Focus Or Magnification Control Patents (Class 355/55)
  • Patent number: 10436577
    Abstract: The invention relates to a full-field statistical & characterizing method of fluid micro-explored strain for alloy microstructure, comprising the following steps: a. grinding and polishing the surface of an alloy sample to mirror with no grinding defects, and then determining a to-be-measured area on the surface of the alloy sample; b. utilizing a white light interferometry 3D surface profiler to perform initial morphology measurement on the surface of an alloy sample; c. utilizing an isostatic pressing technology to obtain the microstructure deformation on the surface of the alloy sample, and then utilizing a white light interferometry 3D surface profiler to perform deformed morphology measurement on the surface of the alloy sample to obtain a changing spectrum of micro morphology of the microstructures on the surface of the alloy; and d.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: October 8, 2019
    Assignee: CENTRAL IRON AND STEEL RESEARCH INSTITUTE
    Inventors: Guang Feng, Yunhai Jia, Haizhou Wang, Zhongnan Bi, Xuejing Shen, Peng Wang, Hailong Qin, Lei Zhao, Xing Yu, Dongling Li
  • Patent number: 10418290
    Abstract: A method of patterning a semiconductor device includes following steps. First of all, a substrate is provided, and a first target pattern is formed in the substrate. Next, a second target pattern is formed on the substrate, across the first target pattern. Then, a third pattern is formed on a hard mask layer formed on the substrate, by using an electron beam apparatus, wherein two opposite edges of the third pattern are formed under an asymmetry control.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 17, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: En-Chiuan Liou, Hon-Huei Liu, Chia-Hung Lin, Yu-Cheng Tung
  • Patent number: 10394128
    Abstract: In a method for predicting at least one illumination parameter for evaluating an illumination setting for illuminating an object field of a projection exposure apparatus, illumination parameters are measured at a number of calibration settings, correction terms for prediction values of the illumination parameters are determined from the measured values, and then at least one illumination parameter of at least one illumination setting, which is not contained in the set of n calibration settings, is predicted.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: August 27, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ralf Gehrke, Christoph Hennerkes, Wolfgang Hoegele, Joerg Zimmermann
  • Patent number: 10359600
    Abstract: The present invention discloses an optical system for adjusting and compensating a back focus through a multi-optical-path combination. The optical system includes a lens barrel. The lens barrel is provided with a lens head holder body. A light splitting component used for splitting a light beam into a plurality of light beams is arranged in the lens head holder body. The present invention may perform matching and adjustment according to a requirement of the optical system in each rate state, so that a plurality of paths of light shares a focus.
    Type: Grant
    Filed: January 7, 2018
    Date of Patent: July 23, 2019
    Assignee: UNION OPTECH CO., LTD.
    Inventor: Junqiang Gong
  • Patent number: 10330905
    Abstract: Provided is a microscope apparatus including: a light source; an illumination optical system that radiates illumination light from the light source onto an observation object; an imaging optical system that focuses light from the observation object; and an image acquisition device that acquires an image of the light focused by the imaging optical system. The imaging optical system is provided with: imaging lenses that form a final image and at least one intermediate image; a first phase modulation element that is disposed closer to an object than any of the at least one intermediate image and that gives a spatial disturbance to the wavefront of light from the object; a second phase modulation element that is disposed at a position for allowing the at least one intermediate image to be sandwiched with the first phase modulation element and that cancels out the spatial disturbance given to the wavefront.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: June 25, 2019
    Assignee: OLYMPUS CORPORATION
    Inventor: Hiroya Fukuyama
  • Patent number: 10324379
    Abstract: A method to form on a substrate a first target comprising a first feature and a second target comprising a second feature, wherein the forming of the targets comprises applying the first feature and the second feature to the substrate by projection of a radiation beam through a production patterning device installed in a lithographic apparatus, the features corresponding to one or more features of the patterning device, and controlling a configuration of the lithographic apparatus to induce an aberration component, such that the first feature is applied to the substrate using a first value of an induced aberration component and the second feature is applied to the substrate using a second, different value of the induced aberration component; measuring a property of the targets; and using the measurements to determine a sensitivity of the property of the targets to changes in value of the induced aberration component.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: June 18, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Cedric Marc Affentauschegg, Milenko Jovanovic, Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Robertus Wilhelmus Van Der Heijden
  • Patent number: 10274840
    Abstract: Disclosed is an adaptive groove focusing and leveling device for measuring the height and the inclination of the surface of a measured object (400).
