Abstract: An image forming apparatus includes a rotatable photosensitive member, a charging member, an exposure unit, a developing member, a transfer member, and a pre-exposure unit. The pre-exposure unit exposes a surface of the photosensitive member after the toner image is transferred to the recording material and before being charged by the charging member. The pre-exposure unit includes a substrate disposed adjacent to one end of the photosensitive member with respect to a longitudinal direction of the photosensitive member, and in which a first light emitting element and a second light emitting element having directional characteristics narrower than that of the first light emitting element are mounted.

Abstract: A lens apparatus includes a first optical system, and a second optical system disposed in parallel with the first optical system. Each of the first optical system and the second optical system includes, in order from an object side to an image side, a first optical axis, a second optical axis, and a third optical axis. When each of the first optical system and the second optical system rotates around an axis parallel to the third optical axis, a distance between first optical axes of the first optical system and the second optical system changes greater than a distance between third optical axes.

Abstract: Method for roll-to-roll imprinting of components, in which method an imprint resist material layer (5) is applied on a substrate material layer (1) before imprinting the resist layer with a roll mold (3), wherein the imprint resist material (5) is applied on the substrate material layer (1) so, that the imprint resist material layer extends over the side edges of the substrate material layer and on the opposite side of the substrate material layer in relation to the imprinting surface of the substrate material layer in the cross-section of the substrate material layer together with the applied imprint resist material layer.

Abstract: Apparatus and method for using a line laser (LL) to quickly mark a substrate or media by utilizing a laser additive on/within the substrate/media, which greatly reduces the power requirement for marking the substrate/media. The combination of the LL wide swath (>305 mm) and the improved media/surface sensitivity to laser wavelength allows the LL marking system to achieve faster marking than other systems. The LL is mounted over a transport which transports the sensitized substrate/media past the LL for marking. The desired image is projected from the LL line by line in synch with the moving media and once the media passes the beam path of the LL, marking is complete. In this case, the media has been physically-altered via the heat generated by the LL interacting with the photosensitized media and is permanent. A second method would use a photosensitizing agent coated on top of the media to be marked.

Abstract: To uniformize the light intensity distribution on an irradiated surface in a light source device including a light-emitting diode (LED) array, a light source device includes a light-emitting diode (LED) array including a circuit having a substrate, a plurality of LED chips on the substrate, and a power supply. A predetermined plane is illuminated with light from the LED array. The plurality of LED chips includes first LED chips and second LED chips different from the first LED chips placed in a same column of the circuit, and the first LED chips have a placement angle different from a placement angle of the second LED chips.

Abstract: A method, a system and an archive server for determining an illumination setting for capturing an image of a component, belonging to a specific package type, in a pick-and-place machine are provided. The method comprises capturing a first image of a first component of the specific package type while the first component is illuminated by a first illumination component, and capturing a second image of the first component while the first component is illuminated by a second illumination component, the second illumination component being different from the first illumination component. An illumination setting may then be determined by creating a plurality of generated images based on the first and second image of the first component, and selecting the generated image that fulfils a predetermined quality measure.

Abstract: An optical device includes a plurality of light sources each configured to emit light having a different wavelength, and a lens mirror array in which a plurality of optical elements is arrayed, each of the plurality of optical elements including an incident surface through which the light emitted from each light source enters the optical element, a first reflection surface from which the light incident on the incident surface is reflected, a second reflection surface from which the light reflected by the first reflection surface is further reflected, and an emission surface through which the light reflected by the second reflection surface exits the optical element. The plurality of light sources is arranged such that a light source that emits light having a shorter wavelength is disposed farther from the second reflection surface.

Abstract: Channel systems adapted to diffuse light are disclosed. The channels include a bottom and a pair of sidewalls. The interior surfaces of the sidewalls are free from inward projections or ridges that would prevent light from linear lighting installed in the channel from reaching the cover. In some cases, the sidewalls may bend inwardly to capture and engage the cover. In various embodiments, the cover may be a diffuser, a lens, or a prism. In some cases, the bottom of the channel may be sloped or angled to direct the light from linear lighting installed on it.

