Abstract: Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

Abstract: The present invention relates to portable image acquisition apparatus (10). The portable image acquisition apparatus (10) is configured to acquire at least one image of apart of a human or animal body. The portable image acquisition apparatus comprises a main body (12) defining a window (20) and an imaging arrangement (16) operable to acquire an image of a part of a human or animal body by way of an imaging path which passes through the window (20). The portable image acquisition apparatus (10) also comprises a lighting module (14) comprising a light source and an optical arrangement (50), the lighting module (14) and the main body (12) being configured to releasably couple with each other when in use. The light source is configured to emit a beam of non-coherent light in a direction substantially perpendicular to the imaging path.

Abstract: Systems and methods are described for modifying a cosmetic product based on a microbe profile including an ingredient-microbe interaction dataset including information associated with interactions between reference cosmetic ingredients and types of reference microbes; and a computing device including circuitry configured to receive information associated with the microbe profile of an individual, receive information associated with an ingredient list of the cosmetic product, compare the microbe profile of the individual and the ingredient list of the cosmetic product to the ingredient-microbe interaction dataset, identify an interaction between at least one cosmetic ingredient in the ingredient list of the cosmetic product and at least one of the one or more types of microbes in the microbe profile of the individual, recommend a modification to the ingredient list in response to an identified interaction, and report to a user the recommended modification.

Abstract: An optical module (1A) includes a polarization beam splitter (10A) having a light splitting surface (11), polarization elements (20, 40), and respectively arranged on an optical path of a first polarization component (L2) transmitted through the light splitting surface (11) and an optical path of a second polarization component (L4) reflected by the light splitting surface (11), a reflective SLM (30) that modulates and reflects the first polarization component (L2) passing through the polarization element (20), and a reflective SLM (50) that modulates and reflects the second polarization component (L4) passing through the polarization element (40). The first modulation light (L3) passing through the polarization element (20) again and then reflected by the light splitting surface (11) and the second modulation light (L5) passing through the polarization element (40) again and then transmitted through the light splitting surface (11) are combined with each other.

Abstract: A scanning probe microscope, in particular an atomic force microscope, for analyzing a sample by moving a probe and the sample relative to one another, wherein the scanning probe microscope includes a detection unit with a side view camera arranged and configured for detecting an image of the sample in a substantially horizontal side view, and a determining unit for determining information indicative of a profile of at least part of a surface of the sample based on the detected image.

Abstract: A polishing pad surface property measuring method which can measure surface properties of a polishing pad that reflect CMP performance by applying a laser beam to the polishing pad at a plurality of incident angles is disclosed. The method includes applying a laser beam to a surface of the polishing pad, and receiving light reflected by the surface of the polishing pad and performing Fourier transform on the received light to determine surface properties of the polishing pad. The laser beam is applied to the polishing pad at a plurality of incident angles.

Abstract: A dielectric-coating based technique determines the refractive index of small dimension materials. The technique utilizes a sample of the small dimension material coated with the dielectric and an uncoated sample, where reflectivity is determined for each. The real and imaginary components of the refractive index can be determined for the small-dimension material itself.

Abstract: An optical test system includes a stage region to accommodate an object to be tested, a first incident optical system which changes a first polarization state of a first light beam to a second polarization state and provide the first light beam in the second polarization state to the stage region in a first direction at a first incident angle which is not a right angle, a second incident optical system which changes a third polarization state of a second light beam to a fourth polarization state and inputs the second light beam in the fourth polarization state to the stage region in a second direction at a second incident angle which is not a right angle, and a main optical system to detect a first reflected light beam reflected from the stage region at a first reflection angle different from the first and second incident.

