Abstract: A method and apparatus for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes is provided herein. The method and apparatus include an electrode assembly and a base assembly. The electrode assembly includes a permeable electrode. The base assembly includes one or more process fluid channels disposed around a circumference of the substrate support surface and configured to fill a process volume with a process fluid. The electrode assembly is configured to apply an electric field to a substrate disposed within the process volume.

Abstract: A method of operating a semiconductor apparatus includes generating an electric field in peripheral areas of a first covering structure and a second covering structure; causing a photomask to move to a position between the first and second covering structures such that the photomask at least partially vertically overlaps the first and second covering structures and such that particles attached to the photomask are attracted to the first and second covering structures by the electric field; and irradiating the photomask with light through light transmission regions of the first and second covering structures.

Abstract: A planarization apparatus, including a chuck having a first surface and a second surface at two opposing sides thereof. The chuck includes a first zone extending along a periphery of the chuck, a second zone at an inner portion of the chuck, the second zone being surrounded by the first zone; and a flexure connecting the first zone with the second zone. The first zone includes a first member extending along the first surface from the flexure and a first ring land protruding from the first member adjacent to the flexure.

Abstract: The instant disclosure discloses a reticle retaining system comprising an inner pod and an outer pod. The inner pod is configured to receive a reticle that includes a first identification feature. The inner pod comprises an inner base having a reticle accommodating region generally at a geometric center thereof and surrounded by a periphery region, and an inner cover configured to establish sealing engagement with the inner base. The inner base has a first observable zone defined in the reticle accommodating region correspondingly arranged to allow observation of the first identification feature. The outer pod is configured to receive the inner base. The outer pod comprises an outer base having a second observable zone defined thereon observably aligned to the first observable zone of the inner pod upon receiving the inner pod, and an outer cover configured to engage the outer base and cover the inner pod.

Abstract: The present invention provides a deformation apparatus that deforms a surface of a member, the apparatus comprising: a plurality of actuators each of which is configured to apply a force to the member to deform the surface; a measurement device configured to measure an induced electromotive force generated in a first actuator of the plurality of actuators; and a controller configured to control the plurality of actuators, wherein the controller causes the measurement device to measure a temporal variation of an induced electromotive force in the first actuator while vibrating the member by using a second actuator, of the plurality of actuators, which is different from the first actuator, converts the measured temporal variation of the induced electromotive force into a frequency spectrum, and detects an abnormality in the first actuator based on the frequency spectrum.

Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.

Abstract: An imprint apparatus forms a pattern on a substrate by bringing a pattern region of a mold into contact with imprint material on the substrate and curing the imprint material. The mold has first and second surfaces. The first surface includes the pattern region and a peripheral region surrounding the pattern region. The second surface includes a held region. The imprint apparatus includes a mold driving mechanism to hold the held region of the mold and drive the mold, a mold conveyance mechanism to hold the peripheral region of the mold and convey the mold, and a controller to control the mold conveyance mechanism based on thickness between the peripheral region and the held region.

Abstract: An object of the invention is to provide a document cover closer as well as office equipment having such a document cover closer, wherein it is possible to finely adjust a spring force and to set its adjusting range within a wide range, as well as to downsize the apparatus. To achieve the above-mentioned object, in a document cover closer 5 according to the invention, a supporting part 20 is rotatably attached to an attaching part 10 being a base via a first hinge pin 81, and a lift part 30 to which the document cover is fixed is rotatably attached to the supporting part 20.

Abstract: A method includes moving a sticky structure to a wafer table such that a first particle on the wafer table is adhered to the sticky structure, moving the sticky structure away from the wafer table after the first particle is adhered to the sticky structure, and performing a lithography process to a wafer held by the wafer table after moving the sticky structure away from the wafer table.

Abstract: A gemstone positioning fixture, including a base and a cover plate applied over the base. The cover plate has apertures, one for each gem to be worked on. At least one biasing member is positioned beneath the plate. The biasing member applies an upward force to the gems to contact the cover plate. The plate is formed of materials that conduct electricity, so as to conduct any charged particles away from the gem work surface.

