Of Surface Reflection Patents (Class 356/369)
  • Patent number: 11530913
    Abstract: Methods and systems for estimating a value of a quality metric indicative of one or more performance characteristics of a semiconductor measurement are presented herein. The value of the quality metric is normalized to ensure applicability across a broad range of measurement scenarios. In some embodiments, a value of a quality metric is determined for each measurement sample during measurement inference. In some embodiments, a trained quality metric model is employed to determine the uncertainty of defect classification. In some embodiments, a trained quality metric model is employed to determine the uncertainty of estimated parameters of interest, such as geometric, dispersion, process, and electrical parameters. In some examples, a quality metric is employed as a filter to detect measurement outliers. In some other examples, a quality metric is employed as a trigger to adjust a semiconductor process.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: December 20, 2022
    Assignee: KLA Corporation
    Inventors: Dzmitry Sanko, Min-Yeong Moon, Stilian Ivanov Pandev
  • Patent number: 11531011
    Abstract: The present invention relates to an imaging device that includes a gating element which receives incident photons and releases pulsed electrons; a single microchannel-plate (MCP) which receives the pulsed electrons and amplifies the pulsed electrons as an amplified pulsed electron flux; a collection element which receives the amplified pulsed electron flux; a high-pass filter; and a gated integrator; wherein the high-pass filter element receives the amplified pulsed electron flux from the collection element and alternate current (AC) couples the amplified pulsed electron flux as a charge pulse to the gated integrator; and wherein the gating element and the gated integrator are time-synchronized to allow charge-integration only while the AC-coupled charge pulse is unipolar. A feedback loop can provide an auto-gating function. The imaging device can be used in night vision goggles or a mass spectrometer.
    Type: Grant
    Filed: September 21, 2020
    Date of Patent: December 20, 2022
    Assignee: United States of America as represented by the Administrator of NASA
    Inventors: Daniel J. Gershman, Levon Avanov, Corey J. Tucker
  • Patent number: 11499870
    Abstract: An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0°, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45°, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90°, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: November 15, 2022
    Assignee: BRUKER NANO, INC.
    Inventors: Mazen Zawaideh, Chris Claypool, Emad Zawaideh
  • Patent number: 11493322
    Abstract: An ellipsometer includes a first separation unit configured to separate a first reflected light into two reflected lights, a first polarizing optical element configured to separate each of the two reflected lights into two linearly polarized lights, a first interference device configured to form an interference fringe by allowing components of the two linearly polarized lights to interfere with each other, a second separation unit configured to separate a second reflected light into two reflected lights, a second polarizing optical element configured to separate each of the two reflected lights into two linearly polarized lights, and a second interference device configured to form an interference fringe by allowing components of the two linearly polarized lights to interfere with each other.
    Type: Grant
    Filed: June 17, 2021
    Date of Patent: November 8, 2022
    Inventor: Yasuhiro Hidaka
  • Patent number: 11479361
    Abstract: A lighting system for an aircraft including a light source configured to emit light and a refractive optical element configured to receive light from the light source and to redirect the light to produce light beams each directed to illuminate a specific surface of the aircraft or ground near the aircraft. The lighting system may be used in a method to monitor ice accretion on a surface of an aircraft.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: October 25, 2022
    Assignee: AIRBUS OPERATIONS, S.L.U.
    Inventor: Pablo Cueto-Gomez
  • Patent number: 11471977
    Abstract: A device for monitoring, in particular for closed-loop control, of a thermal cutting process carried out on a workpiece. The device includes a focusing unit for focusing a machining beam, in particular a laser beam, onto the workpiece for the formation of a kerf on the workpiece. The device also includes an image acquisition unit to generate at least one image of a region of the workpiece, and an evaluation unit configured to determine, based on the at least one image, at least one measured variable for the course of the gap width of the kerf in a thickness direction of the workpiece. The invention also relates to an associated method for monitoring, in particular for closed-loop control, of a thermal cutting process carried out on a workpiece.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: October 18, 2022
    Assignee: TRUMPF Werkzeugmaschinen GmbH + Co. KG
    Inventors: Winfried Magg, David Schindhelm, Boris Regaard, Oliver Bocksrocker, Volker Rominger
  • Patent number: 11473968
    Abstract: An electronic device may include a light sensor system. The light sensor system may have a light source that emits light and a light detector that receives the emitted light after the emitted light has interacted with an external object. The light source may include a ring of light-emitting diodes or other light-emitting devices surrounding the light detector or may have light-emitting devices that are surrounded by a ring-shaped light detector. Polarizer structures may be incorporated into the light sensor system. Control circuitry in the device may control the light source so that different polarizations of light are emitted at different times. The control circuitry may process signals from the light detector that are gathered under different polarizations to discriminate between specular and non-specular reflections from the external object.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: October 18, 2022
    Assignee: Apple Inc.
