Abstract: The disclosure relates to an image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus. In some embodiments, at least one optical element includes a cubic-crystalline material which at a given operating wavelength has a refractive index n that is greater than 1.6. The image-side numerical aperture NA of the image-projecting system is smaller than the refractive index n. The difference (n?NA) between the refractive index n and the numerical aperture NA of the image-projecting system is at most 0.2.

Abstract: A projector optical system for forming a real image by projecting an image of a display element has, sequentially from a screen side or an observation side, a first lens group having positive refractive power, an aperture diaphragm, a second lens group, and a third lens group having positive refractive power, with a diffractive optical element being provided on at least one of the first lens group and the second lens group which are adjacent to the aperture diaphragm. The projector optical system satisfies: 0.05<G/L<0.9 wherein G is an air gap on the optical axis between the second lens group and the third lens group, and L is a length on the optical axis, from the surface that is closest to the screen side to the display element.

Abstract: A projection lens apparatus includes a plurality of lenses, for enlarging and projecting, onto a screen, an original image displayed on an image generation source. The plurality of lenses are arranged, beginning with the lens nearest the screen, as first to sixth lens groups. The fourth lens group includes one meniscus lens that has a positive refracting power and has a concave lens surface directed toward the screen. The concave lens surface of the meniscus lens included in the fourth group lens has a curvature in the vicinity of an outer portion of the concave lens surface that is smaller than a curvature in a predetermined area of the concave lens surface defined between a light axis of the concave lens surface of the meniscus lens and the smaller curvature of the concave lens surface in the vicinity of the outer portion of the concave lens surface.

Abstract: A projection apparatus including an optical engine, a ring, a lens and multiple casings is provided. The optical engine is suitable for producing an image light beam to project an image onto a screen. The ring is fixed on the optical engine. The lens is disposed outside the optical engine and located at a transmission path of the image light beam. The casings are assembled to the ring and connected to each other to form a lens barrel for fixing the lens, and the lens is driven to move relative to the optical engine and the ring by the lens barrel. The projection apparatus has a smaller overall dimension.

Abstract: A zoom lens comprises a plurality of lens units including a first lens unit disposed most adjacent to an enlargement side and having negative refractive power, wherein one or more lens units of the plurality of lens units are moved in the direction of the optical axis thereof during magnification change, and wherein the first lens unit includes a 1-1st lens unit comprising at least one lens of negative refractive power and moved during focusing and a 1-2nd lens unit having positive refractive power, and fixed during focusing.

Abstract: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.

Abstract: Imaging systems, in particular a projection objectives of a microlithographic projection exposure apparatus, are provided. The imaging systems can have an optical axis and produce an image field which is extra-axial relative to the optical axis. The imaging systems can include a first optical element which causes a first distribution of the retardation in a plane that lies perpendicular to the optical axis, and at least one second optical element which causes a second distribution of the retardation in a plane that lies perpendicular to the optical axis. The second distribution of the retardation can at least partially compensate the first distribution of the retardation. The first and the second optical elements can be designed without rotational symmetry relative to the optical axis.

Abstract: A curved surface image-conversion optical system is configured to take an image of a hemispherically curved object or project it as a curved surface image, which optical system includes a front unit formed of a transparent medium rotationally symmetric about a center axis and having at least two internal reflecting surfaces and two transmitting surfaces, a rear unit that is rotationally symmetric about the center axis and has positive power, and an aperture located coaxially with the center axis. The front unit includes the first transmitting surface through which a light beam from an object point is incident on the front unit, the first reflecting surface for reflecting the transmitted light beam, the second reflecting surface for reflecting the reflected light beam and the second transmitting surface through which the reflected light leaves the transparent medium.

Abstract: A projector includes a projection lens having a first lens. The first lens is a plastic lens made by injection molding using a single gate, and has a gate mark on its outer edge. The first lens also has a weld line at the opposite side to the gate mark, which extends from the outer edge. The first lens is positioned such that the gate mark faces a long side of a rectangular pattern of image light on the lens surface, and the weld line becomes disposed outside the rectangular pattern.

Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.

Abstract: A high-performance lens system including lens elements of small diameters for projecting on to a screen or the like in an enlarged fashion images from light valves such as mainly DMDs (Digital Micromirror Devices) for forming images by changing reflecting directions of light is provided. A lens system includes, sequentially in that order from a magnifying side, a first lens group which makes up a substantially afocal optical system as a whole and a second lens group having a positive refractive power as a whole, and depending upon applications, a third lens group made up of a single positive lens element is provided in the vicinity of a light valve such as a DMD on a contracting side of the second lens group.

