Abstract: An optical member of the invention is an optical member for photolithography used together with light having a wavelength of not more than 250 nm. The optical member is made of a fluoride crystal in which a maximum diameter dmax (cm) of scattering bodies existing internally and a quantity ns of the scattering bodies per 1 cm3 satisfy a condition represented by following formula (1): 0<dmax2×ns<6.5×10?4 (cm?1)??(1).

Abstract: A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object using light of a predetermined wavelength less than or equal to 300 nm, comprises: a first lens group G1 of positive refractive power; a second lens group G2 of negative refractive power; a third lens group G3 of positive refractive power; and a fourth lens group G4 of positive refractive power, and: the first lens group G1, the second lens group G2, the third lens group G3 and the fourth lens group G4 are arranged in order from a side of the first object; and a distance D in mm along an optical axis between an optical surface of the fourth lens group G4 closest to the second object, and the second object, satisfies a condition of 0.1<D<5.

Abstract: In a projection display system for example, a projection lens includes a non-radially symmetrical light stopped that is painted or otherwise applied directly to the surface of an optical lens element of the projection lines.

Abstract: A projection optical system includes a plurality of light-transmissive members and projects an image of a first surface onto a second surface. The projection optical system includes a light-transmissive crystal member made of crystal material. At least one of the light-transmissive crystal members satisfies 0.3<ED/LD<0.95 Where an clear aperture diameter of the light-transmissive crystal member is denoted by ED and an outside diameter of the light-transmissive crystal member is denoted by LD.

Abstract: A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Abstract: A projection lens, which has a first group of lenses having a negative power and a second group of lenses having a positive power, sequentially arranged from an enlargement side to a reduction side, satisfying the following conditional expressions (1) through (4), and having a field angle of about 110° or more: (1) 25.0<Fb, (2) F<0.65H, (3) 30F<|EP|, and (4) 4F<T, where Fb is an air-converted distance (mm) from a final surface at the reduction side of the lens to an image point, H is a maximum image height (mm) at the reduction side, F is a focal distance (mm) of the whole projection lens, EP is a exit pupil distance (mm), and T is an air-converted distance (mm) obtained by air-converting a gap between the first group of lenses and the second group of lenses.

Abstract: A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.

Abstract: A diffractive optical element includes a first layer having a relief-type grating, a second layer having a relief-type grating, and a third layer having a relief-type grating. The first, second and third layers are formed of different materials. The diffractive optical element has at least three diffraction optical parts in the boundary areas of the respective layers. The diffractive optical element is set so that at least wavelengths, the diffraction efficiency thereof for diffracted light of a predetermined order may be maximum. The three wavelengths are substantially coincident with the main wavelengths of the three primary colors.

Abstract: A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1-L16) sequentially arranged along an optical axis (16), a means for creating radially polarized light arranged at a given location in that region extending up to the last of said imaging optical components, and a crystalline-quartz plate employable in such a system. A polarization rotator (14) for rotating the planes of polarization of radially polarized light and transforming same into tangentially polarized light, particularly in the form of a crystalline-quartz plate as noted above, is provided at a given location within a region commencing where those imaging optical components that follow said means for creating radially polarized light in the optical train are arranged. The optical imaging system is particularly advantageous when embodied as a microlithographic projection exposure system.

Abstract: The present invention is directed to a projection lens that has a sufficiently long back focus to enable a wide-angle projection and has astigmatism, abaxial spherical aberration (coma), distortion, and other types of aberration satisfactorily corrected. The projection lens includes first to third groups of lenses G1, G2 and G3. The first group of lenses G1 consist of four pieces of lenses, and the first or foremost negative one of the lenses is an aspheric lens. The second group of lenses G2 consist of two pieces of lenses, and the first or foremost negative one and the second positive one of the lenses are joined together. The third group of lenses G3 consist of six pieces of lenses, and the second foremost positive one, the third negative one, and the fourth positive one of the lenses are joined together. The projection lens is characterized in that the following formulae are satisfied; bf/f≧2.8   (1) 1.1≦f2/f3≦1.6 , and   (2) 1.65≦|f1|/f≦2.