    Type: Grant
    Filed: December 27, 2015
    Date of Patent: April 30, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Jingchao Qi, Feibiao Chen
  • Patent number: 10236647
    Abstract: A routing members connection structure electrically connects a long first trunk routing member which is routed in a vehicle and can transmit power and a first branch routing member routed in the vehicle, can transmit power, and branches off from the first trunk routing member. Each of the first trunk routing member and the first branch routing member has a flat conductor and an insulator that is formed on the outer circumferential surface of the flat conductor. The first trunk routing member has a post-shaped first stud bolt that is made of a metal and extends outward from a first branching portion where the flat conductor is exposed without being covered with the insulator. The flat conductor of the first trunk routing member and the flat conductor of the first branch routing member are electrically connected to each other via the first stud bolt.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: March 19, 2019
    Assignee: YAZAKI CORPORATION
    Inventors: Shingo Kato, Yasuhiro Kominato
  • Patent number: 10222573
    Abstract: An adjustable optical lens and camera module and manufacturing method thereof are provided, wherein the camera module includes an optical sensor and an adjustable optical lens. The adjustable optical lens, which is arranged in a photosensitive path of the optical sensor, includes an optical structural member and at least two lenses. Each of the lens is arranged in an internal space of the optical structural member along an axial direction of the optical structural member, wherein before packaging the adjustable optical lens and the optical sensor, at least one position of the lens in the internal space of the optical structural member is able to be adjusted, so that a central axis line of the adjustable optical lens and a central axis line of the optical sensor are coincided, so as to improve the image quality of the camera module.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: March 5, 2019
    Assignee: Ningbo Sunny Opotech Co., Ltd.
    Inventors: Mingzhu Wang, Bojie Zhao, Liang Ding, Chunmei Liu, Feifan Chen, Nan Guo, Heng Jiang
  • Patent number: 10199330
    Abstract: In various embodiments, an alignment mark arrangement may include a plurality of alignment marks disposed next to each other in a row, wherein at least one of the following holds true: a first alignment mark of the plurality of alignment marks has a first width and a second alignment mark of the plurality of alignment marks has a second width that is different from the first width; a first pair of neighboring alignment marks of the plurality of alignment marks is arranged at a first pitch and a second pair of neighboring alignment marks of the plurality of alignment marks is arranged at a second pitch that is different from the first pitch.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 5, 2019
    Assignee: Infineon Technologies AG
    Inventors: Andreas Woerz, Erwin Steinkirchner
  • Patent number: 10200565
    Abstract: An image forming system includes an image forming device, a reading device and a hardware processor. The image forming device includes an image former that forms an image on a sheet. The reading device includes a line sensor and a lens unit. The line sensor reads the sheet with the image formed, thereby obtaining a read image. The lens unit includes a plurality of lenses and forms an image of the sheet on the line sensor. The hardware processor identifies a sheet region of the sheet in the read image, and corrects a magnification of each subregion in a main scanning direction of the sheet region according to a characteristic of a portion in the main scanning direction of the lens unit, the portion having being used in forming an image of the subregion on the line sensor.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: February 5, 2019
    Assignee: KONICA MINOLTA, INC.