    Inventors: Po-Chieh Hung, Nicholas C. Lewty
  • Patent number: 11460689
    Abstract: A system for association-based scattering processing includes a spatial light modulator configured to modulate one or more of phase and amplitude of light irradiated from a light source to a target object. Additionally, the system includes processing circuitry configured to evaluate a field distribution for one localized illumination, induce a set of field distributions for a plurality of localized illuminations based on the field distribution for the one localized illumination, and apply the set of field distributions to the spatial light modulator, scanning a plurality of localized illuminations on the target object.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: October 4, 2022
    Assignees: STANLEY ELECTRIC CO., LTD., LINOPTX, LLC
    Inventors: Lin Pang, Tomofumi Yamamuro
  • Patent number: 11430581
    Abstract: Provided is a contactless internal measurement device including an electromagnetic wave irradiation unit that irradiates an electromagnetic wave to a measurement subject, and an electromagnetic wave receiver that detects the electromagnetic wave reflected by the measurement subject. The electromagnetic wave irradiation unit is disposed to reduce a polarization component of the electromagnetic wave detected by the electromagnetic wave receiver, the polarization component being the same as a polarization component of the electromagnetic wave irradiated by the electromagnetic wave irradiation unit.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: August 30, 2022
    Assignee: MAXELL, LTD.
    Inventor: Yukinobu Tanaka
  • Patent number: 11430097
    Abstract: An endoscopic system includes an endoscopic imager configured to capture image frames of a target site within a living body and a processor configured to apply a spatial transform to a preliminary set of image frames, the spatial transform converting the image frames into cylindrical coordinates; calculate a map image from the spatially transformed image frames, each pixel position in the map image being defined with a vector of fixed dimension; align a current image frame with the map image and apply the spatial transform to the current image frame; fuse the spatially transformed current image frame to the map image to generate a fused image; and apply an inverse spatial transform to the fused image to generate an enhanced current image frame having a greater spatial resolution than the current image frame. The system also includes a display displaying the enhanced current image frame.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: August 30, 2022
    Assignee: BOSTON SCIENTIFIC SCIMED, INC.
    Inventors: Niraj Prasad Rauniyar, Robert J. Riker, Timothy Paul Harrah
  • Patent number: 11423632
    Abstract: The present invention relates to an information processing device used in an image capture device that illuminates an object with an illuminating unit and images light reflected from the object as a reflection image with an imaging unit. The information processing device includes an irradiation angle determining unit configured to determine an irradiation angle when the illuminating unit illuminates the object based on a tilt statistic that is a value corresponding to tilt distribution of irregularities formed on the surface of the object.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: August 23, 2022
    Assignee: NEC CORPORATION
    Inventors: Yuta Kudo, Rui Ishiyama, Toru Takahashi, Kengo Makino
  • Patent number: 11424117
    Abstract: A broadband ultraviolet illumination source for a characterization system is disclosed. The broadband ultraviolet illumination source includes an enclosure having one or more walls, the enclosure configured to contain a gas, and a plasma discharge device based on a graphene-dielectric-semiconductor (GOS) planar-type structure. The GOS structure includes a silicon substrate having a top surface, a dielectric layer disposed on the top surface of the silicon substrate, and at least one layer of graphene disposed on a top surface of the dielectric layer. A metal contact may be formed on the top surface of the graphene layer. The GOS structure has several advantages for use in an illumination source, such as low operating voltage (below 50 V), planar surface electron emission, and compatibility with standard semiconductor processes. The broadband ultraviolet illumination source further includes electrodes placed inside the enclosure or magnets placed outside the enclosure to increase the current density.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: August 23, 2022
    Assignee: KLA Corporation
    Inventors: Yung-Ho Alex Chuang, Yinying Xiao-Li, Edgardo Garcia-Berrios, John Fielden
  • Patent number: 11409204
    Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: August 9, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Sergey Tarabrin
  • Patent number: 11396354
    Abstract: Underwater navigational systems and methods utilizing sunlight polarized via scattering through the water column that does not require an underwater vehicle to surface or use a global position system to maintain precise navigational positions and headings. These navigational systems and methods may be employed by manned or unmanned underwater vehicles and may be utilized by individual units and by units operating in a swarm.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: July 26, 2022
    Assignee: BAE Systems Information and Electronic Systems Integration Inc.