Abstract: A method for capturing image data and for determining the thickness of a specimen holder in the beam path of a microscope. The specimen holder is transparent to illumination radiation and embodied to receive a specimen. The specimen holder, which has a first side face and a second side face, is arranged in a specimen plane and the first side face and second side face of the specimen holder are aligned parallel to the specimen plane. At least one beam of the illumination radiation is directed onto the aligned specimen holder along a first optical axis at a first illumination angle and at least two measured values of a reflected component of the illumination radiation or at least two measurement values of a detection radiation caused by the illumination radiation are captured. Depending on the at least two captured measurement values, a spacing of the first and second side face in relation to one another in the direction of the Z-axis is established as a thickness.

Abstract: Embodiments herein relate to identifying whether a threshold amount of material is on a surface. In particular, an apparatus may have an inspection module to receive an image of a surface captured by a camera, where the surface is illuminated by a light source positioned at an angle to the surface. The apparatus may then analyze the received image to identify a measurement of light intensity of one or more portions of the surface; and determine, based on the analysis, whether each of the one or more portions of the surface includes a threshold amount of a material on the surface.

Abstract: A super-resolution scanning confocal polarization contrast microscope is provided. The microscope has a laser light source (1), sample stage (10) for mounting a sample 6 and detector (8). A polarization controller (3) is used to set the polarization state of the light beam to any one of a defined set of different polarization states. A spatial light modulator (5) modulates the light beam in amplitude and/or phase to focus a sub-diffraction-limit central spot on the sample together with unwanted sidebands. A scanning confocal scheme is used with a pin hole 9 in front of the detector (8) so that only that portion of the light is detected which has comes from the central spot, while rejecting light that has been scattered by the sample from the sidebands. Polarization contrast images with sub-diffraction limit resolution can thus be acquired.

Abstract: A detection device includes: a light source that emits, toward an object, light of a first wavelength band, and light of a second wavelength band that is less readily absorbed by water than the light of the first wavelength band; a polarization splitter that splits at least one of S-polarized light and P-polarized light from light that has been reflected or scattered at the object; a photoreceptor that receives light reflected or scattered at the object via the polarization splitter; and a control unit that determines a state of the object from information based on light received by the photoreceptor. The light emitted by the light source is random polarized light where the ratio of P-polarized light and S-polarized light is generally uniform.

Abstract: A probe for use with an imaging system, including a scanning device configured to receive a first light beam from a light source, a beam-divider configured to split the first light beam into a plurality of second light beams, and a focusing device configured to focus each of the second light beams on respective locations in an object of interest is disclosed.

Abstract: Methods and systems for optimizing a set of measurement library control parameters for a particular metrology application are presented herein. Measurement signals are collected from one or more metrology targets by a target measurement system. Values of user selected parameters of interest are resolved by fitting a pre-computed measurement library function to the measurement signals for a given set of library control parameters. Values of one or more library control parameters are optimized such that differences between the values of the parameters of interest estimated by the library based measurement and reference values associated with trusted measurements of the parameters of interest are minimized. The optimization of the library control parameter values is performed without recalculating the pre-computed measurement library.

Abstract: Embodiments disclosed herein relate to systems and methods for nondestructive testing of material to predict oncoming failure thereof. For example, components and/or elements of various devices may be nondestructively tested to predict and/or prevent failure of such components and elements during operation. In some embodiments, the components and/or elements may be tested without removal thereof from systems or devices (e.g., a wing of an airplane may be tested for oncoming failure without removing the wing from the airplane).

Abstract: Using a substrate on which a structure has been formed with a plurality of sets of processing conditions, the present disclosure provides an evaluation device that evaluates one of said sets of processing conditions with high precision. This evaluation device is provided with an illumination system that uses illuminating light to illuminate a wafer on which a pattern has been provided via exposure using a plurality of sets of exposure conditions, including first exposure conditions and second exposure conditions; a light-receiving system and an imaging unit the detect light coming from the surface of the wafer; and a computation unit that, on the basis of detection results obtained by the imaging unit using first diffraction conditions and second diffraction conditions that differ in terms of illumination conditions and/or detection conditions, and that estimates the first exposure conditions used when the wafer is exposed.

