Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract: Immersion lithography system and method using direction-controlling fluid inlets are described. According to one embodiment of the present disclosure, an immersion lithography apparatus includes a lens assembly having an imaging lens disposed therein and a wafer stage configured to retain a wafer beneath the lens assembly. The apparatus also includes a plurality of direction-controlling fluid inlets disposed adjacent to the lens assembly, each direction-controlling fluid inlet in the plurality of direction-controlling fluid inlets being configured to direct a flow of fluid beneath the lens assembly and being independently controllable with respect to the other fluid inlets in the plurality of direction-controlling fluid inlets.

Abstract: An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.

Abstract: Drive-control of a movable body along a two-dimensional plane includes a process in which on switching from servo control of position in directions of three degrees of freedom of the movable body within a plane parallel to the two-dimensional plane using a first detection device to servo control using an encoder system, a detection device that detects positional information of the movable body in a direction perpendicular to the two-dimensional plane and tilt direction around at least one axis with respect to the two-dimensional plane switches from a second detection device when the movable body is in a suspended state, to a third detection device that has a plurality of detection positions placed in at least a part of an operating area of the movable body, and detects positional information in the perpendicular direction when the movable body is positioned at any of the detection positions.

Abstract: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Abstract: An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.

Abstract: A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The interferometer irradiates a reflection surface arranged on the stage with a measurement light close to a measurement light of the encoder, and receives its reflected light. In this case, the encoder and the interferometer commonly use an optical member fixed to the stage. Accordingly, the Y interferometer and the Y encoder have substantially the equal measurement axis.

Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table constructed and arranged to hold a substrate. The substrate table includes a substrate support plate that is in thermal contact with a thermal conditioning plate. The apparatus further includes a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate.

Abstract: An exposure apparatus which projects a pattern of an original onto a substrate via a liquid to expose the substrate, includes a substrate stage which holds the substrate and moves, the substrate stage including a peripheral member arranged to surround a region in which the substrate is arranged, the peripheral member having a holding surface which holds the liquid, wherein a trench which traps the liquid is formed in the peripheral member, and the trench is arranged to surround the region in which the substrate is arranged, and includes a bottom portion, an inner-side surface extending from the holding surface toward the bottom portion, and an outer-side surface, the inner-side surface having a slant which increases stepwise or continuously in a direction away from the holding surface, and the outer-side surface is provided with a spattering preventing portion which prevents spattering of the liquid trapped by the trench.

Abstract: An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.

Abstract: Provided is a positioning apparatus including a holder configured to hold an original or a substrate and to be movable, and an interferometer for measuring a position of the holder, and positioning the holder based on an output from the interferometer. The positioning apparatus comprises a reference member provided with the holder and including a reference plane; and a plurality of measuring devices respectively configured to face the reference plane, and to respectively measure positions of a plurality of measurement points on the reference plane in a measurement direction intersecting the reference plane.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract: A stage apparatus includes: a moving stage, which moves along a movement plane; a first moving table, which holds a specimen while being able to move with respect to the moving stage; and a second moving table, which is provided on the moving stage and, when the first moving table has moved from a first position to a second position, is positioned at the first position.

Abstract: The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.

Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Abstract: A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.

Abstract: An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first region; a second movable member that is movable while holding the substrate independently from a first movable member, in a predetermined region including the first region and the second region; a first connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves one movable member in the first region; a second connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves the other movable member in the second region; and a third movable member that is provided on the first connection member and is movable to a position facing the optical member; and at leas

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

Abstract: A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.

Abstract: A drive unit drives a wafer table in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer table in the Y-axis direction and based on known correction information in accordance with position information of the wafer table in a non-measurement direction (e.g. Z, ?z and ?x directions) that is measured by an interferometer at the time of the measurement by the encoder. That is, the wafer table (a movable body) is driven in the Y-axis direction based on the measurement value of the encoder that has been corrected by correction information for correcting a measurement error of the encoder that is caused by a relative displacement of a head and a scale in the non-measurement direction.

