Abstract: A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a light-transmissive crystal member made of crystal material.

Abstract: A projection optical system which sufficiently corrects variations in aberrations during focusing irrespective of a distance at which an object is located, i.e. whether the object is located at a point of infinity or at a short distance, while maintaining advantages of a rear focus retrofocus type optical system, is disclosed. This projection optical system has, in order from the enlarging side, a first lens unit having negative optical power, and a second lens unit having positive optical power and moves in a direction of an optical axis for focusing. The following condition is satisfied: 0≦|f/t1|<0.2 where reference character t1 denotes a distance from the reducing-side conjugate plane to a pupil and reference character f denotes a focal length of the entire system.

Abstract: An element control system (32) that reduces the effects on image quality of thermal distortions in an optical element (28) of a lithography system (10) includes a heat source (50) that primarily heats a non-illuminated region (44) of the optical element (28) to alter and/or control the shape of the illuminated part of the optical element (28). The heat source (50) directs heat to the non-illuminated region (44) and/or an illuminated region (42) to simplify and/or alter the shape of thermal distortions aberrations in the optical element (28).

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

Abstract: The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof.

Abstract: Disclosed is a projection optical system capable of ensuring good optical performance virtually without effects of birefringence of fluorite by for example, controlling an angle difference between an optical axis and a predetermined axis of a fluorite lens to a predetermined allowable amount. The projection optical system for forming an image of a first surface (R: reticle) on a second surface (W: wafer) includes at least two light-transmissive crystal members formed of a crystal material belonging to a cubic system. In at least the two light-transmissive crystal members, an angle difference is set at 1° between the optical axis and any one of crystal axes [111], [100] and [110].

Abstract: An objective lens includes a first lens group, a second lens group having a lens pair, a third lens group having a lens pair, a fourth lens group having a lens pair, a fifth lens group having a lens pair, and a sixth lens group.

Abstract: It is an object of this invention to provide a zoom lens capable of projecting an original projection image displayed by a liquid crystal display element onto a screen surface with high optical performance, and an image projection apparatus using the zoom lens. A zoom lens includes a first lens unit having negative refractive power, a second lens unit having positive refractive power, a stop, a third lens unit having negative refractive power, a fourth lens unit having negative refractive power, and a fifth lens unit having positive refractive power, which are sequentially arranged from the enlargement side and having one or a plurality of lenses. When the magnification is to be changed from the wide angle end to the telephoto end, the second, third, and fourth lens units and the stop move.

Abstract: An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

Abstract: A projection optical system projects an enlarged image of a light valve image onto a screen. The system has, from the conjugate enlargement side: a negative front lens unit, optical path turning means (including a reflecting surface), a positive rear lens unit, and projection light preparing means, which can separate illumination and projection light, or can integrate light of different colors, or can do both. Each of the front and rear lens units includes at least one aspherical surface. The front lens unit has a negative first lens element at its conjugate-enlargement end and a negative second lens element at the conjugate reduction side of the first lens element. The rear lens unit includes a positive third lens element made of an anomalous dispersion material. The center of the light valve is not located on the optical axis of the rear lens unit.

Abstract: A projection lens system for enlarging and displaying on a screen an original image from an image generating source, includes a first lens having positive refractive power, a second aberration correction lens, and a third lens, positioned nearest the image generating source and having a concave lens surface thereof facing the screen. The third lens has a profile such that its refractive power at a marginal area adjacent a peripheral edge thereof is less than its refractive power at an area adjacent an optical axis of said projection lens system. The surface of the third lens facing the image generating source is in contact with a cooling liquid which cools the image generating source.

Abstract: A projection exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a photosensitive substrate. The projection optical system includes at least three lens units, including a lens unit of a positive refractive power and a lens unit of a negative refractive power, and an aspherical lens having aspherical surfaces formed on both sides thereof, in which a relation |Lxø0|>17 is satisfied, where L is a conjugate distance of the projection optical system and ø0 is the total power of the negative lens unit or of negative lens units of the projection optical system. Each aspherical surface of said aspherical surface lens is disposed at a position satisfying a relation |hb/h|>0.36 where h is a height of an axial marginal light ray, and hb is a height of a most abaxial chief ray, and each aspherical surface of the aspherical surface lens satisfies a relation |&Dgr;ASPH/L|>1.