    Inventors: Hiroshi Isokawa, Kenji Kawatsu
  • Patent number: 10185225
    Abstract: A lithography apparatus includes a detector that detects an original-side mark image and a substrate-side mark image via a projection optical system, and a controller. The detector generates refocusable light field image data that includes the original-side mark image and the substrate-side mark image. The controller performs, based on the light field image data obtained from the detector, a refocus operation of reconstructing a plurality of images different in position in a focus direction and adjusts a position of at least one of the original holder and the substrate holder based on the plurality of images reconstructed by the refocus operation.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: January 22, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shinichi Egashira
  • Patent number: 10180207
    Abstract: A stand comprising a support platform connected to a movable mounting platform via actuators, a movable mounting platform position locking unit, comprising unit for activation and deactivation of the movable mounting platform positioning mode, sensors of applied force connected to each actuator, and an electronic device for actuator length control capable of receiving signals from force sensors about forces applied to actuators prior to activation of the movable mounting platform positioning mode, of taking the force value at the activation of the movable mounting platform positioning mode as conventionally equal to 0, and of further changing the actuator length based on signals from force sensors about forces applied to actuators after activation of the mode of movable mounting platform positioning in the direction where the force on the corresponding force sensor is decreasing, at a speed proportional to the magnitude of force.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: January 15, 2019
    Inventors: Danylo Kozub, Iurii Shapoval, Sergii Pustovarov
  • Patent number: 10151996
    Abstract: In an image forming apparatus, a correction control unit of an image clock control unit controls the frequency of an image clock, so that the partial magnification of each position in an image region in which an image is formed is corrected in a main scanning direction that is a direction in which a laser beam scans a scanning region of one line. When controlling the frequency of the image clock, the correction control unit makes the change rate (the slope) that is a change amount of the image clock per unit time, be smaller in a non-image region being a region other than the image region, than the change rate in the image region.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: December 11, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hidenori Kanazawa
  • Patent number: 10078267
    Abstract: In a method for predicting at least one illumination parameter for evaluating an illumination setting for illuminating an object field of a projection exposure apparatus, illumination parameters are measured at a number of calibration settings, correction terms for prediction values of the illumination parameters are determined from the measured values, and then at least one illumination parameter of at least one illumination setting, which is not contained in the set of n calibration settings, is predicted.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: September 18, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ralf Gehrke, Christoph Hennerkes, Wolfgang Hoegele, Joerg Zimmermann
  • Patent number: 10037398
    Abstract: A chemical pattern layer including an orientation control material and a prepattern material is formed over a substrate. The chemical pattern layer includes alignment-conferring features and additional masking features. A self-assembling material is applied and self-aligned over the chemical pattern layer. The polymeric block components align to the alignment-conferring features, while the alignment is not altered by the additional masking features. A first polymeric block component is removed selective to a second polymeric block component by an etch to form second polymeric block component portions having a pattern. A composite pattern of the pattern of an etch-resistant material within the chemical pattern layer and the pattern of the second polymeric block component portions can be transferred into underlying material layers employing at least another etch.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: July 31, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Markus Brink, Joy Cheng, Gregory S. Doerk, Michael A. Guillorn, Kafai Lai, Hsinyu Tsai
  • Patent number: 10025193
    Abstract: A lithographic apparatus applies a pattern repeatedly to target portions across a substrate. Prior to applying the pattern an alignment sensor measures positions of marks in the plane of the substrate and a level sensor measures height deviations in a direction normal to the plane of the substrate. The apparatus applies the pattern to the substrate while positioning the applied pattern using the positions measured by the alignment sensor and using the height deviations measured by the level sensor. The apparatus is further arranged to calculate and apply corrections in the positioning of the applied pattern, based on derivatives of the measured height deviations. The corrections may be calculated on an intrafield and/or interfield basis. The corrections may be based on changes between the observed height deviations and height deviations measured previously on the same substrate.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: July 17, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hakki Ergün Cekli, Xing Lan Liu, Daan Maurits Slotboom, Wim Tjibbo Tel, Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren
  • Patent number: 10012912
    Abstract: An exposure method includes: exposing, with a photomask including a shot pattern including chip patterns arranged therein, a plurality of the shot patterns onto a wafer as a first pattern; aligning the photomask on the wafer so that a first region of the shot pattern overlaps the first pattern, a second region other than the first region of the shot pattern is outside the first pattern, and chip patterns are continuously arranged in the first pattern and the second region; adjusting focus on the wafer, with the photomask having been aligned on the wafer; and shielding the first region from light and exposing a pattern of the second region onto the wafer as a second pattern.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: July 3, 2018
    Assignee: FUJITSU SEMICONDUCTOR LIMITED
    Inventor: Kimie Hatakenaka
  • Patent number: 9998694
    Abstract: A method for image processing comprising providing an opening for entrance of light; the light being capable of being formed into an image; providing at least one optical element in an optical train configured to focus light; providing a variable aperture operatively associated with the at least one optical element; the variable aperture being placed in the optical train at an image plane and comprising mask settings for shielding portions of the light; providing an imager; providing at least one processor operatively connected to the variable aperture and imager; the at least one processor configured to control the passage of the light through the variable aperture; selectively masking portions of light using the mask settings of the variable aperture; obtaining image results using the settings; comparing image results obtained by the mask settings, and determining the phase correction that provides the optimal image results.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: June 12, 2018
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: David H Tofsted, Sean G O'Brien
  • Patent number: 9965578
    Abstract: A method for improving a lithographic process for imaging a design layout onto a substrate using a lithographic projection apparatus comprising a patterning device, wherein the patterning device deforms from a first state to a second state, the method comprising: determining a deformation of the patterning device from the first state to the second state; determining a compensatory design layout from the design layout and the deformation; wherein the compensatory design layout is such that when the compensatory design layout is generated on the patterning device in the first state, the deformation of the patterning device deforms the compensatory design layout to the design layout.