Abstract: A surface defect inspecting device for steel sheets includes: an illuminating unit configured to illuminate an imaging target portion on a surface of a steel sheet; first and second diffuse reflection light imaging units arranged at a first angle and at a second angle larger than the first angle with respect to a specular reflection direction of illuminated light reflected from the imaging target portion, respectively, imaging simultaneously reflection light of illuminated light reflected from the imaging target portion; and an image signal processor configured to process first and second diffuse reflection image signals acquired by the first and second diffuse reflection light imaging units, respectively, detecting, as a surface defect portion, a portion for which brightness level is lower than a first predetermined threshold in the first diffuse reflection image signal as well as higher than a second predetermined threshold in the second diffuse reflection image signal.

Abstract: An illumination device that has an orange light, with LEDs having a wavelength in the range of 580-620 nm, and/or a red light with LEDs having a wavelength of light in the range of 620-650 nm for side-transillumination of the veins. Orange light has been found to be beneficial for transillumination of superficial veins, while red light has been found to be beneficial for transillumination of deeper veins. In addition, the device has white light which is used for illumination of the surface of the skin. The illumination device contains a manual or automatic switch or switching mechanism that allows the user to easily switch between the orange light/red light and the white exam light by simply pressing a button or moving the device.

Abstract: Application of detectors of electromagnetic radiation and systems for enabling the optimization thereof for application over various specific wavelength ranges, involving functional combinations of gratings and/or combination dichroic beam splitter-prisms, which themselves can be optimized as regards wavelength dispersion characteristics.

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Abstract: The invention relates to a method for observing a sample under optical microscopy, in incoherent, unpolarised light, using a sample substrate including a contrast-amplifying layer having a complex index of refraction. The invention also relates to a method for detecting or metering at least one chemical or biological species using such a sample substrate.

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Abstract: Diagnostic kits and methods configured to rapidly and non-invasively determine physiologic levels of hemoglobin. A diagnostic kit may include a chamber pre-filled with an indicator, the indicator solution including a tetramethylbenzidine (TMB) solution, the indicator being configured to change color; a collection device configured to collect a test sample from a subject. The kit may also include a hemoglobin physiologic level identifier legend, the legend indicating 1) at least one color of the indicator and 2) a physiologic level and/or range of the hemoglobin and/or disease state associated with the color.

Abstract: This system comprises an illumination optics subsystem for generating and directing an incident beam towards a defect on a surface of a wafer. The illumination optics subsystem includes a light source for generating the incident beam and one or more polarization components for adjusting a ratio and/or a phase difference for the incident beam's electric field components. The system includes a collection optics subsystem for collecting scattered light from the defect and/or surface in response to the incident beam, and the collection optics subsystem comprises an adjustable aperture at the pupil plane, a rotatable waveplate for adjusting a phase difference of electric field components of the collected scattered light, and a rotatable analyzer.

Abstract: The present disclosure provides a device for evaluating a mechanical property of a material. The device comprises a sensing layer that has a contact surface for contacting a surface area of the material. The sensing layer has a property or dimension that is pressure sensitive. The device also comprises a detector arranged to detect electromagnetic radiation that propagates through at least the sensing layer. The device is arranged such that, when the contact surface of the sensing layer is in contact with the surface area of the material and a load is applied on at least a portion of the surface area of the material, the detected electromagnetic radiation can be used to determine stress within a portion of the sensing layer, the determined stress being indicative of the mechanical property of the material.

Abstract: A measurement apparatus includes an optical combining unit configured to optically combine light from a first light source and light from a second light source, a forming unit configured to form pattern light using light from the first light source, a projection optical system configured to project the optically combined light onto an object, an imaging unit configured to image the object on which the pattern light is projected to capture a first image and to image the object illuminated with light from the second light source via the projection optical system to capture a second image, and a processing unit configured to correct the first image using the second image and to obtain information on a shape of the object based on the corrected first image.

