Abstract: An air bearing sheet heater assembly is provided for heating a sheet in an ink imaging printer. It includes a heater plate that has a heating element and defines a first side of a sheet path through the heater assembly. It also includes at least one movable platelet that defines a second side of the sheet path, as well as, an air bearing assembly mounted to the at least one platelet. The air bearing assembly controllably creates an air bearing between the second side and the first side of the sheet path for moving and pneumatically spacing the front surface of the at least one movable platelet from the front side of the heater plate, thereby reducing stiction forces and friction along the sheet path through the air bearing sheet heater assembly.

Abstract: An apparatus according to the present invention includes a vacuum chamber (5) and processes a substrate (4) in the vacuum chamber (5). The apparatus includes pumps (8A, 8B; 9A, 9B) which exhaust the vacuum chamber (5), a first cryopump (7A) accommodated in the vacuum chamber (5), a second cryopump (7B) accommodated in the vacuum chamber (5), and a controller (15) which alternatively stops the first cryopump (7A) and the second cryopump (7B).

Abstract: Highly accurate lithography is performed by maintaining planarity without generating a suction mark on a sheet body. Since a counterbore for storing the head of a screw member for fixing a suction plate on a supporting table communicates with the atmosphere through a long hole and communicating path, inside of the counterbore is never under a negative pressure at the time of sucking the sheet body through a hole section of the suction plate, and the substrate can be held by suction on the suction plate by highly accurately maintaining planarity.

Abstract: The some aspects of the present invention provides a substrate holding apparatus that comprises: a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds a first space that is between the substrate, which is supported by the support part, and the base part; a second circumferential wall that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and surrounds the first circumferential wall; a third circumferential wall that: is formed on the base part; has a third upper sure that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall; a fluid flow port that

Abstract: A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle.

Abstract: A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal stabilizer, arranged in the peripheral part, configured to thermally stabilize a central part of the substrate support relative to the peripheral part.

Abstract: A sheet handling device for wide format sheets including a sheet support plate having a top surface containing suction holes which are connected to at least one suction chamber, the at least one suction chamber being divided into compartments that are connected, though an opening, to a suction device adapted to create a subatmospheric pressure in the compartments, wherein at least one internal wall between adjacent ones of the compartments defines a flow restriction orifice, and at least one of the compartments is directly connected to the suction device, and at least another one of the compartments is indirectly connected to the suction device through the orifice.

Abstract: A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

Abstract: A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

Abstract: The present method and system features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the support system includes a chuck having a plurality of piezo pins and reference pins, with the piezo pins being coupled to piezo actuators to undergo relative movement with respect to said reference pins. These and other embodiments are discussed more fully below.

Abstract: There are provided a wafer stage, an exposure apparatus having the same, and a wafer flatness correction method using the same. The wafer stage includes a chuck having first and second vacuum holes, a first vacuum pump applying a vacuum suction force to the first vacuum holes and a second vacuum pump applying a vacuum suction force to the second vacuum holes. Further, the exposure apparatus and the wafer flatness correction method using the same are disclosed.

Abstract: An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed below a top surface of the outer region and a bottom surface of the groove recessed below the top surface of the vacuum platen; one or more suction ports in the bottom surface of the groove; and a hollow toroidal inflatable and deflatable bladder positioned within the groove.

Abstract: A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substantially the same as in the medial portion.

Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

Abstract: A table configured to support a substrate has one or more projections which support the substrate. In an embodiment, the table also has a raised perimeter defining a space which is configured to be filled with a liquid. A pump is configured to remove liquid from the space via outlet passages to an optional inlet. The removal of liquid can create a pressure differential across the substrate which then clamps it in place. Liquid circulated to the inlet may be filtered by a filter to remove contaminants.

Abstract: A wafer support device having a fixed base, a guiding device, a movable base disposed so as to move in a vertical direction with respect to the fixed base by the guiding device, a first pressing device pressing the movable base, a ? stage rotatably disposed on the movable base with the vertical direction as a rotation axis, a linear motor, a contact bar, a load control device controlling a load of pressing, and a controller controlling a pressing force by the first pressing device based on the load. The first pressing device has a cylinder and a main pressurizing chamber and a sub-pressurizing chamber, a piston rod vertically moving in the main pressurizing chamber and the sub-pressurizing chamber, respectively, a main pressure controller controlling a pressure in the main pressurizing chamber, and a sub pressure controller controlling a pressure in the sub-pressurizing chamber.

