Abstract: A reflective film thickness measurement method includes reading an original spectral image of a thin film measured by a broadband light source passing through a measurement system, transforming the original spectral image into a broadband reflectance wavelength function and then into a broadband frequency-domain function, dividing the broadband frequency-domain function by a single-wavelength frequency-domain function to obtain an ideal frequency-domain function, inverse-transforming the ideal frequency-domain function into an ideal reflectance wavelength function, and performing a curve fitting on the ideal reflectance wavelength function and a reflectance wavelength thickness general expression, so as to obtain a thickness of the thin film. A spectral image spatial axis direction processing method is performed to eliminate optical aberration in a deconvolution manner, so as to obtain spectral images of high spatial resolution.

Abstract: Reflectance systems and methods are described that under-fill the collection fiber of a host spectrometer both spatially and angularly. The under-filled collection fiber produces a response of fiber-based spectrometers that is relatively insensitive to sample shape and position.

Abstract: There is provided a method of measuring a physical thickness of each of layers of a multilayer film, based on an optical thickness thereof. The method includes: (a) setting refractive indexes of the layers; (b) calculating a coefficient matrix using the refractive indexes; (c) providing light to the multilayer film so as to measure the optical thickness based on the light reflected by the multilayer film; and (d) calculating the physical thickness, based on the optical thickness and the coefficient matrix.

Abstract: A thickness measuring device for measuring the thickness of a layer on a substrate surface of a substrate is provided, including multiple piezoelectric crystal elements, which are arranged in an array corresponding to multiple positions on the substrate surface and which are adapted to monitor the deposition rate of a vapor to be deposited on the substrate surface.

Abstract: Disclosed are systems and methods for determining the shape of a glass sheet during and/or after the forming process. In one example, a system for determining the shape of a glass sheet defining an interior bulk can include a light source, an image capture device and a processor that are configured to calculate the location of an energy centroid within a selected portion of the bulk of the glass sheet.

Abstract: An apparatus and method for measurement of the stress in and thickness of the walls of glass containers is disclosed that uses fluorescence to quickly and accurately ascertain both the thickness of the stress layers and the wall thickness in addition to the stress curve in glass containers. The apparatus and method may be used to quickly and accurately measure both the stress in and the thickness of the side walls of glass containers throughout the circumference of the glass containers. The apparatus and method are adapted for large scale glass container manufacturing, and are capable of high speed measurement of the stress in and the thickness of the side walls of glass containers.

Abstract: Optical radiation sources functioning on different optical bands radiate on different optical bands and focus optical radiation on a region in a web surface as pulses in such a manner that illumination areas of the pulses overlap on the plane of the web. At most one optical radiation band is focused on the web from the direction of the normal. The spatial intensity distribution of at least one optical band differs from the uniform distribution and the intensity distributions of at least two different optical bands differ from one another in a predetermined manner. A camera forms still images of the web surface region on each optical radiation band. An image-processing unit determines the surface topography of the web on the basis of the images. In addition, a controller may control the paper manufacturing process on the basis of the determined surface topography.

Abstract: A method of determining the rate of change of optical thickness of a thin-film during deposition comprising the steps of illuminating the thin-film with electromagnetic radiation having a range of wavelengths, measuring the transmission spectrum of the thin-film at least twice during the deposition process to determine the wavelength ?t or turning points in the transmission spectrum, and using the measurements to determine the rate to change of optical thickness of the thin-film as a function of time. The method further comprises the steps of predicting a time T in the growth process at which the wavelength ?t of the turning point in the transmission spectrum of the thin-film will be substantially equal to the wavelength ?d of the turning point in the transmission spectrum of thin-film at its optical design thickness, and interrupting the growth process such that growth ceases at time T.

Abstract: There is described a method for determining a quantitative parameter of a compound in an analysis sample, comprising: providing a scattering medium in physical contact with the analysis sample, the scattering medium having at least one layer, an index of refraction of the scattering medium being superior to an index of refraction of the analysis sample; propagating, in the scattering medium, an incident beam of light having a wavelength substantially corresponding to an absorption wavelength of the compound such that an evanescent wave is generated at an interface between the scattering medium and the analysis sample; taking n intensity measurements of a reflected beam of light for the analysis sample, n being superior to one; and determining the quantitative parameter of the compound using the n intensity measurements for the analysis sample.