Abstract: The present invention relates to a valve to be used when blowing air into squeezing pads from a high pressure blower such as a side duct blower, said valve comprising a valve chamber comprising a primary set of openings with a first opening connected to said high pressure blower and a second opening connected to said squeezing pads, whereby air can be transferred through said valve chamber between said squeezing pads and said high pressure blower, said valve chamber further comprising a third opening, whereby air from said first opening can pass through said third opening, and where air not passing through said third opening passes through said second opening, said valve further comprising a valve spool for blocking said third opening and thereby changing the amount of air passing through said third opening.

Abstract: Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas.

Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

Abstract: An exposure device can exposes a circuit pattern while information data is suitably changed. An exposure device comprises a first light source (20) for irradiating a first light including ultraviolet rays, a projection exposure unit (70) for exposing a circuit pattern drawn on a photomask on a substrate, with the first light, a substrate stage (60) for mounting the substrate, a housing (11) for arranging the substrate stage, a second light source (41) for irradiating a second light including ultraviolet rays, arranged at a position different from the first light source, a spatial light modulation unit (40) for exposing information data formed electrically using the second light on the substrate, and a spatial optical light modulation unit driving means (5) for moving the spatial light modulation unit arranged on the housing (11) in a direction parallel to a moving direction of the substrate stage.

Abstract: A clamping apparatus and method for applying a force to a workpiece during processing includes a base defining a work area. The work area is configured to receive a joined structure including a substrate and a die. A component is positionable in the work area and over the joined structure. An adjustable releasable structure is positionable over the component and the joined structure and includes a resilient mechanism having an inner member for contacting the component to apply an inner downward force to the component. The resilient mechanism also includes outer members for applying an outer downward force to opposing distal edge areas of the substrate. An external downward force is applied to the adjustable releasable structure, such that the inner and outer members apply the inner and outer downward forces to the component and the opposing distal edge areas of the substrate, respectively, during processing of the joined structure.

Abstract: A carrier device includes: a circular belt made of a breathable nonwoven fabric; plural rolls on which the belt is hung so that the rolls contact a surface of an inner circumference of the belt, that causes the belt to rotate; and a decompression unit that reduces pressure in an area surrounded by the belt.

Abstract: The present invention provides an original holding apparatus which holds an original, comprising a first holding unit configured to hold the original, a second holding unit configured to hold the original, a fixing unit configured to fix the second holding unit, and an adjustment unit configured to perform adjustment of an holding force of at least one of the first holding unit and the second holding unit, wherein the adjustment unit performs the adjustment such that the holding force of the second holding unit before fixing the second holding unit is smaller than the holding force of the first holding unit before fixing the second holding unit, and performs the adjustment such that the holding force of the second holding unit after fixing the second holding unit is larger than that before fixing the second holding unit.

Abstract: The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.

Abstract: A manufacturing method of a mask includes aligning a mask sheet including an effective area and a non-effective area, on a mask frame; applying a pressure to the non-effective area of the mask sheet in a direction opposite to a sagging direction of the non-effective area, to prevent sagging of the non-effective area; and moving a clamping unit to the mask sheet along a direction substantially parallel to the mask sheet, to clamp the clamping unit onto the non-effective area of the mask sheet.

Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

Abstract: The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, including a stage configured to place the reticle, a holding mechanism configured to hold the reticle placed on the stage, a driving unit configured to drive the stage, a determination unit configured to determine a feature including at least one of a type or shape of the reticle placed on the stage, and a decision unit configured to decide, based on the feature determined by the determination unit, at least one of a holding state of the reticle held by the holding mechanism, or control regarding driving of the stage.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

Abstract: The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.