Abstract: [Solving Means] A signal processing apparatus is a signal processing apparatus for an optical tomographic measurement apparatus that generates measurement light and reference light and measures a tomographic structure of a measurement object on the basis of a signal intensity of interference light between the reference light and return light of the measurement light from the measurement object. An arithmetic unit is configured to calculate a signal intensity of simple reflection among the return light of the measurement light, the simple reflection being one time of reflection at a plurality of layers virtually set in a depth direction from a surface layer side of the measurement object. The arithmetic unit is configured to calculate a signal intensity of multiple reflection on the basis of the signal intensity of the simple reflection, the signal intensity of multiple reflection being a signal intensity of return light generated by being reflected at the plurality of layers three or more times.

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

Abstract: An apparatus and a method for measuring surface topography of a work-piece are described. The apparatus comprises a light emitting assembly configured to emit an emitted beam of light, the emitted beam being emitted at a plurality of wavelengths and modulated at modulating frequency, the emitted beam being directed onto a surface of a work-piece. A detector is configured to receive a reflected beam of light that includes at least a portion of the emitted beam as reflected from the surface of the work-piece. The detector is further configured to generate a signal indicative of a position of the reflected beam on the detector. A signal processing unit is configured to remove noise from the signal thus generated based on the modulating frequency to obtain a processed signal. A control unit is configured to determine topography of the surface based on the processed signal.

Abstract: A method for assessing the condition of a tissue sample includes the steps of: 1. illuminating the sample with incident electromagnetic radiation exhibiting P polarization types, 2. for each of the P polarization types, inspecting the scattered incident radiation for at least one and possibly all of Q polarization types; 3. establishing a transfer function M relating the intensity of the P polarization types of the incident radiation to the intensity of the polarization types for which the scattered radiation was inspected; 4. comparing the established transfer function to one or more reference transfer functions; and 5. reaching a conclusion about the condition of the tissue sample based on the comparison.

Abstract: A semiconductor device inspection system includes a laser beam source, a tester, an optical sensor, a first spectrum analyzer for measuring first phase information serving as phase information of the detection signal, a reference signal generating unit for generating a reference signal of a predetermined frequency, a second spectrum analyzer for measuring second phase information serving as phase information of a reference signal, and an analysis unit for deriving phase information of the detection signal at the predetermined frequency, wherein the first spectrum analyzer measures the first phase information with respect to the reference frequency, the second spectrum analyzer measures the second phase information with respect to the reference frequency, and the frequency of the base signal of the first spectrum analyzer and the phase thereof are synchronized with the frequency of the base signal of the second spectrum analyzer and the phase thereof.

Abstract: The present disclosure provides devices, systems and methods for the acquisition and display of captured and/or saved slide images of a sample. In particular embodiments, the images are displayed on a portable computer attached to a removable device configured to hold a slide of the sample. The device is aligned with the portable computer so that the displayed sample image is overlaid with the sample being held by the device. In exemplary embodiments, the displayed image is used as a template for dissection of the sample being held by the device.

Abstract: The present invention discloses a device and a method for realizing spectral polarization-independent measurement based on a frequency domain depolarization structure. The device comprises a pump light source module, a depolarization module, an SBS effect generation module and a data acquisition and spectrum reconstruction module. The method comprises: emitting laser light having a fixed polarization state from the pump light source module; the laser light from an output end of the pump light source module passing through the depolarization module to become depolarized light; inputting the depolarized light as pump light into the SBS effect generation module to interact with signal light under test input from the outside into the SBS effect generation module; and after amplifying the signal light under test through the SBS effect generation module, performing data acquisition processing through the data acquisition and spectral reconstruction module and finally obtaining a spectrum of a signal under test.

