Abstract: The present invention provides a projection lens system comprising a double-gauss architecture with aspheric lens elements at the beginning and end of the lens system with a system stop therebetween and an acromatic lens element pair between each aspheric lens and the system stop. Also provided is a projection lens family comprising a plurality of lens systems, each having a double-gauss base architecture with aspheric lens elements at the beginning and end of the lens system with a system stop therebetween and an acromatic lens element pair between each aspheric lens and the system stop. Each lens system is optimized to provide a different cost/performance option.

Abstract: An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

Abstract: A projection lens device includes, in order from a magnification side, a first lens group G1 having a negative refractive power, and a second lens group G2 having a positive refractive power. The projection lens device is substantially telecentric on a reduction side thereof. The second lens group G2 includes a three-element cemented lens L10 to L12 formed by cementing three lens elements. A space between the first lens group G1 and the second lens group G2 is set as the maximum inter-lens space (the maximum air space) so that a reflection mirror 4 can be inserted. Also, the projection lens device satisfies eight conditional expressions.

Abstract: A projection zoom lens has three negative, positive, and position group configuration in order from a magnification side. A first group G1 includes a positive L1, a negative meniscus lens L2, a negative lens L3, a positive L4, and a negative lens L5. The positive lens L4 and the negative lens L5 constitute a cemented lens. The second group G2 includes a biconvex lens L6 and a biconvex lens L7. The third group G3 includes an aspheric lens L8, a negative lens L9, a positive lens L10, and a positive lens L11. The first to third lens groups satisfy: |M3/f3|<|M1/f1|<|M2/f2|??(1) 0.40<|M2/f2|<0.80??(2) where Mi denotes a movement amount of the i-th lens group between the wide-angle end and the telephoto end during the varying of the power, and fi denotes a focal length of the i-th lens group.

Abstract: A disclosed projection optical system for projecting and forming an enlarged image of an image displayed in a planar manner as an object includes: a lens system including, from an object side, at least a lens group providing telecentricity to an object space side, a lens group controlling divergence of angles of view, a diaphragm, a lens group converging the angles of view, and a lens group converging and subsequently enlarging the angles of view; and a catoptric system disposed on an image side relative to the lens system and including a mirror having negative power. Each lens group of the lens system and the mirror having negative power share an optical axis and the optical axis is shifted relative to a center of an object surface.

Abstract: Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.

Abstract: A projector optical system for forming a real image by projecting an image of a display element is constituted by, sequentially from a projection side, an aperture diaphragm; and a first lens group having positive refractive power and having, in the interior thereof or on a lens surface at a projection side or at a display element side, a diffraction optical surface formed by a multilayer-type diffractive optical element in which diffraction gratings formed on two diffractive element components are arranged facing each other. The projector optical system is configured so as to satisfy the following expression 0.1<K/L<1.5 wherein L is a total length on an optical axis, and K is a distance on the optical axis from the aperture diaphragm to a surface of the first lens group that is closest to the projection side, and satisfy also the following expression 0.01<?Nd<0.45 wherein ?Nd is a difference between refractive indices of the two diffractive element components for a main wavelength (d-line).

Abstract: A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

Abstract: A fixed-focus lens suitable for projecting an image beam from a light valve onto a screen is provided. The fixed-focus lens comprises a first lens group, a second lens group, and a third lens group arranged in sequence. The third lens group is disposed near the light valve. The first lens group having a negative refractive power comprises at least an aspheric lens. The second lens group having a positive refractive power comprises at least a lens. The third lens group having a positive refractive power comprises at least four lenses.

Abstract: An exemplary projection lens includes, in this order from the magnification side to the minification side thereof, a negative lens group having negative fraction of power, and a positive lens group having positive fraction of power. The positive and negative lens groups each include a number of positive and negative lenses. The focal length of the projection lens is adjustable. The projection lens satisfies the formulas of: ?2<F1/Fw<?1.6; 1.2<F2/Fw<1.4; and Vg2>56, where F1, and F2 respectively represent the effective focal lengths of the negative lens group and the positive lens group, Fw is the shortest effective focal length of the projection lens, and Vg2 is the average of the Abbe number of the positive lenses in the positive lens group.

Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.

Abstract: A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA?0.85, if appropriate of NA?1.

Abstract: A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ? i = 1 k ? ? ? i ? ? V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, ?i is a refractive power in mm?1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.

Abstract: An optical scanning device provides a radiation source (2,200), a collimator lens (4,40), an objective (7,90) for converting a beam (5,30?) to a scanning spot at the position of an information layer (101) of a record carrier (1,100). The device also includes an electrowetting cell (6). The electrowetting cell (6) acts such that a beam (5,30?) enters the objective (7,90) at a predetermined height of an entrance pupil of the objective (7,90) independent of the position of the objective (7,90) and that the beam (5,30?) forms a predetermined angle at the entrance pupil of the objective (7,90) with the optical axis (8). In this way the rim intensity may be kept constant over the entrance pupil of the objective (7,90).

Abstract: A projection lens system that has a compact configuration and is capable of correcting a color aberration. In the system, first and second lenses have a weak refractive power, respectively, and a third lens has a strong positive refractive power. A fourth lens corrects an aberration generated by the third lens, and a fifth lens has a negative refractive power. A diffractive optical element is formed on at least one among the surface of the first to fifth lenses. A color aberration and spherical aberration is corrected with the diffractive optical element, so that a high resolution can be realized without increasing the number of lenses and the manufacturing cost can be reduced.

Abstract: A projection zoom lens device includes, in order from a magnification side, a negative first group G1 and positive second to fifth groups (G2 to G5) and is configured so that the second group G2, the third group G3, and the fourth group G4 are moved along an optical axis toward the magnification side during zooming from a wide-angle end state to a telephoto end state. Also, a lens L4, being closest to the magnification side, of the second group G2 is formed of a negative lens, and the fifth group G5 includes a single positive lens.

Abstract: The projection lens that projects a light flux from an object onto a projection surface. The projection lens includes a negative lens unit having a negative optical power, and a correction mechanism that tilts the negative lens unit with respect to an optical axis of the projection lens such that field tilt is generated in a direction opposite to a direction of field curvature generated at the projection surface. The projection lens reduces the generation of field curvature and its variation using a simple configuration.

Abstract: Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l1, an incident angle of light coming from the object plane to the first mirror is i1, a distance between the first mirror and the confocal point is l1?, a distance between the confocal point and the second mirror is l2, an incident angle of light coming from the first mirror to the second mirror is i2, and a distance between the second mirror and an image plane is l2?, the off-axis projection optics may satisfy the following equation: l 1 ? + l 1 l 1 ? tan ? ? i 1 = l 2 ? + l 2 l 2 ? tan ? ? i 2 .

Abstract: The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

Abstract: To provide a high-brightness, small, low-cost optical apparatus which covers a wide-angle to super-wide-angle region and which reliably corrects various aberrations with a small number of lenses. At least one negative lens unit 1, a meniscus lens 2 that is convex on an object side, an aperture stop S, and a double-convex positive lens 3 are arranged in order from the object side. At least one of the lenses positioned on the object side of the aperture stop S and the positive lens 3 include respective aspherical surfaces.

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract: A fixed-focus lens including a first lens group, a second lens group, and a third lens group arranged from an object side to an image side in sequence is provided. The first lens group has a negative refractive power, and includes at least one aspheric lens. The second lens group has a positive refractive power, and includes a lens. The third lens group has a positive refractive power, and includes a triple cemented lens. An effective focal length (EFL) of the fixed-focus lens is f. An EFL of the first lens group is f1. An EFL of the second lens group is f2. An EFL of the third lens group is f3. An axial distance between the first lens group and the second lens group is d. The fixed-focus lens satisfies: 2.5<|f1/f|<4.5, 7.5<f2/f<10, 4.5<f3/f<8.5, and 13<d/f<14.

Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.

Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

Abstract: A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective. The optical elements comprise a first group, following the object plane, of optical elements, and a last optical element, which follows the first group and is next to the image plane and which defines an exit surface of the projection objective and is arranged at a working distance from the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis.

