Abstract: An exposure system of a semiconductor wafer and a method for operating the same capable of preventing defects in a photolithographic process. The exposure system of a semiconductor wafer comprises first and second shutters for opening or closing a light source, first and second sensing circuits for sensing the positions of the first and second shutters to generate first and second sensed signals, a controller for determining whether the first and second shutters are completely opened in response to the first and second sensed signals and for generating a control signal when the first and second shutters are not completely opened.

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: An inexpensive and highly productive exposure device for directly scanning and exposing a photosensitive material sensitive to at least a UV region, based on digital data. As a motor controller moves an exposure head at a fixed speed in Y direction, image data is read one line of image data, each GLV element of a light modulator array is switched on/off by the read image data, and laser light from a high power light source of the exposure head is switched on/off. A UV-sensitive object to be exposed is exposed in X direction in a number of pixel units that substantially corresponds to the number of the GLV elements. The image data is scanned and exposed by one line in Y direction (main-scan). The motor controller moves a flat stage by one step in X direction (sub-scan). The object to be exposed is imagewise-exposed by repeating such scans.

Abstract: An apparatus for providing uniform high efficiency illumination in a projection display system comprising two lamp sources each having a different geometric aligning means. By combining a first light source having an annular cross-sectioned beam and a second light source having a circular cross-sectioned beam sized to be identical to said annulus, a light beam is created that provides more light and greater beam uniformity than has heretofore been available using low cost components. The annular beam is produced by a first lamp apparatus having a rear spherical reflector and a front parabolic reflector oriented along an optical axis. The circular beam is produced by a second lamp apparatus having a front spherical reflector and a rear parabolic reflector and having an orientation orthogonal to said optical axis.

Abstract: An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.

Abstract: A system for performing digital lithography onto a subject is provided. The system includes a noncoherent light source for producing a first light and an optical diffraction element for individually focusing the first light into a plurality of second lights. The system also includes a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights. A lens system may then direct the digital pattern to the subject, thereby enabling the lithography.

Abstract: An exposure apparatus includes an illumination system for illuminating, with pulse light, a reticle having a pattern formed thereon, a reticle stage for scanning the reticle, a projection system for projecting the pattern onto a wafer, a wafer stage for scanning the wafer, an interface into which information related to the reticle is inputted and a controller for changing illumination conditions on the basis of the information inputted to the interface. The reticle is illuminated with the pulse light while the reticle and the wafer are scanned, by which the pattern of the reticle is transferred to the wafer sequentially.

Abstract: Systems, devices and methods are provided for viewing a pattern of fluorophors capable of fluorescing when exposed to visible light, e.g., fluorescently stained DNA, protein or other biological material. The system includes a light source emitting light in the visible spectrum, such as a fluorescent lamp used in domestic lighting, a first optical filter capable of transmitting light from the source at wavelengths capable of exciting the fluorophors and of absorbing light of other wavelengths, and a second optical filter capable of blocking substantially all the light from the source not blocked by the first filter, so that the only light reaching the viewer is light produced by fluorescence of the fluorophors.

Abstract: An exposure apparatus comprises mask support portions, which support photo masks each having an exposure pattern thereon for movement between an exposure position in which the masks are in contact with a to-be-exposed object and a separate position in which the masks are kept off the object. Exposure light sources are used to expose the to-be-exposed object through the photo masks that are located in the exposure position. A clean air supplier runs clean air from a first supply portion into regions between the to-be-exposed object and the photo masks to prevent penetration of foreign substances when the photo masks are moved to the separate position. When the photo masks are moved to the exposure position, the supplier feeds clean air from a second supply portion onto the respective outer surfaces of the photo masks, thereby cooling the photo masks.

Abstract: A light box comprises two halogen 500 watt lamps supplied with DC rectified power, a scanning window made of 3 sheets, a thermoswitch, a fan and an intensity control circuit. The light box is adapted to be used with a reflective-type scanner. When a reflective-type scanner is mounted on the scanning window of the light box, the apparatus is able to scan X-ray transparencies and to produce an image which physicians can use to perform radio-diagnosis.