    Inventors: Michael J. DeWeert, Reid A. Noguchi
  • Patent number: 11385167
    Abstract: An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer. The focus signal is produced by splitting off the ellipsometer measurement spot before the signal is analyzed by a polarizer thereby avoiding imagining the spot with a modulated intensity. The focus signal is imaged on a sensor array and based on the position of the spot on the sensor array, the focal position of the ellipsometer may be determined. A single image may be used to determine the focal position of the ellipsometer permitting a real time focus position measurement.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: July 12, 2022
    Assignee: Onto Innovation Inc.
    Inventor: John F. Lesoine
  • Patent number: 11371928
    Abstract: A sensor arrangement characterizes particles. The arrangement has an emitter with a laser source that generates a laser beam; a mode converter that generates a field distribution of the laser beam, which at each position has a different combination of a local intensity and a local polarization direction of the laser beam; and focusing optics that focus the field distribution of the laser beam onto at least one measurement region, through which the particles pass, in a focal plane. A receiver is also provided with analyzer optics configured to determine polarization-dependent intensity signals of the field distribution of the laser beam in the at least one measurement region; and an evaluator configured to characterize the particles, including the particle position, the particle velocity, the particle acceleration, or the particle size, using the polarization-dependent intensity signals.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: June 28, 2022
    Assignee: Q.ANT GMBH
    Inventors: Michael Foertsch, Stefan Hengesbach
  • Patent number: 11346768
    Abstract: An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam. The metrology device focuses the vortex beam on a sample under test over a large range of angles of incidence. The metrology device may detect an image of the vortex beam reflected from the sample and measure the polarization state of the return light as function of the angle of incidence and the azimuth angle, which may be further measured at a plurality of different wavelengths. The vortex beam includes azimuthally varying polarization states, thereby enabling measurement of all desired polarization states without requiring the use of moving optical components. The polarization state information detected over multiple angles of incidence and wavelengths provides data with which an accurate determination of one or more characteristics of a sample may be determined.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: May 31, 2022
    Assignee: Onto Innovation Inc.
    Inventors: Kenneth E. James, John F. Lesoine, Pedro Vagos
  • Patent number: 11346769
    Abstract: An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts. The detector of the ellipsometer includes a diffractive element to spatially separate the wavelengths of the light from the sample. The wavelengths may be spatially separated sufficiently that there is no overlap of bands of wavelengths when imaged by a two-dimensional sensor or may be temporally separated. Additionally, the detector separates and simultaneously analyzes the polarizations states of the light from the sample so there is no overlap of polarization states when imaged by a two-dimensional sensor and no moving parts are used. The resulting image with separated wavelengths and polarization states may be used to determine at least a partial Mueller matrix for the sample.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: May 31, 2022
    Assignee: Onto Innovation Inc.