Abstract: A high-performance lens system including lens elements of small diameters for projecting on to a screen or the like in an enlarged fashion images from light valves such as mainly DMDs (Digital Micromirror Devices) for forming images by changing reflecting directions of light is provided. A lens system includes, sequentially in that order from a magnifying side, a first lens group which makes up a substantially afocal optical system as a whole and a second lens group having a positive refractive power as a whole, the second lens group being configured to include, sequentially in that order from a magnifying side thereof, a first sub-lens group or 2a lens group having a negative refractive power as a whole and a second sub-lens group or 2b lens group having a positive refractive power as a whole, and depending upon applications, a third lens group made up of a single positive lens element is provided in the vicinity of a light valve such as a DMD on a contracting side of the second lens group.

Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

Abstract: [Object] To provide a high-brightness, small, low-cost optical apparatus which covers a wide-angle to super-wide-angle region and which reliably corrects various aberrations with a small number of lenses. [Solving Means] At least one negative lens unit 1, a meniscus lens 2 that is convex on an object side, an aperture stop S, and a double-convex positive lens 3 are arranged in order from the object side. At least one of the lenses positioned on the object side of the aperture stop S and the positive lens 3 include respective aspherical surfaces.

Abstract: A projector includes an illuminating device having a light source device, a first lens array having plural first small lenses, a second lens array having plural second small lenses corresponding to the plural first small lenses, and a superposing lens; an electro-optic modulator, and a projection optical system. A conjugate point of an image forming area in the electro-optic modulator is located on the light source device side or the projection optical system side from the vertex of a lens curved surface in each first small lens of the first lens array. An eccentric amount of each second small lens in the second lens array is adjusted such that each principal ray of the partial light beam passing through each first small lens in the first lens array passes an approximately central portion of the image forming area on the image forming area of the electro-optic modulator.

Abstract: A lens module (800) includes a lens barrel (20), a base (10), and a temperature compensation module (30). A first lens (201) is disposed in the lens barrel. The lens barrel is disposed in the base. The temperature compensation module is detachably installed in the base, and the temperature compensation module includes a temperature compensation lens (302). The temperature compensation lens is configured for compensating for deformation of the first lens caused by temperature changes.

Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.

Abstract: An optical unit has a first lens holder holding a first lens and a second lens holder holding a second lens, the first lens holder and the second lens holder being mounted on a common lens base. The first lens holder is movable in the direction of one side of the exit end face of a light tunnel, and the second lens holder is movable in the direction of another side, adjacent to the one side, of the exit end face of a light tunnel. The first lens holder and the second lens holder are independently moved to bring an illuminating light area on a DMD, as an image forming device, into alignment with an image forming area on the DMD. The illuminating light area can thus be accurately positioned in the image forming area on the DMD. The optical unit has a high light utilization efficiency and can easily be operated for positional adjustment of the illuminating light area. The optical unit is incorporated in a projection display apparatus.

Abstract: A digital light-processing projection apparatus includes a light source, a beam splitter module and an optical combiner module. The beam splitter module is used in conjunction with an optical combiner module that includes combiners and a plurality of prisms. The beam splitter module comprises a beam splitter element for splitting the beam into a plurality of color lights that pass through the respective prisms separately. The polarization direction of each color light when separated in the beam splitter module is equal to the polarization direction of each respective color light when colour combination in the combiner module.

Abstract: In certain aspects, the disclosure relates to an imaging system, particularly an objective or an illumination device of a microlithography projection-exposure apparatus having an optical axis (OA), with at least one optical element of an optically uniaxial crystal material whose optical crystallographic axis is substantially parallel to the optical axis (OA) of the imaging system and which at a working wavelength has an ordinary refractive index no and an extraordinary refractive index ne, with the extraordinary refractive index ne being smaller than the ordinary refractive index no; wherein the optical element is arranged in the ray path pattern in such a way that, at least for rays of the working wavelength which meet the optical element at an angle that falls within an angular range from the optical axis, the p-polarized component is reflected more strongly than the s-polarized component.

Abstract: A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

Abstract: An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

Abstract: A projection system having a prescribed relationship between the condenser and the projection lens is disclosed, where an imager gate normally coinciding with a projection object plane is between and spaced away from a condenser back focal plane and a condenser image plane. The condenser images an extended source onto the condenser image plane. A pixilated panel or film defining a graphic image is located at the imager gate. The magnification of the condenser is chosen so the image of the source is essentially the same size as the pixilated panel. Positioning the imager gate away from the condenser image plane provides blurring of any brightness non-uniformities across the area of the source, providing a relatively uniform illumination pattern whose outer shape matches the shape of the imager gate.