Abstract: There is disclosed an image-forming method, which comprises: subjecting a color light-sensitive material to exposure, by using, at least, a first, second, and third light-emitting element whose peak wavelength of the light-emission spectrum is in a first wavelength region of 380 to 500 nm, a second wavelength region of 500 to 600 nm, and a third wavelength region of 600 to 740 nm, respectively, and subjecting the exposed color light-sensitive material to development processing, wherein the color light-sensitive material has, at least, spectral sensitivities in the from first to third wavelength regions. There is also disclosed organic light-emitting elements for use as light sources for exposure in the method. According to the method, digital color images exhibiting good color reproduction can be obtained by exposing a light-sensitive material according to image information and carrying out development processing.

Abstract: A digital data management and order delivery system is provided. The system includes a storage device for storing digital data and a searching engine for developing a subset of the digital data stored in the storage device in response to inputs received from a first user. The system is also provided with a job order developer responsive to inputs received from the first user for developing a job order which includes: a) at least one copy of the digital data contained in the subset and identified by the first user; and b) a file containing information developed by the first user outside the system. In addition, the system includes a router for electronically routing the job order compiled by the job order developer to a second user specified by the first user.

Abstract: An image input apparatus for picking up an image of an object includes an original table (4) having an object placing surface, a camera head (2), a post (3) which supports the camera head (2) to be located above the original table (4) and can be raised/lowered and is arranged at the corner of the original table (4), illumination devices (5,6) for illuminating an object (50) which are folded and stored in side surface portions (4b) of the original table (4), and a transmission illumination device (13) which is illuminated by the illumination devices (5,6).

Abstract: An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical system for projecting an image of the pattern onto a predetermined exposure region on a substrate, and which synchronously scans the mask and the substrate during the projection. The apparatus includes a measuring device for detecting intensities of the light pulses radiated onto the substrate during the scanning and measuring an integrated light quantity on each of a plurality of partial regions in the exposure region on the substrate on the basis of a detection signal of the intensities, wherein the partial regions are defined by a scanning speed of the photosensitive substrate and an oscillation interval of the light pulses.

Abstract: In a document processing array, an imaging/illumination arrangement for illuminating and imaging the documents at one or several imaging-sites as they are rapidly transported there-past, each site having, as its illumination source, a hollow Lambertian integrating cylinder housing lamps which project essentially all their light onto the inner cylinder walls to be reflected/diffused thereby in Lambertian fashion and sent to the imaging site(s).

Abstract: An embodiment of the instant invention is an optical illumination system for illuminating the mask of an exposure apparatus for transferring the image of the pattern on the mask onto the semiconductor wafer, the optical illumination system comprising: illumination means (illumination means 45 of FIG. 3) comprised of a plurality of light sources for emitting light beams along beam paths; and a lens system (lenses 55 and 57 of FIG. 3) for focusing the light beams to the wafer, the lens system comprising at least one lens element positioned in the beams paths. Preferably, the light sources are individually addressable point like sources, and the optical illumination system further comprising a light control means for operating each of the light sources independently of the others.

Abstract: A method of measuring an illuminance distribution on a substrate; which is characterized in that the method comprises a step of reciprocatively moving a detecting sensor positioned on a substrate stage along a route during which the detecting sensor is intermittently stopped at a plurality of locations within an exposure region over the substrate, and, after reaching a turning location, moved to return along the route during which the detecting sensor is intermittently stopped again at these locations; in that measurement of illuminance is performed an even number of times at each location; and in that the illuminance distribution in the exposure region over the substrate is determined based not only on a measured value of illuminance obtained at each location during the forward movement of the detecting sensor but also on a measured value of illuminance obtained at each location during the returning movement of the detecting sensor.

Abstract: An exposure apparatus includes a light source for providing pulse light, a mask scanner for scanning a mask having a pattern, a wafer scanner for projecting a wafer onto which the pattern is to be projected and a light emission period determining device. The mask scanner and the wafer scanner scan the mask and the wafer in a timed relation so that the mask is illuminated while superposing portions of an illumination region defined by the pulse light and being narrower than the pattern such that the pattern is lithographically transferred onto the wafer. The light emission period determining device determines a period of emission of the pulse light, prior to an actual exposure process, wherein the emission period can be changed in accordance with a required precision of an integrated exposure amount.