Abstract: A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.

Abstract: An optical element of the present invention comprises a fluorite substrate 1, and a lanthanum fluoride film 2 formed directly on the substrate 1. The substrate 1, on which the lanthanum fluoride film 2 is formed, has a plane which is a (111) plane or a plane inclined by an angle within ±30 degrees, preferably within 15 degrees from the (111) plane. Therefore, the lanthanum fluoride film undergoes the crystal growth subjected to the C-axis orientation on the optical substrate. Since the lanthanum fluoride film is dense and has a small surface area, it scarcely involves the oxidation and hydroxylation areas as well as the structural defect. Therefore, it is possible to reduce the optical loss of the optical element in the vacuum ultraviolet region.

Abstract: A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

Abstract: An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

Abstract: A luminous flux, from one conjugate surface (A), having an opening angle of at least 10° sequentially passes through a first optical system (30) having a luminous flux convergent action in the vicinity of its reference axis and a second optical system (31) having a luminous flux divergent action in the vicinity of its reference axis, and converges on another conjugate surface (B). A specific condition is given to the converging distance of each converging point at a luminous flux section including a principal ray according to the passing position of the luminous flux through the first optical system (30) to thereby implement an oblique-incident optical system having a half angle of at least 60° and a comparatively simple structure irrespective of a type of an optical element used.

Abstract: A zoom lens includes, in order from the enlarging side, a first lens group that has negative refractive power, is movable for focusing, and is stationary during zooming, second, third, fourth, and fifth lens groups that are movable for zooming, and a sixth lens group that is stationary during zooming. The second, fourth, and sixth lens groups have positive refractive power and the fifth lens group has negative refractive power. The second and fourth lens groups move nearer the enlarging side when the zoom lens zooms toward the telephoto end, and the fifth lens group is nearer the enlarging side at the zoom lens telephoto end than at the zoom lens wide-angle end. The ratios of the focal lengths of the first, third, and fifth lens groups to the focal length of the zoom lens satisfy three conditions. A projection display device uses the zoom lens.

Abstract: A lens assembly comprising nine lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, &agr; Rba greater than or equal to about 1°, and &agr; Rbi less than or equal to about −14°. The outward ray angle tilt and the inward ray angle tilt are positive if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection. The outward ray angle tilt and the inward ray angle tilt are negative if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in the direction of projection.

Abstract: When a projection lens system used for a rear projection type image display apparatus has a first lens group having an aspherical lens surface, a second lens group, a third lens group sharing almost all the positive refractive power of the overall system, a fourth lens group having an aspherical lens surface, a fifth lens group, and a sixth lens group including a lens having a profile of aspherical surface in which the concave surface thereof faces the screen side and the refractive power in the marginal area is weaker than the refractive power around the optical axis, a projection lens system having a large aperture ratio (low F-number), high focus, wide field angle, and sufficient marginal light amount ratio can be realized at a low cost.

Abstract: The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.

Abstract: There is provided a projection type image display system comprising color image displaying means for displaying an image to be projected onto a screen, means for storing a correlation between an initial XYZ-tristimulus value of an image projected onto the screen at the time of initial adjustment and an initial luminance value of the image projected onto the screen at the time of initial adjustment, luminance measuring means for measuring a maximum luminance value of each of primary colors of an image projected onto the screen upon lapse of a predetermined time from the initial adjustment, means for estimating an XYZ-tristimulus value of the image on the screen upon lapse of the predetermined time based on the maximum luminance value and the correlation, and means for calculating a color correction coefficient based on the estimated XYZ-tristimulus value.

Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

Abstract: A real image display system includes a primary image source for projecting a primary image from the start of a primary light path to an end of the primary light path at which the primary image is viewable, two reflectors positioned in the primary light path between the primary image source and the projected real image, a circular polarizer for circularly polarizing a light beam positioned in the primary light path between the mirror and real image, whereby outside light entering the system is substantially blocked before exiting the system, thereby substantially eliminating ghost image formation caused by outside light sources.