Abstract: Methods and systems for estimating values of parameters of interest of actual device structures based on optical measurements of nearby metrology targets are presented herein. High throughput, inline metrology techniques are employed to measure metrology targets located near actual device structures. Measurement data collected from the metrology targets is provided to a trained signal response metrology (SRM) model. The trained SRM model estimates the value of one or more parameters of interest of the actual device structure based on the measurements of the metrology target. The SRM model is trained to establish a functional relationship between actual device parameters measured by a reference metrology system and corresponding optical measurements of at least one nearby metrology target. In a further aspect, the trained SRM is employed to determine corrections of process parameters to bring measured device parameter values within specification.

Abstract: To minimize or prevent obstruction by a surface-mounted part or disturbance to an object to be visually observed, an electric field sensor is placed at a predetermined distance from a surface of the object to be visually observed, and a two-dimensional distribution of a high-frequency electric field is detected. Considering that the measured electric field distribution is due to an electrostatic field from the electric field distribution at the surface of the visually observed object, the electric field distribution at the surface is back-calculated from Gauss' flux theorem or the like, and the obtained electric field distribution is displayed or outputted. Thus, the electric field distribution at a position closer to the surface of the visually observed object is imaged while obstruction by a surface-mounted part or disturbance to the visually observed object is suppressed.

Abstract: An apparatus and method for laser voltage testing of a DUT is disclosed. The system enables laser voltage probing and laser voltage imaging of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. The electrical signal is sampled by an ADC and the output of the ADC is sent to an FPGA. The FPGA operates on the signal so as to provide an output that emulates a spectrum analyzer or a vector analyzer.

Abstract: There is provided a method that makes it possible to observe fine crystal defects using light of a visible region. The method includes illuminating a substrate with polarized parallel light and evaluating a crystal quality of at least a part of the substrate from an image obtained by light transmitted through or reflected by the substrate. The half width HW, the divergence angle DA, and the center wavelength CWL of the parallel light satisfy conditions given below 3?HW?100 0.1?DA?5 250?CWL?1600 where the center wavelength CWL and the half width HW are expressed in units of nm and the divergence angle DA is expressed in units of mrad.

Abstract: Disclosed are methods and apparatus for acquiring and displaying whole slide images of crystalline samples. In some embodiments, a slide is placed upon an imaging device with a motorized stage, and a digital imaging device, and all parts of the specimen are imaged and reassembled to display the entire slide as a single image, displayable on PC and transmittable across local and wide area networks and the Internet, then facilitating the acquisition multiple whole slide images of the slide under crossed polarizers rotated at different angles, with each image displayed to the viewer at the angle of polarization.

Abstract: Reflective imager sub-systems that have a non-circular entrance pupil and provide substantially increased throughput to a detecting component of a system are disclosed.

Abstract: An optical sensing device is provided, including a first polarizer, a second polarizer, wherein the first polarizer and the second polarizer have respective transmission axes aligned in orthogonal directions, an SPR sensor arrangement including an SPR sensing surface, the SPR sensor arrangement arranged to receive an incident light beam passed through a polarizer to be reflected at the SPR sensing surface and transmitted through a second polarizer to provide a transmitted light beam, a detector arrangement configured to detect the transmitted light beam, the transmitted light beam including a sensing signal and a reference signal, and a processor electrically coupled to the detector arrangement, the processor configured to perform a subtraction operation between the sensing signal and the reference signal. The optical sensing is based on a differential measurement scheme. The subtraction between the sensing signal and the reference signal cancels the common path noise and enhances the sensor resolution.

Abstract: A scattering measurement system is provided, including: a light source generator for generating a detection light beam with discontinuous multi-wavelengths, and generating a multi-order diffraction light beam with three-dimensional feature information when the detection light beam is incident on an object; a detector having a photosensitive array for receiving and converting the multi-order diffraction light beam into multi-order diffraction signals with the three-dimensional feature information; and a processing module for receiving the multi-order diffraction signals and comparing the multi-order diffraction signals with multi-order diffraction feature patterns in a database so as to analyze the three-dimensional feature information of the object.