    Inventor: Alexander George Boosalis
  • Patent number: 11328964
    Abstract: Methods, systems, and non-transitory computer readable medium are described for prescriptive analytics in highly collinear response space. A method includes receiving film property data associated with manufacturing parameters of manufacturing equipment. The method further includes determining that the film property data is correlated and is different from target data. The method further includes selecting a set of data points of the film property data that are orthogonal to the target data. The method further includes performing feature extraction on the set of data points. The method further includes determining, based on the feature extraction, updates to one or more of the manufacturing parameters to meet the target data.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: May 10, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Sidharth Bhatia, Jie Feng, Dermot Cantwell
  • Patent number: 11300887
    Abstract: A method to change an etch parameter of a substrate etching process, the method including: making a first measurement of a first metric associated with a structure on a substrate before being etched; making a second measurement of a second metric associated with a structure on a substrate after being etched; and changing the etch parameter based on a difference between the first measurement and the second measurement.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Leon Paul Van Dijk, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Marinus Jochemsen, Bijoy Rajasekharan, Erik Jensen, Adam Jan Urbanczyk
  • Patent number: 11299701
    Abstract: Provided is a culture-medium-monitoring apparatus including: an optical measurement unit that includes an illumination light source and a collecting lens that radiate an illumination light onto a culturing liquid, a retroreflective member that has an array in which micro-reflective elements are arrayed, that is disposed so as to sandwich the vessel between the retroreflective member, and the illuminating light source and the collecting lens, and that reflects the illumination light passed through the culturing liquid in the vessel, and a light detector that detects an intensity of the illumination light passed through the culturing liquid in the vessel after being reflected by the retroreflective member; and a control portion that causes the intensity of the illumination light to be repeatedly detected at a prescribed timing, and that determines a state of the culturing liquid on the basis of a change over time in the intensity of the illumination light.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: April 12, 2022
    Assignee: OLYMPUS CORPORATION
    Inventor: Hiroshi Sasaki
  • Patent number: 11280604
    Abstract: A film thickness measurement device includes a light output unit that outputs measurement light, a spectroscopic detection unit that detects detection light, and an analysis unit that compares a measured reflectance for each wavelength of a measurement object with a theoretical reflectance and analyzes a film thickness of a first film and a film thickness of a second film. The analysis unit acquire candidates for optimal solutions of the film thicknesses using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a first wavelength range and determines the optimal solutions of the film thicknesses out of the candidates for the optimal solutions using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a second wavelength range.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: March 22, 2022
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventor: Kenichi Ohtsuka
  • Patent number: 11243442
    Abstract: Disclosed are a modulated terahertz (THz) signal deflector and a preparation method thereof. The modulated THz signal deflector includes: a first transparent substrate and a second transparent substrate that are oppositely disposed, a liquid crystal layer, a transparent electrode layer, and a photo-alignment layer, wherein the photo-alignment layer has a control graph in which a molecule director is periodically and gradiently distributed along a specific direction, and the control graph is configured to control a liquid crystal molecule director in the liquid crystal layer to be periodically and gradiently distributed along a specific direction to form a blazed-grating phase distribution based on a geometric phase, and deflect an incident circularly polarized THz signal to a specific angle. The deflector provided in the present disclosure can deflect a THz signal to a specific angle, and can switch signal deflection and non-deflection functions by powering up a transparent electrode.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: February 8, 2022
    Assignee: GUANGZHOU RAILWAY POLYTECHNIC
    Inventors: Yanchun Shen, Jinlan Wang, Ximing Qiao
  • Patent number: 11231569
    Abstract: Included are: a laser light source which emits a plurality of laser beams; an aspherical lens which the plurality of laser beams emitted from the laser light source enters and which converts the plurality of laser beams into convergent beams; and a phosphor which is irradiated with the convergent beams from the aspherical lens as excitation beams to generate fluorescence, wherein the plurality of laser beams have different spread angles in a horizontal direction and a vertical direction and enter the aspherical lens while arranged in a direction in which the spread angle is smaller, from among the horizontal direction and the vertical direction, and the aspherical lens has a function of equalizing a light intensity in a direction in which the spread angle is larger, from among the horizontal direction and the vertical direction.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: January 25, 2022
    Assignee: PANASONIC CORPORATION
    Inventors: Kimihiro Murakami, Kiyoshi Morimoto, Ryo Haseyama
  • Patent number: 11215555
    Abstract: A terahertz spectrum test device and system includes a femtosecond fiber laser configured to generate a pump light and a probe light. The pump light excites a terahertz transmitter to generate terahertz waves which are transmitted to a sample suspension device to irradiate a suspended to-be-tested sample, and the probe light is directly transmitted to a terahertz detector. The terahertz detector receives the terahertz waves transmitted from the sample suspension device, and then transmits the terahertz waves and the probe light together to a signal processing circuit to obtain a corresponding terahertz time-domain spectrum. By adoption of the terahertz spectrum test device and system, the to-be-tested sample need not be fixed with a clamp or other instruments, so that terahertz waves will not irradiate to the instrument used for fixing the to-be-tested sample during a terahertz spectrum test, which may otherwise affect the test result.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: January 4, 2022
    Assignees: SHENZHEN INSTITUTE OF TERAHERTZ TECHNOLOGY AND INNOVATION CO., LTD., SHENZHEN INSTITUTE OF TERAHERTZ TECHNOLOGY AND INNOVATION
    Inventors: Cui Guo, Yi Pan, Zhanqiang Xue
  • Patent number: 11169099
    Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: November 9, 2021
    Assignee: BRUKER TECHNOLOGIES LTD.
