Abstract: A multilayer film reflector for X-rays has alternately stacked layers formed on a substrate and comprising a layer (high refractive index layer) comprising a material having a large difference between a refractive index to soft X-ray and a refractive index in vacuum, and a layer (low refractive index layer) comprising a material having a small difference between a refractive index to soft X-ray and a refractive index in vacuum, wherein at least one intermediate layer having a crystalline structure is provided between the low refractive index layer and the high refractive index layer. Thereby, the crystallization of the low refractive index layer is promoted, the refractive index of the low refractive index layer is lowered, so that the reflectance of the multilayer film reflector is improved.

Abstract: In accordance with the invention, a filter is fabricated by a modified form of the process disclosed in U.S. Pat. No. 7,068,430. In particular, the method is modified to take into account the effect of absorption by filter material. The method is exemplified by the fabricating of an ultraviolet light transmission filter for transmitting a band within the range 230-320 nanometers. The resulting filter comprises plurality of hard-coating, thin-film layers of alternating high and low index of refraction. The improved filter provides high transmission, sharp edge slopes, and deep and extended out-of-band blocking. As compared with currently available filters, the filter provides transmission up to three or more times greater, edge slopes up to four times sharper, and deep extended out-of-band blocking extending further, even through the visible range.

Abstract: Low-emissivity coatings that are highly reflective to infrared radiation. The coating includes three infrared-reflection film regions, which may each include silver.

Abstract: An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (3), e.g. fabricated from crystalline calcium fluoride. A filter coating (5) fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface (4) of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.

Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

Abstract: This invention relates to the field of thermophotovoltaic (TPV) direct energy conversion. In particular, TPV systems use filters to minimize parasitic absorption of below bandgap energy. This invention constitutes a novel combination of front surface filters to increase TPV conversion efficiency by reflecting useless below bandgap energy while transmitting a very high percentage of the useful above bandgap energy. In particular, a frequency selective surface is used in combination with an interference filter. The frequency selective surface provides high transmission of above bandgap energy and high reflection of long wavelength below bandgap energy. The interference filter maintains high transmission of above bandgap energy and provides high reflection of short wavelength below bandgap energy and a sharp transition from high transmission to high reflection.

Abstract: The invention relates to a narrow-band spectral filter. The aim of the invention is to reduce the radiation exposure of optical elements used in highly ultraviolet light by using an optical filter that is simple in construction and that preselects a wavelength band of a predetermined bandwidth. To this end, an optical filter is provided that comprises at least one zirconium, niobium, or molybdenum layer interposed between two silicon layers. In order to increase the mechanical stability and the service life of the filter and in order to further restrict the spectral characteristics, another two ruthenium or rhodium layers each can follow the silicon layers. The filters of this kind are especially used in illumination systems and projection illumination systems for highly ultraviolet light that are used in semiconductor lithography.

Abstract: An infrared filter includes an optical filter stack disposed on a first surface of a substrate, the optical filter stack includes a plurality of dielectric layers and a plurality of metal layers alternating with the dielectric layers. and a transmission-enhancing coating. The infrared filter obtains an average transmission greater than or equal to 75% between 400 nm and 600 nm.

Abstract: A material with spectrally selective reflection in the primary valences of red, green and blue is applied preferably onto laser projection screens in order to make possible the projection even in daylight. In a first embodiment, a first layer of a material that is highly reflective over the entire range of visible light, e.g., aluminum is applied onto a substrate, e.g., glass or a synthetic material, followed by a second layer of a material that is essentially non-absorbing over the entire range of visible light, e.g., SiO2. A third layer in contact with air is applied to the second layer and is made of a material that is partially transmissive over the entire range of visible light, e.g., of NiCr An alternative embodiment comprise five layers, The first layer is made a material with a high index of refraction, e.g.; TiO2, a second of a material with a low index of refraction, e.g., SiO2, the third of a material with a high index of refraction, e.g.

