Abstract: A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween to include a reticle, and a layer of elastomer or gelatinous material disposed on at least one of the first surface and the second surface, wherein the layer of elastomer or gelatinous material is disposed between the base and the cover and contacts either the base or the cover.

Abstract: An internal discharge space is defined between an image reading section and an image forming section and the internal discharge space has an opening in a front of the image forming apparatus. Since the internal discharge space has the opening in the front of the image forming apparatus, a border between the internal discharge space and the housing is located in the front of the image forming apparatus. A light emitting section having a predetermined length along the border is provided and emits light along the predetermined length of the border, enabling users to check a light emission state from a distance. Accordingly, a state of the image forming apparatus can be indicated by the light emitting section.

Abstract: A reticle is pre-heated prior to an exposure operation of a semiconductor substrate lot to reduce substrate to substrate temperature variations of the reticle in the exposure operation. The reticle may be pre-heated while being stored in a reticle storage slot, while being transferred from the reticle storage slot to a reticle stage of an exposure tool, and/or in another location prior to being secured to the reticle stage for the exposure operation. In this way, the reduction in temperature variation of the reticle in the exposure operation provided by pre-heating the reticle may reduce overlay deltas and misalignment for the semiconductor substrates that are processed in the exposure operation. This increases overlay performance, increases yield of the exposure tool, and increases semiconductor device quality.

Abstract: A method for containing a reticle in a pod is provided. The method includes opening the pod such that a pressing element retained movably on the pod by a limiting cap moves to a first position, wherein a shoulder part of the pressing element between a pressure receiving part and a pressing part of the pressing element is spaced from the limiting cap. The method further includes placing the reticle in the pod such that the reticle is pressed by the pressing element.

Abstract: Components of the present image display apparatus, their mode of manufacture and assembly to display the image, include: (a) a ring component 1 comprising a vertical element 12 and a decorative face 13 element dimensioned so as, when assembled, to accommodate and retain in fixed but removable association with said ring component 1 both (i) a core component 17 and (ii) an image for display deployed on a support substrate, said core component 17 assembled on a first, outer aspect of the ring component 1 in relation to said vertical element 12, and said image for display deployed on a support substrate on a second, interior aspect of the ring component 1 in relation to said vertical element 12, to thereby present the image, including artwork, signage or the like, to the exterior of the apparatus for viewing; (b) a core component 17, which in some embodiments bears decoration on an exterior aspect thereof, said core component being dimensioned and shaped to receive and be retained by the ring component 1; and, op

Abstract: A method includes performing a cleaning operation on a supporting surface of a wafer table by using a cleaning scrubber having a plurality of microstructures, the plurality of microstructures being spaced apart from each other and having a tapered width; placing a semiconductor wafer on the supporting surface of the wafer table; and performing a photolithography process on the semiconductor wafer.

Abstract: A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

Abstract: An image reading apparatus includes a transparent document platen on which a document is to be placed, a reader configured to read an image of the document placed on the document platen, a controller configured to perform a reading mode to cause the reader to read a document tucked in a storage member, which has a transparent portion and can store the document, in a state in which the storage member in which the document is tucked is placed on the document platen so that the transparent portion contacts the document platen, and a display configured to display, in the reading mode, a screen indicating an orientation in which the storage member is to be placed on the document platen.

Abstract: A clamping appliance of a reticle inner pod comprises: two clamping seats and a power member. The two clamping seats face each other in a width direction. The power member adjusts a distance of the two clamping seats in the width direction. The two clamping seats each include a bottom wall, two side walls, a first step and a second step. The two side walls are respectively disposed at two ends of the bottom wall. The first step and the second step are sequentially arranged above the bottom wall along the width direction. The two clamping seats each further include two eaves, the two eaves are respectively perpendicularly connected to the two side walls, so that the eave, the side wall and the bottom wall are clamped to form a cladding space with three-sided cladding.

Abstract: A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus.