Abstract: Regardless of a relative installation position error between a light source and a photosensitive material, or of a deviation from a properly preset value of rotation speed of a photosensitive material, images are obtained with minimum loss of image quality and excellent reproducibility. The number m of light-emitting elements to make up a unit and the distance between adjacent pixels formed on the photosensitive surface are adjusted such that the width of the pixel groups is ⅓ mm or less, which is a period that the periodic image noise is not recognized as stripes.

Abstract: This invention is directed to a method of processing at least one digital image of at least one photographic image and distributing at least one visual print produced from the at least one digital image. The method includes the steps of storing at least one digital image of at least one photographic image on at least one image server at a first location. Selective authorized access to the at least one digital image of the at least one photographic image from a second location is then facilitated. Orders are received for at least one visual print of the at least one photographic image from the second location. Based upon the orders at least one visual image is produced from the stored digital image at the first location in response to the at least one order.

Abstract: A plurality of LED chips is turned on at theoretical arrangement pitches. The distance between a theoretical imaging point of one LED chip located farthest from an optical axis and the optical axis, and the distance between an actual imaging point and the optical axis are obtained. With the increasing ratio of the distances being set as a reference, the positions where the LED chips are arranged are shifted in a direction opposite to that of the displacement caused by distortion aberration. The further the LED chip is located from the optical axis, the larger the amount of displacement thereof becomes. Further, the nearer the LED chips is located to the optical axis, the smaller the amount of displacement thereof becomes. As a result, the LED chips are arranged on a substrate in such a configuration that compensation for the distortion aberration produced on the photosensitive material can be achieved.

Abstract: In a method and apparatus wherein components and/or markings applied to substrates are illuminated with illumination devices and imaged via a camera, adequate contrast between useful and unwanted structures is achieved even in the case of highly disparate optical properties of different materials for the substrates, components and markings by the use of an illumination device composed of a number of illumination units that respectively emit light in spectral ranges different from one another and which are thereby separately varied in intensity. This illumination with variable spectral distribution assures an adequate contrast even given the employment of different materials for the illuminated items.

Abstract: A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.

Abstract: An apparatus for exposing photosensitive materials includes a plurality of light sources for generating beams having different wavelengths, a polygon mirror for scanning and exposing the beams toward a color photosensitive material, and one or more f .theta. lenses disposed on an optical path between the photosensitive material and the polygon mirror. The polygon mirror and the f .theta. lenses are arranged, with respect to the beam from a light source having an intermediate wavelength among the light sources, such that reflection points corresponding to both ends of beam scanning on reflection surfaces of the polygon mirror pass through an identical point on an optical axis of the f .theta. lenses, and light beams at the both ends of beam scanning have line symmetry with respect to the optical axis of the f .theta. lenses.

Abstract: A diffraction grating is set between a light source and a fly-eye lens composed of a plurality of lens elements rectangular in cross section, and using the zeroth order diffraction beam and .+-.first order diffraction beams emergent from the diffraction grating, a plurality of light source images are formed along the longitudinal direction on the exit plane of each lens element in the fly-eye lens.

Abstract: A photographic camera system includes a photographic camera that can successively expose a photographic film in different frame sizes and an automatic printer for automatically printing the processed photographic film exposed with those different frame sizes. The camera varies the width of an exposure opening in the camera body in the film-feed direction and the film is fed a length corresponding to the width of the exposure opening. The photographic camera records an exposure opening position signal indicative of the size of the exposure opening on the photographic film, and the automatic printer automatically prints the photographic film using the exposure opening position signal detected from the photographic film.

Abstract: Apparatus and methods for suppressing degradations in the transmissivity and refractive index of lenses used in an exposure unit of a projection-exposure apparatus in which a high-energy pulsed beam of light (such as an excimer laser) is used for the projection exposure. Pulsed-light beams from multiple pulsed-light sources are provided, the pulsed-light beams each having the same wavelength, pulse frequency P.sub.0, and fluence F.sub.0 but being phase-shifted relative to each other. The pulsed-light beams are each split by a beam splitter and integrated to produce at least one integrated light beam having a pulse frequency of P.sub.0 times the number of pulsed-light beams that are integrated but a fluence per pulse of F.sub.0 divided by the number of pulsed-light beams that are integrated. The integrated light beam is passed through the exposure unit. Multiple such integrated light beams can be produced, each propagating to a separate exposure unit.

