Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: An inexpensive projection lens unit in a rear projection type image display system, having a short focal distance (wide angle of viewing field), high focus and high contrast, and as well, including a power lens made of a glass material having a high refractive index in a range from 1.63 to 1.70 and an Abbe's number of not less than 50 with an optimized incident and emergent configuration in order to satisfactorily correct aberration with a enhanced focusing performance even with a shortened focal distance. Further, the power lens having a high refractive index can exhibit a high power, and accordingly, can carry out satisfactory aberration correction by optimizing the aspheric degree of a plastic lens even though the length of back focus is increased for enhancing the contrast.

Abstract: An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an edge to a center thereof.

Abstract: An optical system having at least one dichroic Mangin mirror. The optical system has a front-end optical sub-system or a light source operative to emit an optical beam. The optical beam is dispersed into at least a first color beam and a second color beam and has certain degree of monochromatic aberration. The dichroic Mangin mirror is disposed along the optical paths of both the first and second color beams. The dichroic Mangin mirror includes a first surface operative to transmit the first color beam only, but reflects the second color beam. Therefore, upon incident on the dichroic Mangin mirror, the second color beam is reflected, while the first color beam transmits through the first surface and is then reflected off from the second surface. Thereby, the first and second color beams can be focused at the same position, which is referred as an achromatic system focus. Thereby, the chromatic aberration caused by the dispersion can be eliminated.

Abstract: A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: A projection display apparatus comprises an image forming element, and an imaging optical system made up of a plurality of reflectors for projecting an image formed by the image forming element to provide an enlarged version of the image, wherein at least one of the reflectors which make up the imaging optical system is movable for adjusting the focus, and the movable reflector is movable along a straight line non-parallel with the normal line of the image forming element.

Abstract: An optical system comprising a concave primary mirror reflects light through an intermediate focus to a secondary mirror. The secondary mirror re-focuses the image to a final image plane. Optical limiter material is placed near the intermediate focus to optically limit the intensity of light so that downstream components of the optical system are protected from intense optical transients. Additional lenses before and/or after the intermediate focus correct optical aberrations.

Abstract: A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

Abstract: An optical sheet that accepts light transmitted at or within a specific entrance cone angle that then redirects and transmits the light within an exit cone that is substantially normal to the sheet's plane. The intensity of the light within the exit cone is substantially uniform for any light source entering the sheet within the sheet's acceptance angle. The optical sheet is made of transparent material with microlens arrays formed on its opposite front and back surfaces. The thickness of the optical sheet is sufficient so that the microlens on the opposite surfaces are separated a distance equal to the microlens focal length, with each microlens on the front and back surfaces having substantially similar size and shape, with centers transversely aligned. When used with one or more light sources located on one surface, the transmitted light through the optical sheet is uniform in intensity across a second surface.

Abstract: The invention is directed to multispectral multifield optical combinations that are intended to be integrated into an optical device. A Cassegrain-type multifield optical combination has an image focal plane, comprising a first holed concave primary mirror that is fixed relative to the image focal plane and a convex secondary mirror.

Abstract: An optical relay comprising a first mirror and a second mirror is provided. The first mirror is configured to receive modulated light from a first spatial light modulator and reflect the modulated light onto the second mirror. The second mirror is configured to reflect the modulated light onto the first mirror, and the first mirror is configured to reflect the modulated light onto a second spatial light modulator.

Abstract: There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10–30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the transformation of an object field in an object plane into an image field in an image plane. The invention has a microlithographic projector lens that includes a first, second, third, fourth, fifth, sixth, seventh and eighth mirror, and a beam path from the object plane to the image plane that is free from obscuration.

Abstract: An inexpensive projection lens unit in a rear projection type image display system, having a short focal distance (wide angle of viewing field), high focus and high contrast, and as well, including a power lens made of a glass material having a high refractive index in a range from 1.63 to 1.70 and an Abbe's number of not less than 50 with an optimized incident and emergent configuration in order to satisfactorily correct aberration with a enhanced focusing performance even with a shortened focal distance. Further, the power lens having a high refractive index can exhibit a high power, and accordingly, can carry out satisfactory aberration correction by optimizing the aspheric degree of a plastic lens even though the length of back focus is increased for enhancing the contrast.

Abstract: A projection optical system is provided for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface. An aperture stop is provided along an optical path between the first and second reflective surfaces. The following condition is met by the system, where L1 is an interval between the object surface and the surface apex that is the closest to the object surface, and L2 is an interval between the surface apex of the first reflective surface and the surface apex that is the closest to the object surface: 0.75 < L1 L2 < 1.25 .