Abstract: This invention can provide an optical system which has a diffractive optical element that can suppress generation of flare or the like due to light rays of unnecessary orders of diffraction caused by the wavelength dependence of the diffractive optical element without using any complicated arrangement. In an optical system, light from a light source is separated into light rays of predetermined wavelength regions by a color separation optical system. Those light rays are incident on pixels of an image display element having a plurality of pixels in correspondence with the predetermined wavelength regions. An image displayed on the image display element is projected in an enlarged scale by a projection optical system. A diffractive optical element is disposed near the pupil of the projection optical system, and the diffraction efficiency of the diffractive optical element can be optimized in each of predetermined wavelength regions.

Abstract: An illumination apparatus that can adjust telecentricity of beams on a wafer without reducing the use efficiency of light is provided. The illumination apparatus moves an inner surface reflection type optical integrator in a direction orthogonal to an optical axis, and thus shifts light intensity distribution on a light emission surface thereof, thereby shifting the baricenter of the light intensity distribution on a light incident surface of multi-beam generation means. Therefore, the telecentricity of image-forming beams on the axis may be adjusted.

Abstract: A real image display system includes a primary image source for projecting a primary image from the start of a primary light path to an end of the primary light path at which the primary image is viewable, two reflectors positioned in the primary light path between the primary image source and the projected real image, a circular polarizer for circularly polarizing a light beam positioned in the primary light path between the mirror and real image, whereby outside light entering the system is substantially blocked before exiting the system, thereby substantially eliminating ghost image formation caused by outside light sources.

Abstract: The present invention provides a position-control device for a light modulation device, capable of easily performing a position-control operation. A position-control device is provided with a reference projection lens built therein capable of being commonly used, the reference projection lens projecting light combined by a crossed dichroic prism and forming a projection image, and having a predetermined optical characteristic. If the position of the optical axis is aligned once when the reference projection lens was built in, it is not necessary to align the optical axes every time the positions of liquid crystal panels are controlled and the replacement of the liquid crystal panels and the crossed dichroic prism is only required, whereby the position-control operation can be easily performed.

Abstract: An optical system includes an aperture stop and binary optics having a plurality of rings disposed adjacent to the aperture stop. The rings of the binary optics have different mutual intervals and have a step-like structure formed at each interval. When the interval of arbitrary rings of the rings, which are juxtaposed with each other, is T and the number of steps defined in that interval is N, the following relation is satisfied in all the rings included in the binary optics 16≧N≧T·sin &thgr;h/&lgr;, where &lgr; is a representative value for a wavelength of light used in the optical system, and &thgr;h is an angle defined, with respect to an optical axis of the optical system, by a light ray emitted from an object point at a largest object height and passing a center of the aperture stop.

Abstract: A projection optical system that, by using projection light emanating from a light valve illuminated by illumination light, projects an enlarged image of an image displayed on the light valve onto a screen has, from the conjugate enlargement side: a front lens unit having a negative optical power as a whole, including at least one aspherical surface, having a first lens element having a negative optical power disposed at the conjugate-enlargement-side end thereof, and having a second lens element having a negative optical power disposed on the conjugate reduction side of the first lens element; optical path turning means, including a reflecting surface, for turning the light path of the light emanating from the front lens unit; a rear lens unit having a positive optical power as a whole, including at least one aspherical surface, and including a third lens element made of an anomalous dispersion material and having a positive optical power; and projection light preparing means disposed between the rear lens u

Abstract: An object of the present invention is to provide a projection optical system having a large numerical aperture in which the maximum effective diameter of lens of the optical system is satisfactorily small.

Abstract: This endoscope apparatus utilizes a phenomenon called “curvature of field” of a lens to satisfactorily bring a shape, into focus, of an object to be observed such as unevenness especially during enlargement in accordance with a shape of unevenness or the like of the object. For example, there is provided an objective lens group having two movable lenses, and variable-power is performed and field curvature characteristics are changed by moving these movable lenses. This change in the field curvature characteristics is performed by operating an image surface curving switch and driving the movable lenses through the use of an actuator or the like. Also, information on differences in height on the image central part to the peripheral part is operated from the amount of field curvature changed by the objective lens group to display the information on differences in height on the monitor.

Abstract: A microlithographic projection exposure arrangement has an off-axis field and has a catoptric or catadioptric projection objective (P). In this arrangement, the illumination system (ILL) is made as small as possible in that a lateral offset (&Dgr;y) of the optical axes (OAI, OAP) is introduced relative to each other. A corrective element (AE) is arranged off-axis and functions to adapt the telecentry.