Abstract: An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. The mask is irradiated with a vacuum ultra violet (VUV) light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light. An assembly includes the mask attached to a pellicle frame by a pressure sensitive adhesive; and a pellicle joined to the pellicle frame, forming a sealed enclosure, the sealed enclosure being filled with extreme clean dry air (XCDA) or inert gas.

Abstract: A stage base includes a plate which supports a stage. The plate has a first structure and a second structure, and the first and second structures are coupled. The stage base further includes a component which is arranged on the plate and has a cooling unit, a coolant channel arranged to extend through the plate into the component, and a seal member arranged between the first structure and the second structure so as to surround the coolant channel, an interior and an exterior of the seal member being fastened with a fastener.

Abstract: A stage device to be used in a vacuum includes: a gas supply unit for generating a gas; a base member having upper, lower, right, and left surfaces; a slider formed in a frame shape surrounding the base member and having surfaces facing the respective surfaces of the base member, and disposed to be movable; and an air bearing configured to float the slider by supplying the gas to a space between the base member and the slider. The slider includes: an air chamber provided on the surface facing the base member for accumulating air, and the base member includes thereinside a slider-moving air flow passage configured to guide the gas from an inlet port to an outlet port for supplying the gas to the air chamber of the slider.

Abstract: An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole.

Abstract: A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).

Abstract: A stage apparatus, which holds a plate member, comprises: a stage; a first positioning member and a second positioning member which are placed on the stage, and are configured to contact a lower surface and an upper surface of the plate member respectively to position the plate member in a direction perpendicular to a plane of the plate member; an elastic, first enclosing member configured to form a first enclosed space around the first positioning member; an elastic, second enclosing member configured to form a second enclosed space around the second positioning member; and a first suction mechanism and a second suction mechanism configured to respectively suck air from the first enclosed space and air from the second enclosed space so as to chuck the plate member to the first enclosed space and the second enclosed space by vacuum absorption.

Abstract: The present invention provides a lithography apparatus which transfers a pattern onto a substrate using an original including a pattern region in which the pattern is formed, the apparatus including a stocker configured to store the original, a processing unit configured to perform a transfer process of transferring the pattern onto the substrate, and a conveyance hand configured to convey the original between the stocker and the processing unit, wherein the conveyance hand includes a protective plate configured to protect the pattern region upon being placed to cover the pattern region, and a holding portion configured to hold the original via a portion other than the pattern region of the original upon being placed on the protective plate.

Abstract: An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening which is provided at an exhaust side for exhausting an air from an inside to an outside and is opposed to a suction side for sucking the air from the outside to the inside, a valve 8, and a spring 9 whose one end is connected with one of the suction side and the exhaust side of the body 4 and the other end is connected with the valve 8. The spring 9 is configured to stretch or compress in accordance with a differential pressure between the suction side and the exhaust side, and the valve 8 is provided with at least one hole.

Abstract: Apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. A vacuum ultra violet (VUV) light source is provided for irradiating a mask held by the pellicle mounter while the chamber is filled with the XCDA or inert gas. The mask is irradiated with the VUV light in an atmosphere of the XCDA or inert gas, and the pellicle is mounted to the mask while the mask is in the atmosphere of the XCDA or inert gas and exposed to the VUV light.

Abstract: The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.

Abstract: A pressure body comprises: three or more pressure pins 40 that come into contact with a photomask 70 at downward positions in a pressure direction D; a main body 10 provided with an opening 16, the opening 16 supporting the pressure pins 40 so as to prevent the pins from dropping off downward, the opening 16 being able to change positions within a plane perpendicular to the pressure direction D, the pressure pins 40 being supported at said positions; a cover body 20 fixed to the main body 10 at an upward position in the pressure direction D; and a buffer member 30 located between the pressure pins 40 and the cover body 20 in the pressure direction D. The pressure body further comprises a cap pin 60, the cap pin 60 supported in the opening 16 so as to be prevented from dropping off downward, the cap pin 60 located in alignment with the pressure pins 40 so as to close off the opening 16, thereby preventing the buffer member 30 from being exposed downward.

