Abstract: A projection lens system includes, in order from the magnification side, a negative first lens group and a positive second lens group, and is telecentric on the reduction side. The first lens group includes a first lens formed as an aspheric lens which is disposed closest to the magnification side. The second lens group includes a second lens formed as a positive lens, in or near which an aperture diaphragm is disposed, disposed closest to the magnification side, and an aspheric lens. Between the aperture diaphragm and the aspheric lens of the second lens group, two or more negative lenses and two or more cemented surfaces are disposed. And, 0.10<f/f2?1<0.30, and N2?1>1.75 are satisfied. Here, f denotes a focal length of the whole system, f2?1 denotes a focal length of the second lens, and N2?1 is a refractive index of the second lens at the d-line.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: The projection zoom lens system includes a negative first lens group, a positive second lens group, a third lens group, a positive fourth lens group, a fifth lens group, and a positive sixth lens group. The lens system is nearly telecentric on a reduction side. During zooming, the second to fifth lens groups are moved while the first and six lens groups remain stationary. The third lens group includes a positive lens LP having a convex surface directed to a magnification side, and a negative lens LN having a concave surface which is directed to the reduction side and has a curvature stronger than a magnification-side surface of the negative lens LN. The conditional expression of 5.0?|fG3/RLN-2| is satisfied. Here, fG3 denotes a focal length of the third lens group, and RLN-2 denotes a radius of curvature of the reduction-side surface of the negative lens LN.

Abstract: The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising at least four optical members which are arrayed in turn from the second object plane, and made of an isotropic crystal, wherein the at least four optical members are formed by alternately arraying optical members in each of which a <1 1 1> crystal axis is oriented along a direction of an optical axis, and optical members in each of which a <1 0 0> crystal axis is oriented along the direction of the optical axis.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.

Abstract: A projection-type display apparatus, comprises a front lens group having a plural number of lenses, each having rotationally symmetric surface configuration, a rear lens group, being disposed in rear of the front lens group, including a refractive lens for diverting a light and having a rotationally symmetric surface configuration, and a plural number of free curved surface lenses, each having a rotationally asymmetric free curved surface configuration, and a reflection mirror, being disposed in rear of the rear lens group, having a convex configuration into a direction of reflection of light and a rotationally asymmetric free curved surface configuration, at least in a part thereof.

Abstract: A vehicle camera and wide-angle objective lens system are disclosed wherein the wide-angle objective lens has image aberrations or errors that do not deteriorate the detection of obstructions or obstacles in its field of view.

Abstract: The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

Abstract: A vehicle camera and wide-angle objective lens system are disclosed wherein the wide-angle objective lens has image aberrations or errors that do not deteriorate the detection of obstructions or obstacles in its field of view.

Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.

Abstract: An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.

Abstract: Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.

Abstract: The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.

Abstract: A projection lens includes, in order form a magnification side: a first lens group having negative refractive power; and a second lens group having positive refractive power. An aspheric lens is arranged on the most magnification side of the first lens group. The conditional expressions 3<Bf/f and 0.4<H/L are satisfied, where f denotes a focal length of the projection lens, Bf denotes an air-converted back focal length, H denotes a height of a principal ray at the maximum angle of view on a plane which is orthogonal to an optical axis and which passes through point A, and L denotes a length from the point A to a vertex of a lens surface on the most reduction side on the optical axis. Here, the point A is a vertex of a lens surface on the most magnification side on the optical axis.

Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.

Abstract: The invention relates to a backlighting system for a liquid-crystal display screen, comprising: an illumination source producing an illumination beam; an objective illuminated by said illumination beam; at least one folding mirror illuminated by the illumination beam coming from the objective; and a Fresnel lens capable of collimating and redirecting the illumination beam reflected by said at least one folding mirror, the beam transmitted by the Fresnel lens being intended to back-light said display screen.

Abstract: A projection optical system for use in an image projection apparatus illuminating an image display panel forming an image in accordance with a modulating signal with illumination light from a light source. The projection optical system includes first and second optical systems arranged along an optical path defining an upstream-downstream direction in the order described from upstream to downstream on the downstream side of the image display panel. The first optical system includes at least one dioptric system and has positive power. The second optical system includes at least one reflecting surface having power and has positive power. The image formed by the image display panel is formed as an intermediate image in the optical path, and the intermediate image is magnified and projected.

Abstract: A projection optical system for use in an image projection apparatus illuminating an image display panel forming an image in accordance with a modulating signal with illumination light from a light source. The projection optical system includes first and second optical systems arranged along an optical path defining an upstream-downstream direction in the order described from upstream to downstream on the downstream side of the image display panel. The first optical system includes at least one dioptric system and has positive power. The second optical system includes at least one reflecting surface having power and has positive power. The image formed by the image display panel is formed as an intermediate image in the optical path, and the intermediate image is magnified and projected.

Abstract: A projecting lens system includes a first lens positive in power, a second lens negative in power, a third lens positive in power, and a fourth lens positive in power. The projecting lens system meets a criteria of 1.4<TT/f<1.7; where TT denotes a total length of the projecting lens system and f denotes an effective focal length of the projecting lens system.