Abstract: An objective lens includes a first lens group, a second lens group having a lens pair, a third lens group having a lens pair, a fourth lens group having a lens pair, a fifth lens group having a lens pair, and a sixth lens group.

Abstract: A projection lens shifting mechanism comprises a projection lens unit in the shape of a cylinder for projecting incoming image light, a flange integrated with the projection lens unit, a projection lens mount for providing light emitted from a light valve in the shape of a plane to the projection lens unit, wherein the light valve can be optically modulated for each pixel based on image information, and the projection lens mount is concentric to an optical axis of the light emitted from the light valve, a first cam follower provided in the flange along an optical axis of the projection lens unit, a cam follower guiding portion provided in the projection lens mount for guiding the first cam follower in a direction perpendicular to the optical axis of the projection lens unit, a first lens shifting cam capable of being moved in a predetermined direction with respect to the projection lens mount and engaged with the first cam follower, for shifting the first cam follower in a direction guided by the cam follower

Abstract: A projection optical system which sufficiently corrects variations in aberrations during focusing irrespective of a distance at which an object is located, i.e. whether the object is located at a point of infinity or at a short distance, while maintaining advantages of a rear focus retrofocus type optical system, is disclosed. This projection optical system has, in order from the enlarging side, a first lens unit having negative optical power, and a second lens unit having positive optical power and moves in a direction of an optical axis for focusing.

Abstract: An optical projection lens system comprising one lens with an aspherical surface and comprising a first bulge followed by a first waist followed by a second bulge, wherein the diameter of the second bulge is smaller than the diameter of the first bulge.

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.

Abstract: A projection zoom lens includes a first lens group having a negative refracting power, a second lens group having a positive refracting power, a third lens group having a negative refracting power, and a fourth lens group having a positive refracting power, which are arranged in that order from a screen side toward an image plane side along an optical axis. The first and the fourth lens group are kept stationary, and the second and the third lens group are moved along the optical axis to vary power from a limit wide angle power toward a limit telephoto power. The second lens group includes a 2nd-group 1st positive lens, a 2nd-group 1st compound lens formed by joining a 2nd-group 2nd positive lens having a convex surface on the image plane side and a 2nd-group 1st negative lens having a concave surface on the screen side, and a 2nd-group 3rd positive lens arranged in that order from the screen side toward the image plane side.

Abstract: There is provided a projection type image display system comprising color image displaying means for displaying an image to be projected onto a screen, means for storing a correlation between an initial XYZ-tristimulus value of an image projected onto the screen at the time of initial adjustment and an initial luminance value of the image projected onto the screen at the time of initial adjustment, luminance measuring means for measuring a maximum luminance value of each of primary colors of an image projected onto the screen upon lapse of a predetermined time from the initial adjustment, means for estimating an XYZ-tristimulus value of the image on the screen upon lapse of the predetermined time based on the maximum luminance value and the correlation, and means for calculating a color correction coefficient based on the estimated XYZ-tristimulus value.

Abstract: A projection system that is capable of providing a high-performance projection system and producing a high contrast projection image by using an optical modulation element, which can be positioned a predetermined distance away from an illumination optical system and a projection optical system. The optical modulation element is capable of modulating light received from the illumination optical system and projecting the modulated light to a projection optical system in the direction of a projection surface.

Abstract: The invention relates to a projection objective which consists of at least seven lenses that are adjacent to air on both sides. The inventive projection objective meets the criteria of the following equations in its totality: u≧12.8°; 100 mm≦LEP≦400 mm; &sgr;RBa≧1°; &sgr;RBi≦−14°, whereby u is the aperture angle (2u-entire angle) on the illumination side; LEP is the distance from the entrance pupil (on the illumination side) to the object level (the position in the direction of projection from the reference point: object level corresponds to a positive value); &sgr;RBa is the angle inclination of the beam in relation to the optical axis in the object space between the object and the 1.

Abstract: An object is to obtain a projection optical system capable of projecting image information onto a screen while maintaining satisfactory optical performance, and projection apparatus using it. An image display element and the screen both are set normal to the reference optical axis of the projection optical system, and at least one optical element out of a plurality of optical elements constituting the projection optical system has an optical axis shifted from the reference optical axis or/and tilted relative to the reference optical axis.

Abstract: Telecentric projection lenses for use with pixelized panels (PP) are provided. The projection lenses have a negative first unit (U1) which has at least one negative meniscus element (N1) having at least one aspheric surface and a positive second unit (U2) which has at least one positive element (P1) having at least one aspheric surface. The lens' aperture stop (AS) is located between the two units, and a third lens unit (U3) may be used in the vicinity of the aperture stop to improve the correction of axial color. The lenses have small forward vertex distances, small clear apertures, and long back focal lengths which make them particularly well-suited for use in the manufacture of compact projection systems.

