Of Surface Reflection Patents (Class 356/369)
  • Patent number: 9170190
    Abstract: A sensor device is disclosed, including a database, and a processing apparatus. The database includes, for multiple different first types of objects, a first output data which are output data of an optical system acquired beforehand for each of the first objects in a case in which a surface of one side of the first object is set as the detection surface; and a second output data which are output data of the optical detection system acquired beforehand for each of the first objects in a case in which a surface of an other side opposite to the one side of the first object is set as the detection surface. The processing apparatus matches measurement data with the database, the measurement data being the output data of the optical detection system which is acquired with respect to a second object, and determines a type of the second object.
    Type: Grant
    Filed: July 9, 2014
    Date of Patent: October 27, 2015
    Assignee: RICOH COMPANY, LTD.
    Inventors: Kazuma Goto, Yoshihiro Oba, Fumikazu Hoshi, Toshihiro Ishii, Satoru Sugawara
  • Patent number: 9115987
    Abstract: An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine at least one parameter of a sample. The metrology device focuses light on the sample using an optical system with a large numerical aperture, e.g., 0.2 to 0.9. Multiple channels having multiple AOIs and/or multiple azimuth angles are selected simultaneously by passing light reflected from the sample through a plurality of pupils in a pupil plate. Beamlets produced by the plurality of pupils are detected, e.g., with one or more spectrophotometers, to produce data for the multiple AOIs and/or multiple azimuth angles. The data for multiple AOI and/or multiple azimuth angles may then be processed to determine at least one parameter of the sample, such as profile parameters or overlay error.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: August 25, 2015
    Assignee: Nanometrics Incorporated
    Inventors: Zhuan Liu, Shifang Li
  • Patent number: 9116103
    Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
    Type: Grant
    Filed: October 1, 2013
    Date of Patent: August 25, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: David Y. Wang, Klaus Flock, Lawrence Rotter, Shankar Krishnan, Johannes D. de Veer, Catalin Filip, Gregory Brady, Muzammil Arain, Andrei Shchegrov
  • Patent number: 9103717
    Abstract: An optical sensor includes an irradiation system emitting linearly polarized light of a first polarization direction toward a surface of an object from an incident direction inclined with respect to a normal to the surface; a first light detection system including a first light detector placed on a light path of light emitted from the irradiation system and specularly reflected by the object; and a second light detection system including a separation optical element placed on a light path of light diffusely reflected by the object, on a plane of incidence of the object, and extracting a linearly polarized light component of the first polarization direction included in the light diffusely reflected by the object, a second light detector receiving the linearly polarized light component of the first polarization direction extracted by the separation optical element and a third light detector receiving the light diffusely reflected by the object.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: August 11, 2015
    Assignee: RICOH COMPANY, LTD.
    Inventors: Yoshihiro Oba, Satoru Sugawara, Toshihiro Ishii, Fumikazu Hoshi
  • Patent number: 9076213
    Abstract: Embodiments of the invention include a method and/or system for determining the relative location of light sources in a video clip. The relative location of a light source can be determined from information found within the video clip. This can be determined from specular reflection on a planar surface within the video clip. An ellipse can be fit to glare that is indicative of specular reflection on the planar surface. An outgoing light angle can be determined from the ellipse. From this outgoing light angle, the incident light angle can be determined for the frame. From this incident light angle, the location of the light source can be determined.
    Type: Grant
    Filed: April 16, 2013
    Date of Patent: July 7, 2015
    Assignee: Adobe Systems Incorporated
    Inventors: Halin Jin, Hyeongwoo Kim, Sunil Hadap
  • Patent number: 9063072
    Abstract: A system, apparatus and method for analysis of a specimen using ellipsometric analysis. Polarization distortions caused by the propagation of polarized light within a substrate upon which a specimen is located are reduced by directing light at selected polarizations at the substrate alone and the specimen on the substrate. Image data is collected for each of the selected polarizations and processed to remove errors due to birefringence. Fourier transform processing is used to obtain polarization phase data for correcting polarization caused by any birefringence in the substrate, and optionally amplitude data.