Abstract: Automatic devices that determine when pollutant deposits have accumulated in ductwork may be employed to notify maintenance personnel or automated cleaning equipment of the need for ducts to cleaned or replaced. Various detection devices may be employed to detect a property of accumulated grease and generate an indication of an accumulation. The detection device may present a surface to the fume stream inside a duct. The surface may be cooled to a temperature that represents a worst case temperature so that the accumulation due to condensation on the detector surface is at least as high as the coolest surface in the ductwork which is being monitored. Alternatively, the detection device may be located external to the duct. The detection device may interrogate the surface of the duct through contact or noncontact measurements to determine the thickness of an accumulated grease layer on the interior of the duct.

Abstract: Objects are to reduce the burden on an operator and to improve fabrication efficiency. A transparent conductive film or a transparent optical film formed on a substrate W is irradiated with line illumination light by means of a line illumination device 3, line reflected light reflected at the transparent conductive film or the transparent optical film is detected with a camera, a color evaluation value of the detected reflected light is measured, and a film thickness corresponding to the measured color evaluation value is obtained using a film-thickness characteristic in which the color evaluation value is associated with the film thickness.

Abstract: An object is to reduce film thickness measurement error. Illumination light having different wavelengths is radiated onto a plurality of samples in which thin films having different film qualities and film thicknesses are provided on substrates, evaluation values related to the amounts of transmitted light when the illumination light of each wavelength is radiated are measured, film thickness characteristics, showing the relationship between the evaluation values and the film thicknesses for each film quality, are formed at each wavelength based on the measurement results, and among the film thickness characteristics, a wavelength at which a measurement difference between the evaluation values caused by the film qualities is in a predetermined range is selected.

Abstract: To measure a hollow three-dimensional object without contact, this object being translucent or transparent vis-á-vis a visible light, an image of the object is acquired by single-view backlit shadowgraphy, along a viewing axis, by observing this object with visible light, this image comprising at least one luminous line, an equation is established that connects at least one optogeometric parameter of the object to at least one geometric parameter of the luminous line, this geometric parameter is determined, and the optogeometric parameter is determined by means of the equation and the geometric parameter thus determined.

Abstract: An optical system and measurement method for imaging three-dimensional objects with low light scatter comprising at least one source of radiation; a radiation projection means for creating a set of foci through a volume of an object; and a means for imaging the returned light from the set of foci on at least one camera, wherein the imaging of the volume of the object is at a different angle from the projection, allowing for detection of the returned light on separate camera pixels. The measurement method further comprises projecting a longitudinal grid of elongated foci through the volume of an object; imaging returned light from the object at a different angle on at least one camera, so as to avoid overlapping the elongated images; and analyzing the imaged, returned light to yield depth information of the object at a multiplicity of points.

Abstract: In a method of obtaining an optical constant of each the films of a film-stacked structure formed on a substrate, a basic process obtains an optical constant of each of the films by successively providing the films one by one as a target film from bottom to top and obtaining an optical constant of the target film by using a previously obtained optical constant of a below-located film that is located below the target film and a re-obtaining process re-obtains the optical constant of each of the films by correcting the previously obtained optical constant of the below-located film and the optical constant of the target film obtained in the basic process.

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract: A sheet thickness measuring device includes: an illumination unit that outputs a light that is illuminated into a stack of sheets from a first area defined on one of faces including a top face, a bottom face, and side faces of the stack of sheets; a detection unit that detects a light amount distribution of light entered into the stack of sheets and propagated to a second area through the stack of sheets, the second area defined on one of the side faces of the stack of sheets; and a calculation unit that calculates a thickness of a sheet in the stack of sheets based on the light amount distribution detected by the detection unit.

Abstract: An object is to reduce film thickness measurement error. Illumination light having different wavelengths is radiated onto a plurality of samples in which thin films having different film qualities and film thicknesses are provided on substrates, evaluation values related to the amounts of transmitted light when the illumination light of each wavelength is radiated are measured, film thickness characteristics, showing the relationship between the evaluation values and the film thicknesses for each film quality, are formed at each wavelength based on the measurement results, and among the film thickness characteristics, a wavelength at which a measurement difference between the evaluation values caused by the film qualities is in a predetermined range is selected.

Abstract: Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.

Abstract: Systems and methods for determining liquid depth information in a condensate pan of a climate control unit are provided. The systems and methods radiate a light beam into a liquid contained in a condensate pan associated with a climate control unit. The light beam is detected at a point of the condensate pan that is below a surface of the liquid. Information related to the depth of the liquid is determined based at least in part on the detected light beam. The systems and methods disclosed herein can determine if liquid depth in a condensate pan is greater than a threshold depth and can control evacuation of the liquid from the condensate pan.

