the writing object based on the calculated deformed amount. The beam irradiator irradiates the charged particle beam based on the irradiation position corrected by the position corrector.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: June 30, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Haruyuki Nomura, Takashi Kamikubo
  • Patent number: 10684554
    Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: June 16, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
  • Patent number: 10679340
    Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: June 9, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wei Fang, Zhao-Li Zhang, Jack Jau
  • Patent number: 10678139
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: June 9, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Patent number: 10678152
    Abstract: On a substrate conforming to a layout method for a plurality of marks for detection using a plurality of mark detection systems of which the detection centers are arranged at a predetermined spacing along an X-axis direction, a plurality of shot areas are formed in both an X-axis direction and a Y-axis direction orthogonal thereto in an XY plane, and sets including at least two marks separated in the X-axis direction are repeatedly arranged along the X-axis direction at spacing of a length in the X-axis-direction of each shot area, and the marks belonging to each set are separated from each other in the X-axis direction by a spacing determined based arrangement in the X-axis direction of the plurality of mark detection systems and the length. It is thereby possible to reliably detect a plurality of marks on a substrate using a plurality of mark detection systems.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: June 9, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10670972
    Abstract: A method for exposing a structure on a substrate includes positioning of an invariable reticle and a programmable reticle in a light path between a light source and a layer on a substrate to be exposed to light and exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: June 2, 2020
    Assignee: Infineon Technologies AG
    Inventors: Rudolf Zelsacher, Peter Irsigler
  • Patent number: 10664714
    Abstract: A structure and method for employing the structure to reliably read indicia formed on a substrate such as a panel or wafer is disclosed. A gripping member pulls the substrate into at least partial compliance with a locating structure to facilitate the proper function of a code reader. Where the indicia are not read, the substrate is moved relative to the code reader, starting from a position that may be determined based on the material properties of the substrate.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: May 26, 2020
    Assignee: Rudolph Technologies, Inc.
    Inventor: Kevin Barr
  • Patent number: 10661486
    Abstract: The present invention provides an imprint system including a processing unit configured to perform an imprint process, the processing unit including a dispenser configured to supply a droplet of an imprint material onto a substrate, a library configured to manage a plurality of different maps each indicating at least one of a supply position and a supply amount for a droplet to be supplied on the substrate from the dispenser, and a control unit configured to select one map to be used in the imprint process from the plurality of maps managed in the library based on information about a change of a result of the imprint process caused by a temporal change of at least one of a mold and the dispenser.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: May 26, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Takuro Yamazaki, Tomomi Funayoshi, Hiromitsu Yamaguchi, Masayoshi Fujimoto
  • Patent number: 10663351
    Abstract: A three-dimensional interferometer for measuring a light field produced by an object, comprising a first interferometer arm, a second interferometer arm, a beam splitter arranged between an object point of the object and the first interferometer arm and the second interferometer arm, and is set up to split a beam coming from the object point at the beam splitter into the first beam and the second beam, a detection plane or a detection surface which is arranged downstream of the first interferometer arm and the second interferometer arm and is set up in such a manner that the first beam and the second beam are made to interfere in an interference region on said plane or surface, and an overlapping device which is arranged between the detection plane and the first interferometer arm and the second interferometer arm.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: May 26, 2020
    Inventor: Martin Berz
  • Patent number: 10654216
    Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: May 19, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Philip D. Schumaker, Byung-Jin Choi
  • Patent number: 10656536
    Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: May 19, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Mircea Dusa, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas Poiesz, Marco Adrianus Peter Van Den Heuvel, Paul Van Dongen, Justin Johannes Hermanus Gerritzen, Antonie Hendrik Verweij, Abraham Alexander Soethoudt
  • Patent number: 10656541
    Abstract: The present invention provides a measurement apparatus including a first filter unit including a plurality of first filters, and each configured to allow light having a different wavelength band to pass, a second filter unit including a plurality of second filters, and each configured to reduce light intensity of light and allow the light to pass, an obtaining unit configured to obtain data representing a transmittance of each of the plurality of second filters for a wavelength band of light having passed through each of the plurality of first filters, and a selection unit configured to select, based on the data obtained by the obtaining unit, from the plurality of second filters, one second filter arranged on an optical path together with one first filter among the plurality of first filters.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: May 19, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hironori Maeda
  • Patent number: 10649349
    Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: May 12, 2020
    Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya
  • Patent number: 10649348
    Abstract: A movable body apparatus includes: a substrate holder which can move in the X-axis and Y-axis directions; a Y coarse movement stage which can move in the Y-axis direction; a first measurement system which acquires position information on the substrate holder by heads on the substrate holder and a scale on the Y coarse movement stage; a second measurement system which acquires position information on the Y coarse movement stage by heads on the Y coarse movement stage and a scale; and a control system which controls the position of the substrate holder based on position information acquired by the first and second measurement systems. The first measurement system irradiates a measurement beam while moving the heads in the X-axis direction with respect to the scale, and the second measurement system irradiates a measurement beam while moving the heads in the Y-axis direction with respect to the scale.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: May 12, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10642255
    Abstract: A method of making a semiconductor device includes collecting process control parameters during operation of a processing tool processing a product. The method further includes calculating a processing tool offset for the processing tool based on the collected process control parameters and calculating a product offset based on the collected process control parameters. The method further includes determining whether the product offset is stable and calculating an offset time for processing the product using the processing tool based on the calculated processing tool offset if the product offset is stable.
