Abstract: A method of real time dynamic CD control in a system for patterning resist coated wafers. The method includes lithographically patterning the resist coated wafers using predetermined exposure dose and focus settings. The method further includes obtaining CD metrology data from test areas on the patterned wafers, where different groups of test areas are selected for two or more of the patterned wafers. A CD metrology data map is constructed using the CD metrology data, adjusted exposure dose and/or focus settings are established using the CD metrology data, and additional wafers are then patterned.

Abstract: The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radiation is comprised of N successive current impulses whose surface energy is measured. In particular, each laser emits a quantum of energy having a given duration at each outset. The surface energy of the radiation received by the object in the course of the last N?1 pulses is thus added up for an nth iteration of an iterative method. The photosensitive object is displaced from a distance equal to a fraction 1/N of the width of the irradiation window according to the axis of said translation. The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method.

Abstract: An exposure apparatus for performing exposure of an object to light. A measuring device measures a wavelength spectrum of the light. A processor calculates a center wavelength of light based on the measured wavelength spectrum, and a main controller determines whether the exposure is to be performed, based on the calculated center wavelength of the light. The wavelength spectrum includes a first spectral component and a second spectral component, and the processor calculates the center wavelength of the light ?0 in accordance with: ?0=?0-1+??×(??—A/(??—A+??—B)), and ??_A:??_B=Energy-2:Energy-1, where ?0-1 is a center wavelength of the first spectral component, ?0-2 (?0-2>?0-1) is a center wavelength of the second spectral component, Energy-1 is a peak light intensity of the first spectral component, Energy-2 is a peak light intensity of the second spectral component, and ??=?0-2??0-1.

Abstract: According to test data supplied from a test data memory (80), a test pattern is formed on a substrate (F) and its line width is measured. Light source units (28a to 28j) are adjusted by a light source control unit (89) and the line width change amount between exposure heads (24a to 24j) is corrected so as to set the obtained light quantity. In a mask data setting unit (86), mask data is set so as to control a particular micro mirror of DMD constituting the exposure heads (24a to 24j) to OFF state. By using the mask data, the output data is corrected and a desired image is exposed/recorded on a substrate (F).

Abstract: An exposure apparatus configured to expose a substrate via a reticle includes a light source emitting light, a measuring device performing measurement of a wavelength spectrum of the light emitted from the light source, and a controller. The controller calculates a central wavelength of the light emitted from the light source based on the wavelength spectrum measured by the measuring device, calculates a difference between the calculated central wavelength and a central wavelength set to the light source for the measurement, and updates the central wavelength to be set to the light source based on the calculated difference.

Abstract: A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.

Abstract: A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.

Abstract: A light-amount control apparatus for controlling an output light amount of light sources used for optical writing is disclosed. The apparatus includes one or more drive units for supplying a drive current to the light source; one or more drive-current setting units for determining an amount of the drive current provided to the light source from the drive unit; a light-amount detecting unit for detecting an output light from the light source; and outputting a voltage according to the detected light amount; and a processing unit for setting the drive current amount based on the detected value detected with the light-amount detecting unit.

Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

Abstract: A method of monitoring a light integrator of a photolithography system, wherein the photolithography system comprises a light source for illuminating different fields of a photosensitive layer and a light integrator for measuring the actual exposure doses of the illuminated fields, comprises the step of illuminating different fields of the photosensitive layer in succession. In each illumination step the actual exposure dose is measured by means of the light integrator, the actual exposure time (actualTime) is controlled so that the actual exposure dose to which a field of the photosensitive layer is exposed corresponds to a desired exposure dose, and the actual exposure time (actualTime) is fed to a monitoring system for in-line monitoring the light integrator during illumination of the fields.

Abstract: An image forming apparatus includes an image bearing member; charging means for charging a surface of the image bearing member; image exposure means for exposing the surface of the image bearing member charged by the charging means to light to form an electrostatic image on the surface of the image bearing member; switching means for switching a light emission level of the image exposure means in accordance with the set point of a light emission amount setting the light emission level of the image exposure means; storing means for storing light emission amount set points set corresponding to different target light emission levels of the image exposure means; light emission amount control means for controlling the light emission level of the image exposure means on the basis of information stored in the storing means; an input portion for inputting information relating to an actual light emission level of the image exposure means corresponding to a predetermined light emission amount set point; and correcting

Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Abstract: A lithographic apparatus having a controller that sets at least one lithographic apparatus parameter such that the difference between the critical dimension of pattern features formed on the substrate in regions of relatively high and relatively low pattern feature density is minimized for an area on the substrate on which a patterned beam of radiation is to be projected and which re-sets the at least one lithographic apparatus parameter during a time period between the times of projection of the patterned radiation beam onto two areas of the substrate.