Abstract: A lens apparatus for projection includes a plurality of lenses on an optical axis. A shading plate 11 for covering the peripheral portion of the lens to block off light entering the peripheral portion is provided as a single member on the optical axis with the lenses to omit an inking process. In addition, the shading plate 11 is integrally provided with a contrast compensating plate 13 for compensating a projected image, so that it is not required to provide any portions for supporting the contrast compensating plate 13. Moreover, a shading wall 23 for blocking off light leaking out of the peripheral portion of the lens is provided on the peripheral portion of the shading plate 11. Thus, it is possible to provide a lens apparatus for projection, which has a simple structure and which can be easily assembled to reduce the producing costs.

Abstract: A lens assembly comprising seven lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, &sgr;Rba greater than or equal to about 1°, and &sgr;Rbi less than or equal to about −14°. The outward ray angle slopes and the inward ray angle slopes are positive if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection. The outward ray angle slopes and the inward ray angle slopes are negative if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection.

Abstract: An objective (1), in particular for a microlithography projection apparatus, has lenses or lens parts falling into at least two groups. The first group (3) is made of a first crystalline material and the second group (5) is made of a second crystalline material. In the first group (3), an outermost aperture ray (15) is subject to a first optical path difference between two mutually orthogonal states of linear polarization; and the same outermost aperture ray is subject to a second optical path difference in the second group (5). The two different crystalline materials are selected so that the first and second optical path difference approximately compensate each other. A suitable selection consists of calcium fluoride for the first and barium fluoride for the second crystalline material.

Abstract: Projection lens systems for use with cathode ray tube (CRT) projection televisions are provided which have positive first lens units (U1) and negative second lens units (U2) where the negative second lens units are customized in terms of at least one optical property for at least two of the colors of light produced by the CRTs with which the units are used. The at least one optical property is not spectral transmission, although the second lens units can also be customized for spectral transmission. As illustrated in FIGS. 1B-1F and FIGS. 8B-8F, such customization of a non-transmissive property provides an effective and cost effective approach for improving the color performance of CRT projection lens systems. Constructions for the positive first lens unit which improve image contrast and reduce manufacturing costs are also provided.

Abstract: An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

Abstract: The invention relates to a projection exposure apparatus for microlithography at &lgr;<200 nm. The projection exposure apparatus for microlithography has a light source with a wavelength less than 200 nm and a bandwidth, which is less than 0.3 pm, preferably less than 0.25 pm and greater than 0.1 pm. The projection exposure apparatus includes an exclusively refractive projection objective which is made out of a single lens material. The projection objective provides for a maximum image height in the range of 12 mm to 25 mm, an image side numerical aperture in the range of 0.75 up to 0.95 and a monochromatic correction of the wavefront of rms<15‰ of the wavelength of the light source.

Abstract: A projection optical system comprises a first lens group with positive power, a second lens group with negative power, a third lens group with positive power, a fourth lens group with negative power, and a fifth lens group with positive power. At least one of the first, second, and third lens group has an aspherical surface. A lens arrangement of one embodiment has a plurality of waists of lenses, with aspherical surface before and after a first waist.

Abstract: A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric imaging group (5) having a concave mirror (6) and a beam-deflector (7), and a dioptric imaging lens group (20) that commences after the beam-deflector. The system is configured such that the intermediate image follows the first lens (17) of a dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflector helps to avoid imaging aberrations.

Abstract: A luminous flux, from one conjugate surface (A), having an opening angle of at least 10° sequentially passes through a first optical system (30) having a luminous flux convergent action in the vicinity of its reference axis and a second optical system (31) having a luminous flux divergent action in the vicinity of its reference axis, and converges on another conjugate surface (B). A specific condition is given to the converging distance of each converging point at a luminous flux section including a principal ray according to the passing position of the luminous flux through the first optical system (30) to thereby implement an oblique-incident optical system having a half angle of at least 60° and a comparatively simple structure irrespective of a type of an optical element used.