Abstract: The invention relates to a projection exposure apparatus for microlithography at &lgr;<200 nm. The projection exposure apparatus for microlithography has a light source with a wavelength less than 200 nm and a bandwidth, which is less than 0.3 pm, preferably less than 0.25 pm and greater than 0.1 pm. The projection exposure apparatus includes an exclusively refractive projection objective which is made out of a single lens material. The projection objective provides for a maximum image height in the range of 12 mm to 25 mm, an image side numerical aperture in the range of 0.75 up to 0.95 and a monochromatic correction of the wavefront of rms<15% of the wavelength of the light source.

Abstract: Compactness of a projection type image display apparatus is realized by achieving miniaturization and wide-angle of a projection lens apparatus while various kinds of aberration are satisfactorily compensated. A first lens group having a negative refracting power, a second lens group having a positive refracting power, and a third lens group having a positive refracting power are positioned in this order, from a screen side, toward an image display element side, in the projection lens apparatus. When f, f1, f3, f23, and fb represent, respectively, a focal length of the whole lens system, a focal length of the first lens group, a focal length of the third lens group, a combined focal length of the second and third lens groups, and a back focus of the whole lens system, the projection lens apparatus satisfies the following conditions: 1.4<|f1|/f  (1) 2.8<f3/f  (2) 3.6<fb/f  (3) 0.1<|f1/f23|<0.3.

Abstract: An optical projection lens system comprising in direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refracting power, which follows the second lens group, wherein at least one lens of the projection lens system, which is arranged in front of the waist comprises an aspherical surface.

Abstract: An illumination optical system includes an optical integrator for forming a secondary light source by use of light from a light source, an optical system for directing light from the light source toward the integrator, and a condensing optical system for condensing light from the optical integrator upon a surface to be illuminated.

Abstract: A dioptric projection optical system projects an image of a first surface onto a second surface and includes a first lens group having a negative refractive power and arranged in an optical path between the first surface and the second surface, a second lens group having a positive refractive power and arranged in an optical path between the first lens group and the second surface, a third lens group having a negative refractive power and arranged in an optical path between the second lens group and the second surface, a fourth lens group having an aperture stop and arranged in an optical path between the third lens group and the second surface, and a fifth lens group having a positive refractive power and arranged in an optical path between the fourth lens group and the second surface, wherein lens components belonging to the dioptric projection optical system are formed of at least two types of fluorides, and wherein a clear aperture of a light beam in the projection optical system is at a relative maximum

Abstract: A lens apparatus for projection includes a plurality of lenses on an optical axis. A shading plate 11 for covering the peripheral portion of the lens to block off light entering the peripheral portion is provided as a single member on the optical axis with the lenses to omit an inking process. In addition, the shading plate 11 is integrally provided with a contrast compensating plate 13 for compensating a projected image, so that it is not required to provide any portions for supporting the contrast compensating plate 13. Moreover, a shading wall 23 for blocking off light leaking out of the peripheral portion of the lens is provided on the peripheral portion of the shading plate 11. Thus, it is possible to provide a lens apparatus for projection, which has a simple structure and which can be easily assembled to reduce the producing costs.

Abstract: A zoom lens system has, sequentially from enlarging side to reducing side, first lens unit having negative optical power; second lens unit having positive optical power, the second lens unit having a positive lens element positioned nearest the reducing side; diaphragm; third lens unit having positive optical power, the third lens unit comprising, sequentially from enlarging side to reducing side, a cemented lens unit having a positive lens element and a negative lens element with a concave surface facing the reducing side, and a positive lens element having a concave surface facing the reducing side; fourth lens unit having negative optical power; and fifth lens unit having positive optical power. The second, third, and fourth lens units move from enlarging side to reducing side when zooming from telephoto end to wide angle end. The zoom lens system satisfies a predetermined condition.

Abstract: A dioptric projection optical system which projects an image of a first surface onto a second surface includes lens components formed of at least two types of fluorides, and is constituted by, in order from a first surface side, a first lens group having a negative refractive power, a second lens group having a positive refractive power, a third lens group having a negative refractive power, a fourth lens group having an aperture stop within an optical path, and a fifth lens group having a positive refractive power. An clear aperture of a light beam in the projection optical system is at a maximum within the second lens group, is at a minimum within the third lens group, is at a maximum within the third, fourth, or fifth lens group, and has only one significant minimum between the first surface and the second surface.