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: May 8, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventor: M'hamed Akhssay
  • Patent number: 9892886
    Abstract: There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system (100) is equipped with an aberration corrector (30) for correcting aberrations in the optical system, and includes: an aberration measuring section (44) for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section (46) for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller (48) for controlling the aberration corrector (30) to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.
    Type: Grant
    Filed: June 8, 2017
    Date of Patent: February 13, 2018
    Assignee: JEOL Ltd.
    Inventor: Shigeyuki Morishita
  • Patent number: 9886543
    Abstract: A pattern of features of an integrated circuit is provided. A configuration of a pupil of an extreme ultraviolet wavelength radiation beam (also referred to as an illumination mode), is selected. The selected configuration is an asymmetric, single pole configuration. At least one disparity is determined between a simulated imaging using the selected configuration and a designed imaging for the pattern of features. A parameter (also referred to as a compensation parameter) is then modified to address the at least one disparity, wherein the parameter at least one a design feature, a mask feature, and a lithography process parameter. A substrate is then exposed to the pattern of features using the selected configuration and the modified parameter.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: February 6, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chun Chung, Norman Chen, Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen
  • Patent number: 9876923
    Abstract: Printing a graphic media product is described. The media product has an indicia marked on a media substrate. An installation of a supply of the media substrate is detected. A sensor is activated based on the detection of the installation. The activated sensor measures a width of the installed media substrate. A center position of the media substrate is computed based on the measured width. The marking of the indicia upon the media substrate is aligned relative to the computed center position of the media substrate.
    Type: Grant
    Filed: October 27, 2015
    Date of Patent: January 23, 2018
    Assignee: Intermec Technologies Corporation
    Inventors: Boon Hao Wong, Sze Ping Ching
  • Patent number: 9873937
    Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: January 23, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Choong-Ho Lee, Jung-Min Lee
  • Patent number: 9857692
    Abstract: An exposure method and apparatus exposes an object with an exposure beam via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A first stage on which the object is held and a second stage are moved relative to each other so that the second stage approaches the first stage that is placed facing the projection optical system, the second stage having an upper surface contactable with a liquid immersion area. The first and second stages that have approached each other are moved with respect to the projection optical system so that the second stage is placed facing the projection optical system instead of the first stage. For relative movement of the first and second stages in the approaching, driving of the first and second stages is controlled based on outer periphery positional information of the first stage.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: January 2, 2018
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 9851303
    Abstract: Described is a system for inducing and detecting multi-photon processes, in particular multi-photon fluorescence or higher harmonic generation in a sample. The system comprises a dynamically-controllable light source, said dynamically-controllable light source comprising a first sub-light source, said first sub-light source being electrically controllable such as to generate controllable time-dependent intensity patterns of light having a first wavelength, and at least one optical amplifier, thereby allowing for active time-control of creation of multi-photon-excitation. The system further comprises a beam delivery unit for delivering light generated by said dynamically-controllable light source to a sample site, and a detector unit or detector assembly for detecting signals indicative of said multi-photon process, in particular multi-photon fluorescence signals or higher harmonics signals.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: December 26, 2017
    Assignee: Ludwig-Maximilians-Universität München
    Inventors: Robert Alexander Huber, Sebastian Karpf, Matthias Eibl
  • Patent number: 9810916