Abstract: An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount.

Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

Abstract: A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one or more reference targets mounted on the other of the movable object and the other object, each reference target including a planar surface with a grid or grating to cooperate with the two or more one dimensional (1D) encoder heads, and a processor to calculate a position of the object on the basis of outputs of the two or more 1D encoder heads, wherein the measurement direction of each of the two or more 1D encoder heads is non-perpendicular to the planar surface of the respective reference target.

Abstract: An exposure apparatus includes a light emitting unit, a mask stage that holds a mask for forming a pattern on a workpiece and a moving stage that holds the workpiece and has a laser length measuring device. The apparatus further includes an XY? direction moving mechanism that moves the moving stage within a plane parallel to the workpiece face, and a Z direction moving mechanism that moves the moving stage in a vertical direction. The laser length measuring device measures a distance between the device and a reflection mirror using laser light. A control unit controls the XY? direction moving mechanism to move the moving stage based on the distance. The reflective mirror is fixed to a structural body that supports the mask stage.

Abstract: In a liquid crystal exposure apparatus, base pads are respectively placed on two surface plates, and one step board is supported by the base pads. A device main body of an empty-weight cancelling device moves from above one of the surface plates to above the other by moving on the step board, and therefore, a boundary section between the two adjacent surface plates that are separately placed does not function as a guide surface used when the empty-weight cancelling device moves. Accordingly, a fine movement stage that holds a substrate can be guided along an XY plane with high accuracy although the two surface plates are placed apart.

Abstract: A fluid gauge (222) for measuring the position of a work piece (200) includes a gauge body (236), a fluid source assembly (238), and a gauge control system (240). The gauge body (236) includes a measurement conduit (246), a first reference conduit (248A), a second reference conduit (248B), a first reference surface (250A) that is spaced apart a first reference gap (242A) from an outlet (254) of the first reference conduit (248A), and a second reference surface (250B) that is spaced apart a second reference gap (242B) from an outlet (254) of the second reference conduit (248B). The gauge body (236) is positioned so that an outlet (254) of the measurement conduit (246) is spaced apart a measurement gap (244) from the work piece (200). Further, the fluid source assembly (238) directs a fluid (260) into the conduits (246), (248A), (248B).

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: Two X encoder heads (X heads) and one Y head are mounted on one wafer stage, and an X scale and a Y scale corresponding to these heads are arranged on a surface facing the wafer stage so that the scales connect the exposure area and the alignment area. The wafer stage is made to move back and forth between the exposure area and the alignment area along a path where the X scale and the Y scale are set, while performing position measurement using three encoder heads. In this case, a switching process between XZ interferometer will not be necessary.

Abstract: A detection device that detects a mark provided on the back side of an object, the detection device includes a first detection unit configured to detect the mark from a surface side of the object; a second detection unit configured to detect a surface position of the object; and a processing unit. The processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.

Abstract: An apparatus and method for lithography patterning is disclosed. An exemplary method includes receiving a first mask. The method further includes receiving a defect map, the defect map identifying a defect region of a defect of the first mask. The method further includes preparing processing data, the processing data including pattern data of a semiconductor device and data associated with the defect region. The method further includes processing the first mask according to the processing data thereby forming a first portion of a pattern of the semiconductor device on the first mask, the first portion of the pattern excluding the defect region.

Abstract: A digital stereo imaging photosensitive device for a grating and a photosensitive material, includes: a photosensitive platform (8), connected with a base via a platform moving mechanism; a compressing mechanism (7) mounted on the photosensitive platform, wherein a grating (5) is positioned on the compressing mechanism; a LCD displayer (2) suspending above the photosensitive platform; and a lens suspending above the photosensitive platform via a lens moving mechanism, wherein the lens is under the LCD displayer. And a method for digital stereo projection is also provided.

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.