Abstract: An optical element for uniformly dispersing light from a plurality of linearly aligned LEDs includes a body made of a transparent polymeric material, in which the body has a longitudinally extending center portion having a transverse cross-sectional profile that is uniform along the length of the optical element, and legs extending away from opposite sides of the center portion and extending downwardly to define a recess. The center portion has a top surface and a bottom surface that together define a longitudinally extending lens portion that collects light from the LEDs and refracts the light to produce a desired beam pattern. Uniformly and closely spaced apart transverse grooves can be provided on the top surface of the longitudinally extending lens portion to uniformly spread light on an illuminated surface and eliminate the appearance of dark and light areas on the lens portion when it is illuminated by the LEDs.

Abstract: This invention relates to a beam steering mechanism with ultrahigh frequency response and high sensitivity, which is based on the translation of two mirrors. Beam steering is achieved by the translations of two mirrors in the X axial mirror group and Y axial mirror group. The two translation mirrors are located at the output ends of two PZT actuators, and are directly actuated by the two PZT actuators. The dynamic characteristics of the two translation mirrors are always exactly the same as the output characteristics of the PZT actuators. There is no mechanical translation loss in this beam steering mechanism, and so, the beam steering mechanism has an ultrahigh frequency response and high angular deflection sensitivity.

Abstract: An injection module assembly (IMA) that moves along a predetermined path to inject gas onto a substrate and discharge excess gas is described. The IMA may be used for processing a substrate that is difficult to move for various reasons such as a large size and weight of the substrate. The IMA is connected to one or more sets of jointed arms with structures to provide one or more paths for injecting the gas or discharging the excess gas. The IMA is moved by a first driving mechanism (e.g., linear motor) and the jointed arms are separately operated by a second driving mechanism (e.g., pulleys and cables) to reduce force or torque caused by the weight of the jointed arms. The movement of the first driving mechanism and the second driving mechanism is synchronized to move the IMA and the jointed arms.

Abstract: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.

Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.

Abstract: A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device.

Abstract: Provided herein are a method and apparatus for the formation of conductive films on a substrate using precise sintering of a conductive film and thermal management of the substrate during sintering. In particular, a method may include depositing a conductive metal-based ink on a translucent or transparent substrate, positioning a mask between the deposited conductive metal-based ink and a light source, exposing the mask and the underlying deposited conductive metal-based ink to the light source, sintering the conductive metal-based ink exposed to the light source, and cleaning the non-sintered conductive metal-based ink from the translucent or transparent substrate. The mask may be configured to shield at least a portion of the conductive metal-based ink from the light source. The portion of the conductive metal-based ink shielded from the light source may remain non-sintered in response to the sintering of the conductive metal-based ink exposed to the light source.

Abstract: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device can selectively expose the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. The optical device or a substrate carrier securing the substrate can modify the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern.

Abstract: A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.

Abstract: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A). Further, the first beam (32A) is spaced apart from the second beam (32B) at the mask pattern (12A). As provided herein, the first beam (32A) directed at the mask (12) creates a first pattern beam (34A) that is transferred to a first substrate location (33A), and the second beam (32B) directed at the mask (12) creates a second pattern beam (34B) that is transferred to a second substrate location (33B). Moreover, the first substrate location (33A) is spaced apart from the second substrate location (33B). With this design, the first pattern beam (34A) can be transferred to the first substrate (14A) and the second pattern beam (34B) can be simultaneously transferred to the second substrate (14B).

Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device is disposed between the radiation-sensitive material and the at least one radiation source. The smart glass device includes at least one switchable layer selectively operable from an active state to an inactive state. The smart glass device is configured to expose the radiation-sensitive material to a desired exposure pattern when in one of the active state and the inactive state. A method for fabricating the radiation-cured structure is also provided.

Abstract: An image reading apparatus for reading an image of a document optically by illuminating a document with light emitted from a plurality of light emitting elements arranged linearly and by reading light reflected from the document. The image reading apparatus has a first light emitting element for emitting light in a first direction, a second light emitting element for emitting light in a second direction and one substrate for supporting the first light emitting element and the second light emitting element thereon.

