Abstract: A system including: a document holder configured to receive a document; one or more optical sensors directed toward the document holder; one or more processors; and at least one memory having stored thereon computer program code that, when executed by the processor, instructs the processor to: control the one or more optical sensors to capture a plurality of images of the document within the document holder; identify a feature of the document within each of the plurality of images, the feature having visual characteristics that differ based on an angle at which the feature is viewed; and output, in response comparing the respective visual characteristics of the feature of the document in each of the plurality of images to corresponding expected visual characteristics of the feature for the document, an indication of a verification of the document.

Abstract: A support frame for a pellicle includes a frame body made of an aluminum alloy. The frame body has: a top surface onto which a pellicle film is bonded; and an underside surface onto which a transparent substrate is bonded. A material of which the frame body is made has a Young's modulus larger than that of which the transparent substrate is made. The structure described above makes it possible to reduce deformation of the transparent substrate.

Abstract: An image reading apparatus includes: a reader; a first conveyance roller pair; a second conveyance roller pair; and a hardware processor that lowers a conveying force exerted from the second conveyance roller pair on a sheet when acceleration control for accelerating a conveying speed of the sheet whose image has been read by the reader is performed, compared with a case in which the acceleration control is not performed.

Abstract: An apparatus includes an obtaining unit configured to obtain first image data obtained by reading, performed by a reading unit, a chart on which an image has not been formed by an image forming unit and second image data obtained by reading, performed by the reading unit, a chart formed by the image forming unit, and an estimation unit configured to change the second image data using the first image data and estimate a cause of an abnormality that has occurred in the image forming unit from a feature amount obtained by analyzing the changed image data.

Abstract: A document pressing unit is openable with respect to an apparatus body including a placement portion on which a document is placed, and is configured to press the document from above. The document pressing unit includes a body frame, a pair of hinge units, a pair of metal fixing members, and fastening screws. The body frame is able to press the document. The hinge units respectively include hinge legs mounted on the apparatus body, and are mounted with a certain distance in a left-right direction on a rear end of the body frame to openably support the body frame with respect to the apparatus body. The fixing members fix the hinge units to the body frame, respectively. The fastening screws fasten the fixing member and the hinge unit through the body frame so that the fixing member and the hinge unit sandwich the body frame in an up-down direction.

Abstract: An image reading device includes an image reading unit, a conductive member, a switching portion, and a switching control portion. The image reading unit includes a light emitting portion and a light receiving portion. The light emitting portion irradiates light on a document sheet that is conveyed while in contact with an upper surface of a plate-like contact member. The light receiving portion outputs image data corresponding to light reflected from the document sheet. The conductive member is provided on a lower surface of the contact member. The switching portion is switched between an on-state and an off-state so as to select between a state where the conductive member is grounded or a state where the conductive member is not grounded. The switching control portion controls switching of the switching portion.

Abstract: A method of cleaning an ion source. The method includes: at a first reflective surface of a mirror, reflecting light that has a wavelength in a first wavelength band onto a surface of the ion source so that contaminant material is desorbed from the surface of the ion source; at a second reflective surface of the mirror, reflecting light that has a wavelength in a second wavelength band and that comes from the surface of the ion source towards an imaging apparatus for producing an image of the surface of the ion source, wherein the light that has a wavelength in the second wavelength band passes through the first reflective surface of the mirror before being reflected at the second reflective surface of the mirror.

Abstract: An image reading apparatus comprises a housing having a document table glass, a scanner section, a cover member, an adsorption board, a driving section and a controller. The cover member is connected to the housing to be rotatable around a first rotation center line with respect to the housing between a closed position where the document table glass is covered and an open position. The adsorption board, arranged in a part at a housing side at the time the cover member is positioned at the closed position, has an adsorption surface adsorbing the original document, and is connected to the cover member to be rotatable around a second rotation center line parallel to the first rotation center line. The driving section adsorbs the original document on the adsorption surface of the adsorption board.

Abstract: A lithographic apparatus substrate table comprises a plurality of first projections, whereby the first projections define a first substrate supporting plane and a plurality of second projections, whereby the second projections define a second substrate supporting plane. The substrate table further comprises a clamping device configured to exert a clamping force onto the substrate. The second substrate supporting plane is parallel to the first substrate supporting plane. The second substrate supporting plane is offset in respect of the first substrate supporting plane in a direction perpendicular to the first and second substrate supporting planes. The lithographic apparatus substrate table is configured to support the substrate on the second projections at the second substrate supporting plane before application of the clamping force by the clamping device.