Abstract: A catoptric projection optical system for projecting a reduced size of a pattern on an object surface onto an image surface includes eight mirrors and forms an intermediate image between the sixth mirror and the seventh mirror on an optical path, wherein a position in a height direction of a principal ray from an optical axis at each mirror displaces, and a displacement direction from the first mirror to the fourth mirror is reverse to that from the fifth mirror to the eight mirror, wherein the second mirror to the fifth mirror are a concave mirror, a convex mirror, a concave mirror and a concave mirror, and the seventh mirror to the eighth are a convex mirror and a concave mirror, and wherein the second mirror of the eight mirrors is located closest to the object surface side.

Abstract: There is provided a compact, strong and high-performance catoptric optical system. This catoptric optical system has plural optical curved reflective surfaces. A gap between a pair of reflective surfaces, through which light incident upon said catoptric projection optical system passes, is the same gap between a pair of reflective surfaces, through which light exited from the catoptric projection optical system passes.

Abstract: The present invention employs a method for transmitting and/or receiving high data bandwidths at reduced cost by employing a holographically corrected telescope for transmitting or receiving data-carrying signals remotely, at IR, optical or UV frequencies for low cost data communication.

Abstract: An all-reflective optical system includes an all-reflective afocal module, an all-reflective imaging module and an all-reflective switching structure being operated to direct a light beam through the afocal module and the imaging module. A first position of the switching structure directs the light beam to enter the first optical end of the afocal module and exit the second optical end of the afocal module, and thereafter to enter the input optical end of the imaging module. A second position of the switching structure directs the light beam to enter the second optical end of the afocal module and exit the first optical end of the afocal module, and thereafter to enter the input optical end of the imaging module. A third position of the switching structure directs the light beam to enter the input optical end of the imaging module so that the light beam completely bypasses the afocal module.

Abstract: A catadioptric optical system comprising a first imaging optical system for forming an intermediate image of a first plane surface, a second imaging optical system for forming a final image of the first plane surface onto a second plane surface which is substantially parallel to the first plane surface, and a catadioptric type optical system disposed in the optical path from the first plane surface to the second plane surface and including a first reflecting surface which reflects light coming from through the first plane surface and a second reflecting surface for directing the light reflected by the first reflecting surface toward the second plane surface. At least one of the first and second reflecting surfaces is a concave reflecting surface. All of the optical elements of the catadioptric optical system are disposed on a single linear optical axis.

Abstract: An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging optic element receives the electromagnetic radiation from the first non-imaging optic element and redirects and images the electromagnetic radiation. The electromagnetic radiation from the second non-imaging optic element is suitable for being received by other conventional optical surfaces to provide a desired radiance distribution with a desired angular distribution and desired shape. Facets are used to provide the desired illumination over the desired illumination field. Reflective facets may be placed on the second non-imaging optic, which can reduce the number of mirrors and increase efficiency.

Abstract: A solid catadioptric lens with a single viewpoint has a spherical refractive surface with a center C on an optical axis of the lens. An ellipsoidal reflective surface of the lens faces the spherical refractive surface such that a first focus F1 of the ellipsoidal reflective surface is coincident with the center C of the spherical refractive surface. Furthermore, the lens has a shaping surface facing the ellipsoidal reflective surface for shaping a light that passes the single viewpoint. The shaping surface can be refractive, reflective or semi-transparent and its shape can be ellipsoidal with its first focus F1? coincident with the second focus F2 of the ellipsoidal reflective surface. The single viewpoint of the lens is at the center C of the spherical reflective surface and is enforced with an aperture that can be positioned at various points inside, on a surface or even outside the lens, depending on the type of shaping surface chosen.

Abstract: The invention provides a telescope system for inputting an image and presenting the image to a user. The telescope system includes a first array of flat mirrors including a plurality of first mirrors, the image, being light information, incident upon and reflected by each of the first array of mirrors; a primary reflecting curved mirror, each of the first mirrors reflecting light information onto the primary reflecting curved mirror; and a light collection portion, the light collection portion collecting and combining light information, originating from each of the first mirrors, so as to present a viewable image.