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: May 5, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ching-Hsi Nan, Yu-Hsiu Fu, Chia Jung Chang
  • Patent number: 10643831
    Abstract: A vacuum processing apparatus 100 includes: a vacuum chamber 1; a stage 2 placed inside the vacuum chamber 1, on which an object to be processed is placed; an internal guide rail 31 laid in the vacuum chamber 1 to guide the stage 2; a through-hole 103 made in a sidewall 102 of the vacuum chamber 1; a connecting rod 4 coupled to the stage 2 at one end and inserted in the through-hole 103, the other end being disposed outside the vacuum chamber 1; a movable member 5 connected to the other end of the connecting rod 4; a driving mechanism 8 disposed outside the vacuum chamber 1 to move the movable member 5; and a bellows 6 disposed between the movable member 5 and the sidewall 102, the bellows 6 following the movement of the movable member 5 while maintaining airtightness of the vacuum chamber 1.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: May 5, 2020
    Assignee: SHIMADZU CORPORATION
    Inventor: Tomoyoshi Matsushita
  • Patent number: 10645289
    Abstract: An optical apparatus and its vibration removing method capable of stabilizing a place where light is applied are provided. An optical apparatus according to an aspect of the present disclosure includes a light source chamber, an EUV light source, an optical system chamber, an optical system configured to guide light entering the optical system chamber to an object through a bellows, an optical sensor configured to detect EUV light L2 emitted from the EUV light source, a position sensor disposed to detect a relative position of the optical system chamber with respect to the light source chamber, and a second vibration removal unit configured to remove vibrations from the light source chamber based on detection results of the optical sensor and the position sensor.
    Type: Grant
    Filed: November 15, 2017
    Date of Patent: May 5, 2020
    Assignee: Lasertec Corporation
    Inventor: Haruhiko Kusunose
  • Patent number: 10642158
    Abstract: A method of controlling reticle masking blade positioning to minimize the impact on critical dimension uniformity includes determining a target location of a reticle masking blade relative to a reflective reticle and positioning the reticle masking blade at the target location. A position of the reticle masking blade is monitored during an imaging operation. The position of the reticle masking blade is compared with the target location and the position of the reticle masking blade is adjusted if the position of the reticle masking blade is outside a tolerance of the target location.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: May 5, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng, Chin-Hsiang Lin
  • Patent number: 10642161
    Abstract: Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: May 5, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng
  • Patent number: 10634623
    Abstract: Disclosed are methods and apparatus for inspecting an extreme ultraviolet (EUV) reticle using an optical inspection tool. An inspection tool having a pupil filter positioned at an imaging pupil is used to obtain a test image or signal from an output beam that is reflected and scattered from a test portion of an EUV test reticle. The pupil filter is configured to provide phase contrast in the output beam. A reference image or signal is obtained for a reference reticle portion that is designed to be identical to the test reticle portion. The test and reference images or signals are compared and it is determined whether the test reticle portion has any candidate defects based on such comparison. For each of a plurality of test reticle portions of the reticle, the operations for using the inspection tool, obtaining a reference image or signal, comparing, and determining are repeated. A defect report is generated based on any candidate defects that have been determined to be present.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: April 28, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Qiang Zhang, Rui-fang Shi
  • Patent number: 10632772
    Abstract: A fluid application system and method having a support structure for guiding a plurality of pallets along a path of travel through the system. The plurality of pallets for arranging a medium that receives fluid during operation. The system further includes an application assembly for applying fluid and energy to a medium arranged on the plurality of pallets and a conveyance arrangement comprising first and second conveyors for transferring the one or more pallets through the fluid application system. The first and second conveyors have a dedicated trolley selectively coupled to one of the plurality of pallets during movement along a first direction of the path of travel and selectively decoupled from the one of the plurality of pallets during movement along a second direction of the path of travel.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: April 28, 2020
    Assignee: GED Integrated Solutions, Inc.