Abstract: A technique for optical measurement of a thickness of a layer on a surface uses diffuse reflections at opposite boundaries of the layer, operates on transparent, or translucent layers. The thickness is determined by computing a separation between the centers of the two diffuse reflections, and using the index of refraction of the layer, and geometric properties of a beam and detector with respect to the surface. The technique is useful for quantifying thickness of a layer of rime ice, glaze ice, frosted ice, or water, for example.

Abstract: A measuring device and method are disclosed for parameter distribution measurement over the entire surface of sheet-like objects. The parameters of primary interest are thickness and permeability profiles. The device includes a parameter measuring unit a coordinate measuring unit and a synchronization unit to control operation of the parameter measuring unit and the coordinate measuring unit. The coordinate measuring unit determines the measuring device position on two-dimensional surface using image correlation analysis. The measuring device further comprises a platform for its movement in the plane of the sheet-like object.

Abstract: The invention relates to device for measuring the thickness of a transparent sample (2), particularly a glass strip or a glass pane, involving the use of: a first light beam (L1), particularly a first laser beam, which strikes upon the front surface (8) of the sample (2) at a first angle of incidence (?1); a second light beam (L2), particularly a second laser beam, which strikes upon the front surface (8) of the sample (2) at a second angle of incidence (?2), the first angle of incidence (?1) and the second angle of incidence (?2) being different, and; at least one detector (11, 12) for detecting the light beams (L1?, L1?, L2?, L2?) of the first and second incident light beams (L1, L2) reflected by the sample, and for determining the position thereof.

Abstract: A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intensity is measured by a reflection light intensity monitor at the same points and at the same number of points on the substrate. From the value of “A=1?(R+T)” where R represents reflectivity and T is transmissivity, film thickness is measured and evaluated from the relation of the value A with film thickness. By this procedure, film thickness can be determined on 10,000 substrates or more per minute and film thickness of thin film can be measured over the entire substrate surface.

Abstract: This invention concerns the in-situ and real-time determination of thickness, optical properties and quality of transparent inorganic thin films (oxides, nitrides) and organic materials during their growth and during modification of transparent polymeric materials, with the use of Spectroscopic Ellipsometry, with measurements in the spectral region of Vis-FUV from 1.5-6.5 eV, and IR from 0.1-0.49 eV (900-4000 cm?1). This method can be used in-line for the monitoring and/or control of the processes in air and in vacuum, that concern substrates on which the thin films will be grown, and of the growth processes of transparent oxides, nitrides and other inorganic and organic films with final result the production of integrated systems with desirable properties.

Abstract: To enable precise measurement of a cellular thickness distribution regardless of changes in the refractive index of a culture solution with the progress of culture. There is provides a culture vessel made of a transparent material with a culture surface capable of culturing cells in an adhesive manner on the bottom face, wherein a reference substance having an already known refractive index and an already known thickness dimension is fixed to a part of the culture surface.

Abstract: An apparatus for detecting non-uniform cell gap in a liquid crystal display panel is disclosed, which comprises a first plate, an axle, and a cell gap detecting unit. A surface of the first plate has at least one holding mechanism for fixing at least one the liquid crystal display panel onto the first plate. The axle connects to the first plate and is used to rotate the first plate. The cell gap detecting unit detects the cell gap in the liquid crystal display panel.

Abstract: A high-density channels detecting device for detecting a sample is provided. The high density detecting-device has a light source for emitting a light beam, a collimator, a beam splitter, and a high-density channels imaging device. The collimator arranged on the beam path is used for collimating the emitted light beam. The beam splitter reflects the light beam incident from the collimator to the sample, and the light beam reflected by the sample passes through the beam splitter. The imaging device receives the light beam passing through the beam splitter, and has a light collector and a multi-channel kernel module for receiving the light beam from the light collector. By using the light collector, the light beam incident to the kernel module is parallel to the optical axis of the kernel module.

Abstract: A method for detecting the wall thickness of a container such as a bottle made of PET, for example, in which the absorption of radiation along a first and a second test path of the measurement radiation is ascertained, whereby the test paths intersect the container at two points of intersection such that the two test paths have at least one point of intersection approximately in common. Further, a method for detecting the wall thickness of a container such as a bottle made of PET, for example, such that the wall thickness is detected in the transitional area of a side wall of the container to a bottom area of the container.

Abstract: Waveguide gratings, biosensors, and methods of using a waveguide grating, including as a biosensor.