    Type: Grant
    Filed: June 12, 2012
    Date of Patent: June 23, 2015
    Assignee: Maven Technologies, LLC
    Inventor: Claudia Yi-Chen Lee
  • Patent number: 9046384
    Abstract: In a self-calibration method of an angle detector, an angle interval between first and second scale reader heads are set, so that a single rotation is not equally divided into an integer number of portions by a value of the angle interval and that a plurality of rotations N are equally divided into M equal portions by the value of the angle interval. Readings by the scale reader heads during N rotations of the divided circle are obtained at a pre-set data sampling interval. From differences in readings by these scale reader heads, data of the sequential two-point method relating to an angle scale error of the divided circle are obtained at the data sampling interval. The scale error of the divided circle at the data sampling interval is calculated by synthesizing the data using the fact that an average of the data for the rotations N reaches approximately zero.
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: June 2, 2015
    Assignees: HARMONIC DRIVE SYSTEMS INC.
    Inventors: Hiroshi Yamazaki, Hiroki Hanaoka, Satoshi Kiyono
  • Patent number: 9046474
    Abstract: Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: June 2, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Hidong Kwak, Ward Dixon, Leonid Poslavsky, Torsten R. Kaack
  • Publication number: 20150147826
    Abstract: An integrated system operation method is disclosed that includes the following steps: the film of a substrate is measured by a metrology apparatus to obtain a film information. The substrate is moved from the metrology apparatus to a process apparatus adjacent to the transfer apparatus. The film information is sent to the process apparatus. A film treatment is applied to the substrate in accordance with the film information.
    Type: Application
    Filed: November 27, 2013
    Publication date: May 28, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Weibo Yu, Wen-Yu Ku, Kuo-Sheng Chuang, Chin-Hsiang Lin
  • Publication number: 20150138553
    Abstract: A device for detecting a surface plasmon and polarization includes: a topological insulating layer formed on a substrate; first and second electrodes formed on the topological insulating layer; and a waveguide connected to the topological insulating layer between the first and second electrodes.
    Type: Application
    Filed: May 12, 2014
    Publication date: May 21, 2015
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hee-jeong JEONG, Chang-won LEE, Sang-mo CHEON
  • Publication number: 20150124254
    Abstract: An instrument for measuring and analyzing surface plasmon resonance (SPR) and/or surface plasmon coupled emission on an electro-optic grating-coupled sensor surface is described herein. The sensor chip achieves SPR through a grating-coupled approach, with variations in the local dielectric constant at regions of interest (ROI) at the sensor surface detected as a function of the intensity of light reflecting from these ROI. Unlike other grating-based approaches, the metal surface is sufficiently thin that resonant conditions are sensitive to dielectric constant changes both above and below the metal surface (like the Kretschmann configuration). Dielectric constant shifts that occur as mass accumulates on the surface can be returned to reference intensities by applying voltage across the underlying electro-optic polymer.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 7, 2015
    Inventors: William Page, George N. Gibson, Ernest F. Guignon
  • Patent number: 9025147
    Abstract: A method for detecting ultra-fine features of an integrated circuit (IC) on a semiconductor substrate is disclosed. The semiconductor substrate comprises an IC fabricated by 22 nanometer or smaller scale semiconductor micro-fabrication process. The integrated circuit includes circuit features parallel to a circuit horizontal direction or a circuit vertical direction. The method includes focusing an incident light to produce a focused light spot on a portion of the IC. The incident light is linearly polarized in a linear polarization substantially parallel to the circuit horizontal direction. The method includes detecting reflected light from the portion of the IC, producing a relative movement between the focused light spot and the IC to allow the focused light to illuminate different portions of the IC, obtaining an image of the IC using signals of the reflected light detected from different locations of the integrated circuit, and detecting IC features in the image.
    Type: Grant
    Filed: April 10, 2014
    Date of Patent: May 5, 2015
    Assignee: CheckPoint Technologies, LLC
    Inventors: Yaoming Shen, Guoqing Xiao
  • Patent number: 9019498
    Abstract: Light from a light source device is polarized through a polarizer and is caused to impinge obliquely onto an object to be inspected. The resulting scattered light is received by a CCD imaging device having an element for separating scattered polarized light disposed in a dark field. Component light intensities are worked out for an obtained P-polarized component image and an obtained S-polarized component image and a polarization direction is determined as a ratio of them. The component light intensities and the polarization directions are determined from images obtained by imaging of the light scattering entities in a state where static stress is not applied to the object to the inspected and in a state where static load is applied thereto so as to generate tensional stress on the side irradiated by light. The component light intensities and the polarization directions are compared with predetermined threshold values.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: April 28, 2015
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Kazufumi Sakai, Kazuhiro Nonaka, Shinsuke Yamaguchi
  • Publication number: 20150103348
    Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.