Abstract: An image forming apparatus has an apparatus main body, a cover member, and a coupling member. The cover member is openable and closable relative to a side face of the apparatus main body. The coupling member couples the apparatus main body and the cover member together and is arranged inside the cover member when the cover member is closed. The coupling member is rotatable about a first rotation pivot relative to the apparatus main body. The cover member is rotatable about a second rotation pivot relative to the coupling member. When the cover member is opened relative to the apparatus main body, the rotation center of the cover member switches between the first and second rotation pivots during the opening operation of the cover member.

Abstract: According to an embodiment, a method for designing a mask set is provided. In the method for designing the mask set, an imprint-alignment mark is arranged in a region other than a chip region in an imprint shot formed in a template. The imprint-alignment mark is used for alignment during an imprint. Subsequently, the shape of the imprint shot is set based on an arrangement position of the imprint-alignment mark. Subsequently, another pattern is arranged in a region where the region is other than the chip region in the imprint shot and the imprint-alignment mark is not arranged. The other pattern is used in a process other than the imprint.

Abstract: An image processing apparatus obtains image data by photographing a document which is put on a document plate. The apparatus includes an obtaining unit and a correction unit. The obtaining unit photographs the document plate and obtains calibration image data. The correction unit uses the calibration image data obtained by the obtaining unit, so as to correct the image data obtained by photographing the document which is put on the document plate.

Abstract: A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.

Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.

Abstract: A pellicle assembly is provided. The pellicle assembly includes a frame and a membrane connected to the frame. The pellicle assembly also includes housing connected to the frame. The pellicle assembly further includes capping member passing through an upper opening of the housing and movable along a longitudinal axis of the housing. In addition, the pellicle assembly includes fastening member connected to the capping member and movable along a direction that is perpendicular to the longitudinal axis. When the capping member is in a released position, the fastening member is located within the housing, and when the capping member is in a fastening position, a portion of the fastening member is moved to the outside of the housing for fixing a mask.

Abstract: A base portion includes a cam surface formed around a support pin. A turning portion includes: a slide member provided movably in directions toward and away from the support pin; and a coil spring urging the slide member. The slide member is designed to slide on the cam surface while turning, together with an openable body, about the support pin. The cam surface includes a first sliding surface, a second sliding surface, and a third sliding surface. The first sliding surface presses the slide member back in a direction of closing of the openable body. The second sliding surface presses the slide member back in a direction of opening of the openable body. The third sliding surface presses the slide member back in the direction of closing of the openable body.

Abstract: A scanner is disclosed. The scanner has a background pattern that is captured as part of the scanned image. The scanner may be a flatbed scanner, a sheet-feed scanner, or a flatbed scanner using an automatic document feeder (ADF).

Abstract: An apparatus for bearing a lithography mask with a reticle stage includes a resting support holder for the lithography mask. The resting support holder has bearing points which bear the lithography mask. Optionally, the resting support holder optionally has exactly four bearing points. An associated method adjusts the height of the fourth bearing point until all bearing points bear the same supporting force.

Abstract: An image reading apparatus includes first and second image reading units, and first and second transparent guides disposed along a conveyance path and guiding a document passing through a conveyance path. The first and second transparent guides are disposed to oppose to each other across the conveyance path. The image reading apparatus also includes a grounding portion provided on one of the first and second transparent guides and a conductive portion electrically connecting the first and second transparent guides with each other.

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 ?m. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

Abstract: The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.

Abstract: Embodiments of the present disclosure provide a mask device, an exposure apparatus and an exposure method, which enable a reduction in the possibility that the mask is scratched during exposure so as to protect the mask, and in turn a reduction in production cost of the semiconductor devices. The mask device comprises a mask carrier, a mask disposed on a lower surface of the mask carrier, and at least one protection unit provided on the mask carrier, wherein a lower end of the at least one protection unit is arranged to be lower than the lower surface of the mask during exposure. The mask device is applicable in exposure of a substrate to be exposed.

Abstract: An apparatus includes an obtaining unit configured to obtain first image data obtained by reading, performed by a reading unit, a chart on which an image has not been formed by an image forming unit and second image data obtained by reading, performed by the reading unit, a chart formed by the image forming unit, and an estimation unit configured to change the second image data using the first image data and estimate a cause of an abnormality that has occurred in the image forming unit from a feature amount obtained by analyzing the changed image data.

Abstract: Here is proposed a method for bonding a pellicle to a stencil such as mask plate, which is characteristic in that the stencil-bonding agglutinant layer of the pellicle is warmed under load while the pellicle is being bonded to the stencil, preferably at a temperature in a range of 35 through 80 degrees C., and the load is increased stepwise and with intermittent removal of the load.