Abstract: Provided is a visual inspection apparatus for a semiconductor wafer, by which a threshold value optimal for inspection can be determined and visual inspection of each chip can be performed based on the threshold value, by obtaining in advance a table indicating a relation between a film thickness of a thin film in specific positions in the wafer and a gradation value for each sample area in the chip, measuring the film thickness of the thin film in the specific positions of the wafer to be inspected before inspecting the chip, and comparing the measured film thickness with the gradation value in the table.

Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.

Abstract: A measuring instrument, in particular for transmission measurement with transparent substrates, comprises a measuring head with a light emitting element for emitting a light beam and a light receiver element for recording an incident light beam, and a retro-reflector for reflection of the emitted light beam. The measuring instrument allows transmission measurements to be carried out on transparent substrates with only one reflection measuring head. The measuring instrument also allows reflection measurements to be carried out, for example on non-transparent substrates or by tilting the measuring head and covering the retro-reflector. The measuring instrument only requires one measuring head and can therefore be produced more cost-effectively. It does not require calibration, as the retro-reflector also reflects the light in the original direction in the case of oblique incidence and in the event of positional changes caused by process or operational factors (vibrations etc.).

Abstract: The present invention relates to a non-contact/non-destructive method and apparatus for measuring the thickness of an ophthalmic lens. The present invention also provides a method for inspecting or measuring the base curve of a lens.

Abstract: An interfacial position measuring method for a substrate internally having a plurality of interfaces parallel to one another. A light-convergent line which has converged in only a one-axis direction out of parallel light having an optical axis vertical to the substrate surface is formed so as to be inclined with respect to the substrate surface, and the light-convergent line is made to intersect with the substrate. Out of reflected light of the light-convergent line reflected by the substrate, a position having a light intensity peak is taken as an interface, by which a plurality of interfaces inside the substrate can be measured simultaneously and high-speed interfacial position measurement can be achieved.

Abstract: A method and apparatus for protecting an optical transmission measurement when sensing transparent materials. Sensing apparatus located in a housing directs a light beam at an upward angle to a sheet of transparent material and detects downward surface reflections of the beam from the transparent material. The light beam and the reflections pass through a transparent protective layer on the housing. A flow of clean air is passed between the protective layer and the transparent material to remove particles and liquid from the protective layer and from the space between the protective layer and the transparent material. Preferably, the protective layer is either made from a hydrophobic material or has a hydrophobic surface coating to facilitate blowing liquid and particles from the surface.

Abstract: The method measures the thickness of a hot glass body without direct contact with the glass body and is based on chromatic aberration. This method includes focusing a light beam from a light source on the hot glass body using a focusing device immediately after formation; conducting reflected light from the glass body into a spectrometer to obtain a reflected light spectrum; finding two wavelengths of the reflected light from the front side and the rear side of the glass body respectively at which reflected light intensities are maximum; determining the thickness of the glass body from the difference between the two wavelengths; maintaining the focusing device at a temperature below 120° C. during the measuring of the thickness and substantially preventing heat radiation from reaching the focusing device using at least one heat-blocking filter.

Abstract: An apparatus for inspecting sidewall thickness of non-round transparent containers includes a conveyor for holding a container in stationary position and rotating the container around an axis. A light source directs light energy onto a sidewall of the container on the conveyor. An anamorphic lens system having a lens system axis directs onto a light sensor energy reflected from portions of the inside and outside surfaces of the container sidewall that are substantially parallel to the lens system axis. An information processor is responsive to the sensor for determining sidewall thickness at increments of container rotation as a function of separation at the sensor between light energies reflected from the inside and outside surfaces of the container sidewall.

Abstract: A method is provided for measuring the wall thickness of transparent articles using uniform diverging light in the form of a small point source or elongated narrow line of light, measuring the spacial separation of the reflections from the nearest and furthest surface by means of a two-dimensional image sensor and a computational device to calculate the geometrical corrections needed to provide accurate thickness measurements. In situations where significant thickness variations occur, a symmetrical two view embodiment using two uniform diverging light sources and two image sensors at equal but opposite angles of incidence from the same side of the object, provides a means to correct for errors caused by internal prism effects as a result of undulations of either the nearest or furthest surface. This system provides accurate thickness measurements over a wide range of object movement.

Abstract: A system and method for measuring coating thickness upon a substrate is disclosed. A near infrared light is directed upon the coating and reflected near infrated light is collected to determine the coating thickness. A diffuser is placed between the coating and the reflected near infrared light collector to improve the accuracy of the measurement, especially for coating thickness of less than about 2 mils and for coatings with shiny surfaces. The diffuser is formed of a low density polytetrafluoroethylene fluoropolymer film.

