Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.

Abstract: A photomask including monitoring marks is disclosed. In one aspect, the photomask includes a transparent substrate, a mask pattern formed on an upper surface of the transparent substrate, and a monitoring mark having a line width pattern shared with the mask pattern. The monitoring mark is configured to receive a laser beam so as to measure a power state of the laser beam.

Abstract: A measuring apparatus which measures a substrate on which a mark formed with a resist is formed via lithography. An acquisition unit acquires information of an edge interval in an image of the mark under two different measurement conditions, and a calculation unit calculates a defocus value in the lithography based on a difference between the edge intervals of which information is acquired under the two different measurement conditions.

Abstract: Methods and control systems are provided for controlling stage position errors based, in some embodiments, on a selection of frequency components in a stage position error signal. An error frequency representation of a position error signal may be generated in the frequency domain and filtered by selecting one or more desired frequency components. The filtered error frequency representation can then be manipulated according to a control law and transformed back into the time domain to generate a current control signal. The current control signal can then be used to adjust the position of the stage to reduce positioning error.

Abstract: A guide shaft and a guide portion movably guide a lens holder for holding a collimator lens (i.e. correction lens) in an optical axis direction. A stepping motor rotates a screw shaft arranged in parallel to the optical axis direction. A nut member converts a rotating movement of the screw shaft into a rectilinear movement of the optical axis direction. An urging spring urges the lens holder against the guide shaft and the guide portion. The lens holder is driven in the optical axis direction along the guide shaft by the stepping motor, with a first contact portion and a second contact portion of the lens holder being contacted with the guide shaft, and a third contact portion of the lens holder being contacted with the guide portion by an urging force of the urging spring. The optical pickup device having the above arrangement allows for stable driving of a correction lens.

Abstract: A measuring apparatus measures a substrate on which a registration mark is formed. The measuring apparatus includes an acquisition unit which acquires the edge interval information of an image of the registration mark sensed under a measurement condition which is changed to make the edge interval of the image of the registration mark have an extreme value corresponding to a different focus position of a projection exposure apparatus, and a calculation unit which calculates a defocus value on the basis of the edge interval information of the image of the registration mark sensed under each measurement condition.

Abstract: A lens module includes a frame, a guide bar, a lever, a first lens and a second lens. The frame is for carrying an image sensor with a photosensitive surface. The guide bar is disposed on one side of the frame and parallel to a normal of the photosensitive surface. The lever includes a pivot part coupled with the frame and an extended part capable of rotating around the pivot part. The first lens and the second lens coupled with the guide bar are leaned against the extended part. When the extended part rotates around the pivot part, the extended part drives the first lens and the second lens to slide along the guide bar, for changing a first distance between the first lens and the photosensitive surface and changing a second distance between the second lens and the photosensitive surface.

Abstract: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.

Abstract: A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.

Abstract: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.

Abstract: A photograph vehicle which may be equipped with a digital camera for photographing supplies to be ordered by personnel in a semiconductor production plant and a computer which may be provided in communication with a server, such that images of the supplies transmitted from the digital camera to the computer may be transmitted to the server and the personnel in the semiconductor production plant can observe the images on a desktop, laptop or palmtop computer via internet access to verify supply orders.

Abstract: To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.

Abstract: A stage apparatus includes a stage, a member fixed to the stage and a weight compensation mechanism having at least three spring members for compensating for a weight of a structure including the stage and the member. A barycentric position of the structure deviates from a centroid of a polygon formed by support points of the at least three spring members. The spring constants of the at least three spring members are based on a relative positional relationship between the barycentric position of the structure and the at least three spring members so as to set at least one spring constant different from the other spring constants.

Abstract: In one illustrative embodiment, a system is provided for controlling a lens of an optical system of a stepper. The system comprises the stepper, the optical system, and a controller. The stepper has a light source controllably energizable to provide light to a surface of a semiconductor device. The lens of the optical system has a controllable focus. The controller is capable of determining a temperature of the lens, and controllably varying the focus of the lens in response to the temperature of the lens.