    Abstract: A reticle for a semiconductor lithography process includes a glass plate having regions with a reduced optical transmission factor. The regions may include arrays of elements comprising defects such as cracks or voids which are formed by laser pulses. The regions may be adjacent to openings in an opaque material at the bottom of the reticle to shield the openings from a portion of the light which illuminates the reticle from the top. As a result, the light which exits the reticle and is used to pattern a substrate has an asymmetric intensity. This allows the substrate to be patterned with an inspection mark which indicates whether a defocus condition exists, and whether there is a positive or negative defocus condition. Related methods use a reticle to form a pattern on a substrate and for adjusting a focus condition using a reticle.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: November 7, 2017
    Assignee: SanDisk Technologies LLC
    Inventor: Akihiro Tobioka
  • Patent number: 9766554
    Abstract: A structure in semiconductor fabrication includes at least a first periodic asymmetric feature and a periodic asymmetric second feature. The first feature contains a plurality of periodically distributed first elements. The first feature has a first asymmetric profile such that the first feature no longer has the same first asymmetric profile when it is rotated by 180 degrees. The second feature contains a plurality of periodically distributed second elements. The second feature has a second asymmetric profile such that the second feature no longer has the same second asymmetric profile when it is rotated by 180 degrees. The second asymmetric profile is different from the first asymmetric profile.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: September 19, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Liang Chen, Chih-Ming Ke, Kai-Hsiung Chen, Wen-Zhan Zhou
  • Patent number: 9746784
    Abstract: Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: August 29, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jun Ye, Peng Liu, Yu Cao
  • Patent number: 9678440
    Abstract: A projection exposure method includes exposing an exposure area of a radiation sensitive substrate with at least one image of a pattern of a mask in a scanning operation. The scanning operation includes moving the mask relative to an effective object field of the projection objective and simultaneously moving the substrate relative to an effective image field of the projection objective in respective scanning directions. The projection exposure method also includes changing imaging properties of the projection objective actively during the scanning operation according to a given time profile to change dynamically at least one aberration of the projection objective between a beginning and an end of the scanning operation.
    Type: Grant
    Filed: May 16, 2016
    Date of Patent: June 13, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Dirk Juergens
  • Patent number: 9665015
    Abstract: The present invention provides an original holding apparatus which holds an original, comprising a first holding unit configured to hold the original, a second holding unit configured to hold the original, a fixing unit configured to fix the second holding unit, and an adjustment unit configured to perform adjustment of an holding force of at least one of the first holding unit and the second holding unit, wherein the adjustment unit performs the adjustment such that the holding force of the second holding unit before fixing the second holding unit is smaller than the holding force of the first holding unit before fixing the second holding unit, and performs the adjustment such that the holding force of the second holding unit after fixing the second holding unit is larger than that before fixing the second holding unit.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: May 30, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yuuhei Matsumura
  • Patent number: 9651874
    Abstract: A DUV scanned-spot-array lithography system comprises an array of phase- Fresnel microlenses, which focus multiple radiation beams through intermediate foci at the object surface of a projection system. The intermediate foci are imaged by the projection system onto corresponding focused-radiation spots on an image plane, and the spots expose a photosensitive layer proximate the image plane as the layer is scanned in synchronization with modulation of the beams. The modulators may comprise micromechanical shutters proximate the intermediate foci for ON/OFF switching, in series with transmission grating modulators for gray-level control, and the microlenses may also be actuated to provide dynamic beam centering control. A nodal line printing technique may be used to provide ultra-high-resolution and high-throughput maskless printing capability in conjunction with multi-patterning or dual-wavelength recording processes.