Abstract: A low-reflective thin-film substrate comprising a transparent glass substrate having formed by sputtering a thin film in multilayer containing no chromium series component and made up of at least one kind of Ni, Fe, Co, Mo, W, Ta, Cu, and Nb as a main constituent form or as an alloy thereof, the thin film having a minimum reflectivity of 0.5% or lower and the optical density of at least 4 or having a minimum reflectivity of 0.1% or lower, a maximum reflectivity of 2.0% or lower, an average reflectivity of 0.3% or lower, and an optical density of at least 4.0, in the visible light region. The low-reflective thin-film substrate is useful as a black matrix for a color filter substrate of a liquid crystal panel, etc., and is free from an environmental pollution caused by the use of a chromium component as the target material.

Abstract: A solar control film which includes an adhesive layer for adhering the solar control film to a substrate, a metallized layer and a scratch resistant layer containing dispersed carbon black particles wherein the metallized layer is between the adhesive layer for adhering to a substrate and the scratch resistant layer. The solar control film can be prepared by a process which involves mixing a composition comprised of carbon black in particulate form dispersed in a nitrocellulose resin with a polymer forming material to form a coating composition and applying the coating composition to a component of a solar control film whereby the coating composition forms a scratch resistant layer containing dispersed carbon black particles.

Abstract: The present invention provides a wave plate capable of obtaining preferable phase conversion characteristic over a wide wavelength range. The wave plate includes an aluminum oxide film having linear grating groove patterns. The period L (?m) and the duty ratio De of the grating groove patterns are set at values within the first range specified by the following four formulas: L?0.65 L?2×10?14e31.263De L?6.0317De2?10.352De+5.0516 (De?0.85)2/0.442+(L?0.41)2/0.

Abstract: A solar control panel comprises a glazing substrate and a solar control coating in which the solar control panel exhibits a luminous transmittance of less than 70%, a direct energy transmittance of less than 40% and a dominant wavelength in reflection of less than 510 nm and in which the solar control coating comprises in sequence at least: a first antireflective layer; a first infrared reflecting layer; a first barrier layer; a second antireflective layer; a second infrared reflecting layer; a second barrier layer; and a third antireflective layer; and in which the solar control coating comprises at least one additional light absorbing layer spaced from each of the barrier layers.

Abstract: A reflective film used as a reflective electrode or a reflector, comprising an Ag-based alloy containing rare earth metals. The reflective film has high reflectivity and high durability.

Abstract: A security article includes a light transmissive substrate having a first surface and an opposing second surface, with the first surface having an embossed region with an optical diffraction pattern or a holographic image pattern. A color shifting optical coating is formed on the substrate such as on the opposing second surface, with the optical coating providing an observable color shift as the angle of incident light or viewing angle changes. The security article can be used in a variety of applications and products to provide for enhanced security measures such as anticounterfeiting.

Abstract: A corrosion and ultra violet-resistant silver mirror for use in solar reflectors; the silver layer having a film-forming protective polymer bonded thereto, and a protective shield overlay comprising a transparent multipolymer film that incorporates a UV absorber. The corrosion and ultraviolet resistant silver mirror retains spectral hemispherical reflectance and high optical clarity throughout the UV and visible spectrum when used in solar reflectors.

Abstract: A method for optically coupling a thermoplastic material to an outer surface layer of an organic, dielectric, optical film and the resulting optical filter. Initially, a dielectric film is selected that includes (i) repeating optical layers of at least two polymers having different refractive indexes from each other, (ii) an exterior film surface, (iii) a refractive boundary along the exterior film surface, and (iv) a delamination threshold based on total thermal energy delivered to the film. A thermoplastic material which is miscible with the exterior film surface is fused to the refractive boundary with thermal energy below the delamination threshold to form a polydisperse region having a higher optical transmission than the refractive boundary. Add-on filters in the form of hardcoat layers, anti-reflection layers, holograms, metal dielectric stacks and combinations of these may be combined with the thermoplastic-film construct.