Abstract: An optical system includes multiple cubic crystalline optical elements aligned along a common optical axis and having their crystal lattices oriented with respect to each other to minimize the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements as the elements are oriented such that the intrinsic birefringences of the individual elements cancel each other out. In one embodiment, two [110] cubic crystalline optical elements are clocked with respect to one another and used in conjunction with a [100] cubic crystalline optical element to reduce retardance.

Abstract: In a projection lens, there are arranged in order from a screen side, a first lens group including a meniscus lens having a convex lens surface in a central portion toward a screen with refracting power, a second lens group including a lens having a convex lens surface in a central portion toward a video generating source, a third lens group including a lens having convex lens surfaces in both sides with positive refracting power, a fourth lens group including a lens having a convex lens surface in a central portion toward the video generating source with positive refracting power, and a fifth lens group including a lens having a concave lens surface toward the screen with negative refracting power. An entrance pupil is arranged between incident and emitting surfaces of a power lens.

Abstract: Projection lenses for use with pixelized panels (PP) are provided. The projection lenses have a negative first unit (U1) separated from a positive second unit (U2) by a reflective surface (RS) which folds the lens' optical axis. The lenses are telecentric on the short conjugate side, have a large field of view in the direction of the long conjugate, and have low aberration levels, including, in particular, low levels of lateral color.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: An improved projection system uses a diffractive structure to provide improved image resolution. Display applications using red, green, and blue channel lenses to produce a fill-color image use different diffractive structures to optimize color correction for each of the individual color bands. The preferred location of the diffractive structure is chosen near the aperture stop of the lens to minimize the range of ray incidence angles on the diffractive structure so that diffraction efficiency is maximized for the full field of view. Aspheric surfaces that have both even-power and odd-power terms are used throughout the design. The substantial improvement in image quality provided by the diffractive structure and the novel aspheric surfaces allows shorter object to image distances so that smaller-volume products are made possible.

Abstract: A refractive projection objective for use in microlithography with lenses made exclusively of one and the same material has an image-side numerical aperture larger than 0.7. A light bundle defined by the image-side numerical aperture and by the image field has within the objective a variable light-bundle diameter smaller than or equal to a maximum light-bundle diameter. In a length interval measured on the optical axis from the system diaphragm towards the object field and at least equaling the maximum light-bundle diameter, the variable light-bundle diameter exceeds 85% of the maximum light-bundle diameter.

Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.

Abstract: The present invention is directed to a projection lens that has a sufficiently long back focus to enable a wide-angle projection and has astigmatism, abaxial spherical aberration (coma), distortion, and other types of aberration satisfactorily corrected. The projection lens includes first to third groups of lenses G1, G2 and G3. The first group of lenses G1 consist of four pieces of lenses, and the first or foremost negative one of the lenses is an aspheric lens. The second group of lenses G2 consist of two pieces of lenses, and the first or foremost negative one and the second positive one of the lenses are joined together. The third group of lenses G3 consist of six pieces of lenses, and the second foremost positive one, the third negative one, and the fourth positive one of the lenses are joined together.

Abstract: A projection lens includes a first lens having a negative refractive power, a second lens having a positive refractive power, a third lens having a negative refractive power and including§a first component lens having a negative refractive power and a second component lens having a positive refractive power, and a fourth lens having a positive refractive power. The first, second, third and fourth lens are arranged in that order from a screen side toward an image surface side to form a telecentric system toward the image surface side. A surface on the image surface side of the first lens, and a surface (33) on the image surface side of the second component lens of the third lens are aspherical.

Abstract: A zoom lens system with temperature compensation function includes the first lens group having a positive refractive power, the second lens group that has negative refractive power and moves along an optical axis, the third lens group having a plastic lens of positive refractive power, the fourth lens group that has positive refractive power and moves along the optical axis, the first lens barrel which extends from the first lens group to the third lens group, and the second lens barrel which extends from the third lens group to an image pickup element, and expansion or contraction of at least one of lens barrels in accordance with temperature change cancels variation of image location caused by temperature change of the lens groups.