    Inventors: Alex Krokhmal, Alex Dikopoltsev, Juri Vinshtein
  • Patent number: 11120563
    Abstract: A method and apparatus are provided for registering a base recorded image (9) of an object or terrain with a secondary recorded image (10) of the object or terrain, using a base image sensor model (12), secondary image sensor model (13) and elevation information (11). A plurality of biases (24) and respective matched biases (29) are applied to the secondary image sensor (model 13) and base image sensor model (12), to determine a plurality of corrected sensor models (26) and respective nominally corrected base image sensor models (31). Each corrected sensor model (26) and respective nominally corrected base image sensor model (31) is used to reproject (27) the secondary recorded image (10), and in each case the reprojected secondary recorded image is correlated (19) with the base recorded image (12) to ascertain a correlation score (20) and adjustments to the bias corrections (32). The correlation score being evaluated to determine optimally corrected sensor models and and/or an optimally transformed image.
    Type: Grant
    Filed: January 16, 2018
    Date of Patent: September 14, 2021
    Assignee: The Secretary of State for Defence
    Inventor: John Edward Dawson
  • Patent number: 11092908
    Abstract: An image forming apparatus includes an image holding unit that holds an image that is formed of a developer, the image being intended to be transferred onto a medium, and an image that is not intended to be transferred onto a medium, a transfer unit that transfers the image that is intended to be transferred onto a medium onto a medium, a removing unit that removes the image that is not intended to be transferred onto a medium from the image holding unit, and a forming unit that forms the image that is not intended to be transferred onto a medium onto the image holding unit by using a developer and that has a first forming mode for a first medium and a second forming mode for a second medium that has a transfer sensitivity lower than a transfer sensitivity of the first medium, the forming unit being configured to use a larger amount of the developer in formation of the image that is not intended to be transferred onto a medium in the first forming mode than in the second forming mode.
    Type: Grant
    Filed: April 27, 2020
    Date of Patent: August 17, 2021
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Masaaki Yamaura, Yoshiyuki Tominaga, Kotaro Araki, Ayumi Noguchi
  • Patent number: 11056405
    Abstract: A method for controlling a semiconductor fabrication process includes determining a representative feature within a given area on a wafer. The representative feature has a critical dimension (CD) response to a specified process control parameter that is correlated to a CD response to the specified process control parameter of other features within the given area on the wafer. A CD adjustment is determined for the representative feature to achieve a target CD for the representative feature. The CD response to the specified process control parameter for the representative feature and the CD adjustment for the representative feature are used to determine an adjustment to the specified process control parameter that will drive a CD of the representative feature to the target critical dimension for the representative feature. A process controller is updated to implement the adjustment to the specified process control parameter during subsequent processing of another wafer.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: July 6, 2021
    Assignee: Lam Research Corporation
    Inventor: Marcus Musselman
  • Patent number: 11057608
    Abstract: Techniques are disclosed for depth map generation in a structured light system where an optical transmitter is tilted relative to an optical receiver. The optical transmitter has a transmitter optical axis around which structured light spreads, and the optical receiver has a receiver optical axis around which a reflection of the structured light can be captured. The transmitter optical axis and the receiver optical axis intersect one another. A processing circuit compensates for the angle in the tilt in the reflected pattern to generate the depth map.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: July 6, 2021
    Assignee: QUALCOMM Incorporated
    Inventors: James Wilson Nash, Kalin Mitkov Atanassov
  • Patent number: 11045149
    Abstract: Systems and methods for home monitoring and detection of febrile neutropenia in a patient are provided. The system includes a photoplethysmographic sensor for sensing photoplethysmographic signals of the patient, and one or more blood borne parameter sensors for sensing parameters in the patient's blood. A febrile neutropenia monitoring application receives information sensed by the photoplethysmography sensor and the one or more blood borne parameter sensors and determines, based on the received information, the presence or deterioration of febrile neutropenia.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: June 29, 2021
    Assignee: ALACRITY PATIENT SERVICES, INC.