Abstract: An electrically conductive film contains electrically connected first and second visible light-transmissive metal or metal alloy layers separated by a visible light-transmissive crosslinked polymeric layer. The film can be joined or laminated into glazing (especially non-planar vehicular safety glazing) with reduced likelihood that the metal or metal alloy layers will be damaged or distorted. The film also can transparently shield a device that can cause or is sensitive to electromagnetic interference with reduced likelihood that the metal or metal alloy layers will fracture.

Abstract: A vehicular navigation system which utilizes an optical arrangement installed in eyeglasses or on the vehicle window or windshield so as to impart improved guiding directions to the vehicle. The navigation system enables a user to display their positional coordinates through the intermediary of a global positioning system (GPS) which communicates with a computer of the system. An additional element to current GPS (Global Positioning Systems), which utilizes an optical system located either on the windshield of a vehicle, such as an automobile or truck, or on the eyeglasses of a driver, or possibly on the windshield of an aircraft, which mimics an arrow pointing in the direction in the driver should be traveling.

Abstract: An optical component or an analytical platform includes a substrate, an array of microstructures on the substrate and microchannels formed by side walls of adjacent microstructures, a width of the microchannels varies as a function of distance to the substrate, the width continuously decreasing with increasing distance from the substrate within at least one distance-interval. In a method for producing such a component or such a platform a substrate with an array of surface microstructures is coated in a vapor treatment in such a way that shadowing effects of the coating mechanism narrow at least partially a width of the upper parts of side walls of the microstructures thereby forming at least partially embedded microchannels.

Abstract: Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.

Abstract: The invention describes a system and methods for filtering electromagnetic and visual transmissions and for minimizing acoustic transmissions. Various combinations of UV, IR, and yellow-tinted filters are applied in various physical configurations to a transparent substrate such as a plastic film or glazing of a window for modifying selected wavelengths of electromagnetic radiation. For instance a light filter may have a multi-layered metallic sputtered stack having a relatively low sheet resistance. The combination of filters prevents or attenuates the passage of selected wavelengths through the substrate as needed to address security risks. The combination of filters is useful to prevent unauthorized data collection and information exchange from or within buildings or otherwise prevent such unauthorized data collection and information exchange from, for example, computer monitors or screens, personal digital assistants, and local area networks.

Abstract: In a transparent laminate, n thin-film units (n=3 or 4) are laminated unit by unit successively on a surface of a substrate, and a high-refractive-index transparent thin film is deposited on a surface of the laminate of the n thin-film units, each of the n thin-film units consisting of a high-refractive-index thin film and a silver transparent conductive thin film. When the silver transparent conductive thin films are deposited by a vacuum dry process, the temperature T(K) of the transparent substrate at the time of film deposition is set to be in a range 340?T?410, whereby the transparent laminate having a standard deviation of visible light transmittance which is not larger than 5% in a wave range of from 450 to 650 nm can be produced.

Abstract: The present invention has as its object to provide an optical system which can generally be easily made compact and light in weight and wide in angle of field when image information displayed on a display unit such as a liquid crystal display is observed, and an image displaying apparatus using the same.

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate.

Abstract: An optical filter including at least one substrate and first and second thin-film interference filters disposed directly on the substrate. The interference filters include a plurality of hard coating thin film layers of alternating high and low index of refraction. A fluorescence spectroscopy system and method of selecting a band of wavelengths from light in a fluorescence spectroscopy system are also provided.

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.

Abstract: An optical lens including an optically clear lens element; and a light absorbing coating on a surface of the lens that attenuates transmitted light; has a coloured or colourless reflection as seen from the front of the sunglass lens; and is anti-reflective as seen from the eye side of the lens.

Abstract: A device serves for reflecting electromagnetic waves in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

Abstract: An infrared transparent optical element for use as an optical window for an infrared imaging camera includes an infrared transparent substrate, an antireflection film, and a protective film of a polymer material. The infrared transparent substrate has first and second major surfaces opposite each other, and the antireflection film is disposed on each of the first and second major surfaces of the substrate. The protective film is on an outer surface of the antireflection film on the first major surface of the substrate.