Abstract: A method and apparatus for measuring the width of a strip or the widths of multiple strips being conveyed longitudinally through a sensing region of a gauge. The apparatus includes a correction bar that has very highly accurately machined edges and includes a laser point displacement sensor that traverses across the sensing region of the gauge of the invention. The method of the invention uses the correction bar by sensing its edge distance positions and using the data for the sensed edge distance positions and data for its highly accurately known edge distance positions to generate corrections for all distance positions continuously across the entire sensing region. Corrections are then made to sensed edge distance positions of a strip or strips being sensed by the gauge, regardless of the positions of the strip edges.

Abstract: The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface having at least one first mark and at least one second mark. The first mark has a first reflectivity relative to a light source, and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity, and both are also different from that of the rest area of the bottom surface.

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

Abstract: A substrate table is provided. The substrate table includes a main body having a surface and a plurality of burls extending from the surface. The burls are configured to support a substrate on the main body. The substrate table further includes a number of vacuum channels provided in the burls to apply a vacuum to the substrate. The vacuum channels are distributed throughout the main body and arranged in a grid pattern.

Abstract: A semiconductor processing method includes operations. An exposure process is performed on a semiconductor workpiece and includes selecting a target state of a reticle based on given data and regulating the reticle to reach the target state. A development process is performed on the semiconductor workpiece.

Abstract: Embodiments of the present disclosure provide a device for adjusting a wafer, a reaction chamber, and a method for adjusting a wafer. The device for adjusting a wafer includes: a lifting module, the lifting module including a first carrier surface configured to carry a wafer, and the first carrier surface ascending to a preset highest position or descending to a preset lowest position relative to a reference surface; a carrier module, the carrier module including a second carrier surface, a position of the second carrier surface being higher than the preset lowest position and being lower than the preset highest position, and the second carrier surface being configured to receive and carry the wafer carried on the first carrier surface; and a suction module, the suction module including a first suction opening facing the wafer and surrounded by the second carrier surface.

Abstract: The instant disclosure discloses a workpiece container system comprising a storage assembly. The storage assembly comprises a seat member and a seat cover. The seat member defines a workpiece receiving region that encompasses a geometric center region thereof, configured to receive a workpiece; wherein a lower diffuse inducing component is provided on the seat member within a planar projection of the workpiece yet offsets the geometric center region. The seat cover is configured to engage the seat member at a periphery region around the workpiece receiving region thereof, so as to cooperatively form an enclosure for housing the workpiece; wherein an upper diffuse inducing component is provided on the seat cover over the planar projection of the workpiece and protectively overlaps the geometric center region of the seat member.

Abstract: The disclosed linear motor includes a stator having a plurality of cores and coils that excite the plurality of cores, respectively, and a movable element having a permanent magnet and configured to move using electromagnetic force applied from the stator as driving force, each of the plurality of cores has an excitation unit wound with the coil and an acting unit configured to be magnetically coupled to the excitation unit and cause a magnetic flux applied from the excitation unit to work on the permanent magnet of the movable element, and the linear motor includes an airgap or a heat conduction reduction portion between the excitation unit and the acting unit, and the heat conduction reduction portion reduces heat conduction from the excitation unit to the acting unit more than in a case where the excitation unit and the acting unit are in direct contact with each other.

Abstract: A transportation container is provided with a container body constructed of a top wall, a bottom wall, a rear wall, and two sidewalls forming a front opening for loading or unloading a reticle pod into or out of the container body; a lid for opening and closing the front opening; and a lift plate above the container body configured to connect to a carrier of an overhead hoist transfer (OHT) system.

Abstract: A reticle is pre-heated prior to an exposure operation of a semiconductor substrate lot to reduce substrate to substrate temperature variations of the reticle in the exposure operation. The reticle may be pre-heated while being stored in a reticle storage slot, while being transferred from the reticle storage slot to a reticle stage of an exposure tool, and/or in another location prior to being secured to the reticle stage for the exposure operation. In this way, the reduction in temperature variation of the reticle in the exposure operation provided by pre-heating the reticle may reduce overlay deltas and misalignment for the semiconductor substrates that are processed in the exposure operation. This increases overlay performance, increases yield of the exposure tool, and increases semiconductor device quality.