    Type: Application
    Filed: November 2, 2014
    Publication date: April 16, 2015
    Inventors: Guoheng Zhao, Jenn-Kuen Leong, Mehdi Vaez-Iravani
  • Patent number: 9007583
    Abstract: Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: April 14, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Hidong Kwak, Ward Dixon, Leonid Poslavsky, Torsten R. Kaack
  • Publication number: 20150098082
    Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.
    Type: Application
    Filed: October 8, 2013
    Publication date: April 9, 2015
    Inventor: Feiling Wang
  • Patent number: 9001327
    Abstract: An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: April 7, 2015
    Assignee: KLA-Tencor Corporation
    Inventor: Guoheng Zhao
  • Patent number: 9001326
    Abstract: A system that incorporates teachings of the present disclosure may include, for example, a method for generating from a light source a light signal operating in a region of the light spectrum, modifying the light signal with a first polarization device having a first polarization state to generate a polarized light signal directed to a target, modifying a substantially specular reflection and a substantially diffused reflection of the polarized light signal generated from the target with a second polarization device having a second polarization state to generate mixed polarized light signals having a mixed polarization state, and adjusting the mixed polarization state to modify an observable range of subsurfaces of the target. Other embodiments are disclosed.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: April 7, 2015
    Assignee: Welch Allyn, Inc.
    Inventor: Ervin Goldfain
  • Patent number: 8994943
    Abstract: Representative implementations of devices and techniques provide selectivity for imaging devices and systems. Polarization may be applied to emitted light radiation and/or received light radiation to select a desired imaging result. Using polarization, an imaging device or system can pass desired light radiation having desired information and reject unwanted or stray light radiation.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: March 31, 2015
    Assignee: Infineon Technologies AG
    Inventor: Franz Darrer
  • Publication number: 20150085297
    Abstract: A position detection system is able to detect the three dimensional position of at least one target (10). Each target (10) is configured to act as a retro-reflector for light incident from any direction. At least one light emitter illuminates the at least one target (10) and at least one detector (24) is provided for detecting and taking measurements of light retro-reflected from a target (10). There is also provided a processor for processing measurements taken by each detector (24) to determine the three dimensional position of the at least one target (10).
    Type: Application
    Filed: March 28, 2013
    Publication date: March 26, 2015
    Inventors: Edward Benjamin Hughes, Matthew Stuart Warden, Daniel Walton Veal
  • Publication number: 20150077751
    Abstract: An optical inspection system suitable for inspecting a thin film is provided, in which a computer controls a controller to rotate angles of at least two of a polarization device, a phase compensation device and an analyzer at various incident wavelengths and incident angles of a light source, such that the intensities of a first image corresponding to the incident wavelengths and the incident angles of the light source are zero. The computer further records the rotated angles of at least two of the polarization device, the phase compensation device and the analyzer and intensities of a second image corresponding to the incident wavelengths and the incident angles when the intensities of the first image are zero, thereby obtaining a profiling diagram and a maximum intensity of the second images, in which the maximum intensity corresponds to a maximum grey level.