Abstract: A substrate holder includes a base; a first holding portion which is formed on the base and which attracts and holds a substrate; and a second holding portion which is formed on the base and which attracts and holds a plate member in the vicinity of the substrate attracted and held by the first holding portion. In an exposure apparatus including such a substrate holder, the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.

Abstract: A photosensing device for digital stereo spliced picture projection imaging comprises a base (16), a front (43) and a back (25) wall plates located on the base (16), an light sensing platform (24) located slidably on the base (16), an exposure head (1) located above the front (43) and the back (25) wall plates, a longitudinal moving mechanism for moving the exposure head (1), a lateral moving mechanism for connecting the longitudinal moving mechanism with the front (43) and the back (25) wall plates, a pushing equipment located on the light sensing platform (24), a paper feeder located on a side of the light sensing platform (24), and a paper discharging mechanism located on the other side of the light sensing platform (24). The invention improves the resolution and the quality of the digital stereo image effectively. The device has an advantage of automatic process operation.

Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.

Abstract: The present invention provides an exposure apparatus including a stage control system configured to control a stage for holding a substrate in accordance with a command value, a specifying unit configured to specify an exposure start time at which exposure on the substrate starts upon detecting exposure light illuminated on the substrate, and a main control system configured to calculate positions of the stage at a plurality of times in an exposure period for the substrate based on position information of the stage at an exposure start time specified by the specifying unit, obtain an average position of the stage in at least a partial period in the exposure period from the calculated positions of the stage at the plurality of times, and give a command value for matching the average position of the stage with a target position to the stage control system.

Abstract: A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.

Abstract: A device for mounting a grating and a photosensitive material for stereoprojection imaging, includes: an enlarging-printing platform; and an exposure head positioned above the enlarging-printing platform; wherein the enlarging-printing platform is a chamber structure, and has a plurality of suction holes provided on an upper surface thereof and at least one exhaust port provided on a side connected with an exhaust device; the device for mounting the grating and the photosensitive material for stereoprojection imaging further includes a compressing mechanism connected with the upper surface. The device for mounting the grating and the photosensitive material provides a real-time composite device for developing stereopictures. With the mounting device, the grating and photosensitive photographic paper need either being combined beforehand, or being developed with the grating after exposure.

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

Abstract: There is herein described a method and apparatus for positioning a phototool. More particularly, there is described a method and apparatus for accurately positioning a phototool capable of photoimaging a substrate (e.g. a web) covered with a wet curable photopolymer wherein the phototool creates an imaged substrate which is used to form images suitable for forming electrical circuits such as for printed circuit boards (PCBs), flat panel displays and flexible circuits.

Abstract: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber to hold liquid and having an open end adjacent to a volume in which fluid will be present. The open end removes, through a pressure differential across-the open end when liquid is present in the chamber, substantially only liquid from the volume when liquid in the volume is adjacent to the open end but not gas from the volume when gas in the volume is adjacent to the open end.

Abstract: A method of determining a defect in a grid plate of an encoder-type position measurement system, the method including providing an encoder-type position measurement system to measure a position of a movable object with respect to another object, the encoder-type position measurement system including a grid plate and an encoder head, measuring a quantity of light reflected on each of the two or more detectors, using a combined light intensity of the reflected light on the two or more detectors to determine a reflectivity signal representative for the reflectivity of the grid plate at the measurement location, and determining a presence of a defect at the measurement location on the basis of the reflectivity signal of the grid plate.

Abstract: A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.

Abstract: An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.

Abstract: 3D printing systems and methods avoid build-compromising misalignments through the use of a self-leveling assembly that maintains a constant and typically fully parallel orientation between a build platform and the bottom surface of a resin tank. As a result, contact between the floor of the resin tank and the build platform surface may be uniformly flat and even, and perpendicular to the z-axis motion of the deposition source.

Abstract: A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount detection unit that detects an amount regarding deformation of at least one of the base and the movable table, and a correction device that corrects the measured result of the position information measurement unit based on the detected result of the deformation amount detection unit.