    Type: Grant
    Filed: June 20, 2014
    Date of Patent: May 16, 2017
    Inventor: Kenneth C. Johnson
  • Patent number: 9632431
    Abstract: A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing a property of the patterned beam of radiation. In addition, a first positioning system is connected to the substrate table and displaces the substrate table into and out of a path of the patterned beam of radiation, and a second positioning system is capable of positioning the sensor table into the path of the patterned beam of radiation when the substrate table is displaced out of the path of the patterned beam of radiation.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: April 25, 2017
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9626602
    Abstract: A method and system render rasterized data by receiving non-rasterized page description language data and a corresponding transformation matrix representing transformation operations to be performed. The non-rasterized page description language data is rasterizing to create rasterized data. The corresponding transformation matrix is decomposed into a plurality of individual transformation operation matrices and a discrete transformation operation value, from each corresponding individual transformation operation matrix, is generated for each transformation operation to be performed upon the rasterized data. The transformation operations are performed upon the rasterized data based upon the generated discrete transformation operation values.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: April 18, 2017
    Assignee: Xerox Corporation
    Inventor: Paul Roberts Conlon
  • Patent number: 9626603
    Abstract: A method and system render rasterized data by receiving non-rasterized page description language data and a corresponding transformation matrix representing transformation operations to be performed. The non-rasterized page description language data is rasterizing to create rasterized data. The corresponding transformation matrix is decomposed into a plurality of individual transformation operation matrices and a discrete transformation operation value, from each corresponding individual transformation operation matrix, is generated for each transformation operation to be performed upon the rasterized data. The transformation operations are performed upon the rasterized data based upon the generated discrete transformation operation values.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: April 18, 2017
    Assignee: Xerox Corporation
    Inventor: Paul Roberts Conlon
  • Patent number: 9570364
    Abstract: A method of detecting focus shift in a lithography process, a method of analyzing an error of a transferred pattern using the same, and a method of manufacturing a semiconductor device using the methods are provided. The focus shift detecting method of a lithography process comprises generating a first contour band of a mask pattern between a first focus and a second focus, generating a second contour of the mask pattern between the first focus and a third focus, and determining whether focus shift of the mask pattern occurs using an intersection of the first contour band and the second contour band.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: February 14, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong-Jin Chun, Suk-Joo Lee, Byoung-Il Choi
  • Patent number: 9547812
    Abstract: A printing apparatus, when a sheet is fed from a sheet feeding unit in a state where size information indicating the size of sheets stacked in the sheet feeding unit is not stored in a storage unit, detects and stores the size of the sheet during conveyance. The printing apparatus controls the execution of the print processing, without using size information in a case where a print instruction is received in a state where the size information is not stored, and using the size information in a case where the print instruction is received in a state where the size information is stored. Furthermore, the printing apparatus clears the size information stored in the storage unit when a particular key is operated in a state where the size information is stored while print processing is not being executed.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: January 17, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Oya
  • Patent number: 9541844
    Abstract: A method for calibrating a manufacturing device that manufactures solid parts by projecting images onto a photo-curable substrate includes providing the manufacturing device including a projector and an optical train, positioning an imaging plate at a manufacturing position relative to the manufacturing device, and providing a contrasting image on the imaging plate. The method further includes projecting a test image from the projector through the optical train onto the contrasting image and calibrating the projector and/or the optical train in response to the test image projected onto the contrasting image. The method further includes manufacturing a solid component with the manufacturing device after the calibrating.
    Type: Grant
    Filed: August 9, 2010
    Date of Patent: January 10, 2017
    Assignee: Rolls-Royce Corporation
    Inventor: Michael Christopher Maguire
  • Patent number: 9525814
    Abstract: An automatic focus searching method for an image capture device is provided. The image capture device has a lens and an image sensor. The method includes: setting an exposure time of the image sensor; computing a focal sweep trajectory of the lens based on at least the exposure time; during the exposure time, moving the lens along the focal sweep trajectory while exposing the image sensor; reading out pixel data of the image sensor that is generated during the exposure time; and applying a filtering operation upon the pixel data to generate an output image.