Abstract: Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Abstract: A projection lens includes two lens groups, arranged as follows from the magnification side: a first lens group of negative refractive power, a mask, an aperture stop, and a second lens group of positive refractive power. The projection lens is telecentric or nearly telecentric on the reduction side. Each of the first lens group and the second lens group includes a lens component formed of three lens elements with the middle lens element of each of these lens components having refractive power of opposite sign from the other two lens elements. The distance between the first lens group and the second lens group is large enough for placement of a mirror for folding the optical path of the projection lens. The projection lens satisfies specified conditions regarding focal lengths and spacings of lens surfaces. A projection display device uses the projection lens.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: A portable projection device comprises a housing, a handle, and an optical engine. The optical engine comprises an illumination source, an imaging system, and a wide angle projection lens that includes a first lens group of negative refractive power, the first lens group having at least one aspheric surface, a second lens group, and a third lens group of positive refractive power. For the wide angle projection lens, the following Conditions (1) to (4) are satisfied: |F1/F|?4.5 (Condition (1)); 2.5?|F2/F|?6.0 (Condition (2)); 3.8?|F3/F|?5.0 (Condition (3)); and 0.8?BFL/F?1.4 (Condition (4)). The portable projection device can be implemented as a personal gaming system and can also be configured as a portable, fully integrated video gaming system that allows gamers to plug in and play at nearly any location, with only a wall or other viewing surface being used to view the projected image.

Abstract: The present invention relates to a rear projection type image display device comprising projection lenses (2, 3) for projecting an image displayed on an image display element onto a transmission type screen (6) on a larger scale, an optical path turn-back mirror (7) for turning back halfway a light beam projected from the projection lenses, and a drive circuit for displaying an image on the image display element, that are fixedly housed within a housing (5). When a diagonal size of the transmission type screen (6), the depth of the housing (5), and the length from a lower end of the screen (6) to a lower end of the housing (5), are assumed to be SS (inch), D (inch), and L (inch), respectively, the following conditions are satisfied: SS>40, D?SS/3.0, L?SS/10.9.

Abstract: A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.

Abstract: An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

Abstract: Provided are a projection optical system, a projection television, and a method of manufacturing a lens included in the projection optical system. The projection optical system includes lenses for projecting color beams onto a screen. A color filter layer, absorbing at least one of the color beams, is coated on the surface of at least one of the lenses.

Abstract: A display element having a plurality of pixel portions arranged two-dimensionally with a predetermined pixel pitch and a microlens array including a plurality of microlenses arranged two-dimensionally corresponding to the plurality of pixel portions on an incident side or an emission side of light with respect to the pixel portions, wherein, in the microlens array, each microlens has a lens surface of a hyperboloid of revolution, and a lens pitch of the plurality of microlenses is set to a pitch smaller than the lens pitch able to substantially equivalently maintain a converging efficiency of a lens of the hyperboloid of revolution and a lens of an ellipsoid of revolution with respect to the incident light and able to maintain a converging efficiency higher than the converging efficiency of the lens of the ellipsoid of revolution or wherein, in the microlens array, each microlens has a lens surface of a hyperboloid of revolution, and a lens pitch is 20 ?m or less; a display device; and a microlens array.

Abstract: An aperture comprising a round filter portion and at least one annular filter portion is provided. The round filter portion and the annular filter portion are forming a round zone. A transmission wavelength range of the round filter portion is larger than a transmission wavelength range of the annular filter portion. A projection lens system with the aperture can produce images having higher brightness of the images and better image quality.

Abstract: A projection system includes a modulator and a field lens. The modulator is to modulate light in accordance with image data. The field lens is to at least partially collect the light modulated by the modulator. The field lens has a number of elements. Each element has a wedged shape different than wedged shapes of neighboring elements.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.

Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.

Abstract: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1.

Abstract: A projection lens includes, in order from a magnification side, a first lens group, a second lens group and a third lens group. The first lens group includes, in order from the magnification side, a negative lens whose lens made of a non-resin, a plastic lens at least one surface of which is aspheric and a positive lens. The second lens group includes a plastic lens at least one surface of which is aspheric, a positive lens and a negative lens. The third lens group includes a positive lens. The following conditional expressions are satisfied; 1.0<Bf/f?1.8 2.0<f1/f 2.0<f2/f where Bf denotes a air-conversion back focus of the entire system, f denotes a focal length of the entire system, f1 denotes a focal length of the first lens group and f2 denotes a focal length of the second lens group.

Abstract: A head-mounted display (HMD) comprises a frame for hanging on a user's head, and a display device affixed to the frame. The display device comprises alight source, a driving circuit for generating data signals, a polarization beam splitter (PBS), for passing the light emitted from the light source, a liquid crystal on silicon panel (LCOS panel) for reflecting the light from the PBS based on the data signal generated by the driving circuit, and a lens group including a biconvex glass spherical prism and an aspherical plastic prism. The lens group is used for focusing the reflected light from the LCOS panel.