Abstract: A horizontally arranged six-degree-of-freedom constant-stiffness mechanism is provided, and includes an upper platform, a bottom plate, three composite spherical hinges, spherical hinges, support rods, guide rail slider assemblies, and six electromagnetic adjustable stiffness units. Two ends of a shaft on which a permanent magnet is fixed in each electromagnetic adjustable stiffness unit are fixed to the bottom plate via shaft supports. Axially moving housings of electromagnetic adjustable stiffness units are fixed on sliders of the guide rail slider assemblies via slider backing plates respectively. Guide rail slider assembles are fixed on the bottom plate. Tops of the housings are mounted with the spherical hinges respectively. A bottom of the upper platform is uniformly mounted with the composite spherical hinges. One end of each support rod is threadedly connected to a corresponding one of the spherical hinges, and another end is connected with a corresponding one of composite spherical hinges.

Abstract: A deposition mask includes a mask film including a polymer, a plurality of first deposition openings defined in the mask film. and a conductive layer which is on the mask film and receives a power. The conductive layer includes a first conductive pattern and a second conductive pattern spaced apart from each other along the mask film and electrically disconnected from each other. The conductive layer receives the power at the first conductive pattern and the second conductive pattern, and receipt of the power at the first conductive pattern and the second conductive pattern provides an electrostatic chuck function of the deposition mask.

Abstract: An imprint apparatus that cures an imprint material on a substrate in a state where a mold is in contact with the imprint material includes a substrate holding unit having a plurality of holding regions that holds the substrate, and a control unit configured to control a pressure in each of the holding regions independently, wherein the control unit controls the pressure based on at least one of shape information and distortion information of the substrate, at least when the imprint material is cured.

Abstract: In a medium conveying device, a projector projects light, a projection light amount of the light changes, at every fixed time, to a first projection light amount and a second projection light amount less than the first projection light amount, a receiver receives the light projected from the projector, a processor determines, at fixed sampling timings, whether a reception light amount of the receiver is at a first reception light level or a second reception light level smaller than the first reception light level, determines, when the reception light amount alternately changes to the first reception light level and the second reception light level, that a medium is not present on a conveying path, and determines, when the reception light amount is fixed to either the first reception light level or the second reception light level, that the medium is present on the conveying path.

Abstract: The present invention discloses a coupling beam eddy current damper with shear displacement amplification. The coupling beam eddy current damper with shear displacement amplification comprises a rigid rod, rotating shafts, a pin column, pins, levers, screws, thread sleeves, copper sheets, permanent magnet components, a steel structural component, balls, ball supports and an outer shell. When vibration occurs, coupling beams on both sides of the damper are relatively vertically displaced; at this moment, two levers move up and down relative to the rigid rod; the movement causes the screws and the copper sheets to rotate; the copper sheets rotate in a magnetic field, then induced electromotive force will generates inside the magnetic field, thereby generating eddy current in the copper sheets. The eddy current effect will produce a damping force that impedes the rotation of the copper sheets.

Abstract: A fixing device includes: a non-contact heating unit configured to heat a recording medium in a non-contact manner; and a contact heating unit configured to press and heat the recording medium on a downstream side of the non-contact heating unit in a conveyance direction of the recording medium, in which the non-contact heating unit controls an amount of heat applied to the recording medium according to information on whether the recording medium is black or not, and a thickness of the recording medium, and the contact heating unit controls the pressure applied to the recording medium according to the thickness regardless of whether the recording medium is black or not.

Abstract: Implementations of methods of making a semiconductor device may include: providing a partial semiconductor wafer. The method may also include providing a wafer holder including a tape portion with one or more openings through the tape portion. The method may include mounting the partial semiconductor wafer over the one or more openings in the tape portion of the wafer holder and providing an electrical connection to the partial semiconductor wafer through the one or more openings in the tape portion during probe test.