Abstract: A heat-absorbing system comprising at least a first layer (A) containing a ultraviolet absorber, a second layer (B) containing an organic infrared absorber and ultraviolet absorber and a third, interference layer (C) reflecting in the infrared range is disclosed. The system is suitable for shielding plastic glazing elements from heat radiation.

Abstract: A security article includes a light transmissive substrate having a first surface and an opposing second surface, with the first surface having an embossed region with an optical diffraction pattern or a holographic image pattern. A color shifting optical coating is formed on the substrate such as on the opposing second surface, with the optical coating providing an observable color shift as the angle of incident light or viewing angle changes. The security article can be used in a variety of applications and products to provide for enhanced security measures such as anticounterfeiting.

Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thickness—i.e. constant partition ratio—multilayer stacks commonly designed and, fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), we have observed peak reflectivity enhancements of up to 5% for a single reflector compared to a standard unoptimized stack.

Abstract: A main object of the present invention is to provide a novel optical power limiting material of high performance being less susceptible to damages caused by heat occurring when an intensified laser beam is irradiated, having reversible characteristic and exhibiting a stable optical power limiting effect; production of the optical power limiting is simple and economical. The optical power limiting material of the present invention comprises a transparent substrate and an oxide(s) of at least one metal selected from the group consisting of of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi.

Abstract: Multilayer-film mirrors are disclosed that include multiple units of Mo and Si layers formed on the surface of a mirror substrate and that exhibit reduced internal stress and hence improved imaging properties. Hence, the mirrors are especially suitable for use in X-ray optical systems such as used in X-ray lithography systems. In an exemplary mirror, a molybdenum oxide layer is formed on at least one Mo layer at the interface surface between the Mo layer and an adjacent Si layer. The molybdenum oxide layer is formed by irradiation with oxygen ions, or by forming at least a portion of the Mo layer in an atmosphere including oxygen.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: A multi-layer anti-reflection coating for simultaneously coupling electromagnetic radiation of two different wavelengths, &lgr;1 and &lgr;2, where &lgr;1 is greater than &lgr;2, from a first region into a second region is provided. The first region has an index of refraction that is smaller than that of the second region. The anti-reflection coating comprises three layers: (a) a first layer and a third layer that are essentially invisible to &lgr;1 and serve to reduce Fresnel losses for &lgr;2 and (b) a second layer sandwiched between the first and third layers that serves to reduce Fresnel losses for &lgr;1. The thickness and the index of refraction are calculated for each layer.

Abstract: A heat treatable coated article including an infrared (IR) reflecting layer (e.g., of or including Ag), the coated article being able to attain a &Dgr;E* (glass side) no greater than about 3.0, more preferably no greater than 2.5, and even more preferably no greater than 2.0, following or due to heat treatment (e.g., thermal tempering). Accordingly, low-E (i.e., low emissivity) coated articles of certain embodiments of this invention appear from the glass side thereof visually similar to the naked eye both before and after heat treatment. Coated articles herein may be used in the context of insulating glass (IG) window units, vehicle windshields, or any other suitable applications. In certain embodiments of this invention, an exemplary layer stack includes: glass/Si3N4/NiCr/Ag/NiCr/Si3N4. Other materials may instead be used without departing from the scope and/or spirit of the instant invention which is a low-E matchable product.

Abstract: The invention relates to a transparent substrate, more particularly of glass and having multiple thin layers on which are successively deposited; i) a first dielectric material layer, ii) a first layer having infrared reflection properties, particularly based on metal, iii) a second dielectric material layer, iv) a second layer having infrared reflection properties, particularly based on metal, v) a third dielectric material year, characterized in that the thickness of the first layer having infrared reflection properties corresponding to about 50 to 80%, particularly 55 to 75% and preferably 60 to 70% of that of the second layer having infrared reflection properties.