Abstract: A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured to generate a radiation beam. The beam conditioning device is configured to stabilize a position, a direction, a size, or a divergence of the radiation beam to produce a conditioned beam. The second oscillator configured to amplify the conditioned beam to produce an amplified beam.

Abstract: An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).

Abstract: A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

Abstract: An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution of an incident illumination beam of radiation, wherein the array of individually controllable reflective elements is provided on a curved support structure, or the array of individually controllable reflective elements is arranged to serve as a curved reflective surface.

Abstract: A method for generating a mask for use with a light measurement system that includes a light source for projecting light onto an object, and an imaging sensor for receiving light reflected from the object. The method includes determining a profile of the object to be inspected, and generating an electronic mask based on the determined object profile. The electronic mask has an electronic opening having a profile defined to substantially match the determined object profile as viewed from one of the light source and the imaging sensor.

Abstract: An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source part that includes a generating mechanism for generating a plasma, a condenser mirror for condensing a light radiated from the plasma, and a vacuum chamber for accommodating the generating mechanism and the condenser mirror, and has an opening that is provided at a position approximately corresponding to a position of a condensing point of the light condensed by the condenser mirror, an illumination optical system for illuminating the mask using the light from the light source part, a detector for detecting the light from the condensing point at an emission side of the condensing point, and an evaluation part for evaluating a life of the light source part based on a detected result by the detector.

Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

Abstract: An image forming apparatus is capable of controlling an exposure in accordance with sensitivity variations of a photosensitive body. An actual exposure position (Pr) sometimes precedes an exposure position (Pc) recognized based on the count value (C). In this case, the correction value (Dc) of the exposure position (Pc) recognized based on the count value (C) is calculated by linear interpolation using reference correction values (D0?Dn) corresponding to the position until the home position (HP) of a photosensitive drum is detected. When the home position (HP) is detected, the correction value (Dc(Pc0)) of an exposure position (Pc) recognized after detecting the home position (HP) is so calculated as to make the difference between the correction value of the exposure position and that of a previous exposure position (Pn?) fall within a preset range (?).

Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

Abstract: A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.

Abstract: A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

Abstract: A combined alignment and overlay target to be applied to a substrate to enable measurement of the alignment of the substrate with respect to its surroundings, and measurement of the relative alignment of a series of layers on the substrate, is disclosed. In an embodiment, the target comprises an array of structures substantially equidistant apart except for a portion of the structures that are offset by a specific amount in a first direction, and a second portion of the structures that are offset by the same amount in the opposite direction. This target on the substrate may be used to measure its alignment and the same target applied to a second layer, superposed on a first layer, may be used to measure overlay.

Abstract: A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.

Abstract: A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer standard detector may transmit intensity and dose data to a computer, which analyzes the data. Based on the analyzed data, the lithography tool may be calibrated.

Abstract: A radiation sensor includes a radiation receiver positioned in a focal plane of the final element of the projection system; a transmissive plate supporting the radiation receiver at a side facing the projection system; a quantum conversion layer to absorb light at the first wavelength incident on the transmissive plate and reradiate light at a second wavelength; a fiber optics block with a plurality of optical fibers; and a radiation detector. In the radiation sensor, the plurality of optical fibers guide light is reradiated by the quantum conversion layer towards the radiation detector. The radiation sensor can be used as a substrate-level sensor in a lithographic apparatus.

Abstract: An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.

Abstract: A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.

Abstract: A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.

Abstract: A radiation distribution measurement system for measuring a phase distribution of a beam of radiation and/or a pupil distribution of a projection system includes a transparent carrier plate, a grating and/or a pinhole configured at a first side of the transparent carrier plate, and a camera at an opposite side of the transparent carrier plate. The measurement system also includes a radiation filter between the transparent carrier plate and the camera, with a transmissivity that is lowest at the center of the filter and gradually and concentrically increases towards the outside of the filter. By placing the filter with its specific transmissivity, the difference in intensity across the wave front sensor 10 (i.e. the gradient in intensity) is compensated.

Abstract: In an apparatus for performing an edge exposure process on an edge portion of a photoresist film that is formed on a semiconductor wafer, light provided from a light source is formed to have a ring shape corresponding to a shape of an edge portion of the wafer by an optical unit. The ring-shaped light is irradiated onto the edge portion of the wafer through a ring lens. Thus, the light efficiency is improved. Further, since there is no need to rotate the wafer, a side surface profile of the photoresist film is improved.

Abstract: An exposure apparatus for performing an exposure of expose an object to light is disclosed. The apparatus comprises a measuring device configured to measure a wavelength spectrum of the light, a processor configured to calculate a central wavelength of the light based on the measured spectrum, and a main controller. The processor obtains a central wavelength of each of a plurality of components of the measured spectrum and a light intensity corresponding to each of the plurality of components, and calculates the central wavelength of the light based on the obtained central wavelengths and the obtained light intensities. The main controller determines whether the exposure is to be performed, based on the calculated central wavelength of the light.