    Inventor: David Berz
  • Patent number: 11045259
    Abstract: A surgical navigation system is provided. The surgical navigation system comprises a camera system comprising at least one camera. The camera system is capable of capturing images of light that is filtered through at least three different polarization angles. The surgical navigation system further comprises a processor having access to three dimensional image data of a surgical object. The processor is configured to determine first surface normals from the three dimensional image data of the surgical object. The processor is further configured to determine second surface normals from at least three images captured by the camera system of the surgical object under different polarization angles. The processor is configured to align the first surface normals with the second surface normals. Furthermore, a method for operating a surgical navigation system is provided.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: June 29, 2021
    Assignee: Stryker European Holdings I, LLC
    Inventors: Jean Stawiaski, Fadi Ghanam
  • Patent number: 11035790
    Abstract: The present inventive concepts comprises linearly polarizing light, splitting the linearly polarized light into a first light and a second light, modulating the first light and the second light to have a phase difference to produce an output wave light, converting the output wave light to have a linear shape in a first direction to radiate the converted output wave light to a measured object, receiving a measurement light coming out of the measured object and linearly polarizing the first light and the second light of the measurement light to generate an interference light, and obtaining from the interference light an image of the measured object. The measured object can be scanned in a second direction intersecting the first direction or may be scanned rotationally about an axis in a third direction perpendicular to the first and second directions.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: June 15, 2021
    Assignee: Industrial Cooperation Foundation Chonbuk National University
    Inventor: Daesuk Kim
  • Patent number: 11029253
    Abstract: A computer program product, a computerized method for configuring an inspection system and an inspection system. The inspection system may include an image acquisition module that comprises illumination optics and collection optics, a controller; and a processor. The image acquisition module may be arranged to acquire a group of first images of an object segment. Different first images of the group of first images are acquired while the inspection system is configured with different polarization configurations that belong to a first group of polarization configurations.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: June 8, 2021
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Amir Shoham, Ido Dolev, Yariv Simovitch
  • Patent number: 11009451
    Abstract: A multi-angle colorimeter includes an index calculation unit that calculates, based on a predetermined calculation formula, an index corresponding to a particle diameter of a glittering material, which is used for metallic coating or pearl coating, using optical parameters used in color evaluation of the metallic coating or pearl coating on a surface of an object.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: May 18, 2021
    Assignee: KONICA MINOLTA, INC.