Abstract: A pellicle is proposed in which the frame is formed with an external horizontal slit for the purpose of receiving a pressing means, which can urge the pellicle to be adhered to a photomask, in which the slit forms a vertically protruding part of a thickness of 5-30% of the width of a pellicle frame main body and a horizontally protruding part of a thickness of 0.3-1 mm; also the method of adhering the pellicle to the photomask is proposed.

Abstract: Provided is a transport device including plural rollers that are provided on a transporting path on which a sheet is transported in a transport direction and is subjected to a process at a process position, and transport the sheet which comes into contact with surfaces of the rollers in the transport direction by rotation of the rollers, among the plural rollers, first rollers that are provided closest to the process position, among the plural rollers, second rollers that are provided closest to the first rollers on an opposite side with respect to the process position, and a driving unit that drives the first rollers and the second rollers to rotate so that a speed of a surface of the first roller is faster than a speed of a surface of the second roller at least while the sheet passes through the process position.

Abstract: A method of forming a pattern may include: disposing a first material layer; disposing a first photoresist film including first shot regions; exposing the first shot regions to light, wherein an overlapping region between first shot regions may be overlappingly exposed to light exposures onto the first shot regions; forming a first photoresist pattern by developing the first photoresist film; forming a first pattern by etching the first material layer using the first photoresist pattern as an etching mask; disposing a second material layer on the first pattern; disposing a second photoresist film including second shot regions; exposing the second shot regions, wherein a boundary region between second shot regions may be disposed spaced apart from the overlapping region; forming a second photoresist pattern by developing the second photoresist film; and forming a second pattern by etching the second material layer using the second photoresist pattern as an etching mask.

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

Abstract: An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device.

Abstract: A deposition apparatus includes a deposition unit including a plurality of deposition assemblies, which are separated from a substrate at a predetermined distance and deposit a material onto the substrate while a first transfer unit transfers the substrate. Each of the plurality of deposition assemblies includes a patterning slit sheet facing a deposition source nozzle unit, a positional information obtaining unit obtaining positional information regarding a position of the substrate transferred by the first transfer unit, and a sheet stage adjusting a position of the patterning slit sheet with respect to the substrate transferred by the first transfer unit according to the positional information.

Abstract: The present invention provides a medium conveyance device whose reliability is enhanced. Namely, a roller conveyance section uses support parts to couple together an upper side shaft, which receives a first reaction force produced in accordance with a first contact-pressure force that urges first driven rollers toward first drive rollers, and a lower side shaft, which receives a second reaction force produced in accordance with a second contact-pressure force that urges second driven rollers toward second drive rollers. Because of this, the medium conveyance device of the present invention may cancel out the two reaction forces that cause an upper side guide and a lower side guide to bend in two bank note conveyance paths adjacent to one another.

Abstract: A portable electronic device equipped with a protective cover is provided. The portable electronic device includes a protective cover that is equipped with a reflector having a light reflection characteristic, a proximity sensor that is equipped with a light emitting unit and a light receiving unit, and that is configured to generate a sensing signal based on an amount of light that the light receiving unit receives in response to light emitted from the light emitting unit, and a controller that is provided with the sensing signal generated from the proximity sensor and that is configured to determine whether the protective cover is open or closed.

Abstract: A holding member includes a base, a transparent sheet, first, second and third signs. The base has an adhesive part on which a sheet-shaped object is removably placed. The sheet holds the object between the base and itself. The first sign indicates a type of the holding member. The second sign indicates that the sheet is located at a closed position. The second sign on the sheet and the first and third signs on the base are located at a front part of the base with respect to an insertion direction of the holding member when the sheet is located at a closed position. The first to third signs are located between a front end of the adhesive part and a front end of the base with respect to the insertion direction when the sheet is located at the closed position.

Abstract: There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100-200 degrees C. and it exhibits results of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.

Abstract: A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as to block the opening portion while a clearance between the partition wall and the support device is formed, the support device moving the support portion from a state where the support portion faces the first space to a state where the support portion faces the second space; and an adjustment device which adjusts an amount of the clearance, thereby suppressing the movement of fluid from the first space to the second space.

Abstract: A method of operating a workstation includes capturing multiple monitoring images each being captured with the imaging sensor while the illumination light source is energized during one of multiple short exposure-time-periods, and detecting a checkup-condition that includes analyzing the multiple monitoring images to determine the presence of any adverse feature on workstation's window. Each of the multiple short exposure-time-periods is shorter than four times of a threshold exposure-time-period but no shorter than 25% of the threshold exposure-time-period. The threshold exposure-time-period is a minimal exposure-time-period needed for the imaging sensor to capture recognizable patterns of a barcode that is in directing contacting with the window while the illumination light source is energized.