    Inventors: Matthew B. Persons, Michael Novik, Timothy B. McGlinchy
  • Patent number: 10635005
    Abstract: An exposure apparatus that exposes a substrate is provided. The apparatus includes a stage configured to hold and move the substrate, and a controller configured to control focus driving of the stage based on a measurement value and a correction value obtained for the focus driving of the stage for a shot region on the substrate. The controller is configured to determine the correction value in accordance with an angle of view at a time of exposure.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: April 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Mitsuhide Nishimura, Masatoshi Endo, Junichi Motojima
  • Patent number: 10627721
    Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: April 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Victor Manuel Blanco Carballo, Thomas Augustus Mattaar, Johannes Cornelis Paulus Melman, Gerben Pieterse, Johannes Theodorus Guillielmus Maria Van De Ven, Jan-Piet Van De Ven, Petrus Franciscus Van Gils
  • Patent number: 10620551
    Abstract: A lithography system may include a wafer stage. The wafer stage may include a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process. The wafer stage may further include a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process.
    Type: Grant
    Filed: December 11, 2018
    Date of Patent: April 14, 2020
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Qiang Wu
  • Patent number: 10606049
    Abstract: The present invention relates to an ultra-short distance projection lens with a refractive meridional image surface and a refractive sagittal image surface being isolated, including a display chip, a refractive lens group, and a rotationally symmetric reflector. The display chip undergoes imaging by the refractive lens group to form, between the refractive lens group and the rotationally symmetric reflector, a meridional intermediate image and a sagittal intermediate image that are isolated, wherein the two images undergo imaging by the rotationally symmetric reflector and astigmatism is eliminated on a screen, to form a clear picture. The present invention has a simple structure, a projection ratio 0.27 to 0.31, a magnification ratio 170 times to 220 times, and ultra-small distortion, has an optical structure that cancels out astigmatism, high resolution, very desirable tolerance, and relatively low mounting precision requirements on optical parts, and has a very high yield in mass production.
    Type: Grant
    Filed: November 6, 2016
    Date of Patent: March 31, 2020
    Assignee: ZHEJIANG CRYSTAL-OPTECH.CO., LTD.
    Inventors: Zhenjie Liu, Wenzi Zhang, Jianjun Zhou
  • Patent number: 10600614
    Abstract: The present invention is to provide a stage device capable of improving field-of-view positioning accuracy of a stage having a Z-axis mechanism. The invention is directed to a sample stage device having a first table that moves a sample in a first direction, a second driving mechanism that moves the first table in a second direction different from the first direction, and a part having a function of moving a laser interferometer optical axis that measures the position of the first table, in the second direction.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: March 24, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Hironori Ogawa, Naruo Watanabe, Takanori Kato
  • Patent number: 10591828
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: March 17, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • Patent number: 10585362
    Abstract: In a substrate processing apparatus, an optical sensor is provided at a hand that transports a substrate to a processing unit, and an optical fiber is provided at a fixed member that has a certain positional relationship with a spin chuck in the processing unit. When the hand has a predetermined positional relationship with the spin chuck in the processing unit, the light emitted from a first light emitter of the optical sensor is received by a second light receiver of the optical fiber and guided to a second light emitter of the optical fiber, and the light emitted from the second light emitter is received by a first light receiver. A light receiving signal corresponding to an amount of light received by the first light receiver is output from the optical sensor.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: March 10, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Joji Kuwahara
  • Patent number: 10585296
    Abstract: Disclosed herein is a high throughput optical scanning device and methods of use. The optical scanning device and methods of use provided herein can allow high throughput scanning of a continuously moving object with a high resolution despite fluctuations in stage velocity. This can aid in high throughput scanning of a substrate, such as a biological chip comprising fluorophores. Also provided herein are improved optical relay systems and scanning optics.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: March 10, 2020
    Assignee: APTON BIOSYSTEMS, INC.