Abstract: An index printer in which density correction can be reliably effected and in which an appropriate image can be printed is obtained. When a standard image data such as a so-called Bull's eye is input from an image memory to a gray image processing portion of a sub-control portion, data which is greater than a predetermined threshold value Q is extracted from the standard image data and is averaged so as to set a standard gray image. The set standard gray image is displayed on a whole surface of a display surface of a liquid crystal panel via a liquid crystal panel driver, and is printed onto a photographic printing paper by a light source.

Abstract: An image printer includes a negative-film projection exposure unit capable of projecting and exposing image information of a negative film on to a photosensitive material adapted for negative films and a positive-film exposure unit capable of exposing image information of a positive film on to the photosensitive material adapted for negative films.

Abstract: A diffraction grating is set between a light source and a fly-eye lens composed of a plurality of lens elements rectangular in cross section, and using the zeroth order diffraction beam and .+-.first order diffraction beams emergent from the diffraction grating, a plurality of light source images are formed along the longitudinal direction on the exit plane of each lens element in the fly-eye lens.

Abstract: A video presenter for radiating light toward an object, such as a film negative or transparency, includes an illuminating unit detachably installed within a pallet supporting the object for photographing. To obtain a superior-quality image by uniformly passing light through the object, a recessed portion is formed in the pallet and the illuminating unit is detachably inserted therein. The detachable nature of the illuminating portion permits it to be used apart from the video presenter for other purposes. Further, the illuminating unit may include a diffusion panel for diffusing light emitted by plural light sources; the diffused light being directed upwardly to illuminate the object.

Abstract: Respective light-emitting elements are caused to emit light at the maximum rated outputs and densities of three colors developed by a photosensitive material are made substantially uniform. The maximum rated outputs at light-emitting central wavelengths, of the three-color light-emitting elements are respectively 2.4 mW, 0.04 mW and 1.2 mW. The ratio between the outputs is represented as R:G:B=60:1:30. On the other hand, the ratio between spectral sensitivities of the most-frequently used photosensitive material is represented as R:G:B=1:30:2. An exposure-value ratio on the photosensitive material, which is synthetically obtained from these, reaches R:G:B=2:1:2. Thus, the numerical ratio among the light-emitting elements, for making exposure values uniform becomes R:G:B=1:2:1. The numbers of the respective light-emitting elements are defined so as to reach the least numbers from the numerical ratio (i.e., one R-light-emitting element, two G-light-emitting elements and one B-light-emitting element).

Abstract: An illumination device for illuminating a surface to be illuminated, includes a light source and an irradiation optical system for mixedly projecting light beams from the light source to the surface, wherein the irradiation optical system has a first focal point with respect to a first plane, which is disposed at a position out of the surface.

Abstract: An exposure device includes: at least three light-emitting elements for respectively emitting light of mutually different colors and forming a slit beam; an optical shutter array in which a plurality of optical shutter elements for allowing the slit beam incident thereupon to be transmitted therethrough or shut off as the optical shutter elements are opened or closed, and being provided in a number corresponding to the number of pixels constituting a row of pixels in a scanning line of the photosensitive material along a direction corresponding to the cross-sectionally longitudinal direction of the slit beam; and a control member for controlling the light-emitting elements and the optical shutter array such that an amount of exposure applied to a predetermined pixel on the photosensitive material becomes substantially equal to an amount of exposure of a corresponding pixel of color image data.

Abstract: An image forming device and method. A first scanning device is provided under a transparent glass plate. An image of a paper original loaded on the transparent glass plate is scanned and exposed onto a photosensitive material at an exposure section by the first scanning device. A second scanning device formed from a light source unit, a scan table at which a film original is set, a zoom lens and a lens is provided next to the first scanning device. Further, a mirror, a lens and line sensor are disposed in that order below the scan table. Densities of an image of the film original are read by the line sensor for each pixel and for each color. After exposure conditions are determined based on the densities obtained by the line sensor, the image of the film original is scanned and exposed onto the photosensitive material by the second scanning device.