    Inventors: Yoshitaka Teraoka, Tomomi Setoguchi
  • Patent number: 11011394
    Abstract: A method for annealing a semiconductor die is provided. Information regarding layout of the semiconductor die is received. At least one annealing orbit on the semiconductor die is obtained according to the received information. An alignment procedure is performed on a plurality of alignment marks of the semiconductor die according to the received information. The semiconductor die is positioned according to the alignment marks. A laser beam with a first laser parameter is projected onto the positioned semiconductor die along the annealing orbit, so as to anneal a first portion of the positioned semiconductor die covered by the annealing orbit. The positioned semiconductor die is partially covered by the annealing orbit.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: May 18, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Hsin-Hao Yeh
  • Patent number: 11002602
    Abstract: A spectroscope includes a first substrate and a second substrate opposite to each other; a light introducing assembly on a side of the first substrate facing away from the second substrate; a temperature adjusting assembly between the first substrate and the second substrate; a liquid crystal dimming assembly between the first substrate and the second substrate, wherein the temperature adjusting assembly is configured to adjust a temperature of the liquid crystal dimming assembly, so as to adjust spectrum of light passing through the liquid crystal dimming assembly; a spectroscopic grating on the first substrate; a reflector on the second substrate and configured to reflect incident light introduced by the light introducing assembly to the spectroscopic grating; and a plurality of sensors configured to receive the incident light after being subjected a light splitting by the spectroscopic grating. A wavelength of the incident light received by each sensor is different.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: May 11, 2021
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Pengxia Liang, Fangzhou Wang
  • Patent number: 10983445
    Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.
    Type: Grant
    Filed: February 6, 2019
    Date of Patent: April 20, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij, Armand Eugene Albert Koolen, Hugo Augustinus Joseph Cramer, Paul Christiaan Hinnen, Martinus Hubertus Maria Van Weert, Anagnostis Tsiatmas, Shu-jin Wang, Bastiaan Onne Fagginger Auer, Alok Verma
  • Patent number: 10971369
    Abstract: In cycle etching in which a depo process and an etching process are repeated, a depo film thickness over a pattern is controlled precisely, and etching is executed to have a desired shape stably for a long time.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: April 6, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Miyako Matsui, Tatehito Usui, Masaru Izawa, Kenichi Kuwahara
  • Patent number: 10957176
    Abstract: A detection system for measuring one or more conditions within a predetermined area includes a fiber harness having at least one fiber optic cable for transmitting light. The at least one fiber optic cable defines a node arranged to measure the one or more conditions. A control system is operably coupled to the fiber harness such that a signal indicative of scattered light associated with the node is transmitted to the control system. The control system analyzes the signal associated with the node in one or more of a frequency domain, time-frequency domain, time domain, and spatial domain, to determine at least one of a presence and magnitude of the condition within the predetermined area.
    Type: Grant
    Filed: November 9, 2017
    Date of Patent: March 23, 2021
    Assignee: CARRIER CORPORATION
    Inventors: Michael J. Birnkrant, Jennifer M. Alexander, Yanzhi Chen, Peter R. Harris, Jie Xi, Alan Matthew Finn, Hui Fang
  • Patent number: 10908084
    Abstract: Devices and methods for sampling an analog signal to perform data analysis are disclosed. The sampling devices and corresponding methods include a detector module that measures a response generated from a sample, an analog to digital converter that samples the analog signal, received from the detector module, and converting it into a digital signal, a sampling rate of the converter being faster than the response of the sample; and a logic circuit coupled to the converter that processes the digital signal in a frequency domain to generate a reduced digital data signal, the logic circuit processing the digital signal acquired from the converter to generate a continuous data transfer to a processing system.
    Type: Grant
    Filed: October 14, 2009
    Date of Patent: February 2, 2021
    Inventors: Timothy M. Ragan, Jason D. Sutin
  • Patent number: 10901241
    Abstract: An optical metrology device produces beams of light with varying wavelengths in a spectral range for measurement of a sample that is at least partially transparent to the spectral range. The light is obliquely incident on the sample, where a portion of the light is reflected off the top surface and a portion is transmitted through the sample and is reflected off the bottom surface. The incident light and/or reflected light is polarized and a phase modulator, such as a photoelastic modulator or electrooptic modulator, is adjusted based on the wavelengths in each beam of light to produce a same retardation of polarization for each beam of light. The reflected light that is received by a detector does not include light reflected from the bottom surface of the sample. A characteristic of a buried structure below the top surface of the sample is determined using the detected reflected light.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: January 26, 2021
    Assignee: Onto Innovation Inc.