Abstract: In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial refractive index about the optical axis are used, while one or a plurality of aspheric surfaces for correcting the aberration resulting from the in-homogeousness in refractive index of lenses are provided.

Abstract: A zoom lens comprises first to fifth lens groups successively from the enlargement side. The first lens group is fixed upon changing power and has a negative refracting power and a focusing function. The second and third lens groups having a positive refracting power and the fourth lens group having a negative refracting power are moved with a mutual relationship so as to continuously change power and correct the image surface movement caused by the continuous change in power. The fifth lens group has a positive refracting power and is fixed upon changing power. The first to fifth lens groups satisfy predetermined conditional expressions concerning their focal lengths.

Abstract: A wide-angle projection lens is disclosed having three lens groups of negative, positive, and positive refractive power, respectively, in order from the enlarging side, and that favorably corrects both distortion and lateral color. The wide-angle projection lens includes a diaphragm positioned between the second lens group and the third lens group, and is especially suitable for use in a rear-projection-type image display device that uses a multi-display technique wherein multiple projection lenses arranged in an array, with each projection lens displaying image information for a particular segment of the image to be displayed. By satisfying specified conditions, the wide-angle projection lens, when used in a projection-type image display device, enables the image display device to be more compact.

Abstract: The present invention provides an optical system for crystallization tool for producing an crystallized silicon thin film by using an excimer laser as a light source to crystallize an amorphous silicon thin film through a fine stripped pattern, including 1st to 10th lenses sequentially arranged along an optical axis from said excimer laser, wherein the 1st lens having both side made convex; the 2nd lens having one side made convex toward the light source and the other side concave; the 3rd lens having one side made convex toward the light source and the other side concave; the 4th lens having both side concave; the 5th lens having both side made convex; the 6th lens having one side concave toward the light source and the other side made convex; the 7th lens having one side made convex toward the light source and the other side concave; the 8th lens having both side made convex; the 9th lens having one side made convex toward the light source and the other side concave; and the 10th lens having both side made

Abstract: A projection display apparatus having a light source for generating a white light, a liquid crystal panel for modulating an incident light from the light source, a polarizing plate which is located at a light exiting side of the liquid crystal panel for polarizing a light from the liquid crystal panel passed therethrough and a cooling liquid for cooling at least the liquid crystal panel and the polarizing plate. A projection lens device having plural lens elements which is located at a light exiting side of the polarizing plate is provided for projecting the light passed through the polarizing plate. One of the plural lens elements located nearest the polarizing plate has a negative refractive power in a center region containing an optical axis thereof and has a positive refractive power in a peripheral portion of the center region.

Abstract: An object of the present invention is to provide a projection optical system having a large numerical aperture in which the maximum effective diameter of lens of the optical system is satisfactorily small.

Abstract: A projection television system (10) is provided which has a CRT (16) and a projection lens system (13) for forming an image on a screen (14). The projection lens system (13) is characterized by a diffractive optical surface (DOS) which provides color correction for the lens system. The diffractive optical surface (DOS) can be formed as part of a diffractive optical element (DOE) or as part of an existing lens element of the lens system. The diffractive optical surface (DOS) is located between the object side (S2) of the lens' first lens unit (U1) and the image side (S11) of the lens' third lens unit (U3). The distance between the diffractive optical surface (DOS) and the lens' aperture stop (AS) is less than 0.1·f0, where f0 is the focal length of the projection lens (13).

Abstract: A projector device is disclosed which uses light that is spatially modulated by a DMD having mirrors which are moveable between Off and On positions in response to image information input to the DMD. Images formed at the DMD are projected onto a screen via a projection lens. Surfaces of the lens elements of the projection lens are designed with curvatures such that light that may be undesirably reflected back to the DMD will not be in a converged state at or near the surfaces of DMD mirrors. In this way, ghost light that is projected onto the screen is dispersed over a wider area, and thus is less noticeable and not troublesome.

Abstract: A projection objective, particularly for microlithography at 248 nm or 193 nm has, after two bulges and two waists, a pronounced lens arrangement that preferably contains a further waist and the system diaphragm (AS). This is markedly set back from the negative lens group containing the second waist, and is surrounded by important correction devices. The highest numerical aperture (0.65-0.80) is attained with the smallest lens diameters and by paying heed to the further qualities required for such a microlithography projection objective.