Abstract: A scan type exposure apparatus has a mask stage for mounting a mask formed with an exposure pattern in a pattern area; a substrate stage for mounting a rectangular photosensitive substrate; a driving unit for moving the mask stage and the substrate stage in synchronism parallel to one side of the rectangular photosensitive substrate; illumination optical systems for illuminating partial areas of the mask with light beams; and projection optical systems for projecting images of the illuminated areas of the mask onto the photosensitive substrate. The projection optical system projects the light beams passing through the exposure pattern area of the illuminated mask on a central area, excluding peripheral areas, of an exposure area of the photosensitive substrate and projects the light beams passing through an area other than the exposure pattern area of the illuminated mask on the peripheral areas.

Abstract: Mini-studio equipment allows a person who does not have highly developed photography techniques to take pictures of consistent quality in a shortened period of time, and makes it possible to easily move the studio, thereby widening the area of use. The mini-studio equipment includes an upper box, a middle box, and a lower box. An upper light source is attached to an upper wall of the upper box, and a light diffusion plate is provided as a bottom wall of the upper box so as to diffuse light emitted by the upper light source. The middle box has an upper opening which is covered by the light diffusion plate of the upper box. A photography stage is provided as a bottom wall of the middle box so as to diffuse light from the lower side thereof. The photography stage has a curved portion and a backdrop portion covering a side wall of the middle box. A camera installing window is provided at a central portion of another side wall which is opposed to the side wall covered by the backdrop portion.

Abstract: A photographic printer has an exposure station, in which a frame of a photographic film and color photographic paper are set. A light source is disposed in opposition to the color paper with reference to the photographic film set in the exposure station, and constituted by LED elements. The LED elements are disposed in a matrix for emitting light of red, green and blue colors. The light source illuminates the frame from behind. The color paper is exposed by the light transmitted through the frame, to print the frame recorded on the photographic film to the color paper. In a preferred embodiment, a drive signal is determined individually for driving respective the LED elements. The drive signal is applied to the respective LED elements.

Abstract: An automatic photography apparatus has an object illuminating mechanism that has a high illumination mode and a low illumination mode. A switching control system is provided so that when the apparatus is used to photograph white background documents the illuminating mechanism is in the low illumination mode during the exposure setting periods; during the shutter-open period the illuminating mechanism is in the high illumination mode, so as to achieve sufficient exposure to capture the white background. The switching control system can be actuated to allow the camera to photograph documents and scenes having non-white backgrounds; in such situations the object illuminating mechanism is in the high illumination mode during the exposure lock-in stage and during the shutter-open stage.

Abstract: The illuminance of illumination light from an exposure light source is switched over in a plurality of steps in an open loop control, whereby, when a plurality of shot areas on one substrate to be exposed to light are exposed to the light with various integrated exposure quantities, the exposure quantity with respect to each shot area is correctly controlled. Pulse illumination light from an excimer laser light source is attenuated by a rough energy adjuster and a fine energy adjuster and then illuminates a reticle, while the reticle and a wafer are scanned with respect to a projection optical system, such that a pattern of the reticle is successively transferred to individual shot areas on the wafer. When the extinction ratio of the rough energy adjuster is switched over in an open loop control, the illuminance on the image surface is measured by an illuminance fluctuation sensor so as to adjust, based on the result of this measurement, the illuminance on the image surface.

Abstract: An image recording apparatus is designed to decrease the size of an exposure unit, thereby allowing the exposure unit to move within a narrow space between an original document and a photosensitive material, to facilitate color adjustment and density adjustment, to provide a high resolution at low costs, and to prevent light fogging. The exposure unit is moved between a stage and a document table which hold a photosensitive material and an original document, respectively, so as to copy the image of the original document onto the photosensitive material by scanning exposure. An LED light source comprises three groups of light emitting elements which respectively emit blue, green and red colors, and a light beam from the LED light source is irradiated such that the light beam extends in a direction parallel to the original document and perpendicular to the direction of movement of the exposure unit (the forward and backward direction of the stage).

Abstract: The invention is directed to an illuminating arrangement for an optical system such as a microlithographic projection exposure apparatus and includes a glass rod 5 for light integration. The reticle masking unit (REMA) 51 is mounted at the exit face of the glass rod 5.