Abstract: The present invention for imaging sensor rejuvenation may include a rejuvenation illumination system configured to selectably illuminate a portion of an imaging sensor of an imaging system with illumination suitable for at least partially rejuvenating the imaging sensor degraded by exposure to at least one of extreme ultraviolet light or deep ultraviolet light; and a controller communicatively coupled to the rejuvenation illumination system and configured to direct the rejuvenation illumination system to illuminate the imaging sensor for one or more illumination cycles during a non-imaging state of the imaging sensor.

Abstract: Methods and systems for calibrating system parameter values of a target inspection system are presented. Spectral Error Based Calibration (SEBC) increases consistency among inspection systems by minimizing differences in the spectral error among different inspection systems for a given specimen or set of specimens. The system parameter values are determined such that differences between a spectral error associated with a measurement of a specimen by the target inspection system and a spectral error associated with a measurement of the same specimen by a reference inspection system are minimized. In some examples, system parameter values are calibrated without modifying specimen parameters. Small inaccuracies in specimen parameter values have little effect on the calibration because the target system and the reference system both measure the same specimen or set of specimens. By performing SEBC over a set of specimens, the resulting calibration is robust to a wide range of specimens under test.

Abstract: System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks.

Abstract: A polarizing apparatus includes an electromagnetic wave irradiator to irradiate a target film with an electromagnetic wave to heat the target film; and an electric charge generator to apply an electric field to the target film.

Abstract: A scatterometer is used to measure a property of structures on a substrate. A target grating comprises lines arranged periodically over an distance gp in a first direction, each line individually extending a distance gL in a second direction. The grating is illuminated with a spot of radiation and diffracted radiation is detected and used to calculate a measurement of CD, side wall angle and the like. The spot defines a field of view customized to the grating such that an extent fP of the spot in said first direction is greater than distance gp while an extent fL of the spot in said second direction is less than distance gL- The grating may be smaller than conventional gratings. The calculation can be simplified and made more robust, using a mathematical model that assumes that the grating is finite in the first direction but infinite in the second direction.

Abstract: An apparatus and method for determining optical properties of an object (50) includes a light source (10) and an optical system for illuminating at least one point of the object with light from the light source, and collecting light reflected from the object. A biaxial birefringent crystal (30) intercepts a beam of light reflected from the object and propagates the beam along an optical axis of the crystal and transforms the beam of reflected light to a ring of light having a periphery, each point of which has a different polarization plane. A detector array (40) detects respective points along the periphery of the ring and a processing unit (45) is coupled to the detector and is responsive to signals thereby for determining optical properties of the object.

Abstract: A reflection property measuring device comprising illumination light and reflected light polarizing plates held by a holder in a mutually superposed state in a thickness direction thereof, wherein the holder has a fittingly-holding portion for setting a held posture, and each of the polarizing plates has a fitting portion fittable to the fittingly-holding portion. The fitting portions of the polarizing plates are provided at positions allowing the polarizing plates to be held by the holder in respective postures where polarizing directions thereof intersect orthogonally. A manufacturing method is disclosed for polarizing plates used in the device, wherein the illumination light and reflected light polarizing plates are manufactured in such a manner as to be punched out from the same polarizing plate material.

Abstract: An apparatus and method for generating images of specimens is disclosed. The apparatus includes an imaging system, controller, and user interface. The imaging system generates a plurality of component images of a specimen, each component image corresponding to a different viewing condition. Each image is represented by an intensity as a function of location on the specimen. The controller stores the component images and generates a compound image from a plurality of the component images. The compound image includes a weighted sum of first and second ones of the component images, the controller displaying the compound image on a display controlled by the controller. The user interface is adapted to control a weighting factor used in generating the weighted sum in response to user input. The controller redisplays the compound image after the weighting factor is changed in response to user input.