    Type: Application
    Filed: December 30, 2013
    Publication date: March 19, 2015
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yi-Chen HSIEH, Fu-Cheng YANG, Chih-Jung CHIANG
  • Patent number: 8981293
    Abstract: An inspection system includes: an automated optical inspection device detecting a defect of an inspection object by using a light; a scanning electron microscope device for inspecting the defect of the inspection object by using an electron beam and including a vacuum chamber; a stage positioned below and spaced from the scanning electron microscope device and supporting the inspection object; and a transferring device connected to the scanning electron microscope chamber and the automated optical inspection and transferring the scanning electron microscope device and the automated optical inspection device to positions over the stage. Air is in a gap between the chamber and the inspection object. Accordingly, an inspection object of a large size may be inspected for analysis without damage to the inspection object.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: March 17, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Hyun Gong, Young-Gil Park, Jae-Kwon Lee, Jung-Un Kim, Do-Soon Jung, Hyun-Jung Kim, Geum-Tae Kim
  • Patent number: 8983787
    Abstract: Methodology for determining uncertainty in a data set which characterizes a sample involving elimination of the influence of sample alteration drift caused by data set acquisition, and/or elimination of the influence of system drift during data acquisition.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: March 17, 2015
    Inventor: Martin M. Liphardt
  • Publication number: 20150070693
    Abstract: An analysis device is provided with an optical element having a structure in which the end portions of the upper surface and the lower surface of second metal layers are capable of having contact with a measurement object, and hotspots are exposed on the element surfaces. Therefore, it is easy for the substance that is the analysis object to be located at the hotspot. Further, since a first metal layer is disposed in the vicinity of the second metal layers, a resonance effect of a localized surface plasmon and a propagating surface plasmon can be generated. Therefore, the enhancement degree of light based on the plasmon is extremely high, and it is possible to analyze the substance with extremely high sensitivity.
    Type: Application
    Filed: September 8, 2014
    Publication date: March 12, 2015
    Inventors: Mamoru SUGIMOTO, Tetsuo MANO, Megumi ENARI
  • Publication number: 20150062582
    Abstract: A sensor apparatus includes an irradiation system with a light source configured to emit linearly polarized light of a first polarization direction onto a sheet-like object, in a direction oblique to a direction orthogonal to a surface of the object, a first photodetector arranged on an optical path of light that is emitted from the irradiation system and then is reflected at the object by regular reflection, a first optical element, arranged on an optical path of light reflected by diffuse reflection from an incidence plane of the object, configured to transmit linearly polarized light of a second polarization direction that is orthogonal to the first polarization direction, a second photodetector configured to receive light that has passed through the first optical element, and a detection unit configured to detect at least one of basis weight and thickness of the object.
    Type: Application
    Filed: August 7, 2014
    Publication date: March 5, 2015
    Applicant: RICOH COMPANY. LTD.
    Inventors: Kazuhiko ADACHI, Yoshihiro OBA, Toshihiro ISHII, Fumikazu HOSHI, Sunao CHUBACHI, Yoshihiro MISAKA
  • Patent number: 8971749
    Abstract: An optical sensor is disclosed. The optical sensor includes an irradiating system which irradiates a linearly polarized light; a first photodetecting system including a first photodetector which is arranged on an optical path of a light which is specularly reflected from a subject; a second photodetecting system including an optical element which is arranged on an optical path of a light which is diffuse reflected from the subject within an incident face in the subject and which separates a linearly polarized component in a second polarizing direction which is orthogonal to a first polarizing direction and a second photodetector which receives a light separated by the optical element, wherein an angle of taking in the light in the first photodetector and an angle of taking in the light in the second photodetector are mutually different.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: March 3, 2015
    Assignee: Ricoh Company, Ltd.
    Inventors: Yoshihiro Oba, Satoru Sugawara, Toshihiro Ishii, Fumikazu Hoshi
  • Patent number: 8964178
    Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: February 24, 2015
    Assignee: Nova Measuring Instruments Ltd.
    Inventors: Yoel Cohen, Boaz Brill
  • Publication number: 20150049314
    Abstract: There is provided an inspection apparatus which inspects a substrate supporting portion configured to support a substrate during an exposure performed by an exposure apparatus. The apparatus includes: a irradiation unit configured to irradiate, with an illumination light beam, a surface of the substrate on which a pattern has been formed by an exposure by the exposure device; a detecting unit configured to detect reflected light from a pattern in the irradiated surface; a focusing state computation unit connected to the detection unit and configured to determine a focusing state of the pattern of the substrate, based on a detection result of the reflected light beam detected by the detection unit; and an inspection unit connected to the focusing state computation unit and configured to inspect the substrate supporting portion based on the focusing state determined by the focusing state computation unit.
    Type: Application
    Filed: October 30, 2014
    Publication date: February 19, 2015
    Inventor: Kazuhiko FUKAZAWA
  • Publication number: 20150042993
    Abstract: A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light.