    Type: Grant
    Filed: October 12, 2014
    Date of Patent: December 20, 2016
    Assignee: Himax Imaging Limited
    Inventor: Po-Chang Chen
  • Patent number: 9514396
    Abstract: A printing apparatus, when a sheet is fed from a sheet feeding unit in a state where size information indicating the size of sheets stacked in the sheet feeding unit is not stored in a storage unit, detects and stores the size of the sheet during conveyance. The printing apparatus controls the execution of the print processing, without using size information in a case where a print instruction is received in a state where the size information is not stored, and using the size information in a case where the print instruction is received in a state where the size information is stored. Furthermore, the printing apparatus clears the size information stored in the storage unit when a particular key is operated in a state where the size information is stored while print processing is not being executed.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: December 6, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Oya
  • Patent number: 9488465
    Abstract: The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: November 8, 2016
    Assignee: ASML Netherlands B.V
    Inventors: Laurent Khuat Duy, Martinus Cornelis Reijnen, Lukasz Jerzy Macht, Erik Johan Koop
  • Patent number: 9470986
    Abstract: A method for determining overlay error includes measuring asymmetry of radiation reflected from each of a plurality of targets on a substrate. The plurality of targets include a predetermined overlay offset. The method also includes comparing the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. Additionally, the method includes determining the overlay error of a point on the substrate as a function of measured asymmetry reflected from the point. The function is determined by fitting a polynomial or a Fourier series to a comparison of the measured asymmetry of the radiation reflected from each of the plurality of targets to the corresponding predetermined overlay offset of the respective target. The function limits an effect of linearity error.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: October 18, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Andreas Fuchs, Maurits Van Der Schaar, Scott Anderson Middlebrooks, Panagiotis Pieter Bintevinos
  • Patent number: 9442396
    Abstract: An exposure apparatus is equipped with a coarse movement stage which can move along an XY plane and includes a first section and a second section that can come close to and separate from each other, a fine movement stage which holds wafer W and is supported relatively movable at least within the XY plane by the coarse movement stage, and a drive system which drives the fine movement stage supported by the coarse movement stage independently or integrally with the coarse movement stage. Further, the exposure apparatus is equipped with a relay stage which can deliver the fine movement stage to/from the coarse movement stage.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: September 13, 2016
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9372412
    Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: June 21, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz
  • Patent number: 9372413
    Abstract: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: June 21, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Gosse Charles De Vries, Jan Bernard Plechelmus Van Schoot, Franciscus Johannes Joseph Janssen, Nicolaas Aldegonda Jan Maria Van Aerle
  • Patent number: 9341960
    Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.
    Type: Grant
    Filed: November 14, 2012
    Date of Patent: May 17, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Arno Jan Bleeker
  • Patent number: 9329490
    Abstract: According to one embodiment, a pattern formation method includes preparing a mask pattern for interference, producing Talbot interference, and forming a pattern by blocking a part of interference light. The mask pattern for interference is arranged periodically a plurality of light transmissive portions. The Talbot interference is based on a transmitted light. The transmitted light is transmitted through the light transmissive portions by applying a light to the mask pattern for interference. The part of interference light is produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to an exposure object member.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: May 3, 2016
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takashi Sato, Ryoichi Inanami, Shinichi Ito, Satoshi Tanaka
  • Patent number: 9298108
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: March 29, 2016
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 9217916
    Abstract: A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values.
    Type: Grant
    Filed: August 7, 2012
    Date of Patent: December 22, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Paul Christiaan Hinnen, Marcus Adrianus Van De Kerkhof, Reiner Maria Jungblut, Koenraad Remi André Maria Schreel
  • Patent number: RE47271
    Abstract: Certain embodiments provide an imprint recipe creating device comprising first to fifth creation units. The first creation unit creates inside-standard-shot information by use of filling amount information and residual film thickness information. The second creation unit creates first inside-substrate-surface information by use of shot position information, edge information, and the inside-standard-shot information. The third creation unit creates first correction information by use of unevenness information indicating unevenness in a substrate and unevenness distribution information indicating variations in depth of the unevenness inside the substrate surface. The fourth creation unit creates second correction information by use of post-process information indicating the variations in processing size. The fifth creation unit synthesizes the first inside-substrate-surface information, the first correction information and the second correction information, to create second inside-substrate-surface information.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: March 5, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Shinji Mikami, Ryoichi Inanami