Abstract: A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.

Abstract: A frame 18 with a first lens group 15 and a second lens group 17 of a projection lens system fixedly mounted thereto is supported by a support arm 43 so as to direct a mirror mounting aperture 27 of the frame 18 downward. The reflection mirror 16 for folding an optical axis of the projection lens system is held and placed within the mirror mounting aperture 27 of the frame 18 by a mirror support 46 so as thereby to provisionally complete the projection lens system. Then, while an image of a test pattern generated by a test pattern projection head 44 is projected onto a remote screen 47 by the provisionally complete the projection lens system, the reflection mirror 16 is adjusted in position by 45 by a mirror position adjusting unit 45.

Abstract: The present invention provides new projection schemes for wide angle imaging lenses rotationally symmetric about optical axis wherein the field of view of lenses and the size of image sensors are directly reflected without any reference to the effective focal length of the lenses. This invention also provides explicit examples of wide-angle lenses implementing the newly developed projection schemes. According to the present invention, by providing new projection schemes explicitly reflecting the physical quantities of direct interest to the user for industrial applicability, namely, the field of view and the image sensor size, it is possible to realize wide-angle lenses providing the most satisfactory images.

Abstract: An imaging lens includes, in the order from the object side to the image side, a first lens of positive refraction power, a second lens of negative refraction power, a third lens of positive refraction power, and a fourth lens of negative refraction power. The imaging lens satisfies the formulae (1) 1<T/F<1.4; (2) R3/F>4; and (3) S1/S2>3, where T is the overall length of the imaging lens, F is the focal length of the imaging lens, R3 is the radius of curvature of the object-side surface of the second lens, S1 is the vertical distance from the edge to the center of the image-side surface of the third lens, and S2 is the horizontal distance from the edge to the center of the image-side surface of the third lens.

Abstract: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is SiO2.

Abstract: A projection lens system includes, in order from the magnification side, a negative first group G1 and positive second to fifth groups G2 to G5. In the lens system, the first group G1 has aspheric surface, a lens closest to the magnification side (L7) in the fourth group G4 has an aspheric surface, and the fifth group G5 is formed of one positive lens. During zooming, the first group G1 and the fifth group G5 remain stationary, while the second to fourth groups G2 to G4 are moved separately. Furthermore, the lens system satisfies the expression 0.8<d34/fw, where fw denotes a focal length of the whole system at the wide-angle end, and d34 denotes an air space between the third lens group G3 and the fourth lens group G4 at the wide-angle end.

Abstract: The disclosed embodiments relate to a system and method for wide angle image projection. An exemplary embodiment of the present invention comprises a video unit, comprising an imaging system configured to create a projected image, a lens group optically coupled to the imaging system to receive the projected image. The lens group including a lens doublet having a first positive crown element, a negative flint element affixed to the first positive crown element, and a second positive crown element adjacent to the lens doublet and facing the imaging system.

Abstract: The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

Abstract: Both ends of a transparent cover which is formed of a curved member are fitted to a lens guard and a mirror guard, and a free-shaped surface mirror and a free-shaped surface lens are housed in a sealed space defined within a projection type image display device.

Abstract: A projection image display device is disclosed in which a trapezoidal distortion and/or aberration are restrained when an image is enlarged and projected obliquely onto a screen. An image generator is connected to an optical system base in such a manner that at least an inclination thereof (on an axis parallel to X axis) with respect to a vertical line and a distance thereof in forward and backward direction (Z axis direction) can be adjusted by an adjusting mechanism. Further, a projecting lens 2 as a first optical system and a free-form curved surface mirror as a second optical system are fixed to the optical system base. The free-form curved surface mirror is rotatable (on an rotary axis parallel to X axis) with respect to the vertical line at a substantial center of the free-form curved surface mirror.

Abstract: A lens device comprises a lens element having round depressions formed in the back thereof and a lens barrel provided with round projections formed correspondingly in position to the round depressions each of which has an axial length shorter than an axial depth of the round depression and an outer diameter smaller than an inner diameter of the depression. The lens element is held in the lens barrel with the round projections received in the round depressions, respectively.

Abstract: A projection optical system, in which a plurality of light flux emitted from one conjugate plane enters another conjugate plane and an image formed on the one conjugate plane is projected on the other conjugate plane, includes: a first optical system including at least one lens; and a second optical system which includes at least two reflecting surfaces with optical power, a normal line of the other conjugate plane from a center of an image projected on the other conjugate plane has no intersection with any space of the first optical system, or the second optical system, or a space between the first optical system and the second optical system, and when a plane defined by a vertical direction of the image projected on the other conjugate plane and an extending direction of the normal line is set as a YZ plane, from the first optical system to the other conjugate plane an optical path intersects only once on the YZ plane.

Abstract: A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.

Abstract: An optical apparatus comprises an optical component having at least one optical surface and a first optical axis, a socket in which said optical component is mounted, first manipulators arranged to exert forces approximately parallel to the optical axis of the optical component for varying stresses in the optical component, the forces having a strength such that stress birefringence is induced in the component.