Abstract: An illumination apparatus includes: a group of light source segments; a group of condenser lenses arrayed as opposed to the group of light source segments, and a group of rectangular lens elements arrayed as opposed to the group of condenser lenses for converging a light ray transmitted through the opposing condenser lens; and an illumination optical system for guiding the rays to an illumination plane. The lens elements have a shape of a rectangle and are arrayed in a rectangular effective area in such a way that a longitudinal axis of each lens elements intersects an axis passing a side of the effective area at 45°.

Abstract: A refractive projection optical system for imaging a first object into a region of a second object comprises a plurality of lenses disposed along an imaging beam path of the projection optical system; wherein the projection optical system is configured to have a numerical aperture on a side of the second object of greater than 1 wherein the projection optical system is configured to generate an intermediate image of the first object and to image the intermediate image into the region of the second object, wherein the intermediate image is formed in between, the first and second objects.

Abstract: A projecting lens device includes a first projecting lens system which enlarges and projects an incident image and light onto a projection plane, a second projecting lens system which guides an image generated by an image generator and the light of an illumination system to the first projecting lens system, and a main lens barrel and a sub lens barrel in which the first projecting lens system and the second projecting lens system are installed. The main lens barrel is made of a thermally conductive material such as aluminum, the sub lens barrel is disposed in the rear of the main lens barrel, and a heat prevention member is disposed between the main lens barrel and the first projecting lens system.

Abstract: A front group is formed of a negative first lens as a meniscus lens which is convex at the object side and a negative second lens, and a rear group is formed of a biconvex positive third lens, an aperture stop, a negative fourth lens and a biconvex positive fifth lens. The first lens is a glass lens, and the second lens is a plastic aspherical lens. The following conditions are satisfied: ?2.4<fI/f<?1.55, 0.15<f2/f1<0.35, va<29, and vb>50, where f denotes a focal distance of a whole system, f1 denotes a focal distance of the first lens, f2 denotes a focal distance of the second lens, fI denotes a focal distance of the front group, va denotes an average value of abbe numbers of the third and the forth lenses, and vb denotes an average value of abbe numbers of the rest of the lenses.

Abstract: A zoom optical system, in order from a reduction side to a magnification side, includes a first lens unit having positive optical power, a second lens unit having the positive optical power, a third lens unit having negative optical power, and a fourth lens unit having the positive optical power, wherein respective intervals between the first, second, third and fourth lens units change during zooming, a conjugate position on the magnification side with respect to a conjugate position on the reduction side, and a position of a pupil of the zoom optical system with respect to the conjugate position on the reduction side, are substantially fixed over an entire zooming range, and during zooming from a wide angle end to a telephoto end, the fourth lens unit moves toward the magnification side, and an interval between the first lens unit and the fourth lens unit increases.

Abstract: A relay lens is provided in an illumination system for use in microlithography. The relay lens can be used to uniformly illuminate a field at a reticle by telecentric light beams with variable aperture size. The relay lens can include first, second, and third lens groups. At least one of the second and third lens groups can include a single lens. This can reduce costs and increase transmission by requiring less CaF2 because fewer optical elements are used compared to prior systems.

Abstract: A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).

Abstract: A projection lens is provided and includes: in order from the object, a first lens group having a negative refractive power and including an aspheric lens and a double-concave lens in this order from the magnification side; a second lens group having a positive refractive power and including one positive lens or one positive lens and one negative lens; and a third lens group having a positive refractive power, including three to five lenses including a cemented lens portion and a positive lens portion in this order from the magnification side, and including a surface closest to the magnification side as an aspheric surface. The projection lens has a substantially telecentricity on the reduction side, the third lens group has a magnification-side focal position located between the third and second lens groups, the projection lens has the longest air space between the first and second lens groups, and the projection lens satisfies specific conditions.

Abstract: In general, in one aspect, the invention features systems that include a spatial light modulator, a scanning optical component configured to direct light from the spatial light modulator along a plurality of different paths, a projection optical assembly including a plurality of projection lens modules corresponding to the plurality of different paths, wherein each projection lens module is configured to receive light from the spatial light modulator directed along the corresponding path and projects an image of the spatial light modulator to a common image space.

Abstract: A projection lens for use with LCD panels is provided. The lens has a first lens unit which includes a strong negative lens element having an aspherical surface which provides distortion correction, and a second lens unit which includes a first lens subunit separated by an airspace from a second lens subunit, wherein the first lens subunit has a strong positive power and the second lens subunit has a weaker power. The second lens subunit can include a negative lens element, followed by a positive lens element, followed by a plastic lens element having an aspherical surface. The projection lens has a field of view of at least 35° so that the overall projection lens system has a compact size.