Abstract: An embodiment of the present invention includes an outer capping layer, a multilayer (ML) stack, and an inner capping layer. The outer capping layer is made of an outer material and has an outer thickness. The multilayer (ML) stack is below the outer capping layer. The inner capping layer is made of an inner material and has an inner thickness and is located between the ML stack and a ML reflector. The inner thickness is selected to enable constructive interference between the ML stack and the ML reflector.

Abstract: A reflector assembly for a UV energy exposure system includes a funnel adapted to be connected to a UV energy source to funnel UV energy from the UV energy source longitudinally and a reflector connected to the funnel to redirect the UV energy from the funnel laterally to an object.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: A number of k sets of light transmissive members are prepared, k being an integer of 2 or greater, where each set thereof may consist of a plurality of first light transmissive plates and a plurality of second light transmissive plates, and (K+1) third light transmissive plates having a greater thickness than those of the first and the second light transmissive plate. A composite plate member is produced by alternately arranging and bonding one set of the plurality of first light transmissive plates and the plurality of second light transmissive plates to each of the spaces between the (K+1) third light transmissive plates, and alternately arranging a plurality of polarization separating films and a plurality of reflecting films on each interface in the composite plate member.

Abstract: The present invention discloses an EUV mask having an improved absorber layer with a certain thickness that is formed from a metal and a nonmetal in which the ratio of the metal to the nonmetal changes through the thickness of the improved absorber layer and a method of forming such an EUV mask.

Abstract: An optical filter in the form of a film which can be used in a window to control the amount of absorbed light, reflected light, transmitted light and solar energy rejection. The optical filter contains a unique combination of an interfering Fabry-Perot stack and a massive Fabry-Perot stack.

Abstract: A telescope apparatus for celestial observations by a reflecting telescope which is provided with: a first reflecting mirror 3 having its surface 3a coated over the entire area thereof with a grid-like metallic film 10 that reflects radio waves 1 but permits the passage therethrough of infrared and visible rays 2 and having its back 3b coated over the entire area thereof with a full-face metallic film that reflects both of the radio waves 1 and the infrared and visible rays 2; and a second reflecting mirror 4 having its surface 4a coated over the entire area thereof with the grid-like metallic film 10 that reflects the radio waves 1 but permits the passage therethrough of the infrared and visible rays 2 and having its back 4b coated over the entire area thereof with the full-face metallic film 11 that reflects both of the radio waves 1 and the infrared and visible rays.

Abstract: Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.

Abstract: The infrared absorption filter of the present invention has a transmittance of not higher than 30% in the near-infrared region in the wavelength range of 800 to 1100 nm; a difference of 10% or less between a maximum value and a minimum value of transmittance in the visible light region in the wavelength range of 450 to 650 nm; and a transmittance of not lower than 50% at a wavelength of 550 nm, the filter being so excellent in environmental stability that after being left to stand in the air atmosphere at a temperature of 60° C. and a humidity of 95% for 1000 hours, the filter can maintain said spectral property in said range. Consequently, when used for a plasma display or the like, the filter can absorb the unwanted infrared rays radiated from the display, resulting in preventing erroneous operation of a remote control using infrared radiation even in such a high-temperature and high-humidity environment.

Abstract: The infrared absorption filter of the present invention has a transmittance of not higher than 30% in the near-infrared region in the wavelength range of 800 to 1100 nm; a difference of 10% or less between a maximum value and a minimum value of transmittance in the visible light region in the wavelength range of 450 to 650 nm; and a transmittance of not lower than 50% at a wavelength of 550 nm, the filter being so excellent in environmental stability that after being left to stand in the air atmosphere at a temperature of 60° C. and a humidity of 95% for 1000 hours, the filter can maintain said spectral property in said range. Consequently, when used for a plasma display or the like, the filter can absorb the unwanted infrared rays radiated from the display, resulting in preventing erroneous operation of a remote control using infrared radiation even in such a high-temperature and high-humidity environment.