Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A projector device, includes: a projector unit, including a light source and a projection lens whose focal position is variable, that projects an image upon a projection surface with a light flux outputted from the light source that passes through the projection lens; an image-capturing unit, including a photographic lens whose focal position is variable, that captures an image of a subject with a light flux from the exterior that passes through the photographic lens; and a single drive source that generates drive force for changing both the focal position of the projection lens and the focal position of the photographic lens.

Abstract: A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.

Abstract: In one or more embodiments, an all-reflective optical system includes a primary mirror of ellipsoidal configuration, a secondary mirror of hyperboloidal configuration facing the primary mirror, and an eye-piece that includes: a positive-powered tertiary mirror having a majority of positive power that is expected in the eye-piece and configured to substantially collimate light rays incident thereon; and a negative-powered near-flat quaternary mirror having lesser power than the tertiary mirror and configured to receive the substantially collimated light rays from the tertiary mirror, further collimate the received light rays and reflect the further collimated light rays to an exit pupil. The primary mirror, the secondary mirror and the eye-piece thereby form an afocal optical system.

Abstract: The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane. The first optical element group comprises a first optical element with a reflective first optical surface and a second optical element with a reflective second optical surface. The second optical element group comprises a third optical element with a reflective third optical surface. The first optical element and the second optical element are formed and arranged such that on formation of the image of the object point, in each case a multiple reflection of at least one imaging beam takes place on the first optical surface and the second optical surface.

Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.

Abstract: An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical system for forming an image of a first surface and an image of a second surface on a third surface comprises a first imaging optical system, a second imaging optical system, a third imaging optical system, a fourth imaging optical system, a fifth imaging optical system, a sixth imaging optical system, a seventh imaging optical system, a first folding member disposed between the third imaging optical system and the seventh imaging optical system, and a second folding member disposed between the sixth imaging optical system and the seventh imaging optical system.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: An exemplary laser device includes a laser source and an optical module. The laser source is configured for emitting a laser beam in the TEMxy mode, wherein 0?x?3, and 0?y?3. The optical module includes a cylindrical-type lens disposed on a light path of the laser beam. The cylindrical-type lens has a first surface and an opposite second surface, and the first surface faces toward the laser source. At least one of the first surface and the second surface is a cylindrical-type curved surface configuring for adjusting a field distribution of the laser beam of the laser source.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an edge to a center thereof.

Abstract: A multiple instrument distributed aperture sensor (“MIDAS”) science payload system mounted on a spacecraft, including a spacecraft interface ring affixing the MIDAS science payload system to the spacecraft, and a multiple telescope array (“MTA”) further including a mechanical subsystem further including an optical bench, an optical subsystem mounted upon the mechanical subsystem collecting light and merging the light into a passive, actively-sensed or hyperspectral image, and a laser subsystem providing laser illumination for collecting active remote sensing data. The MIDAS science payload system also includes a hexapod in physical communication with and between the spacecraft interface ring and the mechanical subsystem.

Abstract: A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.

Abstract: The binoculars of the present invention comprise two optical units; one optical unit for each eye. Each optical unit comprises a first reflective lens element and a second reflective lens element, wherein at least one of the reflective lens elements is a Micromirror Array Lens. The binoculars of the present invention provide focusing and/or zoom functions without or with minimal macroscopic mechanical lens movement.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.

Abstract: In certain aspects, catadioptric projection objectives for imaging a pattern from an object field arranged in an object surface of the projection objective onto an image field arranged in an image surface of the projection objective include a first objective part configured to image the pattern from the object surface into a first intermediate image, and having a first pupil surface, a second objective part configured to image the first intermediate image into a second intermediate image, and having a second pupil surface optically conjugate to the first pupil surface, and a third objective part configured to image the second intermediate image into the image surface, and having a third pupil surface optically conjugate to the first and second pupil surface. A pupil mirror having a reflective pupil mirror surface is positioned at or close to one of the first, second and third pupil surface.

Abstract: A digital still camera switches an image sensor between moving picture shooting and still picture shooting. The digital still camera includes a variable-magnification optical system having a plurality of lens groups of which four are movable. At least one of the movable lens groups travels different movement trails for magnification variation between during zooming in moving picture shooting and during zooming in still picture shooting.

Abstract: An optical system resembling a modified Gregorian astronomical telescope is disclosed in the specification and drawings. Lenses are used in the inter-focal region to modify the optical characteristics of the system. The use of such inter-focal lenses, can, for example, flatten the image plane of the field thereby increasing the field of view of the telescope.

Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: A device for taking long-distance images includes, successively: an assembly, formed of spherical mirrors, having a first focal length, an optical relay assembly designed to render afocal the optical combination of this optical relay assembly and the assembly of spherical mirrors, a lens unit and an image sensor placed in the focal plane of the lens unit; the optical relay assembly being designed, for at least one focal length of the lens unit, to form the image from the exit aperture of the assembly constituted of mirrors on the entrance aperture of the lens unit. Preferably, the optical relay assembly is designed to form an image from the exit aperture of the spherical mirrors assembly in the entrance aperture of the lens unit.

Abstract: A reflective-type projection optical system has 8 reflective mirrors that form a reduced image of a first surface on a second surface. A first reflective imaging optical system (G1) forms an intermediate image of the first surfaces and a second reflective imaging optical system (G2) forms an image of the intermediate image on the second surface. The first reflective imaging optical system has, from the first surface side in order of light beam incidence, a first reflective mirror (M1), a second reflective mirror (M2), a third reflective mirror (M3), and a fourth reflective mirror (M4). The second reflective imaging optical system has, from the first surface side in order of light beam incidence, a fifth reflective mirror (M5), a sixth reflective mirror (M6), a seventh reflective mirror (M7), and an eighth reflective mirror (M8). At least one of the reflective surfaces of these 8 reflective mirrors is composed of a spherical surface.