Abstract: In a projection optical system for projecting and transferring a pattern on a projection original R onto a photosensitive substrate W, one or a plurality of lenses having an in-homogeous radial refractive index about the optical axis are used, while one or a plurality of aspheric surfaces for correcting the aberration resulting from the in-homogeousness in refractive index of lenses are provided.

Abstract: A projection exposure apparatus has an illumination optical system 3 for illuminating a mask formed with a pattern with beams of radiation, and a projection optical system for forming an image of the pattern on a workpiece on the basis of radiation from the mask. The illumination optical system supplies an illumination radiation having a center wavelength of 180 nm or smaller, and the projection optical system includes at least one concave mirror, fifteen or less pieces of refracting lenses, and four or more aspherical surfaces.

Abstract: A tilt projection optical system, that performs enlarged projection from the primary image plane on the reduction side to the second image plane on the enlargement side without forming an intermediate real image while being located at an angled position, has, sequentially from the primary image plane side: a refractive lens group including an aperture; a bending mirror that rotates the optical axis for the optical system after said bending mirror by approximately 90 degrees; and an optical group including at least one reflective surface that has a negative power; wherein the construction is such that the radius of the circle that encompasses all the light rays involved in the image formation on the second image plane and that is parallel to the surfaces of each lens of the refracting lens group enlarges once and then converges in terms of its radius on the enlargement side from the aperture of the refracting lens group, and wherein a predetermined condition is met.

Abstract: An objective with lenses made of two different crystals, in particular CaF2 and BaF2 is particularly suitable as a refractive projection objective for microlithography at 157 nm. Such projection objectives for 193/248 nm with quartz glass and achromatization with CaF2 are compaction-resistant with BaF2. Microlithography projection exposure equipment in the 100-200 nm wavelength region include other fluorides and partially catadioptric objectives.

Abstract: An illumination system having a rod integrator and an objective for imaging an object field onto an image field, which has an entry surface, an exit surface, and reflecting side surfaces. A lens-free interspace with an axial size of at least 30 mm is in the objective. A plane within this interspace is optically conjugate to the plane of the entry surface. All rays starting from a central field within the entry surface that are not reflected at the side surfaces have smaller ray heights in the lens-free interspace in relation to the optical axis than all the rays starting from the central field that are reflected at the side surfaces; the ratio of the field width to the width of the entry surface is at most 0.7. The ratio of the field height to the height of the entry surface is at most 0.7.

Abstract: Partial objective for illumination of an image field in an illuminating device of a microlithographic projection exposure apparatus, arranged between a aperture plane and an image plane. The partial objective comprises a first lens group and a second lens group with a lens with a first aspheric lens surface. The second lens group has at least a first lens with negative refractive power and at least a second lens with positive refractive power. The maximum field height Yimmax within the image field is at least 40 mm; the image-side numerical aperture is at least 0.15. The distribution of the chief ray angles PF over the field heights Yim within the image field is given by a pupil function PF(Yim), which consists of a linear contribution c1·Yim and a non-linear contribution PFNL(Yim), the non-linear contribution PFNL(Yim) being at least +15 mrad for the maximum positive field height Yimmax.

Abstract: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first ob

Abstract: A projection optical system of the present invention has a first lens group G1 being positive, a second lens group G2 being negative, a third lens group G3 being positive, a fourth lens group G4 being negative, a fifth lens group G5 being positive, and a sixth lens group G6 being positive in the named order from the first object toward the second object, in which the second lens group G2 comprises an intermediate lens group G2M between a negative front lens L2F and a negative rear lens L2R and in which the intermediate lens group G2M is arranged to comprise at least a first positive lens being positive, a second lens being negative, a third lens being negative, and a fourth lens being negative in the named order from the first object toward the second object.