Abstract: A flow camera apparatus (10) operable for photographing large original documents in continuous, moving fashion includes a camera (74) located within the housing (12). An aperture adjustment mechanism (86) allows adjustment of the camera aperture from the outside of the housing (12) without opening the housing (12). The iris adjustment mechanism also allows the aperture to be changed during photographing of a document. The apparatus includes lamps (214, 216 and 218) for illuminating the document during photographing and a "T" mask assembly 22 provided with baffles (204 and 208) for allowing only light reflected from the document to enter the image path (88) to the camera (74). The apparatus (10) also includes precisely balanced detectors (126) for detecting entry of a document into the apparatus (10).

Abstract: An LED-array light source comprises an LED-array and a light-transmitting member disposed thereon. The light-transmitting member has a pair of opposed major surface for receiving and emitting output light emitted from the LED-array. A plurality of a first reflectors are formed on a light emitting surface of the light-transmitting member so as to partially reflect the output light toward a light-receiving surface of the light-transmitting member. A second light reflector is provided on the light receiving surface of the light-transmitting member so as to rereflect the light reflected from the first reflector to the emitting surface and thereby guiding the output light from the LED-array to an intermediate area between adjacent LEDs. Thus, it is possible to obtain a uniform linear light source with small number of LEDs.

Abstract: An illumination device for illuminating an object to be observed, by a machine vision camera or the like for example, with a continuous diffuse wide angle light which is supplied along the observation axis of the machine vision camera. The diffuser is mounted parallel to the observation axis but recessed within the housing, i.e. either completely shielded by the beam splitter or spaced from an adjacent edge of a viewing aperture a sufficient distance so as to prevent any ray of light from the diffuser from directly illuminating any point of interest on the surface of the object to be observed. The recessing of the diffuser prevents direct illumination by the diffuser and provides improved uniform illumination of the object to be observed.

Abstract: In a method of printing an original image on a photographic paper with an exposure device, the exposure device has an reference exposure light, an image corresponding to the original image is formed on a mask sheet and the photographic paper is printed by exposure lights passing through the mask sheet under the reference exposure light, wherein image signals from the original image are processed so as to satisfy the condition that the mask sheet is used under the reference exposure light.

Abstract: A copying apparatus for the photographic reproduction of a multi-dimensional object capable of photocopying an original and a three-dimensional object, wherein one of an original and a three-dimensional object is disposed on a platen glass, and an illuminating device is disposed so as to be separated from a surface of the platen glass by a predetermined distance in a substantially vertical direction. The illuminating device is also disposed such that the one of the original and the three-dimensional object is positioned between the illuminating device and the platen glass, illuminates a light field to the one of the original and the three-dimensional object. As a result, even if the one of the original and the three-dimensional object is copied onto a photosensitive material, recording can be effected such that quality of a recorded image is maintained and a background image of a copied one of the original and the three-dimensional object is set by the illuminating device.

Abstract: An illumination device for illuminating an object to be observed, by a machine vision camera of the like for example, with a continuous diffuse wide angle light which is supplied both along the viewing axis of the machine vision camera and off axis. The diffuser of the present invention is tilted with respect to the observation axis so that the diffuser is not viewable by the object to be observed. This provides better uniformity of the light which illuminates the object. A second diffuser may be utilized to provide illumination of the object with light of reduced intensity.

Abstract: A microlithographic projection imager has an illuminator system that is adjustable for the uniformity of spatial intensity of the illumination delivered to the wafer plane. This uniformity adjustment can compensate for factors tending to deviate the illumination from uniformity. The uniformity adjusting member is preferably refractive and axially movable next to a pupil of the illuminator.

Abstract: A light source having a solid state laser emitting a beam that is separated into a number of segments. Each segment is frequency shifted by a different amount so that the segments do not substantially overlap in the frequency domain. Each segment passes through a short focal length lens element of a fly's eye array to be dispersed onto a mask plane for evenly illuminating a mask. The lens elements of the fly's eye array are contained within a small region in comparison to the width of the dispersed beam segments, such that each beam segment contributes illumination to the entirety of a common portion of the mask.