Abstract: A photolithography reduction projection catadioptric objective includes a first optical group including an even number of at least four mirrors, and a second at least substantially dioptric optical group more imageward than the first optical group including a number of lenses for providing image reduction. The first optical group provides compensative axial color correction for the second optical group.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light bundles includes light with a wavelength in a range of 10-30 nm. The light is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system comprising six reflective surfaces that include, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces. And the following condition is met, where L1 is an interval between the object surface and the surface apex that is the closest to the object surface, and L2 is an interval between the surface apex of the first reflective surface and the surface apex that is the closest to the object surface: 0.75 < L ? ? 1 L ? ? 2 < 1.25 .

Abstract: A catadioptric imaging optical system of a high numerical aperture in which various aberrations are properly corrected without using a reflection surface having an aspherical shape of high order or a reciprocal optical element. The catadioptric imaging optical system forms an image of a first plane on a second plane and includes a first imaging system for forming a first intermediate image of the first plane based on light from the first plane, a second imaging system having two concave reflection mirrors for forming a second intermediate image of the first plane based on light from the first intermediate image, and a third imaging system for forming a final image of the first plane on the second plane based on light from the second intermediate image. The two concave reflection mirrors have prolate spheroidal-shaped reflection surfaces.

Abstract: A scanning wide-field telescope includes a primary reflecting mirror and a corrector assembly. The corrector assembly corrects light beams for spherical aberration imposed on the light beams by the primary reflecting mirror. The corrector assembly is located between the primary reflecting mirror and a viewing end of the telescope, and is configured to move to multiple optical focal points of the primary reflecting mirror.

Abstract: A detection system for detection of an object in a blind spot of a wing mirror unit. The detection system includes an observation unit for generating observation data, a data processing unit for processing the observation data, and an indication unit for displaying a warning signal. Internal data communication connections of the system may be disposed in a wing mirror unit so that the detection system is autonomous.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: The light of a broad energy band can be observed by reflecting the light of the broad energy band, for example, the light from the visible light region to the x-ray region at a high reflectance respectively, by a composite telescope including a normal incidence optical system and an oblique incidence optical system. A broadband telescope comprise an oblique incidence optical system unit in which the light is obliquely incident on a surface part for reflecting the incident light, a normal incidence optical system unit in which the light is substantially vertically incident on a surface part for reflecting the incident light, and an analyzer for spectrum analysis of the light reflected by the surface part of the obliquely incidence optical system unit and the light reflected by the surface part of the normal incidence optical system unit.

Abstract: A reflective-type projection optical system has 8 reflective mirrors that form a reduced image of a first surface on a second surface. A first reflective imaging optical system (G1) forms an intermediate image of the first surface, and a second reflective imaging optical system (G2) forms an image of the intermediate image on the second surface. The first reflective imaging optical system has, from the first surface side in order of light beam incidence, a first reflective mirror (M1), a second reflective mirror (M2), a third reflective mirror (M3), and a fourth reflective mirror (M4). The second reflective imaging optical system has, from the first surface side in order of light beam incidence, a fifth reflective mirror (M5), a sixth reflective mirror (M6), a seventh reflective mirror (M7), and an eighth reflective mirror (M8). At least one of the reflective surfaces of these 8 reflective mirrors is composed of a spherical surface.

Abstract: An objective for imaging specimens is disclosed. The objective receives light energy from a light energy source configured to provide light energy in a wavelength range of approximately 480 to 660 nanometers, employs a Mangin mirror arrangement in conjunction with an immersion liquid to provide a numerical aperture in excess of 1.0 and a field size in excess of 0.05 millimeters, where every element in the objective has a diameter of less than approximately 40 millimeters.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A wide-angle imaging optical system includes a refractive optical system (3), a reflective optical system, and an image-forming optical system (5). The reflective optical system includes a first reflection surface (1) that directly reflects rays of light from an object, and a second reflection surface (2) that reflects rays of light from the first reflection surface (1). An open portion is provided between the first reflection surface (1) and the second reflection surface (2), and rays of light from the object enter the open portion. A light-transmitting portion (2a) is provided in the second reflection surface (2) and transmits rays of light that have entered the refractive optical system (3). An aperture (1a) is provided in the first reflection surface (1) and allows rays of light from the second reflection surface (2) and the refractive optical system (3) to enter the image-forming optical system (5).

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: An infrared telescope utilizes two mirrors in an off-axis, eccentric-pupil, re-imaging configuration. To improve the image quality of traditional two mirror telescopes, the reflective surfaces of both the primary and secondary mirrors are ellipsoidal. The ellipsoidal surface of the primary mirror has a greater eccentricity than the ellipsoidal surface of the secondary mirror. The infrared light entering through the eccentric pupil strikes the ellipsoidal reflective surface of the primary mirror. The light is reflected from the primary mirror to the ellipsoidal reflective surface of the secondary mirror. An intermediate image of the object being viewed is formed between the primary and secondary mirrors. The light is reflected from the secondary mirror to an image plane. An aperture stop is located between the secondary mirror and the image plane. The image plane is typically located within a cold shield, to reduce the likelihood that stray light will reach the image plane.

Abstract: An adjustable mirror includes first and second fluids in contact over a meniscus extending transverse an optical axis. The fluids are substantially immiscible and have different indices of refraction. A reflective surface extends transverse the optical axis. A meniscus adjuster is arranged to controllably alter at least one of the shape and the position of the meniscus.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.

Abstract: Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.