Abstract: A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate.

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

Abstract: A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.

Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

Abstract: A photosensitive tabular member suction mechanism that can reliably suck with a simple configuration, on a stage, photosensitive tabular members of different sizes by effectively using the suction force resulting from negative pressure, and an image recording device disposed with this photosensitive tabular member suction mechanism. Cylinder members are attached inside the stage in correspondence to respective suction holes, and the piston members accommodated in the suction holes are urged upward by springs. In a state where a substrate is not placed on a placement surface of the stage, the piston members are in a closed position due to the urging force of the springs and block off the suction holes. When the substrate is placed on the placement surface, the piston members move to an open position counter to the urging force of the springs and the suction holes are opened, whereby the substrate is sucked by a suction force resulting from negative pressure.

Abstract: The present invention is directed to a method for modulating shapes of a substrate, having first and second opposed surfaces. This is achieved by creating a pressure differential between differing regions of the first opposed surface to attenuate structural distortions in the second opposed surface that results from external forces bearing on the substrate.

Abstract: In case that some trouble occurs in exhaust pump or in pipe, internal pressure of groove comes closer to atmospheric pressure owing to leak-in of air, because the groove adjoins groove opened to atmospheric air. However, the internal pressures of grooves are maintained at negative value. Thus, difference in pressure between the top and bottom surfaces of moving block is generated. Further, the gap between the moving block and the intermediate block decreases. Consequently, the deterioration in the degree of vacuum in the process chamber can be retarded. During retarded time, measures to protect an object to be processed, such as operation of tightly sealing the object can be taken. Further, in case that the system recovers, time required to operate turbo-molecular pump for sucking the inside of the process chamber is reduced to a short time. Therefore, the processing can be quickly resumed.

Abstract: There is provided an image forming apparatus that can suppress the formation of creases when forming images on both surfaces of a sheet and can greatly reduce the incidence of unprinted areas. The image forming apparatus has a sheet stacking section in which sheets are stacked, a sheet conveying section that conveys a sheet, an image forming section that forms an image on the sheet while the sheet is conveyed, a re-conveying section that again conveys the sheet with the image formed on a first surface thereof to the image forming section, and a sheet feeding section that feeds a sheet from the sheet stacking section or the re-conveying section to the image forming section.

Abstract: A media holddown device a plastics vacuum guide attached to a sheet metal vacuum beam, the guide includes vacuum chambers in communication with the beam through openings to control the negative pressures applied to media of varying widths by a fan. Dividing walls are provided between the chambers to maintain the value of the negative pressure larger than a predetermined value, especially for media with conventional widths. An intermediate wall divides the guide into front and rear chambers to increase the control of media leading edges. The number, size and pattern of arrangement of openings are selected to produce desired air flow characteristics.

Abstract: An alignable, low-profile substrate chuck for processing, one by one, a number of substrate panels, which may be larger than the chuck itself. The substrate chuck is adjustable in x, y and theta while on the movable platform of a stage, and comprises a nested set of rotatable or sliding brackets adjustable in x, y and theta a positionable vacuum diffuser plate mounted within a coplanar apron on the top bracket. The vacuum diffuser plate fits within a relief cut about the periphery of the apron, which, together with a pattern of islands with their tops coplanar to a ledge formed by the relief, provide location and both bottom and peripheral support for the high-flatness vacuum diffuser plate. The vacuum airflow passes through the vacuum diffuser plate, through the pattern around supporting islands and out through a central yaw shaft about which the yaw rotation centers.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: An anti-vibration apparatus includes a table, a pneumatic spring for applying a force to the table, an electromagnetic actuator for applying a force to the table, and a first generator which generates a driving signal for the electromagnetic actuator based on at least one of a target position and a target speed with respect to a movable object on the table.

Abstract: The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.

Abstract: An exposure apparatus for exposing a pattern of a mask onto a substrate. The apparatus includes an apparatus which includes a nonconductive holding section to hold the substrate and holds the substrate, and an electrostatic capacitance sensor which measures height-direction information of the substrate held by the apparatus which holds the substrate. The holding section includes a conductive member which is electronically grounded.