Abstract: A lithography apparatus comprising variable lenses is described. These variable lenses are included in a microlens array. At least some of the lenses have two or more immiscible liquids whose optical properties can be varied, for example, by an application of a voltage.

Abstract: A projection exposure system, intended in particular for microlithography, is used for generating, in an image plane, an image of a mask arranged in an object plane. The projection exposure system has a light source emitting projection light and projection optics arranged between the mask and the image. Starting from the mask, the following are arranged in the beam path of the projection optics: a first group of optical components with an overall positive refractive power; a second group of optical components with an overall negative refractive power; a third group of optical components with an overall positive refractive power; a fourth group of optical components with an overall negative refractive power, and, a fifth group of optical components with an overall positive refractive power. At least three optical subgroups having at least one optical component can be displaced along the optical axis of the projection optics.

Abstract: A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency component. A projection optical system for forming the demagnified image of a first plane (R) on a second plane (W). A first light transmitting member (L23) disposed closest to the second plane side and having almost no refraction power is provided. When the distance between the first light transmitting member and the second plane is WD, a numerical aperture on the second plane side NA, and the center wavelength of a light used L×10?6, the condition 0.06<WDNA/L<0.23 is satisfied. Or, a first light transmitting member disposed closest to a second plane side and having almost no refraction power, and a second light transmitting member (L22) disposed adjacent to the first plane side are provided.

Abstract: A projection zoom lens includes, from a screen side to an image source side, a first lens group having a negative refractive power, a second lens group having a positive refractive power, a third lens group having a positive refractive power, a fourth lens group having a negative refractive power and a fifth lens group having a positive refractive power. Zooming the projection zoom lens from the wide-angle end to the telephoto end causes the second, third and fourth lens groups to move toward the screen side, and the first and fifth lens groups are kept stationary. The projection zoom lens may further include an auto iris being axially movable with the fourth lens group, a composite prism and a cover glass. The projection zoom lens satisfies several conditions so that it can effectively eliminate aberrations and improve the projection image quality.

Abstract: A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

Abstract: A method for driving an optical deflecting device array is disclosed, including in a series of processes for the light deflection operation, at least, a state of a first stage writing and recording data for indicating an inclination direction of the plate member to incline in a first inclination direction or a second inclination direction, into a semiconductor memory device arranged immediately under or adjacent to each of the plurality of optical deflecting devices; a state of a second stage switching the inclination direction of the plate member of the arbitrary optical deflecting device to the first inclination direction based on an indication of the data, and deflecting light; and a state of a third stage switching the inclination direction of the plate member of the arbitrary optical deflecting device to the second inclination direction based on the indication of the data, and deflecting light.

Abstract: An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.

Abstract: An optical system for a projector and an imaging method thereof. A light beam from a light source passes through a first lens set and a second lens set sequentially. The light beam having passed through the second lens set is reflected by a first mirror to pass through the second lens set again and arrived at an imaging device. The light is reflected from the imaging device to a projection lens set to project the light beam onto a screen.

Abstract: An illumination optical apparatus and a projection type display apparatus capable of enhancing an illumination efficiency; having an ellipsoidal mirror, a light source arranged at a first focal point of the ellipsoidal mirror, a stop arranged closer to said light source side by a predetermined distance from a second focal point of said ellipsoidal mirror, and a positive refractive collimator lens for collimating a light flux emitted from the stop to a parallel light flux. A condition (0.01<L2/L1<0.06) is satisfied where, L1 is a distance from an apex of the ellipsoidal mirror to the second focal point thereof and, L2 (the light source side is a positive distance) is a distance from the second focal point of the ellipsoidal mirror to the stop.

Abstract: A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which arc arranged along an optical axis of the projection objective and are configured in such a way that a defined image field curvature of the projection objective is set in such a way that an object surface that is curved convexly with respect to the projection objective can be imaged into a planar image surface. What can be achieved given a suitable setting of the object surface curvature is that a gravitation-dictated bending of a mask does not have a disturbing effect on the imaging quality.