Abstract: A lithographic apparatus having a radiation beam inspection device including a barrier to the beam of radiation, the barrier having an aperture through which a portion of the beam of radiation passes; and a radiation sensor that determines the intensity of the radiation passing through the aperture and the position, relative to the aperture, of the point at which the radiation is incident on the radiation sensor.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam. The illumination system includes a pulsed source of radiation and a controller to control an output of the pulsed source of radiation. The controller includes a dose sensor to measure a dose of a pulse of the source of radiation. The dose sensor includes a dose sensor output to provide a dose signal representative of the measured dose. An integrator unit is connected to the dose sensor output. The integrator unit integrates the dose signal at least twice, an output of the integrator unit provides an integrator output signal including the at least twice integrated dose signal. The output of the integrator unit drives a driving input of the source of radiation with the integrator output signal.

Abstract: An ultraviolet light source (1) comprises a laser light source (10) for generating a signal light in the infrared region, a optical amplifier (20) which comprises fiber optical amplifiers (21, 22) and amplifies the signal light generated by the laser light source (10), and a wavelength converting optical system (30) which coverts the signal light amplified by the light amplifier (20) into an ultraviolet light and outputs the converted light. The ultraviolet light source (1) uses a single-mode fiber laser (26) as an excitation light source for at least the fiber optical amplifier (22) at one stage of the optical amplifier (20).

Abstract: Exposure device for writing mixed data onto a photosensitive support comprising: a light source (10), supplying an exposure light; a first two-dimension pixel matrix modulator (50), and a neutral optical filter means (12) having at least two different optical densities, the modulator and the filter being arranged in series on an optical path of the exposure light coming from the source (10). Application to motion picture cameras.

Abstract: A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.

Abstract: A light source unit supplies the light radiated from the plasma, and includes a stabilizer for reducing a fluctuation of a position of the light radiated from the plasma.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto a substrate includes an illumination optical system configured to illuminate the reticle on a target plane to be illuminated using light from a light source, wherein the illumination optical system includes a computer-generated hologram configured to discretely form plural bright spots on a plane that has a Fourier transformation relationship with the target plane when the light that has no angular distribution is incident upon the computer-generated hologram, and an optical element configured to introduce the light that has an angular distribution to the computer-generated hologram.

Abstract: A light irradiation apparatus includes a light modulation element that modulates a phase of incident light to emit the modulated light therefrom, and an image forming optical system that is arranged between the light modulation element and an irradiation target plane, and forms an image of the emitted light to irradiate the irradiation target plane with the light having a predetermined light intensity. The light modulation element has in a unit region a plurality of area ratio changing structures including a first area ratio changing structure and a second area ratio changing structure. The first area ratio changing structure has at least one first phase modulation region in which an area share ratio varies in a first direction. The second area ratio changing structure has at least one second phase modulation region in which an area share ratio varies in a second direction different from the first direction.

Abstract: A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system. The apparatus includes a sensor unit which includes a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light receiving element is arranged, a sealing window which transmits the incident light and seals the vessel, and a driving mechanism which aligns the substrate. A space between the sealing window and the light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling the driving mechanism.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

Abstract: An exposing device including means which has a plurality of pixels and modulates, per pixel, an optical beam irradiated from a light source, for exposing a plotted image on an exposure surface by modulating, per pixel, the plurality of pixels of the modulating means based on image data, the multi beam exposing device comprising: beam position detecting means for detecting exposure point positional information pertaining to an optical beam irradiated on the exposure surface from predetermined pixels to be measured of the modulating means; and positional deviation calculating means for calculating a relative positional deviation between positional information pertaining to the pixels to be measured of the modulating means and exposure point positional information pertaining to each of the optical beams projected at the exposure surface from each of the pixels to be measured detected by the use of the beam position detecting means, based on the two positional informations.

Abstract: An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of a substrate includes a loading unit loading the substrate, and an edge exposure unit exposing the edge of the substrate loaded by the loading unit using each of a long side exposure unit and a short side exposure unit. Therefore, since the edge of the substrate is exposed using each of the long side exposure unit and the short side exposure unit, it is possible to reduce the edge exposure time period, thereby improving productivity. In addition, since no rotation of the substrate is required, it is possible to reduce the size of the apparatus. Moreover, since the apparatus is provided in an in-line type, it is possible to easily draw the substrate using a conveyer.

Abstract: A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as a light beam having a first light intensity distribution. An optical system is arranged between the optical modulation element and an predetermined plane. The optical system divides the phase-modulated light beam into at least two light fluxes having second and third light intensity distributions and different optical characteristics from each other, and projects a light beam including the divided two light fluxes, the light intensity distributions of the projected light fluxes being combined with each other, so that the projected light beam has a fourth light intensity distribution with an inverse peak shape on the predetermined plane and enters the predetermined plane.

Abstract: An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.

Abstract: A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.