    Inventors: George Andrew Antonelli, Troy Daniel Ribaudo
  • Patent number: 10895529
    Abstract: In order to distinguish between a deterioration in a received optical signal strength resulting from optical axis deviation, and a deterioration in the received optical signal strength due to the effects of dust and the like, this detecting system is provided with: a transmitter provided with a light emitting unit for transmitting a first optical signal and a second optical signal having mutually different wavelengths and divergence angles; and a receiver provided with a detecting unit for receiving the first and second optical signals and outputting a first reception signal indicating the reception strength of the first optical signal, and a second reception signal indicating the reception strength of the second optical signal, and an identification unit for determining a state of propagation of the first and second optical signals on the basis of an amount of variation in the first and second reception signals.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: January 19, 2021
    Assignee: NEC CORPORATION
    Inventor: Akihiro Tanaka
  • Patent number: 10876959
    Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: December 29, 2020
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim Yachini, Matthew Sendelbach, Cornel Bozdog
  • Patent number: 10840102
    Abstract: An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: November 17, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Weibo Yu, Wen-Yu Ku, Kuo-Sheng Chuang, Chin-Hsiang Lin
  • Patent number: 10823828
    Abstract: An object capturing device configured to capture an object present in a measurement target space includes a light emission unit, a light receiving unit, a light scanning unit configured to cause measurement light emitted at a predetermined wavelength from the light emission unit to head toward a measurement target space to perform scanning, and to guide reflected light from an object present in the measurement target space with respect to the measurement light to the light receiving unit, and a polarization filter disposed in the light scanning unit, the polarization filter including a polarizer configured to allow only light vibrating in a first direction in the measurement light to transmit, and an analyzer configured to allow only light vibrating in a second direction perpendicular to the first direction in the reflected light to transmit.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: November 3, 2020
    Assignee: HOKUYO AUTOMATIC CO., LTD.
    Inventors: Toshihiro Mori, Akihito Yamamoto, Masayuki Maeda, Takahiro Kasahara
  • Patent number: 10823669
    Abstract: A method for determining a property of an object positioned on a photo-sensitive polyimide layer, wherein the photo-sensitive polyimide layer is positioned on a lower layer that is a radiation reflecting layer, the method may include illuminating, by an illumination unit, an area of the photo-sensitive polyimide layer with first ultraviolet radiation; sensing, by a first sensor, a first reflected ultraviolet radiation that was reflected from the area; and determining, by a processor, based at least in part on the first reflected ultraviolet radiation, the property of the object.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: November 3, 2020
    Assignee: CAMTEK LTD.
    Inventor: Zehava Ben-Ezer
  • Patent number: 10804167
    Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.
    Type: Grant
    Filed: January 24, 2019
    Date of Patent: October 13, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: David Y. Wang, Esen Salcin, Michael Friedmann, Derrick Shaughnessy, Andrei V. Shchegrov, Jonathan M. Madsen, Alexander Kuznetsov
  • Patent number: 10788664
    Abstract: An exemplary optical apparatus includes a coherent source of light having a frequency controlled by command signals. One surface of a spiral phase plate resonator receives the light and the light exits from different regions of another surface dependent on the frequency of the light. A fixed reflector is mounted adjacent the another surface to reflect the exiting light at about a 90 degree angle relative to the path of the exiting light. A source of the command signals sends different values of the command signals to the coherent light source to produce corresponding frequencies of the light that determine a particular region from which the light exits the another surface and hence a location on the fixed reflector where the light will be reflected. By changing the frequency of the light, the light is output in a plane by the optical apparatus with no physically moving components.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: September 29, 2020
    Assignee: NORTHROP GRUMMAN SYSTEMS CORPORATION
    Inventors: Yisa S. Rumala, Gregory Luther
  • Patent number: 10754010
    Abstract: A distance measuring method and an electronic laser distance measuring module, for determining a distance to a target object, wherein the transmitted signal is emitted with selected polarization states by a transmitting unit of the laser distance measuring module. The transmitted signal is emitted and the received signal is acquired such that a polarization identifier of the polarization state of the transmitted signal adheres to the received signal and an evaluation of the received signal is derived based on the polarization identifier, to take into consideration multiple reflections during the processing of the received signal to determine the distance.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: August 25, 2020
    Assignee: HEXAGON TECHNOLOGY CENTER GMBH
    Inventors: Jürg Hinderling, Thomas Piok