Abstract: A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.

Abstract: An automatic both sides exposing apparatus 1 is provided, and includes a first exposing mechanism 10 having a first mask and the second exposing mechanism 20 having a second mask; a carrying-in portion 2 and a carrying-out portion 30; an optical system for exposing the substrate; and a first holder A and a second holder B for holding the substrate and delivering the substrate from the first holder A to the second holder B with reversal of sides at a spot located in an interval between the first and second exposing mechanisms where both holders meet each other. Accordingly, a frequency at which the substrate is delivered is minimized, the substrate can be turned over without the reversing mechanism, the substrate can be transferred (and delivered) at good efficiency in limited space and exposed accurately, any inconvenient origin for the substrate may be minimized, and the apparatus is made compact.

Abstract: A wafer chuck may have an engagement surface having a curvature approximating a field curvature of an imaging system in which the wafer chuck is used. The wafer chuck may include an integrated vacuum system operative to secure a wafer to the engagement surface, consequently deforming the wafer to have a surface approximating the field curvature of the imaging system.

Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members.

Abstract: A lithographic projection apparatus includes a radiation system to supply a projection beam of radiation; a mask table provided with a mask holder to hold a mask; a substrate table provided with a substrate holder to hold a substrate; a projection system to image an irradiated portion of the mask onto a target portion of the substrate; and a preparatory station comprising an intermediate table on which a substrate can be positioned before transfer to the substrate table; the intermediate table including a major surface provided with a plurality of apertures, and gas bearing generator that generates a gas bearing between the major surface and a substrate located thereon.

Abstract: A photolithography method using near-field light includes a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmissivity of the exposure mask depending on the aperture density.

Abstract: An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a mechanism for setting an inert gas atmosphere in the chamber, and a closed vessel which surrounds the chamber. The purity of inert gas in the chamber is higher than a purity of inert gas in the closed vessel.

Abstract: Method and apparatus are disclosed for transferring organic material from a donor onto a substrate to form a layer of organic material on one or more OLED devices, by aligning first and second fixtures in a reduced pressure environment and positioning the substrate and donor in a chamber defined by the aligned first and second fixtures; increasing the pressure applied to the non-transfer surface of the donor so as to ensure the position of the donor relative to the substrate; moving a member provided on the first fixture from a closed to an open position which permits the transmission of radiation onto the non-transfer surface of the donor so that heat will be produced and organic material transferred from the donor to the substrate; and illuminating with radiation the donor through the open radiation-receiving position to cause the transfer of organic material to the substrate.

Abstract: Stage devices are disclosed that include gas-actuation and reaction-force-canceling mechanisms. In an embodiment, an X-axis moving guide extending in the X direction engages a lower stage via a gas bearing. Y-axis sliders (movable elements) are provided at both ends of the X-axis moving guide. A Y-axis fixed guide 8 engages each Y-axis slider via a gas bearing. Each Y-axis slider and respective fixed guide constitute a respective pneumatic actuator. Respective mounting members are provided near the ends of each fixed guide, with interposed gas bearings, and each fixed guide is slidably affixed to a base plate. An actuator for stroke correction is provided in association with each mounting member.

Abstract: A printing plate is held at one point thereof by a holding portion provided at a surface plate. When pushed by a pushing portion, the printing plate is only rotationally displaced. Thus, an angular error is substantially eliminated and displacement of the printing plate is small. Then, the pushing portion positions the printing plate in a direction perpendicular to a direction in which the surface plate can be moved. Then, movement of the surface plate positions the printing plate in the direction in which the surface plate can be moved.

Abstract: In a wafer chuck for flatly vacuum-chucking a semiconductor wafer (11) supported by support pins (15) such that a pressure in a suction chamber (13) surrounded by an external wall (12), the upper surface of the external wall (12) is formed to be lower than the upper surfaces of the support pins, and the upper surface of the external wall (12) does not pressure the semiconductor wafer (11), a distance (L1) between the external wall (12) and closest support pins (15a) is up to 1.8 mm, and an alignment pitch. (L2) of the support pins (15) aligned inside the closest support pins (15a) to the external wall (12) is not more than 1.5 times of the distance (L1) between the external wall (12) and the closest support pins (15a).