    Inventors: Windsor Owens, Bryan Staker, Rob Hartlage, Edvinas Zizminskas, David Stern, Paul Heilman
  • Patent number: 10573506
    Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: February 25, 2020
    Inventors: Michael Vidra, Robert Vaccaro, Edward Palanko, Mark Megela
  • Patent number: 10571807
    Abstract: The invention relates to an alignment apparatus for aligning a substrate, and a substrate processing system comprising such alignment apparatus. The alignment apparatus comprises an alignment base for supporting said substrate and/or a substrate support member, and a force generating device for applying a contact force on said substrate. The force generating device comprises: an arm comprising a rigid proximal end a rigid distal end provided with a contact section for contacting an edge of said substrate, and an elastically deformable arm section extending between the rigid proximal and distal ends, a connection part connecting said rigid proximal end to said alignment base, said arm being movable with respect to said alignment base via said connection part, and an actuator for acting on and causing a displacement of said rigid proximal end, whereby said contact force, defined by said elastically deformable arm section, is applied to said substrate by said contact section.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: February 25, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Bart Schipper
  • Patent number: 10572922
    Abstract: Some embodiments include a system. The system can comprise one or more processors and one or more non-transitory storage devices.
    Type: Grant
    Filed: December 22, 2018
    Date of Patent: February 25, 2020
    Assignee: WALMART APOLLO, LLC
    Inventors: Berk Atikoglu, Eytan Daniyalzade
  • Patent number: 10558130
    Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: February 11, 2020
    Assignee: ASNL Netherlands B.V.
    Inventors: Rene Marinus Gerardus Johan Queens, Erik Johan Koop, Reiner Maria Jungblut
  • Patent number: 10553396
    Abstract: In one embodiment, a charged particle beam writing apparatus includes a writer writing a pattern on a substrate on a stage with a charged particle beam, a mark substrate disposed on the stage and having a mark, an irradiation position detector detecting an irradiation position of the charged particle beam on a mark surface, a height detector detecting a surface height of the substrate and the mark substrate, a drift correction unit calculating an amount of drift correction, and a writing control unit correcting the irradiation position of the charged particle beam by using the amount of drift correction. The mark substrate has a pattern region with a plurality of marks and a non-pattern region with no pattern therein, and at least part of the non-pattern region is disposed between different portions of the pattern region. The height detector detects a height of a detection point in the non-pattern region.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: February 4, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Takahito Nakayama
  • Patent number: 10545415
    Abstract: A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus includes a substrate holder configured to hold the substrate, an optical system accommodated in the substrate holder, an image sensor configured to capture an image of the mark from the reverse surface side of the substrate through the optical system, and a processor configured to perform detection processing for the mark based on the image of the mark captured by the image sensor. The processor corrects a detection value of the mark based on the position of the mark on the substrate in the height direction and information concerning the telecentricity of the optical system.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: January 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hironobu Fujishima
  • Patent number: 10539719
    Abstract: An optical apparatus including a substrate and a refractive element formed above the substrate. The refractive element including a surface with a predetermined radius of curvature, and a group of periodic structures formed on the surface configured to refract or to filter one or more wavelengths of an incident light.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: January 21, 2020
    Assignee: Forelux Inc.
    Inventors: Shu-Lu Chen, Yun-Chung Na
  • Patent number: 10529694
    Abstract: Embodiments of methods and systems for wafer bonding alignment compensation are disclosed. The method comprises bonding a first pair of wafers including multiple bonding alignment mark pairs on the first pair of wafers; first analyzing a translational misalignment and a rotational misalignment between the first pair of wafers based on a measurement of at least two bonding alignment mark pairs; controlling a wafer position adjustment module to compensate for the translational misalignment and the rotational misalignment during bonding of a second pair of wafers based on the first analysis; second analyzing a mean run-out misalignment between the first pair of wafers based on a measurement of the multiple bonding alignment mark pairs; and controlling a wafer deformation adjustment module to compensate for the run-out misalignment during bonding of a third pair of wafers based on the second analysis.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: January 7, 2020
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventor: Shuai Guo
  • Patent number: 10527958
    Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs, Wendy Johanna Martina Van De Ven, Hadi Yagubizade, Hakki Ergün Cekli, Ralph Brinkhof, Tran Thanh Thuy Vu, Maikel Robert Goosen, Maaike Van't Westeinde, Weitian Kou, Manouk Rijpstra, Matthijs Cox, Franciscus Godefridus Casper Bijnen
  • Patent number: 10527946
    Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: January 7, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Willem Herman De Jager, Robert Albertus Johannes Van Der Werf, Michaël Josephus Evert Van De Moosdijk, Pascale Anne Maury
  • Patent number: 10527950
    Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including an array of radiation source modules configured to project the modulated radiation onto a respective array of exposure regions on the substrate; and a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system including at least one central processing unit and a plurality of module processing units each associated with a respective radiation source module.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Erwin Paul Smakman, Coen Adrianus Verschuren