    Type: Application
    Filed: October 28, 2014
    Publication date: February 12, 2015
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Richard E. Bills, Neil Judell, Klaus R. Freischlad, James P. McNiven
  • Publication number: 20150042992
    Abstract: A system for a laser-scanning microscope includes an optical element configured to transmit light in a first direction onto a first beam path and to reflect light in a second direction to a second beam path that is different from the first beam path; a reflector on the first beam path; and a lens including a variable focal length, the lens positioned on the first beam path. The lens and reflector are positioned relative to each other to cause light transmitted by the optical element to pass through the lens a plurality of times and in a different direction each time. In some implementations, the system also can include a feedback system that receives a signal that represents an amount of focusing of the lens, and changes the focal length of the lens based on the received signal.
    Type: Application
    Filed: August 5, 2014
    Publication date: February 12, 2015
    Inventors: Meng Cui, Lingjie Kong
  • Publication number: 20150029494
    Abstract: A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.
    Type: Application
    Filed: August 1, 2014
    Publication date: January 29, 2015
    Inventors: Hidong Kwak, Ward Dixon, Torsten R. Kaack, Ning-Yi Neil Wang, Jagjit Sandhu
  • Patent number: 8941831
    Abstract: A resonant optical cavity ellipsometer system is provided. The system can be used to conduct time-dependent arid sensitive measurement of ellipsometric parameters of matter. In a particular use, the system can provide time resolution of better than 1 microsecond. In a particular implementation, matter can be probed within the evanescent wave generated by intra-cavity total reflection.
    Type: Grant
    Filed: May 4, 2010
    Date of Patent: January 27, 2015
    Inventor: Theodore Peter Rakitzis
  • Publication number: 20150015882
    Abstract: A sensor device is disclosed, including a database, and a processing apparatus. The database includes, for multiple different first types of objects, a first output data which are output data of an optical system acquired beforehand for each of the first objects in a case in which a surface of one side of the first object is set as the detection surface; and a second output data which are output data of the optical detection system acquired beforehand for each of the first objects in a case in which a surface of an other side opposite to the one side of the first object is set as the detection surface. The processing apparatus matches measurement data with the database, the measurement data being the output data of the optical detection system which is acquired with respect to a second object, and determines a type of the second object.
    Type: Application
    Filed: July 9, 2014
    Publication date: January 15, 2015
    Applicant: RICOH COMPANY, LTD.
    Inventors: Kazuma Goto, Yoshihiro Oba, Fumikazu Hoshi, Toshihiro Ishii, Satoru Sugawara
  • Patent number: 8934096
    Abstract: The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator; a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector such as a Golay cell; a bolometer or a solid state detector; and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.
    Type: Grant
    Filed: May 11, 2012
    Date of Patent: January 13, 2015
    Assignees: University of Nebraska Board of Regents, J.A. Woollam Co., Inc.
    Inventors: Craig M. Herzinger, Mathias M. Schubert, Tino Hofmann, Martin M. Liphardt, John A. Woollam
  • Patent number: 8920723
    Abstract: A sample support structure comprising a sample support manufactured from a semiconductor material and having one or more openings therein. Methods of making and using the sample support structure.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: December 30, 2014
    Assignee: Protochips, Inc.
    Inventors: John Damiano, Jr., Stephen E. Mick, David P. Nackashi
  • Publication number: 20140375983
    Abstract: A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.
    Type: Application
    Filed: April 14, 2014
    Publication date: December 25, 2014
    Applicant: Rudolph Technologies, Inc.