Abstract: An exemplary projection lens includes, in this order from the screen-side thereof, a negative lens group having negative refraction of power, and a positive lens group having positive refraction of power. The positive and negative lens groups each include a number of positive and negative lenses. The focal length of the projection lens is adjustable. The projection lens satisfies the formulas of: ?2<F1/Fw<?1.6; 1.2<F2/Fw<1.4; and Vg2>56, where F1, and F2 respectively represent the effective focal lengths of the negative lens group and the positive lens group, Fw is the shortest effective focal length of the projection lens, and Vg2 is the average of the Abbe numbers of the positive lenses in the positive lens group.

Abstract: A zoom lens comprises a plurality of lens units including a first lens unit disposed most adjacent to an enlargement side and having negative refractive power, wherein one or more lens units of the plurality of lens units are moved in the direction of the optical axis thereof during magnification change, and wherein the first lens unit includes a 1-1st lens unit comprising at least one lens of negative refractive power and moved during focusing and a 1-2nd lens unit having positive refractive power, and fixed during focusing.

Abstract: The zoom lens includes a plurality of lens units. The first lens unit is disposed closest to a magnification side in the plurality of lens units and has a negative optical power, and magnification-varying lens units that are disposed closer to a reduction side than the first lens unit and moves for variation of magnification. The first lens unit includes, in order from the magnification side, a first-A lens sub-unit having a negative optical power and a first-B lens sub-unit having a positive optical power. For focusing from an infinite side to a close side, the first-A and first-B lens sub-units move as a distance therebetween increases, and the first-B lens sub-unit moves toward the reduction side. The zoom lens is capable of correcting well variation of curvature of field due to a projection distance change and has a good optical performance.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2<Nb·Eb/|Rb|<4.0, where Rb is a radius of curvature of the surface on the first plane side of the boundary optical element, Eb an effective diameter of the surface on the first plane side of the boundary optical element, and Nb a refractive index for used light, of an optical material forming the boundary optical element.

Abstract: A projection objective for imaging a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective using ultraviolet radiation has a plurality of optical elements including transparent optical elements transparent for radiation at an operating wavelength ?, where 260 nm>?>150 nm, an image-side pupil surface arranged between the object surface and the image surface, and an aperture-defining lens group arranged between the image-side pupil surface and the image surface for converging radiation coming from the image-side pupil surface towards the image surface to define an image-side numerical aperture NA, where 0.7?NA?1.4. The aperture-defining lens group includes at least one high-index lens made from a transparent high-index material having a refractive index nHI, where nHI>nSIO2 and where nSIO2 is the refractive index of silicon dioxide (SiO2) at the operating wavelength.

Abstract: A negative first group G1 is fixed when a power of the projection zoom lens varies and has a focusing function. A positive second group G2, a positive or negative third group G3, a positive fourth group G4 and a positive or negative group G5 move with a mutual relationship. A sixth group G6 functions as a relay lens. The fifth group G5 includes a cemented lens formed by cementing a negative meniscus lens L10 having a convex surface directed to the magnification side, a negative lens L11 and a positive lens L12 in order from a magnification side, and a positive lens L13 having a convex surface directed to a reduction side. Also, an expression |F5|/F>4.5 is satisfied where F denotes a focal length of the projection zoom lens at a wide-angle end and F5 denotes a focal length of the fifth group.

Abstract: A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.

Abstract: A displaying method of a digital light processing (DLP) projector includes the steps of: providing a light modulation device including a driver printed circuit board and a digital micromirror device (DMD), wherein the DMD includes a plurality of micromirrors each having a first stable state and a second stable state, and a predetermined light incident direction, the DMD is installed on the driver printed circuit board; providing an illumination light beam being incident on the DMD along an operating direction different from the predetermined light incident direction, modulating the illumination light beam to an imaging light beam by the DMD and directing the imaging light beam to a projection lens for projecting an image. A DLP projector made thereby has a relatively lower manufacturing cost.

Abstract: A mobile phone (20) includes a main body, a camera module (300) mounted on the main body for capturing an image of a business card, and a projection module (400) mounted on the main body for projecting a collimating pattern on the business card to facilitate focusing of the camera module on the business card. The projection module includes a light source (122) for emitting light beams, a collimating lens (14) for collimating the light beams, a projection lens (18), and a projection film (16) disposed between the collimating lens and the projection lens. The projection film having a collimating pattern (160), the projection lens configured for projecting the collimating pattern onto the business card.

Abstract: An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.

Abstract: An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.

Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

Abstract: The invention relates to a projection objective with fixed focal length for digital projection, characterized by the following features: a first optical subassembly of several lenses seated in a first objective housing; a second optical subassembly of several lenses seated in a second objective housing; and a third objective housing that, in the region of one end, accepts the first objective housing, and in the region of the other end, accepts the second objective housing. Such an objective is designed to be structurally simple and makes possible a simple and precise assembly.

Abstract: A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.