Abstract: The invention according to a first aspect may include an optical system. The optical system may have an axial axis. This optical system may have a number of primary mirror segments. A number of reflectors may be arranged about the axial axis. The primary mirror segments may be configured to reflect a number of principal rays along a first set of chords to corresponding reflectors. These reflectors may be configured to reflect the corresponding principal rays along a second set of chords. Both the first set of chords and the second set of chords may have an angle in excess of 45 degrees with respect to the direction of the axial axis. The invention according to a first aspect may also include a second set of reflectors. The second set of reflectors may be configured to direct the light to an image plane. Other aspects of the invention may include a method of receiving light using an optical system configured to spiral light though the system and a method of making such a system.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A scanning pattern generator and a method for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (11), the system comprising a light source (1), preferably a laser, for generating at least two light beams, a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens (10) to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1). Hereby, the carrier defines a movable optical path relative to the remaining, stationary optical path. Further, the system comprises means for altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.

Abstract: A coupling configuration for connecting an optical conductor to an opto-receiver has a parabolic mirror or a spherical mirror that reflects light emerging from the optical conductor onto a launching mirror through which the light is launched into the opto-receiver. Such a configuration is largely adjustment-free and therefore particularly suitable for the connection of single-mode fibers (SMF).

Abstract: There is provided a projection objective for wavelengths of ?193 nm for imaging an object field in an object plane into an image field, in an image plane. The projection objective includes a first reflective optical element, a second reflective optical element, a third reflective optical element, a fourth reflective optical element, a fifth reflective optical element, and a sixth reflective optical element, and at least one refractive optical element. The refractive optical elements has a used area with a diameter. The projection objective has an image-side numerical aperture ?0.65, and the used area of the refractive optical element has a diameter that is less than ?rd of the distance from the object plane to the image plane.

Abstract: The suede-like fabric according to the invention is produced by the process which comprises the steps of supplying aqueous chemical composed of acrylic resin, emulsifying agent and water to treating rollers through chemical coating means; passing the raw fabric cloths between the treating rollers having the chemical supplied and supporting rollers to produce a uniform chemical coating of 70˜200 g/m2, the rollers pressing and fixing the passing raw fabric cloths; de-watering and drying the raw fabric cloths having the chemical coating fixed under pressing in a thermal chamber maintained at a temperature between 80 and 200° C.; and heating and pressing the dried raw fabric cloths by means of heating rollers at a temperature between 130 and 150° C. to finish the acrylic coating through this ironing step; and a further step of rubbing-off the coated surfaces of the raw fabric cloths for abrasion by rotating a striker drum made of wood for a predetermined period.

Abstract: A reflecting optical element is disclosed which includes the following articles. The reflecting optical element is constituted by: a base member having a continuous curved-surface portion, and a resin layer integrally formed of resin on the curved surface of the base member, and having a plurality of mutually discontinuous curved surfaces to be reflecting surfaces. The base member is made of a material smaller in coefficient of linear expansion than the resin for forming the resin layer. Thus, a reflecting optical element is provided which is low in optical-performance deterioration caused by the temperature effect, and small in the number of restraints in fabrication.

Abstract: A bright wide-angle catoptric system is provided which will not deteriorate the picture quality of images. The wide-angle catoptric system includes, successively from an object, a secondary reflecting mirror having a concave surface, a primary reflecting mirror having a convex surface and a tertiary reflecting mirror having a concave surface, and produces images by reflecting the luminous flux from the object at the primary reflecting mirror, the secondary reflecting mirror and the tertiary reflecting mirror successively. The system also includes a diaphragm arranged in close proximity to the primary reflecting mirror so as to have an optical axis pass through the center of the diaphragm; the optical axis is a straight line connecting the curvature center of the primary reflecting mirror to the curvature center of the secondary reflecting mirror. The tertiary reflecting mirror has its curvature center decentered from the optical axis in the direction of lesser astigmatism.

Abstract: A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.

Abstract: An optical element comprising an object-side imaging element for imaging an object on an intermediate image plane in an optical path before a final image plane and an image-side imaging element for reimaging an object image formed on the intermediate image plane, on the final image plane, wherein at least one of the object-side imaging element and the image-side imaging element comprises an off-axial curved surface, and wherein aberration is generated by both of the object-side imaging element and the image-side imaging element, thereby flattening (disturbance of) a light intensity distribution caused on the final image plane by a noise source at or near the intermediate image plane.

Abstract: The present invention adopts a particle dispersed silicon material, comprising silicon carbide as dispersion particles, as a mirror substrate, subjects the mirror substrate to mirror finish polishing to form a mirror body, forms a reflecting film on the mirror body to form a mirror, and uses the mirror to form a large aperture optical system.