Abstract: A sheet jam access assembly in combination with a finisher transport assembly having a main transport cover, is used with a digital printer. First and second axles with idler nip rollers are mounted on the transport assembly for movement away from the process path. First and second drive nip rollers are mounted for driven rotation on the transport assembly. A jam access cover pivots on the main transport cover from a closed to an open position. First and second hinges each have a first outer leaf on the jam access cover connected by a hinge pin to an inner leaf which translates transverse to the process direction. The hinge axis is spaced apart from the cover axis. A cam plate base portion translates parallel to the process direction. First and second ramps adjacent the axles extend away from the base portion at an angle to the process direction. A slot extends through the first inner leaf at an angle to the process direction.

Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.

Abstract: Embodiments of the invention generally relate to apparatus and methods of thermal processing of semiconductor substrates using a pellicle to eliminate contamination of an aperture member. The aperture member is disposed between an energy source and a substrate to be processed. The pellicle may be a thin piece of membrane that is substantially transparent to selected forms of energy, such as pulses of electromagnetic energy from a laser that emits radiation at one or more appropriate wavelengths for a desired period of time. In one embodiment, the pellicle is mounted at a predetermined distance from the aperture member and covering pattern openings (i.e., apertures) formed on the aperture member such that any particle contaminants that may land on the aperture member will land on the pellicle. The pellicle keeps particle contaminants out of focus in the final energy field, thereby preventing particle contaminants from being imaged onto the processed substrate.

Abstract: A multi-function attachment for a mobile computer which includes a rotatable and vertically adjustable horizontal arm incorporating a scanner, lighting devices, a camera, a microphone, and retainers for documents. The multi-function attachment for a mobile computer generally includes a multi-function attachment assembly which is slidably and frictionally secured within an inner channel formed within the host device. The attachment assembly includes a horizontal arm rotatably secured to the distal end of a support shaft. The horizontal arm may incorporate a number of devices, such as document retainers, a camera, a microphone, one or more lights and/or a feed slot for scanning documents to the host device.

Abstract: The disclosure is directed to a system and method of providing illumination for reticle inspection. According to various embodiments of the disclosure, a multiplexing mirror system receives pulses of illumination from a plurality of illumination sources and directs the pulses of illumination along an illumination path to a plurality of field mirror facets. The field mirror facets receive at least a portion of illumination from the illumination path and direct at least a portion of the illumination to a plurality of pupil mirror facets. The pupil mirror facets receive at least a portion of illumination reflected from the field mirror facets and direct the portion of illumination along a delivery path to a reticle for imaging and/or defect inspection.

Abstract: An improvement is achieved in the performance of a semiconductor device. A method of manufacturing the semiconductor device includes an exposure step of subjecting a resist film formed over a substrate to pattern exposure using EUV light reflected by the top surface of an EUV mask which is a reflection-type mask. In the exposure step, the EUV mask is held with the cleaned back surface thereof being in contact with a mask stage. In the EUV mask, the water repellency of the side surface thereof is higher than the water repellency of the top surface thereof. After the exposure step, the resist film subjected to the pattern exposure is developed to form a resist pattern.

Abstract: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.

Abstract: The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

Abstract: On the +X and ?X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a predetermined distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair of Y scales. Similarly, on the +Y and ?Y sides of the projection unit, a plurality of X heads are arranged in parallel to the Y-axis by the predetermined distance described above, so that two heads each constantly form a pair and face a pair of X scales. Of the pair of heads consisting of two heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to malfunction of the head, measurement values of the other head is used. Then, by using the measurement values of the two pairs of Y heads and the pair of X heads, a position of a stage within a two-dimensional plane is measured in a stable manner and with high precision.

Abstract: The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.

Abstract: A method for controlling the operation of an arrangement of at least two electric machines coupled to different wheels of a motor vehicle and connected to a battery which provides an actual minimum and maximum limiting current for the electric machines. Desired torques are provided for the electric machines by a drive control logic. A desired current resulting from the desired torque is ascertained for each electric machine, and the sum of the desired currents are compared with the maximum and minimum limiting current. If the sum lies outside an interval defined by the limiting currents, the desired currents are adjusted using at least one change rule such that the sum of the desired currents lies within the interval. Adjusted desired torques are determined from the adjusted desired currents and used to control the electric machines.

Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

Abstract: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, apparatus comprising: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein patterning device has a main imaging field, and a perimeter and apparatus is operable to model higher-order distortions using signals resultant from alignment structures comprised in perimeter and/or in the imaging field.

Abstract: In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.