    Inventors: Robert Gregory Wolf, Michael J. Kotelyanskii
  • Patent number: 8913243
    Abstract: Described are methods and systems for vicarious polarimetric calibration and performance validation of a remote sensor. The system includes a plurality of reflective mirrors configured and arranged to reflect radiation from a source of radiation onto the remote sensor with accurately known polarimetric properties. Each of the reflective mirrors are located so that the target images do not overlap. The remote sensor is configured to receive the radiation reflected from the plurality of reflective mirrors and store the received radiation as image data (e.g., the image of each mirror appears as a point target). The system includes a processor configured to process the received data to provide direct calibration and performance validation for each polarimetric or spectral channel of the remote sensor. In addition, the calibration method removes all atmospheric effects except for transmittance and provides reference targets that have high polarimetric contrast, full spectrum performance and easy to deploy.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: December 16, 2014
    Assignee: Raytheon Company
    Inventors: John F. Silny, Stephen J. Schiller
  • Patent number: 8908185
    Abstract: The present invention provides a prism. The prism includes a lower surface, an upper surface, a first side surface and a second side surface. The first side surface and the second side surface are disposed between the upper surface and the lower surface. The first side surface and the second side surface of the prism are one-dimensional parabolic surfaces. The lower surface is used to receive light. The first side surface is used to reflect the light from the lower surface to the upper surface. The second side surface is used to reflect the light from the upper surface to the lower surface for further analysis in the process unit afterwards.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: December 9, 2014
    Assignee: National Yang-Ming University
    Inventors: How-foo Chen, Oscar Kuang-Sheng Lee
  • Patent number: 8908180
    Abstract: A polarimetric measurement device and method with microscopic resolution include a polarization conversion device to modify the polarization of a beam so as to switch from a spatially uniform distribution to a distribution that is cylindrically symmetric about the optical axis, and vice versa. The conversion device is positioned on the axis of a focusing objective for focusing the cylindrically symmetric polarized beam onto the surface of a sample to be measured. The device may be incorporated into a microellipsometer, or an interference contrast microscope, or used as a polarimetric accessory for a microscope.
    Type: Grant
    Filed: July 18, 2011
    Date of Patent: December 9, 2014
    Assignee: Horiba Jobin Yvon SAS
    Inventor: Olivier Acher
  • Publication number: 20140354994
    Abstract: Provided herein is an apparatus, including at least two photon emitters, each with a preselected polarization orientation, and configured to emit polarized photons onto a surface of an article, and a processing means configured to process photon-detector-array signals corresponding to photons scattered from surface features of the article, and generate one or more surface features maps for the article from the photon-detector-array signals corresponding to the photons scattered from the surface features of the article.
    Type: Application
    Filed: February 28, 2014
    Publication date: December 4, 2014
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Joachim Walter Ahner, David M. Tung
  • Publication number: 20140354992
    Abstract: A localized surface plasmon resonance (LSPR) sensing system with particles arranged in anisotropic periodic manner is revealed. The anisotropy of the nanoparticle array spectrally splits the phase spectra of two perpendicular polarizations thus inducing a phase difference between the two polarizations. An apparatus of ellipsometry is used to measure the phase difference. The simulated results demonstrate that the full width at the half maximum of the spectrum of phase difference is much narrower than the spectrum of transmittance.
    Type: Application
    Filed: November 15, 2013
    Publication date: December 4, 2014
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: CHUN-HUNG LIN, WEN-YU CHEN
  • Publication number: 20140354993
    Abstract: A localized surface plasmon resonance (LSPR) sensing system with anisotropic particles is revealed. The anisotropy of nanoparticles spectrally splits the phase spectra of two perpendicular polarizations thus inducing a phase difference between the two polarizations. An apparatus of ellipsometry is used to measure the phase difference. The simulated results demonstrate that the full width at the half maximum of the spectrum of phase difference is much narrower than the spectrum of transmittance. Therefore the figure of merit is dramatically increased and the performance of the refractive index sensor is improved.
    Type: Application
    Filed: November 15, 2013
    Publication date: December 4, 2014
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: CHUN-HUNG LIN, WEN-YU CHEN
  • Patent number: 8902425
    Abstract: Embodiments generally relate to a light source and methods for minimizing temperature sensitivity of a light source light source. In one embodiment a light source includes a light-emitting diode, a light beam having an optical axis, a photodetector and a polarizer. The diode is operatively configured to emit the light beam. The beam splitter, positioned to intercept the light beam, includes a first optical surface operatively configured to reflect a first portion of the light beam and to transmit a second portion of the light beam therethrough. The photodetector is positioned to capture the first portion of the light beam after reflection by the beam splitter and operatively configured to generate photocurrent proportional to an intensity of that captured first portion. The polarizer is positioned between the diode and the beam splitter, and is operatively configured to polarize the light beam along a polarization direction perpendicular to its optical axis.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: December 2, 2014
    Assignee: University of Zagreb
    Inventor: Dubravko Ivan Babic
  • Publication number: 20140347666
    Abstract: Methods and systems for evaluating the capability of a measurement system to track measurement parameters through a given process window are presented herein. Performance evaluations include random perturbations, systematic perturbations, or both to effectively characterize the impact of model errors, metrology system imperfections, and calibration errors, among others. In some examples, metrology target parameters are predetermined as part of a Design of Experiments (DOE). Estimated values of the metrology target parameters are compared to the known DOE parameter values to determine the tracking capability of the particular measurement. In some examples, the measurement model is parameterized by principal components to reduce the number of degrees of freedom of the measurement model. In addition, exemplary methods and systems for optimizing the measurement capability of semiconductor metrology systems for metrology applications subject to process variations are presented.