Abstract: A method of processing a substrate, includes emitting light including vacuum ultraviolet light to a front surface of the substrate, which has a resist film formed thereon from a resist material for EUV lithography, before an exposure process in an interior of a processing container.

Abstract: A lens assembly driving module includes a holder, a metal yoke, a lens unit, a magnet set, a coil, at least one elastic element and at least one damper agent. The metal yoke is coupled with the holder and includes a through hole and at least one extending structure. The extending structure is disposed around the through hole and extends along a direction from the through hole to the holder. The lens unit is movably disposed in the metal yoke. The lens unit includes an optical axis and at least one notch structure. The notch structure is disposed in an outer peripheral area of the lens unit and is corresponding to the extending structure. The damper agent is disposed between the extending structure of the metal yoke and the notch structure of the lens unit. The damper agent is applied to damp a movement of the lens unit.

Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.

Abstract: An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Abstract: The present invention provides a control apparatus for performing synchronous control to synchronize driving of a second moving member so as to follow driving of a first moving member, including a feedforward control system that includes a calculator configured to obtain an input/output response of the second moving member and position deviations of the first moving member and the second moving member while driving the first moving member and the second moving member in synchronism with each other, and calculate a feedforward manipulated variable based on the input/output response of the second moving member and the synchronous error between the first moving member and the second moving member obtained from the position deviations of the first moving member and the second moving member.

Abstract: A mask chuck may include a base plate including a central region and an edge region surrounding the central region, a head part including a first surface connected to the edge region of the base plate and configured to move on the edge region to be close to the central region or away from the central region, and a pad part disposed on a second surface of the head part opposite to the first surface of the head part. The edge region may include a first edge region extending in a first direction, a second edge region extending in the first direction and spaced apart from the first edge region in a second direction crossing the first direction, a third edge region extending in the second direction, and a fourth edge region extending in the second direction and spaced apart from the third edge region in the first direction.

Abstract: An optical module includes a first bearer and a second bearer. The first bearer includes a first bearing portion and an inclined plane, the first bearing portion is configured to carry a first optical element, and the inclined plane is disposed on a peripheral edge of a first end surface of the first bearing portion. The second bearer includes a second bearing portion and a protruding portion, the second bearing portion is configured to carry a second optical element, a second end surface of the second bearing portion faces the first end surface, and the protruding portion extends from the second end surface to the first bearing portion and is configured to contact the inclined plane. When the protruding portion contacts the inclined plane, the inclined plane does not expose the protruding portion in a direction from the first bearing portion to the second bearing portion.

Abstract: Methods, systems, and apparatus for identifying dimensional attributes of a first active area of a template; based at least in part on the dimensional attributes of the first active area, determining a desired magnification correction of a second active area of a substrate; determining an out-of-plane distortion of the template, the substrate, or both; applying a back pressure to the template, the substrate, or both, to compensate for the out-of-plane distortion of the template, the substrate, or both; after compensating for the out-of-plane distortion of the template, the substrate, or both: i) contacting an imprint resist positioned on the substrate with the template such that pattern features in the first active area are filled by the imprint resist, and ii) applying an additional back pressure to the template, the substrate, or both, wherein the additional back pressure is selected such that the second active area exhibits the desired magnification correction.

Abstract: A measurement apparatus for measuring a height position of an object is provided. The apparatus comprises a light projector that projects measurement light onto the object, a light receiver that receives the measurement light reflected by the object, and a processor that determines a height position of the object based on an image of the measurement light received by the light receiver. The light projector projects a coarse detection pattern and a fine detection pattern having a periodic pattern onto the object, and the processor determines a coarse detection value of a height position of the object based on the coarse detection pattern received by the light receiver, and determines a fine detection value of a height position of the object based on the coarse detection value and the fine detection pattern received by the light receiver.