Abstract: To provide an illumination device in which a point light source and a reflective member based on a light weight, cheap resin material is used, the illumination device has high precision and is strong to environmental variations when in a state assembled as a unit and is easily moldable as a part, a plurality of point light sources (111) is arrayed, a first reflective member (112b, 112c, 112d) is disposed along an outgoing direction of light of the point light sources, a second reflective member (112e) is disposed in a surface opposed to a light emitting surface of the point light source in an orthogonal direction, the point light sources are moved integrally with a part or a whole of the first and the second reflective member, the illumination device irradiates an irradiation surface by light from the point light sources, rib shaped bodies (112a) are disposed in a light passageway side of the first reflective member, the rib shaped bodies includes a reflective surface and is situated at a position of an appro

Abstract: An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group.

Abstract: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.

Abstract: A lithographic arrangement allows for controlling radiation characteristics. An illumination system provides a beam of radiation from radiation provided by a radiation source. The radiation source includes an array of individually controllable elements, each individually controllable element being capable of emitting radiation. A support structure supports a patterning device. The patterning device imparts the radiation beam with a pattern. A projection system projects the patterned radiation beam onto a target portion of a substrate held by a substrate table. A radiation peak intensity detection apparatus detects a peak in the intensity of an emission spectrum of one or more of the individually controllable elements of the radiation source.

Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: The technology disclosed relates to improved acousto-optic deflectors (AODs). In particular, it relates to compensation for subtle effects not previously addressed by AOD designers. A shifting center of gravity is described and addressed using advanced power equalisation strategies. Denser writing brushes are provided by using a two-dimensional array of beams with corrections for factors such as angle of incidence at the AOD interface.

Abstract: A scanning exposure apparatus has plural projection optical systems having plural mirrors configured to form an optical-axis shift vector. Its component in a direction orthogonal to a scanning direction is set so that adjacent areas in plural areas on the original can adjoin each other when viewed from the direction orthogonal to the scanning direction and adjacent areas in plural areas on the substrate can adjoin each other when viewed from the direction. A size of its component in the scanning direction is set so that a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two projection optical systems in the plurality of projection optical systems can be equal to a distance between centers of two areas on the substrate corresponding to the two projection optical systems in the scanning direction.

Abstract: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.

Abstract: An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light beams. The combining optical system combines the light beams emitted from the rod integrators, so that the light beams are adjacent to each other in cross-sections thereof. The light transmission unit has an entrance plane and an exit plane, divides the light beam combined by the combining optical system into plural light beams on the entrance plane, joins the divided light beams so that a cross-sectional shape of a joined pattern of the light beams on the exit plane is different from a cross-sectional shape of a joined pattern of the light beams on the entrance plane, and transfers each of the light beams from the entrance plane to the exit plane using plural optically coupled light pipes.

Abstract: A photolithography system based on a solid-state light source having LEDs is provided. Solid-state photolithography using the solid state light source can achieve high quality patterns over a wide range of length scales at a fraction of the cost of contact mask aligners. 2D nanoscale and 1D microscale patterns can easily be created over a 60 cm2 substrate surface area.

Abstract: The present invention provides an illumination optical system which illuminates a surface to be illuminated with light from a light source, the illumination optical system including a plurality of illumination systems configured to form predetermined illumination regions with the light from the light source, an optical system having reflecting surfaces, which are configured to reflect the light beams from the illumination systems, respectively for the plurality of illumination systems, and a light-shielding unit configured to shield a certain light component in a composite illumination region formed by the light from the optical system to shape a shape of the composite illumination region, wherein one continuous composite illumination region is formed on the surface to be illuminated by connecting the respective illumination regions by reflecting the light beams from the plurality of illumination systems by the reflecting surfaces.

Abstract: The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and a multi-beam module operable to provide multiple radiation beams for writing the wafer; an interface operable to transfer wafers between each of the writing chambers and a track unit for processing an imaging layer to the wafers; and a data path operable to provide a set of circuit pattern data to each of the multiple radiation beams in each of the writing chambers.

Abstract: A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure, the patterning structure being configured to impart the beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; wherein at least part of the lithographic apparatus, in use, includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation.

Abstract: A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.

Abstract: A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the light emitting diode and to the exchange and control the light emitting diodes.

Abstract: A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described.

Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device is disposed between the radiation-sensitive material and the at least one radiation source. The smart glass device includes at least one switchable layer selectively operable from an active state to an inactive state. The smart glass device is configured to expose the radiation-sensitive material to a desired exposure pattern when in one of the active state and the inactive state. A method for fabricating the radiation-cured structure is also provided.

Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.

Abstract: A lithographic apparatus is disclosed that has a plurality of control circuits, each control circuit arranged to be connected to an associated radiation source of a plurality of radiation sources configured to generate pulses of radiation for projection onto a substrate and each control circuit arranged to control the energy of radiation pulses generated by that associated radiation source.

Abstract: An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of a substrate includes a loading unit loading the substrate, and an edge exposure unit exposing the edge of the substrate loaded by the loading unit using each of a long side exposure unit and a short side exposure unit. Therefore, since the edge of the substrate is exposed using each of the long side exposure unit and the short side exposure unit, it is possible to reduce the edge exposure time period, thereby improving productivity. In addition, since no rotation of the substrate is required, it is possible to reduce the size of the apparatus. Moreover, since the apparatus is provided in an in-line type, it is possible to easily draw the substrate using a conveyer.

Abstract: The invention pertains to a method and apparatus for exposing a cylindrical print sleeve. The method and apparatus can accommodate exposing various cylindrical print sleeves having different sleeve lengths and/or diameters. The apparatus includes a sleeve support for supporting the cylindrical print sleeve at one end, a plurality of light tubes supported in a longitudinal orientation, and a means for positioning the light tubes along one of a plurality of concentric rails to form a substantially circular wall of light tubes about the print sleeve.

Abstract: An exposure method which includes illuminating a first object formed with a pattern to be transferred with a first light beam to expose a second object with the first light beam through the first object and a projection optical system; and irradiating the first object and at least one portion of the projection optical system with a second light beam having a wavelength range that is different from that of the first light beam to correct image forming characteristics of the projection optical system.

Abstract: A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the emitted actinic light from the solid state light sources through one or more compound parabolic concentrators, and forms a field conjugate to an objective lens by directing the concentrated actinic light from each compound parabolic concentrator through one or more lens elements in a lens array. Emission of one or more of the solid state light sources is adjusted to obtain a predetermined illumination pupil envelope function.

Abstract: Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern having an undefined area, directing a second beam to the semiconductor wafer surface to define a circuit structure in the undefined area to complete the circuit pattern on the semiconductor wafer surface, and directing the second beam onto a source of real-time configurable imaging. Embodiments may also include a mask to include an undefined area incorporated into the circuit pattern to leave a critical structure of the circuit pattern undefined. Several embodiments include a photolithography system including an exposure tool, a mask, a source of real-time configurable imaging, and addressing circuitry.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

Abstract: A system for detecting reflectance from an image bearing surface in a printer or electronic copier includes an illuminator array, positioned adjacent to the image bearing surface, comprising a plurality of discrete illuminator elements that are spaced in a linear arrangement; a lens array comprising a plurality of collimator lenses positioned between the illuminator array and the image bearing surface, the collimator lenses being positioned with respect to the illuminator array to receive light beams emitted by the illuminator elements and to collimate the light beams for transmission to the image bearing surface at an incidence angle; a linear sensor array comprising a plurality of sensors and positioned adjacent to the image bearing surface such that, of the light beams reflecting off the image bearing surface, specular portions and diffuse portions reflecting at a reflectance angle are received by the sensors.

Abstract: A process and related apparatus for generating an output radiation through an output aperture, including generating pulsed radiations by a plurality of radiation sources, each source being arranged for respectively (i) generating within a respective plasma a respective pulsed elementary radiation whose wavelengths include a respective desired range, and (ii) directing rays of its respective elementary radiation on the output aperture. For each source, refractive indices of rays are distributed in a respective control region through which its respective elementary radiation passes and located in its respective plasma, to selectively deviate rays of its respective elementary radiation as a function of their wavelength, and temporally multiplexing the radiation sources to obtain at the output aperture the output radiation.

Abstract: A lithographic apparatus includes a support constructed to support a patterning device for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. The patterning device includes one or more alignment patterns, the lithographic apparatus including a secondary illumination system effective to illuminate each alignment pattern with radiation separate from said radiation beam, the projection system projecting an image of each alignment pattern onto the substrate table. The substrate table includes a number of sensor arrangements, each sensitive to the projected image of one of said alignment patterns.