Abstract: A scanning exposure apparatus for exposing a substrate with a pattern formed on an original while scanning the original and the substrate. The apparatus includes a chuck for holding a substrate, a stage for moving the chuck to align the substrate, a mechanism for purging an exposure optical path near the stage with inert gas, the mechanism having a cover covering the exposure optical path between a substrate-side lower end of an optical system and a vicinity of the stage, and a supply port for supplying inert gas into the cover, and a top plate which is mounted on the stage and has a surface substantially flush with a surface of the substrate. The top plate is arranged to form a gap between the top plate and a side surface of the substrate, a depth of the gap is not less than a width of the gap, and a dimension from the side surface of the substrate to an outer edge of the top plate is larger than that of a substrate-side opening of the cover in a scanning direction.

Abstract: A board stage of an aligner that can avoid bending of a printed circuit board to be exposed and accomplish high accurate exposure. In one preferred mode a suction plate 2 having small holes 20 is mounted on a supporting body on which a space 30 bigger than the small holes is provided. The holes 20 are connected to the space 30 and to a vacuum device via an air passage 31 and a bottom passage 32. The diameter of the suction hole 20 is so less than 0.4 mm not to make at the printed circuit board such bending that causes exposure troubles.

Abstract: On an upper surface of a main body configuring a holder main body, a plurality of pins and a rim portion which upper end surface is set at almost the same height with a surface formed by the tip portions of the pins are provided. In addition, the main body has a honeycomb structure. Also, through holes formed in the honeycomb core are arranged corresponding to the arrangement of the plurality of pins. And, by a vacuum chucking mechanism, a wafer is vacuum chucked with respect to the tip portions of the plurality of pins and the upper end surface of the rim portion. In addition, among the plurality of pins arranged, the pins arranged closed to the rim portion are spaced more densely than the pins arranged elsewhere on the main body.

Abstract: The stage apparatus can improve static and dynamic features by reducing the number of electrical wiring or tubes for air pressure disposed in a movable main stage member of a movable stage apparatus. The movable stage apparatus has a base structure body and a movable stage structure body. When the movable stage structure body is transferred on the base structure body to a position in which to exchange wafers, a receiving terminal part disposed on the movable stage structure body comes into contact with a feed terminal part disposed on the base structure body and a battery loaded on the movable stage structure body is charged with electric current supplied from the feed terminal part. When the stage structure body is apart from the position in which to exchange wafers, adsorption of the wafer loaded on the stage structure body is sustained electrically by utilizing the electricity of the battery.

Abstract: An intermediate substrate holder for use in a lithographic projection apparatus, which holder can itself be held by a standard substrate holder in the lithographic projection apparatus and in turn can hold a non-standard substrate. The intermediate substrate holder includes at least one of a vacuum holder and a mechanical clamp. The vacuum holder includes a vacuum space on which the non-standard substrate is placed; a barrier around the edge of the vacuum space that closes off the vacuum space and that makes a sealing contact with the non-standard substrate; and a vacuum generator. The mechanical clamp may include two or more stationary positioning pins opposed by a slidable mechanism which is provided with at least one sliding positioning pin mounted thereon and which is biased to move the sliding positioning pin towards the stationary pins.

Abstract: A method for transferring organic material from a flexible donor element onto a substrate to form a layer of organic material in making one or more OLED devices, includes providing the flexible donor element and the substrate in a spaced relationship within a chamber under atmospheric pressure defined by a transfer station so that the flexible donor element partitions the chamber into first and second cavities; varying the pressure differential between the first and second cavities to cause the flexible donor element to move into a contact relationship with the substrate; providing a transparent window which defines the top surface of the second cavity; and providing radiation energy through the transparent window onto the flexible donor element in contact with the substrate to cause the flexible donor element to absorb heat and transfer organic material onto the substrate.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: A stage assembly (224) for moving and positioning a device (300) includes a device table (308), a device holder (312) that retains the device (300), and a holder connector assembly (338). The holder connector assembly (338) includes a first assembly (320) that supports the device holder (312) relative to the device table (308) along a first axis, and a second assembly (322) that supports the device holder (312) relative to the device table (308) along a second axis, the second axis being orthogonal to the first axis.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).