Abstract: An optical imaging system (100) has a Cassegrain-like front end (1) with a substantially spherical concave primary mirror (3) and a substantially spherical convex secondary mirror (4), a Cassegrain-like rear end (2) with a substantially spherical concave primary mirror (7) and a substantially spherical convex secondary mirror 8, and a field lens system (5) to image the aperture stop of the rear end to a position where it forms the entrance pupil of the optical imaging system (100). An aberration corrector (6) may be provided to correct selected aberrations.

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: The invention relates to a compact, high-performance yet wide-field real image type zoom finder comprising a positive objective optical system Ob and a positive eyepiece optical system Ep and further including an image-inverting means for erecting an real image formed by the objective optical system. The objective optical system Ob comprises a plurality of moving groups G2 and G3, and the eyepiece optical system Ep comprises positive reflecting surfaces, at least one of which is defined by a rotationally asymmetric surface, and satisfies conditions 1.25<dEP/fOC<2.0 and 0.5<lOC/fOC<1.3 where dEP is the distance as measured along an axial chief ray from a final surface to an eye point of the eyepiece optical system, fOC is the focal length of the eyepiece optical system, and lOC is the length as calculated on an air basis and measured along an axial chief ray from an intermediate image-formation plane to the final surface of the eyepiece optical system.

Abstract: An optical element comprising an object-side imaging element for imaging an object on an intermediate image plane in an optical path before a final image plane and an image-side imaging element for reimaging an object image formed on the intermediate image plane, on the final image plane, wherein at least one of the object-side imaging element and the image-side imaging element comprises an off-axial curved surface, and wherein aberration is generated by both of the object-side imaging element and the image-side imaging element, thereby flattening (disturbance of) a light intensity distribution caused on the final image plane by a noise source at or near the intermediate image plane.

Abstract: The invention provides a telescope system for inputting an image and presenting the image to a user. The telescope system includes a first array of flat mirrors including a plurality of first mirrors, the image, being light information, incident upon and reflected by each of the first array of mirrors; a primary reflecting curved mirror, each of the first mirrors reflecting light information onto the primary reflecting curved mirror; and a light collection portion, the light collection portion collecting and combining light information, originating from each of the first mirrors, so as to present a viewable image.

Abstract: Disclosed is a projection optical system specifically to be used with extreme ultraviolet (EUV) light having a wavelength not less than 10 nm and not greater than 20 nm. The projection optical system has six mirrors sequentially reflecting light in an order from the object side toward the image side and being disposed to define a coaxial system, wherein each of the six mirrors has a curvature radius not greater than 1500 mm.

Abstract: An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging optic element receives the electromagnetic radiation from the first non-imaging optic element and redirects and images the electromagnetic radiation. The electromagnetic radiation from the second non-imaging optic element is suitable for being received by other conventional optical surfaces to provide a desired radiance distribution with a desired angular distribution and desired shape. Facets are used to provide the desired illumination over the desired illumination field. Reflective facets may be placed on the second non-imaging optic, which can reduce the number of mirrors and increase efficiency.

Abstract: A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.

Abstract: A catadioptric projection objective which images a pattern arranged in an object plane into an image plane, with the production of a real intermediate image, has between the object plane and the image plane a catadioptric first objective portion and a concave mirror and a ray deflecting device and behind the ray deflecting device a dioptric second objective portion. The ray deflecting device has a preferably fully reflecting first reflecting surface for the deflection of the radiation coming from the object plane to the concave mirror. Positive refractive power is arranged behind the first reflecting surface and between this and the concave mirror, in an optical neighborhood of the object plane in which the principal ray height of the outermost field point of the radiation coming from the object is greater than the marginal ray height.

Abstract: An EUV optical projection system includes at least six mirrors (M1, M2, M3, M4, M5, M6) for imaging an object (OB) to an image (IM). At least one mirror pair is preferably configured as an at least phase compensating mirror pair. The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a second mirror (M2) and a third mirror (M3), such that a first mirror (M1) and the second mirror (M2) form a first optical group (G1) and the third mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G1). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the first mirror (M1) and the second mirror (M2). The second mirror (M2) is preferably convex, and the third mirror (M3) is preferably concave. The system preferably forms an image (IM) with a numerical aperture greater than 0.18.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A mirror for use in an exposure system of this invention includes a reflection layer for reflecting EUV formed on a mirror substrate and an absorption layer formed on the reflection layer and made from a compound for absorbing infrared light.

Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective comprises a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, the light bundle includes light with a wavelength in the range of 10-30 nm, and the light path is free of shading.