Abstract: A spectroscopic sensor for measuring flat sheet product is disclosed. The disclosed sensor uses a combination of spectrometers and single-channel detectors and filters together with a broadband source of illumination to optimally measure multiple properties of a flat sheet product. A spectrometer is used to measure over a spectral range where an easily configurable set of wavelength channels is needed and where the signal-to-noise ratios and spectral resolutions of the channels are consistent with the spectral range and number of pixels of the spectrometer; while one or more single channel detector and filter combinations are used to measure, with high signal-to-noise ratio, at specific wavelengths within or outside the spectral range of the spectrometer(s).

Abstract: An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a multitude of measuring frequencies. An analyzing unit determines the respective reflectance and relative phase change and/or relative amplitude change in relation to the respective measuring frequency. In addition, a reflectance spectrum, a relative phase change spectrum and/or a relative amplitude change spectrum may be obtained. By performing a Fourier transformation of the respective spectrum, a secondary Fourier spectrum is obtained. The secondary Fourier spectrum plots a virtual amplitude against corresponding values of a frequency periodicity that correspond to a substrate depth. Peaks of the virtual amplitude may indicate reflective planes within the substrate at respective depths.

Abstract: A measurement system for measuring aspects of a wafer combines an apparatus for performing a conductivity measurement, such as a four-point probe system, with apparatus for performing an optical measurement, such as a photoacoustic measurement system. Results are obtained and combined to provide comprehensive data sets describing the characteristics of the thin film substrate therein.

Abstract: Method for measuring thicknesses of a film, a foil or a material layer with a measuring head which is spaced away from the film and with which a capacitive thickness measurement is performed, in which an optical distance measurement is performed with a distance measuring device and a distance determined by the optical distance measurement is used in determining the film thickness in the capacitive thickness measurement.

Abstract: A method for measuring the thickness of a thin film disk overcoat layer includes radiating x-rays on a thin film disk comprising at least one base layer and an overcoat layer, collecting fluorescence data on electromagnetic radiation fluoresced from the thin film disk, reflecting polarized light from a surface of the thin film disk corresponding to the overcoat layer, collecting ellipsometry data from the polarized light, and estimating the thickness of the overcoat layer using both the fluorescence data and the ellipsometry data. The method may further include providing a statistical model to determine optimal deposition and manufacturing parameters. A system to conduct the described method may include a data analyzer, an ellipsometry measurement device, and an x-ray fluorescence measurement device.

Abstract: An optical surface analysis system for scanning the surface of a (silicon) wafer and detect if any residual material is still on the wafer surface in order to determine an appropriate end-point in a polishing process. An Optical Surface Analyzer (OSA), of the present invention, is generally used to identify composition, measure surface area, and measure thickness variations of thin film layers of material. The difference in optical properties (index of refraction) of different materials on the surface allows the system of the present invention to separate different materials on the wafer surface using the histogram plots generated by the OSA. This method is used to detect and make a quantitative assessment regarding the amount of residual material to be removed by the polishing process and, therefore, when an appropriate end-point has been reached in the polishing process.

Abstract: A safety monitoring mechanism of a wafer fabrication platform is disclosed. The mechanism comprises a vibration sensor mounted at the loading apparatus of the wafer fabrication platform for detecting vibration generated during the operation of the loading apparatus; a determination module for receiving the vibration detected by the vibration sensor and to convert the vibration into digital signals and for contrast analysis with the preset standard signal range; and an alarm apparatus which produces an alarm signal to operator when the detected digital signal by the vibration sensor exceeds the standard signal range for being abnormal after contrast analysis with that of the module.

Abstract: A method for measuring three-dimensional objects by single view backlit shadowgraphy. To measure at least one geometrical parameter of such an object, for example the thickness of a hollow sphere, translucent or transparent to visible light, optical characteristics of the object are determined, by which at least one optical model of the propagation of light through the object is established. This model includes an equation that relates the parameter to the result of an observation directly performed on an image of the object, the object being acquired by observing the object by single view backlit shadowgraphy. The image is acquired, the observation is performed, and the parameter is determined by the equation and the result of the observation.

Abstract: A sensing system and method for biomolecular sensing. The system includes: a receptor for the at least one target, the receptor including a substrate and a transparent coating on the substrate having front and back surfaces; a light source positioned to direct at least a portion of light from the light source toward the coating on the receptor; and a detector positioned to capture the light reflected from the front and back surfaces of the coating, the detector identifying presence of at least one target based on a change in the interference pattern of captured light.

Abstract: A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration of the reflectometer.