    Type: Application
    Filed: May 15, 2014
    Publication date: November 27, 2014
    Inventors: Andrei Veldman, Andrei V. Shchegrov, Gregory Brady, Thaddeus Gerard Dziura, Stilian Ivanov Pandev, Alexander Kuznetsov
  • Patent number: 8896832
    Abstract: Systems and methods for discrete polarization scatterometry are provided.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: November 25, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Andrew V. Hill, Amnon Manassen, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alexander Svizher, David Y. Wang, Lawrence D. Rotter, Johannes D. de Veer
  • Patent number: 8896833
    Abstract: The invention relates to a method and to a device for determining at least one piece of polarization information on a measurement point of a target sample, the device comprising:—a light source capable of emitting a rectilinearly polarized light beam, the light beam being intended to be reflected by the measurement point;—a means for computing polarization information on the measurement point using the beam reflected by the target sample;—at least one waveguide for guiding the incident beam towards the target sample and the reflected beam towards the computing means; and—a means for rotating the polarization, capable of rotating two orthogonal polarimetric components of the incident beam after passing through the waveguide and two orthogonal polarimetric components of the reflected beam before passing through the waveguide.
    Type: Grant
    Filed: January 15, 2010
    Date of Patent: November 25, 2014
    Assignee: Centre National de la Recherche Scientifique-CNRS
    Inventors: Dominique Pagnoux, Frédéric Louradour, Jérôme Desroches, Alain Barthelemy, Julien Brevier
  • Publication number: 20140340682
    Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.
    Type: Application
    Filed: May 15, 2014
    Publication date: November 20, 2014
    Inventors: Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan, Leonid Poslavsky, Mikhail M. Sushchik
  • Patent number: 8891079
    Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.
    Type: Grant
    Filed: December 7, 2011
    Date of Patent: November 18, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Guoheng Zhao, Jenn-Kuen Leong, Mehdi Vaez-Iravani
  • Publication number: 20140333930
    Abstract: An optical biosensor is provided for detecting a bio-molecular sample by Goos-Hänchen (GH) enhancement of Aharonov-Albert-Vaidman (AAV) amplification to a surface plasmon resonance (SPR) detector. The sensor includes pre- and post-selection polarizers respectively upstream and downstream of a right-isosceles prism with a metal film and a liquid medium disposed on a diagonal side of the prism. Laser light passes through the first polarizer, reflects at the film, passes through the second polarizer and is detected with a shift determined by a pointer estimator to indicate the sample.
    Type: Application
    Filed: February 19, 2014
    Publication date: November 13, 2014
    Applicant: United States of America as represented by the Secretary of the Navy
    Inventors: Allen D. Parks, Scott E. Spence, Rose M. Hayden
  • Publication number: 20140327909
    Abstract: The invention concerns a method for exciting a sub-wavelength inclusion structure, comprising: providing a first medium having a first refractive index ni and a second medium having a second refractive index nt, wherein ni>nt, wherein the sub-wavelength inclusion structure is arranged at a boundary between the first and second media, wherein the sub-wavelength inclusion structure exhibits polarizability properties; and directing light through the first medium towards the sub-wavelength inclusion structure. The angle of the incident light to the normal of the boundary, ?i, is such that, for a given set of: frequency of the light; surface density of inclusions; average polarizability of the inclusion structure at the frequency; first refractive index; and second refractive index, ?i fulfils at least one of the relations for s-polarized light and for p-polarized light described herein.
    Type: Application
    Filed: December 14, 2012
    Publication date: November 6, 2014
    Inventors: Mikael KÄLL, Mikael SVEDENDAHL