Abstract: Chucking mechanisms may include a plurality of chucking sections respectively connecting to a pressure control device to generate individual chucking forces. The individual chucking forces of the chucking sections may be varied by the pressure control device such that a magnitude of separation force is reduced for an imprint lithography system.

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array

Abstract: A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.

Abstract: A stage apparatus, which holds a plate member, comprises: a stage; a first positioning member and a second positioning member which are placed on the stage, and are configured to contact a lower surface and an upper surface of the plate member respectively to position the plate member in a direction perpendicular to a plane of the plate member; an elastic, first enclosing member configured to form a first enclosed space around the first positioning member; an elastic, second enclosing member configured to form a second enclosed space around the second positioning member; and a first suction mechanism and a second suction mechanism configured to respectively suck air from the first enclosed space and air from the second enclosed space so as to chuck the plate member to the first enclosed space and the second enclosed space by vacuum absorption.

Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract: A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.

Abstract: The present invention is directed towards a chucking system, including, inter alia, a body having a surface with a pin extending therefrom having a throughway defined therein, and a land surrounding the protrusions defining a channel between the pin and the land. In a further embodiment, the body comprises a plurality of protrusions.

Abstract: A near-field exposure apparatus for exposing a substrate to light via an exposure mask under a condition that the exposure mask is close to the substrate. The apparatus includes a pressure adjustable container to control a relative position of the exposure mask to the substrate by adjusting a pressure of the pressure adjustable container. The pressure adjustable container has a structure adapted to be tightly closed with the exposure mask being held mounted so as to prevent volatile substances or foreign substances from entering into the pressure adjustable container. The pressure of the pressure adjustable container is adjustable through a change in capacity of the pressure adjustable container.

Abstract: The present invention is a compound sliding seal unit of markedly reduced size and height dimensions which is employed as a discrete assembly for both the passage across and the at-will height adjustment of a mounted, rotatable shaft which extends from the atmospheric environment portion into the vacuum environmental portion of an ion implanter apparatus. The extended, rotatable shaft is typically fashioned as either a rotatable hollow tube or conduit (suitable for the passage of electrical components) and/or as a rotatable support suitable for the mounting of a pivotal scanning radial arm translation system. The manner of construction and the substantially reduced height dimensions of the compound sliding seal unit permits on-demand changes of height for the mounted, rotatable shaft which extends from the atmospheric environment and extends through the compound unit into the confined and limited spatial volume of a vacuum environment within a conventional ion implantation apparatus.

Abstract: A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.

Abstract: A latent image developer system and method is disclosed permitting the recovery of document impressions present in paper and other materials. The disclosed system utilizes two power supplies, a first power supply providing a plate bias charge which is applied to the document to be inspected, and a secondary power supply utilized to attract toner or other imaging powder attractant to the latent images present on the document to be inspected. The disclosed invention permits recovery of previously unrecoverable latent detail within documents as compared to the prior art which utilized a single power supply to promote toner to be attracted to the latent document images.

Abstract: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.

Abstract: An image reading apparatus having an improved cover device. The image reading apparatus includes a main body having an upper surface on which a manuscript can be placed, a cover installed at an upper portion of the main body to cover the manuscript when scanning, and a pressing plate movably installed in the direction perpendicular to an upper surface of the cover at an inner portion of the cover so as to press the manuscript. In addition, an elastic member is additionally inserted between the pressing plate and the cover.

Abstract: A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber.

Abstract: A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepared, a stage on which one of the three-point support member and the vacuum chuck member prepared in the storage spaces of the holder is mounted, a vacuum pump to hold and chuck the substrate through the vacuum chuck member in a state of being mounted on the stage, and a recognition unit to recognize a position of a pattern written on the substrate supported by the three-point support member mounted on the stage and a position of a pattern written on the substrate held by the vacuum chuck member on the stage.

Abstract: An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.