Abstract: It is an object to form a highly wear-resistant liquid repellent layer on a non-oxide surface. The oxide layer 8 is formed on the non-oxide material 1 surface. The oxide layer 8 is bound to the liquid repellent layer 3, made of a compound having a perfluoropolyether or perfluoroalkyl chain, at the binding sites 2.

Abstract: A first lens group having a negative refractive power, an aperture diaphragm, and a second lens group having a positive refractive power are arranged in order from an enlargement side. A reduction side of a projection lens is made essentially telecentric. Further, cemented triplet lenses, each of which includes cemented three lenses, are provided in the first lens group and the second lens group, respectively. Further, air spacing which enables placement of a mirror is ensured between the first lens group and the second lens group. Moreover, specific conditional expressions for the lens are satisfied.

Abstract: The zoom lens includes a plurality of lens units. The first lens unit is disposed closest to a magnification side in the plurality of lens units and has a negative optical power, and magnification-varying lens units that are disposed closer to a reduction side than the first lens unit and moves for variation of magnification. The first lens unit includes, in order from the magnification side, a first-A lens sub-unit having a negative optical power and a first-B lens sub-unit having a positive optical power. For focusing from an infinite side to a close side, the first-A and first-B lens sub-units move as a distance therebetween increases, and the first-B lens sub-unit moves toward the reduction side. The zoom lens is capable of correcting well variation of curvature of field due to a projection distance change and has a good optical performance.

Abstract: Disposed in order from a magnification side are a negative first group which is fixed during zooming to effect focusing, second to fifth groups of positive refractive power which move with mutual relationship during magnification variation, and a fixed sixth group. A negative lens made of a glass material which has an anomalous dispersion property and which has 70 or more in Abbe number is disposed in the first lens group. A positive lens made of a glass material which has an anomalous dispersion property and which has 70 or more in Abbe number is disposed in the third group located closer to a reduction side than a diaphragm. The negative lens and the positive lens are cemented to their adjacent lenses, respectively. Also, bf/fw?2.7 is satisfied where bf denotes a back focus, and fw denotes a focal length of the entire system at a wide-angle end.

Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

Abstract: At least one exemplary embodiment is directed to A retro focus optical system that is capable of sufficiently correcting and/or reducing various aberrations including the chromatic aberration. The optical system includes a refractive optical element including a solid material. The Abbe number ?d and the partial dispersion ratio ?gF of the solid material along with a shape of the refractive optical element can reduce various aberrations.

Abstract: A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

Abstract: The present invention is a projection type image display apparatus comprising: an image display device which displays an image; an optical illumination means which irradiates the image display device, the optical illumination means having a light source unit; and a projection lens for projecting an enlarged image of the image display device; characterized in that an optical element is disposed between the image display device and the projection lens or within the projection lens and focusing is performed by moving the optical element in a direction which is substantially perpendicular to the optical axis of the projection lens.

Abstract: A method of driving a display having a plurality of light-emitting elements that change with time or use, comprising the steps of: a) displaying first and second image signals having spatially distributed pixels divided into a plurality of groups, and forming first and second image signal group attributes for each of the plurality of groups; b) comparing the second group attributes and the first group attributes to form at least one group difference value for each group, comparing the group difference values to at least one predetermined metric to form at least one pixel group dynamic value, combining the group dynamic values, and if the combined group dynamic values are found to be less than a first limit, displaying a display-preserving image signal over the entire display.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666?) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

Abstract: A projection optical system for projecting, while enlarging, an image formed on an image formation surface onto an image projection surface from an oblique direction relative thereto has at least three optically powered reflective surfaces and a refractive lens surface having a non-rotation-symmetric free-form curved surface and disposed between the first and second reflective surfaces as counted from the image formation surface side.

Abstract: A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the direction of an optical axis of the projection objective. This immersion space can be filled with an immersion liquid. At least one liquid or solid volume having plane-parallel interfaces can be introduced into the beam path of the projection objective, the optical thickness of the at least one volume being at least substantially equal to the optical thickness of the immersion space. By introducing and removing the volume, it is possible to convert the projection objective from dry operation to immersed operation in a straightforward way, without extensive adjustments to the projection objective or alignment work.

Abstract: A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L?0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.