Abstract: An image forming apparatus includes: a transporter; an image former; a reflective optical sensor; an image density adjuster; and a controller. The image former includes: a photoreceptor; a charger; an exposer; a developer; a transferor; and a fuser. The reflective optical sensor is provided opposite to the photoreceptor across a conveyance path. During image density adjustment, the controller forms a predetermined patch toner image on the photoreceptor, irradiates the patch toner image with light, and control the image density adjuster to adjust image density based on reflected light from the patch toner image. During image forming, the controller causes the reflective optical sensor to emit light on timing that a predetermined leading edge area of the recording area passes, and decides based on reflected light therefrom whether a width in the main scanning direction of a recording medium is longer than a predetermined reference length.

Abstract: A scanner includes a lower unit and an upper unit. The lower unit includes a first document table on which a first document is to be placed. The upper unit includes a second document table on which a second document is to be loaded and a document feed path through which the second document is to be picked up from the second document table fed, the upper unit being coupled to the lower unit to pivot between a closed position in which the first document table is covered and an open position in which the first document table is exposed. The upper unit further includes a reading unit to read an image from the first document and the second document by performing flatbed scanning on the first document and document feed scanning on the second document.

Abstract: A racking protection device that includes a housing and vibration monitor. The vibration monitor is arranged to record the vibration transmitting through a racking component. The housing includes an alert for alerting a user when the racking requires inspection for damage to impacts. The vibration monitor records the frequency and time of each impact. The vibration monitor includes a memory that counts and records the number of minor impacts. The vibration monitor determines a minor impact when the peak frequency is between a minimum and maximum pre-set level for a predetermined time period. When a predeteiiiiined number of minor impacts is exceeded, the alert is arranged to alert the user to inspect the racking for damage. When the frequency exceeds the maximum pre-set level for a predetermined time period the vibration monitor determines that a severe impact has occurred and the alert is arranged to alert the user to inspect the racking for damage.

Abstract: A linear motor system comprises a plurality of stator elements that have one or more magnetic coils for generating a magnetic flux in the respective stator element and at least one mover that has at least one magnetic element that interacts with the magnetic coils of the stator elements. The mover is moved by means of activation of at least one stator element in a direction of movement relative to the stator elements. At least one selected stator element is configured to change with respect to the magnetic flux from a first state into a second state or to have the second state permanently while at least some of the other stator elements remain in the first state so that the selected stator element exerts a braking and/or holding force on the mover in the second state.

Abstract: An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.

Abstract: An image reading apparatus is provided, including a platen glass having opposed upper and lower surfaces, a support frame supporting a peripheral portion of the platen glass, a reading device reciprocable in a first direction and disposed on an inner side of the support frame so as to be nearer to the lower surface than to the upper surface, a guide formed on an inner bottom surface on the inner side of the support frame and extending in the first direction so as to guide reciprocation of the reading device, a controller that controls operations of the reading device, a harness connecting the reading device and the controller to each other, and a harness accommodating portion accommodating the harness and constituted by a groove having a recessed shape, extending in the first direction, and formed at the inner bottom surface at a position located in front of the guide.

Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.

Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.

Abstract: An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

Abstract: A converting machine is used to convert sheet material into packaging templates for assembly into boxes or other packaging. The converting machine includes a converting assembly that performs transverse conversion functions and longitudinal conversion functions on the sheet material to create the packaging templates. A fanfold crease sensing mechanism detects the presence and location of fanfold creases in the sheet material. Based on the location of the fanfold creases, the fanfold creases are either cut out of the sheet material, or the sheet material is cut to adjust the position of the fanfold crease in a packaging template.

Abstract: A peripheral includes a body, an image processing device and a processor. The body includes a sub-housing and a second button. The sub-housing includes a control component. The control component includes a first button disposed on an upper surface of the sub-housing. The second button and the first button are disposed on different adjacent surfaces. The image processing device is disposed above or in the body. The image processing device is disposed above the body. The processor controls a first signal generated by the first button to be the same as a first signal generated by the second button. The sub-housing is disposed on an upper lateral side of the body.