Abstract: An output control method for an excimer laser includes providing plural light pulses, and changing an emission interval for the light pulses, wherein the emission interval is controlled so that an average laser output of each light pulse becomes higher than that when the emission interval is unchanged.

Abstract: An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.

Abstract: In a photographic copying apparatus, in which the plane of the original and the plane of the copying material are positioned at the stable distance from each other, an objective has two optical elements which are adjustable relative to a reference position by means of the associated step motors in the axial direction so as to thereby adjust an image scale and a focus distance. A computer for controlling the step motors and two memory devices, connected to the computer, are provided in the apparatus. The data of the objective characteristics are stored in the first memory and specific apparatus data, as well as individual user's data, are programmed by a user and stored in the second memory. The computer controls the step motors in accordance with the capacities of the two memory devices.

Abstract: A projection printing apparatus uses different lens systems during alignment and during printing. The lens system for alignment causes an alignment mark on mask to be imaged on the alignment mark on a wafer when the mask is illuminated by non-sensitizing light. The lens system for printing causes the circuit pattern of the mask to be illuminated by sensitizing light to be imaged on the wafer. The whole or part of the lens system for alignment is positioned outside of the circuit pattern image forming light path so as not to adversely affect the circuit pattern image on the wafer when the mask is illuminated by the sensitizing light.

Abstract: A photographic enlarger for use in bright light comprises a light-tight space which is enclosed in a casing, a bellows and a box thereon; the box is displaceably mounted on the casing for upward and downward adjustment and contains a light source emanating projecting light, a transparency holder, an enlarging objective and a deflecting mirror. On the floor of the casing a carrier block, which is displaceable freely on the floor in any direction, carries a lenticulated reflecting screen and a hingedly connected masking frame. A light-tightly closable window is provided in the box and permits viewing through the same, when open, the entirety of the surface of the lenticulated screen via the said deflecting mirror. In the front wall of the casing, two handholes having light-tight covering means are provided which allow for manipulation of the carrier block and of the masking frame and also render it possible to switch the light source on and off by means of a light switch inside the casing.

Abstract: A projection type exposure device includes a main projection objective lens for projecting onto a wafer a predetermined pattern on a negative plate to be projected, a main illuminating optical system including a condenser lens for illuminating the negative plate to be projected, and an alignment optical system for forming the image of a reference mark provided on the negative plate to be projected and the image of an alignment mark on the wafer through the main projection objective lens from between the condenser lens and the main projection objective lens. The alignment optical system has a first objective lens and a second objective lens for condensing the light beam from the first objective lens, the first and second objective lenses being disposed on the same optical axis, and a reflecting member for bending the optical axis so that it is orthogonal to the negative plate to be projected. The first objective lens and the reflecting member are movable together relative to the negative plate to be projected.

Abstract: An arrangement for projection copying of masks onto a workpiece, in particular onto a semiconductor substrate for producing integrated circuits, wherein the images of the patterns of the masks are formed by a projection lens on a photosensitive layer on the workpiece. The projection lens is completely corrected at the exposure wavelength used, and alignment patterns of the mask are aligned relative to adjustment marks on the workpiece, after images of the alignment pattern and the adjustment mark have been formed in the same plane, with adjustment exposure, by the projection lens and possibly an auxiliary optical means.

Abstract: A device for the projection printing of the masks of a mask set onto a semiconductor substrate comprising a projection lens for imaging the patterns of said masks on photosensitive layers of said substrate. Alignment patterns are disposed said masks and alignment targets on said substrate. Said alignment patterns of at least one of said masks and said alignment targets of said substrate are positioned in non-conjugated areas in respect of the projection lens, i.e. in areas which cannot be imaged into one another by means of said projection lens. For the alignment process between said mask and said substrate auxiliary optical means are provided, said alignment targets of said substrate and said alignment patterns of said mask being imaged into one another by means of said auxiliary optical means.

Abstract: Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.