  • Patent number: 10527948
    Abstract: An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block. There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: January 7, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Seiji Nagahara, Masaru Tomono, Nobutaka Fukunaga, Gousuke Shiraishi
  • Patent number: 10520818
    Abstract: A photoresist film is patterned into an array of island shapes with improved critical dimension uniformity and no phase edges by using two alternating phase shifting masks (AltPSMs) and one post expose bake (PEB). The photoresist layer is exposed with a first AltPSM having a line/space (L/S) pattern where light through alternating clear regions on each side of an opaque line is 180° phase shifted. Thereafter, there is a second exposure with a second AltPSM having a L/S pattern where opaque lines are aligned orthogonal to the lengthwise dimension of opaque lines in the first exposure, and with alternating 0° and 180° clear regions. Then, a PEB and subsequent development process are used to form an array of island shapes. The double exposure method enables smaller island shapes than conventional photolithography and uses relatively simple AltPSM designs that are easier to implement in production than other optical enhancement techniques.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: December 31, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jesmin Haq, Tom Zhong, Zhongjian Teng
  • Patent number: 10522427
    Abstract: A method for processing a plurality of semiconductor wafers includes acquiring a process parameter measurement for each of the semiconductor wafers, associating each of the semiconductor wafers with one of a plurality of groups based on a respective process parameter measurement for each of the semiconductor wafers, where each respective group corresponds to a respective recipe, and for each one of the groups, processing ones of the semiconductor wafers associated with that group together according to a respective recipe.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: December 31, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tsun-Jen Chan, Yh-Hsiu Hsiao, Lu Cheng-Ta, Jian-Hong Wu
  • Patent number: 10514574
    Abstract: The present disclosure discloses a direct type backlight module, which includes a back plate and a light source disposed on the back plate, wherein the light source includes a printed circuit board and a plurality of micro-LED chips electrically connected to the printed circuit board, the plurality of micro-LED chips are arranged in a matrix array on the printed circuit board, and a light shielding unit is disposed between any adjacent two micro-LED chips; and the printed circuit board is further connected with a backlight driving chip thereon which drives each of the plurality of micro-LED chips independently. The present disclosure further provides a liquid crystal display which includes the abovementioned direct type backlight module.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: December 24, 2019
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
    Inventor: Yan Cheng
  • Patent number: 10514616
    Abstract: An exposure apparatus has a substrate holding member, a first supporting member, a second supporting member, and a driving system. The first supporting member supports the substrate holding member from below. The second supporting member supports the first supporting member from below such that the first supporting member and the second supporting member are capable of moving relative to each other. The driving system moves the substrate holding member, the first supporting member and the second supporting member. The driving system includes a first driving device and a second driving device, the first driving device moving the substrate holding member and the first supporting member in a direction along a predetermined axis, and the second driving device moving the second supporting member in the direction along the predetermined axis.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: December 24, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10503079
    Abstract: A method detects a position of a target in an image using a template having first to Nth feature points. The method includes obtaining an index indicating correlation between the template and the image by repeating processing for each relative positions of the template with respect to the image, while sequentially setting first to nth (n?N) feature points as a feature point of interest. When the feature point of interest is a Jth feature point, whether an intermediate index indicating the correlation obtained based on processing of the first to Jth feature points satisfies a censoring condition is determined, and processing of (J+1)th and subsequent feature points is canceled if the intermediate index satisfies the censoring condition.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: December 10, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tadaki Miyazaki
  • Patent number: 10496078
    Abstract: There is provided a configuration that includes a plurality of substrate processing apparatuses and a management device for managing the plurality of substrate processing apparatuses. Upon receiving information specifying a substrate processing apparatus as a reference and file information designating a predetermined device file, the plurality of substrate processing apparatuses transmits request data including first device information and first data information to the management device. Upon receiving the request data, the management device transmits the received request data to the reference substrate processing apparatus. The reference substrate processing apparatus creates response data including second data information responding to the first data information and transmits the created response data to the management device. Upon receiving the response data, the management device transmits the received response data to the plurality of substrate processing apparatuses.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: December 3, 2019
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Kazuyoshi Yamamoto, Osamu Ueda, Kazuhide Asai